US9627458B2 - Organic light-emitting display panel and method of fabricating the same - Google Patents

Organic light-emitting display panel and method of fabricating the same Download PDF

Info

Publication number
US9627458B2
US9627458B2 US14/676,520 US201514676520A US9627458B2 US 9627458 B2 US9627458 B2 US 9627458B2 US 201514676520 A US201514676520 A US 201514676520A US 9627458 B2 US9627458 B2 US 9627458B2
Authority
US
United States
Prior art keywords
organic light
layer
emitting
patterns
primer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
US14/676,520
Other languages
English (en)
Other versions
US20160133676A1 (en
Inventor
Geun Tak Kim
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Samsung Display Co Ltd
Original Assignee
Samsung Display Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Samsung Display Co Ltd filed Critical Samsung Display Co Ltd
Assigned to SAMSUNG DISPLAY CO., LTD. reassignment SAMSUNG DISPLAY CO., LTD. ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). Assignors: KIM, GUEN TAK
Publication of US20160133676A1 publication Critical patent/US20160133676A1/en
Application granted granted Critical
Publication of US9627458B2 publication Critical patent/US9627458B2/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • H01L27/3246—
    • H01L27/3211—
    • H01L27/3216—
    • H01L51/0012—
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/10—OLED displays
    • H10K59/12—Active-matrix OLED [AMOLED] displays
    • H10K59/122—Pixel-defining structures or layers, e.g. banks
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/30—Devices specially adapted for multicolour light emission
    • H10K59/35—Devices specially adapted for multicolour light emission comprising red-green-blue [RGB] subpixels
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/30—Devices specially adapted for multicolour light emission
    • H10K59/35—Devices specially adapted for multicolour light emission comprising red-green-blue [RGB] subpixels
    • H10K59/352—Devices specially adapted for multicolour light emission comprising red-green-blue [RGB] subpixels the areas of the RGB subpixels being different
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/10—Deposition of organic active material
    • H10K71/191—Deposition of organic active material characterised by provisions for the orientation or alignment of the layer to be deposited

Definitions

  • Embodiments relate to an organic light-emitting display panel and a method of fabricating the organic light-emitting display panel.
  • Organic light-emitting display devices which are flat panel display devices, are increasingly replacing LCDs, which have been widespread.
  • Organic light-emitting display devices unlike LCDs, display images by generating light themselves, and thus do not require backlight units, which can generate light.
  • organic light-emitting display devices may be more suitable than LCDs in the fabrication of thin display devices.
  • organic light-emitting display devices have excellent response properties. Due to these and other benefits, organic light-emitting display devices are increasingly expanding their usage as next-generation display devices.
  • Embodiments are directed to an organic light-emitting display panel and a method of fabricating the organic light-emitting display panel.
  • the embodiments may be realized by providing an organic light-emitting display panel including a base substrate; a first electrode layer including a plurality of first electrodes arranged on the base substrate; a pixel-defining layer including partition walls that extend from the base substrate and that define a plurality of pixels; an organic light-emitting layer including a plurality of organic light-emitting patterns in the pixels, respectively; and a second electrode layer on the organic light-emitting layer, wherein the organic light-emitting layer includes a plurality of primer patterns, the plurality of primer patterns being respectively formed in the pixels, being separate from one another, and respectively overlapping the first electrodes, at least one of the primer patterns has an area different area from an area of the other primer patterns, and the primer patterns have an affinity for liquid that is higher than an affinity for liquid of the pixel-defining layer.
  • the organic light-emitting layer may include first through third organic light-emitting patterns, which alternately appear at least once, and at least one of the first through third organic light-emitting patterns may have a thickness different from a thickness of the other organic light-emitting patterns.
  • L1 denotes the thickness of the first organic light-emitting pattern
  • ⁇ R denotes the wavelength of red light
  • m is a natural number
  • L2 denotes the thickness of the second organic light-emitting pattern
  • ⁇ G denotes the wavelength of green light
  • m is a natural number
  • L3 denotes the thickness of the second organic light-emitting pattern
  • ⁇ B denotes the wavelength of blue light
  • m is a natural number
  • the organic light-emitting layer may further include a hole injection layer between the primer patterns and the first electrodes.
  • the organic light-emitting layer may further include at least one of an emission layer, a hole transport layer, an electron injection layer, and an electron transport layer.
  • At least one of the emission layer, the hole transport layer, the electron injection layer and the electron transport layer may have liquid-philic properties.
  • the primer patterns may include first through third primer patterns, which alternately appear at least once, and the first through third primer patterns may have areas that are different from one another.
  • At least one of the first through third primer patterns may partially overlap the pixel-defining layer in a cross-sectional view along a plane parallel to the base substrate.
  • Two of the first through third primer patterns may partially overlap the pixel-defining layer in a cross-sectional view along a plane parallel to the base substrate, and one of the two primer patterns may have a larger area of contact with the pixel-defining layer than the other primer pattern.
  • the embodiments may be realized by providing a method of fabricating an organic light-emitting display panel, the method including providing a base substrate including a plurality of first electrodes thereon; forming a pixel-defining layer such that the pixel-defining layer includes partition walls that define a plurality of pixels and that extend from the base substrate that includes the plurality of first electrodes thereon; forming an organic light-emitting layer such that the organic light-emitting layer includes a plurality of organic light-emitting patterns that are respectively formed in the pixels; and forming a second electrode layer on the organic light-emitting layer, wherein the organic light-emitting layer includes a plurality of primer patterns, which are formed separately in the pixels, respectively, and that overlap the first electrodes, respectively, at least one of the primer patterns has an area that is different from an area of the other primer patterns, and the primer patterns have an affinity for liquid that is higher than an affinity for liquid of the pixel-defining layer.
  • the method may further include forming a hole injection layer such that the hole injection layer covers the first electrodes and the pixel-defining layer and is between the base substrate and the primer patterns.
  • Forming the organic light-emitting layer may include applying a primer layer that includes a liquid-philic material; patterning the primer layer by using a mask, the mask including light-transmitting areas corresponding to the primer patterns; and removing portions of the primer layer except for portions corresponding with the primer patterns.
  • the organic light-emitting layer may include first through third organic light-emitting patterns, which alternately appear at least once, and at least one of the first through third organic light-emitting patterns may have a thickness different from a thickness of the other organic light-emitting patterns.
  • Forming the organic light-emitting layer may include forming, on the primer patterns, at least one of an emission layer, a hole transport layer, an electron injection layer, and an electron transport layer.
  • Forming the organic light-emitting layer may further include forming at least one of the emission layer, hole transport layer, electron injection layer, and the electron transport layer by using a single nozzle.
  • the pixels may be arranged in a matrix form, and at least one of the hole transport layer, the electron injection layer, and the electron transport layer may extend in a row direction or a column direction.
  • the primer patterns may include first through third primer patterns, which alternately appear at least once, and at least one of the first through third primer patterns may have an area that is different from an area of the other primer patterns.
  • At least one of the first through third primer patterns may partially overlap the pixel-defining layer.
  • FIG. 1 illustrates a cross-sectional view of an organic light-emitting display panel according to an exemplary embodiment.
  • FIG. 2 illustrates a plan view of the organic light-emitting display panel of FIG. 1 .
  • FIGS. 3 through 18 illustrate schematic diagrams of stages in a method of fabricating an organic light-emitting display panel, according to an exemplary embodiment.
  • the term “on” that is used to designate that an element is on another element located on a different layer or a layer includes both a case where an element is located directly on another element or a layer and a case where an element is located on another element via another layer or still another element.
  • first”, “second”, and so forth are used to describe diverse constituent elements, such constituent elements are not limited by the terms. The terms are used only to discriminate a constituent element from another constituent element. Accordingly, in the following description, a first constituent element may be a second constituent element.
  • FIG. 1 illustrates a cross-sectional view of an organic light-emitting display panel according to an exemplary embodiment
  • FIG. 2 illustrates a plan view of the organic light-emitting display panel of FIG. 1 .
  • an organic light-emitting display panel may include a base substrate 100 , a plurality of first electrodes 300 (arranged on the based substrate 100 ), a pixel-defining layer 200 (including partition walls that protrude from the base substrate 100 and that define pixels 700 R, 700 G, and 700 B), an organic light-emitting layer (including a plurality of organic light-emitting patterns, respectively, that are formed in the pixels 700 R, 700 G, and 700 B, respectively, and that are separate or spaced apart from one another), and a second electrode layer 70 (on the organic light-emitting layer).
  • the organic light-emitting layer may include the organic light-emitting patterns, respectively, which are formed in the pixels 700 R, 700 G, and 700 B, respectively, to be separate from one another.
  • the organic light-emitting patterns may include lyophilic or primer patterns 20 R, 20 G, and 20 B, hole transport layers 30 R, 30 G, and 30 B on the primer patterns 20 R, 20 G, and 20 B, respectively, and which are located in, e.g., in an area defined by, the pixel-defining layer 200 , emission layers 40 R, 40 G and 40 B on the hole transport layers 30 R, 30 G and 30 B, respectively, an electron transport layer 50 on the emission layers 40 R, 40 G and 40 B, an electron injection layer 60 on the electron transport layer 50 , and the second electrode layer 70 on the electron injection layer 60 .
  • the first electrodes 300 may be collectively referred to as a first electrode layer.
  • the primer patterns 20 R, 20 G, and 20 B may be formed in the pixels 700 R, 700 G, and 700 B, respectively, to be separate or spaced apart from one another.
  • the primer patterns 20 R, 20 G and 20 B, the hole transport layers 30 R, 30 G and 30 B, the emission layers 40 R, 40 G and 40 B, the electron transport layer 50 , and the electron injection layer 60 may be collectively referred to as the organic light-emitting layer.
  • the base substrate 100 may be formed of glass, quartz, or a transparent plastic material.
  • the pixels 700 R, 700 G, and 700 B may be defined or separated by the pixel-defining layer 200 , which includes the partition walls that protrude or extend from the base substrate 100 .
  • the partition walls may be formed in the shape of banks.
  • the partition walls may be formed along a circumference or perimeter of each of the first electrodes 300 (which are formed in the pixels 700 R, 700 G, and 700 B, respectively), to partially overlap each of the first electrodes 300 .
  • the partition walls may define openings of the pixels 700 R, 700 G, and 700 B.
  • the partition walls may be formed of an organic material, e.g., an acrylic resin, an epoxy resin, or a photosensitive polyimide, or an inorganic material, such as glass or liquid glass.
  • the partition walls may be formed of, e.g., black resist, which may be obtained by the organic material or the inorganic material with carbon black, so as to improve contrast.
  • the pixels 700 R, 700 G, and 700 B may be arranged in a matrix form, as illustrated in FIG. 2 .
  • the pixels 700 R, 700 G, and 700 B may have the same size, i.e., the same length and width.
  • the pixels 700 R, 700 G, and 700 B may have the same length in a column direction, and lengths of the pixels 700 R, 700 G, and 700 B in a row direction, i.e., widths WR, WG, and WB of the pixels 700 R, 700 G, and 700 B, may be identical.
  • Light emitted from the organic light-emitting layer may be released from the openings of the pixels 700 R, 700 G, and 700 B, which are defined by the pixel-defining layer 200 . As a result, light may be emitted from the same pixel areas in a horizontal cross-sectional view.
  • the organic light-emitting layer may be formed in the pixels 700 R, 700 G, and 700 B, respectively, and at least one of the primer patterns 20 R, 20 G, and 20 B may have an area (e.g., surface area) different from the area of the other primer patterns.
  • the primer patterns of the first, second, and third pixels 700 R, 700 G, and 700 B may be referred to as first, second, and third primer patterns 20 R, 20 G and 20 B, respectively.
  • At least one of the first, second, and third primer patterns 20 R, 20 G, and 20 B may have a different area from the other primer patterns.
  • the area of the first, second, and third primer patterns 20 R, 20 G, and 20 B may, e.g., gradually, increase from the first primer pattern 20 R to the third primer pattern 20 B.
  • the primer patterns 20 R, 20 G, and 20 B may have different areas, and the hole transport layers 30 R, 30 G and 30 B, the emission layers 40 R, 40 G and 40 B, the electron transport layer 50 , and/or the electron injection layer 60 may be formed on the primer patterns 20 R, 20 G and 20 B to spread to different extents among the primer patterns 20 R, 20 G and 20 B.
  • a degree to which the liquid drops or solution spreads may be varied due to the differences in area among the primer patterns 20 R, 20 G and 20 B.
  • the organic light-emitting layers of the respective pixels 700 R, 700 B and 700 R may have different thicknesses. Therefore, an organic light-emitting layer with a resonant structure may be formed in each pixel.
  • the organic light-emitting layer may include first, second and third organic light-emitting patterns, which may alternately appear at least once, and at least one of the first, second and third organic light-emitting patterns may have a thickness different from the other organic light-emitting patterns.
  • the thickness of the organic light-emitting patterns may be a distance from the first electrode layer 300 to the second electrode layer 70 .
  • the first, second and third organic light-emitting patterns may be formed in the first, second and third pixels 700 R, 700 G and 700 B, respectively, and may have thicknesses HR, HG and HB, respectively, which differ from one another.
  • the thicknesses may decrease from the thickness HR of the first organic light-emitting pattern to the thickness HB of the third organic light-emitting pattern.
  • the degree to which the organic materials spread may be varied because of the differences between the areas of the primer patterns 20 R, 20 G and 20 B.
  • the thickness of the organic materials in the first, second and third pixels 700 R, 700 G and 700 B, respectively, may be varied. Accordingly, the thickness of the organic light-emitting patterns may be adjusted as desired, even when the same amounts of organic materials are injected with the use of a single nozzle.
  • the thickness HR of the first organic light-emitting pattern may be represented by Equation (1).
  • L 1 ( ⁇ R/ 2) ⁇ m (1)
  • Equation (1) L1 denotes the thickness HR of the first organic light-emitting pattern, ⁇ R denotes the wavelength of red light, and m is a natural number.
  • red light may have a wavelength of 600 nm to 670 nm with a peak at about 618 nm to about 635 nm.
  • the length of an optical path of the first organic light-emitting pattern may be a natural number multiple of 300 nm to 335 nm.
  • the thickness HR of the first organic light-emitting pattern may be determined, as indicated in Equation (1), the first organic light-emitting pattern may have a resonant structure with respect to red light wavelengths, and may thus emit red light with a narrow peak. Accordingly, high-purity red light may be realized.
  • the thickness HG of the second organic light-emitting pattern may be represented by Equation (2).
  • L 2 ( ⁇ G/ 2) ⁇ m (2)
  • Equation (2) L2 denotes the thickness HG of the second organic light-emitting pattern, ⁇ G denotes the wavelength of green light, and m is a natural number.
  • green light may have a wavelength of 500 nm to 570 nm with a peak at about 516 nm to about 533 nm.
  • the length of an optical path of the second organic light-emitting pattern may be a natural number multiple of 250 nm to 285 nm.
  • the thickness HG of the second organic light-emitting pattern may be determined, as indicated in Equation (2), the second organic light-emitting pattern may have a resonant structure with respect to green light wavelengths, and may thus emit green light with a narrow peak. Accordingly, high-purity green light may be realized.
  • the thickness HB of the third organic light-emitting pattern may be represented by Equation (3).
  • L 3 ( ⁇ B/ 2) ⁇ m (3)
  • Equation (3) L3 denotes the thickness HB of the second organic light-emitting pattern, ⁇ B denotes the wavelength of blue light, and m is a natural number.
  • blue light may have a wavelength of 420 nm to 480 nm with a peak at about 440 nm to about 465 nm.
  • the length of an optical path of the third organic light-emitting pattern may be a natural number multiple of 250 nm to 285 nm.
  • the thickness FIB of the third organic light-emitting pattern may be determined, as indicated in Equation (3), the third organic light-emitting pattern may have a resonant structure with respect to blue light wavelengths, and may thus emit blue light with a narrow peak. Accordingly, high-purity blue light may be realized.
  • optical length means the distance between the first electrode layer 300 and the second electrode layer 70 .
  • the organic light-emitting patterns may be formed between the first electrode layer 300 and the second electrode layer 70 , and the term “optical length” may also refer to the thicknesses FIR, HG and HB of the organic light-emitting patterns.
  • each of the lengths of the optical paths of the organic light-emitting patterns is designed to be a natural number (m) multiple of half the wavelength ⁇ a (where ⁇ a is ⁇ R, ⁇ G or ⁇ B) of light desired to be emitted
  • the resonant structures of the organic light-emitting patterns may transmit light therethrough with the wavelength ⁇ a and reflect light with a wavelength other than the wavelength ⁇ a.
  • light with the wavelength ⁇ a may be emitted from each of the organic light-emitting patterns through multiple reflections within the corresponding organic light-emitting pattern.
  • the purity of light with the wavelength ⁇ a may be improved.
  • the wavelength of light within a desired wavelength range may be sharpened.
  • light near a desired wavelength peak may be reflected. Therefore, light of a high-purity color may be emitted.
  • the thicknesses of the organic light-emitting patterns may be adjusted, e.g., deliberately or arbitrarily.
  • the thicknesses of the organic light-emitting patterns may be adjusted by adjusting the areas of the primer patterns 20 R, 20 G and 20 B while using the same amounts of organic light-emitting materials. Accordingly, it is possible to form the resonant structures of the organic light-emitting patterns through simple processes.
  • At least one of the first electrode layer 300 and the second electrode layer 70 may be formed of a semitransparent material or a reflective member.
  • at least one of the first electrode layer 300 and the second electrode layer 70 may be formed of a transparent conductive material such as indium tin oxide (ITO) or indium zinc oxide (IZO).
  • the first electrodes 300 may be pixel electrodes on the organic light-emitting display panel, and the pixel electrodes may be the anode electrodes of the pixels 700 R, 700 G and 700 B.
  • the first electrodes 300 in response to the organic light-emitting display panel being applied a front emission-type organic light-emitting display device, the first electrodes 300 may be used as pixel electrodes, and may include a metal layer formed of a metal such as aluminum (Al) so as to have reflective properties.
  • the first electrodes 300 may be used as pixel electrodes, and may include a transparent conductive layer formed of ITO or IZO so as to have transmissive properties.
  • the first electrodes 300 may include not only a transparent conductive layer, but also a metal layer reflecting light, so as to have semi-transmissive properties.
  • the first electrodes 300 may be formed of a material with excellent reflectivity such as Al, an Al alloy, silver (Ag) or an Ag alloy, and the material of the first electrodes 300 may be varied depending on the emission type of an organic light-emitting display device to which the organic light-emitting display panel is applied.
  • the first electrodes 300 may protrude or extend from the base substrate 100 .
  • a plurality of recesses may be formed on the base substrate 100 , and the first electrodes 300 may be inserted in the recesses, respectively, and various modifications may be made to the first electrodes 300 .
  • the organic light-emitting layer may include the primer patterns 20 R, 20 G and 20 B and may also include a hole injection layer 10 , which may be, e.g., commonly, disposed among or on the first electrodes 300 .
  • the hole injection layer 10 may cover not only the base substrate 100 , but also the pixel-defining layer 200 and the first electrode layer 300 , which are on the base substrate 100 .
  • the hole injection layer 10 may be formed only in each of the pixels 700 R, 700 G and 700 B, which are defined by the pixel-defining layer 200 , or may partially overlap the pixel-defining layer 200 when viewed in a horizontal cross-sectional view or in a plan view.
  • Holes may be injected through or from the first electrode layer 300 .
  • the holes injected from the first electrode layer 300 may be provided to the primer patterns 20 R, 20 G and 20 B and the rest of the organic light-emitting layer through the primer patterns 20 R, 20 G and 20 B.
  • the holes injected through or from the first electrode layer 300 may move to the emission layers 40 R, 40 G and 40 B via the primer patterns 20 R, 20 G and 20 B and the hole transport layers 30 R, 30 G and 30 B.
  • Electrons may be provided by the second electrode layer 70 .
  • the electrons may move to the emission layers 40 R, 40 G and 40 B via the electron injection layer 60 and the electron transport layer 50 . Accordingly, the holes provided by the first electrode layer 300 and the electrons provided by the second electrode layer 70 may combine together in the emission layers 40 R, 40 G and 40 B and, due to the energy resulting from the combination of the holes and the electrons, light may be emitted.
  • holes may be injected into the emission layers 40 R, 40 G and 40 B from the first electrode layer 300 , and electrons may be injected into the emission layers 40 R, 40 G and 40 B from the second electrode layer 70 .
  • the holes and the electrons may combine together, thereby generating excitons. Light corresponding to the energy between the holes and the electrons may be generated by the excitons.
  • the hole injection layer 10 may include suitable hole injection materials.
  • the organic light-emitting layer may include the primer patterns 20 R, 20 G and 20 B, and may also include at least one of the hole transport layers 30 R, 30 G and 30 B, the emission layers 40 R, 40 G and 40 B, the electron injection layer 60 and the electron transport layer 50 between the primer patterns 20 R, 20 G and 20 B and the second electrode layer 70 .
  • the organic light-emitting layer as illustrated in FIG. 1 , may have a stack structure in which the hole transport layers 30 R, 30 G and 30 B, the emission layers 40 R, 40 G and 40 B, the electron transport layer 50 and the electron injection layer 60 are sequentially deposited on the primer patterns 20 R, 20 G and 20 B.
  • various modifications may be made to the stack structure of FIG.
  • the organic light-emitting layer may be formed to have a tandem structure.
  • the hole transport layers 30 R, 30 G and 30 B may be formed of, e.g., a mixture of polyethylene dioxythiophene and polystyrene sulfonic acid, or copper phthalocyanine.
  • the hole transport layers 30 R, 30 G and 30 B may receive holes from the first electrode layer 300 , and may transport the holes.
  • the hole transport layers 30 R, 30 G and 30 B may help improve the light emission efficiency of an organic light-emitting display device.
  • the emission layers 40 R, 40 G and 40 B may be formed of an organic compound, e.g., a polymer organic compound.
  • the emission layers 40 R, 40 G and 40 B may be formed of poly(paraphenylene vinylene) (PPV) or a derivative thereof, poly(alkyllythiophene) such as poly(2,5-thienylene vinylene) (PTV), polyarylene vinylene such as poly(2,5-furylene vinylene) (PFV), poly(para-phenylene) or poly(alkyl fluorine), a pyrazoline dimer, quinolizine carbonic acid, benzopyrylium perchlorate, rubrene, a phenanthroline europium complex, and these organic compounds may be used alone or together with one another.
  • the emission layers 40 R, 40 G and 40 B may be doped with at least one fluorescent dye.
  • the electron transport layer 50 may be formed on the emission layers 40 R, 40 G and 40 B, and the electron injection layer 60 may be formed on the electron transport layer 50 .
  • the electron transport layer 50 and the electron injection layer 60 may include suitable electron transport materials and/or electron injection materials, respectively.
  • the emission layers 40 R, 40 G and 40 B may be formed in the pixels 700 R, 700 G and 700 B, respectively, to be separate from one another.
  • the electron transport layer 50 and the electron injection layer 60 may cover not only the top surfaces of the emission layers 40 R, 40 G and 40 B, but also the pixel-defining layer 200 .
  • various modifications can be made to the organic light-emitting layer by, e.g., forming each layer of the organic light-emitting layer in the pixels 700 R, 700 G and 700 B, respectively.
  • An image created by the organic light-emitting display panel may be displayed by light emitted from the emission layers 40 R, 40 G and 40 B, which are formed in the pixels 700 R, 700 G and 700 B, respectively, to be separate from one another, and may thus not be able to be affected by the electron transport layer 50 and the electron injection layer 60 , which may cover the top of the pixel-defining layer 200 .
  • At least one of the hole transport layers 30 R, 30 G and 30 B, the emission layers 40 R, 40 G and 40 B, the electron injection layer 60 and the electron transport layer 50 may have lyophilic or liquid-philic properties.
  • the primer patterns 20 R, 20 G, and 20 B may also have liquid-philic properties.
  • the hole transport layers 30 R, 30 G and 30 B and the emission layers 40 R, 40 G and 40 B may have liquid-philic properties.
  • the surface energy of the hole transport layers 30 R, 30 G and 30 B and the emission layers 40 R, 40 G and 40 B may not differ much from the surface energy of the primer patterns 20 R, 20 G and 20 B. As a result, the hole transport layers 30 R, 30 G and 30 B may be easily formed, and attached, on the primer patterns 20 R, 20 G and 20 B, respectively.
  • the primer patterns 20 R, 20 G, and 20 B may exhibit an affinity for liquid.
  • at least one of the hole transport layers 30 R, 30 G and 30 B, the emission layers 40 R, 40 G and 40 B, the electron injection layer 60 and the electron transport layer 50 may exhibit an affinity for liquid, e.g., may exhibit a similar affinity for liquid that is exhibited by the primer patterns 20 R, 20 G, and 20 B.
  • the pixel-defining layer 200 may have lyophobic or liquid-repelling properties, and may have higher surface energy than the primer patterns 20 R, 20 G and 20 B. Accordingly, layers of the organic light-emitting layer that are formed on the primer patterns 20 R, 20 G and 20 B may be in proper contact with the primer patterns 20 R, 20 G and 20 B, but not with the pixel-defining layer 200 . Thus, even the same amounts of organic material used may result in different areas of contact between the organic material and the primer patterns 20 R, 20 G and 20 B due to the differences among the areas of the primer patterns 20 R, 20 G and 20 B.
  • the organic light-emitting layer may be formed in the pixels 700 R, 700 G and 700 B, respectively, to have different thicknesses.
  • the primer patterns 20 R, 20 G and 20 B may exhibit an affinity for the materials for forming at least one of the hole transport layers 30 R, 30 G and 30 B, the emission layers 40 R, 40 G and 40 B, the electron injection layer 60 and the electron transport layer 50 , e.g., an affinity for a liquid, solution, or dispersion for forming at least one of the hole transport layers 30 R, 30 G and 30 B, the emission layers 40 R, 40 G and 40 B.
  • the pixel-defining layer 200 and/or the hole injection layer 10 may exhibit a repulsion to the materials for forming at least one of the hole transport layers 30 R, 30 G and 30 B, the emission layers 40 R, 40 G and 40 B, the electron injection layer 60 and the electron transport layer 50 , e.g., a repulsion to the liquid, solution, or dispersion for forming at least one of the hole transport layers 30 R, 30 G and 30 B, the emission layers 40 R, 40 G and 40 B.
  • the layers of the organic light-emitting layer (and/or the materials for forming the same) on the primer patterns 20 R, 20 G and 20 B all have liquid-philic patterns, they may sequentially be formed in each of the pixels 700 R, 700 G and 700 B to have different thicknesses in different pixels. As a result, the organic light-emitting patterns may have different thicknesses from one another. Accordingly, a plurality of organic light-emitting patterns, each having a resonant structure, may be formed by using the same amounts of organic materials. As a result, an organic light-emitting display panel with high color purity may be fabricated with ease.
  • the primer patterns 20 R, 20 G and 20 B will hereinafter be described in further detail.
  • the primer patterns 20 R, 20 G and 20 B may include the first, second and third primer patterns 20 R, 20 G and 20 B, which alternately or sequentially appear at least once and have different areas from one another.
  • At least one of the first, second and third primer patterns 20 R, 20 G and 20 B may partially overlap the pixel-defining layer 200 in a cross-sectional view along a plane parallel to the base substrate 100 or in a plan view.
  • the term “a plane parallel to the base substrate 100 ”, as used herein, may indicate a plane parallel to a surface formed by the base substrate 100 .
  • the expression “the first, second and third primer patterns 20 R, 20 G and 20 B partially overlapping the pixel-defining layer 200 ”, as used herein, may mean that the first, second and third primer patterns 20 R, 20 G and 20 B may be formed even on the pixel-defining layer 200 beyond the pixels 700 R, 700 G and 700 B, respectively, defined by the pixel-defining layer 200 , when viewed from above the base substrate 100 .
  • the pixel-defining layer 200 may include partition walls that protrude or extend from the base substrate 100 to define the pixels 700 R, 700 G and 700 B.
  • One of the first, second and third primer patterns 20 R, 20 G and 20 B may be formed even on one of the partition walls. Accordingly, even though the pixels 700 R, 700 G and 700 B may have the same opening area, the first, second and third primer patterns 20 R, 20 G and 20 B may be formed in the pixels 700 R, 700 G and 700 B, respectively, to have different areas from one another.
  • Two of the first, second and third primer patterns 20 R, 20 G and 20 B may partially overlap the pixel-defining layer 200 in a cross-sectional view along a plane parallel to the base substrate 100 or in a plan view, and the overlapping area of one of the two primer patterns and the pixel-defining layer 200 may be relatively larger than the overlapping area of the other primer pattern and the pixel-defining layer 200 .
  • the first primer pattern 20 R may be formed only in the first pixel 700 R, and the second and third primer patterns 20 G and 20 B may be formed to extend from inside the openings of the second and third pixels 700 G and 700 B, respectively, to over or on the top of the pixel-defining layer 200 .
  • the overlapping area of the third primer pattern 20 B and the pixel-defining layer 200 may be larger than the overlapping area of the second primer pattern 20 G and the pixel-defining layer 200 .
  • an organic light-emitting display device including the organic light-emitting display panel that has been described with reference to FIGS. 1 and 2 may be provided.
  • the method of fabricating an organic light-emitting display panel may include: providing a base substrate that includes a plurality of first electrodes thereon; forming a pixel-defining layer on the base substrate (including the plurality of first electrodes), wherein the pixel-defining layer protrudes or extends from the base substrate and defines a plurality of pixels; forming an organic light-emitting layer (including a plurality of light-emitting patterns, which are formed in the pixels, respectively); and forming a second electrode layer on the organic light-emitting layer.
  • a step of forming a pixel-defining layer 200 on a base substrate 100 (including a plurality of first electrodes 300 thereon) to include partition walls that protrude or extend from the base substrate 100 and that define pixels 700 R, 700 G and 700 B may be performed.
  • the pixel-defining layer 200 may protrude and may partially overlap each of the first electrodes 300 .
  • the pixels 700 R, 700 G and 700 B may be defined by openings formed by the pixel-defining layer 200 .
  • a step of forming an organic light-emitting layer, which includes a plurality of organic light-emitting patterns in the pixels 700 R, 700 G and 700 B, respectively, may be performed.
  • a material for forming a hole injection layer 10 may be discharged from a slit 500 .
  • the hole injection layer 10 may cover the base substrate 100 , the pixel-defining layer 200 and the first electrodes 300 .
  • the hole injection layer 10 may not only cover the first electrodes layer 300 and the pixel-defining layer 200 , but may also be between a plurality of primer patterns (to be formed on the base substrate 100 ).
  • the hole injection layer 10 may be formed to a uniform thickness by being discharged from a discharging outlet 510 of the slit 500 .
  • the hole injection layer 10 may be formed only inside each of the pixels 700 R, 700 G and 700 B, if desired.
  • the hole injection layer 10 may be formed by various methods, other than a method involving the use of the slit 500 , such as a method involving the use of a nozzle, or a deposition or sputtering method.
  • the step of forming the organic light-emitting layer may include applying a primer layer 20 , which includes a liquid-philic material, on the hole injection layer 10 .
  • patterns may be formed on the primer layer 20 by using a mask 600 .
  • the mask 600 may be an optical mask, and the primer layer 20 may include a photosensitive material. Accordingly, parts of the primer layer 20 that are exposed to light may not be removed (e.g., may remain), and parts of the primer layer 20 that are not exposed to light may be removed. As a result, a plurality of primer patterns 20 R, 20 G and 20 B may be formed (e.g., may remain) in the pixels 700 R, 700 G and 700 B, respectively. In an implementation, parts of the primer layer 20 that are exposed to light may be removed, and parts of the primer layer 20 that are not exposed to light may remain unremoved.
  • the mask 600 may include light-transmitting areas P and light-shielding areas B.
  • the light-transmitting areas P may be areas that substantially transmit light therethrough
  • the light-shielding areas B may be areas that substantially block the transmission of light therethrough.
  • the expression “the light-shielding areas B substantially blocking the transmission of light therethrough”, as used herein, should be understood as encompassing not only the case when the light-shielding areas B 100% block the transmission of incident light therethrough, but also the case when the light-shielding areas B do not necessarily 100% block the transmission of light therethrough, but transmit too small an amount of light therethrough to cause a reaction with the photosensitive material of the primer layer 20 .
  • the expression “the light-transmitting areas P substantially transmitting light therethrough”, as used herein, should be understood as encompassing not only the case when the light-transmitting areas P 100% transmit light therethrough, but also the case when the light-transmitting areas P do not necessarily 100% transmit light therethrough, but transmit a sufficient amount of light to cause a reaction with the photosensitive material of the primer layer 20 .
  • the mask 600 may also include semitransparent areas, and various other modifications may be made to the mask 600 .
  • predetermined patterns may be formed on the mask 600 with the light-transmitting areas P and the light-shielding areas B, and the light-transmitting areas P may correspond to areas where the primer patterns 20 R, 20 G and 20 B are formed.
  • the primer patterns 20 R, 20 G and 20 B which have different areas from one another, may be formed.
  • the primer patterns 20 R, 20 G and 20 B in response to the parts of the primer layer 20 corresponding to the light-shielding areas B being removed, the primer patterns 20 R, 20 G and 20 B, which have different areas from one another, may be formed in the pixels 700 R, 700 G and 700 B, respectively.
  • the primer patterns 20 R, 20 G and 20 B may be formed to have different areas and to partially overlap the pixel-defining layer 200 in a horizontal cross-sectional view.
  • FIG. 9 illustrates a plan view of a structure of FIG. 8 .
  • the first, second and third primer patterns 20 R, 20 G and 20 B may be formed in or on the pixels 700 R, 700 G and 700 B, respectively, and may have different horizontal cross-sectional areas from one another.
  • the first primer pattern 20 R may have substantially the same horizontal cross-sectional area as the inside of the pixel 700 R, which is defined by the pixel-defining layer 200 , and may have substantially the same width, i.e., a width PR, as the pixel 700 R.
  • the second primer pattern 20 G may have a larger area than the first primer pattern 20 R, and may have a width PG that is greater than the width of the pixel 700 G.
  • the third primer pattern 20 B may have a larger area than the first primer pattern 20 R and the second primer pattern 20 G, and may have a width PB that is greater than the width PR of the first primer pattern 20 R and the width PG of the second primer pattern 20 G.
  • the step of forming the organic light-emitting layer may also include forming at least one of an emission layer, a hole transport layer, an electron injection layer and an electron transport layer on the primer patterns 20 R, 20 G and 20 B.
  • materials (e.g., in liquid form) for forming hole transport layers 30 R, 30 G and 30 B may be discharged onto the first, second and third primer patterns 20 R, 20 G and 20 B, respectively.
  • the materials for forming the hole transport layers 30 R, 30 G and 30 B may easily contact the primer patterns 20 R, 20 G and 20 B, respectively, (e.g., due to the liquid-philic properties of the primer patterns) and may not as easily contact the pixel-defining layer 200 or the hole injection layer 10 , which may have relatively high surface energy and thus exhibits liquid-repelling properties.
  • the first, second and third primer patterns 20 R, 20 G and 20 B may have different areas from one another, and the third primer pattern 20 B has a greater area than the first and second primer patterns 20 R and 20 G, the hole transport layer 30 B, which is formed on the third primer pattern 20 B, may have a larger contact area than the hole transport layers 30 R and 30 G, which are formed on the first and second primer patterns 20 R and 20 G, respectively. Accordingly, in a case when the hole transport layers 30 R, 30 G and 30 B are formed by discharging the same amount of material (e.g., liquid), the hole transport layers 30 R, 30 G and 30 B may have different heights relative to one another.
  • the hole transport layers 30 R, 30 G and 30 B may have different heights relative to one another.
  • the thickness of the hole transport layers 30 R, 30 G and 30 B may gradually decrease in a direction from the first primer pattern 20 R to the third primer pattern 20 B.
  • DR>DG>DB where DR, DG and DB are the thicknesses of the hole transport layers 30 R, 30 G and 30 B, respectively.
  • FIGS. 11 to 13 illustrate a process of forming a hole transport layer 30 .
  • the hole transport layer 30 may be formed by using a single nozzle 700 .
  • the single nozzle 700 may continuously discharge substantially the same amounts of liquid drops, dispersion, or solution for forming the hole transport layer 30 over the pixels.
  • the nozzle 700 may discharge liquid drops over the pixels that are arranged in a matrix form, while moving in a column direction.
  • the discharged liquid drops may form their position or settle on the first, second and third primer patterns 20 R, 20 G and 20 B, which are already formed.
  • the hole transport layer 30 may be formed to have different areas in different pixels.
  • the single nozzle 700 method may uniformly discharge the same amount of liquid or solution, and may thus form an organic light-emitting layer to a uniform thickness, thereby reducing the possibility of and/or preventing a defect.
  • liquid for forming the hole transport layer 30 may be discontinuously discharged, and may thus be arranged in the form of islands.
  • the discharging of the liquid drops may be performed by moving the single nozzle 700 in a row direction and then in a column direction.
  • pixels may be arranged in rows and columns, and at least one of the hole transport layer 30 , the electron injection layer 60 and the electron transport layer 50 may extend in the row direction or the column direction without discontinuity.
  • the hole transport layer 30 is illustrated in the drawings as being formed by being discharged from the single nozzle 700 .
  • the emission layer, the electron injection layer 60 and the electron transport layer 50 may also be formed by using the single nozzle 700 .
  • the method of fabricating an organic light-emitting display panel may also include drying the organic light-emitting layer.
  • the hole transport layers 30 R, 30 G and 30 B which are formed in the pixels 700 R, 700 G and 700 B, respectively, may have different thicknesses from one another.
  • emission layers 40 R, 40 G and 40 B may be formed by substantially the same method used to form the hole transport layers 30 R, 30 G and 30 B.
  • a liquid or solution for forming the emission layers 40 R, 40 G and 40 B may be discharged onto the hole transport layers 30 R, 30 G and 30 B, respectively, and may then be dried, thereby forming the emission layers 40 R, 40 G and 40 B, as illustrated in FIG. 15 .
  • the electron transport layer 50 and the electron injection layer 60 may be formed on the emission layers 40 R, 40 G and 40 B.
  • the electron transport layer 50 and the electron injection layer 60 may be formed by the same method (e.g., using a nozzle) used to form the hole transport layers 30 R, 30 G and 30 B and the emission layers 40 R, 40 G and 40 B.
  • the electron transport layer 50 and the electron injection layer 60 may be formed by, e.g., deposition or sputtering.
  • a second electrode layer 70 may be formed on the electron injection layer 60 .
  • the second electrode layer 70 may be formed by deposition or sputtering.
  • the hole transport layers 30 R, 30 G, and 30 B, the emission layers 40 R, 40 G and 40 B, the electron transport layer 50 and the electron injection layer 60 may be sequentially formed on the primer patterns 20 R, 20 G and 20 B.
  • some of the hole transport layers 30 R, 30 G, and 30 B, the emission layers 40 R, 40 G and 40 B, the electron transport layer 50 and the electron injection layer 60 may not be formed, or the order in which to form the hole transport layers 30 R, 30 G, and 30 B, the emission layers 40 R, 40 G and 40 B, the electron transport layer 50 and the electron injection layer 60 may be varied.
  • an organic light-emitting display device may include an anode electrode, a cathode electrode, and a hole injection layer, a hole transport layer, an emission layer, an electron transport layer, and an electron injection layer interposed between the anode electrode and the cathode layer.
  • Holes may be provided to the emission layer through the anode electrode, and electrons may be provided to the emission layer through the cathode electrode.
  • the electrons and the holes may recombine in the emission layer, and as a result, excitons may be generated.
  • energy may be generated, and as a result, light may be generated by the emission layer.
  • the embodiments may provide an organic light-emitting display panel capable of realizing high-purity colors.
  • the embodiments may provide a method of fabricating an organic light-emitting display panel, in which an organic light-emitting display panel can be fabricated with the use of a single nozzle, and through simplified processes.

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Manufacturing & Machinery (AREA)
  • Electroluminescent Light Sources (AREA)
US14/676,520 2014-11-10 2015-04-01 Organic light-emitting display panel and method of fabricating the same Active US9627458B2 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
KR10-2014-0155421 2014-11-10
KR1020140155421A KR20160055519A (ko) 2014-11-10 2014-11-10 유기발광 표시패널 및 그 제조방법

Publications (2)

Publication Number Publication Date
US20160133676A1 US20160133676A1 (en) 2016-05-12
US9627458B2 true US9627458B2 (en) 2017-04-18

Family

ID=55912889

Family Applications (1)

Application Number Title Priority Date Filing Date
US14/676,520 Active US9627458B2 (en) 2014-11-10 2015-04-01 Organic light-emitting display panel and method of fabricating the same

Country Status (2)

Country Link
US (1) US9627458B2 (ko)
KR (1) KR20160055519A (ko)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN109065761A (zh) * 2018-07-26 2018-12-21 武汉华星光电半导体显示技术有限公司 Oled基板及其制作方法
CN110600521A (zh) * 2019-09-24 2019-12-20 京东方科技集团股份有限公司 一种显示基板及其制备方法、显示面板、显示装置
US10720478B2 (en) 2017-12-15 2020-07-21 Joled Inc. Organic EL display panel, organic EL display device, and organic EL display panel manufacturing method
US10741627B2 (en) * 2016-08-01 2020-08-11 Samsung Display Co., Ltd. Organic light emitting diode display

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102431626B1 (ko) * 2015-10-06 2022-08-11 삼성디스플레이 주식회사 발광 표시 장치 및 그 제조 방법
KR102592276B1 (ko) * 2016-07-15 2023-10-24 삼성디스플레이 주식회사 발광장치 및 그의 제조방법
KR102602193B1 (ko) * 2016-08-12 2023-11-15 삼성디스플레이 주식회사 유기 발광 표시 장치 및 유기 발광 표시 장치의 제조 방법
CN108630728B (zh) * 2017-03-24 2020-07-28 京东方科技集团股份有限公司 像素界定层、有机电致发光器件及其制备方法和显示装置
KR102587116B1 (ko) * 2018-05-31 2023-10-10 삼성디스플레이 주식회사 표시 장치
US10879327B2 (en) * 2018-07-09 2020-12-29 Joled Inc. Organic EL display panel and method of manufacturing the same, organic EL display device and electronic apparatus
US10707451B2 (en) * 2018-07-26 2020-07-07 Wuhan China Star Optoelectronics Semiconductor Display Technology Co., Ltd. OLED substrate and method for manufacturing same
US12022714B2 (en) * 2018-09-20 2024-06-25 Guangdong Juhua Printed Display Technology Co., Ltd. Pixel structure and display device
KR102718083B1 (ko) * 2018-11-19 2024-10-15 엘지디스플레이 주식회사 표시장치
CN109509782B (zh) * 2019-01-02 2022-09-16 京东方科技集团股份有限公司 像素界定层及其制造方法、自发光显示面板、显示装置
CN117693231A (zh) * 2022-09-02 2024-03-12 台州观宇科技有限公司 发光组件

Citations (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20050116632A1 (en) * 2003-11-27 2005-06-02 Seiko Epson Corporation Electro-optic device, semiconductor device, electro-optic device substrate, manufacturing methods thereof, and electronic apparatus
US20050225232A1 (en) * 2004-04-07 2005-10-13 Eastman Kodak Company Color OLED with added color gamut pixels
KR20070069063A (ko) 2005-12-27 2007-07-02 세이코 엡슨 가부시키가이샤 컬러 필터 기판의 제조 방법 및 액정 표시 장치의 제조방법
US20100124603A1 (en) * 2002-07-31 2010-05-20 Dai Nippon Printing Co., Ltd. Pattern formation method for electroluminescent element
JP2010160945A (ja) 2009-01-07 2010-07-22 Sumitomo Chemical Co Ltd 有機エレクトロルミネッセンス装置の製造方法
US20100193817A1 (en) * 2007-01-31 2010-08-05 Satoshi Amamiya Organic electroluminescent element and method for manufacturing the same
KR20100127246A (ko) 2008-03-31 2010-12-03 스미또모 가가꾸 가부시키가이샤 친액 발액 패턴의 형성 방법 및 유기 전계발광 소자의 제조 방법
US20120319089A1 (en) * 2011-06-16 2012-12-20 Samsung Mobile Display Co., Ltd. Organic Light Emitting Structures, Methods of Forming Organic Light Emitting Structures, Organic Light Emitting Display Devices and Methods of Manufacturing Organic Light Emitting Display Devices
US20130334513A1 (en) * 2011-11-14 2013-12-19 Panasonic Corporation Thin-film transistor device and method for manufacturing same, organic electroluminescent display elements and organic electroluminescent display device
US20140034933A1 (en) * 2011-11-14 2014-02-06 Panasonic Corporation Thin-film transistor device and method for manufacturing same, organic electroluminescent display element, and organic electroluminescent display device
US20140065750A1 (en) * 2012-08-31 2014-03-06 Universal Display Corporation Patterning method for oleds
US20140070175A1 (en) * 2012-09-10 2014-03-13 Samsung Display Co., Ltd. Organic light emitting diode display and method of fabricating the same
KR20140033415A (ko) 2011-06-21 2014-03-18 카티바, 인크. Oled 마이크로 공동 및 버퍼 층을 위한 물질과 그 생산 방법
US20140197396A1 (en) * 2013-01-17 2014-07-17 Kateeva, Inc. High Resolution Organic Light-Emitting Diode Devices, Displays, and Related Method
US20140255661A1 (en) * 2011-06-10 2014-09-11 Joseph Masrud Process for producing patterned coatings
US8946730B2 (en) * 2011-11-14 2015-02-03 Panasonic Corporation Thin-film transistor device and method for manufacturing same, organic electroluminescent display element, and organic electroluminescent display device

Patent Citations (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20100124603A1 (en) * 2002-07-31 2010-05-20 Dai Nippon Printing Co., Ltd. Pattern formation method for electroluminescent element
US20050116632A1 (en) * 2003-11-27 2005-06-02 Seiko Epson Corporation Electro-optic device, semiconductor device, electro-optic device substrate, manufacturing methods thereof, and electronic apparatus
US20050225232A1 (en) * 2004-04-07 2005-10-13 Eastman Kodak Company Color OLED with added color gamut pixels
KR20070069063A (ko) 2005-12-27 2007-07-02 세이코 엡슨 가부시키가이샤 컬러 필터 기판의 제조 방법 및 액정 표시 장치의 제조방법
US20100193817A1 (en) * 2007-01-31 2010-08-05 Satoshi Amamiya Organic electroluminescent element and method for manufacturing the same
KR20100127246A (ko) 2008-03-31 2010-12-03 스미또모 가가꾸 가부시키가이샤 친액 발액 패턴의 형성 방법 및 유기 전계발광 소자의 제조 방법
US20110014389A1 (en) * 2008-03-31 2011-01-20 Sumitomo Chemical Company, Limited Lyophilic/lyophobic pattern-forming method and organic electroluminescent element manufacturing method
JP2010160945A (ja) 2009-01-07 2010-07-22 Sumitomo Chemical Co Ltd 有機エレクトロルミネッセンス装置の製造方法
US20140255661A1 (en) * 2011-06-10 2014-09-11 Joseph Masrud Process for producing patterned coatings
US20120319089A1 (en) * 2011-06-16 2012-12-20 Samsung Mobile Display Co., Ltd. Organic Light Emitting Structures, Methods of Forming Organic Light Emitting Structures, Organic Light Emitting Display Devices and Methods of Manufacturing Organic Light Emitting Display Devices
KR20140033415A (ko) 2011-06-21 2014-03-18 카티바, 인크. Oled 마이크로 공동 및 버퍼 층을 위한 물질과 그 생산 방법
US20140034933A1 (en) * 2011-11-14 2014-02-06 Panasonic Corporation Thin-film transistor device and method for manufacturing same, organic electroluminescent display element, and organic electroluminescent display device
US20130334513A1 (en) * 2011-11-14 2013-12-19 Panasonic Corporation Thin-film transistor device and method for manufacturing same, organic electroluminescent display elements and organic electroluminescent display device
US8946730B2 (en) * 2011-11-14 2015-02-03 Panasonic Corporation Thin-film transistor device and method for manufacturing same, organic electroluminescent display element, and organic electroluminescent display device
US20140065750A1 (en) * 2012-08-31 2014-03-06 Universal Display Corporation Patterning method for oleds
US20140070175A1 (en) * 2012-09-10 2014-03-13 Samsung Display Co., Ltd. Organic light emitting diode display and method of fabricating the same
US20140197396A1 (en) * 2013-01-17 2014-07-17 Kateeva, Inc. High Resolution Organic Light-Emitting Diode Devices, Displays, and Related Method

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10741627B2 (en) * 2016-08-01 2020-08-11 Samsung Display Co., Ltd. Organic light emitting diode display
US10720478B2 (en) 2017-12-15 2020-07-21 Joled Inc. Organic EL display panel, organic EL display device, and organic EL display panel manufacturing method
CN109065761A (zh) * 2018-07-26 2018-12-21 武汉华星光电半导体显示技术有限公司 Oled基板及其制作方法
CN110600521A (zh) * 2019-09-24 2019-12-20 京东方科技集团股份有限公司 一种显示基板及其制备方法、显示面板、显示装置
CN110600521B (zh) * 2019-09-24 2022-06-21 京东方科技集团股份有限公司 一种显示基板及其制备方法、显示面板、显示装置
US11985877B2 (en) 2019-09-24 2024-05-14 Boe Technology Group Co., Ltd. Display substrate and method of manufacturing the same, display panel, and display device

Also Published As

Publication number Publication date
KR20160055519A (ko) 2016-05-18
US20160133676A1 (en) 2016-05-12

Similar Documents

Publication Publication Date Title
US9627458B2 (en) Organic light-emitting display panel and method of fabricating the same
US10991900B2 (en) Crosslinked emissive layer containing quantum dots for light-emitting device and method for making same
US10720591B2 (en) Crosslinked emissive layer containing quantum dots for light-emitting device and method for making same
KR101988217B1 (ko) 유기 발광 다이오드 마이크로-캐비티 구조 및 그 제조 방법
KR101448003B1 (ko) 유기 발광 표시 장치 및 그 제조 방법
US7180238B2 (en) Oled microcavity subpixels and color filter elements
US5405710A (en) Article comprising microcavity light sources
US8816341B2 (en) Organic electroluminescent display and method of manufacturing the same
US10388902B1 (en) Structure for a high resolution light-emitting device
JP5625448B2 (ja) 有機ｅｌ素子，有機ｅｌ画像表示装置の製造方法
WO2011001614A1 (ja) 有機ｅｌディスプレイパネル
JP5313347B2 (ja) 多色発光有機ｅｌ表示装置およびその製造方法
US8748875B2 (en) Organic electro-luminescence display device
CN112289939B (zh) 通过相分的发射层图案化制造的qled
JP2007520862A (ja) 緑色発光マイクロキャビティｏｌｅｄ
JP2006269329A (ja) 発光装置
US20080224595A1 (en) Organic EL device
US10811473B2 (en) Organic light emitting device, display apparatus, method of controlling color temperature of light emitted from organic light emitting device, and method of fabricating organic light emitting device
US20090267494A1 (en) Organic light emitting diode display and manufacturing method thereof
CN113346030A (zh) 发光器件和包括该发光器件的显示装置
JP2011129919A (ja) 青色発光素子及びこれを含む有機発光ディスプレイ
JP2011009093A (ja) 有機ｅｌ装置及び電子機器
JP6286850B2 (ja) トップエミッション型有機ｅｌ表示装置用カラーフィルタ基板およびトップエミッション型有機ｅｌ表示装置
JP2020035713A (ja) 有機ｅｌ表示パネル
JP2020030933A (ja) 有機ｅｌ表示パネル、及び有機ｅｌ表示パネルの製造方法

Legal Events

Date Code Title Description
AS Assignment

Owner name: SAMSUNG DISPLAY CO., LTD., KOREA, REPUBLIC OF

Free format text: ASSIGNMENT OF ASSIGNORS INTEREST;ASSIGNOR:KIM, GUEN TAK;REEL/FRAME:035314/0677

Effective date: 20150223

FEPP Fee payment procedure

Free format text: PAYOR NUMBER ASSIGNED (ORIGINAL EVENT CODE: ASPN); ENTITY STATUS OF PATENT OWNER: LARGE ENTITY

STCF Information on status: patent grant

Free format text: PATENTED CASE

MAFP Maintenance fee payment

Free format text: PAYMENT OF MAINTENANCE FEE, 4TH YEAR, LARGE ENTITY (ORIGINAL EVENT CODE: M1551); ENTITY STATUS OF PATENT OWNER: LARGE ENTITY

Year of fee payment: 4

MAFP Maintenance fee payment

Free format text: PAYMENT OF MAINTENANCE FEE, 8TH YEAR, LARGE ENTITY (ORIGINAL EVENT CODE: M1552); ENTITY STATUS OF PATENT OWNER: LARGE ENTITY

Year of fee payment: 8