WO2002007925A1 - Procede et dispositif permettant d'eliminer des particules de tres petite taille d'une surface au moyen d'une thermophorese de maniere a empecher la redeposition des particules - Google Patents

Procede et dispositif permettant d'eliminer des particules de tres petite taille d'une surface au moyen d'une thermophorese de maniere a empecher la redeposition des particules Download PDF

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Publication number
WO2002007925A1
WO2002007925A1 PCT/US2001/021112 US0121112W WO0207925A1 WO 2002007925 A1 WO2002007925 A1 WO 2002007925A1 US 0121112 W US0121112 W US 0121112W WO 0207925 A1 WO0207925 A1 WO 0207925A1
Authority
WO
WIPO (PCT)
Prior art keywords
particle
sample
transfer medium
energy
redepositing
Prior art date
Application number
PCT/US2001/021112
Other languages
English (en)
Inventor
Susan D. Allen
Original Assignee
Florida State University Research Foundation
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US09/909,992 external-priority patent/US6805751B2/en
Priority claimed from US09/909,993 external-priority patent/US20020029956A1/en
Application filed by Florida State University Research Foundation filed Critical Florida State University Research Foundation
Priority to AU2001282861A priority Critical patent/AU2001282861A1/en
Publication of WO2002007925A1 publication Critical patent/WO2002007925A1/fr

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02041—Cleaning
    • H01L21/02043—Cleaning before device manufacture, i.e. Begin-Of-Line process
    • H01L21/02046—Dry cleaning only
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B7/00—Cleaning by methods not provided for in a single other subclass or a single group in this subclass
    • B08B7/0035—Cleaning by methods not provided for in a single other subclass or a single group in this subclass by radiant energy, e.g. UV, laser, light beam or the like
    • B08B7/0042—Cleaning by methods not provided for in a single other subclass or a single group in this subclass by radiant energy, e.g. UV, laser, light beam or the like by laser
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/82—Auxiliary processes, e.g. cleaning or inspecting

Abstract

L'invention concerne un procédé et un dispositif permettant d'éliminer des particules (22) de très petite taille de la surface (21) d'un échantillon (20) et empêchant la redéposition des particules (22) sur cette surface (21). Par la combinaison de la thermophorèse avec l'élimination de particules par laser, ces procédés et ce dispositif permettent d'éliminer les particules de très petite taille (p. ex. de dimensions micrométriques ou nanométriques) et d'assurer qu'elles ne se redéposent pas.
PCT/US2001/021112 2000-07-24 2001-07-24 Procede et dispositif permettant d'eliminer des particules de tres petite taille d'une surface au moyen d'une thermophorese de maniere a empecher la redeposition des particules WO2002007925A1 (fr)

Priority Applications (1)

Application Number Priority Date Filing Date Title
AU2001282861A AU2001282861A1 (en) 2000-07-24 2001-07-24 Method and apparatus for removal of minute particles from a surface using thermophoresis to prevent particle redeposition

Applications Claiming Priority (6)

Application Number Priority Date Filing Date Title
US22041800P 2000-07-24 2000-07-24
US60/220,418 2000-07-24
US09/909,992 US6805751B2 (en) 2000-07-24 2001-07-23 Method and apparatus for removal of minute particles from a surface using thermophoresis to prevent particle redeposition
US09/909,993 2001-07-23
US09/909,992 2001-07-23
US09/909,993 US20020029956A1 (en) 2000-07-24 2001-07-23 Method and apparatus for removing minute particles from a surface

Publications (1)

Publication Number Publication Date
WO2002007925A1 true WO2002007925A1 (fr) 2002-01-31

Family

ID=27396791

Family Applications (2)

Application Number Title Priority Date Filing Date
PCT/US2001/021112 WO2002007925A1 (fr) 2000-07-24 2001-07-24 Procede et dispositif permettant d'eliminer des particules de tres petite taille d'une surface au moyen d'une thermophorese de maniere a empecher la redeposition des particules
PCT/US2001/021113 WO2002007926A1 (fr) 2000-07-24 2001-07-24 Procede et dispositif permettant l'elimination de particules minuscules sur une surface

Family Applications After (1)

Application Number Title Priority Date Filing Date
PCT/US2001/021113 WO2002007926A1 (fr) 2000-07-24 2001-07-24 Procede et dispositif permettant l'elimination de particules minuscules sur une surface

Country Status (2)

Country Link
AU (2) AU2001282862A1 (fr)
WO (2) WO2002007925A1 (fr)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2005116758A2 (fr) 2004-05-28 2005-12-08 Koninklijke Philips Electronics N.V. Nettoyage d'un substrat de masque
EP2586798A2 (fr) 2005-07-25 2013-05-01 Emergent Product Development Seattle, LLC Réduction des lymphocytes B au moyen de molécules de liaison spécifique de CD37 et CD20
CN110344017A (zh) * 2018-04-03 2019-10-18 程实平 用光学厚度监测系统管理涂层均匀性的方法

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1411388B1 (fr) * 2002-09-12 2006-12-20 ASML Netherlands B.V. Procédé pour nettoyer par enlèvement de particules présentes sur des surfaces, appareil de nettoyage et appareil de projection lithographique

Citations (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4752668A (en) * 1986-04-28 1988-06-21 Rosenfield Michael G System for laser removal of excess material from a semiconductor wafer
US4987286A (en) * 1989-10-30 1991-01-22 University Of Iowa Research Foundation Method and apparatus for removing minute particles from a surface
US5023424A (en) * 1990-01-22 1991-06-11 Tencor Instruments Shock wave particle removal method and apparatus
US5151135A (en) * 1989-09-15 1992-09-29 Amoco Corporation Method for cleaning surfaces using UV lasers
US5332879A (en) * 1992-12-02 1994-07-26 The Aerospace Corporation Method for removing trace metal contaminants from organic dielectrics
US5373806A (en) * 1985-05-20 1994-12-20 Applied Materials, Inc. Particulate-free epitaxial process
US5531857A (en) * 1988-07-08 1996-07-02 Cauldron Limited Partnership Removal of surface contaminants by irradiation from a high energy source
US5637245A (en) * 1995-04-13 1997-06-10 Vernay Laboratories, Inc. Method and apparatus for minimizing degradation of equipment in a laser cleaning technique
US5643472A (en) * 1988-07-08 1997-07-01 Cauldron Limited Partnership Selective removal of material by irradiation
US5800625A (en) * 1996-07-26 1998-09-01 Cauldron Limited Partnership Removal of material by radiation applied at an oblique angle
US5821175A (en) * 1988-07-08 1998-10-13 Cauldron Limited Partnership Removal of surface contaminants by irradiation using various methods to achieve desired inert gas flow over treated surface
US5950071A (en) * 1995-11-17 1999-09-07 Lightforce Technology, Inc. Detachment and removal of microscopic surface contaminants using a pulsed detach light
US5958268A (en) * 1995-06-07 1999-09-28 Cauldron Limited Partnership Removal of material by polarized radiation
US6048588A (en) * 1988-07-08 2000-04-11 Cauldron Limited Partnership Method for enhancing chemisorption of material
US6056827A (en) * 1996-02-15 2000-05-02 Japan Nuclear Cycle Development Institute Laser decontamination method
US6127649A (en) * 1997-12-30 2000-10-03 Lsp Technologies, Inc. Process chamber for laser peening

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
AU589353B2 (en) * 1984-02-17 1989-10-12 Robert Langen Procedure for removal of impurities, in particular rust, from the surface of a metal
KR0141659B1 (ko) * 1993-07-19 1998-07-15 가나이 쓰토무 이물제거 방법 및 장치
US5516369A (en) * 1994-05-06 1996-05-14 United Microelectronics Corporation Method and apparatus for particle reduction from semiconductor wafers

Patent Citations (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5373806A (en) * 1985-05-20 1994-12-20 Applied Materials, Inc. Particulate-free epitaxial process
US4752668A (en) * 1986-04-28 1988-06-21 Rosenfield Michael G System for laser removal of excess material from a semiconductor wafer
US5821175A (en) * 1988-07-08 1998-10-13 Cauldron Limited Partnership Removal of surface contaminants by irradiation using various methods to achieve desired inert gas flow over treated surface
US5531857A (en) * 1988-07-08 1996-07-02 Cauldron Limited Partnership Removal of surface contaminants by irradiation from a high energy source
US6048588A (en) * 1988-07-08 2000-04-11 Cauldron Limited Partnership Method for enhancing chemisorption of material
US5643472A (en) * 1988-07-08 1997-07-01 Cauldron Limited Partnership Selective removal of material by irradiation
US5151135A (en) * 1989-09-15 1992-09-29 Amoco Corporation Method for cleaning surfaces using UV lasers
US4987286A (en) * 1989-10-30 1991-01-22 University Of Iowa Research Foundation Method and apparatus for removing minute particles from a surface
US5023424A (en) * 1990-01-22 1991-06-11 Tencor Instruments Shock wave particle removal method and apparatus
US5332879A (en) * 1992-12-02 1994-07-26 The Aerospace Corporation Method for removing trace metal contaminants from organic dielectrics
US5637245A (en) * 1995-04-13 1997-06-10 Vernay Laboratories, Inc. Method and apparatus for minimizing degradation of equipment in a laser cleaning technique
US5958268A (en) * 1995-06-07 1999-09-28 Cauldron Limited Partnership Removal of material by polarized radiation
US5950071A (en) * 1995-11-17 1999-09-07 Lightforce Technology, Inc. Detachment and removal of microscopic surface contaminants using a pulsed detach light
US6056827A (en) * 1996-02-15 2000-05-02 Japan Nuclear Cycle Development Institute Laser decontamination method
US5800625A (en) * 1996-07-26 1998-09-01 Cauldron Limited Partnership Removal of material by radiation applied at an oblique angle
US6127649A (en) * 1997-12-30 2000-10-03 Lsp Technologies, Inc. Process chamber for laser peening

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2005116758A2 (fr) 2004-05-28 2005-12-08 Koninklijke Philips Electronics N.V. Nettoyage d'un substrat de masque
WO2005116758A3 (fr) * 2004-05-28 2006-10-19 Koninkl Philips Electronics Nv Nettoyage d'un substrat de masque
JP2008501232A (ja) * 2004-05-28 2008-01-17 コーニンクレッカ フィリップス エレクトロニクス エヌ ヴィ マスク基板のクリーニング
EP2586798A2 (fr) 2005-07-25 2013-05-01 Emergent Product Development Seattle, LLC Réduction des lymphocytes B au moyen de molécules de liaison spécifique de CD37 et CD20
CN110344017A (zh) * 2018-04-03 2019-10-18 程实平 用光学厚度监测系统管理涂层均匀性的方法

Also Published As

Publication number Publication date
WO2002007926A1 (fr) 2002-01-31
WO2002007926A8 (fr) 2002-06-20
AU2001282862A1 (en) 2002-02-05
AU2001282861A1 (en) 2002-02-05

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