US3728180A - Powderless etching bath compositions - Google Patents

Powderless etching bath compositions Download PDF

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Publication number
US3728180A
US3728180A US00239384A US3728180DA US3728180A US 3728180 A US3728180 A US 3728180A US 00239384 A US00239384 A US 00239384A US 3728180D A US3728180D A US 3728180DA US 3728180 A US3728180 A US 3728180A
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United States
Prior art keywords
etching
acid
acids
bath
water
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US00239384A
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English (en)
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B Johnsen
H Messerschmidt
K Heyman
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Mona Industries Inc
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Mona Industries Inc
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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F1/00—Etching metallic material by chemical means
    • C23F1/10—Etching compositions
    • C23F1/14—Aqueous compositions
    • C23F1/16—Acidic compositions

Definitions

  • etching baths also containing nitric acid and water, gives good etching performance, particularly decreased lateral etching and better side wall protection of the resist.
  • This invention relates to powderless etching and is more specifically concerned with improved additive compositions, both anhydrous and water based, for use in po wderless etching baths.
  • the invention relates to etching baths as such, particularly for chemically dimensioning photoengraving plates, and with a method of etching such plates, especially magnesiumbased plates.
  • a flat or cylindrical plate of an acid-soluble metal such as magnesium, zinc or one of their alloys is coated with a light sensitive coating or enamel.
  • This coated surface is exposed to light through a negative having an image thereon so as to produce an image on the coating.
  • the exposed coated surface is then developed to form an acid-resistant coating corresponding to the image produced by exposure.
  • This coating may be further hardened by heating and the final acidresistant image is called the resist.
  • the image bearing surface of the plate is subjected to etching by an acid to remove the metal which is not under the resist and thus to produce the image in relief.
  • Powderless etching is now a well-known, widely practiced technique. It is used to etch photoengraving plates and other similar shaped articles. Zinc, magnesium and alloys based thereon are generally used as the photoengraving plate metals.
  • aqueous nitric acid etching baths are modified by the incorporation therein of aliphatic acids, or esters of aliphatic acids with polyhydric aliphatic alcohols, or sulfonates of succinic acid diesters.
  • etching baths One characteristic of these etching baths is their tendency to permit localized defilming on relief side walls. This results in a chipped surface which, in aggravated situations, causes poor printing plates. Another problem stems from the inability of these same baths to quickly form a protective film in the initial stage of etching that will protect the resist from lateral etching beneath it. Further, as the etching action of the acid penetrates to greater depths, there is a problem of preventing lateral etching of relief side walls. Another problem of great importance is the capacity of the etching bath to produce proper depths of etch in all areas of a combination plate, i.e., a plate having both line and half tone image areas.
  • the most commonly commercially used surfactant in the powderless etching art is a material which is usually referred tom the trade as sulfonated castor oil. This is a commercially available material which is chemically mis-named.
  • the material referred to is actually a sulfated castor-oil, mainly the sulfate ester of ricinoleic acid (that is, the hydroxyl group of ricinoleie acid is esterified with sulfuric acid to add a sulfate group thereon).
  • surfactants which have been recommended in the patent literature in combination with the water-immiscible organic liquid are sulfosuccinates, petroleum sulfonates, alkylaryl sulfonates, sulfated alcohols, sulfated fats and oils other than sulfated castor oil, phosphates, esters, polyether non-ionic surfactants, and alkylaryl ether sulfonates.
  • Other objects of this invention are to provide a novel etching bath capable of producing desired depths of etch in all kinds of image areas of combination plates, to provide an etching bath capable of forming a stable protective film to prevent or retard lateral etching and chipping of relief side walls and a smooth, uniform side wall permitting easy release from a matrix, besides having visual appeal.
  • a still further object of this invention is to provide an improved etching bath particularly for magnesium-based plates for producing photoengraving plates, name plates, metal patterns, templates and the like.
  • an additive composition comprising (a) From about to 95 percent by weight of at least one water-soluble or water dispersible anionic aliphatic sulfonated carboxylic acid containing at least one hydrophobic hydrocarbon group of from 8 to 24 carbon atoms attached to the carboxyl group and at least one sulfonate group attached to a carbon atom in said hydrophobic hydrocarbon group and (b) From about 5 to 95 percent by weight of at least one saturated or olefinically unsaturated mono-carboxylic acid of from 8 to 24 carbon atoms.
  • component (a) alone While substantial advantages are secured by the use of component (a) alone, the resulting etching bath has been found not entirely satisfactory.
  • Use of both components (a) and (b) according to the instant invention improves the etching characteristics, gives better side wall protection during the etching process and decreases lateral etching, compared to use of component (a) alone.
  • the instant invention provides etching bath compositions comprising components (a) and (b) and, additionally, water and a mineral acid.
  • component (a) is preferably contained in amounts of from 0.5 to 10, most preferably from 2 to 6, grams per liter of final bath.
  • component (b) is preferably contained in amounts of from 0.5 to 10, most preferably from 2 to 8, grams per liter of final bath.
  • the mineral acid of an etching bath is generally nitric acid, although mixtures of nitric acid and small quantities of sulfuric, hydrochloric or acetic acids can be beneficial. Suitable amounts of mineral acid range from about 30 to 300 grams per liter of bath with a preferred range from about 70 to 250 grams per liter of bath.
  • the mineral acid component of the powderless etching bath of this invention is per se known.
  • the sulfonated carboxylic acids used as component (a) in this invention are true sulfonates as distinguished from the so called sulfonated oils like sulfonated castor oil which products are actually sulfates or esters of sulfuric acid.
  • the true sulfonates of this invention differ from the sulfates by the fact that, in the sulfonate, sulfur is directly linked to a carbon atom rather than through an intermediary oxygen atom as in the sulfate.
  • Saturated and unsaturated fatty acids which have substituents on their hydrocarbon chains can also be sulfonated to add a sulfonate substituent bonded to a carbon atom thereof.
  • esters, amides and nitriles, chlorides and/or anhydrides of these fatty acids can be sulfonated with ease, and the sulfonation products thus produced are applicable in this invention provided there is a sulfurcarbon bond and provided they hydrolyze in an aqueous acid etching bath into the corresponding sulfonated carboxylic acids.
  • the sulfonated acids of this invention can be based on pure fatty acids or can be mixtures of fatty acids and/or esters or other derivates thereof such as occur naturally in vegetable, animal or marine oils, fats and waxes or in synthetic fatty acids derived from petroleum, bituminous coal and natural gas. Where mixtures of sulfonated fatty acids are to be used, sulfonation of the fatty acids can be accomplished before and after mixing.
  • sulfonation of fatty carboxylic acids is a well established procedure and can be accomplished by different means as the occasion demands.
  • Saturated fatty acids can be sulfonated directly in the alpha-position by reaction thereof with chlor-sulfonic acid or sulfur trioxide, which may be dissolved in sulphur dioxide, dioxane or chlorinated hydrocarbons.
  • Alpha-sulfonations can also be accomplished less directly by the Strecker reaction of an alpha-bromo fatty acid with sodium sulfite.
  • Monoand polyunsaturated fatty acids having hydrocarbon chains in the range of 8 to 24 carbon atoms can be sulfonated with sulfur trioxide dissolved in sulfur dioxide to yield truly sulfonated carboxylic acids e.g., oleic acid yields predominantly 8-, 9-, 10-, or ll-sulfooleic and 9-hydroxy-10-sulfostearic acids when reacted with a stoichiometric amount of sulfur trioxide (see US. Patent 2,743,288 to Rueggeberg et al.). As taught in the Rueggeberg et a1.
  • the sulfo group attaching to the fatty acid may attach on one or more different positions; thus, in the case of the sulfo-oleic acid produced according to Rueggeberg et al., the reaction product appears to be a mixture of predominantly 8-, 9-, 10-, or ll-sulfo-oleic acid (as well as some 9-hydroxy-l0- sulfostearic acid).
  • the term ll-sulfo-oleic acid is sometimes used; in using this term we intend to refer to the mixed product obtained by following the teachings of the art.
  • Truly sulfonated ricinoleic acid can also be obtained by sulfonation with acetyl sulfonic acid, which is itself obtained by reacting sulfur trioxide with glacial acetic acid or acetic anhydride.
  • the mono-carboxylic acids used as component (b) in this invention may be straight-chain, linear, or branchedchain and preferably contain from 8 to 18 carbon atoms.
  • said acids Preferably, said acids have melting points below 50 C. and, most preferably, they are liquids at room temperature.
  • the mono-carboxylic acids which may be used are both saturated acids and unsaturated acids such as caprylic, capric, lauric, myristic, palmitic, stearic, isostearic, behenic, lignoceric acids, undecylenic, oleic, linoleic, linolenic, eleostearic, arachidonic acids and the like.
  • the acids operative as component (b) are generally the same as those used, in sulfonated form, as component (a).
  • saturated and unsaturated fatty acids which have substituents on their hydrocarbon chains can also be used.
  • Examples of such acids are ricinoleic, 9,10-dihydroxystearic, 10-chloroor 9,10-dichlorostearic acids, beta-phenylpropionic, 10-phenylundecanoic and 9,10-dibenzylstearic acids.
  • saturated acids isostearic, caprylic and capric acids are particularly preferred, based on their melting point, ease of handling, outstanding performance in etching compositions; and, of the unsaturated acids, oleic and linoleic (one olefinic double bond) and linolenic (two double bonds) are preferred.
  • operative acids may include one or more sub'stituents which do not essentially alter the lipophilicity of the acid molecule; thus, halogenated mono-carboxylic acids, such as bromo-, chloro-, or fluoro-substituted acids, may be employed.
  • sulfonated acid (a) relative to the amount of mono-carboxylic acid (b) to be used, within the ranges set forth above, for optimum results is readily determinable by the skilled artisan, it has been found that, when using the shorter alkyl chain monocarboxylic acids, less Sulfonated acid (a) is required than when using the longer, e.g., 18 carbon atom and over, monocarboxylic acids. Generally, however, the total amount of monocarboxylic acid (which may be a mixture of acids) will be from, e.g., 0.5 to times, by weight, the amount of sulfonated acid used.
  • This ratio, and the total amount of components (a) and (b) used in the bath, will depend also on other factors, e.g., the amount of nitric acid employed. We have found that, most preferably from about 1 to 2 grams of 'sulfonated acid, and about 3 to 4 grams of monocarboxylic acid, are employed per liter of final etching bath.
  • additive compositions which are one aspect of this invention, i.e., those compositions not containing the mineral acid and water used in the final etching bath, they may desirably contain, in addition to the components (a) and (b) set forth above, a neutralizing agent such as a basic amine, e.g., diethanol amine, monoisopropanol amine and the ethylene glycol amines, for the purpose of neutralizing the acidic components included within (a) and (b) above.
  • a neutralizing agent such as a basic amine, e.g., diethanol amine, monoisopropanol amine and the ethylene glycol amines
  • additive compositions contemplated herein are combined with water, and, as a neutralizing agent, appropriate amounts of an alkali metal hydroxide such as potassium hydroxide.
  • an alkali metal hydroxide such as potassium hydroxide.
  • Such additive compositions can be transported per se as articles of commerce and constitute an embodiment of this invention different from the ultimate etching bath compositions which also contain a mineral etching acid, e.g., nitric acid, which is a separate composition claimed herein.
  • foam suppressants such as Triton CF 21 may desirably be added
  • certain mineral oils may be added as cleansing agents but care must be taken ,that any water immiscible organic liquid be added only in amounts of less than two grams per liter of final bath because use of greater amounts deleteriously effects etching performance when using the compositions of the instant invention.
  • so-called water-immiscible organic liquids are desirably only added at concentration ranges at which such liquid is in fact miscible, i.e., at very low concentrations. When used in such'very small amounts it has been found that the liquid in question, e.g., white mineral oil, actually mixes with the final bath and thus can no longer be regarded as a water immiscible" organic liquid.
  • the resultant etching bath is suitable for use with no waterimmiscible organic liquid required in the composition which liquids are called for in certain prior art compost tions. Although very small amounts of such liquid may be added, e.g., up to about 2 grams per liter of the final bath, use of greater amounts deleteriously affects etching performance.
  • etching baths having the following composition:
  • nitric acid needs to be supplied per part, by weight, of components (a)+(b), if one operates at preferred bath temperatures, e.g., to 110 F.
  • Weight ratios of 30 to parts of nitric acid per part of (a)+(b) are desirably maintained.
  • etching with the baths of the present invention it has been found to be desirable to impinge the bath against the surface to be etched, as by splashing.
  • the etching bath forms a partially acid-resistant film on the resist-free metal surfaces, and when the bath is impinged against the surface to be etched in a direction normal to that surface, the film is broken.
  • the film is generally not broken because of insufficient striking force and etching of the sides (or under-cutting) is substantially reduced.
  • the bubble-etch machine described in the latter group of three US. patents comprises a manifold having multiple orifices in the manifold pipes immersed in the etching bath wherein compressed air is forced through the manifold to produce bubbles which then rise upwards through the etching bath into which the plate to be etched is immersed and rotated.
  • Other types of etching machines known to the art are also applicable.
  • etch factor ratio is defined as the ratio of (1) the depth of the etch adjacent to a line of resist divided by one-half of the loss in width of metal immediately beneath the resist using a particular additive to (2) the depth of the etch adjacent to a line of resist divided by one half of the loss in width of metal immediately beneath the resist when only nitric acid is used in the exact concentration as was used with the particular additive:
  • EXAMPLE I good with little lateral etching or side wall erosion being observed.
  • the etch factor ratio (EFR) was about 20.
  • Example II was repeated but 16% by weight of nitric acid was used. The results were comparable to those obtained in Example I.
  • Example III Example I was repeated but using 0.15% by weight of caprylic acid, rather than oleic acid.
  • the etched magnesium plates had comparable good quality and an EFR of about 20.
  • Example III was repeated with the nitric acid concentration raised to 16% by weight. The results were comparable to those obtained in Example III.
  • Example I was repeated but using 14% by weight of nitric acid, 0.2% by weight of ll-sulfo-oleic acid, and 0.25% by weight of linoleic acid. The results were as in Example I.
  • Example I was repeated but using 22 percent by weight of nitric acid, 0.2 percent by weight of ll-sulfo-oleic acid, and 0.6 percent by weight of isostearic acid. The results were as in Example I.
  • compositions of the instant invention while providing outstanding etching performance, do not pose any pollution hazard contrary to certain conventional compositions.
  • our compositions are biodegradable as demonstrated in actual tests in which samples containing the components of this invention were tested according to standard techniques [Standard Methods for the Examination of Water and Waste Water, 13th edition (1971), published by the American Public Health Association; tests conducted by the Bridgeport Testing Laboratory, Inc.] and it was found that such compositions were 91% biodegradable after 30 days of being in the test water.
  • Etching bath for powderless etching of printing plates of magnesium, zinc or alloys thereof comprising water and from 30 to 300 grams of nitric acid, and
  • Etching bath as claimed in claim 1 comprising water, from 30 to 300 grams of nitric acid, from 2 to 6 grams per liter of sulfo-oleic acid, from 2 to 8 grams per liter of a saturated mono-carboxylic acid of from 8 to 18 carbon atoms, per liter of bath, and wherein the total amount of mono-carboxylic acids is from 0.5 to 10 times by weight the amount of sulfo-oleic acid.
  • Etching bath as claimed in claim 1 consisting essentially of water, nitric acid, sulfo-oleic acid and isostearic acid.
  • Etching bath as claimed in claim 1 consisting essentially of water, nitric acid, sulfo-oleic acid and caprylic acid.
  • Etching bath as claimed in claim 1 consisting essentially of water, nitric acid, sulfo-oleic acid and a mixture of isostearic and caprylic acids.
  • component (a) is the reaction product obtained when sulfonating oleic acid with sulfur trioxide in such a manner that a carbon-to-sulfur bond is obtained in at least one of the reaction products.
  • Etching bath as claimed in claim 1 also containing up to 2 grams per liter of a water-immiscible organic liquid.
  • Etching bath as claimed in claim 1 wherein about 30 to parts by weight of nitric acid are present per part of [(a) plus (b)].
  • Method of etching a plate of magnesium, zinc, or alloys thereof which comprises bringing the plate into etching contact with an etching bath as claimed in claim 1.

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  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • ing And Chemical Polishing (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Detergent Compositions (AREA)
US00239384A 1972-03-29 1972-03-29 Powderless etching bath compositions Expired - Lifetime US3728180A (en)

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US (1) US3728180A (OSRAM)
JP (1) JPS4914329A (OSRAM)
AU (1) AU447099B2 (OSRAM)
BE (1) BE795344A (OSRAM)
CA (1) CA977251A (OSRAM)
DE (1) DE2306508A1 (OSRAM)
FR (1) FR2182845B2 (OSRAM)
GB (1) GB1397375A (OSRAM)
IT (1) IT977288B (OSRAM)
NL (1) NL7302826A (OSRAM)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4855198A (en) * 1986-08-21 1989-08-08 The Dow Chemical Company Photoengraving articles of zinc-free magnesium-based alloys
CN102839376A (zh) * 2012-09-29 2012-12-26 营口银河镁铝合金有限公司 镁或镁合金蚀刻添加剂的制备及应用

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB928165A (en) * 1959-06-12 1963-06-06 Dow Chemical Co Etching process and improved etching bath

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4855198A (en) * 1986-08-21 1989-08-08 The Dow Chemical Company Photoengraving articles of zinc-free magnesium-based alloys
CN102839376A (zh) * 2012-09-29 2012-12-26 营口银河镁铝合金有限公司 镁或镁合金蚀刻添加剂的制备及应用

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Publication number Publication date
NL7302826A (OSRAM) 1973-10-02
JPS4914329A (OSRAM) 1974-02-07
FR2182845A2 (OSRAM) 1973-12-14
DE2306508A1 (de) 1973-10-18
GB1397375A (en) 1975-06-11
BE795344A (fr) 1973-05-29
FR2182845B2 (OSRAM) 1975-10-31
AU5201573A (en) 1974-04-11
CA977251A (en) 1975-11-04
IT977288B (it) 1974-09-10
AU447099B2 (en) 1974-04-11

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