US7483301B2 - Nonvolatile memory devices that support virtual page storage using odd-state memory cells and methods of programming same - Google Patents

Nonvolatile memory devices that support virtual page storage using odd-state memory cells and methods of programming same Download PDF

Info

Publication number
US7483301B2
US7483301B2 US12/119,608 US11960808A US7483301B2 US 7483301 B2 US7483301 B2 US 7483301B2 US 11960808 A US11960808 A US 11960808A US 7483301 B2 US7483301 B2 US 7483301B2
Authority
US
United States
Prior art keywords
page
data
flash memory
cells
pages
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
US12/119,608
Other versions
US20080212372A1 (en
Inventor
Sang Won Hwang
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Samsung Electronics Co Ltd
Original Assignee
Samsung Electronics Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Samsung Electronics Co Ltd filed Critical Samsung Electronics Co Ltd
Priority to US12/119,608 priority Critical patent/US7483301B2/en
Publication of US20080212372A1 publication Critical patent/US20080212372A1/en
Priority to US12/350,588 priority patent/US7710773B2/en
Application granted granted Critical
Publication of US7483301B2 publication Critical patent/US7483301B2/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C11/00Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor
    • G11C11/56Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using storage elements with more than two stable states represented by steps, e.g. of voltage, current, phase, frequency
    • G11C11/5621Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using storage elements with more than two stable states represented by steps, e.g. of voltage, current, phase, frequency using charge storage in a floating gate
    • G11C11/5628Programming or writing circuits; Data input circuits
    • AHUMAN NECESSITIES
    • A47FURNITURE; DOMESTIC ARTICLES OR APPLIANCES; COFFEE MILLS; SPICE MILLS; SUCTION CLEANERS IN GENERAL
    • A47GHOUSEHOLD OR TABLE EQUIPMENT
    • A47G21/00Table-ware
    • A47G21/10Sugar tongs; Asparagus tongs; Other food tongs
    • A47G21/103Chop-sticks
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C11/00Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor
    • G11C11/56Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using storage elements with more than two stable states represented by steps, e.g. of voltage, current, phase, frequency
    • G11C11/5621Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using storage elements with more than two stable states represented by steps, e.g. of voltage, current, phase, frequency using charge storage in a floating gate
    • G11C11/5642Sensing or reading circuits; Data output circuits
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C16/00Erasable programmable read-only memories
    • G11C16/02Erasable programmable read-only memories electrically programmable
    • G11C16/04Erasable programmable read-only memories electrically programmable using variable threshold transistors, e.g. FAMOS
    • G11C16/0483Erasable programmable read-only memories electrically programmable using variable threshold transistors, e.g. FAMOS comprising cells having several storage transistors connected in series
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C16/00Erasable programmable read-only memories
    • G11C16/02Erasable programmable read-only memories electrically programmable
    • G11C16/06Auxiliary circuits, e.g. for writing into memory
    • G11C16/10Programming or data input circuits
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C16/00Erasable programmable read-only memories
    • G11C16/02Erasable programmable read-only memories electrically programmable
    • G11C16/06Auxiliary circuits, e.g. for writing into memory
    • G11C16/26Sensing or reading circuits; Data output circuits
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C2211/00Indexing scheme relating to digital stores characterized by the use of particular electric or magnetic storage elements; Storage elements therefor
    • G11C2211/56Indexing scheme relating to G11C11/56 and sub-groups for features not covered by these groups
    • G11C2211/564Miscellaneous aspects
    • G11C2211/5641Multilevel memory having cells with different number of storage levels
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C7/00Arrangements for writing information into, or reading information out from, a digital store
    • G11C7/10Input/output [I/O] data interface arrangements, e.g. I/O data control circuits, I/O data buffers
    • G11C7/1006Data managing, e.g. manipulating data before writing or reading out, data bus switches or control circuits therefor

Definitions

  • the present invention relates to integrated circuit memory devices and, more particularly, to nonvolatile memory devices and methods of programming nonvolatile memory devices.
  • Nonvolatile memory devices include electrically erasable programmable read only memory (EEPROM), which may be used in many applications including embedded applications and mass storage applications.
  • EEPROM electrically erasable programmable read only memory
  • embedded applications an EEPROM device may be used to provide code storage in personal computers or mobile phones, for example, where fast random access read times may be required.
  • mass storage applications include memory card applications requiring high capacity and low cost.
  • FIG. 1A illustrates a conventional flash memory array 10 having a plurality of NAND-type strings therein.
  • Each of these NAND-type strings includes a plurality of EEPROM cells, which are associated with respective even and odd bit lines (BL 0 _e, BL 0 _o, . . . , BLn_e, BLn_o).
  • BL 0 _e even and odd bit lines
  • BL 0 _o bit lines
  • Each EEPROM cell includes a floating gate electrode and a control gate electrode, which is electrically connected to a respective word line (WL 0 , WL 1 , . . . , WLn). Access to each NAND string is enabled by driving a string select line (SSL) to a logic 1 voltage during reading and programming operations. Each NAND string also includes a respective ground select transistor, which is electrically connected to a ground select line (GSL).
  • SSL string select line
  • GSL ground select line
  • the EEPROM cells within the flash memory array 10 of FIG. 1A may be cells that support a single programmed state.
  • EEPROM cells that support only a single programmed state are typically referred to as single level cells (SLC).
  • SLC single level cells
  • an SLC may support an erased state, which may be treated as a logic 1 storage value, and a programmed state, which may be treated as a logic 0 storage value.
  • the SLC may have a negative threshold voltage (Vth) when erased (e.g., ⁇ 3V ⁇ Vth ⁇ 1V) and a positive threshold voltage when programmed (e.g., 1V ⁇ Vth ⁇ 3V).
  • This programmed state may be achieved by setting the bit line BL to a logic 0 value (e.g., 0 Volts), applying a program voltage (Vpgm) to a selected EEPROM cell and applying a pass voltage (Vpass) to the unselected EEPROM cells within a string, as illustrated by FIG. 1C .
  • the NAND string may be enabled by applying a positive voltage (e.g., power supply voltage Vdd) to the string select line (SSL) and a ground voltage (e.g., 0 Volts) to the ground select line (GSL).
  • the programmed state or erased state of an EEPROM cell may be detected by performing a read operation on a selected cell.
  • a NAND string will operate to discharge a precharged bit line BL when a selected cell is in an erased state and the selected word line voltage (e.g., 0 Volts) is greater than the threshold voltage of the selected cell.
  • the selected word line voltage e.g., 0 Volts
  • the corresponding NAND string will provide an open circuit to the precharged bit line BL because the selected word line voltage (e.g., 0 Volts) is less than the threshold voltage of the selected cell and the selected cell remains “off”.
  • NAND-type flash memories are disclosed in an article by Jung et al., entitled “A 3.3 Volt Single Power Supply 16-Mb Nonvolatile Virtual DRAM Using a NAND Flash Memory Technology,” IEEE Journal of Solid-State Circuits, Vol. 32, No. 11, pp. 1748-1757, November (1997), the disclosure of which is hereby incorporated herein by reference.
  • EEPROM cells that support multiple programmed states are typically referred to as multi-level cells (MLC).
  • MLC multi-level cells
  • FIG. 2 an MLC that supports an erased state and three different programmed states operates to store two data bits per cell.
  • FIGS. 3A-3B illustrate how a pair of three-state EEPROM cells may support 3-bit programming.
  • an MLC is illustrated as supporting an erased state and two possible programmed states.
  • the erased state may be distinguished from the two possible programmed states by applying a first reference voltage VR 1 to a control electrode of a selected EEPROM cell during a read operation.
  • This first reference voltage VR 1 should be set to a level between the maximum acceptable threshold voltage of an erased cell (shown as V 0 ) and the minimum acceptable threshold voltage of a cell programmed to state 1 (shown as V 1 ).
  • the second programmed state (state 2 ) may be distinguished from the erased and first programmed states by applying a second reference voltage VR 2 to a selected EEPROM cell during a read operation.
  • This second reference voltage VR 2 should be set to a level between the maximum acceptable threshold voltage of a cell programmed to state 1 and the minimum acceptable threshold voltage of a cell programmed to state 2 (shown as V 2 ).
  • V 2 the minimum acceptable threshold voltage of a cell programmed to state 2
  • two adjacent three-level EEPROM cells in the same physical row of memory may be programmed into one of eight possible states ((111), (110), . . . , (001), (000)) to support 3-bits of data per cell pair.
  • Embodiments of the invention include nonvolatile memory devices that support virtual page storage using odd-state memory cells and methods of programming nonvolatile memory devices.
  • an integrated circuit device is provided with a nonvolatile memory array therein.
  • This memory array includes at least two nonvolatile odd-state memory cells that operate individually as respective physical memory cells and collectively as a single virtual memory cell.
  • the memory array is further configured so that programming of the virtual memory cell is verified at only a single reference voltage for all values of data contained in the virtual memory cell.
  • the memory array may also be configured as a flash memory array and reading of the virtual memory cell may occur by evaluating whether any of the physical memory cells associated with the virtual memory cell are programmed to a threshold voltage in excess of the single reference voltage.
  • Additional embodiments of the invention include a flash memory array having at least first and second blocks of three-state memory cells therein. Each of these blocks of memory cells may contain multiple pages of memory cells. These first and second blocks of three-state memory cells operate individually as first and second blocks of physical memory cells, respectively, and collectively as a block of virtual memory cells.
  • the first block of memory cells may include a plurality of NAND strings of EEPROM cells. In some embodiments, each of the plurality of NAND strings of EEPROM cells includes at least one SLC EEPROM cell that does not support virtual cell programming.
  • Still further embodiments of the invention include methods of operating flash memory devices. These methods include programming a NAND-type EEPROM array with a third page of data by initially reading first and second pages of data from the NAND-type EEPROM array and then overwriting the first and second pages of data with modified data. This overwriting operation encodes three pages of data into two pages of EEPROM cells in the NAND-type EEPROM array.
  • Additional operating methods include encoding a third page of flash memory data into first and second pages of flash memory data to thereby generate first and second pages of encoded flash memory data.
  • a first page of flash memory cells in a flash memory device is then programmed with the first page of encoded flash memory data.
  • a second page of flash memory cells in the flash memory device is also programmed with the second page of encoded flash memory data.
  • a third page of flash memory data may then be generated in response reading the first and second pages of encoded flash memory data from the first and second pages of flash memory cells, respectively.
  • FIG. 1A is an electrical schematic of a conventional nonvolatile memory device having NAND-type strings of EEPROM cells therein.
  • FIG. 1B is a graph illustrating the relative threshold voltages of an erased and programmed EEPROM cell, according to the prior art.
  • FIG. 1C is an electrical schematic of a NAND-type string of EEPROM cells showing programming bias conditions.
  • FIG. 1D illustrates current flow in a NAND-type string during operations to read data from an erased EEPROM cell and a programmed EEPROM cell according to the prior art.
  • FIG. 2 is a graph illustrating the relative threshold voltages of a four-state EEPROM cell according to the prior art.
  • FIG. 3A is a graph illustrating the relative threshold voltages of a three-state EEPROM cell according to the prior art.
  • FIG. 3B illustrates the threshold voltage distributions of two adjacent three-state EEPROM cells that support 3-bit data when paired together in the same row of memory.
  • FIG. 4A is an electrical schematic of upper and lower NAND-type strings of EEPROM cells that support virtual page programming according to embodiments of the present invention.
  • FIG. 4B is an electrical schematic of a NAND-type EEPROM device according to embodiments of the present invention.
  • FIG. 4C is a diagram that illustrates operations to program three-state EEPROM cells, according to embodiments of the present invention.
  • FIG. 4D is a diagram that illustrates operations to program three-state EEPROM cells, according to embodiments of the present invention.
  • FIG. 4E is a flow diagram that illustrates operations to program “virtual” pages of EEPROM cells, according to embodiments of the present invention.
  • FIG. 5A illustrates operations to program a virtual EEPROM cell, according to embodiments of the present invention.
  • FIG. 5B is a flow diagram illustrating operations to read data from three-state EEPROM cells, according to embodiments of the present invention.
  • FIG. 5C is a flow diagram illustrating operations to read data from three-state EEPROM cells, according to embodiments of the present invention.
  • a single column 40 a of EEPROM cells is illustrated as including a pair of NAND-type strings.
  • This pair of NAND-type strings includes an upper NAND-type string, which may belong to an upper block of EEPROM cells, which includes multiple pages of cells, and a lower NAND-type string, which may belong to a lower block of EEPROM cells, which includes multiple pages of cells.
  • the upper and lower NAND-type strings are tied to a common source line CSL.
  • the upper NAND-type string includes an NMOS transistor having a gate terminal connected to an upper string select line SSLU and an NMOS transistor having a gate terminal connected to an upper ground select line GSLU.
  • the upper NAND-type string also includes a plurality of three-state EEPROM cells. These three-state EEPROM cells have control gates connected to respective word lines, which are associated with a plurality of pages of nonvolatile memory: PAGE 1 , PAGE 3 , . . . , PAGE 39 .
  • a pair of SLC EEPROM cells associated with PAGES 41 and 43 are also provided. These SLC EEPROM cells may be outside the address space of virtual page programming and reading operations.
  • the lower NAND-type string includes an NMOS transistor having a gate terminal connected to a lower string select line SSLL and an NMOS transistor having a gate terminal connected to an lower ground select line GSLL.
  • the lower NAND-type string also includes a plurality of three-state EEPROM cells. These three-state EEPROM cells have control gates connected to respective word lines, which are associated with a plurality of pages of nonvolatile memory: PAGE 0 , PAGE 2 , . . . , PAGE 38 .
  • a pair of SLC EEPROM cells associated with PAGES 40 and 42 are also provided. As described more fully hereinbelow with respect to FIGS. 4B-4E and 5 A- 5 C, the EEPROM cells associated with the pages PAGE 0 , PAGE 2 , . . . , PAGE 38 of a lower block of memory and the EEPROM cells associated with the pages PAGE 1 , PAGE 3 , . . .
  • PAGE 39 of an upper block of memory may collectively form a plurality of “virtual” pages of nonvolatile memory. These “virtual” pages are illustrated as VPAGE 44 , VPAGE 45 , . . . , VPAGE 63 . Accordingly, the column 40 a of EEPROM cells is illustrated as supporting one column of a 64 page nonvolatile memory. Embodiments of the present invention are not limited to any particular capacity of memory, page width or NAND string length.
  • FIG. 4B illustrates an EEPROM device 40 b according to embodiments of the present invention.
  • the EEPROM device 40 b includes a nonvolatile memory array with upper and lower memory blocks, a page buffer and data input/output circuit.
  • the EEPROM device 40 b is illustrated as an eight column device that supports 2N “physical” pages (e.g., rows) of nonvolatile memory and N “virtual” pages of nonvolatile memory, but only incurs the memory array layout footprint (i.e., area penalty) of a conventional nonvolatile memory supporting 2N pages of SLC EEPROM cells.
  • FIG. 4C illustrates operations to program a corresponding pair of three-state EEPROM cells in a sequential manner, with the upper cell within the pair being programmed before the lower cell within the pair.
  • This program order may be reversed.
  • the upper cell may be the EEPROM cell associated with word line WLU ⁇ 0> and bit line BL ⁇ 0> in FIG. 4B and the lower cell may be the EEPROM cell associated with word line WLL ⁇ 0> and bit line BL ⁇ 0> in FIG. 4B .
  • the programming of two bits of “physical” data as 1/1 does not involve any change in the threshold voltages of the upper and lower cells within the pair.
  • the threshold voltages of the upper and lower cells within the pair remain at their original “erased” levels (i.e., Vth ⁇ VR 1 , where VR 1 is a first reference voltage).
  • the programming of two bits of “physical” data as 1/0 does not involve any change in the threshold voltage of the upper cell, but causes the threshold voltage of the lower cell to be increased to a level between VR 1 and VR 2 .
  • the programming of two bits of “physical” data as 0/1 causes the threshold voltage of the upper cell to be increased to a level between VR 1 and VR 2 , but does not involve any change in the threshold voltage of the lower cell.
  • the programming of two bits of “physical” data as 0/0 causes the threshold voltages of the upper and lower cells to be increased to a level between VR 1 and VR 2 , as illustrated.
  • the programming and reading operations for the upper cell are independent from that of the lower cell and vice versa.
  • FIG. 4D illustrates operations to program a corresponding pair of three-state EEPROM cells with a third bit of “virtual” data, after the pair has been programmed with two bits of “physical” data in accordance with FIG. 4C .
  • These program operations include cases (a)-(h).
  • case (a) the “virtual” program operation does not require any change in the threshold voltages of the pair of cells to achieve 3-bit data as 1/1/1.
  • case (b) which is a special case (S)
  • the “virtual” program operation requires increasing the threshold voltages of both upper and lower cells in the pair to levels in excess of VR 2 (i.e., Vth>VR 2 , where VR 2 is a second reference voltage), to achieve 3-bit data as 1/1/0.
  • the “virtual” program operation does not require any additional change in the threshold voltages of the pair of cells to achieve 3-bit data as 1/0/1.
  • the “virtual” program operation requires increasing the threshold voltages of the lower cell in the pair to a level in excess of VR 2 to achieve 3-bit data as 1/0/0.
  • the “virtual” program operation does not require any additional change in the threshold voltages of the pair of cells to achieve 3-bit data as 0/1/1.
  • the “virtual” program operation requires increasing the threshold voltage of the upper cell in the pair to a level in excess of VR 2 to achieve 3-bit data as 0/1/0.
  • the “virtual” program operation does not require any additional change in the threshold voltages of the pair of cells to achieve 3-bit data as 0/0/1.
  • the “virtual” program operation requires increasing the threshold voltage of the upper cell in the pair to a level in excess of VR 2 to achieve 3-bit data as 0/0/0.
  • each virtual page program operation includes a plurality of read operations from corresponding upper and lower physical pages within a multi-page memory array having upper and lower blocks.
  • EEPROM cells in an upper page of the memory array can be read using a normal SLC read operation.
  • This SLC read operation includes setting a selected word line in an upper block of the memory array to the first reference voltage VR 1 .
  • This upper page of read data is identified by the reference character A 1 .
  • a corresponding lower page of data can be read using a normal SLC read operation, Block 104 .
  • This SLC read operation includes setting a selected word line in a lower block of the memory array to the first reference voltage VR 1 .
  • This lower page of read data is identified by the reference character A 2 .
  • a virtual page of data referred to herein as a third page of data A 3
  • a virtual page of data is then programmed into a “virtual” page of the memory array by encoding both the upper page of “physical” data A 1 and the lower page of “physical” data A 2 with this third page of data A 3 .
  • These encoding operations result in the generation of “encoded” upper cell data A 1 * and “encoded” lower cell data A 2 *.
  • FIG. 5B these encoding operations are non-destructive, which means that A 1 can be decoded directly from A 1 * and A 2 can be decoded directly from A 2 *.
  • FIG. 5B illustrates operations 200 to read “physical” data from selected pages of EEPROM cells.
  • This “physical” data corresponds to BIT 1 and BIT 2 of the three bit data illustrated by FIG. 5A .
  • These read operations 200 include the performance of a special case read operation from corresponding upper and lower pages of a nonvolatile memory array.
  • this special case read operation includes setting the selected word lines for the upper and lower pages in the upper and lower blocks, respectively, at the second reference voltage VR 2 while concurrently setting the unselected word lines at VREAD.
  • Block 206 a check is then made to determine whether any of the corresponding bit lines, which are connected to the upper and lower blocks, are discharged.
  • FIG. 5C illustrates operations 300 to read “virtual” data from a pair of pages of EEPROM cells.
  • the selected and unselected word lines for the upper block are set to VR 2 and VREAD, respectively, to detect whether any of the cells in the selected upper page satisfy the case (b), case (f) or case (h) conditions identified by FIG. 4D .
  • the selected and unselected word lines for the lower block are set to VR 2 and VREAD, respectively, to detect whether any of the cells in the selected lower page satisfy the case (b) or case (d) conditions identified by FIG. 4D .
  • this read operation would result in the following fourth bit line condition:
  • the data is then output from the page buffer, Block 320 .
  • the page buffer may perform alternative operations to resolve the above-described read operations.
  • FIG. 4D illustrate how embodiments of the present invention are relatively immune from multi-bit errors caused in response to threshold voltage programming errors. For example, if the programming state illustrated by case (a) is erroneously reflected as a case (c) or case (e) state upon reading, then the correct 3-bit data value of 1/1/1 will be erroneously reflected upon reading as 1/0/1, which represents a single bit error in A 2 , or 0/1/1, which reflects a single bit error in A 1 .
  • case (g) is erroneously reflected as a case (c), case (e) or case (h) state upon reading
  • case (e) or case (h) state upon reading
  • the correct 3-bit data value of 0/0/1 will be erroneously reflected upon reading as 1/0/1, which represents a single bit error in A 1 , or 0/1/1, which reflects a single bit error in A 2 , or 0/0/0, which reflects a single bit error in A 3 .
  • FIG. 4D illustrates the programming state illustrated by case (g)

Landscapes

  • Engineering & Computer Science (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Read Only Memory (AREA)
  • Semiconductor Memories (AREA)

Abstract

A nonvolatile memory array includes first and second blocks of three-state memory cells therein. These first and second blocks are configured to operate individually as first and second blocks of physical memory cells, respectively, and collectively as an additional block of virtual memory cells. The first and second blocks of memory cells and the additional block of virtual memory cells may be read independently to provide a total of three blocks of read data.

Description

CROSS-REFERENCE TO PRIORITY APPLICATIONS AND RELATED APPLICATION
This application is a divisional of U.S. application Ser. No. 11/358,648, filed Feb. 21, 2006 now U.S. Pat. No. 7,388,778 , which claims priority to Korean Application No. 2005-34825, filed Apr. 27, 2005. The disclosure of U.S. application Ser. No. 11/358,648 is hereby incorporated herein by reference.
FIELD OF THE INVENTION
The present invention relates to integrated circuit memory devices and, more particularly, to nonvolatile memory devices and methods of programming nonvolatile memory devices.
BACKGROUND OF THE INVENTION
One class of nonvolatile memory devices includes electrically erasable programmable read only memory (EEPROM), which may be used in many applications including embedded applications and mass storage applications. In typical embedded applications, an EEPROM device may be used to provide code storage in personal computers or mobile phones, for example, where fast random access read times may be required. Typical mass storage applications include memory card applications requiring high capacity and low cost.
One category of EEPROM devices includes NAND-type flash memories, which can provide a low cost and high capacity alternative to other forms of nonvolatile memory. FIG. 1A illustrates a conventional flash memory array 10 having a plurality of NAND-type strings therein. Each of these NAND-type strings includes a plurality of EEPROM cells, which are associated with respective even and odd bit lines (BL0_e, BL0_o, . . . , BLn_e, BLn_o). These bit lines are connected to a page buffer 12 having a plurality of buffer circuits (PB0, . . . , PBn) therein. Each EEPROM cell includes a floating gate electrode and a control gate electrode, which is electrically connected to a respective word line (WL0, WL1, . . . , WLn). Access to each NAND string is enabled by driving a string select line (SSL) to a logic 1 voltage during reading and programming operations. Each NAND string also includes a respective ground select transistor, which is electrically connected to a ground select line (GSL).
As illustrated by FIG. 1B, the EEPROM cells within the flash memory array 10 of FIG. 1A may be cells that support a single programmed state. EEPROM cells that support only a single programmed state are typically referred to as single level cells (SLC). In particular, an SLC may support an erased state, which may be treated as a logic 1 storage value, and a programmed state, which may be treated as a logic 0 storage value. The SLC may have a negative threshold voltage (Vth) when erased (e.g., −3V<Vth<−1V) and a positive threshold voltage when programmed (e.g., 1V<Vth<3V). This programmed state may be achieved by setting the bit line BL to a logic 0 value (e.g., 0 Volts), applying a program voltage (Vpgm) to a selected EEPROM cell and applying a pass voltage (Vpass) to the unselected EEPROM cells within a string, as illustrated by FIG. 1C. In addition, during programming the NAND string may be enabled by applying a positive voltage (e.g., power supply voltage Vdd) to the string select line (SSL) and a ground voltage (e.g., 0 Volts) to the ground select line (GSL).
Moreover, the programmed state or erased state of an EEPROM cell may be detected by performing a read operation on a selected cell. As illustrated by FIG. 1D, a NAND string will operate to discharge a precharged bit line BL when a selected cell is in an erased state and the selected word line voltage (e.g., 0 Volts) is greater than the threshold voltage of the selected cell. However, when a selected cell is in a programmed state, the corresponding NAND string will provide an open circuit to the precharged bit line BL because the selected word line voltage (e.g., 0 Volts) is less than the threshold voltage of the selected cell and the selected cell remains “off”. Other aspects of NAND-type flash memories are disclosed in an article by Jung et al., entitled “A 3.3 Volt Single Power Supply 16-Mb Nonvolatile Virtual DRAM Using a NAND Flash Memory Technology,” IEEE Journal of Solid-State Circuits, Vol. 32, No. 11, pp. 1748-1757, November (1997), the disclosure of which is hereby incorporated herein by reference.
EEPROM cells that support multiple programmed states are typically referred to as multi-level cells (MLC). As illustrated by FIG. 2, an MLC that supports an erased state and three different programmed states operates to store two data bits per cell. These and other aspects of an MLC having two data bits per cell is disclosed in an article by Takeuchi et al., entitled “A Multipage Cell Architecture for High-Speed Programming Multilevel NAND Flash Memories,” IEEE Journal of Solid-State Circuits, Vol. 33, No. 8, pp. 1228-1238, August (1998). Commonly assigned U.S. Pat. Nos. 5,862,074 and 5,768,188 also disclose aspects of multi-level EEPROM cells arranged in a NAND-type configuration, the disclosures of which are hereby incorporated herein by reference.
FIGS. 3A-3B illustrate how a pair of three-state EEPROM cells may support 3-bit programming. In FIG. 3A, an MLC is illustrated as supporting an erased state and two possible programmed states. As will be understood by those skilled in the art, the erased state may be distinguished from the two possible programmed states by applying a first reference voltage VR1 to a control electrode of a selected EEPROM cell during a read operation. This first reference voltage VR1 should be set to a level between the maximum acceptable threshold voltage of an erased cell (shown as V0) and the minimum acceptable threshold voltage of a cell programmed to state 1 (shown as V1). Similarly, the second programmed state (state 2) may be distinguished from the erased and first programmed states by applying a second reference voltage VR2 to a selected EEPROM cell during a read operation. This second reference voltage VR2 should be set to a level between the maximum acceptable threshold voltage of a cell programmed to state 1 and the minimum acceptable threshold voltage of a cell programmed to state 2 (shown as V2). As illustrated by FIG. 3B, two adjacent three-level EEPROM cells in the same physical row of memory may be programmed into one of eight possible states ((111), (110), . . . , (001), (000)) to support 3-bits of data per cell pair. Additional aspects of three-state EEPROM cells are disclosed in an article by Tanaka et al., entitled “A 3.4-Mbyte/sec Programming 3-Level NAND Flash Memory Saving 40% Die Size Per Bit,” 1997 Symposium on VLSI Circuits Digest of Technical Papers, Section 9.3, pp. 65-66 (1997). Unfortunately, the use of 3-state EEPROM cells in the pair configuration of FIG. 3B may require the use of complex error detection and correction circuitry because any single cell failure will typically result in a corresponding 3-bit data error for both cells in the corresponding pair.
SUMMARY OF THE INVENTION
Embodiments of the invention include nonvolatile memory devices that support virtual page storage using odd-state memory cells and methods of programming nonvolatile memory devices. In some of these embodiments, an integrated circuit device is provided with a nonvolatile memory array therein. This memory array includes at least two nonvolatile odd-state memory cells that operate individually as respective physical memory cells and collectively as a single virtual memory cell. The memory array is further configured so that programming of the virtual memory cell is verified at only a single reference voltage for all values of data contained in the virtual memory cell. The memory array may also be configured as a flash memory array and reading of the virtual memory cell may occur by evaluating whether any of the physical memory cells associated with the virtual memory cell are programmed to a threshold voltage in excess of the single reference voltage.
Additional embodiments of the invention include a flash memory array having at least first and second blocks of three-state memory cells therein. Each of these blocks of memory cells may contain multiple pages of memory cells. These first and second blocks of three-state memory cells operate individually as first and second blocks of physical memory cells, respectively, and collectively as a block of virtual memory cells. The first block of memory cells may include a plurality of NAND strings of EEPROM cells. In some embodiments, each of the plurality of NAND strings of EEPROM cells includes at least one SLC EEPROM cell that does not support virtual cell programming.
Still further embodiments of the invention include methods of operating flash memory devices. These methods include programming a NAND-type EEPROM array with a third page of data by initially reading first and second pages of data from the NAND-type EEPROM array and then overwriting the first and second pages of data with modified data. This overwriting operation encodes three pages of data into two pages of EEPROM cells in the NAND-type EEPROM array.
Additional operating methods include encoding a third page of flash memory data into first and second pages of flash memory data to thereby generate first and second pages of encoded flash memory data. A first page of flash memory cells in a flash memory device is then programmed with the first page of encoded flash memory data. A second page of flash memory cells in the flash memory device is also programmed with the second page of encoded flash memory data. A third page of flash memory data may then be generated in response reading the first and second pages of encoded flash memory data from the first and second pages of flash memory cells, respectively.
BRIEF DESCRIPTION OF THE DRAWINGS
FIG. 1A is an electrical schematic of a conventional nonvolatile memory device having NAND-type strings of EEPROM cells therein.
FIG. 1B is a graph illustrating the relative threshold voltages of an erased and programmed EEPROM cell, according to the prior art.
FIG. 1C is an electrical schematic of a NAND-type string of EEPROM cells showing programming bias conditions.
FIG. 1D illustrates current flow in a NAND-type string during operations to read data from an erased EEPROM cell and a programmed EEPROM cell according to the prior art.
FIG. 2 is a graph illustrating the relative threshold voltages of a four-state EEPROM cell according to the prior art.
FIG. 3A is a graph illustrating the relative threshold voltages of a three-state EEPROM cell according to the prior art.
FIG. 3B illustrates the threshold voltage distributions of two adjacent three-state EEPROM cells that support 3-bit data when paired together in the same row of memory.
FIG. 4A is an electrical schematic of upper and lower NAND-type strings of EEPROM cells that support virtual page programming according to embodiments of the present invention.
FIG. 4B is an electrical schematic of a NAND-type EEPROM device according to embodiments of the present invention.
FIG. 4C is a diagram that illustrates operations to program three-state EEPROM cells, according to embodiments of the present invention.
FIG. 4D is a diagram that illustrates operations to program three-state EEPROM cells, according to embodiments of the present invention.
FIG. 4E is a flow diagram that illustrates operations to program “virtual” pages of EEPROM cells, according to embodiments of the present invention.
FIG. 5A illustrates operations to program a virtual EEPROM cell, according to embodiments of the present invention.
FIG. 5B is a flow diagram illustrating operations to read data from three-state EEPROM cells, according to embodiments of the present invention.
FIG. 5C is a flow diagram illustrating operations to read data from three-state EEPROM cells, according to embodiments of the present invention.
DETAILED DESCRIPTION OF PREFERRED EMBODIMENTS
The present invention now will be described more fully herein with reference to the accompanying drawings, in which preferred embodiments of the invention are shown. This invention may, however, be embodied in many different forms and should not be construed as being limited to the embodiments set forth herein; rather, these embodiments are provided so that this disclosure will be thorough and complete, and will fully convey the scope of the invention to those skilled in the art. Like reference numerals refer to like elements throughout and signal lines and signals thereon may be referred to by the same reference characters. Signals may also be synchronized and/or undergo minor boolean operations (e.g., inversion) without being considered different signals.
Referring now to FIG. 4A, a single column 40 a of EEPROM cells is illustrated as including a pair of NAND-type strings. This pair of NAND-type strings includes an upper NAND-type string, which may belong to an upper block of EEPROM cells, which includes multiple pages of cells, and a lower NAND-type string, which may belong to a lower block of EEPROM cells, which includes multiple pages of cells. The upper and lower NAND-type strings are tied to a common source line CSL. The upper NAND-type string includes an NMOS transistor having a gate terminal connected to an upper string select line SSLU and an NMOS transistor having a gate terminal connected to an upper ground select line GSLU. The upper NAND-type string also includes a plurality of three-state EEPROM cells. These three-state EEPROM cells have control gates connected to respective word lines, which are associated with a plurality of pages of nonvolatile memory: PAGE 1, PAGE 3, . . . , PAGE 39. A pair of SLC EEPROM cells associated with PAGES 41 and 43 are also provided. These SLC EEPROM cells may be outside the address space of virtual page programming and reading operations. Likewise, the lower NAND-type string includes an NMOS transistor having a gate terminal connected to a lower string select line SSLL and an NMOS transistor having a gate terminal connected to an lower ground select line GSLL. The lower NAND-type string also includes a plurality of three-state EEPROM cells. These three-state EEPROM cells have control gates connected to respective word lines, which are associated with a plurality of pages of nonvolatile memory: PAGE 0, PAGE 2, . . . , PAGE 38. A pair of SLC EEPROM cells associated with PAGES 40 and 42 are also provided. As described more fully hereinbelow with respect to FIGS. 4B-4E and 5A-5C, the EEPROM cells associated with the pages PAGE 0, PAGE 2, . . . , PAGE 38 of a lower block of memory and the EEPROM cells associated with the pages PAGE 1, PAGE 3, . . . , PAGE 39 of an upper block of memory may collectively form a plurality of “virtual” pages of nonvolatile memory. These “virtual” pages are illustrated as VPAGE44, VPAGE 45, . . . , VPAGE63. Accordingly, the column 40 a of EEPROM cells is illustrated as supporting one column of a 64 page nonvolatile memory. Embodiments of the present invention are not limited to any particular capacity of memory, page width or NAND string length.
FIG. 4B illustrates an EEPROM device 40 b according to embodiments of the present invention. The EEPROM device 40 b includes a nonvolatile memory array with upper and lower memory blocks, a page buffer and data input/output circuit. In particular, the EEPROM device 40 b is illustrated as an eight column device that supports 2N “physical” pages (e.g., rows) of nonvolatile memory and N “virtual” pages of nonvolatile memory, but only incurs the memory array layout footprint (i.e., area penalty) of a conventional nonvolatile memory supporting 2N pages of SLC EEPROM cells.
FIG. 4C illustrates operations to program a corresponding pair of three-state EEPROM cells in a sequential manner, with the upper cell within the pair being programmed before the lower cell within the pair. This program order may be reversed. For purposes of illustration herein, the upper cell may be the EEPROM cell associated with word line WLU<0> and bit line BL<0> in FIG. 4B and the lower cell may be the EEPROM cell associated with word line WLL<0> and bit line BL<0> in FIG. 4B. As illustrated by FIG. 4C, the programming of two bits of “physical” data as 1/1 does not involve any change in the threshold voltages of the upper and lower cells within the pair. Thus, the threshold voltages of the upper and lower cells within the pair remain at their original “erased” levels (i.e., Vth<VR1, where VR1 is a first reference voltage). The programming of two bits of “physical” data as 1/0 does not involve any change in the threshold voltage of the upper cell, but causes the threshold voltage of the lower cell to be increased to a level between VR1 and VR2. Similarly, the programming of two bits of “physical” data as 0/1 causes the threshold voltage of the upper cell to be increased to a level between VR1 and VR2, but does not involve any change in the threshold voltage of the lower cell. Finally, the programming of two bits of “physical” data as 0/0 causes the threshold voltages of the upper and lower cells to be increased to a level between VR1 and VR2, as illustrated. The programming and reading operations for the upper cell are independent from that of the lower cell and vice versa.
FIG. 4D illustrates operations to program a corresponding pair of three-state EEPROM cells with a third bit of “virtual” data, after the pair has been programmed with two bits of “physical” data in accordance with FIG. 4C. These program operations include cases (a)-(h). In case (a), the “virtual” program operation does not require any change in the threshold voltages of the pair of cells to achieve 3-bit data as 1/1/1. In case (b), which is a special case (S), the “virtual” program operation requires increasing the threshold voltages of both upper and lower cells in the pair to levels in excess of VR2 (i.e., Vth>VR2, where VR2 is a second reference voltage), to achieve 3-bit data as 1/1/0. In case (c), the “virtual” program operation does not require any additional change in the threshold voltages of the pair of cells to achieve 3-bit data as 1/0/1. In case (d), the “virtual” program operation requires increasing the threshold voltages of the lower cell in the pair to a level in excess of VR2 to achieve 3-bit data as 1/0/0. In case (e), the “virtual” program operation does not require any additional change in the threshold voltages of the pair of cells to achieve 3-bit data as 0/1/1. In case (f), the “virtual” program operation requires increasing the threshold voltage of the upper cell in the pair to a level in excess of VR2 to achieve 3-bit data as 0/1/0. In case (g), the “virtual” program operation does not require any additional change in the threshold voltages of the pair of cells to achieve 3-bit data as 0/0/1. Finally, in case (h), the “virtual” program operation requires increasing the threshold voltage of the upper cell in the pair to a level in excess of VR2 to achieve 3-bit data as 0/0/0.
In particular, each virtual page program operation includes a plurality of read operations from corresponding upper and lower physical pages within a multi-page memory array having upper and lower blocks. As illustrated by Block 102, EEPROM cells in an upper page of the memory array can be read using a normal SLC read operation. This SLC read operation includes setting a selected word line in an upper block of the memory array to the first reference voltage VR1. This upper page of read data is identified by the reference character A1. Thereafter, a corresponding lower page of data can be read using a normal SLC read operation, Block 104. This SLC read operation includes setting a selected word line in a lower block of the memory array to the first reference voltage VR1. This lower page of read data is identified by the reference character A2.
A virtual page of data, referred to herein as a third page of data A3, is then programmed into a “virtual” page of the memory array by encoding both the upper page of “physical” data A1 and the lower page of “physical” data A2 with this third page of data A3. These encoding operations result in the generation of “encoded” upper cell data A1* and “encoded” lower cell data A2*. As illustrated by FIG. 5B, these encoding operations are non-destructive, which means that A1 can be decoded directly from A1* and A2 can be decoded directly from A2*. These encoding operations may be illustrated more fully by reference to FIGS. 4D and 5A, for an example case where a first page of data, A1<7:0>, equals <10110001>, a second page of data, A2<7:0>, equals <01110110> and a third page of data, A3<7:0>, equals <10001010>:
    • A1<7:0>=<10110001>;
    • A2<7:0>=<01110110>; and
    • A3<7:0>=<10001010>
      Figure US07483301-20090127-P00001
      (ENCODE)
    • A1*<7:0>=<10P SS00 P01>; and
    • A2*<7:0>=<01SS0110P>.
      In this example, the superscript “P” in A1*<7:0> and A2*<7:0> designates further programming to raise a threshold voltage above VR2 and “S” designates the special case (b) illustrated by FIG. 4D where both lower and upper cells within a pair are further programmed to have threshold voltages in excess of VR2. Thus, among other things, the above example illustrates that one pair of EEPROM cells in column six (6) of the EEPROM device 40 b is programmed to support 3-bits of data as 0/1/0 (i.e., A1<6>=0, A2<6>=1 and A3<6>=0), which corresponds to case (f) in FIG. 4D. Another pair of EEPROM cells in column zero (0) of the EEPROM device 40 b is programmed to support 3-bits of data as 1/0/0 (i.e., A1<0>=1, A2<0>=0 and A3<0>=0), which corresponds to case (d) in FIG. 4D.
Referring again to FIG. 4E and also FIG. 5A, once the encoded data A1* and A2* is generated in response to reading from the upper and lower pages of data A1 and A2, Blocks 102-104, the corresponding upper page of EEPROM cells associated with A1 is programmed with the encoded data A1* and then verified at the second reference voltage VR2, Blocks 106 and 108. Thereafter, the corresponding lower page of EEPROM cells associated with A2 is programmed with the encoded data A2* and then verified at the second reference voltage VR2, Blocks 110 and 112. This upper and lower programming order may be reversed in alternative embodiments of the invention.
FIG. 5B illustrates operations 200 to read “physical” data from selected pages of EEPROM cells. This “physical” data corresponds to BIT 1 and BIT 2 of the three bit data illustrated by FIG. 5A. These read operations 200 include the performance of a special case read operation from corresponding upper and lower pages of a nonvolatile memory array. As illustrated by Blocks 202 and 204, this special case read operation includes setting the selected word lines for the upper and lower pages in the upper and lower blocks, respectively, at the second reference voltage VR2 while concurrently setting the unselected word lines at VREAD. As illustrated by Block 206, a check is then made to determine whether any of the corresponding bit lines, which are connected to the upper and lower blocks, are discharged. If this check results in a negative answer, which means the special case is present (i.e., BIT1/BIT2/BIT3=1/1/0), then the read data for the corresponding physical cell equals a logic 1 value, Block 210. However, if the check results in a positive answer, then a normal SLC read is performed on the selected cell with the selected word line set to the first reference voltage VR1, Block 208. The read data for a selected physical page is then output from a page buffer, Block 212. Thus, for the above example, a special case read of the selected upper page (programmed with A1*<7:0>=<10P SS00 P01>) would result in the following first bit line condition: BL1<7:0>=<00110000>, which indicates that A1 <5:4>=<11>, Block 202-204. in contrast, a normal SLC read of the selected upper page (programmed with A1*<7:0>=<10110001>) would result in the following second bit line condition: BL2<7:0>=<01111110>, Block 208. These first and second bit line conditions (BL1<7:0>=<00110000> and BL2<7:0>=<01111110>) are combined within the page buffer to thereby generate the value of A1<7:0> as <10110001>, Block 212. This value of A1 is generated by inverting every bit associated with the second bit line condition, subject to the constraint set by the first bit line condition, which requires that A1<5:4>=<11> because of the presence of special case programming.
FIG. 5C illustrates operations 300 to read “virtual” data from a pair of pages of EEPROM cells. At Blocks 302 and 304, the selected and unselected word lines for the upper block are set to VR2 and VREAD, respectively, to detect whether any of the cells in the selected upper page satisfy the case (b), case (f) or case (h) conditions identified by FIG. 4D. Thus, for the above example (programmed with A1*<7:0>=<10P SS00 P01>), this read operation would result in the following third bit line condition: BL3<7:0>=<01110100>, which is stored in a first latch within the page buffer, Block 306. Thereafter, at Blocks 308 and 310, the selected and unselected word lines for the lower block are set to VR2 and VREAD, respectively, to detect whether any of the cells in the selected lower page satisfy the case (b) or case (d) conditions identified by FIG. 4D. Thus, for the above example (programmed with A2*<7:0>=<01SS0110P>), this read operation would result in the following fourth bit line condition:
BL4<7:0>=<00110001>, which is stored in a second latch within the page buffer, Block 312.
At Block 314, the data with the first and second latches is compared on a bit-by-bit basis:
BL 3<7:0>=<01110100>;
BL 4<7:0>=<00110001>.
Because only BL3<5:4>=BL4<5:4>=<11>, A3<5:4>=<00>, Block 316. At Block 318, a NOR operation is performed on the remaining bits to yield A3<7:6;3:0>=<10;1010>. The data is then output from the page buffer, Block 320. In other embodiments of the present invention, the page buffer may perform alternative operations to resolve the above-described read operations.
The above-described programming operations illustrated by FIG. 4D illustrate how embodiments of the present invention are relatively immune from multi-bit errors caused in response to threshold voltage programming errors. For example, if the programming state illustrated by case (a) is erroneously reflected as a case (c) or case (e) state upon reading, then the correct 3-bit data value of 1/1/1 will be erroneously reflected upon reading as 1/0/1, which represents a single bit error in A2, or 0/1/1, which reflects a single bit error in A1. Likewise, if the programming state illustrated by case (g), for example, is erroneously reflected as a case (c), case (e) or case (h) state upon reading, then the correct 3-bit data value of 0/0/1 will be erroneously reflected upon reading as 1/0/1, which represents a single bit error in A1, or 0/1/1, which reflects a single bit error in A2, or 0/0/0, which reflects a single bit error in A3. The same is true for other programming states illustrated by FIG. 4D.
In the drawings and specification, there have been disclosed typical preferred embodiments of the invention and, although specific terms are employed, they are used in a generic and descriptive sense only and not for purposes of limitation, the scope of the invention being set forth in the following claims.

Claims (10)

1. A method of operating a flash memory device, comprising the steps of:
programming a NAND-type EEPROM array with a third page of data by reading first and second pages of data from the NAND-type EEPROM array and then overwriting the first and second pages of data with modified data that encodes three pages of data therein.
2. The method of claim 1, wherein said programming step is followed by the step of reading three pages of data from the two pages of EEPROM cells within the NAND-type EEPROM array.
3. The method of claim 2, wherein the EEPROM cells are three-state EEPROM cells.
4. A method of operating a flash memory device, comprising the steps of:
encoding a third page of flash memory data into first and second pages of flash memory data to thereby generate first and second pages of encoded flash memory data;
programming a first page of flash memory cells in the flash memory device with the first page of encoded flash memory data;
programming a second page of flash memory cells in the flash memory device with the second page of encoded flash memory data; and
generating the third page of flash memory data in response reading the first and second pages of encoded flash memory data from the first and second pages of flash memory cells, respectively.
5. The method of claim 4, wherein said encoding step is preceded by the steps of reading the first and second pages of flash memory data from the first and second pages of flash memory cells, respectively.
6. The method of claim 4, wherein said step of programming the first page of flash memory cells with the first page of encoded flash memory data is followed by the step of generating the first page of flash memory data in response to reading the first page of encoded flash memory data from the first page of flash memory cells.
7. The method of claim 4, wherein said step of programming the second page of flash memory cells with the second page of encoded flash memory data is followed by the step of generating the second page of flash memory data in response to reading the second page of encoded flash memory data from the second page of flash memory cells.
8. A method of operating a flash memory device, comprising the steps of:
reading a first page of data from a first page of EEPROM cells in a memory array;
reading a second page of data from a second page of EEPROM cells from the memory array; and
reading a third page of data from the memory array by reading the first and second pages of data from the first and second pages of EEPROM cells, respectively, into a page buffer and decoding the first and second pages of data in the page buffer into the third page of data.
9. The method of claim 8, wherein the first and second pages of EEPROM cells are in different multi-page blocks of EEPROM cells.
10. The method of claim 8, wherein the third page of data is read before reading the first page of data or the second page of data.
US12/119,608 2005-04-27 2008-05-13 Nonvolatile memory devices that support virtual page storage using odd-state memory cells and methods of programming same Active US7483301B2 (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
US12/119,608 US7483301B2 (en) 2005-04-27 2008-05-13 Nonvolatile memory devices that support virtual page storage using odd-state memory cells and methods of programming same
US12/350,588 US7710773B2 (en) 2005-04-27 2009-01-08 Nonvolatile memory devices that support virtual page storage using odd-state memory cells

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
KR1020050034825A KR100666174B1 (en) 2005-04-27 2005-04-27 Nonvolatile semiconductor memory device having three-level memory cells and operating method therefor
KR2005-34825 2005-04-27
US11/358,648 US7388778B2 (en) 2005-04-27 2006-02-21 Nonvolatile memory devices that support virtual page storage using odd-state memory cells
US12/119,608 US7483301B2 (en) 2005-04-27 2008-05-13 Nonvolatile memory devices that support virtual page storage using odd-state memory cells and methods of programming same

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
US11/358,648 Division US7388778B2 (en) 2005-04-27 2006-02-21 Nonvolatile memory devices that support virtual page storage using odd-state memory cells

Related Child Applications (1)

Application Number Title Priority Date Filing Date
US12/350,588 Division US7710773B2 (en) 2005-04-27 2009-01-08 Nonvolatile memory devices that support virtual page storage using odd-state memory cells

Publications (2)

Publication Number Publication Date
US20080212372A1 US20080212372A1 (en) 2008-09-04
US7483301B2 true US7483301B2 (en) 2009-01-27

Family

ID=36791826

Family Applications (3)

Application Number Title Priority Date Filing Date
US11/358,648 Active 2026-05-25 US7388778B2 (en) 2005-04-27 2006-02-21 Nonvolatile memory devices that support virtual page storage using odd-state memory cells
US12/119,608 Active US7483301B2 (en) 2005-04-27 2008-05-13 Nonvolatile memory devices that support virtual page storage using odd-state memory cells and methods of programming same
US12/350,588 Active US7710773B2 (en) 2005-04-27 2009-01-08 Nonvolatile memory devices that support virtual page storage using odd-state memory cells

Family Applications Before (1)

Application Number Title Priority Date Filing Date
US11/358,648 Active 2026-05-25 US7388778B2 (en) 2005-04-27 2006-02-21 Nonvolatile memory devices that support virtual page storage using odd-state memory cells

Family Applications After (1)

Application Number Title Priority Date Filing Date
US12/350,588 Active US7710773B2 (en) 2005-04-27 2009-01-08 Nonvolatile memory devices that support virtual page storage using odd-state memory cells

Country Status (7)

Country Link
US (3) US7388778B2 (en)
EP (1) EP1720168B1 (en)
JP (1) JP4970834B2 (en)
KR (1) KR100666174B1 (en)
CN (2) CN1855304B (en)
DE (1) DE602006001026T2 (en)
TW (1) TWI310189B (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20080101120A1 (en) * 2006-10-23 2008-05-01 Samsung Electronics Co., Ltd. Method of programming multi-pages and flash memory device of performing the same
US20080101116A1 (en) * 2006-10-31 2008-05-01 Hynix Semiconductor Inc. Multi-level cell copyback program method in a non-volatile memory device
US20100091578A1 (en) * 2008-10-10 2010-04-15 Yong-June Kim Nonvolatile Memory Devices Having Built-in Memory Cell Recovery During Block Erase and Methods of Operating Same
US11342026B2 (en) 2020-02-13 2022-05-24 Kioxia Corporation Semiconductor memory medium and memory system

Families Citing this family (59)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100666185B1 (en) * 2005-07-29 2007-01-09 삼성전자주식회사 Nonvolatile semiconductor memory device having three-level memory cells and operating method therefor
KR100666183B1 (en) * 2006-02-01 2007-01-09 삼성전자주식회사 Nonvolatile semiconductor memory device having three-level memory cells and operating method therefor
KR100666223B1 (en) * 2006-02-22 2007-01-09 삼성전자주식회사 Three-level nonvolatile semiconductor memory device for decreasing noise between memory cells and operating method therefor
US7336532B2 (en) * 2006-05-12 2008-02-26 Elite Semiconductor Memory Method for reading NAND memory device and memory cell array thereof
US7366017B2 (en) 2006-08-22 2008-04-29 Micron Technology, Inc. Method for modifying data more than once in a multi-level cell memory location within a memory array
KR100871694B1 (en) * 2006-10-04 2008-12-08 삼성전자주식회사 Program method and data read method of non-volatile memory device using six threshold voltage levels, and non-volatile memory device using the same
ITVA20060065A1 (en) * 2006-11-03 2008-05-04 St Microelectronics Srl MEMORY WITH THREE-LEVEL CELLS AND ITS MANAGEMENT METHOD.
KR100855972B1 (en) * 2007-01-23 2008-09-02 삼성전자주식회사 Non-volatile memory system including a plurality of memory cell arrays having different read stand-by time and data read method of the Non-volatile memory system
JP2009015978A (en) 2007-07-05 2009-01-22 Toshiba Corp Semiconductor memory device and memory system
US7489543B1 (en) * 2007-07-25 2009-02-10 Micron Technology, Inc. Programming multilevel cell memory arrays
KR100938044B1 (en) * 2007-09-10 2010-01-21 주식회사 하이닉스반도체 Non volatile memory device and multi level cell programming method thereof
US7639532B2 (en) * 2007-10-10 2009-12-29 Micron Technology, Inc. Non-equal threshold voltage ranges in MLC NAND
KR100923820B1 (en) 2007-10-12 2009-10-27 주식회사 하이닉스반도체 Page buffer, memory device having the same and operating method thereof
KR101391881B1 (en) * 2007-10-23 2014-05-07 삼성전자주식회사 Multi-bit flash memory device and program and read methods thereof
KR101426845B1 (en) * 2007-12-05 2014-08-14 삼성전자주식회사 Non-volatile memory devices including common source
KR101434401B1 (en) * 2007-12-17 2014-08-27 삼성전자주식회사 Integrated circuit memory device
KR101378365B1 (en) 2008-03-12 2014-03-28 삼성전자주식회사 Apparatus and method for hybrid detecting memory data
KR101414494B1 (en) * 2008-03-17 2014-07-04 삼성전자주식회사 Memory device and memory data read method
US7920430B2 (en) * 2008-07-01 2011-04-05 Qimonda Ag Integrated circuits and methods for operating the same using a plurality of buffer circuits in an access operation
KR100965074B1 (en) * 2008-08-19 2010-06-21 주식회사 하이닉스반도체 Memory cell block of non volatile memory device and managing method for additional information thereof
JP2010092559A (en) * 2008-10-10 2010-04-22 Toshiba Corp Nand type flash memory
EP2267724A1 (en) * 2009-06-26 2010-12-29 STMicroelectronics Rousset SAS EEPROM memory architecture optimised for embedded memories
US8238173B2 (en) 2009-07-16 2012-08-07 Zikbit Ltd Using storage cells to perform computation
US9076527B2 (en) 2009-07-16 2015-07-07 Mikamonu Group Ltd. Charge sharing in a TCAM array
CN101989461B (en) * 2009-08-06 2014-04-02 中芯国际集成电路制造(上海)有限公司 Semiconductor nitride read only memory (NROM) storing device
US8417877B2 (en) 2010-08-31 2013-04-09 Micron Technology, Inc Stripe-based non-volatile multilevel memory operation
US8860117B2 (en) 2011-04-28 2014-10-14 Micron Technology, Inc. Semiconductor apparatus with multiple tiers of memory cells with peripheral transistors, and methods
CN103176910B (en) * 2011-12-26 2015-10-14 群联电子股份有限公司 For the data merging method of nonvolatile memory, controller and storage device
US8976594B2 (en) 2012-05-15 2015-03-10 Micron Technology, Inc. Memory read apparatus and methods
US9064551B2 (en) 2012-05-15 2015-06-23 Micron Technology, Inc. Apparatuses and methods for coupling load current to a common source
US8964474B2 (en) * 2012-06-15 2015-02-24 Micron Technology, Inc. Architecture for 3-D NAND memory
CN103578532B (en) * 2012-08-01 2016-08-10 旺宏电子股份有限公司 The operational approach of storage device and memory array and operational approach thereof
US8811084B2 (en) * 2012-08-30 2014-08-19 Micron Technology, Inc. Memory array with power-efficient read architecture
US8780632B2 (en) 2012-11-09 2014-07-15 Sandisk Technologies Inc. De-duplication techniques using NAND flash based content addressable memory
US8817541B2 (en) 2012-11-09 2014-08-26 Sandisk Technologies Inc. Data search using bloom filters and NAND based content addressable memory
US8773909B2 (en) 2012-11-09 2014-07-08 Sandisk Technologies Inc. CAM NAND with or function and full chip search capability
US8792279B2 (en) 2012-11-09 2014-07-29 Sandisk Technologies Inc. Architectures for data analytics using computational NAND memory
US8780634B2 (en) 2012-11-09 2014-07-15 Sandisk Technologies Inc. CAM NAND with OR function and full chip search capability
US8780635B2 (en) 2012-11-09 2014-07-15 Sandisk Technologies Inc. Use of bloom filter and improved program algorithm for increased data protection in CAM NAND memory
US8780633B2 (en) 2012-11-09 2014-07-15 SanDisk Technologies, Inc. De-duplication system using NAND flash based content addressable memory
US9098403B2 (en) 2012-11-09 2015-08-04 Sandisk Technologies Inc. NAND flash based content addressable memory
WO2014074496A2 (en) * 2012-11-09 2014-05-15 Sandisk Technologies Inc. Cam nand with or function and full chip search capability
US8811085B2 (en) 2012-11-09 2014-08-19 Sandisk Technologies Inc. On-device data analytics using NAND flash based intelligent memory
US9064577B2 (en) 2012-12-06 2015-06-23 Micron Technology, Inc. Apparatuses and methods to control body potential in memory operations
US9032271B2 (en) * 2012-12-07 2015-05-12 Western Digital Technologies, Inc. System and method for lower page data recovery in a solid state drive
CN103971750B (en) * 2013-01-29 2017-02-08 中国航空工业集团公司西安飞机设计研究所 Sensitive fault detection method of 9 adjacent units of RAM
US8717827B1 (en) * 2013-02-22 2014-05-06 Hyperstone Gmbh Method for the permanently reliable programming of multilevel cells in flash memories
US9075424B2 (en) 2013-03-06 2015-07-07 Sandisk Technologies Inc. Compensation scheme to improve the stability of the operational amplifiers
US8995188B2 (en) * 2013-04-17 2015-03-31 Micron Technology, Inc. Sharing support circuitry in a memory
KR102320830B1 (en) * 2015-09-24 2021-11-03 에스케이하이닉스 주식회사 Semiconductor memory device including three-dimensional array structure
US9679650B1 (en) 2016-05-06 2017-06-13 Micron Technology, Inc. 3D NAND memory Z-decoder
US10176880B1 (en) 2017-07-01 2019-01-08 Intel Corporation Selective body reset operation for three dimensional (3D) NAND memory
KR20190102596A (en) * 2018-02-26 2019-09-04 에스케이하이닉스 주식회사 Semiconductor memory device and methode for operating thereof
US11011239B2 (en) * 2018-12-27 2021-05-18 Kioxia Corporation Semiconductor memory
KR20200136747A (en) * 2019-05-28 2020-12-08 에스케이하이닉스 주식회사 Memory device, memory system including the memory device and operating method of the memory system
KR20200142219A (en) 2019-06-12 2020-12-22 삼성전자주식회사 Electronic device and method of utilizing storage space thereof
US12027209B2 (en) * 2019-06-17 2024-07-02 SK Hynix Inc. Memory device and method of operating the same
US11450381B2 (en) 2019-08-21 2022-09-20 Micron Technology, Inc. Multi-deck memory device including buffer circuitry under array
US11133062B1 (en) * 2020-05-07 2021-09-28 Micron Technology, Inc. Two memory cells sensed to determine one data value

Citations (35)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5652719A (en) 1993-09-21 1997-07-29 Kabushiki Kaisha Toshiba Nonvolatile semiconductor memory device
US5696717A (en) 1995-10-16 1997-12-09 Samsung Electronics Co., Ltd. Nonvolatile integrated circuit memory devices having adjustable erase/program threshold voltage verification capability
US5734609A (en) 1995-11-29 1998-03-31 Samsung Electronics Co., Ltd. Integrated circuit memory devices having reduced susceptibility to inadvertent programming and erasure and methods of operating same
US5768188A (en) 1995-12-11 1998-06-16 Samsung Electronics Co., Ltd. Multi-state non-volatile semiconductor memory and method for driving the same
US5812454A (en) 1995-12-20 1998-09-22 Samsung Electronics Co., Ltd. Nand-type flash memory device and driving method thereof
US5841693A (en) 1996-04-25 1998-11-24 Nec Corporation Non-volatile memory using field effect transistors having dual floating gates for storing two bits per cell
US5848009A (en) 1996-10-08 1998-12-08 Samsung Electronics Co., Ltd. Integrated circuit memory devices that map nondefective memory cell blocks into continuous addresses
US5862074A (en) 1996-10-04 1999-01-19 Samsung Electronics Co., Ltd. Integrated circuit memory devices having reconfigurable nonvolatile multi-bit memory cells therein and methods of operating same
US5936887A (en) 1996-08-13 1999-08-10 Samsung Electronics Co., Ltd. Non-volatile memory device with NAND type cell structure
US5973958A (en) 1998-06-23 1999-10-26 Advanced Micro Devices, Inc. Interlaced storage and sense technique for flash multi-level devices
US6137729A (en) 1997-12-29 2000-10-24 Samsung Electronics Co., Ltd. Method for erasing memory cells in a flash memory device
US6181606B1 (en) 1998-10-30 2001-01-30 Samsung Electronics Co., Inc. Nonvolatile integrated circuit memory devices having improved word line driving capability and methods of operating same
US6259628B1 (en) 1997-12-30 2001-07-10 Samsung Electronics Co., Ltd. Memory devices with verifying input/output buffer circuits and methods of operation thereof
US6288935B1 (en) * 1999-09-20 2001-09-11 Kabushiki Kaisha Toshiba Nonvolatile semiconductor memory device for storing multivalued data
JP2002511655A (en) 1998-04-08 2002-04-16 インフィネオン テクノロジース アクチエンゲゼルシャフト Semiconductor memory device and method of manufacturing the same
US6549457B1 (en) 2002-02-15 2003-04-15 Intel Corporation Using multiple status bits per cell for handling power failures during write operations
US20030086316A1 (en) 2001-03-30 2003-05-08 Wlodek Kurjanowicz RAM having dynamically switchable access modes
US6594178B2 (en) 2001-01-10 2003-07-15 Samsung Electronics Co., Ltd. Method for optimizing distribution profile of cell threshold voltages in NAND-type flash memory device
US6725321B1 (en) 1999-02-17 2004-04-20 Lexar Media, Inc. Memory system
US20040080979A1 (en) 2002-10-25 2004-04-29 Nexflash Technologies, Inc. Nonvolatile semiconductor memory having three-level memory cells and program and read mapping circuits therefor
US6735116B2 (en) 2001-12-24 2004-05-11 Samsung Electronics Co., Ltd. NAND-type flash memory device with multi-page program, multi-page read, multi-block erase operations
US6772274B1 (en) 2000-09-13 2004-08-03 Lexar Media, Inc. Flash memory system and method implementing LBA to PBA correlation within flash memory array
US6813184B2 (en) 2002-01-12 2004-11-02 Samsung Electronics Co., Ltd. NAND flash memory and method of erasing, programming, and copy-back programming thereof
US20050007801A1 (en) 2001-09-17 2005-01-13 Ron Barzilai Multi-purpose non-volatile memory card
US6853585B2 (en) 2002-12-05 2005-02-08 Samsung Electronics Co., Ltd. Flash memory device having uniform threshold voltage distribution and method for verifying same
US6865110B1 (en) 2003-08-22 2005-03-08 Samsung Electronics Co., Ltd. Program voltage generation circuit for stably programming flash memory cell and method of programming flash memory cell
US20050174841A1 (en) 2004-02-05 2005-08-11 Iota Technology, Inc. Electronic memory with tri-level cell pair
US20050246480A1 (en) 2004-04-29 2005-11-03 Hung-Shiun Fu System and method capable of sequentially writing data to a flash memory
US7057942B2 (en) 2004-09-13 2006-06-06 Kabushiki Kaisha Toshiba Memory management device and memory device
US20060161723A1 (en) 2005-01-14 2006-07-20 Stmicroelectronics S.R.I. Controlling operation of flash memories
US7085909B2 (en) 2003-04-29 2006-08-01 International Business Machines Corporation Method, system and computer program product for implementing copy-on-write of a file
US7164601B2 (en) 2003-09-12 2007-01-16 Renesas Technology Corp. Multi-level nonvolatile semiconductor memory device utilizing a nonvolatile semiconductor memory device for storing binary data
US7215580B2 (en) 2001-09-28 2007-05-08 Lexar Media, Inc. Non-volatile memory control
US20070106875A1 (en) 2005-11-10 2007-05-10 Mather Clifford J Memory management
US20070195597A1 (en) 2006-02-22 2007-08-23 Samsung Electronics Co., Ltd. Non-Volatile Memory Devices that Utilize Mirror-Image Programming Techniques to Inhibit Program Coupling Noise and Methods of Programming Same

Family Cites Families (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6342099A (en) * 1986-08-06 1988-02-23 Fujitsu Ltd Ternary level rom
JPH07120720B2 (en) * 1987-12-17 1995-12-20 三菱電機株式会社 Nonvolatile semiconductor memory device
JPH0730000A (en) * 1993-07-09 1995-01-31 Toshiba Corp Nonvolatile semiconductor memory device and its manufacturing method
JPH0766304A (en) * 1993-08-31 1995-03-10 Toshiba Corp Semiconductor storage device
JP3476952B2 (en) * 1994-03-15 2003-12-10 株式会社東芝 Nonvolatile semiconductor memory device
AU2593595A (en) * 1994-06-02 1996-01-04 Intel Corporation Sensing schemes for flash memory with multilevel cells
KR100253868B1 (en) * 1995-11-13 2000-05-01 니시무로 타이죠 Non-volatile semiconductor memory device
DE19631169C2 (en) * 1996-08-01 1998-07-23 Siemens Ag Matrix memory in virtual ground architecture
JP3555076B2 (en) 1999-12-28 2004-08-18 Necエレクトロニクス株式会社 Readout circuit of multi-value storage semiconductor storage device
US6233175B1 (en) * 2000-10-21 2001-05-15 Advanced Micro Devices, Inc. Self-limiting multi-level programming states
US6587372B2 (en) * 2001-01-11 2003-07-01 Micron Technology, Inc. Memory device with multi-level storage cells and apparatuses, systems and methods including same
JP3472271B2 (en) * 2001-02-13 2003-12-02 株式会社東芝 Nonvolatile semiconductor memory device
FR2828029B1 (en) * 2001-07-25 2003-09-26 Centre Nat Rech Scient ENERGY CONVERSION DEVICE
JP4259922B2 (en) 2002-07-30 2009-04-30 シャープ株式会社 Semiconductor memory device
US6986016B2 (en) * 2002-09-30 2006-01-10 International Business Machines Corporation Contiguous physical memory allocation
US6937520B2 (en) * 2004-01-21 2005-08-30 Tsuyoshi Ono Nonvolatile semiconductor memory device
KR100567912B1 (en) * 2004-05-28 2006-04-05 주식회사 하이닉스반도체 Page buffer in a flash memory device and method of programing data using the same
KR100609568B1 (en) * 2004-07-15 2006-08-08 에스티마이크로일렉트로닉스 엔.브이. Page buffer of nonvolatile memory device and programming and reading method using the same
US7254075B2 (en) * 2004-09-30 2007-08-07 Rambus Inc. Integrated circuit memory system having dynamic memory bank count and page size
KR100666183B1 (en) * 2006-02-01 2007-01-09 삼성전자주식회사 Nonvolatile semiconductor memory device having three-level memory cells and operating method therefor
US7508711B2 (en) * 2007-04-30 2009-03-24 Intel Corporation Arrangements for operating a memory circuit

Patent Citations (37)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5652719A (en) 1993-09-21 1997-07-29 Kabushiki Kaisha Toshiba Nonvolatile semiconductor memory device
US5696717A (en) 1995-10-16 1997-12-09 Samsung Electronics Co., Ltd. Nonvolatile integrated circuit memory devices having adjustable erase/program threshold voltage verification capability
US5734609A (en) 1995-11-29 1998-03-31 Samsung Electronics Co., Ltd. Integrated circuit memory devices having reduced susceptibility to inadvertent programming and erasure and methods of operating same
US5768188A (en) 1995-12-11 1998-06-16 Samsung Electronics Co., Ltd. Multi-state non-volatile semiconductor memory and method for driving the same
US5812454A (en) 1995-12-20 1998-09-22 Samsung Electronics Co., Ltd. Nand-type flash memory device and driving method thereof
US5841693A (en) 1996-04-25 1998-11-24 Nec Corporation Non-volatile memory using field effect transistors having dual floating gates for storing two bits per cell
US5936887A (en) 1996-08-13 1999-08-10 Samsung Electronics Co., Ltd. Non-volatile memory device with NAND type cell structure
US5862074A (en) 1996-10-04 1999-01-19 Samsung Electronics Co., Ltd. Integrated circuit memory devices having reconfigurable nonvolatile multi-bit memory cells therein and methods of operating same
US5848009A (en) 1996-10-08 1998-12-08 Samsung Electronics Co., Ltd. Integrated circuit memory devices that map nondefective memory cell blocks into continuous addresses
US6137729A (en) 1997-12-29 2000-10-24 Samsung Electronics Co., Ltd. Method for erasing memory cells in a flash memory device
US6259628B1 (en) 1997-12-30 2001-07-10 Samsung Electronics Co., Ltd. Memory devices with verifying input/output buffer circuits and methods of operation thereof
JP2002511655A (en) 1998-04-08 2002-04-16 インフィネオン テクノロジース アクチエンゲゼルシャフト Semiconductor memory device and method of manufacturing the same
KR100408944B1 (en) 1998-04-08 2003-12-11 인피니언 테크놀로지스 아게 Semiconductor memory and method for producing same
US5973958A (en) 1998-06-23 1999-10-26 Advanced Micro Devices, Inc. Interlaced storage and sense technique for flash multi-level devices
US6181606B1 (en) 1998-10-30 2001-01-30 Samsung Electronics Co., Inc. Nonvolatile integrated circuit memory devices having improved word line driving capability and methods of operating same
US6725321B1 (en) 1999-02-17 2004-04-20 Lexar Media, Inc. Memory system
US6288935B1 (en) * 1999-09-20 2001-09-11 Kabushiki Kaisha Toshiba Nonvolatile semiconductor memory device for storing multivalued data
US6772274B1 (en) 2000-09-13 2004-08-03 Lexar Media, Inc. Flash memory system and method implementing LBA to PBA correlation within flash memory array
US6594178B2 (en) 2001-01-10 2003-07-15 Samsung Electronics Co., Ltd. Method for optimizing distribution profile of cell threshold voltages in NAND-type flash memory device
US20030086316A1 (en) 2001-03-30 2003-05-08 Wlodek Kurjanowicz RAM having dynamically switchable access modes
US20050007801A1 (en) 2001-09-17 2005-01-13 Ron Barzilai Multi-purpose non-volatile memory card
US7215580B2 (en) 2001-09-28 2007-05-08 Lexar Media, Inc. Non-volatile memory control
US6735116B2 (en) 2001-12-24 2004-05-11 Samsung Electronics Co., Ltd. NAND-type flash memory device with multi-page program, multi-page read, multi-block erase operations
US6813184B2 (en) 2002-01-12 2004-11-02 Samsung Electronics Co., Ltd. NAND flash memory and method of erasing, programming, and copy-back programming thereof
KR20040098642A (en) 2002-02-15 2004-11-20 인텔 코포레이션 Using multiple status bits per cell for handling power failures during write operations
US6549457B1 (en) 2002-02-15 2003-04-15 Intel Corporation Using multiple status bits per cell for handling power failures during write operations
US20040080979A1 (en) 2002-10-25 2004-04-29 Nexflash Technologies, Inc. Nonvolatile semiconductor memory having three-level memory cells and program and read mapping circuits therefor
US6853585B2 (en) 2002-12-05 2005-02-08 Samsung Electronics Co., Ltd. Flash memory device having uniform threshold voltage distribution and method for verifying same
US7085909B2 (en) 2003-04-29 2006-08-01 International Business Machines Corporation Method, system and computer program product for implementing copy-on-write of a file
US6865110B1 (en) 2003-08-22 2005-03-08 Samsung Electronics Co., Ltd. Program voltage generation circuit for stably programming flash memory cell and method of programming flash memory cell
US7164601B2 (en) 2003-09-12 2007-01-16 Renesas Technology Corp. Multi-level nonvolatile semiconductor memory device utilizing a nonvolatile semiconductor memory device for storing binary data
US20050174841A1 (en) 2004-02-05 2005-08-11 Iota Technology, Inc. Electronic memory with tri-level cell pair
US20050246480A1 (en) 2004-04-29 2005-11-03 Hung-Shiun Fu System and method capable of sequentially writing data to a flash memory
US7057942B2 (en) 2004-09-13 2006-06-06 Kabushiki Kaisha Toshiba Memory management device and memory device
US20060161723A1 (en) 2005-01-14 2006-07-20 Stmicroelectronics S.R.I. Controlling operation of flash memories
US20070106875A1 (en) 2005-11-10 2007-05-10 Mather Clifford J Memory management
US20070195597A1 (en) 2006-02-22 2007-08-23 Samsung Electronics Co., Ltd. Non-Volatile Memory Devices that Utilize Mirror-Image Programming Techniques to Inhibit Program Coupling Noise and Methods of Programming Same

Non-Patent Citations (4)

* Cited by examiner, † Cited by third party
Title
European Search Report, European Application No. 06004699.2, Sep. 1, 2006.
Jung et al., "A 3.3-V Single Power Supply 16-Mb Nonvolatile Virtual DRAM Using a NAND Flash Memory Technology," IEEE Journal of Solid-State Circuits, vol. 32, No. 11, Nov. 1997, pp. 1748-1757.
Takeuchi et al., "A Multipage Cell Architecture for High-Speed Programming Multilevel NAND Flash Memories," IEEE Journal of Solid-State Circuits, vol. 33, No. 8, Aug. 1998, pp. 1228-1238.
Tanaka et al., "A 3.4 Mbyte/sec Programming 3-Level NAND Flash Memory Saving 40% Die Size Per Bit," 1997 Symposium on VLSI Circuits Digest of Technical Papers, pp. 65-66.

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20080101120A1 (en) * 2006-10-23 2008-05-01 Samsung Electronics Co., Ltd. Method of programming multi-pages and flash memory device of performing the same
US20080101116A1 (en) * 2006-10-31 2008-05-01 Hynix Semiconductor Inc. Multi-level cell copyback program method in a non-volatile memory device
US7848141B2 (en) * 2006-10-31 2010-12-07 Hynix Semiconductor Inc. Multi-level cell copyback program method in a non-volatile memory device
US20110075479A1 (en) * 2006-10-31 2011-03-31 Hynix Semiconductor Inc. Multi-level cell copyback program method in a non-volatile memory device
US8036030B2 (en) 2006-10-31 2011-10-11 Hynix Semiconductor Inc. Multi-level cell copyback program method in a non-volatile memory device
US20100091578A1 (en) * 2008-10-10 2010-04-15 Yong-June Kim Nonvolatile Memory Devices Having Built-in Memory Cell Recovery During Block Erase and Methods of Operating Same
US8274840B2 (en) 2008-10-10 2012-09-25 Samsung Electronics Co., Ltd. Nonvolatile memory devices having built-in memory cell recovery during block erase and methods of operating same
US11342026B2 (en) 2020-02-13 2022-05-24 Kioxia Corporation Semiconductor memory medium and memory system
US11615851B2 (en) 2020-02-13 2023-03-28 Kioxia Corporation Semiconductor memory medium and memory system
US11749350B2 (en) 2020-02-13 2023-09-05 Kioxia Corporation Semiconductor memory medium and memory system

Also Published As

Publication number Publication date
US20080212372A1 (en) 2008-09-04
EP1720168A1 (en) 2006-11-08
CN1855304B (en) 2010-06-16
US20060245249A1 (en) 2006-11-02
TWI310189B (en) 2009-05-21
TW200638425A (en) 2006-11-01
DE602006001026D1 (en) 2008-06-12
CN101807432B (en) 2012-02-01
JP4970834B2 (en) 2012-07-11
US20090129161A1 (en) 2009-05-21
CN101807432A (en) 2010-08-18
DE602006001026T2 (en) 2009-06-25
JP2006309928A (en) 2006-11-09
KR20060112413A (en) 2006-11-01
US7388778B2 (en) 2008-06-17
KR100666174B1 (en) 2007-01-09
EP1720168B1 (en) 2008-04-30
US7710773B2 (en) 2010-05-04
CN1855304A (en) 2006-11-01

Similar Documents

Publication Publication Date Title
US7483301B2 (en) Nonvolatile memory devices that support virtual page storage using odd-state memory cells and methods of programming same
US6055188A (en) Nonvolatile semiconductor memory device having a data circuit for erasing and writing operations
US7420847B2 (en) Multi-state memory having data recovery after program fail
US7639529B2 (en) Non-volatile memory devices that utilize mirror-image programming techniques to inhibit program coupling noise and methods of programming same
US7345928B2 (en) Data recovery methods in multi-state memory after program fail
JP3940544B2 (en) Method for verifying nonvolatile semiconductor memory
KR101191479B1 (en) Semiconductor storage device
US7701765B2 (en) Non-volatile multilevel memory cell programming
US7518909B2 (en) Non-volatile memory device adapted to reduce coupling effect between storage elements and related methods
US7411820B2 (en) Three-level nonvolatile semiconductor memory device and associated method of operation
US20060007737A1 (en) Nonvolatile semiconductor memory device
US7663922B2 (en) Non-volatile semiconductor memory devices with lower and upper bit lines sharing a voltage control block, and memory cards and systems having the same
US8391080B2 (en) Erase voltage reduction in a non-volatile memory device
US7796438B2 (en) Flash memory device and method of programming the same
US10026484B2 (en) High-speed readable semiconductor storage device
KR102194907B1 (en) Semiconductor storage device and readout method
JP4672673B2 (en) Semiconductor device and method for controlling semiconductor device
US7907454B2 (en) Method of verifying programming operation of flash memory device
CN115705888A (en) Memory device with four data line bias levels
JP2003157681A (en) Nonvolatile semiconductor memory
JP2007115407A (en) Nonvolatile semiconductor memory

Legal Events

Date Code Title Description
STCF Information on status: patent grant

Free format text: PATENTED CASE

FPAY Fee payment

Year of fee payment: 4

FPAY Fee payment

Year of fee payment: 8

MAFP Maintenance fee payment

Free format text: PAYMENT OF MAINTENANCE FEE, 12TH YEAR, LARGE ENTITY (ORIGINAL EVENT CODE: M1553); ENTITY STATUS OF PATENT OWNER: LARGE ENTITY

Year of fee payment: 12