US3668083A - Process of electroplating rhenium and bath for this process - Google Patents
Process of electroplating rhenium and bath for this process Download PDFInfo
- Publication number
- US3668083A US3668083A US84505A US3668083DA US3668083A US 3668083 A US3668083 A US 3668083A US 84505 A US84505 A US 84505A US 3668083D A US3668083D A US 3668083DA US 3668083 A US3668083 A US 3668083A
- Authority
- US
- United States
- Prior art keywords
- bath
- rhenium
- group
- addition
- sulfuric
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 229910052702 rhenium Inorganic materials 0.000 title claims abstract description 25
- WUAPFZMCVAUBPE-UHFFFAOYSA-N rhenium atom Chemical compound [Re] WUAPFZMCVAUBPE-UHFFFAOYSA-N 0.000 title claims abstract description 25
- 238000000034 method Methods 0.000 title claims abstract description 22
- 238000009713 electroplating Methods 0.000 title claims abstract description 14
- CSNNHWWHGAXBCP-UHFFFAOYSA-L Magnesium sulfate Chemical compound [Mg+2].[O-][S+2]([O-])([O-])[O-] CSNNHWWHGAXBCP-UHFFFAOYSA-L 0.000 claims abstract description 28
- 150000002500 ions Chemical class 0.000 claims abstract description 21
- 150000003839 salts Chemical class 0.000 claims abstract description 17
- 229910052943 magnesium sulfate Inorganic materials 0.000 claims abstract description 14
- 235000019341 magnesium sulphate Nutrition 0.000 claims abstract description 14
- YZVJHCGMTYDKFR-UHFFFAOYSA-L magnesium;disulfamate Chemical compound [Mg+2].NS([O-])(=O)=O.NS([O-])(=O)=O YZVJHCGMTYDKFR-UHFFFAOYSA-L 0.000 claims abstract description 9
- 229910045601 alloy Inorganic materials 0.000 claims abstract description 7
- 239000000956 alloy Substances 0.000 claims abstract description 7
- DIZPMCHEQGEION-UHFFFAOYSA-H aluminium sulfate (anhydrous) Chemical compound [Al+3].[Al+3].[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O DIZPMCHEQGEION-UHFFFAOYSA-H 0.000 claims abstract description 7
- NLXYLZCLIHHPMA-UHFFFAOYSA-K aluminum;trisulfamate Chemical compound [Al+3].NS([O-])(=O)=O.NS([O-])(=O)=O.NS([O-])(=O)=O NLXYLZCLIHHPMA-UHFFFAOYSA-K 0.000 claims abstract description 7
- 229910052751 metal Inorganic materials 0.000 claims description 11
- 239000002184 metal Substances 0.000 claims description 11
- QAOWNCQODCNURD-UHFFFAOYSA-N sulfuric acid group Chemical group S(O)(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 claims description 9
- VLTRZXGMWDSKGL-UHFFFAOYSA-N perchloric acid Chemical class OCl(=O)(=O)=O VLTRZXGMWDSKGL-UHFFFAOYSA-N 0.000 claims description 7
- 239000002253 acid Substances 0.000 claims description 6
- IIACRCGMVDHOTQ-UHFFFAOYSA-N sulfamic acid group Chemical class S(N)(O)(=O)=O IIACRCGMVDHOTQ-UHFFFAOYSA-N 0.000 claims description 5
- 229910052783 alkali metal Inorganic materials 0.000 claims description 4
- 150000001340 alkali metals Chemical class 0.000 claims description 4
- 150000003863 ammonium salts Chemical class 0.000 claims description 4
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 11
- 238000007747 plating Methods 0.000 description 7
- 229910052759 nickel Inorganic materials 0.000 description 6
- VLTRZXGMWDSKGL-UHFFFAOYSA-M perchlorate Chemical compound [O-]Cl(=O)(=O)=O VLTRZXGMWDSKGL-UHFFFAOYSA-M 0.000 description 4
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 3
- 238000000151 deposition Methods 0.000 description 3
- 229910052700 potassium Inorganic materials 0.000 description 3
- 239000011591 potassium Substances 0.000 description 3
- IIACRCGMVDHOTQ-UHFFFAOYSA-M sulfamate Chemical compound NS([O-])(=O)=O IIACRCGMVDHOTQ-UHFFFAOYSA-M 0.000 description 3
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- JLVVSXFLKOJNIY-UHFFFAOYSA-N Magnesium ion Chemical compound [Mg+2] JLVVSXFLKOJNIY-UHFFFAOYSA-N 0.000 description 2
- 229910000990 Ni alloy Inorganic materials 0.000 description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 2
- 230000001464 adherent effect Effects 0.000 description 2
- BFNBIHQBYMNNAN-UHFFFAOYSA-N ammonium sulfate Chemical compound N.N.OS(O)(=O)=O BFNBIHQBYMNNAN-UHFFFAOYSA-N 0.000 description 2
- 229910052921 ammonium sulfate Inorganic materials 0.000 description 2
- 235000011130 ammonium sulphate Nutrition 0.000 description 2
- 238000011109 contamination Methods 0.000 description 2
- 230000008021 deposition Effects 0.000 description 2
- 238000004070 electrodeposition Methods 0.000 description 2
- 238000009472 formulation Methods 0.000 description 2
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 2
- 229910052737 gold Inorganic materials 0.000 description 2
- 239000010931 gold Substances 0.000 description 2
- 229910001425 magnesium ion Inorganic materials 0.000 description 2
- 159000000003 magnesium salts Chemical class 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- UJRJCSCBZXLGKF-UHFFFAOYSA-N nickel rhenium Chemical compound [Ni].[Re] UJRJCSCBZXLGKF-UHFFFAOYSA-N 0.000 description 2
- BVKZGUZCCUSVTD-UHFFFAOYSA-L Carbonate Chemical compound [O-]C([O-])=O BVKZGUZCCUSVTD-UHFFFAOYSA-L 0.000 description 1
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 1
- QAOWNCQODCNURD-UHFFFAOYSA-L Sulfate Chemical compound [O-]S([O-])(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-L 0.000 description 1
- LZCDAPDGXCYOEH-UHFFFAOYSA-N adapalene Chemical compound C1=C(C(O)=O)C=CC2=CC(C3=CC=C(C(=C3)C34CC5CC(CC(C5)C3)C4)OC)=CC=C21 LZCDAPDGXCYOEH-UHFFFAOYSA-N 0.000 description 1
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 1
- 150000001450 anions Chemical class 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 150000001805 chlorine compounds Chemical class 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 229910017052 cobalt Inorganic materials 0.000 description 1
- 239000010941 cobalt Substances 0.000 description 1
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 1
- 229910000361 cobalt sulfate Inorganic materials 0.000 description 1
- 229940044175 cobalt sulfate Drugs 0.000 description 1
- KTVIXTQDYHMGHF-UHFFFAOYSA-L cobalt(2+) sulfate Chemical compound [Co+2].[O-]S([O-])(=O)=O KTVIXTQDYHMGHF-UHFFFAOYSA-L 0.000 description 1
- 230000001627 detrimental effect Effects 0.000 description 1
- 229940002658 differin Drugs 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 229910052738 indium Inorganic materials 0.000 description 1
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 description 1
- 229910052749 magnesium Inorganic materials 0.000 description 1
- 239000011777 magnesium Substances 0.000 description 1
- 239000001095 magnesium carbonate Substances 0.000 description 1
- 229910000021 magnesium carbonate Inorganic materials 0.000 description 1
- 239000000395 magnesium oxide Substances 0.000 description 1
- CPLXHLVBOLITMK-UHFFFAOYSA-N magnesium oxide Inorganic materials [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 description 1
- AXZKOIWUVFPNLO-UHFFFAOYSA-N magnesium;oxygen(2-) Chemical compound [O-2].[Mg+2] AXZKOIWUVFPNLO-UHFFFAOYSA-N 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 150000001455 metallic ions Chemical class 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- LGQLOGILCSXPEA-UHFFFAOYSA-L nickel sulfate Chemical compound [Ni+2].[O-]S([O-])(=O)=O LGQLOGILCSXPEA-UHFFFAOYSA-L 0.000 description 1
- 229910000363 nickel(II) sulfate Inorganic materials 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 238000002310 reflectometry Methods 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/54—Electroplating: Baths therefor from solutions of metals not provided for in groups C25D3/04 - C25D3/50
Definitions
- ABSTRACT Primary Examiner-G. L. Kaplan Attorney-Greene & Durr [57] ABSTRACT
- the invention relates to a bath for electrodepositing low-stress rhenium and its alloys of the perrhenate type and is characterized by the addition of ions which make up one or more of the following salts: magnesium sulfate, magnesium sulfamate, aluminum sulfate and aluminum sulfamate.
- the invention also relates to the process of electroplating from said bath.
- the present invention relates to a method for the electrodeposition of rhenium and to a bath for carrying out this method.
- Rhenium has manyinteresting properties. Its melting point is 3,] 80 C., its oxide is conductive and this metal is very hard and has a high density as well as good'reflectivity. These properties suggest its use under suitable high temperature conditions, for switching devices, as a protecting material against radiations and as a thennal shield. Rhenium has been plated for more than thirty years. However, the baths described in the literature give in general brittle'deposits, many cannot be used for heavy deposits and have efficiencies of under percent.
- the object of the present invention is to provide a method and an electrolytic bath for the deposition of rhenium to heavy thicknesses at a good efficiency.
- A- second object of the invention is to permit the deposition of the rhenium in a lowstressed ductile condition.
- The'method is characterized by the fact that one uses a bath containing rhenium as the perrhenate ion and a salt selected from the group comprising magnesium sulfate, magnesium sulfamate, aluminum sulfate and aluminum sulfamate.
- the bath according to the invention is characterized by the fact that it contains rhenium as the perrhenate ion and a-salt selected from the group comprising magnesium sulfate, magnesium sulfamate, aluminum sulfate and aluminum sulfamate.
- the deposits are adherent, smooth and fully bright. Satisfactory deposits have been obtained on many basis metals. Where the high acidity attacks the basis metal, it should be plated first with nickel. In order to prevent contamination of the bath, the use of a gold strike, prior to the rhenium plating step, has been found helpful.
- a typical bath in grams per liter, is the following:
- Potassium Pcrrhenate KReO. 10 g/l Sulfuric acid (H 800 30 ml/l Magnesium sulfate (MgSO -7H O) 25 gll CONDITIONS.
- EXAMPLE 2 The substitution of 25 gll of magnesium sulfamate for the magnesium sulfate in the typical bath described above yielded deposits which appear to be even less stressed on the basis of a qualitative test, so it appears that the magnesium ion is the effective agent, but that the anion also has an effect. The deposits were bright and adherent to the nickel basis metal provided with a gold-strike.
- the amount of rhenium added as the perrhenate ion is not limited to 10 gll as' 'given in the example. This may be varied from 2 g/l to 50 g/l. For cost reasons, the concentration of rhenium is usually from 10 to l5 gll.
- the amount of magnesium salt required is not critical in that it can be varied over a wide range. However, it appears that the lower limit at which the salt is effective is about 5 g/l and that quantities above 50 g/l do not produce any improvement. However, the scope of the invention is not limited to the higher value mentioned, because amounts of magnesium salt up to saturation can be used.
- Examples 1 and 2 indicate the simplest formulation, i.e., a solution containing the perrhenate ion and; magnesium sulfate with the pH lowered to l or 2 with sulfuric and sulfamic acids respectively. The amount of acid is conveniently 2 to 25 g/l,
- nickel coating itself should be goldflashed .tominimize the contamination of the bath by nickel impurities. Of course, when plating rhenium-nickel alloys, this is not necessary.
- Rhenium (as potassium perrhenate) Deposits obtainedfrom the above bath at 60 C. and at Amp/dm were bright and ductile.
- the plating rate was 2.78 mg/Ampere-minute while the rate '-for the standard bath, containing neither the perchlorate nor the magnesium sulfate, is of the 1.2 mg/Ampere-minute.
- Adding the magnesium sulfate only, but notthe perchlorate as in Example 3 increased the rate of 1.5 mg/Ampere-minute. The addition of the perchlorate improved this rate by more than 80 percent,
- Example 7 To the bath described in Example 5 were added 20 g/l of nickel sulfate. The deposit was bright and rather ductile, differin'g in color from that of Example 5, indicating the formation of a rhenium-nickel alloy. The plating conditions were the same as for Example 5.
- An aqueous electroplating bath for the electrodeposition of low-stress deposits of rheniumand its alloys comprising from 2 to grams of rhenium as the perrhenate ion per liter of bath, and the ions from at least one salt selected from the group consisting magnesium sulfamate, aluminum sulfate, and aluminum sulfamate, the concentration of said salt ranging from about 5 grams per liter of bath up to its saturation concentration, said bath being maintained at a pH of less than 10.
- aqueous electroplating bath of claim 1 comprising in addition at least one conducting salt selected from the group consisting of alkali metal and ammonium salts of sulfuric, sulfamic and perchloric acids.
- aqueous electroplating bath of claim 1 comprising in addition free acid selected from the group consisting of perchloric, sulfuric and sulfamic acids.
- the aqueous electroplating bath of claim 1 comprising, in addition to the perrhenate ions, ions of an electrodepositable metal, added as a soluble salt of the metal. 5. The aqueous electroplating bath of claim 1 wherein the bath is maintained at a pH of l to 2. 1
- a method of electrodepositing rhenium and its alloys which comprises electrolyzing, at a current density of 2 to 30 amp/dm measured at the cathode, an aqueous bath comprising from 2 to 50 grams of rhenium as the perrhenate ion per liter of bath and at least one salt selected from the group consisting of magnesium sulfate, magnesium sulfamate, aluminum sulfate and aluminum sulfamate, the concentration of said salt ranging from about 5 grams per liter of bath up to its saturation concentration, said bath being maintained at a pH of less than 10.
- said bath contains at least one conducting salt selected from the group consisting of alkali metal and ammonium salts of sulfuric, sulfamic and perchloric acids.
- said bath contains, in addition to the perrhenate ion, at least one ion of a metal which is codeposited with the rhenium.
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Electroplating And Plating Baths Therefor (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CH947067A CH467340A (fr) | 1967-07-03 | 1967-07-03 | Procédé de placage électrolytique de rhénium et bain pour la mise en oeuvre de ce procédé |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| US3668083A true US3668083A (en) | 1972-06-06 |
Family
ID=4352326
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| US84505A Expired - Lifetime US3668083A (en) | 1967-07-03 | 1970-10-27 | Process of electroplating rhenium and bath for this process |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US3668083A (enExample) |
| CH (1) | CH467340A (enExample) |
| DE (2) | DE1771734A1 (enExample) |
| FR (1) | FR1573421A (enExample) |
| GB (1) | GB1222562A (enExample) |
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20010026877A1 (en) * | 2000-03-07 | 2001-10-04 | Ebara Corporation | Alloy coating, method for forming the same, and member for high temperature apparatuses |
| WO2003062501A1 (fr) * | 2002-01-18 | 2003-07-31 | Japan Science And Technology Agency | Procede pour former un film de revetement en alliage de re ayant une teneur elevee en re par electroplacage |
| WO2003062502A1 (en) * | 2002-01-18 | 2003-07-31 | Japan Science And Technology Agency | METHOD FOR FORMING Re-Cr ALLOY COATING FILM THROUGH ELECTROPLATING USING Cr(IV)-CONTAINING BATH |
| WO2003062500A1 (fr) * | 2002-01-18 | 2003-07-31 | Japan Science And Technology Agency | Procede pour former un film de revetement en alliage de re ou de re-cr par electroplacage |
| CN101899693A (zh) * | 2010-07-30 | 2010-12-01 | 安徽华东光电技术研究所 | 一种在无氧铜基体上局部镀铼的方法 |
| EP2610371A1 (en) | 2011-12-27 | 2013-07-03 | Instytut Metali Niezelaznych | Method of preparing rhenium - nickel alloys |
| US8863720B2 (en) | 2011-10-31 | 2014-10-21 | Federal-Mogul Corporation | Coated piston and a method of making a coated piston |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5942066B2 (ja) * | 1975-10-24 | 1984-10-12 | 日本電気株式会社 | レニウム−コバルト合金接点 |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3260658A (en) * | 1962-10-31 | 1966-07-12 | Philip E Churchward | Process for the recovery of rhenium |
-
0
- DE DENDAT1771763 patent/DE1771763A1/de active Pending
-
1967
- 1967-07-03 CH CH947067A patent/CH467340A/fr unknown
-
1968
- 1968-06-20 GB GB29529/68A patent/GB1222562A/en not_active Expired
- 1968-07-01 FR FR1573421D patent/FR1573421A/fr not_active Expired
- 1968-07-02 DE DE19681771734 patent/DE1771734A1/de active Pending
-
1970
- 1970-10-27 US US84505A patent/US3668083A/en not_active Expired - Lifetime
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3260658A (en) * | 1962-10-31 | 1966-07-12 | Philip E Churchward | Process for the recovery of rhenium |
Non-Patent Citations (1)
| Title |
|---|
| Eldridge K. Camp, Plating, pp. 413 416, May 1965. * |
Cited By (16)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP1132499A3 (en) * | 2000-03-07 | 2004-02-25 | Ebara Corporation | Alloy coating, method for forming the same, and member for high temperature apparatuses |
| US20010026877A1 (en) * | 2000-03-07 | 2001-10-04 | Ebara Corporation | Alloy coating, method for forming the same, and member for high temperature apparatuses |
| US6899926B2 (en) | 2000-03-07 | 2005-05-31 | Ebara Corporation | Alloy coating, method for forming the same, and member for high temperature apparatuses |
| US20050079089A1 (en) * | 2000-03-07 | 2005-04-14 | Ebara Corporation | Alloy coating, method for forming the same, and member for high temperature apparatuses |
| US20050167282A1 (en) * | 2002-01-18 | 2005-08-04 | Toshio Narita | Method for forming Re-Cr alloy film through electroplating process using bath containing Cr(VI) |
| WO2003062500A1 (fr) * | 2002-01-18 | 2003-07-31 | Japan Science And Technology Agency | Procede pour former un film de revetement en alliage de re ou de re-cr par electroplacage |
| WO2003062502A1 (en) * | 2002-01-18 | 2003-07-31 | Japan Science And Technology Agency | METHOD FOR FORMING Re-Cr ALLOY COATING FILM THROUGH ELECTROPLATING USING Cr(IV)-CONTAINING BATH |
| US20050126922A1 (en) * | 2002-01-18 | 2005-06-16 | Toshio Narita | Method for forming re coating film or re-cr alloy coating film through electroplating |
| WO2003062501A1 (fr) * | 2002-01-18 | 2003-07-31 | Japan Science And Technology Agency | Procede pour former un film de revetement en alliage de re ayant une teneur elevee en re par electroplacage |
| US20050189230A1 (en) * | 2002-01-18 | 2005-09-01 | Toshio Narita | Method for forming re alloy coating film having high re content through electroplating |
| US6979392B2 (en) | 2002-01-18 | 2005-12-27 | Japan Science And Technology Agency | Method for forming Re—Cr alloy film or Re-based film through electroplating process |
| US6998035B2 (en) | 2002-01-18 | 2006-02-14 | Japan Science And Technology Agency | Method for forming Re-Cr alloy film through electroplating process using bath containing Cr(VI) |
| US7368048B2 (en) | 2002-01-18 | 2008-05-06 | Japan Science And Technology Agency | Method for forming Re alloy coating film having high-Re-content through electroplating |
| CN101899693A (zh) * | 2010-07-30 | 2010-12-01 | 安徽华东光电技术研究所 | 一种在无氧铜基体上局部镀铼的方法 |
| US8863720B2 (en) | 2011-10-31 | 2014-10-21 | Federal-Mogul Corporation | Coated piston and a method of making a coated piston |
| EP2610371A1 (en) | 2011-12-27 | 2013-07-03 | Instytut Metali Niezelaznych | Method of preparing rhenium - nickel alloys |
Also Published As
| Publication number | Publication date |
|---|---|
| DE1771763A1 (enExample) | |
| FR1573421A (enExample) | 1969-07-04 |
| GB1222562A (en) | 1971-02-17 |
| CH467340A (fr) | 1969-01-15 |
| DE1771734A1 (de) | 1972-01-13 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| AS | Assignment |
Owner name: HOOKER CHEMICALS & PLASTICS CORP. Free format text: MERGER;ASSIGNOR:OXY METAL INDUSTRIES CORPORATION;REEL/FRAME:004075/0885 Effective date: 19801222 |
|
| AS | Assignment |
Owner name: OCCIDENTAL CHEMICAL CORPORATION Free format text: CHANGE OF NAME;ASSIGNOR:HOOKER CHEMICAS & PLASTICS CORP.;REEL/FRAME:004126/0054 Effective date: 19820330 |
|
| AS | Assignment |
Owner name: OMI INTERNATIONAL CORPORATION, 21441 HOOVER ROAD, Free format text: ASSIGNMENT OF ASSIGNORS INTEREST.;ASSIGNOR:OCCIDENTAL CHEMICAL CORPORATION;REEL/FRAME:004190/0827 Effective date: 19830915 |
|
| AS | Assignment |
Owner name: MANUFACTURERS HANOVER TRUST COMPANY, A CORP OF NY Free format text: SECURITY INTEREST;ASSIGNOR:INTERNATIONAL CORPORATION, A CORP OF DE;REEL/FRAME:004201/0733 Effective date: 19830930 |