WO2001094036A1 - Cleaning sheet, conveying member using the same, and substrate processing equipment cleaning method using them - Google Patents
Cleaning sheet, conveying member using the same, and substrate processing equipment cleaning method using them Download PDFInfo
- Publication number
- WO2001094036A1 WO2001094036A1 PCT/JP2001/003848 JP0103848W WO0194036A1 WO 2001094036 A1 WO2001094036 A1 WO 2001094036A1 JP 0103848 W JP0103848 W JP 0103848W WO 0194036 A1 WO0194036 A1 WO 0194036A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- cleaning
- layer
- cleaning sheet
- cleaning layer
- sheet
- Prior art date
Links
- 238000004140 cleaning Methods 0.000 title claims abstract description 395
- 239000000758 substrate Substances 0.000 title claims abstract description 56
- 238000000034 method Methods 0.000 title claims description 25
- 239000010410 layer Substances 0.000 claims description 166
- 239000000853 adhesive Substances 0.000 claims description 52
- 230000001070 adhesive effect Effects 0.000 claims description 52
- 239000012790 adhesive layer Substances 0.000 claims description 52
- 238000005520 cutting process Methods 0.000 claims description 41
- 239000000463 material Substances 0.000 claims description 41
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 30
- 229910052710 silicon Inorganic materials 0.000 claims description 30
- 239000010703 silicon Substances 0.000 claims description 30
- 238000007689 inspection Methods 0.000 claims description 29
- 150000001875 compounds Chemical class 0.000 claims description 20
- 238000006116 polymerization reaction Methods 0.000 claims description 16
- 238000004519 manufacturing process Methods 0.000 claims description 15
- 238000006243 chemical reaction Methods 0.000 claims description 10
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 9
- 239000004820 Pressure-sensitive adhesive Substances 0.000 claims description 8
- 238000002360 preparation method Methods 0.000 claims description 6
- 229920003023 plastic Polymers 0.000 claims description 5
- 239000004033 plastic Substances 0.000 claims description 5
- 238000010030 laminating Methods 0.000 claims description 4
- 229920000642 polymer Polymers 0.000 claims description 4
- 239000003505 polymerization initiator Substances 0.000 claims description 4
- 235000012431 wafers Nutrition 0.000 description 129
- -1 polyethylene Polymers 0.000 description 29
- BAPJBEWLBFYGME-UHFFFAOYSA-N Methyl acrylate Chemical compound COC(=O)C=C BAPJBEWLBFYGME-UHFFFAOYSA-N 0.000 description 22
- 239000000203 mixture Substances 0.000 description 22
- 238000005259 measurement Methods 0.000 description 16
- 229920000058 polyacrylate Polymers 0.000 description 15
- 229920000728 polyester Polymers 0.000 description 14
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 12
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 12
- 239000000178 monomer Substances 0.000 description 12
- GOXQRTZXKQZDDN-UHFFFAOYSA-N 2-Ethylhexyl acrylate Chemical compound CCCCC(CC)COC(=O)C=C GOXQRTZXKQZDDN-UHFFFAOYSA-N 0.000 description 11
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 9
- 238000012360 testing method Methods 0.000 description 9
- 239000003999 initiator Substances 0.000 description 8
- 239000004814 polyurethane Substances 0.000 description 8
- 229920002635 polyurethane Polymers 0.000 description 8
- 230000000052 comparative effect Effects 0.000 description 7
- UHESRSKEBRADOO-UHFFFAOYSA-N ethyl carbamate;prop-2-enoic acid Chemical compound OC(=O)C=C.CCOC(N)=O UHESRSKEBRADOO-UHFFFAOYSA-N 0.000 description 7
- 229920001228 polyisocyanate Polymers 0.000 description 7
- 239000005056 polyisocyanate Substances 0.000 description 7
- 239000004065 semiconductor Substances 0.000 description 7
- KWVGIHKZDCUPEU-UHFFFAOYSA-N 2,2-dimethoxy-2-phenylacetophenone Chemical compound C=1C=CC=CC=1C(OC)(OC)C(=O)C1=CC=CC=C1 KWVGIHKZDCUPEU-UHFFFAOYSA-N 0.000 description 6
- 230000000694 effects Effects 0.000 description 6
- 229920006267 polyester film Polymers 0.000 description 6
- 239000000126 substance Substances 0.000 description 6
- 239000002202 Polyethylene glycol Substances 0.000 description 5
- 229920001223 polyethylene glycol Polymers 0.000 description 5
- 229940113115 polyethylene glycol 200 Drugs 0.000 description 5
- 229920000139 polyethylene terephthalate Polymers 0.000 description 5
- 239000005020 polyethylene terephthalate Substances 0.000 description 5
- 239000004952 Polyamide Substances 0.000 description 4
- 239000004698 Polyethylene Substances 0.000 description 4
- 239000004743 Polypropylene Substances 0.000 description 4
- SMEGJBVQLJJKKX-HOTMZDKISA-N [(2R,3S,4S,5R,6R)-5-acetyloxy-3,4,6-trihydroxyoxan-2-yl]methyl acetate Chemical compound CC(=O)OC[C@@H]1[C@H]([C@@H]([C@H]([C@@H](O1)O)OC(=O)C)O)O SMEGJBVQLJJKKX-HOTMZDKISA-N 0.000 description 4
- 229940081735 acetylcellulose Drugs 0.000 description 4
- 229920002301 cellulose acetate Polymers 0.000 description 4
- 229920002647 polyamide Polymers 0.000 description 4
- 229920000515 polycarbonate Polymers 0.000 description 4
- 239000004417 polycarbonate Substances 0.000 description 4
- 229920000573 polyethylene Polymers 0.000 description 4
- 229920001155 polypropylene Polymers 0.000 description 4
- UPMLOUAZCHDJJD-UHFFFAOYSA-N 4,4'-Diphenylmethane Diisocyanate Chemical compound C1=CC(N=C=O)=CC=C1CC1=CC=C(N=C=O)C=C1 UPMLOUAZCHDJJD-UHFFFAOYSA-N 0.000 description 3
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 3
- 239000004642 Polyimide Substances 0.000 description 3
- 238000004132 cross linking Methods 0.000 description 3
- 229920001971 elastomer Polymers 0.000 description 3
- STVZJERGLQHEKB-UHFFFAOYSA-N ethylene glycol dimethacrylate Chemical compound CC(=C)C(=O)OCCOC(=O)C(C)=C STVZJERGLQHEKB-UHFFFAOYSA-N 0.000 description 3
- 229920001721 polyimide Polymers 0.000 description 3
- 239000007787 solid Substances 0.000 description 3
- 238000003756 stirring Methods 0.000 description 3
- OZAIFHULBGXAKX-UHFFFAOYSA-N 2-(2-cyanopropan-2-yldiazenyl)-2-methylpropanenitrile Chemical compound N#CC(C)(C)N=NC(C)(C)C#N OZAIFHULBGXAKX-UHFFFAOYSA-N 0.000 description 2
- VVBLNCFGVYUYGU-UHFFFAOYSA-N 4,4'-Bis(dimethylamino)benzophenone Chemical compound C1=CC(N(C)C)=CC=C1C(=O)C1=CC=C(N(C)C)C=C1 VVBLNCFGVYUYGU-UHFFFAOYSA-N 0.000 description 2
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 2
- 229910000831 Steel Inorganic materials 0.000 description 2
- 239000006061 abrasive grain Substances 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 2
- 125000004386 diacrylate group Chemical group 0.000 description 2
- 239000006185 dispersion Substances 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 229940057847 polyethylene glycol 600 Drugs 0.000 description 2
- 229920001296 polysiloxane Polymers 0.000 description 2
- 239000011347 resin Substances 0.000 description 2
- 229920005989 resin Polymers 0.000 description 2
- 229910000679 solder Inorganic materials 0.000 description 2
- 229910001220 stainless steel Inorganic materials 0.000 description 2
- 239000010935 stainless steel Substances 0.000 description 2
- 239000010959 steel Substances 0.000 description 2
- QNODIIQQMGDSEF-UHFFFAOYSA-N (1-hydroxycyclohexyl)-phenylmethanone Chemical compound C=1C=CC=CC=1C(=O)C1(O)CCCCC1 QNODIIQQMGDSEF-UHFFFAOYSA-N 0.000 description 1
- BWZAUXRKSMJLMH-UHFFFAOYSA-N 1,1-diethoxyethylbenzene Chemical compound CCOC(C)(OCC)C1=CC=CC=C1 BWZAUXRKSMJLMH-UHFFFAOYSA-N 0.000 description 1
- UYEDESPZQLZMCL-UHFFFAOYSA-N 1,2-dimethylthioxanthen-9-one Chemical compound C1=CC=C2C(=O)C3=C(C)C(C)=CC=C3SC2=C1 UYEDESPZQLZMCL-UHFFFAOYSA-N 0.000 description 1
- YNSNJGRCQCDRDM-UHFFFAOYSA-N 1-chlorothioxanthen-9-one Chemical compound S1C2=CC=CC=C2C(=O)C2=C1C=CC=C2Cl YNSNJGRCQCDRDM-UHFFFAOYSA-N 0.000 description 1
- CTOHEPRICOKHIV-UHFFFAOYSA-N 1-dodecylthioxanthen-9-one Chemical compound S1C2=CC=CC=C2C(=O)C2=C1C=CC=C2CCCCCCCCCCCC CTOHEPRICOKHIV-UHFFFAOYSA-N 0.000 description 1
- BGRKGHSKCFAPCL-UHFFFAOYSA-N 2-(2-methylbutan-2-yl)phenol Chemical compound CCC(C)(C)C1=CC=CC=C1O BGRKGHSKCFAPCL-UHFFFAOYSA-N 0.000 description 1
- TXBCBTDQIULDIA-UHFFFAOYSA-N 2-[[3-hydroxy-2,2-bis(hydroxymethyl)propoxy]methyl]-2-(hydroxymethyl)propane-1,3-diol Chemical compound OCC(CO)(CO)COCC(CO)(CO)CO TXBCBTDQIULDIA-UHFFFAOYSA-N 0.000 description 1
- KMNCBSZOIQAUFX-UHFFFAOYSA-N 2-ethoxy-1,2-diphenylethanone Chemical compound C=1C=CC=CC=1C(OCC)C(=O)C1=CC=CC=C1 KMNCBSZOIQAUFX-UHFFFAOYSA-N 0.000 description 1
- NACPTFCBIGBTSJ-UHFFFAOYSA-N 2-hydroxy-2-phenyl-1-(2-propan-2-ylphenyl)ethanone Chemical compound CC(C)C1=CC=CC=C1C(=O)C(O)C1=CC=CC=C1 NACPTFCBIGBTSJ-UHFFFAOYSA-N 0.000 description 1
- 239000004342 Benzoyl peroxide Substances 0.000 description 1
- OMPJBNCRMGITSC-UHFFFAOYSA-N Benzoylperoxide Chemical compound C=1C=CC=CC=1C(=O)OOC(=O)C1=CC=CC=C1 OMPJBNCRMGITSC-UHFFFAOYSA-N 0.000 description 1
- 239000004593 Epoxy Substances 0.000 description 1
- JOYRKODLDBILNP-UHFFFAOYSA-N Ethyl urethane Chemical compound CCOC(N)=O JOYRKODLDBILNP-UHFFFAOYSA-N 0.000 description 1
- ZJCCRDAZUWHFQH-UHFFFAOYSA-N Trimethylolpropane Chemical compound CCC(CO)(CO)CO ZJCCRDAZUWHFQH-UHFFFAOYSA-N 0.000 description 1
- WGLPBDUCMAPZCE-UHFFFAOYSA-N Trioxochromium Chemical compound O=[Cr](=O)=O WGLPBDUCMAPZCE-UHFFFAOYSA-N 0.000 description 1
- MPIAGWXWVAHQBB-UHFFFAOYSA-N [3-prop-2-enoyloxy-2-[[3-prop-2-enoyloxy-2,2-bis(prop-2-enoyloxymethyl)propoxy]methyl]-2-(prop-2-enoyloxymethyl)propyl] prop-2-enoate Chemical compound C=CC(=O)OCC(COC(=O)C=C)(COC(=O)C=C)COCC(COC(=O)C=C)(COC(=O)C=C)COC(=O)C=C MPIAGWXWVAHQBB-UHFFFAOYSA-N 0.000 description 1
- 230000001133 acceleration Effects 0.000 description 1
- 125000005396 acrylic acid ester group Chemical group 0.000 description 1
- 239000003522 acrylic cement Substances 0.000 description 1
- RWCCWEUUXYIKHB-UHFFFAOYSA-N benzophenone Chemical compound C=1C=CC=CC=1C(=O)C1=CC=CC=C1 RWCCWEUUXYIKHB-UHFFFAOYSA-N 0.000 description 1
- 239000012965 benzophenone Substances 0.000 description 1
- 125000003236 benzoyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C(*)=O 0.000 description 1
- 235000019400 benzoyl peroxide Nutrition 0.000 description 1
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 229910000423 chromium oxide Inorganic materials 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 230000002542 deteriorative effect Effects 0.000 description 1
- 229910003460 diamond Inorganic materials 0.000 description 1
- 239000010432 diamond Substances 0.000 description 1
- NZZFYRREKKOMAT-UHFFFAOYSA-N diiodomethane Chemical compound ICI NZZFYRREKKOMAT-UHFFFAOYSA-N 0.000 description 1
- 125000000118 dimethyl group Chemical group [H]C([H])([H])* 0.000 description 1
- 125000000524 functional group Chemical group 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- LGYTZKPVOAIUKX-UHFFFAOYSA-N kebuzone Chemical compound O=C1C(CCC(=O)C)C(=O)N(C=2C=CC=CC=2)N1C1=CC=CC=C1 LGYTZKPVOAIUKX-UHFFFAOYSA-N 0.000 description 1
- 229960000194 kebuzone Drugs 0.000 description 1
- 125000005397 methacrylic acid ester group Chemical group 0.000 description 1
- 239000004745 nonwoven fabric Substances 0.000 description 1
- 229920002601 oligoester Polymers 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 125000000951 phenoxy group Chemical group [H]C1=C([H])C([H])=C(O*)C([H])=C1[H] 0.000 description 1
- 229920001451 polypropylene glycol Polymers 0.000 description 1
- 239000000523 sample Substances 0.000 description 1
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 1
- 229910010271 silicon carbide Inorganic materials 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 238000003786 synthesis reaction Methods 0.000 description 1
- 238000009864 tensile test Methods 0.000 description 1
- PAPBSGBWRJIAAV-UHFFFAOYSA-N ε-Caprolactone Chemical compound O=C1CCCCCO1 PAPBSGBWRJIAAV-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B1/00—Cleaning by methods involving the use of tools
- B08B1/10—Cleaning by methods involving the use of tools characterised by the type of cleaning tool
- B08B1/14—Wipes; Absorbent members, e.g. swabs or sponges
- B08B1/143—Wipes
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B1/00—Cleaning by methods involving the use of tools
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B7/00—Cleaning by methods not provided for in a single other subclass or a single group in this subclass
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B7/00—Cleaning by methods not provided for in a single other subclass or a single group in this subclass
- B08B7/0028—Cleaning by methods not provided for in a single other subclass or a single group in this subclass by adhesive surfaces
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T156/00—Adhesive bonding and miscellaneous chemical manufacture
- Y10T156/10—Methods of surface bonding and/or assembly therefor
- Y10T156/1052—Methods of surface bonding and/or assembly therefor with cutting, punching, tearing or severing
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
- Y10T428/24802—Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.]
- Y10T428/2481—Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.] including layer of mechanically interengaged strands, strand-portions or strand-like strips
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
- Y10T428/24802—Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.]
- Y10T428/2481—Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.] including layer of mechanically interengaged strands, strand-portions or strand-like strips
- Y10T428/24818—Knitted, with particular or differential bond sites or intersections
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/249921—Web or sheet containing structurally defined element or component
- Y10T428/249953—Composite having voids in a component [e.g., porous, cellular, etc.]
- Y10T428/249982—With component specified as adhesive or bonding agent
Definitions
- the present invention relates to a sheet for cleaning various equipments. More particularly, the present invention relates to a cleaning sheet for a substrate processing equipment which is apt to be easily damaged by foreign matters such as equipment for producing or inspecting semiconductor, flat panel display, printed circuit board, etc., a conveying member comprising same, and a method for cleaning a substrate processing equipment using same.
- Various substrateprocessingequipments are adapted to convey various conveying systems and substrates while allowing them to come in physical contact with each other. During this operation, when foreign matters are adhered to these substrates and conveying systems, the subsequent substrates can be successively contaminated. This, it is necessarythat the equipmentbe regularly suspended for cleaning purpose. This causes the drop of operating efficiency or requires much labor to disadvantage.
- a method has been proposed which comprises conveying a substrate having an adhesive material attached thereto to clean foreign matters away from the interior of the substrate processing equipment (as inUnexamined Japanese Patent Publication 10-154686) .
- the method which comprises conveying a substrate having an adhesive material attached thereto to clean foreign matters away from the interior of the substrate processing equipment is an effective method for overcoming the foregoing difficulties.
- this method is disadvantageous in that the adhesive material and the contact area of the equipment adhere to each other too strongly to peeled off each other, making it impossible to assure the complete conveyance of the substrate.
- an object of the invention is to provide a cleaning sheet which can certainly convey substrates to the interior of a substrate processing equipment as well as remove foreign matters attached to the interior of the equipment easily and certainly.
- the inventors made extensive studies to accomplish the foregoing object. As a result, it was found that foreign matters can be simply and certainly removed without causing the foregoing problems by conveying a sheet having a cleaning layer or a substrate having such a sheet fixed thereto to clean foreign matters away from the interior of a substrate processing equipment wherein the cleaning layer has substantially no tackiness and a tensile modulus of not lower than a specific value or has surface free energy of less than a specific value or Vickers hardness of not lower than a specific value.
- the present invention provides a cleaning sheet comprising a cleaning layer having substantiallyno tackiness andhaving atensilemodulus ofnot lower than 0.98N/mm 2 as determined according to JIS K7127.
- the cleaning layer may be provided on a base material, or may be provided on one side of the base material and an ordinary adhesive layer may be provided on the other.
- the cleaning layer preferably has substantially no tackiness and substantially no electrical conductivity.
- the cleaning layer preferably exhibits a surface free energy of less than 30 mJ/m 2 .
- the present invention also provides a cleaning sheet comprising a cleaning layer having a Vickers hardness of not lower than 10.
- the cleaning layer may be provided on a base material, or may be provided on one side of a base material and an ordinary adhesive layer may be provided on the other.
- the aforementioned cleansing sheets may be further modified from other aspects.
- the cleaning layer (hereinafter, including forms such as single cleaning sheet, laminated sheet and sheet laminated with base material) needs to have substantially no tackiness and have a tensile modulus of not lower than 0.98 N/mm 2 , preferably from 0.98 to 4,900 N/mm 2 , more preferably from 9.8 to 3,000 N/mm 2 as determined according to JIS K7127.
- the tensile modulus of the cleaning layer is designed to fall within the above defined specific range, making itpossible to remove foreignmatters without causing any troubles in conveyance.
- the cleaning layer falls below 0.98 N/mm 2 , the cleaning layerbecomes adhesive and thus can adhere to the interior area of the equipment to be cleaned during conveyance, causing troubles in conveyance.
- the cleaning layer exhibits a 180°peel adhesion ofnot greater than 0.20 N/10 mm, preferably from 0.01 to 0.1 N/10 mm with respect to silicon wafer (mirror surface) .
- the peel adhesion of the cleaning layer exceeds 0.20 N/10 mm, the cleaning layer adheres to the interior area of the equipment to be cleaned, causing troubles in conveyance.
- the cleaning layer in the cleaning sheet of the invention bemade of a layer having substantiallyno tackiness and substantially no electrical conductivity.
- the cleaning sheet can be designed such that the cleaning layer has substantially no tackiness and substantially no electrical conductivity, making it possible to remove foreign matters by an electrostatic attraction without causing any trouble in conveyance.
- the cleaning layer preferably exhibits a surface resistivity of not lower than 1 x 10 13 ⁇ /D, more preferably not lower than 1 x 10 14 ⁇ /D.
- the cleaning layer is not specificallylimited in its material and structure so far as it has substantially no tackiness and substantially no electrical conductivity.
- a material include a film of plastic such as polyethylene, polyethylene terephthalate, acetyl cellulose, polycarbonate, polypropylene, polyamide, polyimide and polycarbodimide, and a material having substantially no tackiness obtained by hardening a hardenable adhesive.
- the cleaning layer in the cleaning sheet of the invention preferably exhibits a surface free energy of less than 30 mJ/m 2 , preferably from 25 to 15 mJ/m 2 .
- surface free energy of cleaning layer (solid) as used herein is meant to indicate a value determined by solving as a simultaneous linear equation two equations obtained by substituting measurements of contact angle of the surface, of the cleaning layer with respect to water and methylene iodide and the surface free energy of these liquids used in the measurement of contact angle (known from literatures) in Young's equation and the following equation (1) derived from extended Fowkes' equation.
- the cleaning sheet is preferably designed such that the surface of the cleaning layer exhibits a contact angle of more than 90 degrees, more preferably more than 100 degrees with respect to water.
- the cleaning layer by designing the cleaning layer such that it exhibits a surface free energy and a contact angle with respect to water falling within the range defined above, an effect of conveying the cleaning sheet certainly without causing the cleaning layer to adhere firmly to the position to be cleaned during conveyance can be exerted.
- the cleaning layer in the second cleaning sheet of the invention needs to have a Vickers hardness of not lower than 10, preferably from 20 to 500.
- the term "Vickers hardness” as used herein is meant to indicate a value obtained by dividing a predetermined load applied to a diamond indenter according to JIS Z2244 by the surface area of the resulting dent.
- the cleaning sheet by designing the cleaning sheet such that the Vickers hardness of the cleaning layer is not lower than the predetermined value, an effect of conveying the cleaning sheet without causing the cleaning layer to come in close contact with the position to be cleaned during conveyance can be exerted.
- the cleaning layer in the second cleaning sheet of the invention preferably exhibits a surface free energy of less than 30 mJ/m 2 , more preferably from 15 to 25 mJ/m 2 .
- the cleaning layer exhibits a surface contact angle of greater than 90 degrees, preferably greater than 100 degrees with respect to water.
- the cleaning layer by designing the cleaning layer such that it exhibits a surface free energy and a contact angle with respect to water falling within the range defined above, an effect of conveying the cleaning sheet certainly without causing the cleaning layer to adhere firmly to the position to be cleaned during conveyance can be exerted.
- the foregoing cleaning layer is not specifically limited in its material, etc. so far as it has a tensile modulus or Vickers hardness of not lower than the above defined value and has substantially no tackiness. In practice, however, there may be preferably used a material which can undergo accelerated crosslinking reaction or curing by an active energy such as ultraviolet light and heat to exhibit an enhanced tensile modulus .
- the foregoing cleaning layer is preferably made of amaterial obtained by subjecting a pressure-sensitive adhesive polymer containing at least a compoundhaving one ormore unsaturated double bonds permolecule and a polymerization initiator to polymerization curing reaction with an active energy so that the tackiness thereof substantially disappears.
- a such a pressure-sensitive adhesive polymer there may be used an acrylic polymer comprising as a main monomer a (meth) acrylic acid and/or (meth) acrylic acid ester selected from the group consisting of acrylic acid, acrylic acid ester, methacrylic acid and methacrylic acid ester.
- an acrylic polymer comprising as a main monomer a (meth) acrylic acid and/or (meth) acrylic acid ester selected from the group consisting of acrylic acid, acrylic acid ester, methacrylic acid and methacrylic acid ester.
- the synthesis of the acrylic polymer can be accomplished by using a compound having two or more unsaturated double bonds per molecule or chemically bonding a compound having unsaturated double bonds per molecule to the acrylic polymer thus synthesized through the reaction of functional groups so that unsaturated double bonds are introduced into the molecule of acrylic polymer, the resulting polymer itself can participate in the polymerization curing reaction by an active energy.
- the compound having one or more unsaturated double bonds per molecule preferably is nonvolatile low molecular compound having a weight-average molecular weight of not higher than 10,000.
- the polymerizable unsaturated compound preferably has a molecular weight of not higher than 5,000 so that the adhesive layer can be three-dimensionally networked more efficiently during curing.
- the polymerizable unsaturated compound also preferably is a nonvolatile low molecular compound having a weight-average molecular weight of not higher than 10,000.
- the polymerizable unsaturated compound preferably has a molecular weight of not higher than 5, 000 so that the cleaning layer can be three-dimensionally networked more efficiently during curing.
- Examples of such a polymerizable compound include phenoxy polyethylene glycol (meth) acrylate, ⁇ -caprolactone (meth) acrylate, polyethylene glycol di (meth) acrylate, polypropylene glycol di (meth) acrylate, trimethylolpropane tri (meth) acrylate, dipentaerythritol hexa (meth) acrylate, urethane (meth) acrylate, epoxy (meth) acrylate, and oligoester (meth) acrylate . These polymerizable compounds may be used singly or in combination of two or more thereof.
- the polymerization initiator to be incorporated in the cleaning layer there may be used any known material without any restriction. If heat is used as an active energy, a heat polymerization initiator such as benzoyl peroxide and azobisisobutyronitrile may be used.
- a photopoly erization initiator such as benzoyl, benzoin ethyl ether, dibenzyl, isopropylbenzoin ether, benzophenone, Michler's ketone chlorothioxanthone, dodecyl thioxanthone, dimethyl thioxanthone, acetophenone diethyl ketal, benzyl dimethyl ketal, ⁇ -hydroxy cyclohexyl phenyl ketone, 2-hydroxy dimethyl phenyl propane and 2, 2-dimethoxy-2-phenyl acetophenone may be used.
- the thickness of the cleaning layer is not specifically limited. In practice, however, it is normally from about 5 to 100 ⁇ m.
- the present invention also provides a cleaning sheet comprising the foregoing specific cleaning layer provided on one side of a base material and an ordinary adhesive layer provided on the other.
- the adhesive layer to be provided on the other side of the base material is not specifically limited in its material so far as it can exhibit a desired sticking function.
- An ordinary adhesive e.g., acrylic adhesive, rubber-based adhesive
- acrylic adhesive e.g., acrylic adhesive, rubber-based adhesive
- the cleaning sheet canbe stuckto various substrates or other conveying members such as tape and sheet with an ordinary adhesive layer so that it can be conveyed to the interior of the equipment as a conveying member with a cleaning function to come in contact with the position to be cleaned, making itpossible to clean the equipment.
- the adhesive layer may have a 180° peel adhesion of from 0.01 to 0.98 N/10 mm, particularly from about 0.01 to 0.5 N/10 mm with respect to silicon wafer (mirror surface) , making it possible to prevent the substrate from being peeled off the adhesive layer and easily peel the substrate after cleaning.
- the base material on which the cleaning layer is provided is not specifically limited.
- a base material there may be used a film of a plastic such as polyethylene, polyethylene terephthalate, acetyl cellulose, polycarbonate, polypropylene and polyamide.
- the thickness of the base material is normally from about 10 to 100 ⁇ m.
- the conveying member to which the cleaning sheet is stuck is not specifically limited.
- a substrate such as semiconductorwafer, substrate for flatpanel display (e.g., LCD, PDP) and substrate for compact disk and MR head may be used.
- the present invention further provides a member for cleaning various conduction inspection equipments, a method for cleaning a conduction inspection equipment using same, and a member and method for cleaning a conduction inspection equipment which is apt to be easily damaged by foreign matters.
- contact pin cleaner In order to remove these foreign matters from the contact pin, a polyethylene terephthalate film coated with alumina particles or a member having abrasive grains incorporated in a rubber-based resin such as silicone (hereinafter referred to as "contact pin cleaner") is used.
- contact pin cleaner a polyethylene terephthalate film coated with alumina particles or a member having abrasive grains incorporated in a rubber-based resin such as silicone
- another object of the invention is to provide a cleaning member and cleaning method which can clean the contact pin in the conduction inspection equipment as well as reduce the amount of foreign matters attached to the chuck table and conveying arm.
- a cleaning member comprising a member for removing foreign matters attached to the conduction inspection contact pin in a conduction inspection equipment (hereinafter referred to as "contact pin cleaner") and a cleaning layer provided on one side of the contact pin cleaner for removing foreign matters attached to the contact area of the equipment with which the contact pin cleaner comes in contact (chuck table)
- the contact pin can be cleaned while removing foreign matters attached to the chuck table in the inspection equipment.
- the friction coefficient of the cleaning layer predetermining the friction coefficient of the cleaning layer to be not lower than a specific value, the cleaning sheet can be certainly conveyed through the interior of the inspection equipment while simply reducing the amount of foreignmatters .
- thepresent invention alsoprovides a cleaning member for conduction inspection equipment comprising a member for removing foreignmatters attached to the conduction inspection contact pin in a conduction inspection equipment (hereinafter referred to as "contact pin cleaner” ) and a cleaning layer provided on one side of the contact pin cleaner for removing foreign matters attached to the contact area of the equipment with which the contact pin cleaner comes in contact.
- a cleaning member for conduction inspection equipment comprising a member for removing foreignmatters attached to the conduction inspection contact pin in a conduction inspection equipment (hereinafter referred to as "contact pin cleaner” ) and a cleaning layer provided on one side of the contact pin cleaner for removing foreign matters attached to the contact area of the equipment with which the contact pin cleaner comes in contact.
- the present invention further provides a cleaning member for conduction inspection equipment comprising a member provided on one side of a conveying member for removing foreign matters attached to the conduction inspection contact pin of the conduction inspection equipment (hereinafter referred to as "contact pin cleaner") and the foregoing cleaning sheet provided on the other for removing foreign matters attached to the contact area of an equipment with which said contact pin cleaner comes in contact.
- the cleaning layer in the cleaning member of the invention is not specifically limited so far as it can be certainly conveyed through the interior of the inspection equipment as well as reduce the amount of foreign matters simply. In practice, however, the friction coefficient of the cleaning layer is preferably not lower than 1.0, more preferably from 1.2 to 1.8 from the standpoint of dust-removing properties and conveying properties.
- the friction coefficient ( ⁇ ) of the cleaning layer is determined by measuring the friction coefficient (F) developed when a stainless steel plate (50 mm x 50 mm flat plate) is allowed to slide along the surface of the cleaning layer by means of a universal testing machine, and then substituting this measurement and the vertical load (W) applied to the steel plate during this process in the following equation (2) .
- ⁇ F/W (2) wherein ⁇ represents a dynamic friction coefficient; F represents a frictional resistance (N) ; and W represents the vertical load (N) applied to steel plate.
- the cleaning layer exhibits a tensile modulus of not higher than 2, 000 N/mm 2 , preferably greater than 1 N/mm 2 .
- a tensile modulus of the cleaning layer exceeds 2, 000 N/mm 2 , there is a fear that foreignmatters on the chuck table cannot be certainly attached to the cleaning layer.
- the tensile modulus of the cleaning layer falls below 1 N/mm 2 , there is a fear that the cleaning sheet can fail to be conveyed.
- the cleaning layer has substantiallyno tackiness during the conveyance of the cleaning sheet or the like, making it possible to exert an effect of conveying the cleaning sheet without causing the cleaning layer to adhere firmly to the position to be cleaned.
- the contact pin cleaner to be used in the invention is not specifically limited in its material, shape and other factors.
- a wide range of materials can be used.
- a film of a plastic such as polyethylene, polyethylene terephthalate, acetyl cellulose, polycarbonate, polypropylene, polyamide, polyimide and polycarbodimide, a rubber-based resin such as silicone or a substrate (backing) such as non-woven fabric coatedwith an abrasive grain such as particulate alumina, silicon carbide and chromium oxide may be used, but the present invention should not be construed as being limited thereto.
- the shape of the contact pin cleaner can be properly determined depending on the shape of socket and IC to be cleaned such as silicon wafer and IC chip and the kind of the equipment.
- the cleaning sheet can be conveyed to the interior of the equipment while being stuck to the contact pin cleaner for cleaning the contact pin on the non-cleaning side thereof or conveying member such as various substrates with a cleaning functionwith an ordinaryadhesive layer to forma conveying member so that it comes in contact with the chuck table for cleaning .
- the conveying member on which the cleaning layer is provided is not specifically limited. In practice, however, there may be used a semiconductor wafer, substrate for flat panel display such as LCD and PDP, substrate for compact disk and MR head, or a film of a plastic such as polyethylene, polyethylene terephthalate, acetyl cellulose, polycarbonate, polypropylene, polyamide, polyimide and polycarbodimide.
- a semiconductor wafer substrate for flat panel display such as LCD and PDP
- substrate for compact disk and MR head or a film of a plastic such as polyethylene, polyethylene terephthalate, acetyl cellulose, polycarbonate, polypropylene, polyamide, polyimide and polycarbodimide.
- the present invention further provides a process for the productionof a conveyingmemberwitha cleaning function forvarious substrate processing equipments, e.g., aprocess for the production of a conveying member with a cleaning function which is apt to be easily damagedby foreignmatters such as equipment for producing or inspecting semiconductor, flat panel display, printed circuit board, etc.
- cleaning member The foregoingprocess for the production of a conveyingmember with a cleaning function (hereinafter referred to as "cleaning member") is disadvantageous in that when a cleaningmember produced by laminating a conveying member such as substrate with a cleaning sheet having a shape greater than that of the conveying member is cut on the cleaning sheet along the profile of the conveying member (hereinafter this process will be referred to as "direct cutting process") , cutting wastes are produced from the cleaning layer during cutting and attached to the cleaning member to disadvantage.
- direct cutting process a cleaning sheet for label which has beenpreviouslyprocessed into the shape of the conveyingmember is laminated with a conveying member to produce a cleaning member
- the production of cutting wastes during the working of label can be inhibited as compared with direct cutting process.
- the cutting of sheet for label must be previously conducted, adding to the number of working steps required, complicating the process for the production of cleaning member and hence deteriorating the operating efficiency.
- a further object of the invention is to provide a process for the preparation of a cleaning member which can certainlybe conveyedthrough the interior of the substrate processing equipment, can certainly and simply remove foreign matters attached to the interior of the substrate processing equipment and produces no cutting wastes during the cutting of sheet by direct cutting process.
- the inventors made extensive studies to accomplish the foregoingobject.
- the present invention further provides a process for the preparation of a conveying member with a cleaning function which comprises laminating a cleaning sheet having a cleaning layer made of an adhesive which undergoes polymerization curing when acted upon by an active energy provided on one side of a base material and an ordinary adhesive layer provided on the other with a conveying member with an ordinary adhesive layer interposed therebetween in such an arrangement that the shape of the cleaning sheet is greater than that of the conveying member, and then cutting said cleaning sheet along the profile of the conveying member, characterized in that the cleaning layer undergoes polymerization curing reaction after the cutting of the cleaning sheet along the profile of the conveying member.
- the cleaning layer be made of an adhesive which undergoes polymerization curing with an active energy and the polymerization curing be conducted after sheet cutting. This is because when the cleaning layer is allowed to undergo polymerization curingbefore sheet cutting, it undergoes crosslinking to have a higher elastic modulus, causing the production of a large amount of cutting wastes which are attached to the cleaning member or the equipment.
- the tensile modulus of the cleaning layer be not higher than 1 N/mm 2 , preferably not higher than 0.1 N/mm 2 as determined by a testing method according to JIS K7127.
- the production of cutting wastes from the cleaning layer during sheet cutting can be prevented, making it possible to prepare a cleaning member free of cutting wastes by direct cutting process.
- a cleaning layer made of an adhesive which undergoes polymerization curing can undergo polymerization curing after sheet cutting to have substantially no tackiness, making it possible to provide a cleaning member which can be certainly conveyed without firmly adhering to the contact area of the equipment.
- the cleaning layer after sheet cutting exhibits a tensile modulus of not lower than 10 N/mm 2 , preferably from 10 to 2,000 N/mm 2 due to the acceleration of crosslinking reaction or curing by an active energy.
- a tensile modulus of the cleaning layer exceeds 2,000 N/mm 2 , the capacity of removing foreign matters from the conveying system is deteriorated.
- the tensile modulus of the cleaning layer falls below 10 N/mm 2 , the cleaning layer adheres to the interior area of the equipment to be cleaned during conveyance, causing troubles in conveyance.
- the preparation of the cleaning member according to the invention involves the use of a cleaning sheet comprising the foregoing specific adhesive layer provided as a cleaning layer on one side of a base material and an ordinary adhesive layer provided on the other, said cleaning layer being in uncured form.
- an acrylic polymer (weight-average molecular weight: 700,000) obtained from a monomer mixture comprising 75 parts of 2-ethylhexyl acrylate, 20 parts of methyl acrylate and 5 parts of acrylic acid were added 50 parts of a polyethylene glycol dimethacrylate, 50 parts of urethane acrylate, 3 parts of benzyl dimethyl ketal and 3 parts of diphenylmethane diisocyanate .
- the mixture was then uniformly stirred to obtain a solution of an ultraviolet-curing adhesive.
- the adhesive which hadbeen irradiatedwith ultraviolet light having a central wavelength of 365 nm in an integrated dose of 1,000 mJ/cm 2 to undergo curing exhibited a tensile modulus of 49 N/mm 2 .
- the measurement of tensile was carried out by a testing method according to JIS K7127.
- an adhesive solution obtained in the same manner as mentioned above except that the foregoing adhesive was free of benzyl dimethyl ketal was applied to the peel surface of a polyester peelable film having a thickness of 38 ⁇ m and a width of 250 mm to a dry thickness of 10 ⁇ m to provide an ordinary adhesive layer thereon.
- the foregoing ultraviolet-curing adhesive solution was applied to the peel surface of a polyester peelable film having a thickness of 38 ⁇ m to a dry thickness of 40 ⁇ m to provide a cleaning layer thereon.
- the two polyester peelable films were then laminated with each other in such an arrangement that the cleaning layer and the ordinary adhesive layer were opposed to each other.
- the resulting sheet was then irradiated with ultraviolet light having a central wavelength of 365 nm in an integrated dose of 1, OOOmJ/cm 2 to obtain a cleaning sheet according to the invention.
- the surface of the cleaning layer had substantially no tackiness.
- the cleaning layer was measured for surface resistivity at a temperature of 23°C and a relative humidity of 60% by means of a Type MCP-UP450 surface resistivity meter produced by Mitsubishi Chemical Corporation. As a result, the reading was greater than
- the peelable film was then peeled off the cleaning sheet on the ordinary adhesive layer side thereof.
- the cleaning sheet was then stuck to the back side (mirror surface) of an 8 inch silicon wafer toprepare a conveying cleaningwaferwitha cleaning function.
- the cleaning layer was then measured for tensile modulus. The results were 0.5 N/mm 2 .
- Example 2 It was tried to convey a conveying cleaning wafer prepared from the foregoing cleaning sheet in the same manner as in Example 1 through the interior of the substrate processing equipment. However, the conveying cleaning wafer adhered to the conveying arm and thus could not be conveyed.
- Example 2
- an acrylic polymer (weight-average molecular weight: 700,000) obtained from a monomer mixture comprising 75 parts of 2-ethylhexyl acrylate, 20 parts of methyl acrylate and 5 parts of acrylic acid were added 50 parts of a polyethylene glycol dimethacrylate, 50 parts of urethane acrylate, 3 parts of benzyl dimethyl ketal and 3 parts of diphenylmethane diisocyanate. The mixture was then uniformly stirred to obtain a solution of an ultraviolet-curing adhesive.
- an acrylic polymer weight-average molecular weight: 700,000
- an adhesive solution obtained in the same manner as mentioned above except that the foregoing adhesive was free of benzyl dimethyl ketal was applied to one side of a polyester peelable film having a thickness of 25 ⁇ m and a width of 250 mm to a dry thickness of 10 ⁇ m to provide an ordinary adhesive layer thereon.
- a polyester peelable film having a thickness of 38 ⁇ m was then stuck to the surface of the ordinary adhesive layer.
- the foregoing ultraviolet-curing adhesive solution was applied to the other side of the base material film to a dry thickness of 40 ⁇ m to provide an adhesive layer as a cleaning layer thereon.
- a similar peelable film was then stuck to the surface of the cleaning layer.
- the resulting sheet was then irradiated with ultraviolet light having a central wavelength of 365 nm in an integrated dose of 1, 000mJ/cm 2 to obtain a cleaning sheet accordingto the invention.
- the adhesive layer as a cleaning layer in the cleaning sheet which had been cured by ultraviolet light exhibited a tensile modulus of 49 N/mm 2 .
- the measurement of tensile modulus was carried out by a testing method according to JIS K7127.
- the adhesive layer on the cleaning layer side was stuck to the mirror surface of a silicon wafer at a width of 10 mm, and then measured for 180° peel adhesion with respect to silicon wafer according to JIS Z0237. The results were 0.08 N/10 mm.
- the peelable film was then peeled off the cleaning sheet on the adhesive layer side thereof.
- the cleaning sheet was then stuck to the back side (mirror surface) of an 8 inch silicon wafer to prepare a conveying cleaning wafer with a cleaning function.
- the peelable film was peeled off the foregoing conveying cleaning wafer on the cleaning layer side thereof.
- the conveying cleaning wafer was then conveyed to the interior of the substrate processing equipment having the wafer stage having 25,000 foreignmatters attached thereto. As a result, the conveyance of the conveying cleaning wafer was conducted without any troubles. Thereafter, the wafer stage was removed, and then measured for the presence of foreign matters having a size of not smaller than 0.3 ⁇ mbymeans of a laser type foreignmatter analyzer .
- a cleaning sheet was prepared in the same manner as in Example 2 except that it was irradiated with ultraviolet light having a central wavelength of 365 nm in an integrated dose of 5 mJ/cm 2 .
- the cleaning sheet thus prepared was then measured for tensile modulus of cleaning layer in the same manner as in Example 2.
- the results were 0.67 N/mm 2 .
- the adhesive layer of the cleaning layer was then measured for adhesion with respect to silicon wafer.
- the results were 0.33 N/10 mm. It was tried to convey a conveying cleaning wafer prepared from the foregoing cleaning sheet in the same manner as in Example 2 through the interior of the substrate processing equipment having a wafer stage having 22, 000 foreign matters attached thereto. As a result, the conveying cleaning wafer was fixed to the wafer stage . Thus, the conveying cleaning wafer could no longer be conveyed.
- an acrylic polymer (weight-average molecular weight: 700,000) obtained from a monomer mixture comprising 75 parts of 2-ethylhexyl acrylate, 20 parts of methyl acrylate and 5 parts of acrylic acid were added 50 parts of a polyethylene glycol dimethacrylate, 50 parts of urethane acrylate, 3 parts of benzyl dimethyl ketal and 3 parts of diphenylmethane diisocyanate. The mixture was then uniformly stirred to obtain a solution of an ultraviolet-curing adhesive.
- an acrylic polymer weight-average molecular weight: 700,000
- an adhesive solution obtained in the same manner as mentioned above except that the foregoing adhesive was free of benzyl dimethyl ketal was applied to one side of a polyester peelable film having a thickness of 25 ⁇ m and a width of 250 mm to a dry thickness of 10 ⁇ m to provide an ordinary adhesive layer thereon.
- a polyester peelable film having a thickness of 38 ⁇ m was then stuck to the surface of the ordinary adhesive layer.
- the foregoing ultraviolet-curing adhesive solution was applied to the other side of the base material film to a dry thickness of 40 ⁇ m to provide an adhesive layer as a cleaning layer thereon .
- a similar peelable film was then stuck to the surface of the cleaning layer.
- the resulting sheet was then irradiated with ultraviolet light having a central wavelength of 365 nm in an integrated dose of 3, OOO J/cm 2 to obtain a cleaning sheet according to the invention.
- the surface of the cleaning layer had substantially no tackiness.
- the cleaning layer which had been cured by ultraviolet light exhibited a tensile modulus of 0.58 N/mm 2 .
- the measurement of tensile modulus was carried out by a testing method according to JIS K7127.
- the cleaning layer was stuck to the mirror surface of a silicon wafer at a width of 10 mm, and then measured for 180° peel adhesion with respect to silicon wafer according to JIS Z0237. The results were 0.0049 N/10 mm. It was thus confirmed that the cleaning layer has substantially no tackiness.
- the cleaning layer was measured for surface resistivity at a temperature of 23°C and a relative humidity of 60% by means of a Type MCP-UP450 surface resistivity meter produced by Mitsubishi Chemical Corporation. As a result, the reading was greater than
- the cleaning layer has substantially no electrical conductivity.
- the peelable film was then peeled off the cleaning sheet on the ordinary adhesive layer side thereof.
- the cleaning sheet was then stuck to the back side (mirror surface) of an 8 inch silicon wafer to prepare a conveying cleaning wafer with a cleaning function
- a polyester film having a thickness of 25 ⁇ m and a width of 250 mm was used as a cleaning layer.
- the same ordinary adhesive layer as used in Example 3 was provided on one side of the polyester film to a dry thickness of 10 ⁇ m.
- a polyester peelable film having a thickness of 38 ⁇ m was then stuck to the surface of the ordinary adhesive layer to prepare a cleaning sheet.
- the polyester film as a cleaning layer exhibited a tensile modulus of 200 N/mm 2 .
- the polyester film was also measured for
- the polyester film was measured for surface resistivity.
- the reading was greater than 9.99 x 10 13 ⁇ , making the measurement impossible . From these results, it was confirmed that the cleaning layer has substantially no electrical conductivity.
- a cleaning wafer with a cleaning function (2) was then prepared in the same manner as in Example 3.
- the peelable film was peeled off the foregoing conveying cleaning wafer (1) on the cleaning layer side thereof.
- the conveying cleaning wafer (1) was then conveyed to the interior of the substrate processing equipment having the wafer stage having 23,788 foreign matters attached thereto. As a result, the conveyance was made with any troubles .
- the brand-new 8 inch silicon wafer having 7 foreign matters having a size of not smaller than 0.2 ⁇ mpresent thereon was conveyed to the interior of the substrateprocessing equipment with its mirror surface facing downward.
- These wafers were then each measured for the presence of foreign matters having a size of not smaller than 0.2 ⁇ m by means of a laser type foreign matter analyzer .
- foreign matters having a size of not smaller than 0.2 ⁇ m were found on an 8 inch wafer size area in a number of 6,205, demonstrating that 74% of foreign matters which had been attached before cleaning was removed.
- the foregoing conveying cleaning wafer (2) was then conveyed to the interior of the substrate processing equipment having the wafer stage having 26,008 foreign matters attached thereto. As a result, the conveyance was made with any troubles. Thereafter, the brand-new 8 inch silicon wafer having
- the cleaning sheet thus prepared was then measured for tensile modulus of cleaning layer. The results were 0.067 N/mm 2 .
- the cleaning layer was thenmeasured for adhesion with respect to silicon wafer. The results were 0.33 N/10 mm.
- Example 5 To 100 parts of an acrylic polymer (weight-average molecular weight: 2,800,000) obtained from a monomer mixture comprising 30 parts of 2-ethylhexyl acrylate, 70 parts of methyl acrylate and 10 parts of acrylic acid were added 150 parts of dipentaerythritol hexaacrylate (trade name: UV 1700B, produced by Nippon Synthetic Chemical Industry Co. , Ltd. ) , 3 parts of a polyisocyanate compound
- the pressure-sensitive adhesive solution B was then applied to one side of a polyester base material film having a thickness of 25 ⁇ m and a width of 250 mm to a dry thickness of 10 ⁇ m to provide an ordinary adhesive layer thereon.
- a polyester peelable film having a thickness of 38 ⁇ m was then stuck to the surface of the ordinary adhesive layer.
- the foregoing ultraviolet-curing adhesive solution A was applied to the other side of the base material film to a dry thickness of 10 ⁇ m to provide a cleaning layer thereon.
- a similar peelable film was then stuck to the surface of the cleaning layer.
- the resulting sheet was then irradiated with ultraviolet light having a central wavelength of 365 nm in an integrated dose of 1, 000 J/cm 2 to obtain a cleaning sheet accordingto the invention.
- the peelable film was then peeled off the cleaning sheet on the cleaning layer side thereof.
- the cleaning layer was thenmeasured for surface free energy. The results were 18.4 mJ/m 2 .
- the cleaning layer exhibited a contact angle of 105.1 degrees with respect to water.
- the peelable film was then peeled off the cleaning sheet on the ordinary adhesive layer side thereof.
- the cleaning sheet was then stuck to the back side (mirror surface) of an 8 inch silicon wafer with a hand roller to prepare a conveying cleaning wafer with a cleaning function.
- the wafer stage was removed from the substrate processing equipment, and then measured for the presence of foreign matters having a size of not smaller than 0.3 ⁇ m by a laser type foreign matter analyzer. As a result, foreign matters having a size of not smaller than 0.3 ⁇ m were found on an 8 inch wafer size area in a number of 21,000.
- the peelable film was peeled off the cleaning wafer on the cleaning layer side thereof.
- the cleaning wafer was then conveyedto the interior of the substrateprocessing equipment .
- the cleaning layer didn' t firmly adhere to the position to be cleaned even after 100 sheets of continuous conveyance .
- the conveyance was made without any troubles.
- an adhesive solution C prepared by a process which comprises adding 100 parts of a polyethylene glycol 200 dimethacrylate (trade name: NK Ester 4G, produced by Sninnakamura Chemical Co., Ltd.), 100 parts of a polyethylene glycol 600 diacrylate (trade name: NK Ester A-600, produced by Sninnakamura Chemical Co., Ltd.) and 3 parts of a polyisocyanate compound (trade name: Colonate L, producedbyNippon Polyurethane Industry Co.
- a polyethylene glycol 200 dimethacrylate trade name: NK Ester 4G, produced by Sninnakamura Chemical Co., Ltd.
- a polyethylene glycol 600 diacrylate trade name: NK Ester A-600, produced by Sninnakamura Chemical Co., Ltd.
- Colonate L producedbyNippon Polyurethane Industry Co.
- a cleaning sheet was prepared from the cleaning layer in the samemanner as inExample 5.
- the cleaning layer was thenmeasured for surface free energ .
- the results were 57.3 mJ/m 2 .
- the cleaning layer exhibited a contact angle of 49.4 degrees with respect to water .
- Example 6 It was dried to convey a conveying cleaning wafer prepared from the foregoing cleaning sheet in the same manner as in Example 5 to the interior of the substrateprocessing equipment . As a result, the cleaningwaferwas fixedto the wafer stage during the conveyance of the first sheet. Thus, the conveying cleaning wafer could no longer be conveyed.
- Example 6
- an acrylic polymer (weight-average molecular weight: 700,000) obtained from a monomer mixture comprising 75 parts of 2-ethylhexyl acrylate, 20 parts of methyl acrylate and 5 parts of acrylic acid were added 100 parts of a polyethylene glycol 200 dimethacrylate (trade name: NK Ester 4G, produced by Sninnakamura Chemical Co., Ltd.), 3 parts of a polyisocyanate compound (trade name: Colonate L, produced by Nippon Polyurethane Industry Co., Ltd.) and 3 parts of a benzyl dimethyl ketal (Irgacure 651, produced by Ciba Specialty Chemicals Co., Ltd.) as a photopolymerization initiator. The mixture was then uniformly stirred to prepare an ultraviolet-curing adhesive solution A.
- a polyethylene glycol 200 dimethacrylate trade name: NK Ester 4G, produced by Sninnakamura Chemical Co., Ltd.
- an adhesive solution obtained in the same manner as mentioned above except that the foregoing adhesive solution A was free of benzyl dimethyl ketal as a photopolymerization initiator was applied to one side of a polyester peelable film having a thickness of 38 ⁇ m and a width of 250 mm to a dry thickness of 10 ⁇ m to provide an ordinary adhesive layer thereon.
- Apolyester peelable film having a thickness of 38 ⁇ m was then stuck to the surface of the ordinary adhesive layer .
- the foregoing ultraviolet-curing adhesive solution A was applied to the other side of the base material film to a dry thickness of 10 ⁇ m to provide an adhesive layer as a cleaning layer thereon.
- a similar peelable film was then stuck to the surface of the adhesive layer.
- the resulting sheet was then irradiated with ultraviolet light having a central wavelength of 365 nm in an integrated dose of 2, OOOmJ/cm 2 to obtain a cleaning sheet according to the invention.
- the peelable film was then peeled off the cleaning sheet on the cleaning layer side thereof.
- the cleaning sheet was then easured for Vickers hardness of cleaning layer by means of a Type MHA-400 Vickers hardness meter produced by NEC. The results were 45.
- the cleaning layer which had been cured with ultraviolet light exhibited a tensile modulus of 147.2 N/mm 2 .
- the measurement of tensile modulus was carried out by a testing method according to JIS K7127.
- the cleaning layer was stuck to the mirror surface of a silicon wafer at a width of 10 mm, and then measured for 180° peel adhesion with respect to silicon wafer according to JIS Z0237. The results were 0.0049 N/10 mm. It was thus confirmed that the cleaning layer has substantially no tackiness.
- the cleaning layer was measured for surface resistivity at a temperature of 23°C and a relative humidity of 60% by means of a Type MCP-UP450 surface resistivity meter produced by Mitsubishi Chemical Corporation. As a result, the reading was greater than
- the cleaning layer has substantially no electrical conductivity.
- the peelable film was then peeled off the cleaning sheet.
- the cleaning sheet was then stuck to the back side (mirror surface) of an 8 inch silicon wafer to prepare a conveying cleaning wafer with a cleaning function.
- the peelable film was peeled off the foregoing conveying cleaning wafer on the cleaning layer side thereof.
- the conveying cleaning wafer was then conveyed to the interior of the substrateprocessing equipment having the wafer stage having 25, 000 foreign matters attached thereto. As a result, the conveyance of the conveying cleaning wafer was conducted without any troubles. Thereafter, the wafer stage was removed, and then measured for the presence of foreign matters having a size of not smaller than 0.3 ⁇ mbymeans of a laser type foreignmatter analyzer .
- a cleaning sheet was prepared in the same manner as in Example 6 except that as an adhesive for cleaning layer there was used an adhesive solution B prepared by a process which comprises adding 100 parts of a polyethylene glycol 600 diacrylate (trade name: NK Ester A-600, produced by Sninnakamura Chemical Co., Ltd.), 3 parts of apolyisocyanate compound (trade name: Colonate L, produced by Nippon Polyurethane Industry Co., Ltd.) and 10 parts of benzyl dimethyl ketal (trade name: Irgacure 651, producedbyCiba Specialty Chemicals Co., Ltd.) as a photopolymerization initiator to 100 parts of an acrylic polymer (weight-average molecular weight: 2,800,000) obtained from a monomer mixture comprising 30 parts of 2-ethylhexyl acrylate, 70 parts of methyl acrylate and 10 parts of acrylic acid, and then stirring uniformly the mixture.
- an adhesive solution B prepared by a process which comprises adding 100 parts of a
- the cleaning sheet thus prepared was then measured for Vickers hardness of cleaning layer in the samemanner asmentioned above .
- the results were 5.
- the cleaning layer was measured for surface free energy.
- the results were 34.6mJ/cm 2 .
- the cleaninglayer exhibited a contact angle of 82.3 degrees with respect to water.
- Example 7 It was dried to convey a conveying cleaning wafer prepared from the foregoing cleaning sheet in the same manner as in Example 6 to the interior of the substrate processing equipment having the wafer stage having 23,000 foreign matters attached thereto. As a result, the cleaning wafer was fixed to the wafer stage during the conveyance of the first sheet. Thus, the conveying cleaning wafer could no longer be conveyed.
- Example 7
- an acrylic polymer (weight-average molecular weight: 700,000) obtained from a monomer mixture comprising 75 parts of 2-ethylhexyl acrylate, 20 parts of methyl acrylate and 5 parts of acrylic acid were added 50 parts of a polyethylene glycol 200 dimethacrylate (trade name: NK Ester 4G, produced by Sninnakamura Chemical Co., Ltd.), 50 parts of urethane acrylate (trade name: U-N-01, producedby Sninnakamura Chemical Co.
- a polyethylene glycol 200 dimethacrylate (trade name: NK Ester 4G, produced by Sninnakamura Chemical Co., Ltd.)
- urethane acrylate (trade name: U-N-01, producedby Sninnakamura Chemical Co.
- an adhesive solution obtained in the same manner as mentioned above except that the foregoing adhesive solution A was free of benzyl dimethyl ketal as a photopolymerization initiator was applied to one side of a polyester peelable film having a thickness of 38 ⁇ m and a width of 250 mm to a dry thickness of 10 ⁇ m to provide an ordinary adhesive layer thereon.
- Apolyester peelable film having a thickness of 38 ⁇ m was then stuck to the surface of the ordinary adhesive layer .
- the foregoing ultraviolet-curing adhesive solution A was applied to the other side of the base material film to a dry thickness of 10 ⁇ m to provide an adhesive layer as a cleaning layer thereon.
- a similar peelable film was then stuck to the surface of the adhesive layer.
- the resulting sheet was then irradiated with ultraviolet light having a central wavelength of 365 nm in an integrated dose of 1, OOOmJ/cm 2 to obtainacleaning sheet according to the invention.
- the peelable film was then peeled off the cleaning sheet on the cleaning layer side thereof.
- the cleaning sheet which had been cured with ultraviolet light exhibited a friction coefficient of 1.7 and a tensile modulus of 50 N/mm 2 .
- a stainless steel plate having a size of 50 mm x 50 mm was allowed to move along the surface of the cleaning layer in a predetermined direction at a rate of 300 mm/min at a vertical load of 9.8 N.
- the resulting frictional resistance was then measured by a universal tensile testing machine.
- the measurement of tensile modulus was conducted by a testing method according to JIS K7127.
- the peelable film was then peeled off the cleaning sheet on the ordinary adhesive layer side thereof.
- the cleaning sheet was then stuck to the back side (non-cleaning surface) of a contact pin cleaner (trade name: Passchip, produced by PASS INC.) as a contact pin cleaning member having the shape of an 8 inch silicon wafer with a hand roller to prepare a conveying cleaning member for cleaning function.
- a contact pin cleaner trade name: Passchip, produced by PASS INC.
- the peelable film was peeled off the cleaning member on the cleaning layer side thereof.
- the cleaning member was then dummy-conveyed through the interior of a wafer probe which is a conduction inspection equipment for the production of semiconductor to clean the contact pin and the chuck table. As a result, the cleaning layer didn't firmly adhere to the contact position. Thus, the conveyance was made without any troubles.
- an acrylic polymer (weight-average molecular weight: 700,000) obtained from a monomer mixture comprising 75 parts of 2-ethylhexyl acrylate, 20 parts of methyl acrylate and 5 parts of acrylic acid were added 50 parts of a polyethylene glycol 200 dimethacrylate (trade name: NK Ester 4G, produced by Sninnakamura Chemical Co., Ltd.), 50 parts of urethane acrylate (trade name: U-N-01, produced by Sninnakamura Chemical Co .
- an ordinary pressure-sensitive adhesive solution A was obtained in the same manner as mentioned above except that the foregoing adhesive was free of benzyl dimethyl ketanol.
- the ordinary pressure-sensitive adhesive solution A was applied to one side of a polyester base material film having a thickness of 25 ⁇ m and a width of 250 mm to a dry thickness of 10 ⁇ m to provide an ordinary adhesive layer.
- a polyester peelable film having a thickness of 38 ⁇ m was then stuck to the surface of the ordinary adhesive layer.
- the foregoing ultraviolet-curing adhesive solvent A was applied to the other side of the basematerial film to a dry thickness of 30 ⁇ m to provide an adhesive layer as a cleaning layer .
- a similar peelable film was stuck to the surface of the adhesive layer to prepare a cleaning sheet A.
- the ultraviolet-curing adhesive A was then measured for tensile modulus (testing method: JIS K7127) . As a result, it exhibited a tensile modulus of 0.1 N/mm 2 before it underwent curing reaction by ultraviolet light.
- the ultraviolet-curing adhesive A which had been irradiated with ultraviolet light having a central wavelength of 365 nm in an integrated dose of 1, 000 mJ/cm 2 exhibited a tensile modulus of 49 N/mm 2 .
- the cleaning sheet A thus obtained was then stuck to a wafer by a direct cutting type tape sticker (NEL-DR8500II, produced by NITTO SEIKI INC.) .
- the sheet A was stuck to the back side (mirror surface) of an 8 inch silicon wafer, and then cut into the shape of wafer by direct cutting process. This operation was continuously conducted over 25 sheets . As a result, no cutting wastes were produced during sheet cutting.
- the conveying cleaning wafer A was then conveyed to the interior of the substrate processing equipment having the wafer stage having 31,254 foreign matters attached thereto. As a result, the conveyance was made without any troubles . Thereafter, a brand-new 8 inch silicon wafer was conveyed to the interior of the substrate processing equipment with its mirror surface facing downward, and then measured for the presence of foreign matters having a size of not smaller than 0.2 ⁇ m by a laser type foreign matter analyzer . This operation was conducted 5 times. The results are set forth in Table 1.
- a cleaning sheet B was prepared in the same manner as in Example 8 except that as an ultraviolet-curing adhesive there was used anultraviolet-curing adhesive solutionBpreparedby aprocess which comprises adding 100 parts of a polyfunctional urethane acrylate (trade name: UV 1700B, produced by Nippon Synthetic Chemical Industry Co. , Ltd.
- a polyisocyanate compound (trade name: Colonate L, produced by Nippon Polyurethane Industry Co., Ltd.) and 10 parts of benzyl dimethyl ketal (trade name: Irgacure 651, produced by Ciba Specialty Chemicals Co., Ltd.) as a photopolymerization initiator to 100 parts of an acrylic polymer (weight-average molecular weight: 2,800,000) obtained from a monomer mixture comprising 30 parts of 2-ethylhexyl acrylate, 70 parts of methyl acrylate and 10 parts of acrylic acid, and then stirring uniformly the mixture.
- the ultraviolet-curing adhesive B was then measured for tensile modulus .
- the ultraviolet-curing adhesive B which had been irradiated with ultraviolet light having a central wavelength of 365 nm in an integrated dose of 1, 000 mJ/cm 2 exhibited a tensile modulus of 1, 440 N/mm 2 .
- the foregoing cleaning sheet B was then subjected to direct cutting process in the same manner as in Example 8 to prepare 25 sheets of wafers with sheet . As a result, no cuttings were produced during sheet cutting. Five out of the 25 sheets of wafers were then irradiated with ultraviolet light having a central wavelength of 365 nm in an integrated dose of 1, 000 mJ/cm 2 to prepare a conveying cleaning wafer B with a cleaning function.
- a wafer with sheet was prepared by direct cutting process in the same manner as in Example 8 except that a cleaning sheet C prepared by a process which comprises irradiating the cleaning sheet A with ultraviolet light having a central wavelength of 365 nm in an integrated dose of 1, 000 mJ/cm 2 before being stuck to the wafer.
- a cleaning sheet C prepared by a process which comprises irradiating the cleaning sheet A with ultraviolet light having a central wavelength of 365 nm in an integrated dose of 1, 000 mJ/cm 2 before being stuck to the wafer.
- a cleaning sheet D was prepared in the same manner as in Example 8 except that as an adhesive for cleaning layer there was used the pressure-sensitive adhesive solution A described in Example 8.
- the cleaning layer in the cleaning sheet D exhibited a tensile modulus of 0.1 N/mm 2 .
- the cleaning sheet D was then subjected to direct cutting in the same manner as in Example 8 to prepare a wafer with sheet. As a result, no cutting wastes were produced during sheet cutting. 25 sheets of wafers with sheet were prepared. It was then tried to convey the conveying cleaning wafer D to the interior of the substrate processing equipment having a wafer stage having 27,986 foreign matters attached thereto. As a result, the conveying cleaning wafer D adhered to the wafer stage during the conveyance of the first sheet. Thus, the cleaning wafer D could no longer be conveyed.
- the cleaning sheet according to the invention can certainly be conveyed through the interior of a substrate processing equipment as well as can simply and certainly remove foreign matters attached to the interior of the equipment.
Landscapes
- Cleaning In General (AREA)
- Cleaning Or Drying Semiconductors (AREA)
- Laminated Bodies (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Cleaning Implements For Floors, Carpets, Furniture, Walls, And The Like (AREA)
Abstract
Description
Claims
Priority Applications (7)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020027016584A KR100786437B1 (en) | 2000-06-06 | 2001-05-08 | Cleaning sheet, conveying member using the same, and substrate processing equipment cleaning method using them |
DE2001629687 DE60129687T2 (en) | 2000-06-06 | 2001-05-08 | CLEANING ELEMENT |
US10/297,173 US7713356B2 (en) | 2000-06-06 | 2001-05-08 | Cleaning sheet, conveying member using the same, and substrate processing equipment cleaning method using them |
EP01926156A EP1286792B1 (en) | 2000-06-06 | 2001-05-08 | Cleaning member |
US11/014,779 US7793668B2 (en) | 2000-06-06 | 2004-12-20 | Cleaning sheet, conveying member using the same, and substrate processing equipment cleaning method using them |
US11/229,586 US20060105164A1 (en) | 2000-06-06 | 2005-09-20 | Cleaning sheet, conveying member using the same, and substrate processing equipment cleaning method using them |
US12/851,797 US20100319151A1 (en) | 2000-06-06 | 2010-08-06 | Cleaning sheet, conveying member using the same, and substrate processing equipment cleaning method using them |
Applications Claiming Priority (14)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2000168423A JP4456666B2 (en) | 2000-06-06 | 2000-06-06 | Cleaning sheet, conveying member with cleaning function, and method for cleaning substrate processing apparatus using them |
JP2000-168423 | 2000-06-06 | ||
JP2000-177963 | 2000-06-14 | ||
JP2000177964A JP4718667B2 (en) | 1999-11-09 | 2000-06-14 | Cleaning sheet |
JP2000177963A JP2001198075A (en) | 1999-11-09 | 2000-06-14 | Cleaning sheet |
JP2000-177964 | 2000-06-14 | ||
JP2000-230339 | 2000-07-31 | ||
JP2000230339A JP3740002B2 (en) | 2000-07-31 | 2000-07-31 | Cleaning sheet and substrate processing apparatus cleaning method using the same |
JP2000243752A JP3740004B2 (en) | 2000-08-11 | 2000-08-11 | Cleaning sheet and substrate processing apparatus cleaning method using the same |
JP2000-243752 | 2000-08-11 | ||
JP2000-349840 | 2000-11-16 | ||
JP2000349840A JP2002158199A (en) | 2000-11-16 | 2000-11-16 | Method for manufacturing conveying member with cleaning function and cleaning sheet used therefor |
JP2001004634A JP2002214271A (en) | 2001-01-12 | 2001-01-12 | Cleaning member and method for cleaning electrical continuity inspection device using the same |
JP2001-004634 | 2001-01-12 |
Related Child Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US10297173 A-371-Of-International | 2001-05-08 | ||
US11/014,779 Continuation-In-Part US7793668B2 (en) | 2000-06-06 | 2004-12-20 | Cleaning sheet, conveying member using the same, and substrate processing equipment cleaning method using them |
Publications (1)
Publication Number | Publication Date |
---|---|
WO2001094036A1 true WO2001094036A1 (en) | 2001-12-13 |
Family
ID=27566979
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/JP2001/003848 WO2001094036A1 (en) | 2000-06-06 | 2001-05-08 | Cleaning sheet, conveying member using the same, and substrate processing equipment cleaning method using them |
Country Status (7)
Country | Link |
---|---|
US (1) | US7713356B2 (en) |
EP (4) | EP1782894A3 (en) |
KR (1) | KR100786437B1 (en) |
CN (1) | CN100400185C (en) |
DE (1) | DE60129687T2 (en) |
MY (1) | MY135752A (en) |
WO (1) | WO2001094036A1 (en) |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2003052045A1 (en) * | 2001-12-19 | 2003-06-26 | Nitto Denko Corporation | Cleaning sheet and process for cleaning substrate treatment device |
US7575790B2 (en) | 2001-12-19 | 2009-08-18 | Nitto Denko Corporation | Cleaning sheet and process for cleaning substrate treatment device using same |
US7615288B2 (en) | 2003-06-26 | 2009-11-10 | Nitto Denko Corporation | Cleaning member and cleaning method |
US7655316B2 (en) | 2004-07-09 | 2010-02-02 | Applied Materials, Inc. | Cleaning of a substrate support |
TWI395264B (en) * | 2003-04-14 | 2013-05-01 | Nitto Denko Corp | Cleaning sheet, carrying member with a cleaning function and method of cleaning substrate processing equipment |
CN105694749A (en) * | 2014-12-09 | 2016-06-22 | 日东电工株式会社 | Pressure-sensitive adhesive sheet to be used in production of semiconductor |
Families Citing this family (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7793668B2 (en) * | 2000-06-06 | 2010-09-14 | Nitto Denko Corporation | Cleaning sheet, conveying member using the same, and substrate processing equipment cleaning method using them |
MY137666A (en) * | 2001-04-09 | 2009-02-27 | Nitto Denko Corp | Label sheet for cleaning and conveying member having cleaning function |
US20050118414A1 (en) * | 2002-06-19 | 2005-06-02 | Nitto Denko Corporation | Cleaning sheets, transfer member having cleaning function, and method of cleaning substrate-processing apparatus with these |
KR101025981B1 (en) * | 2003-03-20 | 2011-03-30 | 닛토덴코 가부시키가이샤 | Cleaning sheet and its production method as well as transporting member having such cleaning sheet |
JP2006143996A (en) * | 2004-10-19 | 2006-06-08 | Nitto Denko Corp | Heat-resistant resin |
JP2006278765A (en) * | 2005-03-29 | 2006-10-12 | Fujitsu Ltd | Cleaning method, tool, and apparatus for laminated substrate manufacturing apparatus |
CN101297395A (en) * | 2005-10-25 | 2008-10-29 | 日东电工株式会社 | Cleaning sheet, transfer member provided with cleaning function, and method for cleaning substrate processing apparatus |
JP4509981B2 (en) * | 2006-08-11 | 2010-07-21 | 日東電工株式会社 | Cleaning member, conveying member with cleaning function, and cleaning method for substrate processing apparatus |
US20100175716A1 (en) * | 2006-08-11 | 2010-07-15 | Nitto Denko Corporation | Cleaning Member, Delivery Member with Cleaning Function, and Method of Cleaning Substrate Processing Apparatus |
JP5038259B2 (en) | 2008-08-26 | 2012-10-03 | 株式会社日立ハイテクノロジーズ | Cleaning device and cleaning method |
JP5167195B2 (en) * | 2009-04-30 | 2013-03-21 | 日東電工株式会社 | Cleaning sheet, conveying member with cleaning function, cleaning method for substrate processing apparatus, and substrate processing apparatus |
JP5743450B2 (en) * | 2010-07-28 | 2015-07-01 | 株式会社東芝 | Reticle chuck cleaner |
CN101982248B (en) * | 2010-09-26 | 2012-05-23 | 昆山博益鑫成高分子材料有限公司 | Manufacturing method of suede cleaning roller |
US9058753B2 (en) | 2012-03-23 | 2015-06-16 | Documotion Research, Inc. | Paper, labels made therefrom and methods of making paper and labels |
JP6378501B2 (en) * | 2014-03-05 | 2018-08-22 | 日東電工株式会社 | Adhesive sheet |
Citations (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH06274072A (en) * | 1993-03-24 | 1994-09-30 | Sanrei Giken:Kk | Cleaning sheet for printing and copying equipment |
US5415889A (en) * | 1993-08-20 | 1995-05-16 | Tdk Corporation | Manufacturing method for a magnetic recording medium |
JPH07128368A (en) * | 1993-10-30 | 1995-05-19 | Suzuki Motor Corp | Contact pin cleaning sheet |
JPH08115897A (en) * | 1994-10-13 | 1996-05-07 | Nitto Denko Corp | Adhesive tape and method for removing foreign matter from semiconductor wafer |
WO1997000534A1 (en) * | 1995-06-15 | 1997-01-03 | Nitto Denko Corporation | Method of removing resist, and adhesive or adhesive sheet used for the method |
JPH10154686A (en) * | 1996-11-22 | 1998-06-09 | Toshiba Corp | Method of cleaning semiconductor substrate processing device |
EP0930538A1 (en) * | 1998-01-14 | 1999-07-21 | Nitto Denko Corporation | A cleaning tape for photographic material transporting rollers |
US6055392A (en) * | 1998-01-30 | 2000-04-25 | Moore U.S.A., Inc. | Cleaning toner from rollers and surface of business forms handling machines |
Family Cites Families (43)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3149364A (en) * | 1963-05-02 | 1964-09-22 | James N Baptist | Attachable cleaning device |
JPS5850435U (en) | 1981-10-01 | 1983-04-05 | 株式会社リコー | Cleaner sheet for dry type diazo copying machine developing device |
US4539342A (en) * | 1984-04-03 | 1985-09-03 | Imi-Tech Corporation | Polyimide foam prepared from amino terminated butadiene acrylonitrile reactant |
JPS61138253A (en) | 1984-12-10 | 1986-06-25 | Matsushita Electric Works Ltd | Ultraviolet-hardenable resin composition |
JPH01187458A (en) | 1988-01-22 | 1989-07-26 | Hitachi Ltd | Gas analysis apparatus |
JPH0291241A (en) | 1988-09-22 | 1990-03-30 | Mitsubishi Rayon Co Ltd | Cloth like fabric for wiper |
JPH02292382A (en) * | 1989-05-02 | 1990-12-03 | Saiden Kagaku Kk | Pressure-sensitive adhesive composition |
JPH0612784B2 (en) | 1989-09-08 | 1994-02-16 | 株式会社東芝 | Substrate for cleaning semiconductor manufacturing equipment |
JPH05326471A (en) | 1992-05-19 | 1993-12-10 | Sony Corp | Method for cleaning semiconductor devices |
JPH06173041A (en) | 1992-12-02 | 1994-06-21 | Nissin Electric Co Ltd | Method for cleaning etching device |
JP2868977B2 (en) | 1993-07-30 | 1999-03-10 | 住友ベークライト株式会社 | Film adhesive |
JPH07142440A (en) | 1993-11-19 | 1995-06-02 | Fujitsu Ltd | Particle removing method and semiconductor production system having particle removing means |
EP0658828A1 (en) | 1993-12-16 | 1995-06-21 | Eastman Kodak Company | Particle transfer film and method of using same |
JPH0885070A (en) | 1994-09-14 | 1996-04-02 | Nippon Micro Coating Kk | Cleaning sheet and manufacture thereof |
JPH08115896A (en) | 1994-10-13 | 1996-05-07 | Nitto Denko Corp | Adhesive tape and method for removing foreign matter sticking to semiconductor wafer |
JPH08124892A (en) | 1994-10-21 | 1996-05-17 | Nitto Denko Corp | Adhesive tape for removing impurity attached to semiconductor wafer and removal |
JPH08139067A (en) | 1994-11-07 | 1996-05-31 | Nitto Denko Corp | Adhesive tape for removing foreign matters adhering to semiconductor wafer and removing method thereof |
JPH08181158A (en) | 1994-12-22 | 1996-07-12 | Nitto Denko Corp | Suction device |
JPH08323572A (en) | 1995-05-30 | 1996-12-10 | Nitto Denko Corp | Suction type locking device |
JP3493079B2 (en) * | 1995-06-19 | 2004-02-03 | 東燃化学株式会社 | Method for producing microporous thermoplastic resin membrane |
JPH0928645A (en) | 1995-07-21 | 1997-02-04 | Ube Nitto Kasei Co Ltd | Polyolefin wiping cloth and its manufacture |
JP3272990B2 (en) | 1996-09-04 | 2002-04-08 | キヤノン株式会社 | Cleaning sheet, cleaning method for recording apparatus using the same, and stacked recording material having the same |
DE19702546C1 (en) | 1997-01-24 | 1998-07-09 | Boeder Deutschland Gmbh | Device and method for applying labels to compact discs |
US5902678A (en) * | 1997-04-01 | 1999-05-11 | Nitto Denko Corporation | Pressure-sensitive adhesive or pressure-sensitive adhesive tape for foreign-matter removal |
JP3183214B2 (en) * | 1997-05-26 | 2001-07-09 | 日本電気株式会社 | Cleaning method and cleaning device |
JP3889859B2 (en) | 1997-07-29 | 2007-03-07 | リンテック株式会社 | Adhesive sheet for wafer attachment |
JPH11224895A (en) | 1997-12-04 | 1999-08-17 | Sony Corp | Disc jig for removing particles and method for controlling particles using the jig |
DE19810967A1 (en) | 1998-02-07 | 1999-08-19 | Phonosound Musikprod Gmbh | Self adhesive transparent polyester sheet protecting printed label of compact disc |
JPH11228994A (en) | 1998-02-17 | 1999-08-24 | Sony Corp | Cleaning liquid for magnetic recording head, cleaning tape for magnetic recording head, and cleaner for magnetic recording head |
JP4014283B2 (en) | 1998-03-20 | 2007-11-28 | リンテック株式会社 | Antistatic adhesive sheet |
JP3892595B2 (en) | 1998-10-01 | 2007-03-14 | 日東電工株式会社 | Aromatic polycarbodiimide and sheet thereof |
JP3892597B2 (en) | 1998-10-27 | 2007-03-14 | 日東電工株式会社 | Aromatic polycarbodiimide and sheet thereof |
US6669391B2 (en) * | 1998-11-09 | 2003-12-30 | The Procter & Gamble Company | Cleaning composition, pad, wipe, implement, and system and method of use thereof |
JP2000288482A (en) | 1999-04-02 | 2000-10-17 | Techno Inter:Kk | Method for cleaning medical implement |
JP3822763B2 (en) | 1999-04-28 | 2006-09-20 | 日東電工株式会社 | Cleaning sheet |
JP4718667B2 (en) | 1999-11-09 | 2011-07-06 | 日東電工株式会社 | Cleaning sheet |
JP2001181962A (en) | 1999-12-22 | 2001-07-03 | Kanai Hiroaki | Nonwoven fabric for polishing glass |
JP2001264975A (en) | 2000-03-22 | 2001-09-28 | Nippon Kayaku Co Ltd | Resin composition, its film and its curd body |
JP2002079190A (en) | 2000-09-06 | 2002-03-19 | Dainippon Screen Mfg Co Ltd | Substrate cleaning member, and device and method for cleaning substrate using the same |
JP2002249749A (en) | 2001-02-23 | 2002-09-06 | Nitto Denko Corp | Hydrogenated polyimide adhesive and adhesive sheet |
JP3888197B2 (en) | 2001-06-13 | 2007-02-28 | 三菱電機株式会社 | Member for removing foreign matter adhering to probe tip, cleaning method and probing device for foreign matter adhering to probe tip |
JP4125505B2 (en) | 2001-10-05 | 2008-07-30 | 日東電工株式会社 | Cleaning sheet and cleaning method using the same |
JP2004191571A (en) * | 2002-12-10 | 2004-07-08 | Fuji Xerox Co Ltd | Cleaning method and image forming apparatus |
-
2001
- 2001-05-08 WO PCT/JP2001/003848 patent/WO2001094036A1/en active IP Right Grant
- 2001-05-08 EP EP07004040.7A patent/EP1782894A3/en not_active Withdrawn
- 2001-05-08 KR KR1020027016584A patent/KR100786437B1/en not_active IP Right Cessation
- 2001-05-08 EP EP01926156A patent/EP1286792B1/en not_active Expired - Lifetime
- 2001-05-08 EP EP20100011696 patent/EP2266717A2/en not_active Withdrawn
- 2001-05-08 MY MYPI20012130A patent/MY135752A/en unknown
- 2001-05-08 US US10/297,173 patent/US7713356B2/en not_active Expired - Fee Related
- 2001-05-08 CN CNB018106811A patent/CN100400185C/en not_active Expired - Fee Related
- 2001-05-08 DE DE2001629687 patent/DE60129687T2/en not_active Expired - Lifetime
- 2001-05-08 EP EP20100011695 patent/EP2266716A2/en not_active Withdrawn
Patent Citations (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH06274072A (en) * | 1993-03-24 | 1994-09-30 | Sanrei Giken:Kk | Cleaning sheet for printing and copying equipment |
US5415889A (en) * | 1993-08-20 | 1995-05-16 | Tdk Corporation | Manufacturing method for a magnetic recording medium |
JPH07128368A (en) * | 1993-10-30 | 1995-05-19 | Suzuki Motor Corp | Contact pin cleaning sheet |
JPH08115897A (en) * | 1994-10-13 | 1996-05-07 | Nitto Denko Corp | Adhesive tape and method for removing foreign matter from semiconductor wafer |
WO1997000534A1 (en) * | 1995-06-15 | 1997-01-03 | Nitto Denko Corporation | Method of removing resist, and adhesive or adhesive sheet used for the method |
US6126772A (en) * | 1995-06-15 | 2000-10-03 | Nitto Denko Corporation | Method for resist removal, and adhesive or adhesive sheet for use in the same |
JPH10154686A (en) * | 1996-11-22 | 1998-06-09 | Toshiba Corp | Method of cleaning semiconductor substrate processing device |
EP0930538A1 (en) * | 1998-01-14 | 1999-07-21 | Nitto Denko Corporation | A cleaning tape for photographic material transporting rollers |
US6055392A (en) * | 1998-01-30 | 2000-04-25 | Moore U.S.A., Inc. | Cleaning toner from rollers and surface of business forms handling machines |
Non-Patent Citations (4)
Title |
---|
PATENT ABSTRACTS OF JAPAN vol. 018, no. 689 (P - 1850) 26 December 1994 (1994-12-26) * |
PATENT ABSTRACTS OF JAPAN vol. 1995, no. 08 29 September 1995 (1995-09-29) * |
PATENT ABSTRACTS OF JAPAN vol. 1996, no. 09 30 September 1996 (1996-09-30) * |
PATENT ABSTRACTS OF JAPAN vol. 1998, no. 11 30 September 1998 (1998-09-30) * |
Cited By (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2003052045A1 (en) * | 2001-12-19 | 2003-06-26 | Nitto Denko Corporation | Cleaning sheet and process for cleaning substrate treatment device |
KR100704090B1 (en) * | 2001-12-19 | 2007-04-05 | 닛토덴코 가부시키가이샤 | Cleaning sheet and process for cleaning substrate treatment device |
US7575790B2 (en) | 2001-12-19 | 2009-08-18 | Nitto Denko Corporation | Cleaning sheet and process for cleaning substrate treatment device using same |
CN1796528B (en) * | 2001-12-19 | 2010-05-26 | 日东电工株式会社 | Cleaning sheet and process for cleaning substrate treatment device |
TWI395264B (en) * | 2003-04-14 | 2013-05-01 | Nitto Denko Corp | Cleaning sheet, carrying member with a cleaning function and method of cleaning substrate processing equipment |
US7615288B2 (en) | 2003-06-26 | 2009-11-10 | Nitto Denko Corporation | Cleaning member and cleaning method |
KR100957282B1 (en) * | 2003-06-26 | 2010-05-12 | 닛토덴코 가부시키가이샤 | Cleaning member and cleaning method |
KR101078104B1 (en) * | 2003-06-26 | 2011-10-28 | 닛토덴코 가부시키가이샤 | Cleaning member and cleaning method |
US7655316B2 (en) | 2004-07-09 | 2010-02-02 | Applied Materials, Inc. | Cleaning of a substrate support |
US8114477B2 (en) | 2004-07-09 | 2012-02-14 | Applied Materials, Inc. | Cleaning of a substrate support |
CN105694749A (en) * | 2014-12-09 | 2016-06-22 | 日东电工株式会社 | Pressure-sensitive adhesive sheet to be used in production of semiconductor |
CN105694749B (en) * | 2014-12-09 | 2020-07-24 | 日东电工株式会社 | Pressure-sensitive adhesive sheet for use in semiconductor production |
Also Published As
Publication number | Publication date |
---|---|
US7713356B2 (en) | 2010-05-11 |
DE60129687D1 (en) | 2007-09-13 |
CN100400185C (en) | 2008-07-09 |
KR20030007880A (en) | 2003-01-23 |
EP1782894A2 (en) | 2007-05-09 |
EP1286792B1 (en) | 2007-08-01 |
KR100786437B1 (en) | 2007-12-17 |
CN1433341A (en) | 2003-07-30 |
DE60129687T2 (en) | 2007-12-06 |
US20030136430A1 (en) | 2003-07-24 |
MY135752A (en) | 2008-06-30 |
EP1286792A1 (en) | 2003-03-05 |
EP1782894A3 (en) | 2017-07-12 |
EP2266717A2 (en) | 2010-12-29 |
EP2266716A2 (en) | 2010-12-29 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US7713356B2 (en) | Cleaning sheet, conveying member using the same, and substrate processing equipment cleaning method using them | |
KR100691075B1 (en) | Cleaning sheet, conveying member using the same, and substrate processing equipment cleaning method using them | |
JP3987720B2 (en) | Cleaning sheet and method for cleaning substrate processing apparatus using the same | |
US20100319151A1 (en) | Cleaning sheet, conveying member using the same, and substrate processing equipment cleaning method using them | |
JP4718667B2 (en) | Cleaning sheet | |
US20060105164A1 (en) | Cleaning sheet, conveying member using the same, and substrate processing equipment cleaning method using them | |
JP3740004B2 (en) | Cleaning sheet and substrate processing apparatus cleaning method using the same | |
JP4456666B2 (en) | Cleaning sheet, conveying member with cleaning function, and method for cleaning substrate processing apparatus using them | |
JP4130830B2 (en) | Conveying member with cleaning function and method for cleaning substrate processing apparatus using the same | |
JP4163705B2 (en) | Conveying member with cleaning function and method for cleaning substrate processing apparatus using the same | |
JP4316105B2 (en) | Cleaning sheet | |
JP4130087B2 (en) | How to remove particles | |
JP4495806B2 (en) | Cleaning sheet | |
JP3740002B2 (en) | Cleaning sheet and substrate processing apparatus cleaning method using the same | |
JP4593761B2 (en) | Cleaning sheet and substrate processing apparatus cleaning method using the same | |
JP2002214271A (en) | Cleaning member and method for cleaning electrical continuity inspection device using the same | |
JP2002153823A (en) | Cleaning sheet and method for cleaning substrate treating device by using the same | |
JP2003190883A (en) | Cleaning sheet and cleaning method for substrate treatment device using the same | |
JP2003112128A (en) | Particle removal tape and method for cleaning with the same | |
JP2002018377A (en) | Cleaning sheet and method for cleaning substrate treating device by using the sheet | |
JP2002192084A (en) | Cleaning sheet and method of cleaning substrate treatment apparatus using the same | |
JP2002153824A (en) | Cleaning sheet and method for cleaning substrate treating device by using the same | |
JP2003190884A (en) | Label sheet with cleaning function | |
JP2002028582A (en) | Method for cleaning substrate treatment apparatus and cleaning sheet used therefor | |
JP2002201359A (en) | Cleaning sheet, and method for cleaning substrate- treating device using the same |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
AK | Designated states |
Kind code of ref document: A1 Designated state(s): CN KR SG US |
|
AL | Designated countries for regional patents |
Kind code of ref document: A1 Designated state(s): AT BE CH CY DE DK ES FI FR GB GR IE IT LU MC NL PT SE TR |
|
121 | Ep: the epo has been informed by wipo that ep was designated in this application | ||
DFPE | Request for preliminary examination filed prior to expiration of 19th month from priority date (pct application filed before 20040101) | ||
WWE | Wipo information: entry into national phase |
Ref document number: 2001926156 Country of ref document: EP |
|
WWE | Wipo information: entry into national phase |
Ref document number: 10297173 Country of ref document: US |
|
WWE | Wipo information: entry into national phase |
Ref document number: 018106811 Country of ref document: CN |
|
WWE | Wipo information: entry into national phase |
Ref document number: 1020027016584 Country of ref document: KR |
|
WWP | Wipo information: published in national office |
Ref document number: 1020027016584 Country of ref document: KR |
|
WWP | Wipo information: published in national office |
Ref document number: 2001926156 Country of ref document: EP |
|
WWG | Wipo information: grant in national office |
Ref document number: 2001926156 Country of ref document: EP |