WO1996029598A1 - Systeme de gestion des eaux usees - Google Patents

Systeme de gestion des eaux usees Download PDF

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Publication number
WO1996029598A1
WO1996029598A1 PCT/JP1995/000483 JP9500483W WO9629598A1 WO 1996029598 A1 WO1996029598 A1 WO 1996029598A1 JP 9500483 W JP9500483 W JP 9500483W WO 9629598 A1 WO9629598 A1 WO 9629598A1
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WO
WIPO (PCT)
Prior art keywords
liquid
processing
monitoring
wastewater
data
Prior art date
Application number
PCT/JP1995/000483
Other languages
English (en)
Japanese (ja)
Inventor
Tsutomu Sakamoto
Akira Okamoto
Original Assignee
Hitachi, Ltd.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi, Ltd. filed Critical Hitachi, Ltd.
Priority to PCT/JP1995/000483 priority Critical patent/WO1996029598A1/fr
Publication of WO1996029598A1 publication Critical patent/WO1996029598A1/fr

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Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N33/00—Investigating or analysing materials by specific methods not covered by groups G01N1/00 - G01N31/00
    • G01N33/18—Water

Definitions

  • the present invention relates to a wastewater management system that monitors and reuses treatment liquid and wastewater inside and outside of a production line, such as after-products.
  • An object of the present invention is to provide a wastewater management system capable of preventing environmental pollution and reducing the amount of materials by reusing a treatment liquid or treated water in view of the above-mentioned problems of the related art. Disclosure of the invention In order to solve the above problems, the present invention created a database to manage various data such as processing solution monitoring data, solution replacement time management data, product processing acceleration coefficient data, and so on. An instruction algorithm for regenerating and reusing the processing solution is created based on these data, and the recycling of the processing solution is managed based on the algorithm.
  • the processing liquid monitoring data, the liquid replacement time management data, the product processing acceleration coefficient data, etc. are collected, and the replacement time of the processing liquid is determined based on the number of times the processing liquid is used and the number of products processed.
  • an alarm or the like is notified as needed, so that the processing liquid can be used up to the maximum number of times that it can be used, and it is possible to reduce the cost of materials, especially the processing solution and washing water. is there.
  • Fig. 1 shows the configuration of the system of the present invention
  • Fig. 2 shows the database table of the processing liquid monitoring data registration database
  • Fig. 3 shows the table of the spectrum of the processing liquid registered
  • Fig. 4 shows the liquid exchange.
  • Tochikan database table Fig. 5 is a database table of product processing acceleration factor
  • Fig. 6 is a configuration diagram showing an example of applying the present invention to a plant
  • Fig. 7 is a comparison of composition spectra.
  • Fig. 8 is a flow chart showing the method
  • Fig. 8 is a correlation diagram between the number of foreign substances in the processing liquid and the number of processed products
  • Fig. 9 is a block diagram showing an example of monitoring the processing liquid and performing necessary post-processing
  • Fig. 10 Fig.
  • FIG. 1 is a block diagram showing an example of monitoring washing water and performing necessary post-processing.
  • Fig. 11 is a block diagram showing an example of distributing washing water to each manufacturing process.
  • Fig. 1 2 FIG. 4 is a correlation diagram in which the deterioration of the liquid is accelerated according to the number of processed products.
  • FIG. 1 is a basic configuration diagram of the system of the present invention.
  • FIG. 1 an example in which the present invention is applied to a semiconductor manufacturing brand is shown.
  • 1 is a data analysis station
  • 2 is a display device
  • 3 is a processing liquid monitoring data registration database
  • 4 is a liquid replacement time management database
  • 5 is a product processing acceleration coefficient database
  • 6 is a processing liquid regeneration instruction database
  • 7 is a database for automatically instructing treatment liquid regeneration
  • 8 is a monitoring device installed at various points in the plant.
  • Table 3a of the treatment liquid monitoring data registration database 3 is shown.
  • the items consisted of date 9, time 10, processing tank No. 11, number of foreign substances 12, concentration 13, liquid composition 14, spectral diagram No. 15, reserve 16.
  • the spectrum diagram No. 15 in the table of the database 3 and each of the spectra are registered in the database 23 in association with each other, and an example of the spectrum 17 is shown in FIG. Shown in Figure 3.
  • FIG. 4 shows a table configuration 4a of the liquid exchange time management database 4. Items include processing tank No. 11, service period 19, last replacement date 20, product processing number 21. Although not shown, yield, product characteristics, etc. are stored in a database. You may leave.
  • the items consist of processing tank N 0.11, product processing number 21 and acceleration factor 23.
  • the acceleration coefficient 23 is a coefficient for giving an instruction to shorten the use / use period of the liquid and advance the replacement time in advance according to the number of products to be processed (2 1). This coefficient can be changed or corrected as necessary.
  • Fig. 6 shows an example of applying this invention to Brand A.
  • Manufacturing processes such as plating process 24, washing process 25, etching process 26, etc., each of which has a monitoring device 8 and each process. The status of the service is monitored.
  • an overall plant monitoring device 27 that compiles and manages each of these data, which monitors all plant A holidays, instructs liquid replacement timing, and manages product processing history. For example, in the case of the plating process 24, parameters such as the concentration of the plating solution (13), the composition of the solution (14), the number of foreign substances (12), and the number of uses of the solution (16) are monitored. These values are registered in the processing solution monitoring data registration database 3 from each monitoring device 8 via the data analysis station 1 shown in FIG. In addition, data on the number (21), yield, product characteristics, etc. of products processed with the processing solution will be collected as data on the liquid exchange time management data base 4. In addition,? In the embodiment of the plant shown in FIG. 56, these databases are provided in the whole plant monitoring device S27.
  • the value of the plating solution is measured using, for example, a concentration analyzer, and when the spectrum is obtained, it is registered in the processing solution monitoring data registration data 3 overnight. Then, the composition spectrum of the liquid is measured and compared with the spectrum of the liquid in the database to check the change of the waveform.
  • Fig. 7 shows one method of comparison. First, "measure the concentration of the processing solution" as the first step, and then "collect the spectrum data" as the second step. The third step is to search the previous spectrum from the database, and the fourth step is to compare two spectrum waveforms.
  • Fig. 8 shows a graph of the number of waste products and the number of processed products.
  • the number of foreign substances in the processing liquid is measured.
  • data on the number of processed products is also collected, and a correlation line between the number of processed products and the increase in the number of foreign particles is obtained.
  • the processing can be continued until it is arrested on the replacement line 12b.
  • the number of foreign substances deviates from the straight line 12a and increases rapidly, it is considered that an abnormality has occurred, and an instruction to stop processing is issued.
  • the above processing is executed by the data analysis station 1 in the embodiment of FIG. 1, and is executed by the all-blank monitor 27 in the embodiment of FIG.
  • the monitoring of the treatment liquid 30 is performed by the monitoring device 8, and in accordance with the type of the treatment liquid, for example, a change in the composition of the liquid or an increase in impurities, a processing method for reducing the amount is determined in advance. In advance, register them in databases 6 and 7.
  • the data analysis station 1 or the whole plant monitoring device 27 retrieves the data and displays, for example, the database 6 to display the appropriate bioinstruction information such as filtration, ion exchange and reverse osmosis on the display device 2 or the whole plant.
  • the regeneration liquid is displayed on the display of the run monitoring device 27 to prompt the regeneration. If the regeneration operation does not require any manual operation, the treatment liquid is automatically regenerated according to the instruction from the database 7.
  • component analysis is performed after the product is processed, and if the number of solid substances increases based on the results, the solution is filtered and then processed. If increases, store the liquid after performing ion exchange treatment.
  • FIG. 10 shows a processing example in the case of washing water.
  • the cleaning liquid 31 is used for washing the thorns after the product work processing. Therefore, after washing, necessary post-treatments (filtration, ion exchange, reverse permeation, etc.) are performed as in the case of the treatment liquid 30 and ⁇ ] described in FIG. After that, the water is purified (32), and if the quality is within a certain range with respect to the undiluted solution, it is returned to the original undiluted water.
  • the water is washed. If the processing solution is within a certain value, it is used repeatedly i. If it exceeds that value, a disposal instruction is issued. Monitor and reprocess the processing solution and cleaning solution every time.
  • Fig. 11 shows an example of the distribution of reprocessed water.
  • the status of the wastewater that has been monitored in each process by the monitoring device 8 and subjected to post-treatment is transmitted to the overall plant monitoring device 27. Therefore, the whole plant monitoring device 27 collects the status of the remaining treated water i in the whole plant and determines which process is lacking in the cleaning liquid 31a, 31b, 31c. Then, the reprocessed water 32 is sent to a predetermined area in a required amount as needed. In this way, the distribution and management of the reprocessed water 32 in the plant are instructed.
  • the product name, lot number, etc. of the product work processed at this time Even if a trouble occurs in the product work by registering it in the database 3, it can be analyzed by comparing the product work, when and by what type of processing, and the state of the processing liquid at that time.
  • the analysis results obtained in this way are used for product monitoring and for monitoring the condition of the processing solution in each processing step, and abnormalities are detected in real time.
  • Each of these data is registered in the database and correlated in various combinations such as the processing solution concentration : and the number of processed product workpieces, the number of foreign substances in the processing solution, the number of processed product workpieces, and the film thickness of the product workpiece. Analyzes can be performed, and the results can be used to predict the interval of replacement of the processing solution, that is, the timing of replacement. Also, if the product work is found to be defective after formation, it is possible to quickly narrow down which equipment and processing liquid were bad based on the processing data of each processing liquid. By taking countermeasures in a short period of time, it is possible to reduce the number of times when the plant is stopped and to prevent the creation of defects. Then, the analysis results are registered in the database, and updated as necessary as described above.
  • Costs required for reuse and costs required to be picked up and processed by specialist companies The data for calculating the usage is registered in the database 6. For example, if the treatment solution is used once or twice, the necessary reprocessing can be performed and reused.However, the solution is already used, and various impurities are mixed or the solution is used. If it has deteriorated, it is more efficient to dispose of it than to reprocess it, and the ⁇ 'river is cheaper. Therefore, it is possible to issue such an instruction based on the above-mentioned database and issue an instruction.
  • the use of the processing solution is monitored by monitoring the various types of the processing solution and the number of processes of the product within the manufacturing brand. Judgment of reutilization / ⁇ can be performed, and high-yield production of products, reduction of processing solution cost, and quality control can be performed.

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  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Food Science & Technology (AREA)
  • Medicinal Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Management, Administration, Business Operations System, And Electronic Commerce (AREA)

Abstract

La présente invention vise à uniformiser le niveau de liquide et à réduire les coûts par le retraitement, dans une usine de fabrication de produits utilisables sous forme de films, par exemple, par contrôle et retraitement les liquides utilisés pour le traitement et les eaux usées. Plus précisément, la présente invention vise à identifier le degré de détérioration des liquides de traitement en fonction du nombre de produits traités, à réaliser un cycle de remplacement approprié, à donner une instruction de traitement en vue d'une réutilisation et à procéder à une réutilisation à l'aide d'une station d'analyse de données, des dispositifs de surveillance des différents processus et un dispositif de surveillance général chargé de centraliser les données recueillies par les dispositifs de surveillance et à surveiller ces derniers de manière à collecter des données de surveillance provenant des dispositifs de surveillance respectifs, afin d'évaluer la qualité des liquides de traitement en vue de leur éventuelle réutilisation, ce qui permet à la fois de réduire la pollution et les coûts de matériaux.
PCT/JP1995/000483 1995-03-17 1995-03-17 Systeme de gestion des eaux usees WO1996029598A1 (fr)

Priority Applications (1)

Application Number Priority Date Filing Date Title
PCT/JP1995/000483 WO1996029598A1 (fr) 1995-03-17 1995-03-17 Systeme de gestion des eaux usees

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/JP1995/000483 WO1996029598A1 (fr) 1995-03-17 1995-03-17 Systeme de gestion des eaux usees

Publications (1)

Publication Number Publication Date
WO1996029598A1 true WO1996029598A1 (fr) 1996-09-26

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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002263597A (ja) * 2001-03-06 2002-09-17 Seiko Corp 生産プラントの配管システム洗浄装置、洗浄方法、及びプログラム
WO2003081647A1 (fr) * 2002-03-27 2003-10-02 Ebara Corporation Systeme d'approvisionnement en matieres d'une usine de fabrication de dispositifs a semi-conducteur

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59163541A (ja) * 1983-03-09 1984-09-14 Hitachi Ltd フラツクス濃度測定方法
JPH0228917B2 (ja) * 1985-11-13 1990-06-27 Hitachi Ltd Senjosochi
JPH03242536A (ja) * 1990-02-20 1991-10-29 Tokico Ltd 自動液管理装置
JPH03283488A (ja) * 1990-03-30 1991-12-13 Fujitsu Ltd プリント基板の後洗浄方法

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59163541A (ja) * 1983-03-09 1984-09-14 Hitachi Ltd フラツクス濃度測定方法
JPH0228917B2 (ja) * 1985-11-13 1990-06-27 Hitachi Ltd Senjosochi
JPH03242536A (ja) * 1990-02-20 1991-10-29 Tokico Ltd 自動液管理装置
JPH03283488A (ja) * 1990-03-30 1991-12-13 Fujitsu Ltd プリント基板の後洗浄方法

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002263597A (ja) * 2001-03-06 2002-09-17 Seiko Corp 生産プラントの配管システム洗浄装置、洗浄方法、及びプログラム
WO2003081647A1 (fr) * 2002-03-27 2003-10-02 Ebara Corporation Systeme d'approvisionnement en matieres d'une usine de fabrication de dispositifs a semi-conducteur
US7305275B2 (en) 2002-03-27 2007-12-04 Ebara Corporation Material supply system in semiconductor device manufacturing plant

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