USD1022904S1 - Tubular reactor - Google Patents

Tubular reactor Download PDF

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Publication number
USD1022904S1
USD1022904S1 US29/830,614 US202229830614F USD1022904S US D1022904 S1 USD1022904 S1 US D1022904S1 US 202229830614 F US202229830614 F US 202229830614F US D1022904 S USD1022904 S US D1022904S
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US
United States
Prior art keywords
tubular reactor
view
elevational view
reactor
tubular
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
US29/830,614
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English (en)
Inventor
Yusaku OKAJIMA
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kokusai Electric Corp
Original Assignee
Kokusai Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kokusai Electric Corp filed Critical Kokusai Electric Corp
Assigned to Kokusai Electric Corporation reassignment Kokusai Electric Corporation ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). Assignors: OKAJIMA, YUSAKU
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Publication of USD1022904S1 publication Critical patent/USD1022904S1/en
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US29/830,614 2021-09-15 2022-03-14 Tubular reactor Active USD1022904S1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2021019930F JP1713188S (cs) 2021-09-15 2021-09-15
JP2021-019930D 2021-09-15

Publications (1)

Publication Number Publication Date
USD1022904S1 true USD1022904S1 (en) 2024-04-16

Family

ID=81209955

Family Applications (1)

Application Number Title Priority Date Filing Date
US29/830,614 Active USD1022904S1 (en) 2021-09-15 2022-03-14 Tubular reactor

Country Status (3)

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US (1) USD1022904S1 (cs)
JP (1) JP1713188S (cs)
TW (1) TWD230200S (cs)

Citations (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
USD405429S (en) * 1997-01-31 1999-02-09 Tokyo Electron Limited Processing tube for use in a semiconductor wafer heat processing apparatus
USD405431S (en) * 1997-08-20 1999-02-09 Tokyo Electron Ltd. Tube for use in a semiconductor wafer heat processing apparatus
USD424024S (en) * 1997-01-31 2000-05-02 Tokyo Electron Limited Quartz process tube
US20030221779A1 (en) * 2002-03-28 2003-12-04 Kazuyuki Okuda Substrate processing apparatus
USD590359S1 (en) * 2006-02-20 2009-04-14 Tokyo Electron Limited Process tube for manufacturing semiconductor wafers or the like
USD594488S1 (en) * 2007-04-20 2009-06-16 Tokyo Electron Limited Process tube for manufacturing semiconductor wafers
USD600659S1 (en) * 2006-09-12 2009-09-22 Tokyo Electron Limited Process tube for manufacturing semiconductor wafers
USD618638S1 (en) 2008-05-09 2010-06-29 Hitachi Kokusai Electric, Inc. Reaction tube
USD619630S1 (en) * 2007-05-08 2010-07-13 Tokyo Electron Limited Process tube for manufacturing semiconductor wafers
USD742339S1 (en) 2014-03-12 2015-11-03 Hitachi Kokusai Electric Inc. Reaction tube
USD770993S1 (en) * 2015-09-04 2016-11-08 Hitachi Kokusai Electric Inc. Reaction tube
USD772824S1 (en) * 2015-02-25 2016-11-29 Hitachi Kokusai Electric Inc. Reaction tube
USD778457S1 (en) * 2015-02-23 2017-02-07 Hitachi Kokusai Electric Inc. Reaction tube
USD791090S1 (en) * 2015-09-04 2017-07-04 Hitachi Kokusai Electric Inc. Reaction tube

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWD166710S (zh) 2013-07-08 2015-03-21 日立國際電氣股份有限公司 反應管

Patent Citations (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
USD405429S (en) * 1997-01-31 1999-02-09 Tokyo Electron Limited Processing tube for use in a semiconductor wafer heat processing apparatus
USD424024S (en) * 1997-01-31 2000-05-02 Tokyo Electron Limited Quartz process tube
USD405431S (en) * 1997-08-20 1999-02-09 Tokyo Electron Ltd. Tube for use in a semiconductor wafer heat processing apparatus
US20030221779A1 (en) * 2002-03-28 2003-12-04 Kazuyuki Okuda Substrate processing apparatus
USD590359S1 (en) * 2006-02-20 2009-04-14 Tokyo Electron Limited Process tube for manufacturing semiconductor wafers or the like
USD600659S1 (en) * 2006-09-12 2009-09-22 Tokyo Electron Limited Process tube for manufacturing semiconductor wafers
USD594488S1 (en) * 2007-04-20 2009-06-16 Tokyo Electron Limited Process tube for manufacturing semiconductor wafers
USD619630S1 (en) * 2007-05-08 2010-07-13 Tokyo Electron Limited Process tube for manufacturing semiconductor wafers
USD618638S1 (en) 2008-05-09 2010-06-29 Hitachi Kokusai Electric, Inc. Reaction tube
USD742339S1 (en) 2014-03-12 2015-11-03 Hitachi Kokusai Electric Inc. Reaction tube
USD778457S1 (en) * 2015-02-23 2017-02-07 Hitachi Kokusai Electric Inc. Reaction tube
USD772824S1 (en) * 2015-02-25 2016-11-29 Hitachi Kokusai Electric Inc. Reaction tube
USD770993S1 (en) * 2015-09-04 2016-11-08 Hitachi Kokusai Electric Inc. Reaction tube
USD791090S1 (en) * 2015-09-04 2017-07-04 Hitachi Kokusai Electric Inc. Reaction tube

Also Published As

Publication number Publication date
TWD230200S (zh) 2024-03-01
JP1713188S (cs) 2022-04-21

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