US3870569A - Process for boriding refractory metals and their alloys - Google Patents
Process for boriding refractory metals and their alloys Download PDFInfo
- Publication number
- US3870569A US3870569A US360190A US36019073A US3870569A US 3870569 A US3870569 A US 3870569A US 360190 A US360190 A US 360190A US 36019073 A US36019073 A US 36019073A US 3870569 A US3870569 A US 3870569A
- Authority
- US
- United States
- Prior art keywords
- boriding
- process according
- vacuum
- titanium
- oxygen
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000003870 refractory metal Substances 0.000 title claims abstract description 23
- 238000000034 method Methods 0.000 title claims description 48
- 230000008569 process Effects 0.000 title claims description 45
- 229910045601 alloy Inorganic materials 0.000 title claims description 7
- 239000000956 alloy Substances 0.000 title claims description 7
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 claims abstract description 30
- 229910052796 boron Inorganic materials 0.000 claims abstract description 25
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims abstract description 19
- 239000001301 oxygen Substances 0.000 claims abstract description 19
- 229910052760 oxygen Inorganic materials 0.000 claims abstract description 19
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims description 20
- 229910052719 titanium Inorganic materials 0.000 claims description 20
- 239000010936 titanium Substances 0.000 claims description 20
- 229910052751 metal Inorganic materials 0.000 claims description 18
- 239000002184 metal Substances 0.000 claims description 18
- 229910052735 hafnium Inorganic materials 0.000 claims description 11
- VBJZVLUMGGDVMO-UHFFFAOYSA-N hafnium atom Chemical compound [Hf] VBJZVLUMGGDVMO-UHFFFAOYSA-N 0.000 claims description 10
- 238000000137 annealing Methods 0.000 claims description 9
- 239000010955 niobium Substances 0.000 claims description 9
- 229910052756 noble gas Inorganic materials 0.000 claims description 9
- 238000012856 packing Methods 0.000 claims description 9
- 229910052758 niobium Inorganic materials 0.000 claims description 8
- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 claims description 8
- 229910052715 tantalum Inorganic materials 0.000 claims description 8
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 claims description 8
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 claims description 7
- 150000002739 metals Chemical class 0.000 claims description 7
- 229910052726 zirconium Inorganic materials 0.000 claims description 7
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 claims description 3
- 239000012298 atmosphere Substances 0.000 claims description 3
- 229910052750 molybdenum Inorganic materials 0.000 claims description 3
- 239000011733 molybdenum Substances 0.000 claims description 3
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 claims description 3
- 229910052721 tungsten Inorganic materials 0.000 claims description 3
- 239000010937 tungsten Substances 0.000 claims description 3
- 229910052720 vanadium Inorganic materials 0.000 claims description 3
- LEONUFNNVUYDNQ-UHFFFAOYSA-N vanadium atom Chemical compound [V] LEONUFNNVUYDNQ-UHFFFAOYSA-N 0.000 claims 1
- 239000010410 layer Substances 0.000 description 27
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 14
- 239000000463 material Substances 0.000 description 11
- 239000003795 chemical substances by application Substances 0.000 description 9
- 229910052786 argon Inorganic materials 0.000 description 7
- 239000000843 powder Substances 0.000 description 7
- 229910001069 Ti alloy Inorganic materials 0.000 description 5
- 150000001875 compounds Chemical class 0.000 description 5
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 4
- 229910001093 Zr alloy Inorganic materials 0.000 description 4
- 239000000654 additive Substances 0.000 description 4
- 239000003085 diluting agent Substances 0.000 description 4
- -1 ferrous metals Chemical class 0.000 description 4
- 239000007789 gas Substances 0.000 description 4
- 150000003839 salts Chemical class 0.000 description 4
- 239000007787 solid Substances 0.000 description 4
- 229910052580 B4C Inorganic materials 0.000 description 3
- 230000003213 activating effect Effects 0.000 description 3
- 230000008901 benefit Effects 0.000 description 3
- INAHAJYZKVIDIZ-UHFFFAOYSA-N boron carbide Chemical compound B12B3B4C32B41 INAHAJYZKVIDIZ-UHFFFAOYSA-N 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 238000002474 experimental method Methods 0.000 description 3
- 239000000155 melt Substances 0.000 description 3
- 239000011148 porous material Substances 0.000 description 3
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- 239000012190 activator Substances 0.000 description 2
- 238000009792 diffusion process Methods 0.000 description 2
- 150000004673 fluoride salts Chemical class 0.000 description 2
- 239000001257 hydrogen Substances 0.000 description 2
- 229910052739 hydrogen Inorganic materials 0.000 description 2
- 229910052742 iron Inorganic materials 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 230000003647 oxidation Effects 0.000 description 2
- 238000007254 oxidation reaction Methods 0.000 description 2
- 230000001681 protective effect Effects 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- GPPXJZIENCGNKB-UHFFFAOYSA-N vanadium Chemical compound [V]#[V] GPPXJZIENCGNKB-UHFFFAOYSA-N 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 239000004606 Fillers/Extenders Substances 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- XGCTUKUCGUNZDN-UHFFFAOYSA-N [B].O=O Chemical compound [B].O=O XGCTUKUCGUNZDN-UHFFFAOYSA-N 0.000 description 1
- SWCGXFPZSCXOFO-UHFFFAOYSA-N [Zr].[Mo] Chemical compound [Zr].[Mo] SWCGXFPZSCXOFO-UHFFFAOYSA-N 0.000 description 1
- 230000009471 action Effects 0.000 description 1
- 230000004913 activation Effects 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 239000012790 adhesive layer Substances 0.000 description 1
- 230000000274 adsorptive effect Effects 0.000 description 1
- 238000005452 bending Methods 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 229910021538 borax Inorganic materials 0.000 description 1
- 150000001639 boron compounds Chemical class 0.000 description 1
- 150000003842 bromide salts Chemical class 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 150000003841 chloride salts Chemical class 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 238000005868 electrolysis reaction Methods 0.000 description 1
- 230000008030 elimination Effects 0.000 description 1
- 238000003379 elimination reaction Methods 0.000 description 1
- 239000007792 gaseous phase Substances 0.000 description 1
- 239000008187 granular material Substances 0.000 description 1
- 229910002804 graphite Inorganic materials 0.000 description 1
- 239000010439 graphite Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 239000003779 heat-resistant material Substances 0.000 description 1
- 239000001307 helium Substances 0.000 description 1
- 229910052734 helium Inorganic materials 0.000 description 1
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 1
- 150000002431 hydrogen Chemical class 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 230000000266 injurious effect Effects 0.000 description 1
- CPLXHLVBOLITMK-UHFFFAOYSA-N magnesium oxide Inorganic materials [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 description 1
- 239000000395 magnesium oxide Substances 0.000 description 1
- AXZKOIWUVFPNLO-UHFFFAOYSA-N magnesium;oxygen(2-) Chemical compound [O-2].[Mg+2] AXZKOIWUVFPNLO-UHFFFAOYSA-N 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 229910052754 neon Inorganic materials 0.000 description 1
- GKAOGPIIYCISHV-UHFFFAOYSA-N neon atom Chemical compound [Ne] GKAOGPIIYCISHV-UHFFFAOYSA-N 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 150000002835 noble gases Chemical class 0.000 description 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
- 238000000746 purification Methods 0.000 description 1
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 1
- 229910010271 silicon carbide Inorganic materials 0.000 description 1
- 239000004328 sodium tetraborate Substances 0.000 description 1
- 235000010339 sodium tetraborate Nutrition 0.000 description 1
- 230000003746 surface roughness Effects 0.000 description 1
- 239000008207 working material Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C8/00—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals
- C23C8/60—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using solids, e.g. powders, pastes
- C23C8/62—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using solids, e.g. powders, pastes only one element being applied
- C23C8/68—Boronising
Definitions
- the purpose of the invention is the development of a process in which boride layers are produced by the diffusion of boron into refractory metals and alloys of refractory metals. Such layers are characterized by an extremely high hardness and impart an extraordinarily high wear resistance to parts which can consist, for example, of titanium, tantalum, niobium, hafnium, zirconium molybdenum, tungsten or vanadium.
- the improvement produced by the boriding is above all of significance for metals which are inclined to wear and seizing. This is true, for example, of titanium and all titanium alloys.
- the alloys of titanium because of their high strength and their low weights, in many respects are ideal work materials. However, they can be added only to a very limited extent for construction parts which both must have strenth and be able to transmit motion because of a decided inclination to seizing.
- the boride layers furthermore, increase the compressive strength and the bending strength, the oxidation resistance and the corrosion resistance.
- the boride layers of various refractory metals is characterized by a small wettability and a high resistance to molten metals.
- the process of the invention is characterized by the following particulars.
- a vessel of heat resistant material is filled with amorphous boron and slowly heated under a vacuum of 10 to 10 Torr to 1000C. It is held at this temperature for l to 3 hours. (The temperature can range from 850to l300C, in this pretreatment the time of pretreatment can be widely varied). Then the furnace chamber is flooded with the purest argon or one of the other pure noble gases, e.g. helium or neon, and cooled to room temperature. After this treatment not only is the amorphous boron oxygen free but instead of being laden with air oxygen is loaded with noble gas. The adsorptive bond of the noble gas to the amorphous boron is very stabile so that the furnace chamber can be opened without an immediate reloading with air oxygen occurring.
- the purest argon or one of the other pure noble gases e.g. helium or neon
- the part to be treated is packed in the pretreated boron, whereupon the furnace chamber is again evacuated and is brought to the treatment temperature provided for. Since the evacuation occurs before the high heating the powder packing is again completely oxygen free before reaching the critical temperatures, that is also if in bringing the parts into the powder packing larger amounts of oxygen are taken up adsorptively.
- the boriding process preferably does not occur under high vacuum but preferably at a pressure of 10 Torr.
- the boriding process can be carried out at 10" to 10" Torr. preferably at 10 Torr.
- the treatmenttemperature can be from 850 to I300C. Titanium, tantalum and niobium are preferably borided in the lower temperature range, thus between 850 and 1000C. I-Iafniurn and zirconium, because of the slower speed of growth of their layers, are more suitably treated above 1000C, the time of treatment, according to the thickness of the layer sought and the material, varies between 2 and 12 hours. In special cases, however, it can also be extended to 24 hours or more. After expiration of the fixed time of treatment the furnace chamber is again flooded with argon (or other noble gas) and the parts after cooling to room temperature can be taken out from the powder packing.
- argon or other noble gas
- the next boriding treatment can take place in the same powder packing without the need for renewed oxygen free annealing.
- the use of pure, amorphous boron has the advantage that this substance is reusable as often as desired. The consumption is extraordinarily small and even after 50 fold use no chemical change of the boron occurs.
- the amorphous boron has no tendency to sinter together but remains loose and powdery.
- the solid boriding agents developed for iron materials as a rule contain diluents and activating additives.
- diluents there can be used aluminum oxide, magnesium oxide, silicon carbide and graphite.
- chlorides, fluorides and bromides for an activation there can be used chlorides, fluorides and bromides.
- Such diluents and activating additives can also on principle be employed for the boriding of refractory metals. Their use is recommended, for example, in combination with the already mentioned processes which provide a boriding of titanium work materials under purest argon.
- this can still be considered to cheapen the boriding agents by replacing the expensive, amorphous boron by cheaper boron compounds, as for example, boron carbide or ferroboron.
- the process of the invention makes available a high effectiveness even without the addition of known activators. Since, besides, the activators are consumed in the course of time they limit the reusability of the boriding agent and are therefore rather of disadvantage than of advantage.
- EXAMPLE 1 Samples of pure titanium and the titanium alloy Ti Al 6 V4 were heated for 5 hours at 1000C, and at a pressure of 10 Torr in amorphous, oxygen free annealed boron. In both workpieces there were produced closed, completely pore free boride layers which were toothed in characteristic manner with the base material. The compact part of the layer had in the case of pure titanium, a thickness of 10 um and in the case of the alloy Ti Al 6 V4 a thickness of 8 pm. If the treatment temperature is increased to 1200C, then, after the same time of treatment the thickness of the pure titanium is 35 ,um and of the alloy Ti Al 6 V4 is 30 pm.
- the thickness of the layer of both workpieces can be raised to above 50 ,um. Also under these conditions the layers are built up completely fault free.
- the compact portion of the layer consists of the titanium-boride Ti B
- the dentrites extending deeper into the base material consist predominantly of the boron poor compound Ti B. Both compounds are extremely hard. Their Vickers hardness is between 3500 and 3800 kp/mm EXAMPLE 2 Samples of niobium and tantalum were treated for 5 hours at 900C, and a pressure of 10* Torr in amorphous, oxygen free annealed boron. In both workpieces the layers were built up without flaw and their thickness was between 12 and 18 pm. If the temperature of holding the treatment for 5 hours is increased to 1000C there the thickness of the layer grows to 45 to 50 ,um.
- the thicker layers are still free of pores but are inclined, however, to the formation of cracks which signifies an increased brittleness of the thicker layers.
- the layer produced from tantalum consists of the compound Ta B and the layer produced from niobium consists of the compound Nb B
- the Vickers hardness of both layers is in the range of 3800 to 4200 kp/mm EXAMPLE 3
- Samples of hafnium and the zirconium alloy, zircaloy, which contains 1.5% of tin were borided for 5 hours at 1 C under a pressure of 10 Torr. In both cases the layer was toothed with the base material and faultlessly formed. In the Zircaloy there was measured a thickness of the layer of 10 am and in the hafnium a thickness of 15 am.
- a process for boriding a refractory metal consisting essentially of annealing amorphous boron powder in an oxygen-free vacuum and then packing the refractory metal in the oxygen-free amorphous boron powder and boriding the metal in a vacuum at an elevated temperature.
- refractory metal is a member of the group consisting of titanium, zirconium and hafnium.
- refractory metal is titanium, hafnium, tantalum, niobium, zirconium, molybdenum, vanadium, tungsten or an alloy of such metals.
- a process according to claim 1 wherein the oxygen free annealing is carried out at 1000C for l to 3 hours with a vacuum of 10 to 10 Torr.
- a process according to claim 1 consisting of l) annealing amorphous boron powder in an oxygen-free vacuum, (2) subjecting the annealed boron to an atmosphere of noble gas, (3) packing the refractory metal in the oxygen-free noble gas laden amorphous boron powder, and (4) boriding the metal in a vacuum at an elevated temperature.
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Powder Metallurgy (AREA)
- Physical Vapour Deposition (AREA)
- Ceramic Products (AREA)
- Compositions Of Oxide Ceramics (AREA)
- Manufacture Of Alloys Or Alloy Compounds (AREA)
- Solid-Phase Diffusion Into Metallic Material Surfaces (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE2225378A DE2225378C3 (de) | 1972-05-25 | 1972-05-25 | Verfahren zum Borieren refraktärer Metalle und deren Legierungen |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| US3870569A true US3870569A (en) | 1975-03-11 |
Family
ID=5845815
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| US360190A Expired - Lifetime US3870569A (en) | 1972-05-25 | 1973-05-14 | Process for boriding refractory metals and their alloys |
Country Status (6)
Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4254184A (en) * | 1975-05-30 | 1981-03-03 | Pioneer Electronic Corporation | Vibrating member for acoustic transducer and method for manufacturing the same |
| WO1982003094A1 (en) * | 1981-03-05 | 1982-09-16 | Metal Techn Inc Turbine | Abrasion and erosion resistant articles and method therefor |
| US5242741A (en) * | 1989-09-08 | 1993-09-07 | Taiho Kogyo Co., Ltd. | Boronized sliding material and method for producing the same |
| US20050208213A1 (en) * | 2002-11-15 | 2005-09-22 | University Of Utah Research Foundation | Titanium boride coatings on titanium surfaces and associated methods |
| US20070018139A1 (en) * | 2005-05-10 | 2007-01-25 | Chandran K S R | Nanostructured titanium monoboride monolithic material and associated methods |
| US20100176339A1 (en) * | 2009-01-12 | 2010-07-15 | Chandran K S Ravi | Jewelry having titanium boride compounds and methods of making the same |
| US20120205012A1 (en) * | 2008-05-28 | 2012-08-16 | Universal Global Products, Llc. | Boronization Process and Composition with Improved Surface Characteristics of Metals |
| CN112538602A (zh) * | 2020-11-19 | 2021-03-23 | 武汉力盾新材料科技有限公司 | 一种高镍铸铁工件表面处理工艺 |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5133732A (en) * | 1974-09-17 | 1976-03-23 | Seiko Instr & Electronics | Tokeiyogaisobuhin no hyomenshorihoho |
| JPS5376936A (en) * | 1976-12-21 | 1978-07-07 | Pioneer Electronic Corp | Surface hardening method |
| JP2593441B2 (ja) * | 1986-01-16 | 1997-03-26 | 日新電機株式会社 | 高硬度膜被覆工具材料とその製造方法 |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2949390A (en) * | 1957-08-07 | 1960-08-16 | Harold M Feder | Method of protecting tantalum crucibles against reaction with molten uranium |
| US3647576A (en) * | 1967-12-26 | 1972-03-07 | Suwa Seikosha Kk | Method of hardening sintered cemented carbide compositions by boronizing |
| US3787245A (en) * | 1970-10-26 | 1974-01-22 | Inst Haertereitechn | Method for the boration of titanium and titanium alloys |
-
1972
- 1972-05-25 DE DE2225378A patent/DE2225378C3/de not_active Expired
-
1973
- 1973-05-14 US US360190A patent/US3870569A/en not_active Expired - Lifetime
- 1973-05-24 AT AT453773A patent/AT321053B/de not_active IP Right Cessation
- 1973-05-25 JP JP5849873A patent/JPS5624033B2/ja not_active Expired
- 1973-05-25 GB GB2506773A patent/GB1413077A/en not_active Expired
- 1973-05-25 FR FR7319170A patent/FR2185694B3/fr not_active Expired
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2949390A (en) * | 1957-08-07 | 1960-08-16 | Harold M Feder | Method of protecting tantalum crucibles against reaction with molten uranium |
| US3647576A (en) * | 1967-12-26 | 1972-03-07 | Suwa Seikosha Kk | Method of hardening sintered cemented carbide compositions by boronizing |
| US3787245A (en) * | 1970-10-26 | 1974-01-22 | Inst Haertereitechn | Method for the boration of titanium and titanium alloys |
Cited By (15)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4254184A (en) * | 1975-05-30 | 1981-03-03 | Pioneer Electronic Corporation | Vibrating member for acoustic transducer and method for manufacturing the same |
| WO1982003094A1 (en) * | 1981-03-05 | 1982-09-16 | Metal Techn Inc Turbine | Abrasion and erosion resistant articles and method therefor |
| US5242741A (en) * | 1989-09-08 | 1993-09-07 | Taiho Kogyo Co., Ltd. | Boronized sliding material and method for producing the same |
| US7264682B2 (en) | 2002-11-15 | 2007-09-04 | University Of Utah Research Foundation | Titanium boride coatings on titanium surfaces and associated methods |
| US20050208213A1 (en) * | 2002-11-15 | 2005-09-22 | University Of Utah Research Foundation | Titanium boride coatings on titanium surfaces and associated methods |
| US20070235701A1 (en) * | 2005-05-10 | 2007-10-11 | Chandran K S R | Nanostructured titanium monoboride monolithic material and associated methods |
| US20070018139A1 (en) * | 2005-05-10 | 2007-01-25 | Chandran K S R | Nanostructured titanium monoboride monolithic material and associated methods |
| US7459105B2 (en) | 2005-05-10 | 2008-12-02 | University Of Utah Research Foundation | Nanostructured titanium monoboride monolithic material and associated methods |
| US7501081B2 (en) | 2005-05-10 | 2009-03-10 | University Of Utah Research Foundation | Nanostructured titanium monoboride monolithic material and associated methods |
| US20120205012A1 (en) * | 2008-05-28 | 2012-08-16 | Universal Global Products, Llc. | Boronization Process and Composition with Improved Surface Characteristics of Metals |
| US8815023B2 (en) * | 2008-05-28 | 2014-08-26 | Universal Global Products, LLC | Boronization process and composition with improved surface characteristics of metals |
| US20140329081A1 (en) * | 2008-05-28 | 2014-11-06 | Universal Global Products, Llc. | Boronization Process and Composition with Improved Surface Characteristics of Metals |
| US20100176339A1 (en) * | 2009-01-12 | 2010-07-15 | Chandran K S Ravi | Jewelry having titanium boride compounds and methods of making the same |
| CN112538602A (zh) * | 2020-11-19 | 2021-03-23 | 武汉力盾新材料科技有限公司 | 一种高镍铸铁工件表面处理工艺 |
| CN112538602B (zh) * | 2020-11-19 | 2023-08-01 | 武汉力盾新材料科技有限公司 | 一种高镍铸铁工件表面处理工艺 |
Also Published As
| Publication number | Publication date |
|---|---|
| AT321053B (de) | 1975-03-10 |
| GB1413077A (en) | 1975-11-05 |
| DE2225378C3 (de) | 1978-07-06 |
| FR2185694B3 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1976-05-21 |
| DE2225378B2 (de) | 1977-11-10 |
| FR2185694A1 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1974-01-04 |
| JPS4942535A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1974-04-22 |
| JPS5624033B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1981-06-03 |
| DE2225378A1 (de) | 1973-12-06 |
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