US3649355A - Process for production of rotary anodes for roentgen tubes - Google Patents

Process for production of rotary anodes for roentgen tubes Download PDF

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Publication number
US3649355A
US3649355A US849444A US3649355DA US3649355A US 3649355 A US3649355 A US 3649355A US 849444 A US849444 A US 849444A US 3649355D A US3649355D A US 3649355DA US 3649355 A US3649355 A US 3649355A
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tungsten
spraying
depositing
alloy
metal
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Expired - Lifetime
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US849444A
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English (en)
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Walter Hennig
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Schwarzkopf Technologies Corp
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SCHWARZOPF DEV CORP
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Assigned to SCHWARZKOPF TECHNOLOGIES CORPORATION, A CORP. OF MD reassignment SCHWARZKOPF TECHNOLOGIES CORPORATION, A CORP. OF MD CHANGE OF NAME (SEE DOCUMENT FOR DETAILS). EFFECTIVE ON 05/21/1991 Assignors: SCHWARZKOPF DEVELOPMENT CORPORATION, A CORP. OF MD
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    • C—CHEMISTRY; METALLURGY
    • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B41/00—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
    • C04B41/009—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone characterised by the material treated
    • C—CHEMISTRY; METALLURGY
    • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B41/00—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
    • C04B41/45—Coating or impregnating, e.g. injection in masonry, partial coating of green or fired ceramics, organic coating compositions for adhering together two concrete elements
    • C04B41/50—Coating or impregnating, e.g. injection in masonry, partial coating of green or fired ceramics, organic coating compositions for adhering together two concrete elements with inorganic materials
    • C04B41/51—Metallising, e.g. infiltration of sintered ceramic preforms with molten metal
    • C04B41/5133—Metallising, e.g. infiltration of sintered ceramic preforms with molten metal with a composition mainly composed of one or more of the refractory metals
    • C—CHEMISTRY; METALLURGY
    • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B41/00—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
    • C04B41/80—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone of only ceramics
    • C04B41/81—Coating or impregnation
    • C04B41/85—Coating or impregnation with inorganic materials
    • C04B41/88—Metals
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J35/00—X-ray tubes
    • H01J35/02—Details
    • H01J35/04—Electrodes ; Mutual position thereof; Constructional adaptations therefor
    • H01J35/08—Anodes; Anti cathodes
    • H01J35/10—Rotary anodes; Arrangements for rotating anodes; Cooling rotary anodes
    • H01J35/108—Substrates for and bonding of emissive target, e.g. composite structures
    • C—CHEMISTRY; METALLURGY
    • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B2111/00—Mortars, concrete or artificial stone or mixtures to prepare them, characterised by specific function, property or use
    • C04B2111/00474—Uses not provided for elsewhere in C04B2111/00
    • C04B2111/00844—Uses not provided for elsewhere in C04B2111/00 for electronic applications
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2235/00—X-ray tubes
    • H01J2235/08—Targets (anodes) and X-ray converters
    • H01J2235/083—Bonding or fixing with the support or substrate
    • H01J2235/084—Target-substrate interlayers or structures, e.g. to control or prevent diffusion or improve adhesion

Definitions

  • ABSTRACT A process is described for imparting resistance to rotary Ausma "7861/68 anodes for X-ray tubes by spraying a graphite base with lungsten or a tungsten alloy, followed by depositing an outer coat- [52] 11.5. C1 ..ll7/2l7, 117/227, 117/228, ing oftungsten or an alloy thereoffmm the gaswus pham ll7/93.1PF,l17/107.2 R, 313/311, 313/330 [51] Int. Cl.
  • This invention relates to X-ray or Roentgen tubes and more particularly, to a process for imparting resistance to rotary anodes for X-ray tubes.
  • rotary anodes for X-ray tubes which generally consist of a base member made of graphite to which a layer of tungsten, molybdenum, thorium or tantalum metal has been applied.
  • Rotary anodes of the kind described above are highly desirable because of their extraordinarily high load capacity derived, to a great extent, from the graphite base member.
  • the layer on to which the electrons are emitted consists of tungsten or a tungsten alloy
  • a brittle interlayer of tungsten carbide forms between the tungsten or tungsten alloy layer and the graphite substrate.
  • the aforesaid brittle interlayer is a distinct disadvantage since it jeopardizes the connection between the covering layer and the graphite substrate.
  • this invention discloses and claims a process for imparting resistance to rotary anodes for X-ray tubes which comprises the steps of:
  • an outer covering layer comprising a metal selected from the group consisting of tungsten and tungsten alloys wherein said deposition is from a gaseous phase.
  • the first step i.e., spraying step, comprises the formation of a uniform coating on the graphite substrate at the site where electron impact will take place.
  • spraying step comprises the formation of a uniform coating on the graphite substrate at the site where electron impact will take place.
  • a plasma gun in the spray application of the uniform coating layer. In this manner, the individual tungsten particles which are heated to high temperatures upon striking the graphite substrate, are cooled very rapidly so that there is little chance of reaction with the substrate to form a brittle tungsten carbide phase.
  • This uniform coating layer applied by a spray technique can consist of substantially pure tungsten or it can be an alloy of tungsten with from about 1.0 to 35 percent by weight of rhenium, osmium, iridium or other metals having high melting points or mixtures thereof as an alloying ingredient.
  • the resulting surface is not suitable as a coating layer for a tungsten rotary anode. This is due to the high porosity of such a surface layer.
  • This second step is a deposition step wherein an outer covering layer is deposited on the uniform coating applied by the spraying technique.
  • This outer covering layer can be substantially pure tungsten or an alloy of tungsten with from about 1.0 to 35 percent by weight of rhenium, osmium, iridium or other metals having high melting points, or mixtures thereof as alloying ingredient.
  • the depositing of tungsten or a tungsten alloy is accomplished from a gaseous phase which contains the aforesaid tungsten or tungsten alloy.
  • Deposition from the gaseous state is effected in one of two ways: direct vapor deposition under vacuum or precipitation of gaseous compounds.
  • the direct vapor deposition method is carried out under low pressures whereby the gaseous tungsten or tungsten alloy sublimates forming an outer covering layer on the sprayer coating layer.
  • the second or precipitation method is another highly desirable means of forming an outer covering layer. It consists of precipitating tungsten or a tungsten alloy from the gaseous state present therein as a compound salt, such as tungsten hexafluoride or tungsten hexachloride or mixtures thereof, in a hydrogen atmosphere. Generally, high temperatures, for example 550 C., accompany the precipitation step. Of course, in a similar manner, tungsten alloys can be deposited by utilizing the appropriate metal salts.
  • tungstenrhenium alloy is to comprise the outer covering layer
  • a gaseous phase consisting of tungsten hexafluoride and rhenium hexafluoride in predetermined amounts admixed with hydrogen gas.
  • thermal decomposition takes place and a tungsten-rhenium alloy precipitates.
  • the body or substrate of the rotating anode is made of graphite in whatever shape and dimensions are necessary for the particular application.
  • the tungsten or tungsten alloy intermediate coating layer need not be very thick. A thickness of about 1 millimeter is preferred; however, a range of thickness of from 0.1 mm. to about 5.0 mm is applicable.
  • the outer layer is even less thick and is preferably about 0.2 mm, however, a suitable range is from 0.02 mm. to about 2.0 mm.
  • This product is illustrated by the accompanying drawing which shows a cross section of a rotating anode having a disc shaped body 1 made of graphite on which a sprayed tungsten coating layer 2 is superimposed with an outer covering layer 3 of tungsten.
  • Layer 2 consists of substantially pure tungsten and is about 1 mm. thick. It was applied by means of a plasma gun. Over this layer, there is another layer 3 comprised of tungsten having a thickness of about 0.2 mm. It was applied by precipitating a gaseous mixture of hydrogen and tungsten hexafluoride in proportions of 10:1 at a temperature of about 550 C.
  • the outer covering layer can be a tungstenrhenium alloy which is deposited from a gaseous mixture of rhenium hexafluoride, tungsten hexafluoride and hydrogen.
  • the outer covering layer 3 consisting of columnar crystals, is practically non-porous and is highly resistant to impinging electrons.
  • a process for imparting resistance to rotary anodes for X- ray tubes which comprises the steps of:
  • an outer covering layer comprising a metal selected from the group consisting of tungsten and tungsten alloys wherein said deposition is from a gaseous phase.
  • tungsten alloy utilized in the spraying and depositing steps is selected from the group consisting of tungsten-rhenium, tungsten-osmium and tungsten-iridium alloys,
  • the metal utilized in said depositing step is tungsten which is precipitated by thermally decomposing a mixture comprising hydrogen and a tungsten salt selected from the group consisting of tungsten hexafluoride and tungsten hexachloride.

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Ceramic Engineering (AREA)
  • Materials Engineering (AREA)
  • Structural Engineering (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Coating By Spraying Or Casting (AREA)
  • Physical Vapour Deposition (AREA)
US849444A 1968-08-12 1969-08-12 Process for production of rotary anodes for roentgen tubes Expired - Lifetime US3649355A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
AT786168A AT278983B (de) 1968-08-12 1968-08-12 Verfahren zur Herstellung von Drehanoden für Röntgenröhren

Publications (1)

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US3649355A true US3649355A (en) 1972-03-14

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US849444A Expired - Lifetime US3649355A (en) 1968-08-12 1969-08-12 Process for production of rotary anodes for roentgen tubes

Country Status (6)

Country Link
US (1) US3649355A (enrdf_load_stackoverflow)
AT (1) AT278983B (enrdf_load_stackoverflow)
DE (1) DE1930095A1 (enrdf_load_stackoverflow)
FR (1) FR2015491A1 (enrdf_load_stackoverflow)
GB (1) GB1207648A (enrdf_load_stackoverflow)
NL (1) NL6912203A (enrdf_load_stackoverflow)

Cited By (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3887723A (en) * 1972-03-22 1975-06-03 Richard B Kaplan Method of fabrication of composite anode for rotating-anode x-ray tubes
US3890521A (en) * 1971-12-31 1975-06-17 Thomson Csf X-ray tube target and X-ray tubes utilising such a target
US3969131A (en) * 1972-07-24 1976-07-13 Westinghouse Electric Corporation Coated graphite members and process for producing the same
US4029828A (en) * 1975-06-23 1977-06-14 Schwarzkopf Development Corporation X-ray target
US4119879A (en) * 1977-04-18 1978-10-10 General Electric Company Graphite disc assembly for a rotating x-ray anode tube
DE2816120A1 (de) * 1977-04-18 1978-10-26 Gen Electric Verfahren zum verbinden eines wolfram enthaltenden anodentargets mit einem graphit-substrat
US4145632A (en) * 1977-04-18 1979-03-20 General Electric Company Composite substrate for rotating x-ray anode tube
US4168449A (en) * 1976-10-29 1979-09-18 Tokyo Shibaura Electric Co., Ltd. Rotary anode for X-ray tube and a method for manufacturing the same
US4195247A (en) * 1978-07-24 1980-03-25 General Electric Company X-ray target with substrate of molybdenum alloy
US4227112A (en) * 1978-11-20 1980-10-07 The Machlett Laboratories, Inc. Gradated target for X-ray tubes
US4279709A (en) * 1979-05-08 1981-07-21 The Dow Chemical Company Preparation of porous electrodes
US4331902A (en) * 1972-12-07 1982-05-25 U.S. Philips Corporation Laminated rotary anode for X-ray tube
USRE31560E (en) * 1977-04-18 1984-04-17 General Electric Company Graphite disc assembly for a rotating x-ray anode tube
USRE31568E (en) * 1977-04-18 1984-04-24 General Electric Company Composite substrate for rotating x-ray anode tube
US4871703A (en) * 1983-05-31 1989-10-03 The Dow Chemical Company Process for preparation of an electrocatalyst
US5204891A (en) * 1991-10-30 1993-04-20 General Electric Company Focal track structures for X-ray anodes and method of preparation thereof
US6554179B2 (en) 2001-07-06 2003-04-29 General Atomics Reaction brazing of tungsten or molybdenum body to carbonaceous support
US20050226387A1 (en) * 2004-04-08 2005-10-13 General Electric Company Apparatus and method for light weight high performance target
AT413160B (de) * 1999-11-22 2005-11-15 Gen Electric Verfahren zum herstellen einer röntgenröhrenanode
US20070207338A1 (en) * 2006-03-01 2007-09-06 Plasma Processes, Inc. X-ray target and method for manufacturing same
US20090060139A1 (en) * 2007-08-28 2009-03-05 Subraya Madhusudhana T Tungsten coated x-ray tube frame and anode assembly
US9159523B2 (en) 2007-08-28 2015-10-13 General Electric Company Tungsten oxide coated X-ray tube frame and anode assembly

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2251656C3 (de) * 1972-10-20 1979-04-19 Siemens Ag, 1000 Berlin Und 8000 Muenchen Verfahren zur Herstellung einer Röntgenröhren-Drehanode
FR2606037B1 (fr) * 1986-11-04 1989-02-03 Total Petroles Revetement metallique realise sur un substrat mineral
DE59703543D1 (de) * 1996-12-24 2001-06-21 Sulzer Metco Ag Wohlen Verfahren zum Beschichten von Kohlenstoffsubstraten oder nichtmetallischen, kohlenstoffhaltigen Substraten sowie Substrat beschichtet nach dem Verfahren
EP4386807A1 (de) * 2022-12-13 2024-06-19 Plansee SE Röntgendrehanode mit zwei unterschiedlichen kornstrukturen im brennbahnbelag
AT18281U1 (de) * 2023-06-15 2024-08-15 Plansee Se Verbundkörper

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3085317A (en) * 1959-12-31 1963-04-16 Union Carbide Corp Coated graphite bodies
US3157531A (en) * 1960-01-21 1964-11-17 Ethyl Corp Process for the manufacture of carbonaceous solid bodies

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3085317A (en) * 1959-12-31 1963-04-16 Union Carbide Corp Coated graphite bodies
US3157531A (en) * 1960-01-21 1964-11-17 Ethyl Corp Process for the manufacture of carbonaceous solid bodies

Cited By (25)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3890521A (en) * 1971-12-31 1975-06-17 Thomson Csf X-ray tube target and X-ray tubes utilising such a target
US3887723A (en) * 1972-03-22 1975-06-03 Richard B Kaplan Method of fabrication of composite anode for rotating-anode x-ray tubes
US3969131A (en) * 1972-07-24 1976-07-13 Westinghouse Electric Corporation Coated graphite members and process for producing the same
US4331902A (en) * 1972-12-07 1982-05-25 U.S. Philips Corporation Laminated rotary anode for X-ray tube
US4029828A (en) * 1975-06-23 1977-06-14 Schwarzkopf Development Corporation X-ray target
US4168449A (en) * 1976-10-29 1979-09-18 Tokyo Shibaura Electric Co., Ltd. Rotary anode for X-ray tube and a method for manufacturing the same
USRE31560E (en) * 1977-04-18 1984-04-17 General Electric Company Graphite disc assembly for a rotating x-ray anode tube
US4145632A (en) * 1977-04-18 1979-03-20 General Electric Company Composite substrate for rotating x-ray anode tube
DE2816120A1 (de) * 1977-04-18 1978-10-26 Gen Electric Verfahren zum verbinden eines wolfram enthaltenden anodentargets mit einem graphit-substrat
US4119879A (en) * 1977-04-18 1978-10-10 General Electric Company Graphite disc assembly for a rotating x-ray anode tube
USRE31568E (en) * 1977-04-18 1984-04-24 General Electric Company Composite substrate for rotating x-ray anode tube
US4195247A (en) * 1978-07-24 1980-03-25 General Electric Company X-ray target with substrate of molybdenum alloy
US4227112A (en) * 1978-11-20 1980-10-07 The Machlett Laboratories, Inc. Gradated target for X-ray tubes
US4279709A (en) * 1979-05-08 1981-07-21 The Dow Chemical Company Preparation of porous electrodes
US4871703A (en) * 1983-05-31 1989-10-03 The Dow Chemical Company Process for preparation of an electrocatalyst
US5204891A (en) * 1991-10-30 1993-04-20 General Electric Company Focal track structures for X-ray anodes and method of preparation thereof
AT413160B (de) * 1999-11-22 2005-11-15 Gen Electric Verfahren zum herstellen einer röntgenröhrenanode
US6554179B2 (en) 2001-07-06 2003-04-29 General Atomics Reaction brazing of tungsten or molybdenum body to carbonaceous support
US20050226387A1 (en) * 2004-04-08 2005-10-13 General Electric Company Apparatus and method for light weight high performance target
US20060151578A1 (en) * 2004-04-08 2006-07-13 Tiearney Thomas C Jr Method for making a light weight high performance target
US7194066B2 (en) 2004-04-08 2007-03-20 General Electric Company Apparatus and method for light weight high performance target
US7505565B2 (en) 2004-04-08 2009-03-17 General Electric Co. Method for making a light weight high performance target
US20070207338A1 (en) * 2006-03-01 2007-09-06 Plasma Processes, Inc. X-ray target and method for manufacturing same
US20090060139A1 (en) * 2007-08-28 2009-03-05 Subraya Madhusudhana T Tungsten coated x-ray tube frame and anode assembly
US9159523B2 (en) 2007-08-28 2015-10-13 General Electric Company Tungsten oxide coated X-ray tube frame and anode assembly

Also Published As

Publication number Publication date
NL6912203A (enrdf_load_stackoverflow) 1970-02-16
FR2015491A1 (enrdf_load_stackoverflow) 1970-04-30
GB1207648A (en) 1970-10-07
AT278983B (de) 1970-02-25
DE1930095A1 (de) 1970-02-19

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AS Assignment

Owner name: SCHWARZKOPF TECHNOLOGIES CORPORATION, A CORP. OF M

Free format text: CHANGE OF NAME;ASSIGNOR:SCHWARZKOPF DEVELOPMENT CORPORATION, A CORP. OF MD;REEL/FRAME:005931/0448

Effective date: 19910517