WO1997016482A3 - Photohärtbares harz mit geringem schwund - Google Patents

Photohärtbares harz mit geringem schwund Download PDF

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Publication number
WO1997016482A3
WO1997016482A3 PCT/DE1996/002086 DE9602086W WO9716482A3 WO 1997016482 A3 WO1997016482 A3 WO 1997016482A3 DE 9602086 W DE9602086 W DE 9602086W WO 9716482 A3 WO9716482 A3 WO 9716482A3
Authority
WO
WIPO (PCT)
Prior art keywords
low
curable resin
light
shrinkage
shrinkage light
Prior art date
Application number
PCT/DE1996/002086
Other languages
English (en)
French (fr)
Other versions
WO1997016482A2 (de
Inventor
Heiner Bayer
Walter Fischer
Volker Muhrer
Wolfgang Rogler
Lothar Schoen
Original Assignee
Siemens Ag
Heiner Bayer
Walter Fischer
Volker Muhrer
Wolfgang Rogler
Lothar Schoen
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Siemens Ag, Heiner Bayer, Walter Fischer, Volker Muhrer, Wolfgang Rogler, Lothar Schoen filed Critical Siemens Ag
Priority to JP9516988A priority Critical patent/JP2000506553A/ja
Priority to EP96945853A priority patent/EP0858617A2/de
Publication of WO1997016482A2 publication Critical patent/WO1997016482A2/de
Publication of WO1997016482A3 publication Critical patent/WO1997016482A3/de

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
    • C08G59/40—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the curing agents used
    • C08G59/62—Alcohols or phenols
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L63/00—Compositions of epoxy resins; Compositions of derivatives of epoxy resins
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0037—Production of three-dimensional images

Landscapes

  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Epoxy Resins (AREA)

Abstract

Es wird ein für die Laserstereolithographie geeignetes photohärtbares Harz vorgeschlagen, welches neben einer vorzugsweise aliphatischen und dünnflüssigen Epoxidverbindung eine darin lösliche Polyhydroxylverbindung, eine Base und einen Photoinitiator für die kationische Härtung enthält.
PCT/DE1996/002086 1995-11-03 1996-10-31 Photohärtbares harz mit geringem schwund WO1997016482A2 (de)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP9516988A JP2000506553A (ja) 1995-11-03 1996-10-31 僅かな収縮率を有する光硬化可能な樹脂
EP96945853A EP0858617A2 (de) 1995-11-03 1996-10-31 Photohärtbares harz mit geringem schwund

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE1995141075 DE19541075C1 (de) 1995-11-03 1995-11-03 Photohärtbares Harz mit geringem Schwund und dessen Verwendung in einem Stereolithographieverfahren
DE19541075.0 1995-11-03

Publications (2)

Publication Number Publication Date
WO1997016482A2 WO1997016482A2 (de) 1997-05-09
WO1997016482A3 true WO1997016482A3 (de) 1997-08-07

Family

ID=7776582

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/DE1996/002086 WO1997016482A2 (de) 1995-11-03 1996-10-31 Photohärtbares harz mit geringem schwund

Country Status (4)

Country Link
EP (1) EP0858617A2 (de)
JP (1) JP2000506553A (de)
DE (1) DE19541075C1 (de)
WO (1) WO1997016482A2 (de)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE19804595A1 (de) * 1998-02-05 1999-08-12 Siemens Ag Thermisch härtbare Ein-Komponenten-Underfill-Masse
US6287748B1 (en) * 1998-07-10 2001-09-11 Dsm N.V. Solid imaging compositions for preparing polyethylene-like articles
DE19944372A1 (de) * 1999-09-16 2001-03-22 Bayerische Motoren Werke Ag Verfahren zum Erzeugen einer sichtbaren Struktur in einem zumindest teilweise transparenten Kunststoff-Element
DE10150256A1 (de) * 2001-10-11 2003-07-10 Envision Technologies Gmbh I I Verfahren und Vorrichtung zum Herstellen von dreidimensionalen Objekten
US20030149124A1 (en) * 2001-11-27 2003-08-07 Thommes Glen A. Radiation curable resin composition for making colored three dimensional objects
US6913794B2 (en) 2002-01-14 2005-07-05 Coherent, Inc. Diode-laser curing of liquid epoxide encapsulants
TWI432904B (zh) * 2006-01-25 2014-04-01 Dow Corning 用於微影技術之環氧樹脂調配物

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4256828A (en) * 1975-09-02 1981-03-17 Minnesota Mining And Manufacturing Company Photocopolymerizable compositions based on epoxy and hydroxyl-containing organic materials
EP0221559A2 (de) * 1985-11-07 1987-05-13 Union Carbide Corporation Photocopolymerisierbare Verbindungen auf der Basis von Epoxydharzen und Hydroxylgruppen enthaltende organische Verbindungen
JPS63149640A (ja) * 1986-12-12 1988-06-22 Konica Corp 感光性組成物および感光性平版印刷版
EP0605361A2 (de) * 1992-12-21 1994-07-06 Ciba-Geigy Ag Photoempfindliche Zusammensetzungen

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4256828A (en) * 1975-09-02 1981-03-17 Minnesota Mining And Manufacturing Company Photocopolymerizable compositions based on epoxy and hydroxyl-containing organic materials
EP0221559A2 (de) * 1985-11-07 1987-05-13 Union Carbide Corporation Photocopolymerisierbare Verbindungen auf der Basis von Epoxydharzen und Hydroxylgruppen enthaltende organische Verbindungen
JPS63149640A (ja) * 1986-12-12 1988-06-22 Konica Corp 感光性組成物および感光性平版印刷版
EP0605361A2 (de) * 1992-12-21 1994-07-06 Ciba-Geigy Ag Photoempfindliche Zusammensetzungen

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
DATABASE WPI Section Ch Week 8831, Derwent World Patents Index; Class E19, AN 88-215340, XP002031001 *

Also Published As

Publication number Publication date
JP2000506553A (ja) 2000-05-30
DE19541075C1 (de) 1997-04-24
EP0858617A2 (de) 1998-08-19
WO1997016482A2 (de) 1997-05-09

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