AU2001282862A1 - Method and apparatus for removing minute particles from a surface - Google Patents

Method and apparatus for removing minute particles from a surface

Info

Publication number
AU2001282862A1
AU2001282862A1 AU2001282862A AU8286201A AU2001282862A1 AU 2001282862 A1 AU2001282862 A1 AU 2001282862A1 AU 2001282862 A AU2001282862 A AU 2001282862A AU 8286201 A AU8286201 A AU 8286201A AU 2001282862 A1 AU2001282862 A1 AU 2001282862A1
Authority
AU
Australia
Prior art keywords
minute particles
removing minute
particles
minute
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2001282862A
Inventor
Susan D. Allen
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Florida State University Research Foundation Inc
Original Assignee
Florida State University Research Foundation Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US09/909,993 external-priority patent/US20020029956A1/en
Priority claimed from US09/909,992 external-priority patent/US6805751B2/en
Application filed by Florida State University Research Foundation Inc filed Critical Florida State University Research Foundation Inc
Publication of AU2001282862A1 publication Critical patent/AU2001282862A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02041—Cleaning
    • H01L21/02043—Cleaning before device manufacture, i.e. Begin-Of-Line process
    • H01L21/02046—Dry cleaning only
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B7/00—Cleaning by methods not provided for in a single other subclass or a single group in this subclass
    • B08B7/0035—Cleaning by methods not provided for in a single other subclass or a single group in this subclass by radiant energy, e.g. UV, laser, light beam or the like
    • B08B7/0042—Cleaning by methods not provided for in a single other subclass or a single group in this subclass by radiant energy, e.g. UV, laser, light beam or the like by laser
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/82—Auxiliary processes, e.g. cleaning or inspecting
AU2001282862A 2000-07-24 2001-07-24 Method and apparatus for removing minute particles from a surface Abandoned AU2001282862A1 (en)

Applications Claiming Priority (6)

Application Number Priority Date Filing Date Title
US22041800P 2000-07-24 2000-07-24
US60220418 2000-07-24
US09/909,993 US20020029956A1 (en) 2000-07-24 2001-07-23 Method and apparatus for removing minute particles from a surface
US09/909,992 US6805751B2 (en) 2000-07-24 2001-07-23 Method and apparatus for removal of minute particles from a surface using thermophoresis to prevent particle redeposition
PCT/US2001/021113 WO2002007926A1 (en) 2000-07-24 2001-07-24 Method and apparatus for removing minute particles from a surface
USNOTGIVEN 2001-08-30

Publications (1)

Publication Number Publication Date
AU2001282862A1 true AU2001282862A1 (en) 2002-02-05

Family

ID=27396791

Family Applications (2)

Application Number Title Priority Date Filing Date
AU2001282862A Abandoned AU2001282862A1 (en) 2000-07-24 2001-07-24 Method and apparatus for removing minute particles from a surface
AU2001282861A Abandoned AU2001282861A1 (en) 2000-07-24 2001-07-24 Method and apparatus for removal of minute particles from a surface using thermophoresis to prevent particle redeposition

Family Applications After (1)

Application Number Title Priority Date Filing Date
AU2001282861A Abandoned AU2001282861A1 (en) 2000-07-24 2001-07-24 Method and apparatus for removal of minute particles from a surface using thermophoresis to prevent particle redeposition

Country Status (2)

Country Link
AU (2) AU2001282862A1 (en)
WO (2) WO2002007926A1 (en)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1411388B1 (en) * 2002-09-12 2006-12-20 ASML Netherlands B.V. A method of cleaning by removing particles from surfaces, a cleaning apparatus and a lithographic projection apparatus
CN1961258A (en) 2004-05-28 2007-05-09 皇家飞利浦电子股份有限公司 Cleaning a mask substrate
CN105012953B (en) 2005-07-25 2018-06-22 阿普泰沃研发有限责任公司 B- cells are reduced with CD37- specificity and CD20- specific binding molecules
US10138539B1 (en) * 2018-04-03 2018-11-27 Shiping Cheng Method of managing coating uniformity with an optical thickness monitoring system

Family Cites Families (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CA1265209A (en) * 1984-02-17 1990-01-30 Robert Langen Process to remove contaminants, particularly rust/from metallic surfaces
US5373806A (en) * 1985-05-20 1994-12-20 Applied Materials, Inc. Particulate-free epitaxial process
US4752668A (en) * 1986-04-28 1988-06-21 Rosenfield Michael G System for laser removal of excess material from a semiconductor wafer
US5643472A (en) * 1988-07-08 1997-07-01 Cauldron Limited Partnership Selective removal of material by irradiation
US6048588A (en) * 1988-07-08 2000-04-11 Cauldron Limited Partnership Method for enhancing chemisorption of material
US5531857A (en) * 1988-07-08 1996-07-02 Cauldron Limited Partnership Removal of surface contaminants by irradiation from a high energy source
US5821175A (en) * 1988-07-08 1998-10-13 Cauldron Limited Partnership Removal of surface contaminants by irradiation using various methods to achieve desired inert gas flow over treated surface
US5151135A (en) * 1989-09-15 1992-09-29 Amoco Corporation Method for cleaning surfaces using UV lasers
US4987286A (en) * 1989-10-30 1991-01-22 University Of Iowa Research Foundation Method and apparatus for removing minute particles from a surface
US5023424A (en) * 1990-01-22 1991-06-11 Tencor Instruments Shock wave particle removal method and apparatus
US5332879A (en) * 1992-12-02 1994-07-26 The Aerospace Corporation Method for removing trace metal contaminants from organic dielectrics
KR0141659B1 (en) * 1993-07-19 1998-07-15 가나이 쓰토무 An apparatus for removing foreign particles and the method
US5516369A (en) * 1994-05-06 1996-05-14 United Microelectronics Corporation Method and apparatus for particle reduction from semiconductor wafers
US5637245A (en) * 1995-04-13 1997-06-10 Vernay Laboratories, Inc. Method and apparatus for minimizing degradation of equipment in a laser cleaning technique
TW284907B (en) * 1995-06-07 1996-09-01 Cauldron Lp Removal of material by polarized irradiation and back side application for radiation
US5950071A (en) * 1995-11-17 1999-09-07 Lightforce Technology, Inc. Detachment and removal of microscopic surface contaminants using a pulsed detach light
JP3044188B2 (en) * 1996-02-15 2000-05-22 核燃料サイクル開発機構 Laser decontamination method
US5800625A (en) * 1996-07-26 1998-09-01 Cauldron Limited Partnership Removal of material by radiation applied at an oblique angle
US6064035A (en) * 1997-12-30 2000-05-16 Lsp Technologies, Inc. Process chamber for laser peening

Also Published As

Publication number Publication date
AU2001282861A1 (en) 2002-02-05
WO2002007926A8 (en) 2002-06-20
WO2002007926A1 (en) 2002-01-31
WO2002007925A1 (en) 2002-01-31

Similar Documents

Publication Publication Date Title
AU2001278325A1 (en) Method and apparatus for formation damage removal
AU2002226002A1 (en) Apparatus and method for detecting and removing undesirable material from workpieces
AU2001229729A1 (en) Device and method for selectively removing a thrombus filter
AU2001270205A1 (en) Method and apparatus for wafer cleaning
AU2001277061A1 (en) Method and apparatus for fine feature spray deposition
AU2003202895A1 (en) Apparatus and method for stone removal from a body
EP1128415B8 (en) Sheet removing apparatus and method
GB0211641D0 (en) Apparatus and method for cleaning a surface
AU2002230053A1 (en) A method and apparatus for processing a token
AU2002211838A1 (en) Apparatus for switchng and manipulating particles and method of use thereof
AU1396300A (en) Method and apparatus for removing particulates
AU2001289093A1 (en) Method and apparatus for counting submicron sized particles
AU2001227007A1 (en) A processing method and apparatus
AU2003251606A1 (en) Method and apparatus for removing minute particle(s) from a surface
AU4567500A (en) Apparatus and process for removing solid particles from gases
AU7969300A (en) Method and apparatus for removing solid particles from a gas
AU5157100A (en) Process for removing contaminant from a surface and composition useful therefor
AU2001282862A1 (en) Method and apparatus for removing minute particles from a surface
AU2001292994A1 (en) A method and apparatus for controlled polishing
EP0747788A3 (en) Cleaning apparatus and method for removing particles from a surface
AU2002222137A1 (en) Method and apparatus for processing waste
AU2001287546A1 (en) A method and an apparatus for separating waste
GB2382022B (en) A method and apparatus for removing gum
AU2001237032A1 (en) Apparatus and process for selecting and positioning particles
AU2001266556A1 (en) Methods and apparatus for particulate removal from fabrics