USD935425S1 - Susceptor for use in production of a semiconductor - Google Patents
Susceptor for use in production of a semiconductor Download PDFInfo
- Publication number
- USD935425S1 USD935425S1 US35/355,090 US35509019F USD935425S US D935425 S1 USD935425 S1 US D935425S1 US 35509019 F US35509019 F US 35509019F US D935425 S USD935425 S US D935425S
- Authority
- US
- United States
- Prior art keywords
- susceptor
- view
- semiconductor
- production
- sectional
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 239000004065 semiconductor Substances 0.000 title claims 2
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/458—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for supporting substrates in the reaction chamber
- C23C16/4582—Rigid and flat substrates, e.g. plates or discs
- C23C16/4583—Rigid and flat substrates, e.g. plates or discs the substrate being supported substantially horizontally
- C23C16/4585—Devices at or outside the perimeter of the substrate support, e.g. clamping rings, shrouds
Landscapes
- Chemical & Material Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2018-021799 | 2018-02-09 | ||
JPD2018-21799F JP1648519S (de) | 2018-10-04 | 2018-10-04 |
Publications (1)
Publication Number | Publication Date |
---|---|
USD935425S1 true USD935425S1 (en) | 2021-11-09 |
Family
ID=68916791
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US35/355,090 Active USD935425S1 (en) | 2018-10-04 | 2019-04-04 | Susceptor for use in production of a semiconductor |
Country Status (3)
Country | Link |
---|---|
US (1) | USD935425S1 (de) |
JP (1) | JP1648519S (de) |
TW (1) | TWD203027S (de) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
USD965044S1 (en) * | 2019-08-19 | 2022-09-27 | Asm Ip Holding B.V. | Susceptor shaft |
USD975665S1 (en) * | 2019-05-17 | 2023-01-17 | Asm Ip Holding B.V. | Susceptor shaft |
USD1037186S1 (en) * | 2021-10-22 | 2024-07-30 | Nuflare Technology, Inc. | Susceptor ring |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
USD1012873S1 (en) | 2020-09-24 | 2024-01-30 | Asm Ip Holding B.V. | Electrode for semiconductor processing apparatus |
USD980813S1 (en) | 2021-05-11 | 2023-03-14 | Asm Ip Holding B.V. | Gas flow control plate for substrate processing apparatus |
Citations (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US8366830B2 (en) * | 2003-03-04 | 2013-02-05 | Cree, Inc. | Susceptor apparatus for inverted type MOCVD reactor |
US8372204B2 (en) * | 2002-05-13 | 2013-02-12 | Cree, Inc. | Susceptor for MOCVD reactor |
JP2013138224A (ja) | 2008-08-29 | 2013-07-11 | Veeco Instruments Inc | 一様でない熱抵抗を有するウエハキャリア |
USD694791S1 (en) * | 2011-09-20 | 2013-12-03 | Tokyo Electron Limited | Baffle plate for manufacturing semiconductor |
USD694790S1 (en) * | 2011-09-20 | 2013-12-03 | Tokyo Electron Limited | Baffle plate for manufacturing semiconductor |
US8801857B2 (en) * | 2008-10-31 | 2014-08-12 | Asm America, Inc. | Self-centering susceptor ring assembly |
US9612215B2 (en) * | 2004-07-22 | 2017-04-04 | Toyo Tanso Co., Ltd. | Susceptor |
USD810705S1 (en) * | 2016-04-01 | 2018-02-20 | Veeco Instruments Inc. | Self-centering wafer carrier for chemical vapor deposition |
USD819580S1 (en) * | 2016-04-01 | 2018-06-05 | Veeco Instruments, Inc. | Self-centering wafer carrier for chemical vapor deposition |
-
2018
- 2018-10-04 JP JPD2018-21799F patent/JP1648519S/ja active Active
-
2019
- 2019-04-03 TW TW108301945F patent/TWD203027S/zh unknown
- 2019-04-04 US US35/355,090 patent/USD935425S1/en active Active
Patent Citations (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US8372204B2 (en) * | 2002-05-13 | 2013-02-12 | Cree, Inc. | Susceptor for MOCVD reactor |
US8366830B2 (en) * | 2003-03-04 | 2013-02-05 | Cree, Inc. | Susceptor apparatus for inverted type MOCVD reactor |
US9612215B2 (en) * | 2004-07-22 | 2017-04-04 | Toyo Tanso Co., Ltd. | Susceptor |
JP2013138224A (ja) | 2008-08-29 | 2013-07-11 | Veeco Instruments Inc | 一様でない熱抵抗を有するウエハキャリア |
US8801857B2 (en) * | 2008-10-31 | 2014-08-12 | Asm America, Inc. | Self-centering susceptor ring assembly |
USD694791S1 (en) * | 2011-09-20 | 2013-12-03 | Tokyo Electron Limited | Baffle plate for manufacturing semiconductor |
USD694790S1 (en) * | 2011-09-20 | 2013-12-03 | Tokyo Electron Limited | Baffle plate for manufacturing semiconductor |
USD810705S1 (en) * | 2016-04-01 | 2018-02-20 | Veeco Instruments Inc. | Self-centering wafer carrier for chemical vapor deposition |
USD819580S1 (en) * | 2016-04-01 | 2018-06-05 | Veeco Instruments, Inc. | Self-centering wafer carrier for chemical vapor deposition |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
USD975665S1 (en) * | 2019-05-17 | 2023-01-17 | Asm Ip Holding B.V. | Susceptor shaft |
USD965044S1 (en) * | 2019-08-19 | 2022-09-27 | Asm Ip Holding B.V. | Susceptor shaft |
USD1037186S1 (en) * | 2021-10-22 | 2024-07-30 | Nuflare Technology, Inc. | Susceptor ring |
Also Published As
Publication number | Publication date |
---|---|
JP1648519S (de) | 2019-12-23 |
TWD203027S (zh) | 2020-03-01 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
FEPP | Fee payment procedure |
Free format text: ENTITY STATUS SET TO UNDISCOUNTED (ORIGINAL EVENT CODE: BIG.); ENTITY STATUS OF PATENT OWNER: LARGE ENTITY |