WO2000015570A1 - Composant optique en verre quartzeux et son procede de production - Google Patents

Composant optique en verre quartzeux et son procede de production Download PDF

Info

Publication number
WO2000015570A1
WO2000015570A1 PCT/EP1999/003342 EP9903342W WO0015570A1 WO 2000015570 A1 WO2000015570 A1 WO 2000015570A1 EP 9903342 W EP9903342 W EP 9903342W WO 0015570 A1 WO0015570 A1 WO 0015570A1
Authority
WO
WIPO (PCT)
Prior art keywords
quartz glass
hydrogen
optical component
molecules
content
Prior art date
Application number
PCT/EP1999/003342
Other languages
German (de)
English (en)
Inventor
Bruno Uebbing
Bodo KÜHN
Original Assignee
Heraeus Quarzglas Gmbh & Co. Kg
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Heraeus Quarzglas Gmbh & Co. Kg filed Critical Heraeus Quarzglas Gmbh & Co. Kg
Priority to EP99969079A priority Critical patent/EP1049654A1/fr
Priority to JP2000570115A priority patent/JP2002524382A/ja
Priority to KR1020007005233A priority patent/KR20010032101A/ko
Publication of WO2000015570A1 publication Critical patent/WO2000015570A1/fr

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00—Glass compositions
    • C03C3/04—Glass compositions containing silica
    • C03C3/06—Glass compositions containing silica with more than 90% silica by weight, e.g. quartz
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B19/00—Other methods of shaping glass
    • C03B19/14—Other methods of shaping glass by gas- or vapour- phase reaction processes
    • C03B19/1453—Thermal after-treatment of the shaped article, e.g. dehydrating, consolidating, sintering
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C4/00—Compositions for glass with special properties
    • C03C4/0085—Compositions for glass with special properties for UV-transmitting glass
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2201/00—Type of glass produced
    • C03B2201/06—Doped silica-based glasses
    • C03B2201/20—Doped silica-based glasses doped with non-metals other than boron or fluorine
    • C03B2201/21—Doped silica-based glasses doped with non-metals other than boron or fluorine doped with molecular hydrogen
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2201/00—Type of glass produced
    • C03B2201/06—Doped silica-based glasses
    • C03B2201/20—Doped silica-based glasses doped with non-metals other than boron or fluorine
    • C03B2201/23—Doped silica-based glasses doped with non-metals other than boron or fluorine doped with hydroxyl groups
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2207/00—Glass deposition burners
    • C03B2207/30—For glass precursor of non-standard type, e.g. solid SiH3F
    • C03B2207/32—Non-halide
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2201/00—Glass compositions
    • C03C2201/06—Doped silica-based glasses
    • C03C2201/20—Doped silica-based glasses containing non-metals other than boron or halide
    • C03C2201/21—Doped silica-based glasses containing non-metals other than boron or halide containing molecular hydrogen
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2201/00—Glass compositions
    • C03C2201/06—Doped silica-based glasses
    • C03C2201/20—Doped silica-based glasses containing non-metals other than boron or halide
    • C03C2201/23—Doped silica-based glasses containing non-metals other than boron or halide containing hydroxyl groups
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2203/00—Production processes
    • C03C2203/40—Gas-phase processes

Definitions

  • the present invention relates to an optical component for transmitting ultraviolet radiation of a wavelength of 250 nm and shorter, made of synthetic quartz glass, which is obtained by forming fine-grained SiO 2 by flame hydrolysis of a chlorine-free silicon compound, deposited on a substrate and directly glazed.
  • the invention further relates to a method for producing an optical component made of synthetic quartz glass for the transmission of ultraviolet radiation of a wavelength of 250 nm and shorter, comprising the production of synthetic, hydrogen-containing quartz glass, by synthesis of fine-grained SiO 2 by means of flame hydrolysis of a chlorine-free silicon compound, and deposition and direct vitrification of the fine-grained SiO 2 on a substrate to form the hydrogen-containing quartz glass.
  • Such optical components made of synthetic quartz glass are used in particular for the transmission of high-energy, ultraviolet laser radiation, for example in the form of optical fibers or in the form of exposure optics in microlithography devices for the production of highly integrated circuits in semiconductor chips.
  • the exposure systems of modern microlithography devices are equipped with excimer lasers that emit high-energy, pulsed UV radiation with a wavelength of 248 nm (KrF laser) or 193 nm (ArF laser). It is known that such short-wave UV radiation can induce defects in the optical components and the associated absorptions which are characteristic of the type and quality of the respective quartz glass.
  • SAT effect damage behavior is observed in which the induced absorption rises linearly with continuous UV radiation, or in which it leads to saturation after an initial increase, or in which the induced defects accumulate in such a way that they become sudden and strong Express increase in absorption.
  • the sharp increase in absorption with the damage behavior described last is referred to in the literature as the SAT effect.
  • the radiation resistance of a quartz glass can depend on its structural properties, such as density, refractive index and homogeneity, or on its chemical composition. The influence of the chemical composition of the quartz glass on the damage behavior when irradiated with high-energy UV light is described, for example, in EP-A1 401 845.
  • a high radiation resistance was accordingly found in a high-purity quartz glass, which has a relatively high OH content in the range from 100 to approx. 1000 ppm by weight and at the same time a relatively high hydrogen concentration of at least 5 ⁇ 10 16 molecules per cm 3 (based on the volume of the Quartz glass).
  • the favorable influence of hydrogen on radiation resistance can be explained by the fact that it can contribute to the healing of defects and thus to a slower increase in radiation-induced absorption. Due to this effect of hydrogen, EP-A1 401 845 recommends loading optical components with high requirements with regard to radiation resistance with hydrogen.
  • the damage behavior of optical components can be different if the quartz glass has been obtained by different manufacturing processes, or that chemical or structural differences may exist, but these are not clear
  • the reason for the observed differences in damage behavior are.
  • the optical component according to the present invention is best characterized by its manufacturing process.
  • the production processes of synthetic quartz glass by flame hydrolysis of silicon-containing compounds can be differentiated on the basis of the starting substances and on the way in which the deposited SiO 2 particles are glazed.
  • SiCI 4 is a frequently used starting material in the production of synthetic quartz glass by flame hydrolysis.
  • other, for example chlorine-free, silicon-containing organic compounds are also used, such as silanes or siloxanes.
  • the production of quartz glass using alkoxysilanes is described in EP-A1 525 984; the production of quartz glass using siloxanes in EP-A1 463 045. Based on these starting substances, practically chlorine-free quartz glass can be produced.
  • the SiO 2 particles can be vitrified directly during the deposition on the substrate, which is referred to below as "direct vitrification”.
  • direct vitrification in the so-called “soot process”, the temperature during the deposition of the SiO 2 particles is kept so low that a porous soot body is formed, but none or only slight glazing of the SiO 2 particles occurs. Glazing with the formation of quartz glass requires a subsequent sintering of the soot body. Both manufacturing processes lead to a dense, transparent, high-purity quartz glass.
  • a generic optical component for the transmission of UV radiation of a wavelength of less than 300 nm and a method for its production are known from EP-A1 780 345.
  • the component described therein is obtained by depositing synthetic quartz glass on a substrate by flame hydrolysis of a chlorine-free polymethylsiloxane compound in the form of SiO 2 particles and vitrifying it directly.
  • the optical component produced in this way shows a damage behavior which, in comparison to a standard component, is characterized by the absence of the so-called SAT effect.
  • the standard component also consists of synthetic quartz glass, but a chlorine-containing starting material - namely SiCI 4 - was used in its manufacture. The observed effect in the known optical component may therefore be due to its low chlorine content, which is given as less than 3 ppm.
  • the present invention is therefore based on the object of providing an optical component which has a high long-term stability for the transmission of ultraviolet radiation of a wavelength of 250 nm and shorter, and which in particular shows a damage behavior in which the induced absorption into a saturation at a low level flows into. Furthermore, the invention is based on the object of specifying a method for producing such an optical component.
  • the quartz glass has a hydrogen content of less than 5 ⁇ 10 16 molecules / cm 3 .
  • the optical component according to the invention is characterized by a combination of features which can be summarized as follows: the component consists of synthetically produced quartz glass, the quartz glass is synthesized by flame hydrolysis of chlorine-free starting materials, the quartz glass is glazed directly during the deposition, and the hydrogen content of the quartz glass is set to a maximum of 5x10 16 molecules / cm 3 (based on the volume of the quartz glass).
  • the characteristic damage behavior of the optical component produced in this way in relation to high-energy UV radiation can be seen in the fact that the induced absorption initially rises rapidly, but then quickly leads to saturation at a low level.
  • This characteristic damage behavior is clearly dependent on the manufacturing conditions specified above. It changes as soon as one of the parameters in the manufacture of the component is changed, for example by using a soot process for the synthesis of the quartz glass instead of the direct glazing.
  • the hydrogen content of the quartz glass must be less than 5 ⁇ 10 16 molecules / cm 3 in order to achieve the desired radiation resistance. An explanation for this would be that the hydrogen not only contributes to the healing of radiation-induced defects, but also generates defects that are particularly noticeable in long-term radiation. It has been shown that the low hydrogen content of less than 5 ⁇ 10 16 molecules / cm 3 not only saturates the radiation-induced absorption, but also that the saturation level is comparatively low in comparison with a quartz glass with a higher hydrogen content.
  • the quartz glass contains hydrogen after vitrification, in a concentration that can be above the above-mentioned maximum limit of 5x10 16 molecules / cm 3 . It may be necessary to expel the hydrogen from the component.
  • the hydrogen content here and below means a hydrogen content averaged over the volume of the optical component (arithmetic mean of at least three measuring points evenly distributed over the component), it being assumed that the entire component is used for the transmission of UV radiation . In the case of optical components in which this requirement is not met, it is sufficient if the average hydrogen content is below the maximum value mentioned above, at least in the optically stressed volume range.
  • the hydrogen content is determined on the basis of a Raman measurement, which was carried out by Khotimchenko et al., "Determining the Content of Hydrogen Dissolved in Quartz Glass Using the Methods of Raman Scattering and Mass Spectrometry" in "Zhurnal Prikladnoi Spectoskopii", Vol 46, No.
  • the product gives the hydrogen concentration of the quartz glass in a volume of 1 cm 3 .
  • the detection limit for hydrogen with this measuring method is currently around 5x10 15 molecules / cm 3 .
  • An optical component in which the quartz glass has a hydrogen content of less than 2 ⁇ 10 16 molecules / cm 3 , in particular less than 5 ⁇ 10 15 molecules / cm 3 has proven to be particularly advantageous, that is to say the hydrogen content is below the current detection limit.
  • a component of this type is distinguished by particularly good long-term stability in relation to high-energy UV radiation and a particularly low saturation level of the absorption induced by the UV radiation.
  • an especially favorable damage behavior is shown by an optical component in which the quartz glass has an OH content of at least 400 ppm by weight.
  • the OH content refers to a value averaged over the quartz glass volume. It is determined spectroscopically.
  • the quartz glass has a chlorine content of at most 1 ppm by weight.
  • the indication of this chlorine content also relates to a value averaged over the quartz glass volume and is determined by wet chemistry. Chlorine or chlorine-containing compounds are often used to remove hydroxyl ions or contaminants from quartz glass. A chlorine content above 1 ppm by weight can, however, have an adverse effect on the damage behavior of the optical component.
  • the technical problem specified above is achieved, based on the process mentioned at the outset, in that the hydrogen-containing quartz glass is subjected to a hydrogen reduction treatment in which its hydrogen content is adjusted to a value below 5 ⁇ 10 16 molecules / cm 3 .
  • the hydrogen content of the quartz glass is adjusted to a value below 5 ⁇ 10 16 molecules / cm 3 by means of a hydrogen reduction treatment.
  • the hydrogen content can be set from a first, high concentration in a defined manner and therefore reproducibly to a second concentration below 5x10 16 molecules / cm 3 .
  • the optical components produced in this way therefore show reproducible damage behavior.
  • the hydrogen content of the quartz glass in the hydrogen reduction treatment is brought below 2x10 16 molecules / cm 3 , even better to a value below 5x10 15 molecules / cm 3 , i.e. to a concentration below the current detection limit of Raman Method lies.
  • a component manufactured in this way is characterized by particularly good long-term stability against high-energy UV radiation and a particularly low saturation level of the radiation-induced absorption.
  • the hydrogen reduction treatment advantageously comprises a thermal treatment of the quartz glass, a treatment under vacuum, and / or a treatment in a chemically reactive atmosphere.
  • the treatment variants mentioned can be used alternatively or cumulatively.
  • thermal treatment hereinafter referred to as tempering
  • a hydrogen-free atmosphere for example under inert gas or in a vacuum
  • tempering has proven to be particularly effective in order to adjust the hydrogen content of the quartz glass.
  • Annealing causes hydrogen to diffuse out of the quartz glass blank, the areas near the surface first becoming poor in hydrogen and only later the central areas of the blank.
  • the temperature, the tempering time and the tempering atmosphere taking into account the wall thickness or thickness of the quartz glass blank to be tempered, must be set so that the hydrogen is removed to a sufficient extent.
  • the tempering of quartz glass for optical components is a frequently used process step, which is usually used to reduce mechanical stress affect the optical properties of the glass.
  • the tempering proposed here for removing hydrogen differs from the known tempering methods in that, according to the invention, a quartz glass with an average hydrogen content of less than 5x10 16 molecules / cm 3 , preferably less than 2x10 16 molecules / cm 3 , and is particularly advantageously set to a value below 5x10 15 molecules / cm 3 .
  • the method is particularly effective when the hydrogen-containing quartz glass is formed into an intermediate product, the smallest lateral dimension of which does not exceed 100 mm, preferably 80 mm, the hydrogen reduction treatment being carried out partially or completely on the intermediate product.
  • the hydrogen reduction treatment is based on diffusion processes in quartz glass, for example the diffusion of hydrogen during tempering. The required diffusion times depend crucially on the relevant layer thickness.
  • optical components can be in very large layer thicknesses.
  • lenses for microlithography devices can have diameters of around 250 mm and thicknesses of around 100 mm.
  • the quartz glass blanks required for this have diameters of around 300 mm and thicknesses of over 100 mm.
  • Adequate hydrogen reduction treatment would require extremely long treatment times for such components, which would no longer be economically justifiable.
  • an intermediate product is formed from the hydrogen-containing quartz glass, the geometric dimensions of which are chosen so that the hydrogen can be easily driven off.
  • the smallest lateral dimension is understood to mean, for example, the outer diameter in the case of a rod-shaped intermediate product, the wall thickness in the case of a tubular one, or the thickness in the case of a plate-shaped intermediate product.
  • Such an intermediate product allows the hydrogen reduction treatment to be carried out in economically justifiable periods of time. It may be sufficient to only reduce the hydrogen content in the intermediate product without falling below the above-mentioned maximum values if the further treatment of the quartz glass allows complete hydrogen reduction in the sense of the present invention.
  • the component is formed from the intermediate product in a subsequent molding step.
  • FIG. 1 shows a diagram with two absorption curves, one of which represents the damage behavior of an optical component according to the invention and the other the damage behavior of an optical component according to the prior art.
  • a number of laser pulses is plotted on the x-axis of the diagram according to FIG. 1, and the absorption coefficient in the unit 1 / cm to the base e is plotted on the y-axis.
  • a disk-shaped substrate is arranged so that it faces vertically downward with one of its flat sides.
  • a deposition burner is arranged below the substrate and has a center nozzle which is coaxially surrounded by four ring nozzles. The deposition burner is aimed at the substrate, which rotates about its central axis.
  • the center nozzle of the deposition burner is supplied with methyltrimethoxysilane using a carrier gas (nitrogen), the other nozzles (in order from the inside out) a separation gas (nitrogen), oxygen and completely hydrogen.
  • Oxygen and hydrogen react with one another to form an oxyhydrogen gas flame, in which the methyltrimethoxysilane flowing out of the central nozzle hydrolyses and is deposited on the substrate in the form of finely divided SiO 2 .
  • the SiO 2 deposited on the substrate is vitrified directly by the heat of the oxyhydrogen gas to form a rod-shaped quartz glass blank. Due to the starting substances used, the quartz glass blank is practically chlorine-free (the chlorine content is
  • the quartz glass blank is then clamped in a quartz glass lathe, zone by zone heated to a temperature of approx. 2000 ° C and twisted.
  • a suitable homogenization process is described in EP-A1 673 888.
  • After repeated twisting there is a quartz glass body in the form of a round rod with a diameter of 80 mm and a length of approx. 800 mm, which is streak-free in three directions and which, averaged over its volume, has a hydrogen concentration of approx. 5x10 17 molecules / cm 3 and one OH content of about 900 ppm by weight.
  • the round rod is then subjected to a hydrogen reduction treatment by being under vacuum is annealed at 1100 ° C for a period of 200 h. Thereafter, the average hydrogen concentration of the round rod is approx. 3x10 16 molecules / cm 3 .
  • a circular quartz glass block with an outer diameter of 240 mm and a length of 90 mm is formed from this by hot deformation at a temperature of 1700 ° C. and using a nitrogen-flushed melting mold.
  • the quartz glass block After a further tempering process, in which the quartz glass block is heated to 1100 ° C under air and atmospheric pressure and then cooled at a cooling rate of 1 ° C / h, only a stress birefringence of maximum 2 nm / cm is measured, and the refractive index distribution is so homogeneous that the difference between the maximum value and the minimum value is less than 1x10 ⁇ .
  • the hydrogen content of the quartz glass block can no longer be detected using the Raman method and is therefore below 5x10 15 molecules / cm 3 ; its average OH content remains unchanged at approx. 900 ppm by weight.
  • the quartz glass block produced in this way is directly suitable as a blank for the production of an optical lens for a microlithography device.
  • the measurement samples were produced using a process variant.
  • the round rod present after the twisting was formed directly into the quartz glass block by annealing without prior hydrogen reduction treatment.
  • Two cylindrical measurement samples A and B with the dimensions 10 mm ⁇ 10 mm ⁇ 40 mm were cut from the quartz glass block, and the four long sides of each were polished.
  • test sample B was then subjected to a conventional tempering program, which comprises heating at a temperature of 800 ° C. for 5 hours in air.
  • the mean hydrogen content of sample B after this temper treatment was 1x10 17 molecules / cm 3 ; and the average OH content at 900 ppm by weight.
  • Measurement sample A was subjected to a hydrogen reduction treatment which, similar to the tempering program for measurement sample B, comprises heating in air at a temperature of 800 ° C., but for a period of 15 hours.
  • the mean hydrogen content of sample A after this tempering and hydrogen reduction treatment was in the range of the detection limit at about 5x10 15 molecules / cm 3 ; and the average OH content at 900 ppm by weight.
  • the absorption curve labeled "A" in FIG. 1 was obtained for measurement sample A and the absorption curve labeled "B" for measurement sample B.
  • the absorption curve "A" for the optical component produced according to the invention in accordance with measurement sample A initially shows a rapid increase, which indicates a rapid onset of damage to the quartz glass, but which, after a pulse number of approximately 1,000,000, saturates to an absolute value of the absorption coefficient of approx. 0.12 cm “1 flows out, which means a surprisingly low saturation level under these conditions.
  • the absorption curve "B" for an optical component according to the prior art shows a significantly slower increase with an approximately constant slope.
  • sample B no saturation of the induced absorption can be seen up to a pulse number of 15,000,000.
  • the absorption curves "A", "B” intersect. This means that the transmission of the optical component according to the invention is better at higher pulse numbers than that of the other optical component. This shows that the optical component according to the invention has more favorable damage behavior with regard to long-term stability.

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Organic Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Thermal Sciences (AREA)
  • Manufacturing & Machinery (AREA)
  • Physics & Mathematics (AREA)
  • Glass Compositions (AREA)
  • Glass Melting And Manufacturing (AREA)

Abstract

On connaît un composant optique servant à la transmission d'un rayonnement ultraviolet d'une longueur d'onde de 250 nm ou plus courte, constitué de verre quartzeux synthétique, qui est produit par hydrolyse à la flamme d'un composé de silicium exempt de chlore qui est constitué sous la forme de SiO2 à grains fins, déposé sur un substrat et directement vitrifié. L'objectif de l'invention, est, sur la base de cela, de réaliser un composant optique qui présente, pour la transmission d'un rayonnement ultraviolet d'une longueur d'onde de 250 nm ou plus courte, une stabilité de longue durée élevée et qui a en particulier un comportement, en cas d'endommagement, tel que l'absorption induite débouche sur une saturation à bas niveau. A cet effet, il est proposé, selon l'invention que le verre quartzeux présente une teneur en hydrogène inférieure à 5 x 1016 molécules/cm3. Un procédé de production de ce composant optique comprend la production de verre quartzeux synthétique, contenant de l'oxygène, par synthèse de SiO¿2? à grains fins, par hydrolyse à la flamme d'un composé de silicium exempt de chlore, ainsi que le dépôt et la vitrification du SiO2 à grains fins sur un substrat, avec formation du verre quartzeux contenant de l'oxygène, ce verre étant soumis à un traitement de réduction de l'oxygène grâce auquel sa teneur en oxygène est ajustée à une valeur inférieure à 5 x 10?16¿ molécules/cm3.
PCT/EP1999/003342 1998-09-14 1999-05-14 Composant optique en verre quartzeux et son procede de production WO2000015570A1 (fr)

Priority Applications (3)

Application Number Priority Date Filing Date Title
EP99969079A EP1049654A1 (fr) 1998-09-14 1999-05-14 Composant optique en verre quartzeux et son procede de production
JP2000570115A JP2002524382A (ja) 1998-09-14 1999-05-14 石英ガラス製光学部材及びその製法
KR1020007005233A KR20010032101A (ko) 1998-09-14 1999-05-14 석영 유리로 제조된 광소자 및 그 제조 방법

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE19841932A DE19841932A1 (de) 1998-09-14 1998-09-14 Optisches Bauteil aus Quarzglas und Verfahren für seine Herstellung
DE19841932.5 1998-09-14

Publications (1)

Publication Number Publication Date
WO2000015570A1 true WO2000015570A1 (fr) 2000-03-23

Family

ID=7880849

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/EP1999/003342 WO2000015570A1 (fr) 1998-09-14 1999-05-14 Composant optique en verre quartzeux et son procede de production

Country Status (5)

Country Link
EP (1) EP1049654A1 (fr)
JP (1) JP2002524382A (fr)
KR (1) KR20010032101A (fr)
DE (1) DE19841932A1 (fr)
WO (1) WO2000015570A1 (fr)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0999190A2 (fr) * 1998-11-04 2000-05-10 Heraeus Quarzglas GmbH & Co. KG Verre de coeur pour une préforme de fibre optique, une préforme realisée avec le verre de coeur et procédés de fabrication du verre de coeur et d'une fibre optique
US7534733B2 (en) 2004-02-23 2009-05-19 Corning Incorporated Synthetic silica glass optical material having high resistance to laser induced damage

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE10142893B4 (de) * 2001-09-03 2005-07-07 Heraeus Quarzglas Gmbh & Co. Kg Verfahren zum Tempern eines Rohlings für ein optisches Bauteil aus Quarzglas
DE102004015766B4 (de) 2004-03-23 2016-05-12 Asahi Glass Co., Ltd. Verwendung eines SiO2-TiO2-Glases als strahlungsresistentes Substrat
DE102004024808B4 (de) 2004-05-17 2006-11-09 Heraeus Quarzglas Gmbh & Co. Kg Quarzglasrohling für ein optisches Bauteil zur Übertragung extrem kurzwelliger ultravioletter Strahlung
EP1866257A1 (fr) * 2005-03-29 2007-12-19 Asahi Glass Company, Limited Verre de type quartz et procédé pour sa production
DE102010052685A1 (de) 2010-11-26 2012-05-31 J-Fiber Gmbh Verfahren zur Herstellung von strahlungsresistentem Quarzglasmaterial und danach hergestellte Quarzglaskörper
JP5935765B2 (ja) * 2012-07-10 2016-06-15 信越化学工業株式会社 ナノインプリントモールド用合成石英ガラス、その製造方法、及びナノインプリント用モールド
DE102013215292A1 (de) 2013-08-02 2015-02-05 Carl Zeiss Smt Gmbh Verfahren zum Beladen eines Rohlings aus Quarzglas mit Wasserstoff, Linsenelement und Projektionsobjektiv

Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1990010596A1 (fr) * 1989-03-15 1990-09-20 Tsl Group Plc Produits ameliores de silice vitreuse
EP0401845A2 (fr) * 1989-06-09 1990-12-12 Heraeus Quarzglas GmbH Membres optiques et ébauches de verre en silice synthétique et leur méthode de fabrication
EP0525984A1 (fr) * 1991-06-29 1993-02-03 Shin-Etsu Quartz Products Co., Ltd. Procédé pour la fabrication d'un article en verre à haute teneur en silice pour l'usage dans un laser à excimer
JPH06199539A (ja) * 1992-12-28 1994-07-19 Shinetsu Quartz Prod Co Ltd エキシマレーザー用光学石英ガラス部材及びその製造方法
JPH0840736A (ja) * 1994-08-03 1996-02-13 Shin Etsu Chem Co Ltd エキシマレーザ光学素材用合成石英ガラス部材およびその製造方法
EP0720969A1 (fr) * 1995-01-06 1996-07-10 Nikon Corporation Verre de silice, élément optique le contenant, et méthode pour sa production
EP0780345A1 (fr) * 1995-12-22 1997-06-25 Corning Incorporated Elément optique pour la transmission UV
EP0879799A2 (fr) * 1997-05-16 1998-11-25 Sumitomo Electric Industries, Ltd. Article en verre de silice et son procédé de fabrication

Patent Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1990010596A1 (fr) * 1989-03-15 1990-09-20 Tsl Group Plc Produits ameliores de silice vitreuse
EP0463045A1 (fr) * 1989-03-15 1992-01-02 Tsl Group Plc Produits ameliores de silice vitreuse.
EP0401845A2 (fr) * 1989-06-09 1990-12-12 Heraeus Quarzglas GmbH Membres optiques et ébauches de verre en silice synthétique et leur méthode de fabrication
EP0525984A1 (fr) * 1991-06-29 1993-02-03 Shin-Etsu Quartz Products Co., Ltd. Procédé pour la fabrication d'un article en verre à haute teneur en silice pour l'usage dans un laser à excimer
JPH06199539A (ja) * 1992-12-28 1994-07-19 Shinetsu Quartz Prod Co Ltd エキシマレーザー用光学石英ガラス部材及びその製造方法
JPH0840736A (ja) * 1994-08-03 1996-02-13 Shin Etsu Chem Co Ltd エキシマレーザ光学素材用合成石英ガラス部材およびその製造方法
EP0720969A1 (fr) * 1995-01-06 1996-07-10 Nikon Corporation Verre de silice, élément optique le contenant, et méthode pour sa production
EP0780345A1 (fr) * 1995-12-22 1997-06-25 Corning Incorporated Elément optique pour la transmission UV
EP0879799A2 (fr) * 1997-05-16 1998-11-25 Sumitomo Electric Industries, Ltd. Article en verre de silice et son procédé de fabrication

Non-Patent Citations (2)

* Cited by examiner, † Cited by third party
Title
PATENT ABSTRACTS OF JAPAN vol. 18, no. 558 (C - 1264) 25 October 1994 (1994-10-25) *
PATENT ABSTRACTS OF JAPAN vol. 96, no. 6 28 June 1996 (1996-06-28) *

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0999190A2 (fr) * 1998-11-04 2000-05-10 Heraeus Quarzglas GmbH & Co. KG Verre de coeur pour une préforme de fibre optique, une préforme realisée avec le verre de coeur et procédés de fabrication du verre de coeur et d'une fibre optique
EP0999190A3 (fr) * 1998-11-04 2001-10-10 Heraeus Quarzglas GmbH & Co. KG Verre de coeur pour une préforme de fibre optique, une préforme realisée avec le verre de coeur et procédés de fabrication du verre de coeur et d'une fibre optique
US6622527B2 (en) 1998-11-04 2003-09-23 Heraeus Quarzglas Gmbh Adjusting the hydrogen content of a preform for an UV-optical fiber
US7534733B2 (en) 2004-02-23 2009-05-19 Corning Incorporated Synthetic silica glass optical material having high resistance to laser induced damage

Also Published As

Publication number Publication date
JP2002524382A (ja) 2002-08-06
KR20010032101A (ko) 2001-04-16
EP1049654A1 (fr) 2000-11-08
DE19841932A1 (de) 2000-03-16

Similar Documents

Publication Publication Date Title
EP1586544B1 (fr) Element optique en verre quartzeux, son procédé de fabrication et son utilisation
EP1712528B1 (fr) Composant optique en verre quartzeux , son procede de production et son utilisation
DE102005017739B4 (de) Halter aus Quarzglas für die Prozessierung von Halbleiterwafern und Verfahren zur Herstellung des Halters
DE60015684T2 (de) Optisches Element aus Quarzglas zum Durchlassen von Fluor-Excimer-Laserstrahlung und Verfahren zu seiner Herstellung
DE69816758T2 (de) Synthetisches quarzglas zur verwendung in uv-strahlung und verfahren zu seiner herstellung
DE60033481T2 (de) Optischer Werkstoff aus Quarzglas für Excimer Laser und Excimer Lampe, und Verfahren zu dessen Herstellung
EP1982963B1 (fr) Procedé de production d'un composant optique en verre quartzeux synthétique avec une résistance aux rayonnements élevée, et ébauche pour la production du composant
DE102011120412B4 (de) Excimerlampe mit Emissionsfenster aus Quarzglas mit einem bestimmten Gehalt an Hydroxylgruppen, Wasserstoff und Chlor
DE10159961C2 (de) Quarzglasrohling für ein optisches Bauteil sowie Verfahren zur Herstellung und Verwendung desselben
EP1327612B1 (fr) Ebauche en verre de silice pour la fabrication d'un element optique ainsi que sa preparation et application de celle-ci
DE19942443A1 (de) Für ultraviolette Strahlen durchlässiges, optisches Glasmaterial und Verfahren zu seiner Herstellung
WO2005102950A2 (fr) Composant en verre de quartz destine a une source de rayons ultraviolets et procede de production et de test d'aptitude de ce composant en verre de quartz
EP1049654A1 (fr) Composant optique en verre quartzeux et son procede de production
EP1327613B1 (fr) Ebauche en verre de silice pour la fabrication d'un element optique et application de celle-ci
DE102010009589B4 (de) Verfahren zur Herstellung eines Rohlings aus Titan-dotiertem, hochkieselsäurehaltigem Glas für ein Spiegelsubstrat für den Einsatz in der EUV-Lithographie
DE19850736C2 (de) Kernglas für eine Vorform für eine optische Faser, unter Verwendung des Kernglases hergestellte Vorform, sowie Verfahren zur Herstellung des Kernglases einer Vorform für eine optische Faser
DE102008049325B4 (de) Verfahren zur Herstellung eines rohrförmigen Halbzeugs aus Quarzglas sowie Halbzeug aus Quarzglas
EP4030204B1 (fr) Fibre optique microstructurée et préforme associée
DE102010052685A1 (de) Verfahren zur Herstellung von strahlungsresistentem Quarzglasmaterial und danach hergestellte Quarzglaskörper

Legal Events

Date Code Title Description
AK Designated states

Kind code of ref document: A1

Designated state(s): JP KR US

AL Designated countries for regional patents

Kind code of ref document: A1

Designated state(s): AT BE CH CY DE DK ES FI FR GB GR IE IT LU MC NL PT SE

WWE Wipo information: entry into national phase

Ref document number: 1999969079

Country of ref document: EP

WWE Wipo information: entry into national phase

Ref document number: 09554283

Country of ref document: US

WWE Wipo information: entry into national phase

Ref document number: 1020007005233

Country of ref document: KR

121 Ep: the epo has been informed by wipo that ep was designated in this application
WWP Wipo information: published in national office

Ref document number: 1999969079

Country of ref document: EP

WWP Wipo information: published in national office

Ref document number: 1020007005233

Country of ref document: KR

WWW Wipo information: withdrawn in national office

Ref document number: 1999969079

Country of ref document: EP

WWR Wipo information: refused in national office

Ref document number: 1020007005233

Country of ref document: KR