WO2001061296A1 - Procede et dispositif servant a verifier la coherence d'un systeme optique - Google Patents

Procede et dispositif servant a verifier la coherence d'un systeme optique Download PDF

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Publication number
WO2001061296A1
WO2001061296A1 PCT/US2001/004821 US0104821W WO0161296A1 WO 2001061296 A1 WO2001061296 A1 WO 2001061296A1 US 0104821 W US0104821 W US 0104821W WO 0161296 A1 WO0161296 A1 WO 0161296A1
Authority
WO
WIPO (PCT)
Prior art keywords
optical system
coherence
light
designed
elongated areas
Prior art date
Application number
PCT/US2001/004821
Other languages
English (en)
Other versions
WO2001061296A9 (fr
Inventor
Matthew E. Hansen
Original Assignee
Silicon Valley Group, Inc.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Silicon Valley Group, Inc. filed Critical Silicon Valley Group, Inc.
Priority to AU2001235021A priority Critical patent/AU2001235021A1/en
Publication of WO2001061296A1 publication Critical patent/WO2001061296A1/fr
Publication of WO2001061296A9 publication Critical patent/WO2001061296A9/fr

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G03F7/70583—Speckle reduction, e.g. coherence control or amplitude/wavefront splitting
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J9/00—Measuring optical phase difference; Determining degree of coherence; Measuring optical wavelength
    • G01J9/02—Measuring optical phase difference; Determining degree of coherence; Measuring optical wavelength by interferometric methods
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70591—Testing optical components

Abstract

L'invention concerne un réticule ou une plaque lithographique servant à effectuer un essai de cohérence, ainsi qu'un procédé correspondant servant à vérifier la cohérence d'un faisceau laser par cet éclairage. Cette technique a été conçue, de façon non exhaustive, pour caractériser des systèmes laser par l'intermédiaire de la détection du rayonnement optique modulé par des configurations d'émission, de réflexion et de diffraction imprimées sur un réticule ou sur une plaque lithographique conçues spécifiquement à cet effet. On peut mesurer de façon indépendante la cohérence spatiale et la cohérence longitudinale ou temporelle. On peut également mesurer de façon indépendante la cohérence verticale et horizontale. Cette technique est insensible aux erreurs de mise au point. Ceci signifie que les erreurs de mise au point seront enregistrées par la technique de façon déterministique et seront supprimées des données. La fiabilité de cette technique s'appuie d'abord sur l'absence d'alignement optique de la plaque unique, ce qui facilite sa mise en application sur le site.
PCT/US2001/004821 2000-02-15 2001-02-15 Procede et dispositif servant a verifier la coherence d'un systeme optique WO2001061296A1 (fr)

Priority Applications (1)

Application Number Priority Date Filing Date Title
AU2001235021A AU2001235021A1 (en) 2000-02-15 2001-02-15 Method and apparatus for optical system coherence testing

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US18251000P 2000-02-15 2000-02-15
US60/182,510 2000-02-15

Publications (2)

Publication Number Publication Date
WO2001061296A1 true WO2001061296A1 (fr) 2001-08-23
WO2001061296A9 WO2001061296A9 (fr) 2002-10-24

Family

ID=22668780

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US2001/004821 WO2001061296A1 (fr) 2000-02-15 2001-02-15 Procede et dispositif servant a verifier la coherence d'un systeme optique

Country Status (2)

Country Link
AU (1) AU2001235021A1 (fr)
WO (1) WO2001061296A1 (fr)

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0204495A2 (fr) * 1985-06-03 1986-12-10 Xerox Corporation Correction d'astigmatisme pour diodes laser
US5357311A (en) * 1991-02-25 1994-10-18 Nikon Corporation Projection type light exposure apparatus and light exposure method
US5703675A (en) * 1992-01-17 1997-12-30 Nikon Corporation Projection-exposing apparatus with deflecting grating member
US5835217A (en) * 1997-02-28 1998-11-10 The Regents Of The University Of California Phase-shifting point diffraction interferometer
JP2000031035A (ja) * 1998-05-02 2000-01-28 Canon Inc 露光装置及びデバイスの製造方法

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0204495A2 (fr) * 1985-06-03 1986-12-10 Xerox Corporation Correction d'astigmatisme pour diodes laser
US5357311A (en) * 1991-02-25 1994-10-18 Nikon Corporation Projection type light exposure apparatus and light exposure method
US5703675A (en) * 1992-01-17 1997-12-30 Nikon Corporation Projection-exposing apparatus with deflecting grating member
US5835217A (en) * 1997-02-28 1998-11-10 The Regents Of The University Of California Phase-shifting point diffraction interferometer
JP2000031035A (ja) * 1998-05-02 2000-01-28 Canon Inc 露光装置及びデバイスの製造方法

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
PATENT ABSTRACTS OF JAPAN vol. 2000, no. 04 31 August 2000 (2000-08-31) *

Also Published As

Publication number Publication date
AU2001235021A1 (en) 2001-08-27
WO2001061296A9 (fr) 2002-10-24

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