US3852637A - Electron gun structure with unipotential and bipotential lens - Google Patents

Electron gun structure with unipotential and bipotential lens Download PDF

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Publication number
US3852637A
US3852637A US00220641A US22064172A US3852637A US 3852637 A US3852637 A US 3852637A US 00220641 A US00220641 A US 00220641A US 22064172 A US22064172 A US 22064172A US 3852637 A US3852637 A US 3852637A
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Prior art keywords
electrodes
electron
electron gun
gun structure
lens
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Expired - Lifetime
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US00220641A
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English (en)
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E Yamazaki
H Kanai
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Hitachi Ltd
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Hitachi Ltd
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J3/00—Details of electron-optical or ion-optical arrangements or of ion traps common to two or more basic types of discharge tubes or lamps
    • H01J3/02—Electron guns
    • H01J3/029—Schematic arrangements for beam forming
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J29/00—Details of cathode-ray tubes or of electron-beam tubes of the types covered by group H01J31/00
    • H01J29/46—Arrangements of electrodes and associated parts for generating or controlling the ray or beam, e.g. electron-optical arrangement
    • H01J29/48—Electron guns
    • H01J29/488—Schematic arrangements of the electrodes for beam forming; Place and form of the elecrodes

Definitions

  • the electrode system capable of lens action for use in a cathoderay tube there have heretofore been two types; the unipotential type and the bipotential type.
  • the unipotential type of electrode system three focusing electrodes are used which are arranged on a common axis in order to form a main focusing lens assembly, two of the electrodes on both sides have applied thereto a common high voltage of, e.g., approximately 25kV, and the other electrode receives a voltage close to ground potential.
  • two focusing electrodes are employed which are arranged on a common axis in order to form a main focusing lens assembly, one of the electrodes has applied thereto a high voltage of approximately 25kV, and the other receives a medium voltage of 3 to 6 kV.
  • Electrodes system for an electron gun structure has the focusing electrodes arranged so as to constitute a single main electron lens, with the resultv that a cathode image is focused on the screen by the single main electron lens.
  • the aperture of the electron gun is restricted by the inside diameter of the neck portion in which the electron gun is received.
  • the aperture of the main electron lens formed is accordingly subject to restriction, and the reduction of aberration is limited. This leads to serious problems especially in the three electron-gun type cathode-ray tube which accommodates three electron guns in the neck portion.
  • the present invention intends to solve such problems, and has its object in providing an electron gun structure which makes very small the aberration in the main electron lens without increasing the aperture of the electron gun, whereby an electron beam emanating from the electron gun is satisfactorily focused onto the screen.
  • an electron gun structure having a plurality of electrodes for focusing an electron beam on a screen,- the improvement comprising a main focusing lens assembly comprising a first electrode means forming a unipotential electron lens and a second electrode means forming a bipotential electron lens.
  • FIG. 1 is a diagram for explaining the basic construe tion of a main focusing lens system for use in an electron gun structure according to the present invention.
  • FIGS. 2 to are schematic views of an electrode arrangement each showing an embodiment of the electron gun structure according to the present invention.
  • FIG. 1 shows the basic construction of the main focusing lens system used in the electron gun structure type electron lens L,, (or a bipotential type electron lens L,,) and the bipotential electron lens (or the unipotential electron lens).
  • the electron lenses L, and L areadapted to form a main electron lens L,,,, which is larger in effective aperture.
  • l, to I represent loci of electron beams.
  • the main electron lens system L is constructed of the two electron lenses L and L in this way, the effective aperture of the main electron lens may be made large, and hence, the aberration may be sharply decreased over the prior art.
  • the two electron lenses L, and L consist, as described above, of the combination between the unipotential type electron lens L and the bipotential type electron lens L,,, the main electron lens system L, may reduce focal variations by means of the unipotential type electron lens L with respect to fluctuations in voltage, and it may also reduce an increased beam current by means of the unipotential type electron lens L with respect to blooming. Furthermore, owing to the use of the bipotential type electron lens L,, a fine beam is easily obtained.
  • FIG. 2 illustrates an embodiment of the electron gun structure according to the present invention, and specifically shows only an electrode system forming the main electron lens system L,,, and. the way of supplying potentials thereto.
  • the main electron lens system L is composed of an electrode system consisting of four electrodes, the first to fourth electrodes P to P arranged on a common axis, the first electrode P is arranged so as to be closest to the stem of the cathode-ray tube, and the fourth electrode P is arranged so as to be closest to the face panel of the cathode-ray tube.
  • the electrode system has voltages supplied such that the first electrode P, and the third one P are connected in common to apply a high potential from a high potential source E to them, while the second electrode P and the fourth one P are connected in common to apply a medium potential from a medium potential source E to them, and thereby, a main focusing lens assembly is constructed.
  • the first to third electrodes P to P form the unipotential type electron lens L
  • the third and fourth electrodes P and P form the bipotential type electron lens L
  • the lenses L and L form the apparently single main electron lens L,,,, of a larger effective aperture.
  • FIGS. 3 to 5 illustrate further embodiments of the electron gun structure according to the present invention, each specifically showing only the electrode system forming the main electron lens system L and the manner of supplying potentials thereto as in FIG. 2.
  • the first and third electrodes P and P are in common connected to apply a high potential from a high potential source E, thereto, while the second and fourth electrodes P and P are respectively applied with different medium potentials from medium potential sources E and E
  • the main focusing lens assembly is constructed.
  • the first to third electrodes P to P form the unipotential type electron lens L while the third and fourth electrodes P and P form the bipotential type electron lens L
  • FIG. 4 among the four. first.
  • the first and third ones P, and P are connected in common to supply a medium potential from a medium potential source E thereto, while the second and fourth ones P and P are connected in common to supply a high potential from .a high potentialsource E,,'thereto.
  • the main focusing lens assembly is constructed.
  • the first and second electrodes P and P form the bipotential type electron lens L while the second to fourth ones P to P form the unipotential type electron lens L Further, according'to the embodiment of FIG.
  • the second and fourth ones P and P are connected in common to supply a high potential from a high potential source E thereto, while the first and third ones P and P are respectively supplied with different medium potentials from medium potential sources E and E
  • the main focusing lens assembly is constructed.
  • the first and second electrodes P and P form the bipotential type electron lens L
  • the second to fourth ones P to P form the unipotential type electron lens L
  • the use of the electron gum structure according to the present invention provides a finebeam electron flow at small aberration, and accomplishes a very high resolution.
  • an electron gun structure having a plurality of electrodes for focusing an electron beam on a screen
  • the improvement comprising a main focusing lens assembly comprising first electrode means for forming a unipotential electronlens and second electrode means for forming a bipotential electron lens.
  • said first electrode means includes first, second and third electrodes and said second electrode means includes said third electrode and a fourth electrode, said first, second, third and fourth electrodes being arranged on a common axis in order, said first and third electrodes being electrically connected to each other and supplied with a common high potential and each of said second and fourth electrodes being supplied with a potential lower than that of said first and third electrodes.
  • said first electrode means includes second, third and fourth electrodes and said second electrode means includes a first electrode and said second electrode, said first, second, third and fourth electrodes being arranged on a common axis in order, said second and fourth electrodes being electrically connected to each other and supplied with a common high potential and each of said first and third electrodes being supplied with a potential lower than that of said second and fourth electrodes.

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  • Cold Cathode And The Manufacture (AREA)
  • Electrodes For Cathode-Ray Tubes (AREA)
US00220641A 1971-02-05 1972-01-25 Electron gun structure with unipotential and bipotential lens Expired - Lifetime US3852637A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP46004232A JPS5743972B1 (xx) 1971-02-05 1971-02-05

Publications (1)

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US3852637A true US3852637A (en) 1974-12-03

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US00220641A Expired - Lifetime US3852637A (en) 1971-02-05 1972-01-25 Electron gun structure with unipotential and bipotential lens

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US (1) US3852637A (xx)
JP (1) JPS5743972B1 (xx)
DE (1) DE2205162C2 (xx)
FR (1) FR2170876B1 (xx)
GB (1) GB1377091A (xx)

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2850656A1 (de) * 1977-11-22 1979-05-23 Tokyo Shibaura Electric Co Elektronenstrahlrohr fuer kathodenstrahlroehren
DE3013044A1 (de) * 1979-04-10 1980-10-16 Tokyo Shibaura Electric Co Fernsehbildroehre mit einem elektronenstrahlsystem, das nichtkreisfoermige oeffnungen hat
US4246511A (en) * 1977-12-09 1981-01-20 Mitsubishi Denki Kabushiki Kaisha Electron gun
US4276495A (en) * 1977-06-15 1981-06-30 Hitachi, Ltd. Electron gun for cathode-ray tube
US4528476A (en) * 1983-10-24 1985-07-09 Rca Corporation Cathode-ray tube having electron gun with three focus lenses
US4558253A (en) * 1983-04-18 1985-12-10 Rca Corporation Color picture tube having an inline electron gun with asymmetric focusing lens
US5317161A (en) * 1991-05-24 1994-05-31 Ims Ionen Mikrofabrikations Systeme Gesellschaft M.B.H. Ion source

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2015195A (en) * 1978-02-15 1979-09-05 Tektronix Inc Cathode Ray Tube Having Low Voltage Focus and Dynamic Correction
JPS563948A (en) * 1979-06-22 1981-01-16 Hitachi Ltd Electrostatic focusing type pickup tube

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3437868A (en) * 1965-10-11 1969-04-08 Sony Corp Electron gun device
US3501668A (en) * 1968-05-10 1970-03-17 Zenith Radio Corp Low focus voltage electron gun for cathode-ray tubes
US3651359A (en) * 1969-04-23 1972-03-21 Sony Corp Abberation correction of plurality of beams in color cathode ray tube

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US25127A (en) * 1859-08-16 Improvement in mole-plows
GB493882A (en) * 1937-04-17 1938-10-17 Harry Raymond Lubcke Cathode ray tube
DE764012C (de) * 1936-11-15 1954-10-04 Aeg Elektronenoptisches Abbildungssystem zur Erzielung eines kleinen Elektronenflecks
BE428489A (xx) * 1937-06-08
FR1172405A (fr) * 1956-02-20 1959-02-10 Thomson Houston Comp Francaise Perfectionnements aux canons électroniques
US3076121A (en) * 1959-03-20 1963-01-29 Sylvania Electric Prod Cathode ray tube system
US3049641A (en) * 1959-05-08 1962-08-14 Gen Electric High transconductance cathode ray tube
BE630810A (xx) * 1962-04-13
US3295001A (en) * 1963-06-04 1966-12-27 Sylvania Electric Prod Cathode ray tube gun having a second grid with an effective thickness
FR1477372A (fr) * 1965-04-26 1967-04-14 Sony Corp Canons à électrons pour engendrer et concentrer un faisceau électronique

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3437868A (en) * 1965-10-11 1969-04-08 Sony Corp Electron gun device
US3501668A (en) * 1968-05-10 1970-03-17 Zenith Radio Corp Low focus voltage electron gun for cathode-ray tubes
US3651359A (en) * 1969-04-23 1972-03-21 Sony Corp Abberation correction of plurality of beams in color cathode ray tube

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4276495A (en) * 1977-06-15 1981-06-30 Hitachi, Ltd. Electron gun for cathode-ray tube
DE2850656A1 (de) * 1977-11-22 1979-05-23 Tokyo Shibaura Electric Co Elektronenstrahlrohr fuer kathodenstrahlroehren
US4246511A (en) * 1977-12-09 1981-01-20 Mitsubishi Denki Kabushiki Kaisha Electron gun
DE3013044A1 (de) * 1979-04-10 1980-10-16 Tokyo Shibaura Electric Co Fernsehbildroehre mit einem elektronenstrahlsystem, das nichtkreisfoermige oeffnungen hat
US4558253A (en) * 1983-04-18 1985-12-10 Rca Corporation Color picture tube having an inline electron gun with asymmetric focusing lens
US4528476A (en) * 1983-10-24 1985-07-09 Rca Corporation Cathode-ray tube having electron gun with three focus lenses
US5317161A (en) * 1991-05-24 1994-05-31 Ims Ionen Mikrofabrikations Systeme Gesellschaft M.B.H. Ion source

Also Published As

Publication number Publication date
JPS5743972B1 (xx) 1982-09-18
DE2205162A1 (de) 1972-08-10
DE2205162C2 (de) 1983-08-18
FR2170876B1 (xx) 1975-10-24
GB1377091A (en) 1974-12-11
FR2170876A1 (xx) 1973-09-21

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