WO2003008140A2 - Appareil de traitement de pièce à travailler - Google Patents

Appareil de traitement de pièce à travailler Download PDF

Info

Publication number
WO2003008140A2
WO2003008140A2 PCT/US2002/023297 US0223297W WO03008140A2 WO 2003008140 A2 WO2003008140 A2 WO 2003008140A2 US 0223297 W US0223297 W US 0223297W WO 03008140 A2 WO03008140 A2 WO 03008140A2
Authority
WO
WIPO (PCT)
Prior art keywords
rotor
workpiece
head
liquid
processing
Prior art date
Application number
PCT/US2002/023297
Other languages
English (en)
Other versions
WO2003008140A3 (fr
Inventor
Steven L. Peace
Paul Z. Wirth
Erik Lund
Original Assignee
Semitool, Inc.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US09/907,552 external-priority patent/US6492284B2/en
Priority claimed from US09/907,522 external-priority patent/US6680253B2/en
Application filed by Semitool, Inc. filed Critical Semitool, Inc.
Priority to AU2002322587A priority Critical patent/AU2002322587A1/en
Publication of WO2003008140A2 publication Critical patent/WO2003008140A2/fr
Publication of WO2003008140A3 publication Critical patent/WO2003008140A3/fr

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
    • H01L21/68714—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
    • H01L21/68728—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support characterised by a plurality of separate clamping members, e.g. clamping fingers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H01L21/6704—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
    • H01L21/67057—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing with the semiconductor substrates being dipped in baths or vessels
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67063—Apparatus for fluid treatment for etching
    • H01L21/67075—Apparatus for fluid treatment for etching for wet etching
    • H01L21/67086—Apparatus for fluid treatment for etching for wet etching with the semiconductor substrates being dipped in baths or vessels
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
    • H01L21/68714—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
    • H01L21/68785—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support characterised by the mechanical construction of the susceptor, stage or support
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
    • H01L21/68714—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
    • H01L21/68792—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support characterised by the construction of the shaft

Abstract

L'invention concerne un système de traitement de pièces à travailler comprenant une base dotée d'une cuve ou d'un évidement destiné à retenir un liquide. Un réacteur ou une tête de traitement retient une pièce à travailler entre un rotor supérieur et un rotor inférieur. Un dispositif de levage abaisse la tête retenant la pièce à travailler en contact avec le liquide. La tête fait tourner la pièce à travailler pendant ou après le contact avec le liquide. Les rotors supérieurs et inférieur présentent des ouvertures latérales pour charger et décharger une pièce à travailler au niveau de la tête. Les rotors, qui se déplacent de manière axiale, permettent d'aligner les ouvertures latérales.
PCT/US2002/023297 2001-07-16 2002-07-10 Appareil de traitement de pièce à travailler WO2003008140A2 (fr)

Priority Applications (1)

Application Number Priority Date Filing Date Title
AU2002322587A AU2002322587A1 (en) 2001-07-16 2002-07-10 Apparatus for processing a workpiece

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
US09/907,552 2001-07-16
US09/907,552 US6492284B2 (en) 1999-01-22 2001-07-16 Reactor for processing a workpiece using sonic energy
US09/907,522 2001-07-16
US09/907,522 US6680253B2 (en) 1999-01-22 2001-07-16 Apparatus for processing a workpiece

Publications (2)

Publication Number Publication Date
WO2003008140A2 true WO2003008140A2 (fr) 2003-01-30
WO2003008140A3 WO2003008140A3 (fr) 2003-11-06

Family

ID=27129490

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US2002/023297 WO2003008140A2 (fr) 2001-07-16 2002-07-10 Appareil de traitement de pièce à travailler

Country Status (3)

Country Link
AU (1) AU2002322587A1 (fr)
TW (1) TW559571B (fr)
WO (1) WO2003008140A2 (fr)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103140611A (zh) * 2010-08-13 2013-06-05 应用材料公司 电化学电镀装置中的去镀触点

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3727620A (en) * 1970-03-18 1973-04-17 Fluoroware Of California Inc Rinsing and drying device
US4132567A (en) * 1977-10-13 1979-01-02 Fsi Corporation Apparatus for and method of cleaning and removing static charges from substrates
US4750505A (en) * 1985-04-26 1988-06-14 Dainippon Screen Mfg. Co., Ltd. Apparatus for processing wafers and the like
US4903717A (en) * 1987-11-09 1990-02-27 Sez Semiconductor-Equipment Zubehoer Fuer die Halbleiterfertigung Gesellschaft m.b.H Support for slice-shaped articles and device for etching silicon wafers with such a support
US5168886A (en) * 1988-05-25 1992-12-08 Semitool, Inc. Single wafer processor
US5222310A (en) * 1990-05-18 1993-06-29 Semitool, Inc. Single wafer processor with a frame
US5591262A (en) * 1994-03-24 1997-01-07 Tazmo Co., Ltd. Rotary chemical treater having stationary cleaning fluid nozzle

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59208831A (ja) * 1983-05-13 1984-11-27 Hitachi Tokyo Electronics Co Ltd 塗布装置
JPS63185029A (ja) * 1987-01-28 1988-07-30 Hitachi Ltd ウエハ処理装置

Patent Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3727620A (en) * 1970-03-18 1973-04-17 Fluoroware Of California Inc Rinsing and drying device
US4132567A (en) * 1977-10-13 1979-01-02 Fsi Corporation Apparatus for and method of cleaning and removing static charges from substrates
US4750505A (en) * 1985-04-26 1988-06-14 Dainippon Screen Mfg. Co., Ltd. Apparatus for processing wafers and the like
US4903717A (en) * 1987-11-09 1990-02-27 Sez Semiconductor-Equipment Zubehoer Fuer die Halbleiterfertigung Gesellschaft m.b.H Support for slice-shaped articles and device for etching silicon wafers with such a support
US5168886A (en) * 1988-05-25 1992-12-08 Semitool, Inc. Single wafer processor
US5222310A (en) * 1990-05-18 1993-06-29 Semitool, Inc. Single wafer processor with a frame
US5445172A (en) * 1990-05-18 1995-08-29 Semitool, Inc. Wafer holder with flexibly mounted gripping fingers
US5591262A (en) * 1994-03-24 1997-01-07 Tazmo Co., Ltd. Rotary chemical treater having stationary cleaning fluid nozzle

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103140611A (zh) * 2010-08-13 2013-06-05 应用材料公司 电化学电镀装置中的去镀触点

Also Published As

Publication number Publication date
TW559571B (en) 2003-11-01
AU2002322587A1 (en) 2003-03-03
WO2003008140A3 (fr) 2003-11-06

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