USD1108381S1 - Filler block for substrate processing apparatus - Google Patents
Filler block for substrate processing apparatusInfo
- Publication number
- USD1108381S1 USD1108381S1 US29/961,389 US202429961389F USD1108381S US D1108381 S1 USD1108381 S1 US D1108381S1 US 202429961389 F US202429961389 F US 202429961389F US D1108381 S USD1108381 S US D1108381S
- Authority
- US
- United States
- Prior art keywords
- processing apparatus
- substrate processing
- filler block
- filler
- block
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Images
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2024-004871D | 2024-03-08 | ||
| JP2024004871F JP1778590S (enExample) | 2024-03-08 | 2024-03-08 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| USD1108381S1 true USD1108381S1 (en) | 2026-01-06 |
Family
ID=92499660
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| US29/961,389 Active USD1108381S1 (en) | 2024-03-08 | 2024-09-05 | Filler block for substrate processing apparatus |
Country Status (2)
| Country | Link |
|---|---|
| US (1) | USD1108381S1 (enExample) |
| JP (1) | JP1778590S (enExample) |
Citations (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| USD326273S (en) * | 1988-07-25 | 1992-05-19 | Tel Sagami Limited | Heat insulating cylinder for thermal treatment of semiconductor wafers |
| USD326272S (en) * | 1988-07-25 | 1992-05-19 | Tel Sagami Limited | Heat insulating cylinder for thermal treatment of semiconductor wafers |
| US20130244440A1 (en) * | 2012-03-15 | 2013-09-19 | Lam Research Corporation | Chamber filler kit for plasma etch chamber useful for fast gas switching |
| US9005459B2 (en) * | 2011-03-18 | 2015-04-14 | Tokyo Electron Limited | Film deposition method and film deposition apparatus |
| US20180005851A1 (en) * | 2016-07-01 | 2018-01-04 | Lam Research Corporation | Chamber filler kit for dielectric etch chamber |
| USD818961S1 (en) * | 2016-02-10 | 2018-05-29 | Hitachi Kokusai Electric Inc. | Insulation unit cover of semiconductor manufacturing apparatus |
| US11646184B2 (en) * | 2019-11-29 | 2023-05-09 | Asm Ip Holding B.V. | Substrate processing apparatus |
| USD1003243S1 (en) * | 2021-06-28 | 2023-10-31 | Kokusai Electric Corporation | Heat insulator cover of semiconductor manufacturing apparatus |
| USD1003834S1 (en) * | 2021-06-28 | 2023-11-07 | Kokusai Electric Corporation | Heat insulator cover of semiconductor manufacturing apparatus |
| US12020934B2 (en) * | 2020-07-08 | 2024-06-25 | Asm Ip Holding B.V. | Substrate processing method |
| US12374543B2 (en) * | 2020-09-28 | 2025-07-29 | Tokyo Electron Limited | Recess filling method and substrate processing apparatus |
-
2024
- 2024-03-08 JP JP2024004871F patent/JP1778590S/ja active Active
- 2024-09-05 US US29/961,389 patent/USD1108381S1/en active Active
Patent Citations (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| USD326273S (en) * | 1988-07-25 | 1992-05-19 | Tel Sagami Limited | Heat insulating cylinder for thermal treatment of semiconductor wafers |
| USD326272S (en) * | 1988-07-25 | 1992-05-19 | Tel Sagami Limited | Heat insulating cylinder for thermal treatment of semiconductor wafers |
| US9005459B2 (en) * | 2011-03-18 | 2015-04-14 | Tokyo Electron Limited | Film deposition method and film deposition apparatus |
| US20130244440A1 (en) * | 2012-03-15 | 2013-09-19 | Lam Research Corporation | Chamber filler kit for plasma etch chamber useful for fast gas switching |
| USD818961S1 (en) * | 2016-02-10 | 2018-05-29 | Hitachi Kokusai Electric Inc. | Insulation unit cover of semiconductor manufacturing apparatus |
| US20180005851A1 (en) * | 2016-07-01 | 2018-01-04 | Lam Research Corporation | Chamber filler kit for dielectric etch chamber |
| US11646184B2 (en) * | 2019-11-29 | 2023-05-09 | Asm Ip Holding B.V. | Substrate processing apparatus |
| US12020934B2 (en) * | 2020-07-08 | 2024-06-25 | Asm Ip Holding B.V. | Substrate processing method |
| US12374543B2 (en) * | 2020-09-28 | 2025-07-29 | Tokyo Electron Limited | Recess filling method and substrate processing apparatus |
| USD1003243S1 (en) * | 2021-06-28 | 2023-10-31 | Kokusai Electric Corporation | Heat insulator cover of semiconductor manufacturing apparatus |
| USD1003834S1 (en) * | 2021-06-28 | 2023-11-07 | Kokusai Electric Corporation | Heat insulator cover of semiconductor manufacturing apparatus |
Also Published As
| Publication number | Publication date |
|---|---|
| JP1778590S (enExample) | 2024-08-28 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| FEPP | Fee payment procedure |
Free format text: ENTITY STATUS SET TO UNDISCOUNTED (ORIGINAL EVENT CODE: BIG.); ENTITY STATUS OF PATENT OWNER: LARGE ENTITY |