WO2003012166A2 - Procede destine a la production d'un materiau de base plat en metal, materiau de base ainsi produit et son utilisation - Google Patents
Procede destine a la production d'un materiau de base plat en metal, materiau de base ainsi produit et son utilisation Download PDFInfo
- Publication number
- WO2003012166A2 WO2003012166A2 PCT/DE2002/002687 DE0202687W WO03012166A2 WO 2003012166 A2 WO2003012166 A2 WO 2003012166A2 DE 0202687 W DE0202687 W DE 0202687W WO 03012166 A2 WO03012166 A2 WO 03012166A2
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- layer
- base material
- substrate
- metal
- superconducting
- Prior art date
Links
- 229910052751 metal Inorganic materials 0.000 title claims abstract description 44
- 239000002184 metal Substances 0.000 title claims abstract description 44
- 239000000463 material Substances 0.000 title claims abstract description 36
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 11
- 239000000758 substrate Substances 0.000 claims abstract description 39
- 238000000034 method Methods 0.000 claims abstract description 27
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 12
- 239000004332 silver Substances 0.000 claims description 11
- 238000005240 physical vapour deposition Methods 0.000 claims description 9
- 239000002131 composite material Substances 0.000 claims description 7
- 239000010949 copper Substances 0.000 claims description 7
- 229910052709 silver Inorganic materials 0.000 claims description 7
- 229910052759 nickel Inorganic materials 0.000 claims description 6
- 229910001316 Ag alloy Inorganic materials 0.000 claims description 5
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 5
- 229910052802 copper Inorganic materials 0.000 claims description 5
- 229910000881 Cu alloy Inorganic materials 0.000 claims description 4
- 229910000990 Ni alloy Inorganic materials 0.000 claims description 4
- 239000004020 conductor Substances 0.000 claims description 4
- 229910052594 sapphire Inorganic materials 0.000 claims description 3
- 239000010980 sapphire Substances 0.000 claims description 3
- 239000010936 titanium Substances 0.000 claims description 3
- 229910052719 titanium Inorganic materials 0.000 claims description 3
- 229910021521 yttrium barium copper oxide Inorganic materials 0.000 claims description 2
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 7
- 239000002887 superconductor Substances 0.000 description 4
- 239000011248 coating agent Substances 0.000 description 3
- 238000000576 coating method Methods 0.000 description 3
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 2
- 239000011159 matrix material Substances 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- 238000005096 rolling process Methods 0.000 description 2
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 238000000137 annealing Methods 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000009713 electroplating Methods 0.000 description 1
- 230000002349 favourable effect Effects 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 230000005408 paramagnetism Effects 0.000 description 1
- 239000010970 precious metal Substances 0.000 description 1
- 238000001953 recrystallisation Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D1/00—Electroforming
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D1/00—Electroforming
- C25D1/20—Separation of the formed objects from the electrodes with no destruction of said electrodes
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N60/00—Superconducting devices
- H10N60/01—Manufacture or treatment
- H10N60/0268—Manufacture or treatment of devices comprising copper oxide
- H10N60/0296—Processes for depositing or forming copper oxide superconductor layers
- H10N60/0576—Processes for depositing or forming copper oxide superconductor layers characterised by the substrate
Definitions
- the invention relates to a method for producing a flat base material made of metal for applying a superconducting layer.
- RABITS Rolling Assisted Biaxial Testuring of Substrates
- the invention has for its object to provide a method for producing a flat base material for applying a superconducting layer, which can not only be carried out comparatively inexpensively, but which can also be used to produce base material with which superconducting, in particular high-temperature superconducting components with very good superconducting properties can be produced let create.
- a metal layer is galvanically produced on a single-crystalline substrate and the metal layer is detached from the substrate to obtain the base material.
- Microx can be produced by a simple electroplating process and subsequent detachment of the metal layer from the matrix or from the substrate, a two-dimensional base material made of metal, which is used to apply a layer made of a superconducting material, in particular a high-temperature superconducting material Formation of a superconductor is very suitable because this base material has the favorable texture of the substrate for this purpose. Another important advantage is that the - expensive substrate is reusable.
- a metallic auxiliary layer is advantageously formed on the substrate prior to the galvanic production of the metal layer, and at least the metal layer is detached from the substrate to obtain the base material.
- the auxiliary layer can advantageously by means of z. B. PCT (Physical Vapor Deposition). The auxiliary layer can therefore remain on the substrate; if it is replaced in each case, then the Detach the double layer more easily from the substrate without damage and then process it further.
- a metallic auxiliary layer is formed on the substrate before the galvanic production of the metal layer, and at least one insulating buffer layer is applied to the metal layer and, in turn, the superconducting layer thereon, and then the layer composite thus formed, at least including the metal layer detached from the substrate. From this composite layer - with us without an auxiliary layer - superconducting components can be obtained by relatively simple mechanical structuring.
- the layered composite can in a simple manner - either before it is detached from this substrate or later - by a metal coating, e.g. B. from a precious metal, to be able to manufacture a superconducting device with a shunt.
- a metal coating e.g. B. from a precious metal
- This metal pad can be formed in different ways. It is considered to be particularly advantageous if the metal coating is produced by means of PVD (Physical Vapor Deposition).
- YBCO YBa 2 Cu 3 0 7
- sapphire is advantageously used as the substrate.
- Titanium which is advantageously applied by means of PVD, is particularly suitable as an auxiliary in such a substrate.
- metal layers made of different metals can be produced on the substrate.
- the application of a metal layer made of nickel or a nickel alloy can be advantageous.
- the invention is also based on the object of specifying a flat base material which can be produced particularly cost-effectively and is particularly well suited for the production of superconductors.
- the areal base material is a base material that is electroplated by means of a single-crystalline substrate.
- the flat base material advantageously consists of nickel or a nickel alloy or of silver or copper or of a silver or copper alloy.
- a sheet-like base material made of metal such as. B. silver or a silver alloy, considered as a carrier for a layer of a superconducting material to form a superconducting conductor.
- a superconducting conductor causes a base material made of silver or copper no disturbing influences when used in alternating magnetic fields.
- a single-crystalline substrate is required in any case, which can be made of sapphire, for example.
- the illustration 1 shows a section of a single-crystalline substrate 1, on which an auxiliary layer 2 z. B. is made of titanium. Subsequently - as the illustration 2 shows - a metal layer 3 is galvanically produced on the auxiliary layer 2, which has taken over the texture of the substrate 1.
- the structure of the two layers 2 and 3 can be detached from the substrate 1 in order to continue to be used as the base material for superconducting components.
- the method according to the invention can also be carried out or continued such that initially - according to the partial representation of epitaxial buffer layers 4 and 5 made of z. B. Cu0 2 and YSZ are applied to the epitaxial metal layer 3, on which then again (see. Partial representation 4) z. B. a high-temperature superconducting layer 6 is produced from, for example, YBCo by means of PVD.
- the layer composite produced in this way can be pulled off the substrate 1 and, after mechanical structuring, form superconducting components. If such components are to have an integrated electrical shunt, then, according to partial illustration 5, a metal coating 7, for example made of gold, is applied to the epitaxial superconducting layer 6 before detaching by means of PVD.
- the partial representation 6 shows the layer composite after the detachment in front of the substrate 1.
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Manufacturing & Machinery (AREA)
- Superconductors And Manufacturing Methods Therefor (AREA)
- Superconductor Devices And Manufacturing Methods Thereof (AREA)
Abstract
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE10136891.7 | 2001-07-25 | ||
DE10136891A DE10136891B4 (de) | 2001-07-25 | 2001-07-25 | Verfahren zum Erzeugen eines flächenhaften Basismaterials aus Metall |
Publications (2)
Publication Number | Publication Date |
---|---|
WO2003012166A2 true WO2003012166A2 (fr) | 2003-02-13 |
WO2003012166A3 WO2003012166A3 (fr) | 2003-10-16 |
Family
ID=7693460
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/DE2002/002687 WO2003012166A2 (fr) | 2001-07-25 | 2002-07-17 | Procede destine a la production d'un materiau de base plat en metal, materiau de base ainsi produit et son utilisation |
Country Status (2)
Country | Link |
---|---|
DE (1) | DE10136891B4 (fr) |
WO (1) | WO2003012166A2 (fr) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2005031043A1 (fr) * | 2003-09-29 | 2005-04-07 | Siemens Aktiengesellschaft | Procede et installation de production pour produire un composant stratifie |
WO2003012172A3 (fr) * | 2001-07-25 | 2005-08-18 | Siemens Ag | Procede et dispositif destines a la production d'une bande texturee de metal |
US9468003B2 (en) | 2008-08-11 | 2016-10-11 | Koninklijke Philips N.V. | Medium access control (MAC) protocol for body area networks |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5741377A (en) * | 1995-04-10 | 1998-04-21 | Martin Marietta Energy Systems, Inc. | Structures having enhanced biaxial texture and method of fabricating same |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0612114B1 (fr) * | 1993-02-15 | 1997-05-14 | Sumitomo Electric Industries, Ltd. | Procédé pour former une couche mince structurée en oxyde supraconducteur |
GB2336849B (en) * | 1998-04-27 | 2003-02-26 | Telcon Ltd | Substrate materials |
KR100352976B1 (ko) * | 1999-12-24 | 2002-09-18 | 한국기계연구원 | 전기도금법에 의한 2축 집합조직을 갖는 니켈 도금층 및 그 제조방법 |
-
2001
- 2001-07-25 DE DE10136891A patent/DE10136891B4/de not_active Expired - Fee Related
-
2002
- 2002-07-17 WO PCT/DE2002/002687 patent/WO2003012166A2/fr not_active Application Discontinuation
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5741377A (en) * | 1995-04-10 | 1998-04-21 | Martin Marietta Energy Systems, Inc. | Structures having enhanced biaxial texture and method of fabricating same |
US5968877A (en) * | 1995-04-10 | 1999-10-19 | Lockheed Martin Energy Research Corp | High Tc YBCO superconductor deposited on biaxially textured Ni substrate |
Non-Patent Citations (1)
Title |
---|
DATABASE WPI Section Ch, Week 200317 Derwent Publications Ltd., London, GB; Class M11, AN 2002-031979 XP002249052 & KR 2001 063 692 A (KOREA INST OF MACHINENRY & MAT), 9. Juli 2001 (2001-07-09) -& US 6 346 181 B1 (KOREA INST OF MACHINERY AND MAT) 12. Februar 2002 (2002-02-12) * |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2003012172A3 (fr) * | 2001-07-25 | 2005-08-18 | Siemens Ag | Procede et dispositif destines a la production d'une bande texturee de metal |
US7666290B2 (en) | 2001-07-25 | 2010-02-23 | Siemens Aktiengesellschaft | Method and device for producing a textured metal strip |
WO2005031043A1 (fr) * | 2003-09-29 | 2005-04-07 | Siemens Aktiengesellschaft | Procede et installation de production pour produire un composant stratifie |
US9468003B2 (en) | 2008-08-11 | 2016-10-11 | Koninklijke Philips N.V. | Medium access control (MAC) protocol for body area networks |
Also Published As
Publication number | Publication date |
---|---|
DE10136891B4 (de) | 2004-07-22 |
DE10136891A1 (de) | 2003-02-20 |
WO2003012166A3 (fr) | 2003-10-16 |
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