USD877079S1 - Electrode plate for plasma processing apparatus - Google Patents

Electrode plate for plasma processing apparatus Download PDF

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Publication number
USD877079S1
USD877079S1 US29/554,794 US201629554794F USD877079S US D877079 S1 USD877079 S1 US D877079S1 US 201629554794 F US201629554794 F US 201629554794F US D877079 S USD877079 S US D877079S
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United States
Prior art keywords
processing apparatus
electrode plate
plasma processing
view
taken
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Active
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US29/554,794
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English (en)
Inventor
Shinichi Kozuka
Ryosuke NIITSUMA
Manabu Ishikawa
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Tokyo Electron Ltd
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Tokyo Electron Ltd
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Assigned to TOKYO ELECTRON LIMITED reassignment TOKYO ELECTRON LIMITED ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). Assignors: ISHIKAWA, MANABU, KOZUKA, SHINICHI, NIITSUMA, RYOSUKE
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US29/554,794 2015-08-26 2016-02-16 Electrode plate for plasma processing apparatus Active USD877079S1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JPD2015-18692F JP1545606S (fr) 2015-08-26 2015-08-26
JP2015-018692 2015-08-26

Publications (1)

Publication Number Publication Date
USD877079S1 true USD877079S1 (en) 2020-03-03

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ID=55484389

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US29/554,794 Active USD877079S1 (en) 2015-08-26 2016-02-16 Electrode plate for plasma processing apparatus

Country Status (3)

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US (1) USD877079S1 (fr)
JP (1) JP1545606S (fr)
TW (1) TWD178422S (fr)

Citations (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
USD411516S (en) * 1996-03-15 1999-06-29 Tokyo Electron Limited Gas diffusion plate for electrode of semiconductor wafer processing apparatus
USD460350S1 (en) * 2001-03-22 2002-07-16 Alan Davis Compressed fabric article package having a wedge shape
US6537419B1 (en) * 2000-04-26 2003-03-25 David W. Kinnard Gas distribution plate assembly for providing laminar gas flow across the surface of a substrate
US6793733B2 (en) * 2002-01-25 2004-09-21 Applied Materials Inc. Gas distribution showerhead
US6872258B2 (en) * 2001-07-16 2005-03-29 Samsung Electronics Co., Ltd. Shower head of a wafer treatment apparatus having a gap controller
USD570310S1 (en) * 2006-08-01 2008-06-03 Tokyo Electron Limited Attracting plate of an electrostatic chuck for semiconductor manufacturing
USD609652S1 (en) * 2008-07-22 2010-02-09 Tokyo Electron Limited Wafer attracting plate
US8221582B2 (en) * 2008-07-07 2012-07-17 Lam Research Corporation Clamped monolithic showerhead electrode
US8702866B2 (en) * 2006-12-18 2014-04-22 Lam Research Corporation Showerhead electrode assembly with gas flow modification for extended electrode life
US9484190B2 (en) * 2014-01-25 2016-11-01 Yuri Glukhoy Showerhead-cooler system of a semiconductor-processing chamber for semiconductor wafers of large area
USD787458S1 (en) * 2015-11-18 2017-05-23 Asm Ip Holding B.V. Gas supply plate for semiconductor manufacturing apparatus
USD790041S1 (en) * 2016-01-08 2017-06-20 Asm Ip Holding B.V. Gas dispersing plate for semiconductor manufacturing apparatus
USD789888S1 (en) * 2016-01-08 2017-06-20 Asm Ip Holding B.V. Electrode plate for semiconductor manufacturing apparatus
USD793572S1 (en) * 2015-06-10 2017-08-01 Tokyo Electron Limited Electrode plate for plasma processing apparatus

Patent Citations (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
USD411516S (en) * 1996-03-15 1999-06-29 Tokyo Electron Limited Gas diffusion plate for electrode of semiconductor wafer processing apparatus
US6537419B1 (en) * 2000-04-26 2003-03-25 David W. Kinnard Gas distribution plate assembly for providing laminar gas flow across the surface of a substrate
USD460350S1 (en) * 2001-03-22 2002-07-16 Alan Davis Compressed fabric article package having a wedge shape
US6872258B2 (en) * 2001-07-16 2005-03-29 Samsung Electronics Co., Ltd. Shower head of a wafer treatment apparatus having a gap controller
US6793733B2 (en) * 2002-01-25 2004-09-21 Applied Materials Inc. Gas distribution showerhead
USD570310S1 (en) * 2006-08-01 2008-06-03 Tokyo Electron Limited Attracting plate of an electrostatic chuck for semiconductor manufacturing
US8702866B2 (en) * 2006-12-18 2014-04-22 Lam Research Corporation Showerhead electrode assembly with gas flow modification for extended electrode life
US8221582B2 (en) * 2008-07-07 2012-07-17 Lam Research Corporation Clamped monolithic showerhead electrode
USD609652S1 (en) * 2008-07-22 2010-02-09 Tokyo Electron Limited Wafer attracting plate
US9484190B2 (en) * 2014-01-25 2016-11-01 Yuri Glukhoy Showerhead-cooler system of a semiconductor-processing chamber for semiconductor wafers of large area
USD793572S1 (en) * 2015-06-10 2017-08-01 Tokyo Electron Limited Electrode plate for plasma processing apparatus
USD787458S1 (en) * 2015-11-18 2017-05-23 Asm Ip Holding B.V. Gas supply plate for semiconductor manufacturing apparatus
USD790041S1 (en) * 2016-01-08 2017-06-20 Asm Ip Holding B.V. Gas dispersing plate for semiconductor manufacturing apparatus
USD789888S1 (en) * 2016-01-08 2017-06-20 Asm Ip Holding B.V. Electrode plate for semiconductor manufacturing apparatus

Also Published As

Publication number Publication date
JP1545606S (fr) 2016-03-14
TWD178422S (zh) 2016-09-21

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