JP1545606S - - Google Patents
Info
- Publication number
- JP1545606S JP1545606S JPD2015-18692F JP2015018692F JP1545606S JP 1545606 S JP1545606 S JP 1545606S JP 2015018692 F JP2015018692 F JP 2015018692F JP 1545606 S JP1545606 S JP 1545606S
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Priority Applications (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JPD2015-18692F JP1545606S (ja) | 2015-08-26 | 2015-08-26 | |
| US29/554,794 USD877079S1 (en) | 2015-08-26 | 2016-02-16 | Electrode plate for plasma processing apparatus |
| TW105300839F TWD178422S (zh) | 2015-08-26 | 2016-02-23 | 電漿處理裝置用電極板之部分 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JPD2015-18692F JP1545606S (ja) | 2015-08-26 | 2015-08-26 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JP1545606S true JP1545606S (ja) | 2016-03-14 |
Family
ID=55484389
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JPD2015-18692F Active JP1545606S (ja) | 2015-08-26 | 2015-08-26 |
Country Status (3)
| Country | Link |
|---|---|
| US (1) | USD877079S1 (ja) |
| JP (1) | JP1545606S (ja) |
| TW (1) | TWD178422S (ja) |
Family Cites Families (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| USD411516S (en) * | 1996-03-15 | 1999-06-29 | Tokyo Electron Limited | Gas diffusion plate for electrode of semiconductor wafer processing apparatus |
| US6537419B1 (en) * | 2000-04-26 | 2003-03-25 | David W. Kinnard | Gas distribution plate assembly for providing laminar gas flow across the surface of a substrate |
| USD460350S1 (en) * | 2001-03-22 | 2002-07-16 | Alan Davis | Compressed fabric article package having a wedge shape |
| KR100400044B1 (ko) * | 2001-07-16 | 2003-09-29 | 삼성전자주식회사 | 간격 조절 장치를 가지는 웨이퍼 처리 장치의 샤워 헤드 |
| US6793733B2 (en) * | 2002-01-25 | 2004-09-21 | Applied Materials Inc. | Gas distribution showerhead |
| USD570310S1 (en) * | 2006-08-01 | 2008-06-03 | Tokyo Electron Limited | Attracting plate of an electrostatic chuck for semiconductor manufacturing |
| US8702866B2 (en) * | 2006-12-18 | 2014-04-22 | Lam Research Corporation | Showerhead electrode assembly with gas flow modification for extended electrode life |
| US8221582B2 (en) * | 2008-07-07 | 2012-07-17 | Lam Research Corporation | Clamped monolithic showerhead electrode |
| USD609652S1 (en) * | 2008-07-22 | 2010-02-09 | Tokyo Electron Limited | Wafer attracting plate |
| US9484190B2 (en) * | 2014-01-25 | 2016-11-01 | Yuri Glukhoy | Showerhead-cooler system of a semiconductor-processing chamber for semiconductor wafers of large area |
| JP1545222S (ja) * | 2015-06-10 | 2016-03-07 | ||
| TWD177995S (zh) * | 2015-11-18 | 2016-09-01 | ＡＳＭ知識產權私人控股有	 | 用於半導體製造設備之氣體供應板 |
| TWD178699S (zh) * | 2016-01-08 | 2016-10-01 | ＡＳＭ知識產權私人控股有	 | 用於半導體製造設備的氣體分散板 |
| TWD178425S (zh) * | 2016-01-08 | 2016-09-21 | ＡＳＭ知識產權私人控股有	 | 用於半導體製造設備的電極板 |
-
2015
- 2015-08-26 JP JPD2015-18692F patent/JP1545606S/ja active Active
-
2016
- 2016-02-16 US US29/554,794 patent/USD877079S1/en active Active
- 2016-02-23 TW TW105300839F patent/TWD178422S/zh unknown
Also Published As
| Publication number | Publication date |
|---|---|
| TWD178422S (zh) | 2016-09-21 |
| USD877079S1 (en) | 2020-03-03 |