US4359519A - Process for forming a high resolution recording medium - Google Patents

Process for forming a high resolution recording medium Download PDF

Info

Publication number
US4359519A
US4359519A US06/116,494 US11649480A US4359519A US 4359519 A US4359519 A US 4359519A US 11649480 A US11649480 A US 11649480A US 4359519 A US4359519 A US 4359519A
Authority
US
United States
Prior art keywords
layer
etching
reflecting layer
photosensitive material
photosensitive layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
US06/116,494
Other languages
English (en)
Inventor
Heinz Kraus
Erich Bayer
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Dr Johannes Heidenhain GmbH
Original Assignee
Dr Johannes Heidenhain GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dr Johannes Heidenhain GmbH filed Critical Dr Johannes Heidenhain GmbH
Application granted granted Critical
Publication of US4359519A publication Critical patent/US4359519A/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Images

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0035—Multiple processes, e.g. applying a further resist layer on an already in a previously step, processed pattern or textured surface
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C7/00—Multicolour photographic processes or agents therefor; Regeneration of such processing agents; Photosensitive materials for multicolour processes
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S428/00—Stock material or miscellaneous articles
    • Y10S428/913—Material designed to be responsive to temperature, light, moisture
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24802—Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.]

Definitions

  • This invention relates to a process for forming a multilayered, high resolution recording medium having a plurality of reflecting layers separated by a spacing layer.
  • high resolution, multicolored recording media can be formed by means of multiple, carefully formed reflecting layers separated by a translucent spacing layer.
  • the reflecting layers are formed by means of a high frequency sputter etching process. In this process a substrate is exposed to a high vacuum in a vacuum apparatus and then coated by means of a cathode formed of a material such as silver which is suitable for the generation of reflecting layers. Thereupon, the reflecting layer is coated with a photosensitive layer and the photosensitive layer is exposed through a patterned exposure mask. After the unexposed pattern portion of the photosensitive layer has been removed, the patterned portion of the reflecting layer not covered with the photosensitive layer is then removed by ion bombardment with reversed polarization.
  • DT-OS No. 26 58 623 presents the disadvantage that in addition to the ions responsible for the material removal there also arise high energy electrons. During the removal process, these energy-rich electrons often bring about a chemical alteration of the remaining photosensitive layer in the form of a hardening of the photosensitive layer by cross-linking.
  • the hardened photosensitive layer is not removable in the form of a true solution as is the photosensitive layer prior to hardening. When the hardened photosensitive layer is immersed in solvent it tends to swell rather than dissolve, and the removal of the photosensitive layer often has to be initiated by mechanical means such as ultrasound or wiping techniques.
  • the present invention is directed to an improved process for the production of a high resolution recording medium that avoids the disadvantages mentioned above.
  • chemical etching techniques or ion beam etching techniques are used to remove selected portions of a reflecting layer in the production of a multilayer, high resolution recording medium.
  • chemical etching is performed in such a manner that a rapid and thorough boundary surface exchange of the etching agent takes place continually.
  • under-etching takes place when the edges of the photosensitive layer lift off of the underlying protected layer when the etching process takes excessively long, as for example as a result of a reduced activity of unexchanged etching agent at the boundary surfaces of the etching agent.
  • Adequately rapid and thorough boundary surface exchange of the etching medium can be achieved, for example, by the means that the chemical etching is carried out in a centrifuge and the etching agent is fed continuously onto the photosensitive layer as a spray jet. Tests have indicated that the quality of the pattern reproduction of such chemically etched layers in comparison to layers that were produced by high-frequency sputter etching, is substantially identical, since the under-etching occurring in the preferred chemical etching process can be kept less than 0.1 microns.
  • An alternate process for removing patterned portions of a reflecting layer not covered with a photosensitive layer is by means of ion beam etching.
  • this etching process the electrons present in the plasma discharge are prevented by application of suitable electric or magnetic fields from reaching the surface of the remaining photolac layer. In this manner the removal process does not cross-link the photosensitive layer and the remaining photosensitive layer can therefore be removed from the reflecting layer by means of solvents.
  • the remaining photosensitive layer is not chemically altered by the proposed process of chemical etching or of ion beam etching.
  • the remaining photosensitive layer can therefore be removed by dissolving it in a solvent without mechanical action, so that there is achieved a substantial reduction of scratching or otherwise disturbing the remaining reflecting layer.
  • the drawing shows a cross-sectional view of a portion of a recording medium produced by a preferred embodiment of the process of this invention.
  • FIGURE there is represented a portion of a recording medium produced by a preferred embodiment of the process of the present invention.
  • This medium includes a transparent substrate layer 1 of glass to which is applied a reflecting layer 2 of silver.
  • the layer 2 of silver is coated with a photosensitive layer (not represented), which is then exposed in the desired pattern by means of an exposure mask and thereafter developed.
  • the portion of the reflecting layer 2 under the removed photosensitive layer is then removed by chemical etching or by ion beam etching.
  • the remaining photosensitive layer is then removed and an interference layer 3 of uniformly thick inorganic material absorption free in the visible wavelength range is then applied to the structure-carrying side of the substrate 1.
  • a reflecting layer 4 of silver is then applied over the interference layer 3, and the layer 4 is then coated with a photosensitive layer (not represented).
  • the photosensitive layer is exposed in the desired pattern by means of an exposure mask and thereafter developed.
  • the portion of the reflecting layer 4 no longer covered with the photosensitive layer is then removed by chemical etching or by ion beam etching.
  • another reflecting layer 5 of silver is applied, which is patterned by application of a photosensitive layer (not represented), patterned exposure, development of the photosensitive layer and removal of chemical etching or ion beam etching of the patterned portion of the reflecting layer 5 no longer covered with the photosensitive layer.
  • the photosensitive layer is the photolac material distributed by Shipley as part number 1350.
  • the etching agent is a solution of 1% nitric acid or 50% iron nitrate.
  • the solvent of the photosensitive layer is dimethyl formamide or a keytone.
  • the chemical etching is performed in a centrifuge which spins the part being etched at about 600 revolutions per minute.
  • the part being etched can have a diameter up to about 350 millimeters and is maintained in a horizontal position.
  • the chemical etching solution is sprayed onto the part being etched at the center of rotation of the part at a flow rate of about 150 millimeters/minute.
  • the rotary motion of the part being etched causes the etching solution to move across the surface of the part. This ensures that a rapid, thorough and continuous exchange of the boundary layer of the etching solution occurs and allows the etching step to be completed in about 40 to 60 seconds.
  • a device such as the Micro Ion Mill (MIM-TLA 5.5), distributed by the Technics Corporation, Alexandria, Va., is preferably employed.
  • This device includes means for substantially preventing high energy electrons from reaching the remaining photosensitive layer. This greatly reduces cross linking of the layer and facilitates later removal of this layer with solvents.
  • the recording medium produced in this manner presents a structure having a color, blue in this example, which is determined by the thickness of the interference layer 3.
  • the color saturation of this color is determined in the zone of the arrow 7 by the thicknesses of the two reflecting layers 2, 4, so that the light emerging in this zone appears "light blue”.
  • the color saturation is strengthened by the thicknesses of the two reflecting layers 2, 4 and 5 (the successively applied reflecting layers 4, 5 present a single reflecting layer), so that in this zone the emerging light appears "dark blue”.
  • the emerging light because of the transparency of the layer 3, appears white, since in this zone no reflecting layers are present.
  • the layer sequences 2, 3, 4, and 2, 3, 4 and 5, form in each case an interference filter for the color "blue" with differing color saturation.
  • an arrangement of such interference filters adjacent to one another on a substrate there can be generated any desired color hues with any desired color saturation next to one another.
  • By an arrangement of such interference filters one over another on a substrate there can be produced color tones by multiplicative color mixing.

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • ing And Chemical Polishing (AREA)
  • Manufacturing Optical Record Carriers (AREA)
  • Thermal Transfer Or Thermal Recording In General (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
US06/116,494 1979-01-31 1980-01-29 Process for forming a high resolution recording medium Expired - Lifetime US4359519A (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE2903641A DE2903641C2 (de) 1979-01-31 1979-01-31 Verfahren zur Herstellung eines Aufzeichnungsträgers mit einem bei Bestrahlung mit Licht in wenigstens zwei unterschiedlichen Farben erscheinenden Muster
DE2903641 1979-01-31

Publications (1)

Publication Number Publication Date
US4359519A true US4359519A (en) 1982-11-16

Family

ID=6061815

Family Applications (1)

Application Number Title Priority Date Filing Date
US06/116,494 Expired - Lifetime US4359519A (en) 1979-01-31 1980-01-29 Process for forming a high resolution recording medium

Country Status (9)

Country Link
US (1) US4359519A (fr)
JP (1) JPS55110238A (fr)
BR (1) BR8000480A (fr)
CH (1) CH643956A5 (fr)
DE (1) DE2903641C2 (fr)
FR (1) FR2448167A2 (fr)
GB (1) GB2043295B (fr)
IL (1) IL59251A (fr)
ZA (1) ZA80545B (fr)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4522862A (en) * 1981-12-04 1985-06-11 Johannes Heidenhain Gmbh High resolution recording medium and method for producing same
US4877713A (en) * 1986-01-21 1989-10-31 Kyodo Printing Co., Ltd. Preformatted optical recording card and method of producing the same
US20070131408A1 (en) * 2002-04-29 2007-06-14 Bergstrom, Inc. Vehicle Air Conditioning and Heating System Providing Engine On and Off Operation
US20090188611A1 (en) * 2008-01-29 2009-07-30 Savoyet Jean Louis Methods and Means for Constituting Graphical Data, and for Protecting Use of Such Data, and Modes of Reading and Storing Such Data
US9638847B2 (en) 2009-06-04 2017-05-02 Commissariat à l'énergie atomique et aux énergies alternatives Method for producing micron-resolution coloured images embedded in a very robust, very durable medium

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2090428B (en) * 1980-12-29 1985-06-12 Permanent Images Inc Permanent gray-scale reproductions including half-tone images

Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB697036A (en) 1951-04-03 1953-09-16 Heidenhain Johannes Photographic copying process
DE902713C (de) 1950-02-28 1955-11-17 Wenczler & Heidenhain Verfahren zum Aufbringen von Kopien auf beliebiges Material
US3521961A (en) * 1965-09-15 1970-07-28 Heidenhain Johannes Dr Measuring division for photoelectric position indicators
US3824100A (en) * 1970-06-29 1974-07-16 Corning Glass Works Transparent iron oxide microcircuit mask
US3891440A (en) * 1973-11-02 1975-06-24 Gte Sylvania Inc Process for fabricating a color cathode ray tube screen structure incorporating optical filter means therein
US3971874A (en) * 1973-08-29 1976-07-27 Matsushita Electric Industrial Co., Ltd. Optical information storage material and method of making it
US4019905A (en) * 1974-06-17 1977-04-26 Hitachi, Ltd. Method for forming fluorescent screen of color cathode ray tubes using filter layer
US4026743A (en) * 1976-06-24 1977-05-31 Gennady Nikolaevich Berezin Method of preparing transparent artworks
US4151321A (en) * 1976-12-23 1979-04-24 Dr. Johannes Heidenhaln GmbH High resolution recording medium and method for producing same

Patent Citations (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE902713C (de) 1950-02-28 1955-11-17 Wenczler & Heidenhain Verfahren zum Aufbringen von Kopien auf beliebiges Material
GB697036A (en) 1951-04-03 1953-09-16 Heidenhain Johannes Photographic copying process
US3521961A (en) * 1965-09-15 1970-07-28 Heidenhain Johannes Dr Measuring division for photoelectric position indicators
US3824100A (en) * 1970-06-29 1974-07-16 Corning Glass Works Transparent iron oxide microcircuit mask
US3971874A (en) * 1973-08-29 1976-07-27 Matsushita Electric Industrial Co., Ltd. Optical information storage material and method of making it
US3891440A (en) * 1973-11-02 1975-06-24 Gte Sylvania Inc Process for fabricating a color cathode ray tube screen structure incorporating optical filter means therein
US4019905A (en) * 1974-06-17 1977-04-26 Hitachi, Ltd. Method for forming fluorescent screen of color cathode ray tubes using filter layer
US4026743A (en) * 1976-06-24 1977-05-31 Gennady Nikolaevich Berezin Method of preparing transparent artworks
US4151321A (en) * 1976-12-23 1979-04-24 Dr. Johannes Heidenhaln GmbH High resolution recording medium and method for producing same
US4258126A (en) * 1976-12-23 1981-03-24 Dr. Johannes Heidenhain Gmbh High resolution recording medium and method for producing same

Non-Patent Citations (2)

* Cited by examiner, † Cited by third party
Title
IBM Tech. Disclosure Bulletin, vol. 15, No. 5, Oct. 1972, Making Iron Oxide Masks. *
Kodak Publication, p. 131, "Chemical Milling with Kodak Photosensitive Resists", 1968, pp. 15, 18. *

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4522862A (en) * 1981-12-04 1985-06-11 Johannes Heidenhain Gmbh High resolution recording medium and method for producing same
US4877713A (en) * 1986-01-21 1989-10-31 Kyodo Printing Co., Ltd. Preformatted optical recording card and method of producing the same
US20070131408A1 (en) * 2002-04-29 2007-06-14 Bergstrom, Inc. Vehicle Air Conditioning and Heating System Providing Engine On and Off Operation
US20090188611A1 (en) * 2008-01-29 2009-07-30 Savoyet Jean Louis Methods and Means for Constituting Graphical Data, and for Protecting Use of Such Data, and Modes of Reading and Storing Such Data
US8845843B2 (en) 2008-01-29 2014-09-30 Jean Louis SAVOYET Methods and means for constituting graphical data, and for protecting use of such data, and modes of reading and storing such data
US9638847B2 (en) 2009-06-04 2017-05-02 Commissariat à l'énergie atomique et aux énergies alternatives Method for producing micron-resolution coloured images embedded in a very robust, very durable medium

Also Published As

Publication number Publication date
CH643956A5 (de) 1984-06-29
ZA80545B (en) 1981-02-25
IL59251A0 (en) 1980-05-30
GB2043295A (en) 1980-10-01
DE2903641A1 (de) 1980-08-07
FR2448167B2 (fr) 1984-11-09
JPS55110238A (en) 1980-08-25
BR8000480A (pt) 1980-10-07
FR2448167A2 (fr) 1980-08-29
IL59251A (en) 1983-06-15
DE2903641C2 (de) 1982-11-11
GB2043295B (en) 1983-02-23

Similar Documents

Publication Publication Date Title
EP1724616B1 (fr) Procédé d'obtention d'un filtre optique structuré sur un substrat
US4948706A (en) Process for producing transparent substrate having thereon transparent conductive pattern elements separated by light-shielding insulating film, and process for producing surface-colored material
KR940003742B1 (ko) 금속박판에 미소한 관통구멍을 형성하기 위한 방법
US4174219A (en) Method of making a negative exposure mask
US3508982A (en) Method of making an ultra-violet selective template
US4359519A (en) Process for forming a high resolution recording medium
US4861422A (en) Method of manufacturing shadow mask and apparatus
KR970006927B1 (ko) 위상시프트 포토마스크 및 그 제조방법
US5759724A (en) Method for making multi-phase, phase shifting masks
US3957609A (en) Method of forming fine pattern of thin, transparent, conductive film
US5089361A (en) Mask making process
JPS594820B2 (ja) 色分離フイルタ−の製造法
JPH10197712A (ja) カラーフィルターの製造方法
JPS62210467A (ja) レジスト塗布方法
JP2008158265A (ja) カラーフィルタ、カラーフィルタの製造方法
JPH07209514A (ja) カラーフィルタ
JP2002333516A (ja) 透明基板および透明基板の製造方法
KR100334012B1 (ko) 액정디스플레이용컬러필터의제조방법
JPS6024933B2 (ja) 電子線感応性無機レジスト
JPH01102567A (ja) 露光マスクの製造方法
JPH02827A (ja) 遮光性絶縁膜によって分離された透明導電性パターンを有する透明基板および表面着色体の製造方法
DE3824889A1 (de) Optischer aufzeichnungstraeger
JPH06104172A (ja) 薄膜パターンの形成方法
JPH06130649A (ja) 位相シフトマスクおよび位相シフトマスク用ブランクスの製造方法
JPS6045246A (ja) レジストパタ−ンの形成方法

Legal Events

Date Code Title Description
STCF Information on status: patent grant

Free format text: PATENTED CASE