WO2000064666A1 - Optical recording media having increased erasability - Google Patents
Optical recording media having increased erasability Download PDFInfo
- Publication number
- WO2000064666A1 WO2000064666A1 PCT/US1999/008861 US9908861W WO0064666A1 WO 2000064666 A1 WO2000064666 A1 WO 2000064666A1 US 9908861 W US9908861 W US 9908861W WO 0064666 A1 WO0064666 A1 WO 0064666A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- optical
- phase
- recording medium
- data storage
- change
- Prior art date
Links
- 230000003287 optical effect Effects 0.000 title claims abstract description 216
- 229910045601 alloy Inorganic materials 0.000 claims abstract description 82
- 239000000956 alloy Substances 0.000 claims abstract description 82
- 239000000463 material Substances 0.000 claims abstract description 70
- 239000003607 modifier Substances 0.000 claims abstract description 47
- 238000013500 data storage Methods 0.000 claims description 23
- 229910052714 tellurium Inorganic materials 0.000 claims description 21
- 229910052787 antimony Inorganic materials 0.000 claims description 20
- 229910052711 selenium Inorganic materials 0.000 claims description 20
- 229910052732 germanium Inorganic materials 0.000 claims description 19
- 230000006911 nucleation Effects 0.000 claims description 15
- 238000010899 nucleation Methods 0.000 claims description 15
- 229910052742 iron Inorganic materials 0.000 claims description 9
- 229910052804 chromium Inorganic materials 0.000 claims description 6
- 229910052750 molybdenum Inorganic materials 0.000 claims description 6
- 230000001681 protective effect Effects 0.000 claims description 4
- 229910052741 iridium Inorganic materials 0.000 claims description 3
- 229910052748 manganese Inorganic materials 0.000 claims description 3
- 229910052762 osmium Inorganic materials 0.000 claims description 3
- 229910052702 rhenium Inorganic materials 0.000 claims description 3
- 229910052703 rhodium Inorganic materials 0.000 claims description 3
- 229910052707 ruthenium Inorganic materials 0.000 claims description 3
- 229910052715 tantalum Inorganic materials 0.000 claims description 3
- 229910052720 vanadium Inorganic materials 0.000 claims description 3
- 239000002667 nucleating agent Substances 0.000 claims 2
- 229910052721 tungsten Inorganic materials 0.000 claims 2
- 239000010410 layer Substances 0.000 description 99
- 239000011669 selenium Substances 0.000 description 30
- 238000002425 crystallisation Methods 0.000 description 18
- 230000008025 crystallization Effects 0.000 description 18
- 239000000758 substrate Substances 0.000 description 16
- 239000000203 mixture Substances 0.000 description 14
- 230000008859 change Effects 0.000 description 13
- 238000000034 method Methods 0.000 description 9
- 239000012782 phase change material Substances 0.000 description 9
- BUGBHKTXTAQXES-UHFFFAOYSA-N Selenium Chemical compound [Se] BUGBHKTXTAQXES-UHFFFAOYSA-N 0.000 description 7
- 238000002679 ablation Methods 0.000 description 5
- 230000015572 biosynthetic process Effects 0.000 description 5
- 230000008569 process Effects 0.000 description 5
- 239000011241 protective layer Substances 0.000 description 5
- 229910000618 GeSbTe Inorganic materials 0.000 description 4
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 4
- 238000001579 optical reflectometry Methods 0.000 description 4
- 239000005083 Zinc sulfide Substances 0.000 description 3
- 238000010521 absorption reaction Methods 0.000 description 3
- 230000007423 decrease Effects 0.000 description 3
- 238000000151 deposition Methods 0.000 description 3
- 230000008021 deposition Effects 0.000 description 3
- 230000006870 function Effects 0.000 description 3
- 238000005259 measurement Methods 0.000 description 3
- 238000002310 reflectometry Methods 0.000 description 3
- 229910052984 zinc sulfide Inorganic materials 0.000 description 3
- 229910005865 GeSbTeSe Inorganic materials 0.000 description 2
- 229910052681 coesite Inorganic materials 0.000 description 2
- 229910052906 cristobalite Inorganic materials 0.000 description 2
- 239000008393 encapsulating agent Substances 0.000 description 2
- YBMRDBCBODYGJE-UHFFFAOYSA-N germanium oxide Inorganic materials O=[Ge]=O YBMRDBCBODYGJE-UHFFFAOYSA-N 0.000 description 2
- 238000002347 injection Methods 0.000 description 2
- 239000007924 injection Substances 0.000 description 2
- 230000005855 radiation Effects 0.000 description 2
- 230000004044 response Effects 0.000 description 2
- 238000004544 sputter deposition Methods 0.000 description 2
- 229910052682 stishovite Inorganic materials 0.000 description 2
- 238000003860 storage Methods 0.000 description 2
- PORWMNRCUJJQNO-UHFFFAOYSA-N tellurium atom Chemical compound [Te] PORWMNRCUJJQNO-UHFFFAOYSA-N 0.000 description 2
- 230000009466 transformation Effects 0.000 description 2
- 229910052905 tridymite Inorganic materials 0.000 description 2
- 238000004017 vitrification Methods 0.000 description 2
- 206010073306 Exposure to radiation Diseases 0.000 description 1
- 229910052581 Si3N4 Inorganic materials 0.000 description 1
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 1
- 150000001252 acrylic acid derivatives Chemical class 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- VXAUWWUXCIMFIM-UHFFFAOYSA-M aluminum;oxygen(2-);hydroxide Chemical compound [OH-].[O-2].[Al+3] VXAUWWUXCIMFIM-UHFFFAOYSA-M 0.000 description 1
- 238000005280 amorphization Methods 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 239000003989 dielectric material Substances 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 238000007756 gravure coating Methods 0.000 description 1
- 239000012774 insulation material Substances 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 238000002955 isolation Methods 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 238000005457 optimization Methods 0.000 description 1
- 239000011368 organic material Substances 0.000 description 1
- PVADDRMAFCOOPC-UHFFFAOYSA-N oxogermanium Chemical compound [Ge]=O PVADDRMAFCOOPC-UHFFFAOYSA-N 0.000 description 1
- 229910052763 palladium Inorganic materials 0.000 description 1
- 230000000149 penetrating effect Effects 0.000 description 1
- 238000005289 physical deposition Methods 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 238000000623 plasma-assisted chemical vapour deposition Methods 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 239000011253 protective coating Substances 0.000 description 1
- 238000010791 quenching Methods 0.000 description 1
- 230000000171 quenching effect Effects 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 230000003068 static effect Effects 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- 238000002207 thermal evaporation Methods 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
- 230000007704 transition Effects 0.000 description 1
- DRDVZXDWVBGGMH-UHFFFAOYSA-N zinc;sulfide Chemical compound [S-2].[Zn+2] DRDVZXDWVBGGMH-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
- G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
- G11B7/241—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material
- G11B7/242—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of recording layers
- G11B7/243—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of recording layers comprising inorganic materials only, e.g. ablative layers
- G11B7/2433—Metals or elements of Groups 13, 14, 15 or 16 of the Periodic Table, e.g. B, Si, Ge, As, Sb, Bi, Se or Te
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
- G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
- G11B7/241—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material
- G11B7/242—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of recording layers
- G11B7/243—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of recording layers comprising inorganic materials only, e.g. ablative layers
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
- G11B7/004—Recording, reproducing or erasing methods; Read, write or erase circuits therefor
- G11B7/0055—Erasing
- G11B7/00557—Erasing involving phase-change media
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
- G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
- G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
- G11B7/241—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material
- G11B7/242—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of recording layers
- G11B7/243—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of recording layers comprising inorganic materials only, e.g. ablative layers
- G11B2007/24302—Metals or metalloids
- G11B2007/24306—Metals or metalloids transition metal elements of groups 3-10
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
- G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
- G11B7/241—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material
- G11B7/242—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of recording layers
- G11B7/243—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of recording layers comprising inorganic materials only, e.g. ablative layers
- G11B2007/24302—Metals or metalloids
- G11B2007/24312—Metals or metalloids group 14 elements (e.g. Si, Ge, Sn)
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
- G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
- G11B7/241—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material
- G11B7/242—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of recording layers
- G11B7/243—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of recording layers comprising inorganic materials only, e.g. ablative layers
- G11B2007/24302—Metals or metalloids
- G11B2007/24314—Metals or metalloids group 15 elements (e.g. Sb, Bi)
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
- G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
- G11B7/241—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material
- G11B7/242—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of recording layers
- G11B7/243—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of recording layers comprising inorganic materials only, e.g. ablative layers
- G11B2007/24302—Metals or metalloids
- G11B2007/24316—Metals or metalloids group 16 elements (i.e. chalcogenides, Se, Te)
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
- G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
- G11B7/241—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material
- G11B7/252—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of layers other than recording layers
- G11B7/253—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of layers other than recording layers of substrates
- G11B7/2533—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of layers other than recording layers of substrates comprising resins
- G11B7/2534—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of layers other than recording layers of substrates comprising resins polycarbonates [PC]
Definitions
- the invention disclosed herein relates generally to optical recording media and more specifically to optical recording media having a recording layer comprising optical phase-change memory materials .
- Non-ablative, optical phase-change data storage systems record information in an optical phase-change memory material that is switchable between at least two detectable states by the application of optical energy.
- Optical phase-change memory material is typically incorporated in an optical recording medium having a structure such that the optical phase-change memory material is supported by a substrate and protected by encapsulants .
- the encapsulants include, for example, anti-ablation materials and layers, thermal insulation materials and layers, anti-reflection materials and layers, reflective layers, and chemical isolation layers.
- various layers may perform more than one of these functions.
- anti-reflection layers may also be anti-ablation layers and thermal insulating layers.
- the thicknesses of the layers are engineered to minimize the energy necessary for effecting the state change as well as to optimize the high contrast ratio, high carrier-to-noise ratio and high stability of the optical phase-change memory materials.
- Formation of optical recording media includes deposition of the individual layers by, for example, evaporative deposition, chemical vapor deposition, and/or plasma deposition.
- plasma deposition includes sputtering, glow discharge, and plasma assisted chemical vapor deposition.
- An optical phase-change material is capable of being switched from one detectable state to another detectable state or states by the application of optical energy.
- the state of the phase-change changeable material is detectable by properties such as, for example, index of refraction, optical absorption, optical reflectivity, or combinations thereof .
- Tellurium based materials have been utilized as phase-change materials for data storage where the change is evidenced by a change in a physical property such as reflectivity.
- Tellurium based state changeable materials in general, are single or multi-phased systems.
- the ordering phenomena of such materials includes a nucleation and growth process (including both or either homogeneous and heterogeneous nucleations) to convert a system of disordered materials to a system of ordered and disordered materials.
- the vitrification phenomena includes attaining a high mobility state and rapid quenching of the phase changeable material to transform a system of disordered and ordered materials to a system of largely disordered materials.
- the above phase changes and separations occur over relatively small distances, with intimate interlocking of the phases and gross structural discrimination, and may be highly sensitive to local variations in stoichiometry .
- the instant invention provides for high speed transformation by passing through a high mobility state. This high mobility state allows for high speed transformation from one state of relative order to another.
- the high mobility state does not specifically correspond to the molten state, but more accurately corresponds to a state of high system mobility.
- a laser is used to supply the optical energy to cause the phase transitions between amorphous and crystalline states in an optical phase-change memory material.
- the amount of energy applied to the memory material is a function of both the power of the laser as well as the period of time that the laser pulse is applied.
- the crystallization energy is defined herein as the amout of energy per unit volume needed to substantially re-crystallize an amorphous region of the memory material.
- the crystallization energy is dependent upon many factors, including the energy necessary for nucleation during the crystallization process. If the crystallization energy is too high, the memory material requires exposure to either a higher power laser pulse or a longer laser pulse in order to convert the material from the amorphous to the crystalline states. It is desireable to be able to control the crystallization energy of a phase-change memory material via the addition of one or more modifier elements. It is also desirable to increase the erasability of optical recording media.
- One object of the present invention is an optical storage medium having reduced energy requirements. Still another object of the present invention is an optical recording media having increased erasability.
- an optical recording medium comprising one or more recording layers, at least one of the recording layers comprising an optical phase-change memory material comprising: an optical phase-change alloy; and at least one modifier element, added to the phase-change alloy, that increases the erasability of the optical recording medium by at least 3 dB.
- an optical data storage and retrieval system comprising: an optical drive means with an optical head for reading, writing and erasing optical data to an optical recording medium, the optical recording meium comprising one or more recording layers, at least one of the recording layers comprising optical phase-change memory material comprising: an optical phase-change alloy; and at least one modifier element, added to the optical phase-change alloy, that increases the erasability of the recording medium by at least 3 dB.
- Figure 1 depicts a highly stylized view of a cross-section of a multi-layered optical disk.
- an optical phase-change memory material comprising an optical phase-change alloy, and at least one modifier element which is added to the optical phase-change alloy.
- the optical phase-change alloy of the present invention may be any material that (1) has an amorphous state and a crystalline state, (2) is capable of being switched between the amorphous and crystalline states in response to optical energy, and (3) undergoes a detectable change in either index of refraction, optical absorption, or optical reflectivity when switched between the amorphous and crystalline states.
- the optical phase-change memory material of the present invention is formed by modifying the above-mentioned phase-change alloy by adding at least one modifier element to the optical phase-change alloy to form a modified material.
- the phase-change alloy that is modified by the addition of at least one modifier element to form an optical phase-change memory material is referred to herein as the "corresponding unmodified phase-change alloy”.
- the optical phase-change memory material of the present invention comprises an optical phase-change alloy, and at least one modifier element which is added to the optical phase-change alloy.
- the modifier element when added to the optical phase-change alloy, decreases the crystallization energy of the optical phase-change alloy by at least 5%.
- the modifier element when added to the optical phase-change alloy, decreases the crystallization energy of the optical phase-change alloy by at least 10%.
- the optical phase-change memory material has a crystallization energy which is preferably at least 5% lower, and more preferably at least 10% lower, than the crystallization energy of the corresponding phase-change alloy.
- the "crystallization energy” is the amount of energy per unit volume to substantially re-crystallize an amorphized volume of phase-change material.
- the energy needed to crystallize the volume of phase-change material may be supplied by a laser beam pulse having power P and pulse width .
- the amount of energy E delivered to the amorphized volume is P x .
- the percentage difference in crystallization energy between (1) the phase-change memory material of the present invention and (2) the corresponding unmodified phase-change alloy can be measured under "static" test conditions by irradiating sample volumes of each (1) and (2) with a laser beam having power P and pulse width and measuring the optical reflectivities of the samples.
- the optical phase-change memory material of the present invention comprises an optical phase-change alloy, and at least one modifier element added to the phase-change alloy.
- an optical recording medium comprising one or more recording layers. At least one of the recording layers comprises the optical phase-change memory material described above (i.e., the optical phase-change memory material comprises an optical phase-change alloy, and at least one modifier element added to the phase-change alloy) . In one embodiment of the present invention, each of the recording layers comprises the optical phase-change memory material described above.
- the optical recording medium of the present invention has an erasability which is at least 3 dB greater than the erasability of an "unmodified" optical recording medium (having the same structure) wherein each of the recording layers is formed from the corresponding unmodified optical phase-change alloy. More preferably, the optical recording medium of the present invention has an erasability which is at least 5 dB greater than the erasability of the unmodified optical recording medium. Any optical recording medium having the characteristics described above falls within the scope of the invention.
- the optical recording medium of the present invention has one recording layer.
- the recording layer is formed from the optical phase-change memory material of the present invention (i.e., an optical phase-change alloy that has been modified with the addition of at least one modifier element) .
- this optical recording medium has an erasability that is at least 3 dB greater than the erasability of an "unmodified" optical recording medium (with the same structure) wherein said recording layer is formed from the corresponding unmodified phase-change alloy. More preferably, the erasability of the optical recording medium is at least 5 dB greater than the erasability of the unmodified optical recording medium. Any optical recording medium having the characteristics described above falls within the scope of the invention.
- the optical recording medium of the present invention has two or more recording layers. At least one of the optical recording layers comprises the optical memory material described herein (i.e., an optical phase-change alloy that has been modified with the addition of at least one modifier element) .
- this optical recording medium has an erasability that is at least 3 dB greater than the erasability of an "unmodified" optical recording medium (with the same structure) wherein each of the recording layers is formed from the corresponding unmodified phase-change alloy. More preferably, the erasability of the optical recording medium is at least 5 dB greater than the erasability of the unmodified optical recording medium. Any optical recording medium having the characteristics described above falls within the scope of the invention.
- the erase CNR is the carrier-to-noise ratio of the signal recorded into the medium after that portion of the medium, where the signal was recorded, has been subjected to an erase procedure.
- the values of both the record CNR and the erase CNR vary with the record power P w used. Hence, the erasability measurements will also vary with the record power P w .
- the addition of the modifier element to the optical phase- change alloy increases the erasability of the optical recording medium by at least 3 dB. This 3 dB (or greater) increase will occur at least at some record power P w which is between the "threshold power" P thres o i d and the "ablation power" P ab ⁇ ta tion-
- the threshold power P thresho i d is defined herein as that power, below which, there is no measureable record signal which can be distinguished from the noise.
- erasability measurements are made at an "optimal record power" P opt .
- An example of an optical record power P opt at which the erasability measurements may be made is the record power where the second harmonic record CNR is minimized.
- the recording layer is sandwiched between a first dielectric layer and a second dielectric layer.
- the optical recording medium comprises at least a substrate, a first dielectric layer deposited on top of the substrate, a recording layer deposited on top of the first dielectric layer, and a second dielectric layer deposited on top of the recording layer.
- FIG. 1 An example of a multi-layered optical recording medium is shown in Figure 1.
- the storage medium 1 includes a substrate 10, a first dielectric layer 20 deposited on top of the substrate 10, a recording layer 30 deposited on top of the first dielectric layer 20, a second dielectric layer 40 deposited on top of the recording layer, a reflective layer 50 deposited on top of the second dielectric layer 40, and a protective coating layer 60 deposited on top of the second dielectric layer.
- the substrate 10 may be formed from polycarbonate or other similar material.
- the substrate 10 is a substantially optically invariant, substantially optically isotropic, transparent sheet.
- the preferred thickness is between about 0.6mm to about 1.2 mm.
- the substrate 10 is typically injection molded but can be formed by other methods. Grooves may be placed in the substrate for guiding the light delivered by a laser source.
- the grooves may be polymerized, molded, injection molded or cast molded into the substrate 10.
- the thickness of the grooves may be from about 200 to about 1000 Angstroms.
- First and second dielectric layers 20, 40 sandwich the recording layer 30.
- a primary function of the first and second dielectric layers 20,40 is to optimize the reflectivity of the optical source so as to maximize the amount of optical energy delivered to the memory material from said source. Optimization requires an appropriate choice for the "optical thickness" of the first and second dielectric layers 20, 40.
- the optical thickness of a layer of material is defined as the index of refraction of the material multiplied by the physical thickness of the layer.
- the first and second dielectric layers are chosen from a dielectric material having an optical index of refraction between 1.5 and 2.5. More preferably, the optical index of refraction is chosen between 2.0 and 2.2.
- Materials which may be used for the first and second dielectric layers include, but are not limited to, germanium oxide (Ge0 2 ) , silicon dioxide (Si0 2 ) , zinc sulfide (ZnS) , aluminum dioxide, titanium oxide, and silicon nitride. The materials may be used individually or in combination. One or both of the dielectric layers 20, 40 may be layered or graded to avoid diffusion into the recording layer 30.
- the first and second dielectric layers 20, 40 provide a means for thermally insulating the recording layer 30. Moreover, they may also act to prevent agents which could chemically change the memory material from penetrating the recording layer 30. As well, they may also prevent the substrate 10 from deforming when the memory material is heated by the optical source during recording or erasing.
- a reflective layer 50 may be deposited on top of the second dielectric layer 40.
- the reflective layer 50 increases the quantity of reflected light entering the memory layer. It also influences the thermal environment of the memory layer by providing a thermal sink that encourages rapid cooling.
- the reflective layer is formed from a thin-film metal. Preferred are high reflectance materials such as Al, Au, Ag, Pt, Cu, Ti, Ni, Pd or alloys thereof.
- the reflective layer is preferably about 30 to about 150 nm thick.
- the reflective layer is preferably formed by physical deposition methods such as sputtering and evaporation.
- a protective layer 60 may be deposited on top of the reflective layer 50 for the purpose of improving scratch and corrosion resistance. It is preferably formed from organic materials such as acrylates. More preferably, the protective layer 60 is formed from radiation-curable compounds and compositions which are cured by exposure to radiation (typically electron radiation and ultraviolet radiation) . The protective layer 60 is preferably about 0.1 to about 15 micrometers thick. It may be formed by any desirable one of conventional coating methods including spin coating, gravure coating, or spray coating.
- the optical recording medium may comprise at least a substrate, a first protective layer, a recording layer, and a second protective layer. Examples of this type of multi-layered structure are described in U.S. Patent No. 5,063,097, the disclosure of which is incorporated by reference herein.
- the recording medium may comprise at least a substrate, a lower dielectric layer, a recording layer, a first upper dielectric layer, and a second upper dielectric layer. This type of multi-layered structure is described in U.S. Patent No. 5,498,507, the disclosure of which is incorporated by reference herein.
- the recording medium may comprise at least a substrate, a first reflective layer, a first dielectric layer, a recording layer, a second dielectric layer, and a second reflective layer.
- the optical recording medium of the present invention comprises one or more recording layers.
- the optical recording medium of the present invention may have one recording layer.
- the optical recording medium may have two recording layers.
- the optical recording medium may have three recording layers.
- the optical recording medium may have four recording layers.
- the optical recording medium may have five recording layers.
- the optical recording medium may have six recording layers.
- the optical recording medium may have seven recording layers.
- the optical recording medium may have eight recording layers.
- the optical recording medium of the present invention may have more than eight recording layers.
- the optical phase-change memory material of the present invention comprises an optical phase-change alloy, and at least one modifier element added to the phase-change alloy.
- the optical phase-change alloy of the present invention may be any material that (1) has an amorphous state and a crystalline state, (2) is capable of being switched between the amorphous and crystalline states in response to optical energy, and (3) undergoes a detectable change in either index of refraction, optical absorption, or optical reflectivity when switched between the amorphous and crystalline states.
- the modifier element is selected from the group consisting of V, Cr, Mn, Fe, Co, Mo, Ru, Rh, Ta, , Re, Os, and Ir.
- the modifier element is selected from the group consisting of Fe, Cr, and Mo. Most preferably, the modifier element is Fe .
- the "atomic percentage" of an element is the percentage of that element, per number of atoms, within the optical phase-change memory material. In one embodiment, the modifier element is added to the optical phase-change alloy so that the atomic percentage of the modifier element is between 0.06 and 1.0.
- the atomic percentage of Fe is between 0.06 and 1.0, it is more preferable that the atomic percentage of Fe is between 0.08 and 0.8, it is most preferable that the atomic percentage is about 0.3. In an alternate embodiment, the atomic percentage of Fe may be about 0.1.
- the crystallization energy of a material is the amount of energy per unit volume necessary to substantially re-crystallize an amorphized volume of phase-change material. Crystallization can be divided into two basic steps: (1) the formation of nuclei, and (2) the growth of said nuclei into crystals.
- the nucleation process may be either homogeneous nucleation or heterogeneous nucleation. Generally, the amount of energy needed for heterogeneous nucleation is less than that required for homogeneous nucleation.
- the modifier element adds heterogeneous nucleation sites to the optical phase-change alloy.
- heterogeneous nucleation sites reduces the amount of energy necessary for nucleation and thereby reduces the crystallization energy of the phase-change material. Further, the decrease in crystallization energy of the phase-change material increases the erasability of the optical recording medium using the phase-change material. It is believed that at atomic percentages below about 0.06, the modifier element does not provide enough heterogeneous nucleation sites to favorably affect the nucleation characteristics of the material, and at atomic percentages that are above about 1.0, the modifier element has no additional beneficial effect, and can in some cases deleteriously affect the desirable characteristics of the phase- change material.
- the optical phase-change alloy comprises Ge, Sb, and Te . This is defined herein as a GeSbTe phase-change alloy.
- the ratio of Ge atoms to Sb atoms to Te atoms i.e., Ge:Sb:Te
- the modifier element is added to the GeSbTe phase-change alloy to form the optical phase-change memory material of the present invention.
- the ratio of atoms Ge:Sb:Te is chosen as approximately 1:2:4 to form a "1:2:4 alloy".
- the modifier element is added to the GeSbTe phase- change alloy to form the optical phase-change memory material of the present invention.
- the ratio of atoms Ge:Sb:Te is chosen as approximately 2:2:5 to form a "2:2:5 alloy".
- the modifier element is added to the GeSbTe phase- change alloy to form the optical phase-change memory material of the present invention.
- the modifier element Fe may be added to the optical phase- change alloy to form an optical phase-change memory material comprising Ge, Sb, Te, and Fe.
- the atomic percentage of Fe is preferably between 0.06 and 1.0 percent, more preferably between 0.08 and 0.8 percent, and most preferably about 0.3 percent.
- Specific examples of the optical phase-change memory material comprising the above-mentioned phase-change alloy include, but are not limited to, (Ge 39 Sb 10 Te 51 ) 99 7 Fe 0-3 ,
- optical phase-change alloy comprises Ge, Sb, Te, and Se. This is defined herein as a GeSbTeSe phase-change alloy.
- the element Se may be used to slow the crystallization process of the phase-change alloy thereby making it easier to form the amorphous phase.
- the Se retards crystallite formation during the vitrification process as the material forms its final structure during relaxation from the high mobility state.
- the Se is substituted for the Te and is added to the phase-change alloy so that it makes up about 5 to 15 atomic percent of the resulting composition. More preferably, selenium is added so that it makes up about 5 to 11 atomic percent of the composition. Most preferably, selenium is added so that it makes up about 7 to 10 atomic percent of the composition. In one embodiment selenium makes up about 7 atomic percent of the composition. In another embodiment selenium makes up about 8 percent of the composition. In yet another embodiment selenium makes up about 9 percent of the composition. In yet another embodiment, selenium makes up about 10 percent of the composition. Selenium retards the formation of crystallites in the amorphous state.
- compositions with concentrations of Se higher than about 15 atomic percent have crystallization speeds that are too low. Additionally, compositions with concentrations of Se lower than about 5 atomic percent have higher crystallization speeds that favor formation of the crystalline phase, thereby requiring a higher power for amorphization.
- the optical phase-change alloy is formed by substituting between 5 and 11 atomic percent of Se for Te in the 4:1:5 alloy described above.
- the modifier element may be added to the GeSbTeSe phase- change alloy.
- Fe may be added to the above- mentioned optical phase-change alloy to form an optical phase- change memory material having a composition comprising Ge, Sb, Te, Se, and Fe.
- the atomic percentage of the Fe is between 0.06 and 1.0. More preferably, the atomic percentage of Fe is between 0.08 and 0.8. Most preferably, the atomic percentage of Fe is about 0.3. In an alternate embodiment the Fe may be added to the optical phase-change alloy so that the atomic percentage of the Fe is about 0.1.
- Specific examples of optical phase-change memory materials of the present invention include, but are not limited to, (Ge 39 Sb 10 Te 44 Se 7 ) 99 7 Fe 0 . 3 , (Ge 22 Sb 22 Te 47 Se 9 ) 99-7 Fe 0 . 3 , and (Ge 14 Sb 28 Te 47 Se 9 ) 99 7 Fe 0-3 .
- the optical data storage and retrieval system comprises an optical drive means with an optical head for reading, writing and erasing optical data to an optical recording medium.
- the optical head may include a laser.
- the optical head is used to store data to and erase data from the optical recording medium.
- the recording medium has a recording layer comprising the optical phase-change memory material that has been disclosed above.
- the optical recording medium may be removable or non-removable, and may be disposed in a protective cartridge case or freestanding (i.e., not disposed in a protective case).
- Example Experiments have been performed on a disc structure having a substrate, a first dielectric layer formed on the substrate, a recording layer formed on the first dielectric layer, and a second dielectric layer formed on the recording layer.
- the first dielectric layer, recording layer, and second dielectric layer have optical thicknesses equal to 1/4, 1/2, and 1/2 of the 780 nm wavelength of the laser beam used as the source of optical energy.
- the first and second dielectric layers are formed from a mixture of ZnS and Si0 2 .
- the disc radius is 3.207cm
- the disc rotation rate is 29.8Hz
- the disc linear velocity is 6m/s
- the record power is varied between 2 and 15 mW
- the record frequency is 4MHz
- the pulse width is 100ns
- the erase power is 5mW
- the read power is 1.499mW.
- Table 1 shows record CNR, erase CNR and erasability (record CNR - erase CNR) versus record powers between 2 and 15 mW.
- the recording layer in Table 1 is formed from the phase-change alloy having the composition Ge 40 Sb 10 Te 41 Se 9 . Table
- the optical phase-change memory material is formed from the phase-change alloy Ge 40 Sb 10 Te 41 Se 9 to which .3% Fe had been added.
- the composition is (Ge 40 Sb 10 Te 41 Se 9 ) 99-7 Fe 0 3 ) .
- Table 3 is a comparison of the erasabilities from Tables 2 and 3. Note that, in this particular example, for record powers from 7 to 13 mW, the erasability of the recording medium having a recording layer formed from an optical phase-change ateral comprising the optical phase-change alloy and .3% of the modifier element Fe was at least 3 dB greater than the erasability of the recording medium formed from the alloy alone without the additional modifier element.
- the record powers of 7 to 13 mW are above the threshold power P th r e s h oi d and below the ablation power P ab ⁇ at i 0 n as defined above.
- Table 1 - phase-change memory material is Ge 40 Sb 10 Te 41 Se 9
Landscapes
- Chemical & Material Sciences (AREA)
- Inorganic Chemistry (AREA)
- Optical Record Carriers And Manufacture Thereof (AREA)
- Thermal Transfer Or Thermal Recording In General (AREA)
- Optical Recording Or Reproduction (AREA)
Priority Applications (6)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
AU36623/99A AU3662399A (en) | 1999-04-22 | 1999-04-22 | Optical recording media having increased erasability |
EP19990918793 EP1194284A4 (en) | 1999-04-22 | 1999-04-22 | OPTICAL STORAGE MEDIUM WITH INCREASED ERASABILITY |
KR1020017013317A KR20020000630A (ko) | 1999-04-22 | 1999-04-22 | 소거가능성이 증가되는 광 기록 매체 |
CA002370836A CA2370836A1 (en) | 1999-04-22 | 1999-04-22 | Optical recording media having increased erasability |
PCT/US1999/008861 WO2000064666A1 (en) | 1999-04-22 | 1999-04-22 | Optical recording media having increased erasability |
JP2000613640A JP2002542085A (ja) | 1999-04-22 | 1999-04-22 | 増強された消去能力を具備する光学的記録媒体 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
PCT/US1999/008861 WO2000064666A1 (en) | 1999-04-22 | 1999-04-22 | Optical recording media having increased erasability |
Publications (1)
Publication Number | Publication Date |
---|---|
WO2000064666A1 true WO2000064666A1 (en) | 2000-11-02 |
Family
ID=22272614
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/US1999/008861 WO2000064666A1 (en) | 1999-04-22 | 1999-04-22 | Optical recording media having increased erasability |
Country Status (6)
Country | Link |
---|---|
EP (1) | EP1194284A4 (ja) |
JP (1) | JP2002542085A (ja) |
KR (1) | KR20020000630A (ja) |
AU (1) | AU3662399A (ja) |
CA (1) | CA2370836A1 (ja) |
WO (1) | WO2000064666A1 (ja) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN100394484C (zh) * | 2000-12-22 | 2008-06-11 | 能源变换设备有限公司 | 记录存储器的方法 |
JP2008234826A (ja) * | 2001-09-01 | 2008-10-02 | Energy Conversion Devices Inc | 青色レーザおよび/またはプラズモンレンズを用いて光データ記憶検索システムにおいて増大されたデータ記憶 |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5591501A (en) * | 1995-12-20 | 1997-01-07 | Energy Conversion Devices, Inc. | Optical recording medium having a plurality of discrete phase change data recording points |
US5761188A (en) * | 1996-05-28 | 1998-06-02 | International Business Machines Corporation | Optical data storage system with multiple rewritable phase change recording layers |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4866672A (en) * | 1985-08-09 | 1989-09-12 | Hitachi, Ltd. | Information-recording thin film and method for recording and reproducing information |
JP2834131B2 (ja) * | 1988-03-28 | 1998-12-09 | 株式会社日立製作所 | 情報記録用薄膜 |
CA1337582C (en) * | 1988-08-09 | 1995-11-21 | Donald Robert Preuss | Optical recording materials comprising antimony-tin alloys including a third element |
JPH0361082A (ja) * | 1989-07-31 | 1991-03-15 | Toshiba Corp | 情報記録媒体 |
JP3207230B2 (ja) * | 1992-01-08 | 2001-09-10 | 株式会社リコー | 相変化型情報記録媒体 |
US5736657A (en) * | 1995-03-31 | 1998-04-07 | Ricoh Company, Ltd. | Sputtering target |
JPH10337955A (ja) * | 1997-06-06 | 1998-12-22 | Asahi Chem Ind Co Ltd | 相変化型光情報記録媒体およびその製造方法 |
-
1999
- 1999-04-22 EP EP19990918793 patent/EP1194284A4/en not_active Withdrawn
- 1999-04-22 WO PCT/US1999/008861 patent/WO2000064666A1/en not_active Application Discontinuation
- 1999-04-22 CA CA002370836A patent/CA2370836A1/en not_active Abandoned
- 1999-04-22 KR KR1020017013317A patent/KR20020000630A/ko not_active Application Discontinuation
- 1999-04-22 AU AU36623/99A patent/AU3662399A/en not_active Abandoned
- 1999-04-22 JP JP2000613640A patent/JP2002542085A/ja active Pending
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5591501A (en) * | 1995-12-20 | 1997-01-07 | Energy Conversion Devices, Inc. | Optical recording medium having a plurality of discrete phase change data recording points |
US5761188A (en) * | 1996-05-28 | 1998-06-02 | International Business Machines Corporation | Optical data storage system with multiple rewritable phase change recording layers |
Non-Patent Citations (1)
Title |
---|
See also references of EP1194284A4 * |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN100394484C (zh) * | 2000-12-22 | 2008-06-11 | 能源变换设备有限公司 | 记录存储器的方法 |
JP2008234826A (ja) * | 2001-09-01 | 2008-10-02 | Energy Conversion Devices Inc | 青色レーザおよび/またはプラズモンレンズを用いて光データ記憶検索システムにおいて増大されたデータ記憶 |
Also Published As
Publication number | Publication date |
---|---|
JP2002542085A (ja) | 2002-12-10 |
KR20020000630A (ko) | 2002-01-05 |
EP1194284A4 (en) | 2002-10-31 |
EP1194284A1 (en) | 2002-04-10 |
AU3662399A (en) | 2000-11-10 |
CA2370836A1 (en) | 2000-11-02 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US6011757A (en) | Optical recording media having increased erasability | |
Yamada | Erasable phase-change optical materials | |
US4876667A (en) | Data storage device having a phase change memory medium reversible by direct overwrite | |
USRE36383E (en) | Optical recording medium and production process for the medium | |
US5591501A (en) | Optical recording medium having a plurality of discrete phase change data recording points | |
US5498507A (en) | Optical recording media | |
JP3506491B2 (ja) | 光情報媒体 | |
US5637372A (en) | Phase change optical recording medium | |
US6656559B2 (en) | Optical recording medium and optical recording method therefor | |
US5523140A (en) | Optical recording method and medium | |
KR100531538B1 (ko) | 광학적 정보기록매체와 그 제조방법 | |
US5637371A (en) | Phase change optical recording medium and activation energy determining method | |
EP0260920B1 (en) | Thin film amorphous optical recording films | |
US4737934A (en) | Data storage device and system having an optically non transmissive chalcogenide layer | |
US5362538A (en) | Optical recording medium | |
US7510753B2 (en) | Phase-change optical recording media | |
WO2000064666A1 (en) | Optical recording media having increased erasability | |
KR19990083107A (ko) | 광기록 매체 | |
JP4227278B2 (ja) | 情報記録媒体とその製造方法およびその記録再生方法 | |
US20030112731A1 (en) | Phase-change recording medium, recording method and recorder therefor | |
JP2538915B2 (ja) | 情報の記録及び消去方法 | |
JPH04228126A (ja) | 光学的情報記録用媒体 | |
JP2006035863A (ja) | 情報記録媒体およびその製造方法ならびにその記録再生方法 | |
JP2937296B2 (ja) | 書き替え可能な相変化型光メモリ媒体の製造方法 | |
JPS63167440A (ja) | 情報を記録もしくは記録及び消去する方法 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
AK | Designated states |
Kind code of ref document: A1 Designated state(s): AU BR CA JP KR MX RU SG |
|
AL | Designated countries for regional patents |
Kind code of ref document: A1 Designated state(s): AT BE CH CY DE DK ES FI FR GB GR IE IT LU MC NL PT SE |
|
121 | Ep: the epo has been informed by wipo that ep was designated in this application | ||
DFPE | Request for preliminary examination filed prior to expiration of 19th month from priority date (pct application filed before 20040101) | ||
WWE | Wipo information: entry into national phase |
Ref document number: 36623/99 Country of ref document: AU |
|
ENP | Entry into the national phase |
Ref document number: 2370836 Country of ref document: CA Ref country code: CA Ref document number: 2370836 Kind code of ref document: A Format of ref document f/p: F |
|
WWE | Wipo information: entry into national phase |
Ref document number: 1020017013317 Country of ref document: KR |
|
ENP | Entry into the national phase |
Ref country code: JP Ref document number: 2000 613640 Kind code of ref document: A Format of ref document f/p: F |
|
WWE | Wipo information: entry into national phase |
Ref document number: 1999918793 Country of ref document: EP |
|
WWP | Wipo information: published in national office |
Ref document number: 1020017013317 Country of ref document: KR |
|
WWP | Wipo information: published in national office |
Ref document number: 1999918793 Country of ref document: EP |
|
WWW | Wipo information: withdrawn in national office |
Ref document number: 1999918793 Country of ref document: EP |
|
WWW | Wipo information: withdrawn in national office |
Ref document number: 1020017013317 Country of ref document: KR |