WO1999067683A3 - Optical system, especially a projection light facility for microlithography - Google Patents

Optical system, especially a projection light facility for microlithography Download PDF

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Publication number
WO1999067683A3
WO1999067683A3 PCT/EP1999/004246 EP9904246W WO9967683A3 WO 1999067683 A3 WO1999067683 A3 WO 1999067683A3 EP 9904246 W EP9904246 W EP 9904246W WO 9967683 A3 WO9967683 A3 WO 9967683A3
Authority
WO
WIPO (PCT)
Prior art keywords
optical element
optical system
microlithography
projection light
optical
Prior art date
Application number
PCT/EP1999/004246
Other languages
German (de)
French (fr)
Other versions
WO1999067683A8 (en
WO1999067683A2 (en
Inventor
Erwin Gaber
Christian Wagner
Hubert Holderer
Michael Gerhard
Erich Merz
Jochen Becker
Arie Cormelis Scheiberlich
Original Assignee
Zeiss Carl
Zeiss Stiftung
Erwin Gaber
Christian Wagner
Hubert Holderer
Michael Gerhard
Erich Merz
Jochen Becker
Arie Cormelis Scheiberlich
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Zeiss Carl, Zeiss Stiftung, Erwin Gaber, Christian Wagner, Hubert Holderer, Michael Gerhard, Erich Merz, Jochen Becker, Arie Cormelis Scheiberlich filed Critical Zeiss Carl
Priority to EP99929277A priority Critical patent/EP1015931B1/en
Priority to DE59913282T priority patent/DE59913282D1/en
Priority to JP2000556280A priority patent/JP4357117B2/en
Priority to US09/486,017 priority patent/US6388823B1/en
Publication of WO1999067683A2 publication Critical patent/WO1999067683A2/en
Publication of WO1999067683A3 publication Critical patent/WO1999067683A3/en
Publication of WO1999067683A8 publication Critical patent/WO1999067683A8/en

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70825—Mounting of individual elements, e.g. mounts, holders or supports
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/0025—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for optical correction, e.g. distorsion, aberration
    • G02B27/0068—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for optical correction, e.g. distorsion, aberration having means for controlling the degree of correction, e.g. using phase modulators, movable elements
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
    • G02B7/02—Mountings, adjusting means, or light-tight connections, for optical elements for lenses
    • G02B7/023—Mountings, adjusting means, or light-tight connections, for optical elements for lenses permitting adjustment
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
    • G02B7/02—Mountings, adjusting means, or light-tight connections, for optical elements for lenses
    • G02B7/028—Mountings, adjusting means, or light-tight connections, for optical elements for lenses with means for compensating for changes in temperature or for controlling the temperature; thermal stabilisation
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70241—Optical aspects of refractive lens systems, i.e. comprising only refractive elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70358—Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70783—Handling stress or warp of chucks, masks or workpieces, e.g. to compensate for imaging errors or considerations related to warpage of masks or workpieces due to their own weight

Abstract

The invention relates to an optical system, especially a projection light facility for microlithography, especially with an image field shaped as a slit or with non rotational symmetry illumination, comprising an optical element (1), especially a lens or a mirror, which is arranged in a mount (2) and actuators (3) which engage with the optical element (1) at least nearly perpendicular to the optical axis. The actuators (3) effect non rotational symmetric forces and/or moments deviating from the radial lines in the optical element (1) to generate deformations with substantially no changes in thickness. Image errors arising as a result of asymmetric heating of the optical system are compensated for by deformation of the optical element.
PCT/EP1999/004246 1998-06-20 1999-06-18 Optical system, especially a projection light facility for microlithography WO1999067683A2 (en)

Priority Applications (4)

Application Number Priority Date Filing Date Title
EP99929277A EP1015931B1 (en) 1998-06-20 1999-06-18 Projection light facility for microlithography
DE59913282T DE59913282D1 (en) 1998-06-20 1999-06-18 PROJECTION EXPOSURE SYSTEM OF MICROLITHOGRAPHY
JP2000556280A JP4357117B2 (en) 1998-06-20 1999-06-18 Optical system, especially microlithographic projection exposure apparatus
US09/486,017 US6388823B1 (en) 1998-06-20 1999-06-18 Optical system, especially a projection light facility for microlithography

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE19827603A DE19827603A1 (en) 1998-06-20 1998-06-20 Projection light exposure system for microlithography
DE19827603.6 1998-06-20

Publications (3)

Publication Number Publication Date
WO1999067683A2 WO1999067683A2 (en) 1999-12-29
WO1999067683A3 true WO1999067683A3 (en) 2000-04-20
WO1999067683A8 WO1999067683A8 (en) 2000-05-25

Family

ID=7871556

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/EP1999/004246 WO1999067683A2 (en) 1998-06-20 1999-06-18 Optical system, especially a projection light facility for microlithography

Country Status (7)

Country Link
US (1) US6388823B1 (en)
EP (1) EP1015931B1 (en)
JP (1) JP4357117B2 (en)
KR (1) KR100591306B1 (en)
DE (2) DE19827603A1 (en)
TW (1) TWI253509B (en)
WO (1) WO1999067683A2 (en)

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Also Published As

Publication number Publication date
US6388823B1 (en) 2002-05-14
TWI253509B (en) 2006-04-21
KR100591306B1 (en) 2006-06-19
JP4357117B2 (en) 2009-11-04
EP1015931B1 (en) 2006-03-29
JP2002519843A (en) 2002-07-02
KR20000005738A (en) 2000-01-25
DE19827603A1 (en) 1999-12-23
EP1015931A2 (en) 2000-07-05
DE59913282D1 (en) 2006-05-18
WO1999067683A8 (en) 2000-05-25
WO1999067683A2 (en) 1999-12-29

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