WO2002036851A1 - Procede et dispositif de traitement de surface de substrats electro-isolants - Google Patents
Procede et dispositif de traitement de surface de substrats electro-isolants Download PDFInfo
- Publication number
- WO2002036851A1 WO2002036851A1 PCT/EP2001/012513 EP0112513W WO0236851A1 WO 2002036851 A1 WO2002036851 A1 WO 2002036851A1 EP 0112513 W EP0112513 W EP 0112513W WO 0236851 A1 WO0236851 A1 WO 0236851A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- treated
- substrate
- surface areas
- voltage
- vacuum chamber
- Prior art date
Links
- 239000000758 substrate Substances 0.000 title claims abstract description 32
- 238000000034 method Methods 0.000 title claims abstract description 28
- 239000000463 material Substances 0.000 claims abstract description 4
- 230000007704 transition Effects 0.000 claims abstract 3
- 239000007789 gas Substances 0.000 claims description 14
- HSFWRNGVRCDJHI-UHFFFAOYSA-N Acetylene Chemical compound C#C HSFWRNGVRCDJHI-UHFFFAOYSA-N 0.000 claims description 7
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 claims description 4
- 239000011248 coating agent Substances 0.000 claims description 4
- 238000000576 coating method Methods 0.000 claims description 4
- 239000010410 layer Substances 0.000 claims description 4
- 238000004381 surface treatment Methods 0.000 claims description 3
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 2
- 229910052786 argon Inorganic materials 0.000 claims description 2
- 229910052799 carbon Inorganic materials 0.000 claims description 2
- 239000011241 protective layer Substances 0.000 claims description 2
- 239000002344 surface layer Substances 0.000 claims description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims 2
- 230000005540 biological transmission Effects 0.000 claims 2
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 claims 2
- 229910052756 noble gas Inorganic materials 0.000 claims 2
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 claims 1
- 230000003213 activating effect Effects 0.000 claims 1
- 239000012790 adhesive layer Substances 0.000 claims 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims 1
- 230000004888 barrier function Effects 0.000 claims 1
- 238000004140 cleaning Methods 0.000 claims 1
- -1 cleaning Substances 0.000 claims 1
- 239000001257 hydrogen Substances 0.000 claims 1
- 229910052739 hydrogen Inorganic materials 0.000 claims 1
- 125000004435 hydrogen atom Chemical class [H]* 0.000 claims 1
- 239000002346 layers by function Substances 0.000 claims 1
- 229910052757 nitrogen Inorganic materials 0.000 claims 1
- 230000003287 optical effect Effects 0.000 claims 1
- 230000001590 oxidative effect Effects 0.000 claims 1
- 239000001301 oxygen Substances 0.000 claims 1
- 229910052760 oxygen Inorganic materials 0.000 claims 1
- 229910000077 silane Inorganic materials 0.000 claims 1
- 239000002210 silicon-based material Substances 0.000 claims 1
- 239000000126 substance Substances 0.000 claims 1
- CZDYPVPMEAXLPK-UHFFFAOYSA-N tetramethylsilane Chemical compound C[Si](C)(C)C CZDYPVPMEAXLPK-UHFFFAOYSA-N 0.000 claims 1
- 229920006254 polymer film Polymers 0.000 description 4
- ANVAOWXLWRTKGA-NTXLUARGSA-N (6'R)-beta,epsilon-carotene Chemical compound CC=1CCCC(C)(C)C=1\C=C\C(\C)=C\C=C\C(\C)=C\C=C\C=C(/C)\C=C\C=C(/C)\C=C\[C@H]1C(C)=CCCC1(C)C ANVAOWXLWRTKGA-NTXLUARGSA-N 0.000 description 2
- 241000531891 Alburnus alburnus Species 0.000 description 1
- MQSMIOKTOYAPHO-WEVVVXLNSA-N [(e)-5-hydroperoxypent-1-enyl]benzene Chemical compound OOCCC\C=C\C1=CC=CC=C1 MQSMIOKTOYAPHO-WEVVVXLNSA-N 0.000 description 1
- 229910003481 amorphous carbon Inorganic materials 0.000 description 1
- 230000002925 chemical effect Effects 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 238000004132 cross linking Methods 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000005137 deposition process Methods 0.000 description 1
- BCQMRZRAWHNSBF-UHFFFAOYSA-N desmethylprodine Chemical compound C=1C=CC=CC=1C1(OC(=O)CC)CCN(C)CC1 BCQMRZRAWHNSBF-UHFFFAOYSA-N 0.000 description 1
- 230000005288 electromagnetic effect Effects 0.000 description 1
- 238000010849 ion bombardment Methods 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 230000007723 transport mechanism Effects 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32082—Radio frequency generated discharge
- H01J37/32091—Radio frequency generated discharge the radio frequency energy being capacitively coupled to the plasma
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
- C23C16/505—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using radio frequency discharges
- C23C16/509—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using radio frequency discharges using internal electrodes
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/54—Apparatus specially adapted for continuous coating
- C23C16/545—Apparatus specially adapted for continuous coating for coating elongated substrates
Definitions
- the present invention relates to a method and a device for the surface treatment of electrically insulating substrates. Such methods and devices are used to coat and clean substrates, to remove material from them or to activate their surface or to introduce gas components into the surface layer of a substrate.
- the methods and devices according to the invention are used in particular for protective layers against mechanical, electromagnetic and / or chemical effects and the like.
- CD CD CD p 01 P Hi 01 • ⁇ pj: ⁇ P ) rt 01 h- 1 ⁇ P H- ⁇ n PP P.
- P 4 tr Q tr H "P 01 ⁇ tr P 4 H rt rt PPP ⁇ P ) 01 P ⁇ • --1 HP 4 PP ⁇ Q H- HHO ⁇ P ⁇ P
- Fig. 1 a. device according to the invention.
- Fig. 2 shows another device according to the invention.
- a polymer film according to the invention is coated.
- a polymer film 2 is transported in the direction of arrow A over deflection rollers 3, 3 ', 5, 4', 4.
- the pulleys, 3, 3 '. and 4, 4 ' are arranged such that the film between the guide rollers 3, 3' is guided parallel to the film between the guide rollers 4, 4 r .
- an electrode 1, 1 ' is arranged with its surfaces parallel to the film 2 and with an intermediate space 7, 7' spaced apart therefrom.
- the same voltage is applied to both electrodes 1, 1 'by a voltage source 9 (high-frequency generator) via lines 10', 10 ''.
- the transport mechanisms for the film 2, in particular the deflection rollers 3, 3 ', 5, 4', 0 4, are then omitted.
- FIG. 2 shows a further device according to the invention, identical or similar elements being designated here with the same or similar reference symbols.
- the film 2 is guided over three deflection rollers 3, 5, 3 ', the deflection rollers 3, 3' themselves as electrodes with a high-frequency voltage via the lines 10 ', 10''from the high-frequency source 9 are applied.
- the sheets on the guide rollers 3, 3' be bought
- the substrate 2 is treated with each pass, for example cleaned, material removed or coated when a reactive gas is supplied.
- a polymer film with a thickness of 30 ⁇ m is moved evenly between the rollers at a speed of 50 m / min.
- a gas mixture consisting of 40% ethyne and 60% argon is introduced into the hollow cathode area.
- The. Total pressure in Hohlkatoden Siemens loading • contributes 0.3 mbar.
- An AC voltage with a frequency of 150 kHz and an effective amplitude of 300 V is applied to the rollers. This alternating voltage creates a hollow cathode glow discharge which chemically activates the ethyne and at the same time causes ion bombardment of the film surface. This leads to an intimate cross-linking of the ethine fragments that are deposited on the film surface, and an amorphous carbon layer is formed.
- the thickness of the carbon layer is 0.1 ⁇ m, its hardness 20 GPa.
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Analytical Chemistry (AREA)
- Chemical Vapour Deposition (AREA)
Abstract
La présente invention concerne un procédé et un dispositif de traitement de surface de substrats électro-isolants, respectivement mis en oeuvre et utilisé pour recouvrir des substrats, nettoyer des substrats, enlever de la matière de ces substrats, activer la surface de ces substrats, ou bien incorporer des composants gazeux dans leur couche superficielle. Selon le procédé présenté, chaque fois deux zones de surface à traiter d"un substrat ou de substrats sont placées à une certaine distance l"une de l"autre et couplées de manière capacitive à une source de tension. Auxdites zones de surface à traiter est appliquée une tension de telle sorte qu"elles présentent la même polarité et que se forme, de façon limitée par ces zones de surface, sur au moins deux côtés sensiblement opposés, une décharge lumineuse de cathode creuse ou une décharge lumineuse dans la zone de transition entre une décharge lumineuse habituelle et une décharge lumineuse de cathode creuse.
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| EP01992802A EP1339895B1 (fr) | 2000-11-02 | 2001-10-30 | Procede et dispositif de traitement de surface de substrats electro-isolants |
| DE50114932T DE50114932D1 (de) | 2000-11-02 | 2001-10-30 | Verfahren und vorrichtung zur oberflächenbehandlung elektrisch isolierender substrate |
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE10054197.6 | 2000-11-02 | ||
| DE10054197 | 2000-11-02 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| WO2002036851A1 true WO2002036851A1 (fr) | 2002-05-10 |
Family
ID=7661822
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| PCT/EP2001/012513 WO2002036851A1 (fr) | 2000-11-02 | 2001-10-30 | Procede et dispositif de traitement de surface de substrats electro-isolants |
Country Status (3)
| Country | Link |
|---|---|
| EP (1) | EP1339895B1 (fr) |
| DE (1) | DE50114932D1 (fr) |
| WO (1) | WO2002036851A1 (fr) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE10320805A1 (de) * | 2003-05-08 | 2004-12-02 | Je Plasmaconsult Gmbh | Vorrichtung zur Bearbeitung von zylindrischen, zumindest eine elektrisch leitende Ader aufweisenden Substraten |
| EP1575078A1 (fr) * | 2004-03-08 | 2005-09-14 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Procédé pour le traitement de surfaces de substrats |
| WO2012095321A2 (fr) | 2011-01-14 | 2012-07-19 | Lothar Ginzel | Dispositif pour améliorer les propriétés électriques d'un revêtement d'un conducteur ou analogue au moyen de matériaux isolants, et procédé d'utilisation de ce dispositif |
| US8702902B2 (en) | 2008-08-20 | 2014-04-22 | Vision Dynamics Holding B.V. | Device for generating a plasma discharge for patterning the surface of a substrate |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE4233895A1 (de) * | 1992-10-08 | 1994-04-14 | Juergen Prof Dr Engemann | Verfahren und Vorrichtung zur Plasmabehandlung bahnförmiger Materialien |
| US5595792A (en) * | 1994-08-24 | 1997-01-21 | Fuji Photo Film Co., Ltd. | Method and apparatus for producing magnetic recording medium |
| DE19744060A1 (de) * | 1997-10-06 | 1999-04-22 | Fraunhofer Ges Forschung | Verfahren und Vorrichtung zur Oberflächenbehandlung von Substraten |
-
2001
- 2001-10-30 WO PCT/EP2001/012513 patent/WO2002036851A1/fr active Application Filing
- 2001-10-30 DE DE50114932T patent/DE50114932D1/de not_active Expired - Lifetime
- 2001-10-30 EP EP01992802A patent/EP1339895B1/fr not_active Expired - Lifetime
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE4233895A1 (de) * | 1992-10-08 | 1994-04-14 | Juergen Prof Dr Engemann | Verfahren und Vorrichtung zur Plasmabehandlung bahnförmiger Materialien |
| US5595792A (en) * | 1994-08-24 | 1997-01-21 | Fuji Photo Film Co., Ltd. | Method and apparatus for producing magnetic recording medium |
| DE19744060A1 (de) * | 1997-10-06 | 1999-04-22 | Fraunhofer Ges Forschung | Verfahren und Vorrichtung zur Oberflächenbehandlung von Substraten |
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE10320805A1 (de) * | 2003-05-08 | 2004-12-02 | Je Plasmaconsult Gmbh | Vorrichtung zur Bearbeitung von zylindrischen, zumindest eine elektrisch leitende Ader aufweisenden Substraten |
| DE10320805B4 (de) * | 2003-05-08 | 2010-10-28 | Je Plasmaconsult Gmbh | Vorrichtung zur Bearbeitung von zylindrischen, zumindest eine elektrisch leitende Ader aufweisenden Substraten |
| EP1575078A1 (fr) * | 2004-03-08 | 2005-09-14 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Procédé pour le traitement de surfaces de substrats |
| US8702902B2 (en) | 2008-08-20 | 2014-04-22 | Vision Dynamics Holding B.V. | Device for generating a plasma discharge for patterning the surface of a substrate |
| WO2012095321A2 (fr) | 2011-01-14 | 2012-07-19 | Lothar Ginzel | Dispositif pour améliorer les propriétés électriques d'un revêtement d'un conducteur ou analogue au moyen de matériaux isolants, et procédé d'utilisation de ce dispositif |
| DE102012000125A1 (de) | 2011-01-14 | 2012-07-19 | Lothar Ginzel | Vorrichtung zur Verbesserung der elekrischen Eigenschaften einer Beschichtung eines Leiters oder dergleichen durch Isolierstoffe,sowie ein Verfahren zur Anwendung einer derartigen Vorrichtung |
Also Published As
| Publication number | Publication date |
|---|---|
| DE50114932D1 (de) | 2009-07-23 |
| EP1339895A1 (fr) | 2003-09-03 |
| EP1339895B1 (fr) | 2009-06-10 |
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