WO2001084547A1 - Disc molding apparatus for compact disc - Google Patents

Disc molding apparatus for compact disc Download PDF

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Publication number
WO2001084547A1
WO2001084547A1 PCT/JP2001/003766 JP0103766W WO0184547A1 WO 2001084547 A1 WO2001084547 A1 WO 2001084547A1 JP 0103766 W JP0103766 W JP 0103766W WO 0184547 A1 WO0184547 A1 WO 0184547A1
Authority
WO
WIPO (PCT)
Prior art keywords
stamper
mold
mounting surface
disk
layer
Prior art date
Application number
PCT/JP2001/003766
Other languages
French (fr)
Japanese (ja)
Inventor
Kensuke Uemura
Raharjo Purwadi
Morioki Shibuya
Original Assignee
Itac Limited
Nagata Seiki Kabushiki Kaisha
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Itac Limited, Nagata Seiki Kabushiki Kaisha filed Critical Itac Limited
Priority to AU52666/01A priority Critical patent/AU5266601A/en
Publication of WO2001084547A1 publication Critical patent/WO2001084547A1/en

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Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29CSHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C45/00Injection moulding, i.e. forcing the required volume of moulding material through a nozzle into a closed mould; Apparatus therefor
    • B29C45/17Component parts, details or accessories; Auxiliary operations
    • B29C45/26Moulds
    • B29C45/263Moulds with mould wall parts provided with fine grooves or impressions, e.g. for record discs
    • B29C45/2632Stampers; Mountings thereof
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29CSHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C45/00Injection moulding, i.e. forcing the required volume of moulding material through a nozzle into a closed mould; Apparatus therefor
    • B29C45/17Component parts, details or accessories; Auxiliary operations
    • B29C45/26Moulds
    • B29C45/263Moulds with mould wall parts provided with fine grooves or impressions, e.g. for record discs
    • B29C45/2632Stampers; Mountings thereof
    • B29C2045/2634Stampers; Mountings thereof mounting layers between stamper and mould or on the rear surface of the stamper
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11BINFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B7/00Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
    • G11B7/24Record carriers characterised by shape, structure or physical properties, or by the selection of the material
    • G11B7/26Apparatus or processes specially adapted for the manufacture of record carriers
    • G11B7/263Preparing and using a stamper, e.g. pressing or injection molding substrates

Definitions

  • the present invention relates to a molding device for molding a compact disk, a magneto-optical disk, an optical disk, a laser disk, and the like.
  • a molding device for a disk such as a compact disk is provided with a stamper 52 which is a mold for molding a disk such as a compact disk, and a stamper 52 for fixing the stamper 52 in a cavity 51. And a mold 50 having a mounting surface 50c.
  • reference numeral 57 denotes a feeder mouth for injecting a resin material into the mold 50.
  • the mold 50 includes a fixed mold 50a, a movable mold 50b for opening and closing the mold 50, and a first mold for fixing the stamper 52 to the movable mold 50b. , Second holding members 55 and 56, a gate forming body 53 for forming a gate 53 a, and a gate cutting member 54.
  • the moving mold 50b is made of steel and quenched.
  • the moving die 50b is provided with the stamper mounting surface 50c.
  • the mounting surface 50c is hard-plated and polished with high precision.
  • the cavity 51 is a disk-shaped space formed when the fixed mold 50a and the movable mold 50b are closed.
  • the stamper 52 is a donut-shaped metal sheet. The inner peripheral edge of the central child is held by the cylindrical first holding member 55, and the outer peripheral edge of the stamper 52 is held by the second holding member 56, and comes into contact with the mounting surface 50c in the cavity 51 to be air-tightly fixed. Have been.
  • An air vent 56a is formed between the second holding member 56 and the fixed mold 50a in order to improve the injection of the molten resin material into the cavity 51.
  • the gate forming body 53 is air-tightly fixed in a central hole of the fixed mold 50a.
  • the gate cut member 54 is airtightly held in the cylindrical first holding member 55 so as to be movable rightward in the drawing.
  • the gate forming body 53 and the gate cut member 54 form a gate 53a communicating with the cavity 51.
  • the gate 53a is composed of a horizontal columnar passage and a disk-shaped passage intersecting the horizontal columnar passage.
  • the molten resin material to be a disk such as a compact disk is injected into the cavity 51 of the mold 50 through the gate 53a by the feeder mouth 57. This is solidified under pressure to form a disk on which the surface shape of the stamper 52 has been transferred.
  • the temperature of the molten resin material is usually 360 ° C.
  • the surface temperature of the side of the stamper in contact with the molten resin is 360 ° C.
  • the mounting surface of the moving-side mold 50b is 100 ° C.
  • the mounting surface of the stamper 52 to the movable mold 50b expands and contracts due to the action of heat and pressure.
  • molding is repeatedly performed using the mold 50.
  • the mounting surface of the stamper 52 to the moving die 50b is damaged by friction, causing cracks, and frequent replacement of the stamper.
  • the life of the entire disk forming apparatus such as a compact disk is shortened.
  • DLC diamond-like carbon
  • the number of usable shots is about 20,000 times, and the effect of improving the life is insufficient.
  • the present invention has been made in view of the above problems, and an object of the present invention is to provide a disk forming apparatus such as a compact disk which has a reduced manufacturing cost and a long life. Disclosure of the invention
  • the present invention includes a stamper that is a molding die of a disc such as a compact disc, and a mold having a mounting surface for fixing the stamper in a cavity.
  • the present invention relates to a disk forming apparatus for forming a disk to which a surface shape of a stamper is transferred by press-fitting a resin material into the cavity. '' Further, in order to achieve the above object, the disk forming apparatus of the present invention W
  • Both the mounting surface on the mold side and the mounting surface on the mold side are covered with a DLC layer, and the ratio of sp 3 bonds occupied by carbon in the DLC layer is 30% or more and 85% or less.
  • the Vickers hardness of the surface of the D1 layer is not less than 3000ks f / mm 2 (29.419 X 10 3 N / mm 2 ) and not more than 9000 kgf / mm 2 (88.260 X IO 3 N / mm 2 ).
  • the surface hardness of the DLC layer is higher than 3000 kgf / mm 2 (29.419 X 10 3 N / mm 2 ). Is also small, and sufficient durability cannot be obtained.
  • the ratio of sp 3 bonds exceeds 85%, the surface hardness of the DLC layer becomes larger than 9000 kgf / mm 2 (88.260 x 10 3 N / mm 2 ), but the ratio of SP 2 bonds decreases As a result, separation and cracking of the D1 layer is likely to occur due to an increase in internal stress.
  • both the mounting surface of the stamper on the side of the die and the mounting surface of the die side are covered with a DLC layer, and the sp 3 bond occupied by carbon in the DLC layer.
  • the surface hardness of the DLC layer is 3000 kgf / mm 2 (29.419 X 10 3 N / mm 2 ) Since it is less than 9000 kgf / mm 2 (88.260 X 10 3 N / mm 2 ), the mold and stamper have sufficient durability. As a result, the life of the entire disc forming apparatus is prolonged.
  • Hard material-hard material combination In this combination, the contact area A does not increase due to the load at the time of contact, but the shear stress s increases.
  • both the mounting surface on the mold on the stamper side and the mounting surface on the mold side are covered with the DLC layer, and the mounting surface on the stamper side and the die side Either one or both of the DLC layers formed on the mounting surface of the above is further coated with a polyfluorohydrocarbon layer.
  • the hardness of the polyfluorohydrocarbon layer is lower than the hardness of the DLC layer and the mounting surface of the stamper or the mold that is not covered by the DLC layer.
  • a soft polyfluorohydrocarbon layer is laminated on one or both of the hard DLC layers covering the stamper one-side mounting surface and the mold-side mounting surface. Therefore, the frictional force at the portion where the mounting surface on one side of the stamper and the mounting surface on the mold side contact each other is reduced. As a result, the durability of the stamper and the mold is improved, and the life of the entire disc forming apparatus is extended. Still further, in the disk forming apparatus of the present invention, one of the mounting surface on the mold on one side of the stamper and the mounting surface on the mold side is covered with a DLC layer, and the other of the one is polyfluorocarbonized. It is characterized by being covered with a hydrogen layer.
  • the hardness of the polyfluorocarbon hydrocarbon layer is desirably lower than the hardness of the stamper or the mold mounting surface on which the polyfluorocarbon hydrocarbon layer is covered, and the DLC layer.
  • one of the mounting surface of the stamper on the side of the die and the mounting surface of the die side is covered with the DLC layer of the guest, and The other is covered with a soft polyfluorohydrocarbon layer, and the other is harder than the polyfluorohydrocarbon layer. Therefore, the frictional force at the portion where the stamper-side mounting surface and the mold-side mounting surface are in contact with each other is reduced. It becomes smaller. As a result, the durability of the stamper and the mold is improved, and the life of the entire disc forming apparatus is extended.
  • the mounting surface on the mold side is covered with a DLC layer, and the DLC layer formed on the mounting surface on the mold side further comprises a polyfluorocarbon layer. Characterized by being coated with
  • the hardness of the polyfluorohydrocarbon layer is preferably lower than the hardness of the DLC layer and the hardness of the mounting surface on the stamper side.
  • a soft polyfluorohydrocarbon layer is laminated on a hard DLC layer covering the mold-side mounting surface, and the mounting surface on the stamper side is relatively thin. Since it is harder than the polyfluorohydrocarbon layer, the frictional force at the contact portion between the stamper-side mounting surface and the mold-side mounting surface is reduced. As a result, the durability of the stamper and the mold is improved, and the life of the entire disc forming apparatus is extended.
  • the mounting surface of the stamper on one side of the mold is covered with a DLC layer, and the DLC layer formed on the mounting surface of the stamper is further provided with a DLC layer. It is characterized by being covered with a polyfluorinated hydrocarbon layer.
  • the hardness of the polyfluorohydrocarbon layer is desirably lower than the hardness of the DLC layer and the hardness of the mounting surface on the mold side. ;
  • the soft polyfluorinated hydrocarbon layer is laminated on the hard DLC layer covering the mounting surface on one side of the stamper, and the mounting surface on the mold side is relatively small. Since it is harder than the polyfluorohydrocarbon layer, the frictional force at the contact portion between the stamper-side mounting surface and the mold-side mounting surface is reduced. As a result, the durability of the stamper and the mold is improved, and the life of the entire disk forming apparatus is extended.
  • the disk forming apparatus of the present invention is characterized in that, in addition to any one of the features described above, the surface roughness of the (! IX layer is 0.6 or less.
  • the surface roughness of the DLC layer is as small as 0.6 win or less and the surface is smooth, so that the shear stress s is reduced, and the stamper side mounting surface and the metal The frictional force at the point of contact with the mold side mounting surface is reduced. As a result, the durability of the stamper and the mold is improved, and the life of the entire disk forming apparatus is extended.
  • the surface of the DLC layer can be irradiated with oxygen by using the function attached to the sputtering apparatus. Can be reduced.
  • the disk forming apparatus of the present invention is characterized in that the sp 3 the ratio of binding is 85% or less than 30% the Vickers hardness of the surface of the diamond-like car carbon layer 3000kgf / mm 2 (29. 419 x lO 3 N / mm 2),. Or 9000 kgf / mrn 2 (88.260 X lO 3 N / mm 2 ) or less. If the ratio of sp 3 bonds to carbon atoms in the DLC layer is less than 30%, the surface hardness of the DLC layer becomes It is smaller than 3000 kgf / nrai 2 (29. 419 x 10 3 N / mm 2 ), and sufficient durability cannot be obtained.
  • the sp 3 bond ratio exceeds 85%, the surface hardness of the DLC layer becomes larger than 9000 kgf / mm 2 (88.260 X 10 3 N / mm 2 ), but the sp 2 bond ratio decreases. As a result, the internal stress increases, so that the separation and cracking of the DLC layer tends to occur.
  • both the mounting surface of the stamper on the side of the die and the mounting surface of the die side are covered with a DLC layer, and sp 3 occupied by carbon in the DLC layer. Since the bonding ratio is 30% or more and 85% or less, separation and cracking of the DLC layer are unlikely to occur, and the surface hardness of the DLC layer is 3000 kgf / ⁇ 2 (29.419 X 10 3 N / mm 2 ) Since it is not less than 9000 kgf / mm 2 (88.260 ⁇ 10 3 N / mm 2 ), the mold and the stamper have the effect of having sufficient durability.
  • any of the above-described disc forming apparatuses of the present invention various diamond thin film techniques may be used for the method of forming the DLC layer in the present invention.
  • various diamond thin film techniques may be used for the method of forming the DLC layer in the present invention.
  • the arc sputtering method it is possible to easily form a DLC layer having the characteristics of the present invention.
  • a magnetron sputtering apparatus can be used for the method of forming the polyfluorohydrocarbon layer, which reduces the manufacturing cost of the disk forming apparatus of the present invention. Can be suppressed.
  • FIG. 1 is a diagram showing a first embodiment of the present invention.
  • FIG. 2 is a diagram showing a second or third embodiment of the present invention.
  • FIG. 3 is a diagram schematically showing a sputtering apparatus used in the present invention.
  • FIG. 4 is a graph showing a phenomenon of reduction in surface roughness due to oxygen irradiation used in the present invention.
  • FIG. 5 is a diagram showing Table 1 showing combinations of layers covering respective mounting surfaces of a die and a stamper provided in a disk forming apparatus such as a compact disk of the present invention.
  • FIG. 6 is a diagram showing Table 2 showing the results of measuring the life by the number of serviceable shots of the stamper of the disk forming apparatus. '
  • FIG. 7 is a cross-sectional view showing a main part around a die of a disk forming apparatus such as a compact disk.
  • FIG. 1 shows an enlarged view of a part of the mounting portion of the stamper 52 to the mold 50 in the disk forming apparatus of the present invention as a first embodiment, and FIG. 2 as a second or third embodiment.
  • both the mounting surface 50c of the moving mold 50b and the mounting surface 52a of the stamper 52 are covered with the DLC layers 1 and 2.
  • the DL The ratio of sp 3 bonds occupied by carbon in the layer C is 85% or less than 30% Bidzukasu hardness of the surface of the DLC layer is 3000 kgf / Yuzuru 2 (29. 419 x lO 3 N / mm 2) or more 9000.
  • the surface roughness of the DLC layer is 0.6 rn or less.
  • the DLC layers 1 and 2 that cover both the mounting surface 52a on the stamper 52 side and the mounting surface 50c of the moving mold 50b as described above are provided by the arc sputtering device 4 shown in FIG. 3 and the magnet not shown.
  • a film can be easily formed by a sputtering method using an opening sputtering apparatus.
  • '' 5 is a vacuum deposition chamber
  • 6 is a gas inlet
  • 7 is a sample holder
  • 8 is a 1st target table
  • 9 is a 2nd target table
  • 10 is a sputtering power supply for a 2nd target.
  • the stamper 52 when a DLC layer is applied to the mounting surface 52a on the side of the stamper 52 used as a molding matrix, the stamper 52 is placed on the sample holder 7 in the vacuum film forming chamber 5.
  • the solid carbon as the target material on the first target base 8 is fixed.
  • One or more transition metal elements selected from the group consisting of titanium, tantalum, tungsten, molybdenum, and niobium are fixed as target materials on the second target table 9.
  • a gas selected from the group consisting of helium, neon, argon, and nitrogen is introduced from the gas inlet 6 into the vacuum film forming chamber 5, and the surface of the stamper 52 is ion-washed.
  • the metal on the second target table 9 is used as an evening gate to perform a transition of the transition metal element. Is preferably formed.
  • the pulse frequency of the pulse sputtering power supply 12 for the first target is set to 0.1 to 5 Hz, and the pulsed arc sputtering is performed using the solid carbon on the first target table 8 as a target.
  • the temperature of the DLC layer formed by pulse index notching will be over 100 ° C, and warpage will occur.
  • the surface hardness of the DLC layer is less than 3000 kgf / ram 2 (29.419 x 10 3 N / job 2 ). Poor, insufficient durability.
  • the ratio of sp 3 bonds of the DLC layer is more than 85%, the surface hardness of the DLC layer is 9000 kgf / ⁇ 2 (88. 260 x lO 3 N / mm
  • the ratio of sp 2 bonds in the DLC layer decreases.
  • the internal stress of the DLC layer increases, so that the separation and cracking of the DLC layer is likely to occur.
  • the ratio of sp 3 bonds in the carbon of the DLC layer is set to 30% or more and 85% or less.
  • the surface hardness is 3000 kgf / mm 2 (29.419 x lO
  • the surface of the DLC layer with oxygen from the gas inlet 6 in the vacuum film forming chamber 5.
  • This oxygen irradiation greatly reduces the surface roughness of the DLC layer to 0.6 m or less.
  • the surface of the DLC layer becomes smoother, the shear stress s is reduced, and the frictional force is significantly reduced, so that the life of the mold and the stamper in contact therewith can be prolonged. .
  • the process of forming the DLC layer and irradiating oxygen is repeated until the thickness of the DLC layer reaches a desired value in the range of 0.5 to 2.0 urn.
  • the pulse frequency of the first target pulse sputtering power supply 12 is set in the range of 10 to 30 Hz.
  • the process of forming the DLC layer and irradiating oxygen is repeated until the thickness of the DLC layer reaches a desired value in the range of 0.5 to 2.0 m.
  • both the mounting surface of the stamper on one side of the die and the mounting surface of the die side are covered with a DLC layer. Since the ratio of sp 3 bonds occupying is 30% or more and 85% or less, separation and cracking of the DLC layer are less likely to occur, and the surface hardness of the DLC layer is 3000 kgf / fuji 2 (29.419 x 10 3 N / mm 2 ) or more and 9000 kgf / customer 2 (88, 260 X 10 3 N / mm 2 ) or less, the mold and the stamper have sufficient durability. As a result, the life of the entire disc forming apparatus is prolonged.
  • the surface roughness of the DLC layer is as small as 0.6 x ra or less, and the surface is smooth, so that the shear stress s is small, and the mounting surface on one side of the stamper and the mold side This has the effect of reducing the frictional force at the contact portion with the mounting surface.
  • the durability of the stamper and the mold is further improved, and the life of the entire disc forming apparatus is further extended.
  • both the mounting surface 50c of the moving mold 50b and the mounting surface 52a on the stamper 52 side are covered with the DLC layers 1 and 2.
  • the DLC layer formed on the mounting surface 52a on the side of the stamper 52 is covered with the fluorinated hydrocarbon layer 3.
  • the thickness of the DLC layer is in the range of 0.5 to 3.0 m, and the thickness of the polyfluorohydrocarbon layer '3 is in the range of 1.0 ⁇ ra
  • the ratio of sp 3 bonds occupied by carbon in the DLC layer is 30% or more and 85% or less, and the hardness of the surface of the DLC layer is 3000 kgf / mm 2 (29.41 9 ⁇ 10 3 N / mm 2 ) or more and 9000 kgf / mm 2 (88.260 ⁇ 10 3 N / mra 2 ) or less.
  • the surface roughness of the DLC layer is preferably 0.6 ⁇ m or less.
  • a method of forming the DLC layers 1 and 2 on the mounting surface of the moving mold 50b and the stamper 52 and the polyfluorohydrocarbon layer on the DLC layer 2 of the stamper 52 in the second embodiment will be described.
  • a film is formed using the sputtering apparatus 4.
  • the formation of the DLC layers 1 and 2 on the mounting surface 50c of the movable mold 50b and the mounting surface 52a of the stamper 52 is performed by the same method as described in the first embodiment.
  • the stamper 52 whose mounting surface 52a is covered with the DLC layer 2 is placed in a magnetron sputtering apparatus.
  • Polyfluorohydrocarbon is used as a target material for magnetron sputtering.
  • Argon gas is introduced into the magnetron sputtering apparatus so that the pressure is in the range of 0.3 to 1.0 Pa.
  • the high frequency voltage of the sputtering power source for evening get was set to 4 kV and the frequency was set to 13.56 MHz, and magnetron sputtering was performed using polyfluorohydrocarbon as a target.
  • a polyfluorinated hydrocarbon layer is laminated on the DLC layer covering the mounting surface.
  • both the mounting surface 50c of the moving die 50b and the mounting surface 52a of the stamper 52 are covered with the DLC layers 1 and 2, and the mounting of the moving die 50b is performed.
  • DLC layer deposited on surface 50c This is a form covered with a hydrocarbon layer.
  • the thickness of the DLC layer is in the range of Q.5 to 3.0 jum, and the thickness of the polyfluorinated hydrocarbon layer 3 is in the range of 1 or less.
  • the ratio of sp 3 bonds occupied by carbon in the DLC layer is not less than 30 ° and not more than 85 °, and the hardness of the surface of the DLC layer is 3000 kgf7 sq. 2 (29.41 9 ⁇ 10 3 N / mm 2 ) It is preferably at least 9000 kgf / mra 2 (88.260 ⁇ 10 3 N / mm 2 ). Further, the surface roughness of the DLC layer is preferably not more than 0.6. '' The method of forming the DLC layer 2 and the polyfluorohydrocarbon layer 3 on the mounting surface of the moving mold 50b and the stamper 52 in the third embodiment is the same as the method described in the second embodiment. Done in a way.
  • the disk forming apparatus according to the present invention described in the second and third embodiments is characterized in that one of the hard DLC layer covering the one-side mounting surface of the stamper and the hard DLC layer covering the mounting surface on the mold side is provided with a soft polyfide hydrocarbon layer. Are laminated, so that the frictional force at the portion where the mounting surface on one side of the stamper and the mounting surface on the mold side contact each other is reduced. As a result, the durability of the stamper and the mold is improved, and the life of the entire disc forming apparatus is extended.
  • the ratio of sp 3 bonds occupied by carbon of the DLC layer of 85% or less than 303 ⁇ 4, the Pitsuka Ichisu hardness of the surface of the DLC layer 3000 kgf / Yuzuru 2 (29. 419 X '10 3 N / ram 2 ) or more and 9000 kgf / mm 2 (88.260 X 10 3 N / mm 2 ) or less, the separation and cracking of DLC hardly occur, and the mold and stamper must have sufficient durability. Becomes As a result, the life of the entire disc forming apparatus is further extended.
  • the surface roughness of the DLC layer was as small as 0.6 m or less, and the surface was smooth, so that the shear stress s was reduced. Frictional force at the point of contact with It has the effect of becoming. As a result, the durability of the stamper and the mold is further improved, and the life of the entire disc molding apparatus is further extended.
  • Table 1 shows combinations of layers covering the mounting surfaces 50c and 52a of the die and the stamper provided in the disk forming apparatus such as the compact disk of the present invention as Table 1.
  • the fourth and fifth embodiments are embodiments in which the manufacturing cost is minimized when manufacturing the disk forming apparatus of the present invention. It is desirable that the hardness of the polyfluorinated hydrocarbon layer is lower than the hardness of a mounting surface of a stamper or a mold covered with the polyfluorohydrocarbon layer.
  • the sixth embodiment is a form in which the life of the disk forming apparatus can be extended to the longest.
  • the seventh embodiment is a form of a disk forming apparatus that can obtain sufficient durability even by using a conventionally used stamper.
  • the hardness of the polyfluorocarbon layer is preferably lower than the hardness of the DLC layer and the hardness of the mounting surface on the stamper side which has been conventionally used.
  • a soft polyfluorinated hydrocarbon layer is laminated and coated on the hard DLC layer that covers the mold side mounting surface. Since the mounting surface on one side is relatively harder than the hydrocarbon layer, even in the case of a conventionally used stamper, the friction in the contact portion between the mounting surface on the stamper side and the mounting surface on the mold side. The force is reduced. As a result, it is possible to have sufficient durability as compared with the conventional disk forming apparatus.
  • the eighth embodiment is a form of a disk forming apparatus that can obtain sufficient durability even using a conventionally used mold.
  • the hardness of the polyfluorocarbon layer is preferably lower than the hardness of the DLC layer and the hardness of the mounting surface on the mold side which has been conventionally used.
  • the mounting surface on the-side is the hard film of the DLC layer and the soft film of the Since the mounting surface on the mold side is relatively harder than the polyfluorohydrocarbon layer, the mold used in the related art is a stano, one-side mounting. The frictional force at the contact point between the surface and the mold side mounting surface is reduced. As a result, it is possible to have sufficient durability as compared with the conventional disk forming apparatus.
  • a mold is placed on the sample holder 17 installed in the vacuum film formation chamber 5 in Fig. 3, and after exhausting the inside of the vacuum film formation chamber 5, argon ions are introduced from the gas inlet 6 to the surface of the mold.
  • argon ions are introduced from the gas inlet 6 to the surface of the mold.
  • titanium was placed on the second evening platform 9 and carbon was placed on the first evening platform 8.
  • the sputtering power source 10 for the second target was turned on, and a titanium layer was formed.
  • pulse sputtering was performed with the pulse frequency of the pulse sputtering power source 12 for the first evening set to 20 Hz.
  • oxygen irradiation was performed from the gas inlet 6 to smooth the surface. This pulsed padding and oxygen irradiation process was repeated twice.
  • the sp 3 bond content of carbon was 75%.
  • the surface had a Pickers hardness of 8000 kgf / mm 2 (78.453 ⁇ 10 3 N / drawing 2 ).
  • a CD copying stamper was placed on a sample holder 7 installed in a vacuum film forming chamber 5, and a pulse frequency of a sputtering power supply was set to 2 Hz, and a film was formed in the same manner as described above.
  • the sp 3 bond content of carbon was 70%.
  • the surface had a hardness of 6500 kgf / mm 2 (63.743 ⁇ 10 3 N / ram 2 ).
  • a compact disk was manufactured by a disk forming apparatus equipped with the above-mentioned mold and stamper. The life was measured by the number of durable shots of the stamper of the disk forming device. The results are shown in Table 6 in Table 2.
  • Magnet mouth Susuno A stamper is placed in the cutter, and polytetrafluoroethylene (Teflon, du Pont) is one of polyfluorocarbons under the conditions of high-frequency voltage of 4 kV, frequency of 13.65 MHz, and argon pressure of 0.8 Pa. Was used as a target to shine and shoot. A porous fluorocarbon layer was formed on the mounting surface on the sumper side without pores.
  • Teflon, du Pont polytetrafluoroethylene
  • a compact disk was manufactured by the disk forming apparatus equipped with the mold and the stamper.
  • the life was measured by the number of durable shots of the stamper of the disk forming device.
  • the results are shown in Table 6 in Table 2. '
  • the compact disk was manufactured by a disk forming device equipped with a mold and a stamper.
  • the life was measured by the number of durable shots of the stamper of the disk forming device. The results are shown in Table 6 in Table 2.
  • a mold having a DLC layer formed by the same method as in Example 1 was placed in a magnet opening sputtering apparatus, and a high-frequency voltage of 4 kV and a frequency of 13.
  • Polytetrafluoroethylene (Teflon, trade name of du Pont) one of polyfluorocarbons, was irradiated with magnetron under the conditions of 13.65 MHz and an argon pressure of 0.8 Pa.
  • a DLC-coated mold having a hydrogen fluoride layer on the surface was obtained. Its surface hardness was 30 kgf / fan 2 (294 N / ⁇ 2 ).
  • a DLC layer was formed on the mounting surface on the stamper side in the same manner as in Example 1.
  • the sp 3 bond content of carbon was 70%. Further, the surface thereof had a hardness of 6500 kgf / mm 2 (63.743 ⁇ 10 3 N / mm 2 ).
  • a compact disk was manufactured by a disk forming apparatus equipped with the above-mentioned mold and stamper. The life was measured by the number of durable shots on the stamper of the disk forming apparatus. The results are shown in Table 6 in Table 2.
  • the mold having the DLC layer formed in the same manner as in Example 1 was It is placed in a net mouth sprinkling device, and under the conditions of a high-frequency voltage of 4 kV, a frequency of 65 MHz, and an argon pressure of 0 ⁇ Pa, polytetrafluoroethylene (Teflon, trade name of du Pont) ) was used as a target for magnetron irradiation.
  • a DLC-coated mold having a polyfluorohydrocarbon layer on the surface was obtained. Its surface hardness was 30 kgf / mm 2 (294 N / ⁇ 2 ).
  • a compact disk was manufactured by a disk forming apparatus equipped with the above-mentioned mold and stamper. The life was measured by the number of durable shots of the stamper of the disk forming device. The results are shown in Table 6 in Table 2.
  • a conventional mold with a DLC layer generated only by the CVD method on the mounting surface on the mold side, and a conventional stamper without the DLC layer also having a polyfluorohydrocarbon layer '' was manufactured.
  • the life was measured by the number of durable shots of the stamper of the disk forming device. The results are shown in Table 6 in Table 2.
  • a DLC layer was formed only on the mounting surface on the mold side and only on the mounting surface on the stamper side by the CVD method.
  • a compact disk was manufactured by a conventional disk forming apparatus equipped with these conventional dies and stampers. The service life was measured by the number of serviceable shots of the stamper of the disk forming apparatus. The results are shown in Table 6 in Table 2.
  • FIG. 4 shows the results of irradiation with oxygen ions having an energy of 0.1 to 10 keV when the thickness of the DLC layer is about 2 in.
  • the present invention is suitable as a compact disk device, a magneto-optical disk, an optical disk, a laser disk, etc., which has a reduced production cost and a long service life.

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  • Manufacturing Optical Record Carriers (AREA)

Abstract

A disc molding apparatus comprising a mother die of disc, i.e. a stamper (52), and a die (50b) having a face (50c) for securing the stamper (52) in the cavity, and molding a disc having the surface shape of the stamper (52) transferred thereto by pressure feeding a molten resin material into the cavity, characterized in that both the face (52a) on the stamper (52) side being fixed to the die and the fixing face (50c) on the die (50b) side are coated with DLC layers (1, 2), the ratio of sp3 bond occupied by carbon in the DLC layers (1, 2) is in the range of 30%-85%, and Vickers hardness on the surface of the DLC layers (1, 2) is in the range of 3000 kgf/mm2 (29.419 103 N/mm2) -9000 kgf/mm2 (88.260 103 N/mm2). The disc molding apparatus is further characterized in that any one or both of the DLC layers (1, 2) is further coated with a polyfluorohydrocarbon layer (3).

Description

明 細 書 コンパクトディスクなどのディスク成形装置 技術分野 '  Description Disc molding equipment for compact discs, etc.Technical field ''
本発明は、 コンパクトディスク、光磁気ディスク、 光ディスク、 レー ザディスク等を成形するための成形装置に関する。  The present invention relates to a molding device for molding a compact disk, a magneto-optical disk, an optical disk, a laser disk, and the like.
背景技術 Background art
従来、 コンパクトディスクなどのディスクの成形装置は、 第 7図に示 すように、 コンパクトディスクなどのディスクの成形母型であるスタン パ一 52と、 キヤビティ 51内に前記スタンパ一 52を固定するための取付面 50c を有する金型 50とを備えている。 コンパクトディスクなどのディス クとなる溶融樹脂材料が前記キャビティ 51内に圧入されることによって 、 スタンパ一 52の表面制犬が転写されたディスクが成形される。  Conventionally, as shown in FIG. 7, a molding device for a disk such as a compact disk is provided with a stamper 52 which is a mold for molding a disk such as a compact disk, and a stamper 52 for fixing the stamper 52 in a cavity 51. And a mold 50 having a mounting surface 50c. By pressing a molten resin material to be a disc such as a compact disc into the cavity 51, a disc on which the surface control dog of the stamper 52 is transferred is formed.
第 7図において、 符号 57は金型 50内に樹脂材料を注入するためのフィ 一ダマウスを示している。  In FIG. 7, reference numeral 57 denotes a feeder mouth for injecting a resin material into the mold 50.
前記金型 50は、 固定側金型 50a と、前記金型 50の開閉 可能にするた めの移動側金型 50b と、前記スタンパ一 52を前記移動側金型 50b に固定 するための第 1, 第 2保持部材 55, 56 と、 ゲート 53a を形成するための ゲート形成体 53と、 ゲートカツト部材 54とを有する。 前記移動側金型 50 b は鋼から製作され焼き入れされたものである。 前記移動側金型 50b に 前記スタンパー取付面 50c が設けられている。 その取付面 50c には、硬 質めつきが施されて高精度に研磨されている。  The mold 50 includes a fixed mold 50a, a movable mold 50b for opening and closing the mold 50, and a first mold for fixing the stamper 52 to the movable mold 50b. , Second holding members 55 and 56, a gate forming body 53 for forming a gate 53 a, and a gate cutting member 54. The moving mold 50b is made of steel and quenched. The moving die 50b is provided with the stamper mounting surface 50c. The mounting surface 50c is hard-plated and polished with high precision.
前記キヤビティ 51は、前記固定側金型 50a と移動側金型 50b とが閉じ られた時に形成される円板状の空間である。 前記スタンパ一 52はドーナツ状金属シ一トである。 その中央の子しの内 周縁が筒状第 1保持部材 55により、前記スタンパー 52の外周縁が前記第 2保持部材 56により保持されて前記キヤビティ 51内の取付面 50c に接触 して気密に固定されている。 また、 前記キヤビティ 51内への溶融樹脂材 料の注入を良くするために前記第 2保持部材 56と前記固定側金型 50a と の間にはエア一ベント 56aが形成される。 The cavity 51 is a disk-shaped space formed when the fixed mold 50a and the movable mold 50b are closed. The stamper 52 is a donut-shaped metal sheet. The inner peripheral edge of the central child is held by the cylindrical first holding member 55, and the outer peripheral edge of the stamper 52 is held by the second holding member 56, and comes into contact with the mounting surface 50c in the cavity 51 to be air-tightly fixed. Have been. An air vent 56a is formed between the second holding member 56 and the fixed mold 50a in order to improve the injection of the molten resin material into the cavity 51.
前記ゲート形成体 53は前記固定側金型 50aの中央の孔に気密に固定さ れている。 l己ゲートカツト部材 54は前記筒状の第 1保持部材 55内に紙 面右方向に移動可能なように気密に保持されている。 ' 前記固定側金型 50a と前記移動側金型 50b が閉じられた時、前記ゲ一 ト形成体 53と前記ゲートカット部材 54とによってキヤビティ 51に通じる ゲ一卜 53aが形成される。 前記ゲ一ト 53a は、紙面水平方向の円柱状通 路と前記水平方向の円柱状通路に交差する円板状の通路とからなる。 前記フィ一ダマウス 57によってコンパクトディスクなどのディスクと なる溶融樹脂材料がゲ一ト 53aを通つて前記金型 50のキャビティ 51内に 注入される。 これを加圧固化することによって、 スタンパ一 52の表面形 状が転写されたディスクを成形する。 そして、前記ゲートカツト部材 54 が紙面右方向に移動すると前記ゲ一トカット部材 54のェッジ 54a と前記 固定側金型 50aの孔のエッジ 50d との剪断作用によりディスクの中央が 打ち抜かれる。 このようにして、 コンパクトディスクなどのディスクを- 製造する。  The gate forming body 53 is air-tightly fixed in a central hole of the fixed mold 50a. The gate cut member 54 is airtightly held in the cylindrical first holding member 55 so as to be movable rightward in the drawing. When the fixed mold 50a and the movable mold 50b are closed, the gate forming body 53 and the gate cut member 54 form a gate 53a communicating with the cavity 51. The gate 53a is composed of a horizontal columnar passage and a disk-shaped passage intersecting the horizontal columnar passage. The molten resin material to be a disk such as a compact disk is injected into the cavity 51 of the mold 50 through the gate 53a by the feeder mouth 57. This is solidified under pressure to form a disk on which the surface shape of the stamper 52 has been transferred. When the gate cutting member 54 moves to the right in the drawing, the center of the disk is punched out by the shearing action between the edge 54a of the gate cutting member 54 and the edge 50d of the hole of the fixed mold 50a. In this way, a disc such as a compact disc is manufactured.
前記溶融樹脂材料の は通常 360 °Cであることから、 スタンパーの 前記溶融樹脂と接触する側の表面温度は 360 °Cとなる。 一方、前記移動 側金型 50bへの取付面は 100 °Cである。 しかも高圧力で押されている。 そのため、 スタンパ一52の移動側金型 50bへの取付面は熱及び圧力の作 用により伸縮する。 その結果、前記金型 50を用いて繰り返し成形を行う と、前記スタンパ一52の移動側金型, 50bへの取付面は摩擦により損傷を 受けて亀裂を生じ、 スタンパーの頻繁な交換が必要となる。 その結果、 コンパクトディスクなどのディスク成形装置全体の寿命が短くなるとい う問題が生じた。 Since the temperature of the molten resin material is usually 360 ° C., the surface temperature of the side of the stamper in contact with the molten resin is 360 ° C. On the other hand, the mounting surface of the moving-side mold 50b is 100 ° C. Moreover, it is pressed with high pressure. Therefore, the mounting surface of the stamper 52 to the movable mold 50b expands and contracts due to the action of heat and pressure. As a result, molding is repeatedly performed using the mold 50. Then, the mounting surface of the stamper 52 to the moving die 50b is damaged by friction, causing cracks, and frequent replacement of the stamper. As a result, there has been a problem that the life of the entire disk forming apparatus such as a compact disk is shortened.
この問題を解決するために、金型のスタンパーと接触する部分の表面. を鏡面研磨したり、 TiN等で被覆する方法が提案された。 しかし、 充分 な耐摩耗性の向上と摩擦力低下は得られなかつた。  In order to solve this problem, a method has been proposed in which the surface of the portion of the mold that comes into contact with the stamper is mirror-polished or coated with TiN or the like. However, sufficient improvement in wear resistance and reduction in frictional force could not be obtained.
そこで、 金型のスタンパーと接触する部分の表面ゃスタンパーの金型 と接触する部分の表面に CVD法によってダイヤモンドライクカーボン ( 以下 DLC という) の薄膜を施す方法(特開平卜 234214号、 特開平 2 - 22 012号参照) が提案された。 これにより表面の耐摩耗性と低摩擦性はあ る程度得られる。  Therefore, a method of applying a thin film of diamond-like carbon (hereinafter referred to as DLC) to the surface of the portion of the mold that comes into contact with the stamper by the CVD method (JP-A-234214, JP-A-Heisei 2) -See 22 012). This provides a certain degree of surface wear resistance and low friction.
しかしながら、金型側の取付面 50cゃスタンパ一側の取付面 52a にの み DLC薄膜を施した場合、 耐用ショット数が 2万回程度と寿命の改良効 果は不十分である。  However, when the DLC thin film is applied only to the mounting surface 50c on the mold side and the mounting surface 52a on one side of the stamper, the number of usable shots is about 20,000 times, and the effect of improving the life is insufficient.
本発明は、上記問題を鑑みてなされたものであって、 その目的とする ところは、製作コストを抑え、 しかも長寿命を実現したコンパクトディ スクなどのディスク成形装置を提供することにある。 発明の開示  SUMMARY OF THE INVENTION The present invention has been made in view of the above problems, and an object of the present invention is to provide a disk forming apparatus such as a compact disk which has a reduced manufacturing cost and a long life. Disclosure of the invention
本発明は、 コンパクトディスクなどのディスクの成形母型であるス夕 ンパ一と、 キヤビティ内に前記スタンパーを固定するための取付面を有 する金型とを備え、 コンパクトディスクなどのディスクとなる溶融樹脂' 材料が前記キャビティ内に圧入されることによってス夕ンパ一の表面形 状が転写されたディスクを成形するディスク成形装置に関する。 ' 更に、 上記目的を達成するために本発明のディスク成形装置は、前記 W The present invention includes a stamper that is a molding die of a disc such as a compact disc, and a mold having a mounting surface for fixing the stamper in a cavity. The present invention relates to a disk forming apparatus for forming a disk to which a surface shape of a stamper is transferred by press-fitting a resin material into the cavity. '' Further, in order to achieve the above object, the disk forming apparatus of the present invention W
-側の金型への取付面及び前記金型側の取付面の双方が DLC層 により被覆されており、前記 DLC層中の炭素の占める sp3 結合の比率は 30%以上 85%以下であり、 前記 D1 層の表面のビッカース硬度は 3000ks f/mm2 (29. 419 X lO3 N/mm2 ) 以上 9000 kgf/mm2 (88. 260 X IO3 N/mm2 ) 以下であることを特徴とする。 Both the mounting surface on the mold side and the mounting surface on the mold side are covered with a DLC layer, and the ratio of sp 3 bonds occupied by carbon in the DLC layer is 30% or more and 85% or less. The Vickers hardness of the surface of the D1 layer is not less than 3000ks f / mm 2 (29.419 X 10 3 N / mm 2 ) and not more than 9000 kgf / mm 2 (88.260 X IO 3 N / mm 2 ). Features.
前言己 DLC層の中の炭素原子に占める sp3 結合の比率が 30% よりも小さ くなると、 DLC層の表面硬度は 3000 kgf/mm2 (29. 419 X lO3 N/mm2 ) よ りも小さくなり、 十分な耐久性が得られない。 一方 sp3 結合の比率が 85 % を超えると、 DLC層の表面硬度は 9000 kgf/mm2 (88. 260 x 103 N/mm2 ) よりも大きくなるが、 SP2 結合の比率が減少した結果内部応力が増大 するために、 D1 層の剝離ゃ亀裂が生じやすくなる。 Foreword When the ratio of sp 3 bonds to carbon atoms in the DLC layer is smaller than 30%, the surface hardness of the DLC layer is higher than 3000 kgf / mm 2 (29.419 X 10 3 N / mm 2 ). Is also small, and sufficient durability cannot be obtained. On the other hand, when the ratio of sp 3 bonds exceeds 85%, the surface hardness of the DLC layer becomes larger than 9000 kgf / mm 2 (88.260 x 10 3 N / mm 2 ), but the ratio of SP 2 bonds decreases As a result, separation and cracking of the D1 layer is likely to occur due to an increase in internal stress.
本発明のディスク成形装置は、前記スタンパ一側の金型への取付面及 び前記金型側の取付面の双方が DLC層により被覆されており、 前記 DLC 層中の炭素の占める sp3 結合の比率は 30%以上 85%以下であるので、 DL C層の剝離ゃ亀裂が生じにくく、 前記 DLC層の表面のピツカ一ス硬度は 3000kgf/mm2 (29. 419 X lO3 N/mm2 ) 以上 9000 kgf/mm2 (88. 260 X lO3 N/mm2 ) 以下であるので金型ゃスタンパ一は十分な耐久性有することと なる。 その結果、 ディスク成形装置全体の寿命が長くなる。 In the disc forming apparatus of the present invention, both the mounting surface of the stamper on the side of the die and the mounting surface of the die side are covered with a DLC layer, and the sp 3 bond occupied by carbon in the DLC layer. Is 30% or more and 85% or less, so that the separation and cracking of the DLC layer hardly occurs, and the surface hardness of the DLC layer is 3000 kgf / mm 2 (29.419 X 10 3 N / mm 2 ) Since it is less than 9000 kgf / mm 2 (88.260 X 10 3 N / mm 2 ), the mold and stamper have sufficient durability. As a result, the life of the entire disc forming apparatus is prolonged.
また、本発明は、バウデン外著、 曽田範宗訳 「固体の摩擦と潤滑」 19 70、 100-101 ページに記載の自然法則を利用してなされた。  Also, the present invention was made using the law of nature described in Bowden et al., Norimune Soda, “Friction and Lubrication of Solids,” 1970, pp. 100-101.
その自然法則とは、以下の通りである。  The natural laws are as follows.
一般に固体どうしを接触させる場合、 接触面積を A とすると、摩擦力 F は F=A X s で表される。 ここに、 s は接触に働く剪断応力である。 摩擦力を減らそうとするならば、 明らに A と s とはできるだけ小さく することが必要であるが、  In general, when solids are in contact with each other, if the contact area is A, the frictional force F is expressed as F = A X s. Where s is the shear stress acting on the contact. To reduce the friction force, it is obviously necessary to make A and s as small as possible,
1)硬質物-軟質物の組み合わせ: この組み合わせは、 剪断応力 s は小' さくなるが、接触時の荷重により軟質物が変形して接触面積 Aが大きく なる。 ' 1) Combination of hard material and soft material: This combination has a small shear stress s However, the soft material deforms due to the load at the time of contact, and the contact area A increases. '
2)硬質物-硬質物の組み合わせ: この組み合わせは、 接触面積 Aが接 触時の荷重によって大きくなることはないが、剪断応力 s が大きくなる  2) Hard material-hard material combination: In this combination, the contact area A does not increase due to the load at the time of contact, but the shear stress s increases.
3)硬質物-軟質薄膜-硬質物の組み合わせ (硬質物の表面上に軟らか い薄膜を被覆して硬質物同士を接触させた場合に相当) : この組み合わ せは、 接触面積 A及び剪断応力 s が共に小さくなる。 これは、 剪断応力 s は軟質薄膜の剪断応力となり、 同時に、 接触時の荷重は硬質物で支え られるため、 変形はほとんどなぐ、 大荷重に対しても接触面灘は小さ いままであるからである。 その結果、摩擦力 F=A X s は小さくなる。 以上から本発明は、 上記 3)の組み合わせとなるように、金型側取付面 とスタンパ一側取付面の薄膜被覆を考慮した。 3) Combination of hard material-soft thin film-hard material (corresponding to the case where hard materials are brought into contact with each other by coating a soft thin film on the surface of the hard material): This combination is based on the contact area A and the shear stress s. Are both smaller. This is because the shear stress s becomes the shear stress of the soft thin film, and at the same time, the load at the time of contact is supported by a hard material, so there is almost no deformation, and the contact surface remains small even for large loads. . As a result, the frictional force F = A X s decreases. From the above, the present invention has considered the thin film coating of the mold-side mounting surface and the stamper-side mounting surface so as to be a combination of the above 3).
従って、 本発明のディスク成形装置は、 スタンパー側の金型への取付 面及び金型側の取付面の双方が DLC層により被覆されており、前記スタ ンパ一側の取付面及び前記金型側の取付面に成膜された DLC層の何れか —方若しくは両方が、更に、 ポリフッ化炭化水素層によって被覆されて' いることを特徴とする。  Therefore, in the disk forming apparatus of the present invention, both the mounting surface on the mold on the stamper side and the mounting surface on the mold side are covered with the DLC layer, and the mounting surface on the stamper side and the die side Either one or both of the DLC layers formed on the mounting surface of the above is further coated with a polyfluorohydrocarbon layer.
前記ポリフッ化炭化水素層の硬度は、前記 DLC層及び DLC層により被 覆されていないスタンパ一または金型の取付面の硬度よりも低いことが 望ましい。  It is desirable that the hardness of the polyfluorohydrocarbon layer is lower than the hardness of the DLC layer and the mounting surface of the stamper or the mold that is not covered by the DLC layer.
上言己構成の本発明のディスク成形装置によれば、 スタンパ一側取付面 と金型側取付面を被覆する硬質な DLC層の何れか一方若しくは両方に軟 質のポリフッ化炭化水素層が積層されるので、 スタンパ一側取付面と金 型側取付面が接触する部分の摩擦力が小さくなる。 その結果、 スタンパ —及び金型の耐久性が向上し、 ディスク成形装置全体の寿命も延びる。 更にまた、 本発明のディスク成形装置は、 スタンパ一側の金型への取 付面及び金型側の取付面のいずれか一方が DLC層により被覆されており 、前記一方に対する他方がポリフッ化炭化水素層によって被覆されてい ることを特徴とする。 According to the disk forming apparatus of the present invention having the above configuration, a soft polyfluorohydrocarbon layer is laminated on one or both of the hard DLC layers covering the stamper one-side mounting surface and the mold-side mounting surface. Therefore, the frictional force at the portion where the mounting surface on one side of the stamper and the mounting surface on the mold side contact each other is reduced. As a result, the durability of the stamper and the mold is improved, and the life of the entire disc forming apparatus is extended. Still further, in the disk forming apparatus of the present invention, one of the mounting surface on the mold on one side of the stamper and the mounting surface on the mold side is covered with a DLC layer, and the other of the one is polyfluorocarbonized. It is characterized by being covered with a hydrogen layer.
前記ポリフッィ匕炭化水素層の硬度は、前記ポリフッ.化炭化水素層が被 覆されるスタンパ一や金型の取付面の硬度及び DLC層よりも低いことが 望ましい。 ,. 上記構成の本発明のディスク成形装置によれば、 スタンパ一側の金型 への取付面及び金型側の取付面のいずれか一方が硬賓の DLC層により被 覆され、前記一方に対する他方が軟質のポリフッ化炭化水素層によって 被覆され、 前記他方は前記ポリフッ化炭化水素層に比べて硬質であるの で、 スタンパ一側取付面と金型側取付面が接触する部分の摩擦力が小さ くなる。 その結果、 スタンパ一及び金型の耐久性が向上し、 ディスク成 形装置全体の寿命も延びる。  The hardness of the polyfluorocarbon hydrocarbon layer is desirably lower than the hardness of the stamper or the mold mounting surface on which the polyfluorocarbon hydrocarbon layer is covered, and the DLC layer. According to the disk forming apparatus of the present invention having the above-described configuration, one of the mounting surface of the stamper on the side of the die and the mounting surface of the die side is covered with the DLC layer of the guest, and The other is covered with a soft polyfluorohydrocarbon layer, and the other is harder than the polyfluorohydrocarbon layer. Therefore, the frictional force at the portion where the stamper-side mounting surface and the mold-side mounting surface are in contact with each other is reduced. It becomes smaller. As a result, the durability of the stamper and the mold is improved, and the life of the entire disc forming apparatus is extended.
また、 本発明のディスク成形装置は、金型側の取付面が DLC層により 被覆されており、、前記金型側の取付面に成膜された DLC層が、 更に、 ポ リフッ化炭化水素層によつて被覆されていることを特徴とする。  Further, in the disk forming apparatus of the present invention, the mounting surface on the mold side is covered with a DLC layer, and the DLC layer formed on the mounting surface on the mold side further comprises a polyfluorocarbon layer. Characterized by being coated with
前記ポリフッ化炭化水素層の硬度は、前記 DLC層の硬度及びスタンパ —側の取付面の硬度よりも低いことが望ましい。  The hardness of the polyfluorohydrocarbon layer is preferably lower than the hardness of the DLC layer and the hardness of the mounting surface on the stamper side.
上記構成の本発明のディスク成形装置によれば、金型側取付面を被覆 する硬質な DLC層の上に軟質のポリフッ化炭化水素層が積層され、 ス夕 ンパー側の取付面は比較的前記ポリフッ化炭化水素層よりも硬質である ので、 スタンパ一側取付面と金型側取付面との接触部分における摩擦力 が小さくなる。 その結果、 スタンパ一及び金型の耐久性が向上し、 ディ スク成形装置全体の寿命も延びる。 ■ また、本発明のディスク成形装置は、前記スタンパ一側の金型への取 付面が DLC層により被覆されており、 前記スタンパ一側の取付面に成膜 された DLC層が、更に、 ポリフツ化炭化水素層によって被覆されている ことを特徴とする。 According to the disk forming apparatus of the present invention having the above configuration, a soft polyfluorohydrocarbon layer is laminated on a hard DLC layer covering the mold-side mounting surface, and the mounting surface on the stamper side is relatively thin. Since it is harder than the polyfluorohydrocarbon layer, the frictional force at the contact portion between the stamper-side mounting surface and the mold-side mounting surface is reduced. As a result, the durability of the stamper and the mold is improved, and the life of the entire disc forming apparatus is extended. In the disk forming apparatus of the present invention, the mounting surface of the stamper on one side of the mold is covered with a DLC layer, and the DLC layer formed on the mounting surface of the stamper is further provided with a DLC layer. It is characterized by being covered with a polyfluorinated hydrocarbon layer.
前記ポリフッ化炭化水素層の硬度は、前記 DLC層の硬度及び金型側の 取付面の硬度よりも低いことが望ましい。 ;  The hardness of the polyfluorohydrocarbon layer is desirably lower than the hardness of the DLC layer and the hardness of the mounting surface on the mold side. ;
上記構成の本発明のディスク成形装置によれば、 スタンパ一側の取付 面を被覆する硬質な DLC層の上に軟質のポリフツ化炭化水素層が積層さ れ、金型側の取付面は比較的前記ポリフッ化炭化水素層よりも硬質であ るので、 スタンパ一側取付面と金型側取付面との接触部分における摩擦 力が小さくなる。 その結果、 スタンパ一及び金型の耐久性が向上し、 デ. イスク成形装置全体の寿命も延びる。  According to the disk forming apparatus of the present invention having the above configuration, the soft polyfluorinated hydrocarbon layer is laminated on the hard DLC layer covering the mounting surface on one side of the stamper, and the mounting surface on the mold side is relatively small. Since it is harder than the polyfluorohydrocarbon layer, the frictional force at the contact portion between the stamper-side mounting surface and the mold-side mounting surface is reduced. As a result, the durability of the stamper and the mold is improved, and the life of the entire disk forming apparatus is extended.
また、 本発明のディスク成形装置は、上記記載のいずれかの特徴に加 えて、 前記!) IX層の表面粗さが 0. 6 以下であることを特徴とする。 上記構成の本発明のディスク成形装置によれば、前記 DLC層の表面粗 さが 0. 6 w in以下と小さく、表面が滑らかであるので剪断応力 s が小さ くなり、 スタンパー側取付面と金型側取付面との接触部分における摩擦 力が小さくなる。 その結果、 スタンパ一及び金型の耐久性が向上し、 デ イスク成形装置全体の寿命も延びる。  The disk forming apparatus of the present invention is characterized in that, in addition to any one of the features described above, the surface roughness of the (!) IX layer is 0.6 or less. According to the disk forming apparatus of the present invention having the above configuration, the surface roughness of the DLC layer is as small as 0.6 win or less and the surface is smooth, so that the shear stress s is reduced, and the stamper side mounting surface and the metal The frictional force at the point of contact with the mold side mounting surface is reduced. As a result, the durability of the stamper and the mold is improved, and the life of the entire disk forming apparatus is extended.
前記 DLC層の表面粗さを所望値まで低減する方法として、酸素照射が ある。 前記 DLC層の成膜をスパッタリング装置によって行った場合、 ス パッタリング装置に附属の機能を利用して DLC層の表面に酸素照射を行 うことができるので、本発明のディスク成形装置の製造コストを抑える ことができる。  As a method for reducing the surface roughness of the DLC layer to a desired value, there is oxygen irradiation. When the DLC layer is formed by a sputtering apparatus, the surface of the DLC layer can be irradiated with oxygen by using the function attached to the sputtering apparatus. Can be reduced.
また、 本発明のディスク成形装置は、前記 D1 層中の炭素の占める sp 3 結合の比率は 30%以上 85%以下であり、前記ダイヤモンドライクカー ボン層の表面のビッカース硬度は 3000kgf/mm2 (29. 419 x lO3 N/mm2 ) ,. 以上 9000 kgf/mrn2 (88. 260 X lO3 N/mm2 ) 以下であることを特徴とする 前記 DLC層の中の炭素原子に占める sp3 結合の比率が 30% よりも小さ くなると、 DLC層の表面硬度は 3000 kgf/nrai2 (29. 419 x lO3 N/mm2 ) よ りも小さくなり、十分な耐久性が得られない。 一方 sp3 結合の比率が 85 % を超えると、 DLC層の表面硬度は 9000 kgf/mm2 (88. 260 X lO3 N/mm2 ) よりも大きくなるが、 sp2結合の比率が減少した結果内部応力が増大 するために、 DLC層の剝離ゃ亀裂が生じやすくなる。 Further, the disk forming apparatus of the present invention is characterized in that the sp 3 the ratio of binding is 85% or less than 30% the Vickers hardness of the surface of the diamond-like car carbon layer 3000kgf / mm 2 (29. 419 x lO 3 N / mm 2),. Or 9000 kgf / mrn 2 (88.260 X lO 3 N / mm 2 ) or less.If the ratio of sp 3 bonds to carbon atoms in the DLC layer is less than 30%, the surface hardness of the DLC layer becomes It is smaller than 3000 kgf / nrai 2 (29. 419 x 10 3 N / mm 2 ), and sufficient durability cannot be obtained. On the other hand, when the sp 3 bond ratio exceeds 85%, the surface hardness of the DLC layer becomes larger than 9000 kgf / mm 2 (88.260 X 10 3 N / mm 2 ), but the sp 2 bond ratio decreases. As a result, the internal stress increases, so that the separation and cracking of the DLC layer tends to occur.
前言己本発明のディスク成形装置は、前記スタンパ一側の金型への取付 面及び前記金型側の取付面の双方が DLC層により被覆されており、前記 DLC層中の炭素の占める sp3 結合の比率は 30%以上 85%以下であるので 、 DLC層の剝離ゃ亀裂が生じにくく、前記 DLC層の表面のピツカ一ス硬 度は 3000kgf/删 2 (29. 419 X lO3 N/mm2 ) 以上 9000 kgf/mm2 (88. 260 X 103 N/mm2 ) 以下であるので金型ゃスタンパ一は十分な耐久性有すると いう効果を奏する。 その結果、 ディスク成形装置全体の寿命が長くなる 更に、 上述のいずれの本発明のディスク成形装置においても、 前記本 発明中の DLC層の成膜方法については種々のダイヤモンド薄膜技術を用 いることができるが、 アークスパッタリング法によると本発明の特徴を 有する DLC層の成膜が容易にできる。 According to the disk forming apparatus of the present invention, both the mounting surface of the stamper on the side of the die and the mounting surface of the die side are covered with a DLC layer, and sp 3 occupied by carbon in the DLC layer. Since the bonding ratio is 30% or more and 85% or less, separation and cracking of the DLC layer are unlikely to occur, and the surface hardness of the DLC layer is 3000 kgf / 删2 (29.419 X 10 3 N / mm 2 ) Since it is not less than 9000 kgf / mm 2 (88.260 × 10 3 N / mm 2 ), the mold and the stamper have the effect of having sufficient durability. As a result, the life of the entire disc forming apparatus is prolonged.In any of the above-described disc forming apparatuses of the present invention, various diamond thin film techniques may be used for the method of forming the DLC layer in the present invention. However, according to the arc sputtering method, it is possible to easily form a DLC layer having the characteristics of the present invention.
加えて、 前記ポリフッ化炭化水素層の成膜をする場合、 前記ポリフッ ィ匕炭化水素層の成膜方法についてもマグネトロンスパッタリング装置を 使用することができるので、本発明のディスク成形装置の製造コストを 抑えることができる。 図面の簡単な説明 In addition, when forming the polyfluorohydrocarbon layer, a magnetron sputtering apparatus can be used for the method of forming the polyfluorohydrocarbon layer, which reduces the manufacturing cost of the disk forming apparatus of the present invention. Can be suppressed. BRIEF DESCRIPTION OF THE FIGURES
第 1 図は、本発明の第 ί ©実施形態を示す図である。  FIG. 1 is a diagram showing a first embodiment of the present invention.
第 2 図は、本発明の第 2若しくは第 3の実施形態を示す図である。 第 3 図は、 本発明において使用したスパッタリング装置の概略を示す-, 図である。  FIG. 2 is a diagram showing a second or third embodiment of the present invention. FIG. 3 is a diagram schematically showing a sputtering apparatus used in the present invention.
第 4図は、 本発明において用いた酸素照射による表面粗さの低減の現 象を示したグラフである。  FIG. 4 is a graph showing a phenomenon of reduction in surface roughness due to oxygen irradiation used in the present invention.
第 5 図は、本発明のコンパクトディスクなどのディスク成形装置に備 えられる金型及びスタンパ一のそれぞれの取付面を被覆する層の組み合 わせを表した表 1を示す図である。 ' 第 6 図は、 ディスク成形装置のスタンパ一耐用ショット数によって寿 命を測定した結果を表す表 2を示す図である。 '  FIG. 5 is a diagram showing Table 1 showing combinations of layers covering respective mounting surfaces of a die and a stamper provided in a disk forming apparatus such as a compact disk of the present invention. 'FIG. 6 is a diagram showing Table 2 showing the results of measuring the life by the number of serviceable shots of the stamper of the disk forming apparatus. '
第 7 図は、 コンパクトディスク等のディスク成形装置の金型周辺の要 部を示す断面図である。 発明を実施するための最良の形態  FIG. 7 is a cross-sectional view showing a main part around a die of a disk forming apparatus such as a compact disk. BEST MODE FOR CARRYING OUT THE INVENTION
以下、 本発明の実施形態例を図面に基づいて説明する。  Hereinafter, embodiments of the present invention will be described with reference to the drawings.
本発明の装置全体の構造は、第 7図に示したディスク成形装置と同様 であり、第 7図と異なるところは、金型 50へのスタンパ一 52の取付部で ある。 本発明のデイスク成形装置における金型 50へのスタンパ一 52の取 付部の一部分 Β の拡大図を第 1実施形態として第 1図に第 2若しくは第 3実施形態として第 2図に示す。  The structure of the entire apparatus of the present invention is the same as that of the disk forming apparatus shown in FIG. 7, and the difference from FIG. 7 lies in the mounting portion of the stamper 52 to the mold 50. FIG. 1 shows an enlarged view of a part of the mounting portion of the stamper 52 to the mold 50 in the disk forming apparatus of the present invention as a first embodiment, and FIG. 2 as a second or third embodiment.
[第 1実施形態]  [First Embodiment]
第 1図において、 移動側金型 50b の取付面 50c及びスタンパ一52側の 取付面 52aの双方が DLC層 1, 2 により被覆されている。 そして、 その DL C層中の炭素の占める sp3 結合の比率は 30%以上 85%以下であり、前記 DLC層の表面のビヅカース硬度は 3000kgf/讓 2 (29. 419 x lO3 N/mm2 ) 以上 9000. kgf/醒 2 (88. 260 X lO3 N/mra2 ) 以下である。 その DLC層の表 面粗さは、 0. 6 rn以下である。 In FIG. 1, both the mounting surface 50c of the moving mold 50b and the mounting surface 52a of the stamper 52 are covered with the DLC layers 1 and 2. And the DL The ratio of sp 3 bonds occupied by carbon in the layer C is 85% or less than 30% Bidzukasu hardness of the surface of the DLC layer is 3000 kgf / Yuzuru 2 (29. 419 x lO 3 N / mm 2) or more 9000. kgf / Awake 2 (88.260 X 10 3 N / mra 2 ) or less. The surface roughness of the DLC layer is 0.6 rn or less.
上記のようなスタンパ一 52側の取付面 52a及び移動側金型 50bの取付 面 50c の双方を被覆する DLC層 1, 2 は、第 3図に示すアークスパッタリ ング装置 4及び図示されていないマグネト口ンスパッタリング装置を使 用してスパッタリング法により容易に成膜されることができる。 ' 符号 5 は真空成膜室、 6 はガス導入口、 7はサンプルホルダ一、 8 は 第 1タ一ゲット台、 9 は第 2タ一ゲット台、 10は第 2タ一ゲット用スパ ッタリング電源 (DC 35Y, 55〜180A) 、 11はターンテーブル、 12は第 1 タ一ゲット用パルススパッタリング電源、 13はガスをイオン化するため の電源 (DC 61V, 0. 5A以下) を示している。 前記夕一ンテ一ブル 11は、 スパッタリングが行われている間、点 0 を中心に矢印の方向に回転する 上記スパッ夕リング装置 4 を用いて DLC層 1, 2の成膜の方法を説明す る。  The DLC layers 1 and 2 that cover both the mounting surface 52a on the stamper 52 side and the mounting surface 50c of the moving mold 50b as described above are provided by the arc sputtering device 4 shown in FIG. 3 and the magnet not shown. A film can be easily formed by a sputtering method using an opening sputtering apparatus. '' 5 is a vacuum deposition chamber, 6 is a gas inlet, 7 is a sample holder, 8 is a 1st target table, 9 is a 2nd target table, and 10 is a sputtering power supply for a 2nd target. (DC 35Y, 55 to 180A), 11 is a turntable, 12 is a pulse sputtering power source for the first target, and 13 is a power source for ionizing gas (DC 61V, 0.5A or less). The above-mentioned evening table 11 rotates in the direction of the arrow around the point 0 while sputtering is performed. The method of forming the DLC layers 1 and 2 using the above-mentioned sputtering apparatus 4 will be described. You.
例えば、 成形母型として用いられるスタンパ一 52側の取付面 52aに DLC 層を施す場合、 前記スタンパ一52を真空成膜室 5 内のサンプルホルダー- 7の上に置く。 第 1タ一ゲット台 8上のターゲット材としての固体力一 ボンを固定する。 チタン、 タンタル、 タングステン、 モリブデン、 ニォ ブからなる群から選ばれた 1種または 2種以上の遷移金属元素を第 2タ —ゲット台 9上のターゲット材として固定する。 For example, when a DLC layer is applied to the mounting surface 52a on the side of the stamper 52 used as a molding matrix, the stamper 52 is placed on the sample holder 7 in the vacuum film forming chamber 5. The solid carbon as the target material on the first target base 8 is fixed. One or more transition metal elements selected from the group consisting of titanium, tantalum, tungsten, molybdenum, and niobium are fixed as target materials on the second target table 9.
前記真空成膜室 5 内にガス導入口 6 から、 ヘリウム、 ネオン、 ァルゴ ン、窒素なる群から選ばれるガスを導入し、 スタンパ一 52の表面をィォ ン洗净する。 ここにおいて、後の DLC層成膜工程における DLC層の付着 を著し く増大させるために、 第 2タ一ゲット台 9上の金属を夕一ゲッ卜として ァ一クスパッ夕リングして遷移金属元素の成膜を行うことが好ましい。 第 1タ一ゲット用パルススパッタリング電源 12のパルス周波数を 0. 1 〜5Hz とし、第 1タ一ゲット台 8上の固体力一ボンをタ一ゲットとして パルスアークスパッタリングする。 A gas selected from the group consisting of helium, neon, argon, and nitrogen is introduced from the gas inlet 6 into the vacuum film forming chamber 5, and the surface of the stamper 52 is ion-washed. Here, in order to remarkably increase the adhesion of the DLC layer in the subsequent DLC layer film forming step, the metal on the second target table 9 is used as an evening gate to perform a transition of the transition metal element. Is preferably formed. The pulse frequency of the pulse sputtering power supply 12 for the first target is set to 0.1 to 5 Hz, and the pulsed arc sputtering is performed using the solid carbon on the first target table 8 as a target.
スタンパーの場合、 パルス周波数が 5 より高いと、'パルスァ一クス ノ ツタリングにより形成される DLC層の温度は 100 °C以上となり、 反り を生ずる。  In the case of a stamper, if the pulse frequency is higher than 5, the temperature of the DLC layer formed by pulse index notching will be over 100 ° C, and warpage will occur.
また DLC層の中の炭素原子に占める sp3 結合の比率が 30% よりも下回 ると、 DLC層の表面硬度は 3000 kgf/ram2 (29. 419 x lO3 N/職2 ) よりも 劣り、十分な耐久性が得られない。 一方、 DLC層内の sp3 結合の比率が 85% を超えると、 DLC層の表面硬度は 9000 kgf /顧 2 (88. 260 x lO3 N/mmWhen the ratio of sp 3 bonds to carbon atoms in the DLC layer is less than 30%, the surface hardness of the DLC layer is less than 3000 kgf / ram 2 (29.419 x 10 3 N / job 2 ). Poor, insufficient durability. On the other hand, when the ratio of sp 3 bonds of the DLC layer is more than 85%, the surface hardness of the DLC layer is 9000 kgf /顧 2 (88. 260 x lO 3 N / mm
2 ) を越えるが DLC層内の sp2 結合の比率が減少する。 その結果、 DLC 層の内部応力が増大するために、 DLC層の剝離ゃ亀裂が生じやすくなる 従って DLC層の炭素に占める sp3 結合の比率は 30%以上 85¾以下とな るようにまた、 その表面のピツカ一ス硬度は 3000kgf/mm2 (29. 419 x lO 2 ), but the ratio of sp 2 bonds in the DLC layer decreases. As a result, the internal stress of the DLC layer increases, so that the separation and cracking of the DLC layer is likely to occur.Therefore, the ratio of sp 3 bonds in the carbon of the DLC layer is set to 30% or more and 85% or less. The surface hardness is 3000 kgf / mm 2 (29.419 x lO
3 N/mra2 ) 以上 9000 kgf/贿 2 (88. 260 x lO3 N/mm2 ) 以下となるように DLC の成膜を; ^う。 3 N / mra 2 ) or more and 9000 kgf / 贿2 (88. 260 x 10 3 N / mm 2 ) or less;
更に、前記 DLC層の表面に向け前記真空成膜室 5内のガス導入口 6 か" ら酸素を照射することが好ましい。 この酸素照射により DLC層の表面粗 さを 0. 6 m以下に大幅に低減する。 DLC層の表面が滑らかになり、剪 断応力 s が小さくなり、摩擦力は著しく減少する。 その結果、金型及び これに接触するスタンパ一の寿命を—層長くすることが出来る。 前記 DLC層の成膜と酸素照射のプロセスは DLC層の厚みが所望の値 0. 5〜2. 0 urn の範囲に達す'るまで反復する。 ' 前記移動側金型 50b側の取付面 50c の表面上に DLC薄膜を成膜する場 合も上記と同様な工程によって行うことができる。 この場合、第 1ター ゲット用パルススパッタリング電源 12のパルス周波数を 10〜30 Hz の範 囲にする。 そして、 DLC層の成膜と酸素照射のプロセスは DLC層の厚み が所望の値 0. 5〜2. 0 mの範囲に達するまで反復する。 Further, it is preferable to irradiate the surface of the DLC layer with oxygen from the gas inlet 6 in the vacuum film forming chamber 5. This oxygen irradiation greatly reduces the surface roughness of the DLC layer to 0.6 m or less. The surface of the DLC layer becomes smoother, the shear stress s is reduced, and the frictional force is significantly reduced, so that the life of the mold and the stamper in contact therewith can be prolonged. . The process of forming the DLC layer and irradiating oxygen is repeated until the thickness of the DLC layer reaches a desired value in the range of 0.5 to 2.0 urn. 'When a DLC thin film is formed on the surface of the mounting surface 50c on the side of the moving die 50b, the same process as described above can be performed. In this case, the pulse frequency of the first target pulse sputtering power supply 12 is set in the range of 10 to 30 Hz. The process of forming the DLC layer and irradiating oxygen is repeated until the thickness of the DLC layer reaches a desired value in the range of 0.5 to 2.0 m.
上記構造の本発明のディスク成形装諮ま、前記スタンパ一側の金型へ の取付面及び前記金型側の取付面の双方が DLC層により被覆されており 、前言己 DLC層中の炭素の占める sp3 結合の比率は 30%以上 85%以下であ るので、 DLC層の剝離ゃ亀裂が生じにくく、前記 DLC層の表面のピツカ —ス硬度は 3000kgf /藤2 (29. 419 x lO3 N/mm2 ) 以上 9000 kgf /顧 2 (88, 260 X lO 3 N/mm2 ) 以下であるので金型ゃスタンパ一は十分な耐久性有. することとなる。 その結果、 ディスク成形装置全体の寿命が長くなる。 加えて、酸素照、射をした場合、前記 DLC層の表面粗さが 0. 6 x ra以下 と小さく、 表面が滑らかであるので剪断応力 s が小さくなり、 スタンパ 一側取付面と金型側取付面との接触部分における摩擦力が小さくなると いう効果を有する。 その結果、 スタンパ一及び金型の耐久性が更に向上 し、 ディスク成形装置全体の寿命も更に延びる。 'According to the disk molding apparatus of the present invention having the above structure, both the mounting surface of the stamper on one side of the die and the mounting surface of the die side are covered with a DLC layer. Since the ratio of sp 3 bonds occupying is 30% or more and 85% or less, separation and cracking of the DLC layer are less likely to occur, and the surface hardness of the DLC layer is 3000 kgf / fuji 2 (29.419 x 10 3 N / mm 2 ) or more and 9000 kgf / customer 2 (88, 260 X 10 3 N / mm 2 ) or less, the mold and the stamper have sufficient durability. As a result, the life of the entire disc forming apparatus is prolonged. In addition, when irradiated with oxygen, the surface roughness of the DLC layer is as small as 0.6 x ra or less, and the surface is smooth, so that the shear stress s is small, and the mounting surface on one side of the stamper and the mold side This has the effect of reducing the frictional force at the contact portion with the mounting surface. As a result, the durability of the stamper and the mold is further improved, and the life of the entire disc forming apparatus is further extended. '
[第 2実施形態] [Second embodiment]
第 2実施形 は、 第 2図において、移動側金型 50b の取付面 50c及び スタンパー 52側の取付面 52a の双方が DLC層 1, 2 により被覆されている 。 前記スタンパ一 52側の取付面 52aに成膜された DLC層が、 ポリフッ化 炭化水素層 3 によって被覆されている。 DLC層の膜厚は 0. 5〜3. 0 m の範囲にあり、 ポリフッ化炭化水素層' 3 の膜厚は 1. 0 ^raの範囲にある そして、 その DLC層中の炭素の占める sp3 結合の比率は 30%以上 85% 以下であり、前記 DLC層の表面のピツカ一ス硬度は 3000kgf/mm2 (29. 41 9 X 103 N/mm2 ) 以上 9000 kgf/mm2 (88. 260 X 103 N/mra2 ) 以下である ことが好ましい。 更に、 その DLC層の表面粗さは、 0. 6 um以下である' ことが好ましい。 In the second embodiment, in FIG. 2, both the mounting surface 50c of the moving mold 50b and the mounting surface 52a on the stamper 52 side are covered with the DLC layers 1 and 2. The DLC layer formed on the mounting surface 52a on the side of the stamper 52 is covered with the fluorinated hydrocarbon layer 3. The thickness of the DLC layer is in the range of 0.5 to 3.0 m, and the thickness of the polyfluorohydrocarbon layer '3 is in the range of 1.0 ^ ra The ratio of sp 3 bonds occupied by carbon in the DLC layer is 30% or more and 85% or less, and the hardness of the surface of the DLC layer is 3000 kgf / mm 2 (29.41 9 × 10 3 N / mm 2 ) or more and 9000 kgf / mm 2 (88.260 × 10 3 N / mra 2 ) or less. Further, the surface roughness of the DLC layer is preferably 0.6 μm or less.
前記第 2実施形態における移動側金型 50b及びスタンパ一 52の取付面 上の DLC層 1, 2及びス夕ンパ一 52の DLC層 2上のポリフッ化炭化水素層 の成膜の方法を説明する。 第 1実施形態と同様にスパッタリング装置 4 を用いて成膜を行う。  A method of forming the DLC layers 1 and 2 on the mounting surface of the moving mold 50b and the stamper 52 and the polyfluorohydrocarbon layer on the DLC layer 2 of the stamper 52 in the second embodiment will be described. . As in the first embodiment, a film is formed using the sputtering apparatus 4.
前記移動側金型 50b の取付面 50c及び前記スタンパ一 52の取付面上 52 aへの DLC層 1, 2 の成膜は、上記第 1実施形態において説明と同様な方 法によって行う。  The formation of the DLC layers 1 and 2 on the mounting surface 50c of the movable mold 50b and the mounting surface 52a of the stamper 52 is performed by the same method as described in the first embodiment.
次に、前記取付面 52aが DLC層 2 によって被覆されたスタンパ一 52を マグネトロンスパッ夕リング装置内に配置する。 マグネトロンスパッ夕 リングのタ一ゲット材としてポリフッ化炭化水素を使用する。  Next, the stamper 52 whose mounting surface 52a is covered with the DLC layer 2 is placed in a magnetron sputtering apparatus. Polyfluorohydrocarbon is used as a target material for magnetron sputtering.
前記マグネトロンスパッタリング装置内にァルゴンガスを導入して 0. 3 〜1. 0Paの範囲の圧力下にする。  Argon gas is introduced into the magnetron sputtering apparatus so that the pressure is in the range of 0.3 to 1.0 Pa.
夕一ゲット用スパッタリング電源の高周波電圧を 4kV に、周波数を 13 . 56MHzに設定し、 ポリフッ化炭化水素をターゲットとしてマグネトロン スパッタリングする。 前記取付面を被覆する DLC層の上にポリフツ化炭 化水素層が積層される。  The high frequency voltage of the sputtering power source for evening get was set to 4 kV and the frequency was set to 13.56 MHz, and magnetron sputtering was performed using polyfluorohydrocarbon as a target. A polyfluorinated hydrocarbon layer is laminated on the DLC layer covering the mounting surface.
[第 3実施形態]  [Third embodiment]
第 3実施形態は、 第 2図において、移動側金型 50b の取付面 50c及び スタンパー 52側の取付面 52aの双方が DLC層 1,2 により被覆されており 、前記移動側金型 50b の取付面 50c に成膜された DLC層が、 ポリフッ化 炭化水素層によって被覆されている形態である。 DLC層の膜厚は Q. 5 ~ 3. 0 jum の範囲にあり、 ポリフツ化炭化水素層 3 の膜厚は 1 以下の 範囲にある。 In the third embodiment, in FIG. 2, both the mounting surface 50c of the moving die 50b and the mounting surface 52a of the stamper 52 are covered with the DLC layers 1 and 2, and the mounting of the moving die 50b is performed. DLC layer deposited on surface 50c This is a form covered with a hydrocarbon layer. The thickness of the DLC layer is in the range of Q.5 to 3.0 jum, and the thickness of the polyfluorinated hydrocarbon layer 3 is in the range of 1 or less.
そして、 その DLC層中の炭素の占める sp3 結合の比率は 30¾以上 85¾ 以下であり、 前記 DLC層の表面のピツカ一ス硬度は 3000kgf7讓 2 (29. 41 9 x lO3 N/mm2 ) 以上 9000 kgf/mra2 (88. 260 X 103 N/mm2 ) 以下である ことが好ましい。 更に、 その DLC層の表面粗さは、 0. 6 以下である • ことが好ましい。 ' 前記第 3実施形態における移動側金型 50b及びスタンパ一52の取付面 上の DLC層 2及びポリフッ化炭化水素層 3 の成膜の方法は、上記第 2 実施形態で説明した方法と同様な方法で行われる。 The ratio of sp 3 bonds occupied by carbon in the DLC layer is not less than 30 ° and not more than 85 °, and the hardness of the surface of the DLC layer is 3000 kgf7 sq. 2 (29.41 9 × 10 3 N / mm 2 ) It is preferably at least 9000 kgf / mra 2 (88.260 × 10 3 N / mm 2 ). Further, the surface roughness of the DLC layer is preferably not more than 0.6. '' The method of forming the DLC layer 2 and the polyfluorohydrocarbon layer 3 on the mounting surface of the moving mold 50b and the stamper 52 in the third embodiment is the same as the method described in the second embodiment. Done in a way.
前記第 2, 第 3実施形態に記載の本発明のディスク成形装置は、 スタ ンパ一側取付面と金型側取付面を被覆する硬質な DLC層の何れか一方に 軟質のポリフッィ匕炭化水素層が積層されるので、 スタンパ一側取付面と 金型側取付面が接触する部分の摩擦力が小さくなる。 その結果、 スタン パー及び金型の耐久性が向上し、 ディスク成形装置全体の寿命も延びる  The disk forming apparatus according to the present invention described in the second and third embodiments is characterized in that one of the hard DLC layer covering the one-side mounting surface of the stamper and the hard DLC layer covering the mounting surface on the mold side is provided with a soft polyfide hydrocarbon layer. Are laminated, so that the frictional force at the portion where the mounting surface on one side of the stamper and the mounting surface on the mold side contact each other is reduced. As a result, the durability of the stamper and the mold is improved, and the life of the entire disc forming apparatus is extended.
, 更に、 前記 DLC層中の炭素の占める sp3 結合の比率を 30¾以上 85%以 下とし、 前記 DLC層の表面のピツカ一ス硬度を 3000kgf/讓 2 (29. 419 X ' 103 N/ram2 ) 以上 9000 kgf /mm2 (88. 260 X lO3 N/mm2 ) 以下とした場合 、 DLC曆の剝離や亀裂が生じにくいうえに、 金型ゃスタンパ一は十分な 耐久性有することとなる。 その結果、 ディスク成形装置全体の寿命が更 に長くなる。 Further, the ratio of sp 3 bonds occupied by carbon of the DLC layer of 85% or less than 30¾, the Pitsuka Ichisu hardness of the surface of the DLC layer 3000 kgf / Yuzuru 2 (29. 419 X '10 3 N / ram 2 ) or more and 9000 kgf / mm 2 (88.260 X 10 3 N / mm 2 ) or less, the separation and cracking of DLC hardly occur, and the mold and stamper must have sufficient durability. Becomes As a result, the life of the entire disc forming apparatus is further extended.
加えて、 酸素照射をした は、前記 DLC層の表面粗さが 0. 6 m以 下と小さく、表面が滑らかであるので剪断応力 s が小さくなり、 スタン パー側取付面と金型側取付面との接触部分における摩擦力が更に小さく なるという効果を有する。 その結果、 スタンパ一及び金型の耐久性が更 に向上し、 ディスク成形装置全体の寿命も更に延びる。 In addition, when the oxygen irradiation was performed, the surface roughness of the DLC layer was as small as 0.6 m or less, and the surface was smooth, so that the shear stress s was reduced. Frictional force at the point of contact with It has the effect of becoming. As a result, the durability of the stamper and the mold is further improved, and the life of the entire disc molding apparatus is further extended.
次に、 本発明のコンパクトディスクなどのディスク成形装置に備えら れる金型及びスタンパーのそれぞれの取付面 50c, 52a を被覆する層の組 み合わせを表 1として第 5 図に示す。  Next, Table 1 shows combinations of layers covering the mounting surfaces 50c and 52a of the die and the stamper provided in the disk forming apparatus such as the compact disk of the present invention as Table 1.
第 4実施形態及び第 5実施形態は、 本発明のディスク成形装置を製造 するにあたって、製造コストが極力抑えられる形態である。 前記ポリフ ッ化炭化水素層の硬度は、 前記ポリフッ化炭化水素層が被覆されるスタ ンパーや金型の取付面の硬度よりも低いことが望ましい。  The fourth and fifth embodiments are embodiments in which the manufacturing cost is minimized when manufacturing the disk forming apparatus of the present invention. It is desirable that the hardness of the polyfluorinated hydrocarbon layer is lower than the hardness of a mounting surface of a stamper or a mold covered with the polyfluorohydrocarbon layer.
第 6実施形態は、 ディスク成形装置の寿命を最長に延ばすことが可能 な形態である。  The sixth embodiment is a form in which the life of the disk forming apparatus can be extended to the longest.
第 7実施形態は、 従来から使用されているスタンパーを使用しても十 分な耐久性を得ることのできるディスク成形装置の形態である。 ポリフ .ッ化炭化水素層の硬度は、 DLC層の硬度及び従来から使用されているス タンパー側の取付面の硬度よりも低いことが好ましい。  The seventh embodiment is a form of a disk forming apparatus that can obtain sufficient durability even by using a conventionally used stamper. The hardness of the polyfluorocarbon layer is preferably lower than the hardness of the DLC layer and the hardness of the mounting surface on the stamper side which has been conventionally used.
金型側取付面を被覆する硬質な DLC層の上に軟質のポリフツ化炭化水 素層が積層され被覆され、 スタンノ、。一側の取付面は比較的前記ポリフッ ィ匕炭化水素層よりも硬質であるので、 従来から使用されているスタンパ —であってもスタンパー側取付面と金型側取付面との接触部分における 摩擦力が低減される。 その結果、 従来のディスク成形装置に比べ'て十分 な耐久性を有することができる。  A soft polyfluorinated hydrocarbon layer is laminated and coated on the hard DLC layer that covers the mold side mounting surface. Since the mounting surface on one side is relatively harder than the hydrocarbon layer, even in the case of a conventionally used stamper, the friction in the contact portion between the mounting surface on the stamper side and the mounting surface on the mold side. The force is reduced. As a result, it is possible to have sufficient durability as compared with the conventional disk forming apparatus.
第 8実施形態は、従来から使用されている金型を使用しても十分な耐 久性を得ることのできるディスク成形装置の形態である。 ポリフッ化炭 化水素層の硬度は、 DLC層の硬度及び従来から使用されている金型側の 取付面の硬度よりも低いことが好ましい。  The eighth embodiment is a form of a disk forming apparatus that can obtain sufficient durability even using a conventionally used mold. The hardness of the polyfluorocarbon layer is preferably lower than the hardness of the DLC layer and the hardness of the mounting surface on the mold side which has been conventionally used.
-側の取付面が DLC層の硬質膜とポリフッ化炭化水素層の軟 質膜とで積層されて被覆され、金型側の取付面は比較的前記ポリフッ化 炭化水素層よりも硬質であるので、従来から使用されている金型であつ, てもスタンノ、一側取付面と金型側取付面との接触部分における摩擦力が 低減される。 その結果、 従来のディスク成形装置に比べて十分な耐久性 を有することができる。 The mounting surface on the-side is the hard film of the DLC layer and the soft film of the Since the mounting surface on the mold side is relatively harder than the polyfluorohydrocarbon layer, the mold used in the related art is a stano, one-side mounting. The frictional force at the contact point between the surface and the mold side mounting surface is reduced. As a result, it is possible to have sufficient durability as compared with the conventional disk forming apparatus.
[実施例 1]  [Example 1]
(DLC層を有する金型の作成)  (Creation of mold with DLC layer)
第 3図の真空成膜室 5 内に設置されたサンプルホルダ一 7 に金型を置 き、 真空成膜室 5 内を排気後、 ガス導入口 6 からアルゴンイオンを導入 し、金型の表面をイオン洗浄した。 次に第 2夕一ゲット台 9 にチタンを 、第 1夕一ゲット台 8 にカーボンを配置した。 まず、 第 2タ一ゲット用 スパッタリング電源 10を入れ、 チタン層を成膜した。 ついで、第 1夕一 ゲット用パルススパッタリング電源 12のパルス周波数を 20 Hz としてパ ルスァ一クスパッタリングを行った。 最後にガス導入口 6 から酸素照射 を行って表面を平滑化した。 このパルスァ一クスパッダリングと酸素照 射のプロセスを 2回反復した。  A mold is placed on the sample holder 17 installed in the vacuum film formation chamber 5 in Fig. 3, and after exhausting the inside of the vacuum film formation chamber 5, argon ions are introduced from the gas inlet 6 to the surface of the mold. Was subjected to ion washing. Next, titanium was placed on the second evening platform 9 and carbon was placed on the first evening platform 8. First, the sputtering power source 10 for the second target was turned on, and a titanium layer was formed. Next, pulse sputtering was performed with the pulse frequency of the pulse sputtering power source 12 for the first evening set to 20 Hz. Finally, oxygen irradiation was performed from the gas inlet 6 to smooth the surface. This pulsed padding and oxygen irradiation process was repeated twice.
得られた DLC層のラマンスぺクトルを測定した結果、炭素の sp3 結合 含有率は 75% であった。 また の表面のピツカ一ス硬度は 8000 kgf/mm2 (78. 453 X 103 N/画2 ) であった。 As a result of measuring the Raman spectrum of the obtained DLC layer, the sp 3 bond content of carbon was 75%. The surface had a Pickers hardness of 8000 kgf / mm 2 (78.453 × 10 3 N / drawing 2 ).
(DLC層を有するスタンパ一の作成)  (Create stamper with DLC layer)
真空成膜室 5 内に設置されたサンプルホルダー 7 に CD複写用スタンパ —を置き、 スパッタリング電源のパルス周波数を 2 Hzとして、 上記と同 様な方法につて成膜を行つた。  A CD copying stamper was placed on a sample holder 7 installed in a vacuum film forming chamber 5, and a pulse frequency of a sputtering power supply was set to 2 Hz, and a film was formed in the same manner as described above.
得られた DLC層のラマンスぺクトルを測定した結果、炭素の sp3 結合 含有率は 70% であった。 またその表面のピツカ一ス硬度は 6500 kgf/mm2 (63. 743 X 103 N/ram2 ) であった。 上記金型とスタンパ一を備えたディスク成形装置によってコンパクト ディスクの製造を行った。 ディスク成形装置のスタンパ一耐用ショット 数によって寿命を測定した。 その結果を表 2として第 6 図に示す。 As a result of measuring the Raman spectrum of the obtained DLC layer, the sp 3 bond content of carbon was 70%. In addition, the surface had a hardness of 6500 kgf / mm 2 (63.743 × 10 3 N / ram 2 ). A compact disk was manufactured by a disk forming apparatus equipped with the above-mentioned mold and stamper. The life was measured by the number of durable shots of the stamper of the disk forming device. The results are shown in Table 6 in Table 2.
[実施例 2]  [Example 2]
(DLC層を有する金型の作成) ' 実施例 1 と同様な方法によって金型側の取付面に DLC層を生成した。  (Preparation of Mold Having DLC Layer) 'A DLC layer was formed on the mold-side mounting surface in the same manner as in Example 1.
(ポリフッ化炭化水素層を有するス夕ンパ一の作成) (Preparation of glass with polyfluorocarbon layer)
マグネト口ンスノ、。ッタリング装置内にスタンパーを置き、高周波電圧 4kV、周波数 13. 65MHz、 アルゴン圧力 0. 8 Paの条件でポリフッ化炭化水 素の一つであるポリテトラフルォロエチレン(du Pont社商品名テフロン ) をタ一ゲットとしてマグネト口ン照、射した。 ス夕ンパー側の取付面に 気孔のないボリフッ化炭化水素層を生成した。  Magnet mouth Susuno ,. A stamper is placed in the cutter, and polytetrafluoroethylene (Teflon, du Pont) is one of polyfluorocarbons under the conditions of high-frequency voltage of 4 kV, frequency of 13.65 MHz, and argon pressure of 0.8 Pa. Was used as a target to shine and shoot. A porous fluorocarbon layer was formed on the mounting surface on the sumper side without pores.
上記金型とスタンパーを備えたディスク成形装置によってコンパクト ディスクの製造を行った。 ディスク成形装置のスタンパ一耐用ショット 数によって寿命を測定した。 その結果を表 2として第 6図に示す。 ' A compact disk was manufactured by the disk forming apparatus equipped with the mold and the stamper. The life was measured by the number of durable shots of the stamper of the disk forming device. The results are shown in Table 6 in Table 2. '
[実施例 3] [Example 3]
(DLC層を有する金型の作成)  (Creation of mold with DLC layer)
実施例 1 と同様な方法によって金型側の取付面に DLC層を生成した。  In the same manner as in Example 1, a DLC layer was formed on the mounting surface on the mold side.
(DLC層及びポリフッ化炭化水素層を有するスタンパ一の作成) 実施例 1 と同様な方法によって成膜された DLC層を有するスタンパ一 をマグネトロンスパッタリング装置内に置き、高周波電圧 4kV、周波数 13. 65MHz. アルゴン圧力 0. 8 Faの条件でポリフッ化炭化水素の一つであ るポリテトラフルォロエチレン(du Pont社商品名テフロン) をタ一ゲッ トとしてマグネトロン照射した。 表面にポリフッ化炭ィ匕水素層を有す ¾ DLC被覆スタンパ一が得られた。 その表面硬度は 50kgf/腿2 (490N/mm2 ) であった。 ' (Preparation of a stamper having a DLC layer and a polyfluorohydrocarbon layer) A stamper having a DLC layer formed by the same method as in Example 1 was placed in a magnetron sputtering apparatus, and a high-frequency voltage of 4 kV and a frequency of 13.65 MHz were used. Magnetron irradiation was performed using a target of polytetrafluoroethylene (Teflon, trade name of du Pont), which is one of polyfluorohydrocarbons, under an argon pressure of 0.8 Fa. Has a polyfluorocarbon layer on the surface. A DLC coated stamper was obtained. Its surface hardness was 50 kgf / thigh 2 (490 N / mm 2 ). '
上言己金型とスタンパ一を備えたディスク成形装置によってコンパクト ディスクの製造を行った。 ディスク成形装置のスタンパ一耐用ショット 数によって寿命を測定した。 その結果を表 2として第 6図に示す。  The compact disk was manufactured by a disk forming device equipped with a mold and a stamper. The life was measured by the number of durable shots of the stamper of the disk forming device. The results are shown in Table 6 in Table 2.
[実施例 4]  [Example 4]
(DLC層及びポリフッ化炭化水素層を有する金型の作成) , 実施例 1 と同様な方法によって成膜された DLC層を有する金型をマグ ネト口ンスパツタリング装置内に置き、高周波電圧 4kV、 周波数 13. 65M Hz、 ァルゴン圧力 0. 8 Paの条件でボリフッ化炭化水素の一つであるポリ テトラフルォロエチレン(du Pont社商品名テフロン) を夕一ゲットとし てマグネトロン照射した。 表面にポリフッ化炭ィ匕水素層を有する DLC被 覆金型が得られた。 その表面硬度は 30kgf/扇2 (294N/瞧 2 ) であった。 (Creation of a mold having a DLC layer and a polyfluorohydrocarbon layer), a mold having a DLC layer formed by the same method as in Example 1 was placed in a magnet opening sputtering apparatus, and a high-frequency voltage of 4 kV and a frequency of 13. Polytetrafluoroethylene (Teflon, trade name of du Pont), one of polyfluorocarbons, was irradiated with magnetron under the conditions of 13.65 MHz and an argon pressure of 0.8 Pa. A DLC-coated mold having a hydrogen fluoride layer on the surface was obtained. Its surface hardness was 30 kgf / fan 2 (294 N / 瞧2 ).
(DLC層有するスタンパーの作成) (Create stamper with DLC layer)
実施例 1 と同様な方法によってスタンパー側の取付面に DLC層を生成 した。  A DLC layer was formed on the mounting surface on the stamper side in the same manner as in Example 1.
得られた DLC層のラマンスぺクトルを測定した結果、炭素の sp3 結合 含有率は 70%であった。 またその表面のピツカ一ス硬度は 6500 kgf/mm2 (63. 743 x lO3 N/mm2 ) であった。 As a result of measuring the Raman spectrum of the obtained DLC layer, the sp 3 bond content of carbon was 70%. Further, the surface thereof had a hardness of 6500 kgf / mm 2 (63.743 × 10 3 N / mm 2 ).
上記金型とスタンパ一を備えたディスク成形装置によってコンパクト ディスクの製造を行った。 ディスク成形装置のスタンパ一耐用シヨット 数によって寿命を測定した。 その結果を表 2として第 6図に示す。  A compact disk was manufactured by a disk forming apparatus equipped with the above-mentioned mold and stamper. The life was measured by the number of durable shots on the stamper of the disk forming apparatus. The results are shown in Table 6 in Table 2.
[実施例 5]  [Example 5]
(DLC層及びポリフッ化炭化水素層を有する金型の作成)  (Preparation of mold with DLC layer and polyfluorocarbon layer)
実施例 1 と同様な方法によって成膜された DLC層を有する金型をマグ ネト口ンスパッ夕リング装置内に置き、高周波電圧 4kV、周波数 . 65M Hz、 ァルゴン圧力 0. δ Paの条件でポリフッ化炭化水素の一つであるポリ テトラフルォロエチレン(du Pont社商品名テフロン) をタ一ゲッ トとし てマグネトロン照射した。 表面にポリフッ化炭化水素層を有する DLC被 覆金型が得られた。 その表面硬度は 30kgf/mm2 (294N/瞧 2 ) であった。 The mold having the DLC layer formed in the same manner as in Example 1 was It is placed in a net mouth sprinkling device, and under the conditions of a high-frequency voltage of 4 kV, a frequency of 65 MHz, and an argon pressure of 0 δ Pa, polytetrafluoroethylene (Teflon, trade name of du Pont) ) Was used as a target for magnetron irradiation. A DLC-coated mold having a polyfluorohydrocarbon layer on the surface was obtained. Its surface hardness was 30 kgf / mm 2 (294 N / 瞧2 ).
(DLC層及びポリフッ化炭化水素層を有するスタンパ一の作成) 実施例 3 と同様な方法によって表面にポリフッ化炭化水素層を有する DLC被覆スタンパ一が得られた。 その表面硬度は 50kgf /顧2 (490 N/ram2 )であった。 (Preparation of Stamper Having DLC Layer and Polyfluorohydrocarbon Layer) A DLC-coated stamper having a polyfluorohydrocarbon layer on the surface was obtained in the same manner as in Example 3. Its surface hardness was 50 kgf / customer 2 (490 N / ram 2 ).
上記金型とスタンパ一を備えたディスク成形装置によってコンパクト ディスクの製造を行った。 ディスク成形装置のスタンパ一耐用ショット 数によって寿命を測定した。 その結果を表 2として第 6図に示す。  A compact disk was manufactured by a disk forming apparatus equipped with the above-mentioned mold and stamper. The life was measured by the number of durable shots of the stamper of the disk forming device. The results are shown in Table 6 in Table 2.
[比較例 1]  [Comparative Example 1]
金型及びスタンパーの両方が、 DLC層もポリフッ化炭化水素層も有し ない従来のディスク成形装置について、 コンパク卜ディスクの製造を行 つた。 ディスク成形装置のスタンパ一耐用ショット数によって寿命を測 定した。 その結果を表 2として第 6図に示す。  Compact discs were manufactured on conventional disc forming equipment where neither the mold nor the stamper had a DLC layer or a polyfluorocarbon layer. The life was measured by the number of durable shots of the stamper of the disk forming device. The results are shown in Table 6 in Table 2.
[比較例 2]  [Comparative Example 2]
金型側の取付面のみに CVD法によって DLC層が生成された従来の金型 と、 DLC層もポリフッ化炭化水素層を有しない従来のスタンパーを備え'' た従来のディスク成形装置によってコンパクトディスクの製造を行った 。 ディスク成形装置のスタンパ一耐用ショット数によって寿命を測定し た。 その,結果を表 2として第 6図に示す。  A conventional mold with a DLC layer generated only by the CVD method on the mounting surface on the mold side, and a conventional stamper without the DLC layer also having a polyfluorohydrocarbon layer '' Was manufactured. The life was measured by the number of durable shots of the stamper of the disk forming device. The results are shown in Table 6 in Table 2.
[比較例 3]  [Comparative Example 3]
-側の取付面のみに CVD法によって DLC層が生成された従来 のスタンパーと、 DLC層もポリフッ化炭ィヒ水素層を有しない従来の金型 を備えた従来のディスク成形装置によってコンパクトディスクの製造を 行った。 ディスク成形装置のスタンパ一耐用ショット数によって寿命を 測定した。 その結果を表 2として第 6図に示す。 . ヽConventional method in which a DLC layer is generated only on the-side mounting surface by CVD Compact discs were manufactured using a stamper and a conventional disk forming device equipped with a conventional mold that had neither a DLC layer nor a hydrogen fluoride layer. The life was measured by the number of durable shots of the stamper of the disk forming device. The results are shown in Table 6 in Table 2.ヽ
[比較例 4] [Comparative Example 4]
金型側の取付面のみ及びスタンパー側の取付面のみに CVD法によって DLC層を生成した。 これらの従来の金型とスタンパ一を備えた従来のデ イスク成形装置によってコンパクトディスクの製造を行った。 ディスク 成形装置のスタンパ一耐用ショット数に,よって寿命を測定した。 その結 果を表 2として第 6図に示す。  A DLC layer was formed only on the mounting surface on the mold side and only on the mounting surface on the stamper side by the CVD method. A compact disk was manufactured by a conventional disk forming apparatus equipped with these conventional dies and stampers. The service life was measured by the number of serviceable shots of the stamper of the disk forming apparatus. The results are shown in Table 6 in Table 2.
表 2から明らかなように、 本発明によれば、 150万回以上のショッ卜 が可能であり、比較例に比べ寿命が延びていることが判る。  As is clear from Table 2, according to the present invention, 1.5 million shots or more are possible, and it is found that the life is extended as compared with the comparative example.
[実施例 6]  [Example 6]
DLC層の表面粗さは被覆される基材 (金型或いはスタンパ一) の表面 粗さに依存しているが、酸素照射によって DLC層の表面粗さを低下させることが可能である。 DLC層の厚みがおよそ 2 inの場合、 0. 1 〜10ke V のエネルギ "をもつ酸素ィォンを照射した結果を第 4図に示す。  Although the surface roughness of the DLC layer depends on the surface roughness of the substrate (mold or stamper) to be coated, the surface roughness of the DLC layer can be reduced by irradiation with oxygen. FIG. 4 shows the results of irradiation with oxygen ions having an energy of 0.1 to 10 keV when the thickness of the DLC layer is about 2 in.
前記 DLC層の表面粗さが 0. 6 urn以下の範囲まで低減されると、金型側 の取付面及びスタンパー側の取付面の双方が硬質の DLC層で被覆された ^であっても摩擦力が十分に低減され、 耐久性が良くなる。 産業上の利用可能性 When the surface roughness of the DLC layer is reduced to a range of 0.6 urn or less, even if both the mounting surface on the mold side and the mounting surface on the stamper side are covered with the hard DLC layer, the friction is increased. The force is sufficiently reduced and the durability is improved. Industrial applicability
本発明は、製作コストを抑え、 しかも長寿命を実現したコンパクトデ イスク、 光磁気ディスク、光ディスク、 レ一ザディスク等のディスク成 形装置として最適であ.る。  INDUSTRIAL APPLICABILITY The present invention is suitable as a compact disk device, a magneto-optical disk, an optical disk, a laser disk, etc., which has a reduced production cost and a long service life.

Claims

請 求 の 範 囲 The scope of the claims
1 . コンパクトディスクなどのディスクの成形母型であるスタン パーと、 キヤビティ内に前記スタンパ一を固定するための取付面を有す る金型とを備え、 コンパクトディスクなどのディスクとなる溶融樹脂材 料が前記キャビティ内に圧入されることによってスタンパーの表面开^!犬 が転写されたディスクを成形するディスク成形装置において、  1. A molten resin material that includes a stamper, which is a molding die of a disc such as a compact disc, and a mold having a mounting surface for fixing the stamper in a cavity, and is a disc such as a compact disc. The stamper surface 开 ^! In a disk forming apparatus for forming a disk on which a dog is transferred,
前記ス夕ンパ一側の金型への取付面及び前記金型側の取付面の双方が' ダイヤモンドライクカーボン層により被覆されており、  Both the mounting surface to the mold on the one side of the stamper and the mounting surface on the mold side are covered with a diamond-like carbon layer,
前記ダイヤモンドライク力一ボン層中の炭素の占める sp3 結合の比率 は 30%以上 85¾以下であり、 The ratio of sp 3 bonds occupied by carbon in the diamond-like carbon layer is 30% or more and 85% or less,
前記ダイャモンドライク力一ボン層の表面のビッカース硬度は 3000kg f/mm2 (29. 419 X 103 N/mm2 ) 以上 9000 kgf/mm2 (88. 260 x lO3 N/mm2 ) 以下であるディスク成形装置。 The Vickers hardness of the surface of the diamond-like layer is 3000 kg f / mm 2 (29.419 × 10 3 N / mm 2 ) or more 9000 kgf / mm 2 (88.260 x lO 3 N / mm 2 ) The following is a disk forming apparatus.
2 . コンパクトディスクなどのディスクの成形母型であるスタン パーと、 キヤビティ内に前記スタンパーを固定するための取付面を有す る金型とを備 、 コンパクトディスクなどのディスクとなる溶融樹脂材 料が前記キャビティ内に圧入されることによってスタンノ、"一の表面制犬 が転写されたディスクを成形するディスク成形装置において、 ~ 前記スタンパ一側の金型への取付面及び前記金型側の取付面の双方が ダイヤモンドライク力一ボン層により被覆されており、  2. A molten resin material that becomes a disc such as a compact disc, including a stamper that is a mold for molding a disc such as a compact disc, and a mold that has a mounting surface for fixing the stamper in the cavity. Is press-fitted into the cavity to form a disc on which a stunner, "one surface control dog," is transferred. A mounting surface of the stamper on one side and a mounting surface on the mold side Both sides are covered with a diamond-like layer
前記スタンパ一側の取付面及び前記金型側の取付面に成膜されたダイ ャモンドライクカ一ボン層の何れか一方若しくは両方が、更に、 ポリフ ッ化炭化水素層によつて被覆されているディスク成形装置。  One or both of the diamond-like carbon layer formed on the mounting surface on the side of the stamper and the mounting surface on the side of the mold are further covered with a polyfluorinated hydrocarbon layer. apparatus.
3. コンパクトディスクなどのディスクの成形母型であるスタン パーと、 キヤビティ内に前記スタンパ一を固定するための取付面を有す る金型とを備え、 コンパクトディスクなどのディスクとなる溶融樹脂材 料が fri己キャビティ内に圧入されることによってス夕ンパ一の表面开^!犬 が転写されたディスクを成形するディスク成形装置において、 3. A molten resin material that is provided with a stamper, which is a molding die of a disk such as a compact disk, and a mold having a mounting surface for fixing the stamper in a cavity, and which becomes a disk such as a compact disk. As the material is pressed into the fri cavity, the surface of the glass is 开 ^! In a disk forming apparatus for forming a disk on which a dog is transferred,
前記スタンパ一側の金型への取付面及び前記金型側の取付面のいずれ か一方がダイヤモンドライクカーボン層により被覆されており、  Either one of the mounting surface to the mold on the one side of the stamper and the mounting surface on the mold side is covered with a diamond-like carbon layer,
前記一方に対する他方がポリフッ化炭化水素層によつて被覆されてい るディスク成形装置。  A disk forming apparatus, wherein the one is covered with a polyfluorohydrocarbon layer on the other.
4. コンパクトディスクなどのディスクの成形母型であるスタンパ 4. Stamper which is a molding die for disks such as compact disks
—と、 キヤビティ内に前記スタンパーを固定するための取付面を有する 金型とを備え、 コンパクトディスクなどのディスクとなる溶融樹脂材料„ が前記キャビティ内に圧入されることによってス夕ンパ一の表面形状が 転写されたディスクを成形するディスク成形装置において、 And a mold having a mounting surface for fixing the stamper in the cavity, and a molten resin material serving as a disk such as a compact disk is pressed into the cavity to form a surface of the stamper. In a disk forming apparatus for forming a disk having a transferred shape,
前記金型側の取付面がダイヤモンドライク力一ボン層により被覆され ており、 前記金型側の取付面に成膜されたダイヤモンドライクカーボ ン層が、 更に、 ポリフッ化炭化水素層によって被覆されているディスク  The mounting surface on the mold side is covered with a diamond-like carbon layer, and the diamond-like carbon layer formed on the mounting surface on the mold side is further covered with a polyfluorohydrocarbon layer. Disk
5. コンパクトディスクなどのディスクの成形母型であるスタンパ —と、 キヤビティ内に前記スタンパーを固定するための取付面を有する 金型とを備え、 コンパクトディスクなどのディスクとな 溶融樹脂材料 が前記キャビティ内に圧入されることによってスタンパーの表面形状が 転写されたディスクを成形するディスク成形装置において、 5. A stamper, which is a molding die for a disc such as a compact disc, and a mold having a mounting surface for fixing the stamper in a cavity, wherein the molten resin material serving as a disc such as a compact disc is formed in the cavity. In a disk forming apparatus for forming a disk onto which the surface shape of the stamper has been transferred by being pressed into the inside,
前記スタンノ、'一側の金型への取付面がダイャモンドライク力一ボン層 により被覆されており、 ,  The mounting surface of the stanno on one side of the mold is covered with a diamond-like layer.
前記スタンパ一側の取付面に成膜されたダイヤモンドライク力一ボン 層が、 更に、 ポリフツイ匕炭化水素層によって被覆されているディスク成  A disk-like component, wherein the diamond-like carbon layer formed on the mounting surface on one side of the stamper is further covered with a polyhydrocarbon layer.
6. 前記ダイャモンドライクカ一ボン層の表面粗さが 0. 6 / ni以 下の範囲である請求項 1乃至 5に記載のいずれかのディスク成形装置。 - 6. The surface roughness of the diamond-like carbon layer is 0.6 / ni or less. 6. The disk forming apparatus according to claim 1, wherein the disk forming apparatus has the following range. -
7. 前記ダイヤモンドライク力.一ボン層中の炭素の占める sp3 結 合の比率は 30¾以上 85%以下であり、 , 前記ダイャモンドライクカーボン層の表面のビヅ力一ス硬度は 3000kg f/mm2 (29. 419 X lO 3 N/mm2 ) 以上 9000 kgf/nim2 (88. 260 X IO3 N/rara2 ) 以下である請求項 2乃至 6に記載のいずれかのディスク成形装置。 7. The diamond-like force. The ratio of sp 3 bonds occupied by carbon in the carbon layer is 30% or more and 85% or less, and the diamond-like carbon layer has a surface hardness of 3000kgf. / mm 2 (29. 419 X lO 3 N / mm 2) or more 9000 kgf / nim 2 (88. 260 X IO 3 N / rara 2) following either a disk molding apparatus according to claims 2 to 6 .
PCT/JP2001/003766 2000-04-28 2001-05-01 Disc molding apparatus for compact disc WO2001084547A1 (en)

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FR2825377B1 (en) 2001-05-31 2003-09-19 Essilor Int MOLDING INSERTS
JP4190371B2 (en) * 2003-08-26 2008-12-03 Tdk株式会社 Uneven pattern forming stamper, uneven pattern forming method, and magnetic recording medium

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JPS62267937A (en) * 1986-05-16 1987-11-20 Hitachi Maxell Ltd Metallic mold for producing optical disk
JPH0222012A (en) * 1988-07-11 1990-01-24 Tdk Corp Stamper for molding and manufacture thereof
JPH06187673A (en) * 1992-12-16 1994-07-08 Ricoh Co Ltd Stamper for producing optical disk and its production
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JPH08238630A (en) * 1995-03-03 1996-09-17 Teijin Ltd Apparatus for molding optical disk substrate
JPH1064127A (en) * 1996-08-19 1998-03-06 Matsushita Electric Ind Co Ltd Method for molding optical disk and molding device therefor

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JPS62267937A (en) * 1986-05-16 1987-11-20 Hitachi Maxell Ltd Metallic mold for producing optical disk
JPH0222012A (en) * 1988-07-11 1990-01-24 Tdk Corp Stamper for molding and manufacture thereof
JPH06187673A (en) * 1992-12-16 1994-07-08 Ricoh Co Ltd Stamper for producing optical disk and its production
JPH07232354A (en) * 1993-12-28 1995-09-05 Tdk Corp Disc master for molding disc substrate, mold and combination thereof
JPH08238630A (en) * 1995-03-03 1996-09-17 Teijin Ltd Apparatus for molding optical disk substrate
JPH1064127A (en) * 1996-08-19 1998-03-06 Matsushita Electric Ind Co Ltd Method for molding optical disk and molding device therefor

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