USD935425S1 - Susceptor for use in production of a semiconductor - Google Patents

Susceptor for use in production of a semiconductor Download PDF

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Publication number
USD935425S1
USD935425S1 US35/355,090 US35509019F USD935425S US D935425 S1 USD935425 S1 US D935425S1 US 35509019 F US35509019 F US 35509019F US D935425 S USD935425 S US D935425S
Authority
US
United States
Prior art keywords
susceptor
view
semiconductor
production
sectional
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
US35/355,090
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English (en)
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USD922209S1 (en
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Inventor
Takahiro Ikejiri
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toyo Tanso Co Ltd
Original Assignee
Toyo Tanso Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toyo Tanso Co Ltd filed Critical Toyo Tanso Co Ltd
Assigned to TOYO TANSO CO., LTD. reassignment TOYO TANSO CO., LTD. ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). Assignors: IKEJIRI, TAKAHIRO
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Publication of USD935425S1 publication Critical patent/USD935425S1/en
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Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/458—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for supporting substrates in the reaction chamber
    • C23C16/4582—Rigid and flat substrates, e.g. plates or discs
    • C23C16/4583—Rigid and flat substrates, e.g. plates or discs the substrate being supported substantially horizontally
    • C23C16/4585—Devices at or outside the perimeter of the substrate support, e.g. clamping rings, shrouds

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  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
US35/355,090 2018-10-04 2019-04-04 Susceptor for use in production of a semiconductor Active USD935425S1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JPD2018-21799F JP1648519S (cs) 2018-10-04 2018-10-04
JP2018-021799 2018-10-04

Publications (1)

Publication Number Publication Date
USD935425S1 true USD935425S1 (en) 2021-11-09

Family

ID=68916791

Family Applications (1)

Application Number Title Priority Date Filing Date
US35/355,090 Active USD935425S1 (en) 2018-10-04 2019-04-04 Susceptor for use in production of a semiconductor

Country Status (3)

Country Link
US (1) USD935425S1 (cs)
JP (1) JP1648519S (cs)
TW (1) TWD203027S (cs)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
USD965044S1 (en) * 2019-08-19 2022-09-27 Asm Ip Holding B.V. Susceptor shaft
USD975665S1 (en) * 2019-05-17 2023-01-17 Asm Ip Holding B.V. Susceptor shaft
USD1037186S1 (en) * 2021-10-22 2024-07-30 Nuflare Technology, Inc. Susceptor ring
USD1052547S1 (en) * 2022-10-20 2024-11-26 Nuflare Technology, Inc. Semiconductor wafer and susceptor heating

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
USD1012873S1 (en) 2020-09-24 2024-01-30 Asm Ip Holding B.V. Electrode for semiconductor processing apparatus
USD980813S1 (en) 2021-05-11 2023-03-14 Asm Ip Holding B.V. Gas flow control plate for substrate processing apparatus

Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8366830B2 (en) * 2003-03-04 2013-02-05 Cree, Inc. Susceptor apparatus for inverted type MOCVD reactor
US8372204B2 (en) * 2002-05-13 2013-02-12 Cree, Inc. Susceptor for MOCVD reactor
JP2013138224A (ja) 2008-08-29 2013-07-11 Veeco Instruments Inc 一様でない熱抵抗を有するウエハキャリア
USD694790S1 (en) * 2011-09-20 2013-12-03 Tokyo Electron Limited Baffle plate for manufacturing semiconductor
USD694791S1 (en) * 2011-09-20 2013-12-03 Tokyo Electron Limited Baffle plate for manufacturing semiconductor
US8801857B2 (en) * 2008-10-31 2014-08-12 Asm America, Inc. Self-centering susceptor ring assembly
US9612215B2 (en) * 2004-07-22 2017-04-04 Toyo Tanso Co., Ltd. Susceptor
USD810705S1 (en) * 2016-04-01 2018-02-20 Veeco Instruments Inc. Self-centering wafer carrier for chemical vapor deposition
USD819580S1 (en) * 2016-04-01 2018-06-05 Veeco Instruments, Inc. Self-centering wafer carrier for chemical vapor deposition

Patent Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8372204B2 (en) * 2002-05-13 2013-02-12 Cree, Inc. Susceptor for MOCVD reactor
US8366830B2 (en) * 2003-03-04 2013-02-05 Cree, Inc. Susceptor apparatus for inverted type MOCVD reactor
US9612215B2 (en) * 2004-07-22 2017-04-04 Toyo Tanso Co., Ltd. Susceptor
JP2013138224A (ja) 2008-08-29 2013-07-11 Veeco Instruments Inc 一様でない熱抵抗を有するウエハキャリア
US8801857B2 (en) * 2008-10-31 2014-08-12 Asm America, Inc. Self-centering susceptor ring assembly
USD694790S1 (en) * 2011-09-20 2013-12-03 Tokyo Electron Limited Baffle plate for manufacturing semiconductor
USD694791S1 (en) * 2011-09-20 2013-12-03 Tokyo Electron Limited Baffle plate for manufacturing semiconductor
USD810705S1 (en) * 2016-04-01 2018-02-20 Veeco Instruments Inc. Self-centering wafer carrier for chemical vapor deposition
USD819580S1 (en) * 2016-04-01 2018-06-05 Veeco Instruments, Inc. Self-centering wafer carrier for chemical vapor deposition

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
USD975665S1 (en) * 2019-05-17 2023-01-17 Asm Ip Holding B.V. Susceptor shaft
USD965044S1 (en) * 2019-08-19 2022-09-27 Asm Ip Holding B.V. Susceptor shaft
USD1037186S1 (en) * 2021-10-22 2024-07-30 Nuflare Technology, Inc. Susceptor ring
USD1052547S1 (en) * 2022-10-20 2024-11-26 Nuflare Technology, Inc. Semiconductor wafer and susceptor heating

Also Published As

Publication number Publication date
JP1648519S (cs) 2019-12-23
TWD203027S (zh) 2020-03-01

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