US3615531A - Antistatic layers containing polymers of sulfo-substituted n-phenyl maleic imides - Google Patents
Antistatic layers containing polymers of sulfo-substituted n-phenyl maleic imides Download PDFInfo
- Publication number
- US3615531A US3615531A US881599A US3615531DA US3615531A US 3615531 A US3615531 A US 3615531A US 881599 A US881599 A US 881599A US 3615531D A US3615531D A US 3615531DA US 3615531 A US3615531 A US 3615531A
- Authority
- US
- United States
- Prior art keywords
- polymer
- sulfo
- antistatic
- substituted
- parts
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 229920000642 polymer Polymers 0.000 title claims abstract description 41
- 150000003949 imides Chemical class 0.000 title abstract description 8
- 239000000463 material Substances 0.000 claims abstract description 19
- 229920001577 copolymer Polymers 0.000 claims description 14
- -1 sulfosubstituted styrene Chemical group 0.000 claims description 10
- HIDBROSJWZYGSZ-UHFFFAOYSA-N 1-phenylpyrrole-2,5-dione Chemical class O=C1C=CC(=O)N1C1=CC=CC=C1 HIDBROSJWZYGSZ-UHFFFAOYSA-N 0.000 claims description 6
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Natural products C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 claims description 6
- VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical group C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 claims description 3
- 239000005977 Ethylene Chemical group 0.000 claims description 3
- VQTUBCCKSQIDNK-UHFFFAOYSA-N Isobutene Chemical group CC(C)=C VQTUBCCKSQIDNK-UHFFFAOYSA-N 0.000 claims description 3
- 125000003011 styrenyl group Chemical group [H]\C(*)=C(/[H])C1=C([H])C([H])=C([H])C([H])=C1[H] 0.000 claims description 2
- 239000010410 layer Substances 0.000 description 33
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 21
- 239000000243 solution Substances 0.000 description 16
- 238000005266 casting Methods 0.000 description 9
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 8
- 239000001828 Gelatine Substances 0.000 description 7
- 229920000159 gelatin Polymers 0.000 description 7
- 235000019322 gelatine Nutrition 0.000 description 7
- 239000011241 protective layer Substances 0.000 description 7
- 150000001875 compounds Chemical class 0.000 description 6
- 239000000839 emulsion Substances 0.000 description 6
- 230000000694 effects Effects 0.000 description 4
- 238000005259 measurement Methods 0.000 description 4
- 239000011541 reaction mixture Substances 0.000 description 4
- GBWNQBBVSVGAAL-UHFFFAOYSA-N 5-aminobenzene-1,3-disulfonic acid Chemical compound NC1=CC(S(O)(=O)=O)=CC(S(O)(=O)=O)=C1 GBWNQBBVSVGAAL-UHFFFAOYSA-N 0.000 description 3
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 description 3
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 3
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical class [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 3
- 239000002216 antistatic agent Substances 0.000 description 3
- 125000004432 carbon atom Chemical group C* 0.000 description 3
- 238000006243 chemical reaction Methods 0.000 description 3
- 238000002360 preparation method Methods 0.000 description 3
- 239000001397 quillaja saponaria molina bark Substances 0.000 description 3
- 229930182490 saponin Natural products 0.000 description 3
- 150000007949 saponins Chemical class 0.000 description 3
- 238000003756 stirring Methods 0.000 description 3
- 125000000020 sulfo group Chemical group O=S(=O)([*])O[H] 0.000 description 3
- HVBSAKJJOYLTQU-UHFFFAOYSA-N 4-aminobenzenesulfonic acid Chemical compound NC1=CC=C(S(O)(=O)=O)C=C1 HVBSAKJJOYLTQU-UHFFFAOYSA-N 0.000 description 2
- PAYRUJLWNCNPSJ-UHFFFAOYSA-N Aniline Chemical compound NC1=CC=CC=C1 PAYRUJLWNCNPSJ-UHFFFAOYSA-N 0.000 description 2
- LSNNMFCWUKXFEE-UHFFFAOYSA-M Bisulfite Chemical compound OS([O-])=O LSNNMFCWUKXFEE-UHFFFAOYSA-M 0.000 description 2
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 2
- RRHGJUQNOFWUDK-UHFFFAOYSA-N Isoprene Chemical compound CC(=C)C=C RRHGJUQNOFWUDK-UHFFFAOYSA-N 0.000 description 2
- PEEHTFAAVSWFBL-UHFFFAOYSA-N Maleimide Chemical group O=C1NC(=O)C=C1 PEEHTFAAVSWFBL-UHFFFAOYSA-N 0.000 description 2
- 239000004372 Polyvinyl alcohol Substances 0.000 description 2
- 239000000654 additive Substances 0.000 description 2
- 230000000996 additive effect Effects 0.000 description 2
- 238000004378 air conditioning Methods 0.000 description 2
- 125000001931 aliphatic group Chemical group 0.000 description 2
- 229910052783 alkali metal Inorganic materials 0.000 description 2
- 239000012736 aqueous medium Substances 0.000 description 2
- 239000007864 aqueous solution Substances 0.000 description 2
- 125000003118 aryl group Chemical group 0.000 description 2
- 229920002301 cellulose acetate Polymers 0.000 description 2
- 239000000084 colloidal system Substances 0.000 description 2
- 238000001035 drying Methods 0.000 description 2
- 238000006358 imidation reaction Methods 0.000 description 2
- KWGKDLIKAYFUFQ-UHFFFAOYSA-M lithium chloride Chemical compound [Li+].[Cl-] KWGKDLIKAYFUFQ-UHFFFAOYSA-M 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 239000000178 monomer Substances 0.000 description 2
- 229920002451 polyvinyl alcohol Polymers 0.000 description 2
- SCVFZCLFOSHCOH-UHFFFAOYSA-M potassium acetate Chemical compound [K+].CC([O-])=O SCVFZCLFOSHCOH-UHFFFAOYSA-M 0.000 description 2
- 238000012545 processing Methods 0.000 description 2
- 230000001681 protective effect Effects 0.000 description 2
- 229910052709 silver Inorganic materials 0.000 description 2
- 239000004332 silver Substances 0.000 description 2
- ZUNKMNLKJXRCDM-UHFFFAOYSA-N silver bromoiodide Chemical compound [Ag].IBr ZUNKMNLKJXRCDM-UHFFFAOYSA-N 0.000 description 2
- 159000000000 sodium salts Chemical class 0.000 description 2
- 230000003068 static effect Effects 0.000 description 2
- 150000003440 styrenes Chemical class 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- OZCMOJQQLBXBKI-UHFFFAOYSA-N 1-ethenoxy-2-methylpropane Chemical compound CC(C)COC=C OZCMOJQQLBXBKI-UHFFFAOYSA-N 0.000 description 1
- PYSRRFNXTXNWCD-UHFFFAOYSA-N 3-(2-phenylethenyl)furan-2,5-dione Chemical compound O=C1OC(=O)C(C=CC=2C=CC=CC=2)=C1 PYSRRFNXTXNWCD-UHFFFAOYSA-N 0.000 description 1
- IMROMDMJAWUWLK-UHFFFAOYSA-N Ethenol Chemical compound OC=C IMROMDMJAWUWLK-UHFFFAOYSA-N 0.000 description 1
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 1
- 229920002396 Polyurea Polymers 0.000 description 1
- OFOBLEOULBTSOW-UHFFFAOYSA-N Propanedioic acid Natural products OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 1
- 229910021607 Silver chloride Inorganic materials 0.000 description 1
- 229920000147 Styrene maleic anhydride Polymers 0.000 description 1
- XTXRWKRVRITETP-UHFFFAOYSA-N Vinyl acetate Chemical compound CC(=O)OC=C XTXRWKRVRITETP-UHFFFAOYSA-N 0.000 description 1
- QYKIQEUNHZKYBP-UHFFFAOYSA-N Vinyl ether Chemical class C=COC=C QYKIQEUNHZKYBP-UHFFFAOYSA-N 0.000 description 1
- 238000009825 accumulation Methods 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 150000007933 aliphatic carboxylic acids Chemical class 0.000 description 1
- 150000007824 aliphatic compounds Chemical class 0.000 description 1
- 239000011230 binding agent Substances 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 150000001735 carboxylic acids Chemical class 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 230000001143 conditioned effect Effects 0.000 description 1
- 239000002482 conductive additive Substances 0.000 description 1
- 238000007334 copolymerization reaction Methods 0.000 description 1
- 238000012937 correction Methods 0.000 description 1
- 239000012153 distilled water Substances 0.000 description 1
- 230000005686 electrostatic field Effects 0.000 description 1
- 230000008030 elimination Effects 0.000 description 1
- 238000003379 elimination reaction Methods 0.000 description 1
- MEGHWIAOTJPCHQ-UHFFFAOYSA-N ethenyl butanoate Chemical compound CCCC(=O)OC=C MEGHWIAOTJPCHQ-UHFFFAOYSA-N 0.000 description 1
- UIWXSTHGICQLQT-UHFFFAOYSA-N ethenyl propanoate Chemical compound CCC(=O)OC=C UIWXSTHGICQLQT-UHFFFAOYSA-N 0.000 description 1
- 230000002209 hydrophobic effect Effects 0.000 description 1
- 125000005462 imide group Chemical group 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- 230000001788 irregular Effects 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical compound OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 description 1
- 239000011976 maleic acid Substances 0.000 description 1
- FPYJFEHAWHCUMM-UHFFFAOYSA-N maleic anhydride Chemical group O=C1OC(=O)C=C1 FPYJFEHAWHCUMM-UHFFFAOYSA-N 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000006224 matting agent Substances 0.000 description 1
- 239000012457 nonaqueous media Substances 0.000 description 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- 229920000172 poly(styrenesulfonic acid) Polymers 0.000 description 1
- 229940005642 polystyrene sulfonic acid Drugs 0.000 description 1
- 235000011056 potassium acetate Nutrition 0.000 description 1
- 159000000001 potassium salts Chemical class 0.000 description 1
- 150000003839 salts Chemical group 0.000 description 1
- 238000007127 saponification reaction Methods 0.000 description 1
- HKZLPVFGJNLROG-UHFFFAOYSA-M silver monochloride Chemical compound [Cl-].[Ag+] HKZLPVFGJNLROG-UHFFFAOYSA-M 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- 229950000244 sulfanilic acid Drugs 0.000 description 1
- 150000003460 sulfonic acids Chemical class 0.000 description 1
- 239000002344 surface layer Substances 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 1
- 229920001567 vinyl ester resin Polymers 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
- 239000000080 wetting agent Substances 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
- G03C1/00—Photosensitive materials
- G03C1/76—Photosensitive materials characterised by the base or auxiliary layers
- G03C1/85—Photosensitive materials characterised by the base or auxiliary layers characterised by antistatic additives or coatings
- G03C1/89—Macromolecular substances therefor
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F8/00—Chemical modification by after-treatment
- C08F8/48—Isomerisation; Cyclisation
Definitions
- the present invention relates to photographic materials which have improved antistatic protective layers.
- the electrostatic charge on the surfaces of films can be reduced by adding matting agents to the protective layers so as to reduce the adhesion between two films when they are in contact. Once a charge has accumulated, it can be removed by means of electrically conductive additives which are applied to the surface of the film so as to increase the electrical conductivity of the film. Many substances which are effective for this purpose, however, are not photographically inert with the result that the photographic properties of the film are impaired.
- quaternary salts usually cannot be used in photographic materials because they cause fogging.
- Hygroscopic substances such as glycerol, potassium acetate or LiCl cause sticking of the layers and are ineffective when the humidity is low.
- carboxylic or sulfonic acids such as the sodium salt of polystyrene sulfonic acid and the sodium salt of polyvinyl sulfonic acid are applied directly to a hydrophobic layer support, they show a good antistatic effect but this effect is greatly reduced when the compounds are used in gelatine and are, therefore, only of limited utility.
- antistatic agents which are photographically inert and which can be used either alone or in admixture with gelatine.
- photographic material having at least one silver halide emulsion layer and a topmost antistatic layer which contains as an antistatic agent, a polymer of olefinically unsaturated monomers having a molecular weight of at least 15,000, the polymer containing at least 40 mol. percent of sulfo-substituted Nphenyl maleic imides in polymerized form.
- Copolymers which consist of between 40 to 60 mole percent of units of sulfo-substituted N-phenyl maleic imides are preferred.
- Polymers which have a molecular weight of between 50,000 and 500,000 are particularly useful.
- polymerizable olefinically unsaturated aliphatic compounds which have up to 5 carbon atoms, e.g., ethylene, propylene, butylene or isoprene
- vinyl alcohol vinyl esters with aliphatic carboxylic acids which have up to 5 carbon atoms, e.g., vinyl acetate, vinyl propionate or vinyl butyrate, and vinyl ethers in which the ether component is aliphatic and contains up to 5 carbon atoms, e.g., vinyl isobutyl ether
- styrene or substituted styrenes e.g., styrenes which contain sulfo groups.
- Copolymers of ethylene, isobutylene andlor styrene with sulfo-substituted N-phenyl maleic imides are particularly advantageous
- the sulfo groups are generally present in neutralized form as alkali metal salts in particular as sodium or potassium salts.
- the excellent properties of the antistatic layers according to the invention are due to the sulfo substituted N-phenyl maleic imide units.
- the aromatic character of the imide group is particularly important for this purpose.
- Copolymers which contain an aliphatic group instead of the phenyl ring in a corresponding position are much inferior to N-phenyl maleic imide copolymers in their antistatic effect in their suitability for photographic layers.
- the polymers to be used according to the invention also have an excellent ability to form films. They are eminently compatible with other binders and are photographically unreactive so that the light-sensitive layers are in no way adversely affected.
- the compounds to be used according to the invention are obtainable by employing various methods of the prior art, particularly by reaction maleic acid anhydride copolymers with suitable aromatic amino sulfonic acids or their alkali metal salts in aqueous or nonaqueous media at temperatures above 120 C., the maleic acid imide ring being formed with elimination of water.
- the polymers can also be obtained by sulfonating copolymers of N-phenyl maleic imide which can be obtained either by the copolymerization of N-phenyl maleic imide or subsequent to the reaction of maleic anhydride copolymers with aniline in a reaction involving imidation.
- Polymer I 600 parts of NaOH and 4,500 parts of the monopotassium salt of aniline-3,5-disulfonic acid are dissolved in 17,000 parts H O.
- 3,000 parts of a maleic anhydride styrene copolymer which has an approximately alternating structure and which has an n value of 0.56 (molecular weight approximately l00,000) determined in dimethyl formamide at 25 C. are then added and the reaction mixture is heated in an autoclave at 175 C. for 10 hours, a clear solution of polymer 1 being ob tained.
- Polymer 11 The procedure is the same as for polymer 1 but a maleic anhydride styrene copolymer which has an n value of 1.5 (molecular weight approximately 2,500,000) and which has an approximately alternating structure is used.
- Polymer III 300 parts of the monopotassium salt of aniline-3,5disulfonic acid and 40 parts of NaOH are dissolved in 900 parts of water, and to this are added 130 parts of an ethylene maleic anhydride copolymer of value 0.91 (molecular weight approximately 50,000) which has an alternating structure. The reaction mixture is then heated at 170 C. for 10 hours and a clear solution of polymer 111 is obtained.
- Polymer IV 300 parts of the monopotassium salt of aniline-3,5-disulfonic acid and 40 parts of NaOH are dissolved in 1,500 parts of water. 152 parts of an isobutylene maleic anhydride copolymer of 11 value 0.7 (molecular weight approximately 65,000) which has an approximately alternating structure are then added and the reaction mixture is heated at 175 C. for 10 hours, a clear solution of polymer 1V being obtained. Polymer V 10 parts of anhydrous liquid S are dissolved in 300 parts by volume of anhydrous $0 at -60 C.'20.2 parts of styrene maleic anhydride copolymer of alternating structure are then introduced with vigorous stirring. Stirring is continued for 8 hours at about 50 C.
- the polymers to be used according to the invention are preferably completely imidized ln principle, however, the corresponding polymers which still contain a small amount of maleic acid or maleic anhydride units or the half-amide are also suitable.
- the polymers are worked up in the form of aqueous solutions with a polymer content of up to percent by weight, preferably 2 to 4 percent, to yield layers which have a thickness when dry of 1.5 to 2pm.
- the conductivity depends on the thickness of the layer. Sufficient conductivity is ensured with the thickness mentioned above.
- the above-mentioned compounds have layer forming properties and dry to form a clear, transparent layer. They can be used alone or with the addition of water permeable protective colloids such as gelatine.
- the amount of protective colloids may be up to 50 percent of the quantity of antistatic agent but is preferably not layers according to the invention as auxiliary'agents. Smooth layers with an excellent antistatic action are obtained in this way.
- the layers according to the invention are arranged in the usual manner, with protective layers uppermost on the other layers and can be used for black-white and color photographic materials.
- these antistatic layers could be arranged in any position, both on the front side and on the rear side of the support.
- the antistatic action is tested after two days air-conditioning of the sample strip.
- the test is carried out with a rotating electrostatic field strength measuring instrument of the type FM 300-NR l by Prof. Dr. lng. F. Schwenckhagen (manufacturers: Bergischer Feingeratebau, Wuppertal).
- the concentration of charge at 60 percent relative atmospheric humidity was measured.
- the surface resistance is determined in a measuring instrument of Firma Lindenblatt, Elektrotechnik und Elektronik, Berlin-Halensee.
- the instrument has two comb electrodes 10 cm. in length which are situated parallel to each other at a distance of 2 cm. apart. When the samples have been sufficiently air-conditioned they are pressed at a constant pressure against these electrodes. The resistances are read off a Terraohmeter connected to the instrument.
- EXAMPLE 1 A silver iodobrom'ide gelatine emulsion layer on a cellulose acetate support is coated with a protective layer about 1.5 to 2 pin thickness.
- the casting solution for this protective layer has the following composition: 1 liter of water. 20 g. of a maleic imide polymer (see following table) and 10 ml. of 7.5 percent aqueous solution of saponin as wetting agent.
- the pH of the casting solution is adjusted to 6.5 with sodium hydroxide solution.
- the casting solution can be sprayed or applied by any of the usual casting processes at 20 C.
- a prior art antistatic compound a polyurea sulfonic acid) containing units of the following formula S'O;Ns
- the photographic material containing the layers according to the invention does not flash on processing whereas the comparison material can only be processed at high atmospheric moistures. The photographic properties are not affected.
- EXAMPLE 2 Thirty grams of compound I are dissolved in 1,000 ml. of cold distilled water with stirring, using a paddle stirrer. The pH is adjusted to between 6.0 to 7.0 with l N sodium hydroxide solution. This antistatic casting solution is applied to a silver chloride emulsion layer after the addition of 24 ml. of 7.5 percent aqueous saponin solution. The layer thickness is 0.5, 1.0 or 2.0
- These antistatic layers do not only substantially reduce the surface resistance but also prevent the films from sticking.
- EXAMPLE 4 A silver iodobromide gelatine emulsion layer on a cellulose acetate support is coated with a protective layer of about 1.5 to 2 p. in thickness.
- the casting solution for this protective layer has the following composition: 1 liter of water, 18 g. of polymer l, 2 g. of polyvinyl alcohol and 10 ml. of 7.5 percent saponin.
- the pH of the casting solution is adjusted 6.5 with sodium hydroxide solution.
- a photographic material for use in photographic films said material including a support, at least one silver halide emulsion layer on the support, an outer layer on the emulsion layer, the outer layer containing a polymer of olefinically unsaturated monomers having a molecular weight of at least 15,000 and containing at least 40 mol percent of a sulfo-substituted N-phenyl maleic imide in polymerized form.
- copolymer contains not more than 60 mol percent of units of styrene, sulfosubstituted styrene, ethylene or isobutylene.
- a photographic material according to claim 1 characterized in that the polymer contains 40 to 60 mol percent of units of a sulfosubstituted N-phenyl maleic imide.
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- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Health & Medical Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- General Physics & Mathematics (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Laminated Bodies (AREA)
- Compositions Of Macromolecular Compounds (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE1815944A DE1815944C3 (de) | 1968-12-20 | 1968-12-20 | Antistatisches photographisches Material |
Publications (1)
Publication Number | Publication Date |
---|---|
US3615531A true US3615531A (en) | 1971-10-26 |
Family
ID=5716867
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US881599A Expired - Lifetime US3615531A (en) | 1968-12-20 | 1969-12-02 | Antistatic layers containing polymers of sulfo-substituted n-phenyl maleic imides |
Country Status (7)
Country | Link |
---|---|
US (1) | US3615531A (enrdf_load_stackoverflow) |
JP (1) | JPS4841208B1 (enrdf_load_stackoverflow) |
BE (1) | BE742959A (enrdf_load_stackoverflow) |
CH (1) | CH524158A (enrdf_load_stackoverflow) |
DE (1) | DE1815944C3 (enrdf_load_stackoverflow) |
FR (1) | FR2026725A1 (enrdf_load_stackoverflow) |
GB (1) | GB1265519A (enrdf_load_stackoverflow) |
Cited By (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3791831A (en) * | 1970-03-12 | 1974-02-12 | Agfa Gevaert Ag | Photographic materials with antistatic layers |
US4287299A (en) * | 1979-05-16 | 1981-09-01 | Agfa-Gevaert Ag | Process for the production of matting layers |
US4644035A (en) * | 1983-10-31 | 1987-02-17 | Atlantic Richfield Company | Process for sulfonating of polymers containing dicarboxylic acid cyclic imide units |
US4797450A (en) * | 1983-10-31 | 1989-01-10 | Arco Chemical Company | Additives for water-base drilling fluid and process |
US4983669A (en) * | 1988-03-07 | 1991-01-08 | Aristech Chemical Corporation | Thermosetting composition from maleimide, olefinic monomer and unsaturated polyester |
US5238706A (en) * | 1992-06-26 | 1993-08-24 | Minnesota Mining And Manufacturing Company | Antistatic film bases and their process of manufacturing |
US5674671A (en) * | 1994-07-18 | 1997-10-07 | Minnesota Mining And Manufacturing Company | Light senitive material having improved antistatic behavior |
US5759701A (en) * | 1994-02-15 | 1998-06-02 | Xerox Corporation | Recording sheets containing amine salts and quaternary choline halides |
EP2385425A1 (en) | 2010-05-07 | 2011-11-09 | Fujifilm Corporation | Silver halide photographic light-sensitive material for movie |
CN103275419A (zh) * | 2013-05-31 | 2013-09-04 | 苏州市景荣科技有限公司 | 一种pvc鞋底防静电剂及其制备方法 |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3874879A (en) * | 1972-05-22 | 1975-04-01 | Eastman Kodak Co | Article with oxidation protected adhesive and anti-static layer |
JPS57195353A (en) * | 1981-05-26 | 1982-12-01 | Victor Co Of Japan Ltd | Magnetic tape driver |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR956692A (enrdf_load_stackoverflow) * | 1941-02-18 | 1950-02-02 | ||
US3039870A (en) * | 1960-01-29 | 1962-06-19 | Eastman Kodak Co | Antistatic copolymers comprising salts of n-sulfoalkyl-alpha, beta-unsaturated dicarboxylic imides |
-
1968
- 1968-12-20 DE DE1815944A patent/DE1815944C3/de not_active Expired
-
1969
- 1969-11-20 CH CH1729469A patent/CH524158A/de not_active IP Right Cessation
- 1969-12-02 US US881599A patent/US3615531A/en not_active Expired - Lifetime
- 1969-12-11 BE BE742959D patent/BE742959A/xx unknown
- 1969-12-17 GB GB1265519D patent/GB1265519A/en not_active Expired
- 1969-12-19 FR FR6944237A patent/FR2026725A1/fr not_active Withdrawn
- 1969-12-20 JP JP44102427A patent/JPS4841208B1/ja active Pending
Cited By (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3791831A (en) * | 1970-03-12 | 1974-02-12 | Agfa Gevaert Ag | Photographic materials with antistatic layers |
US4287299A (en) * | 1979-05-16 | 1981-09-01 | Agfa-Gevaert Ag | Process for the production of matting layers |
US4644035A (en) * | 1983-10-31 | 1987-02-17 | Atlantic Richfield Company | Process for sulfonating of polymers containing dicarboxylic acid cyclic imide units |
US4797450A (en) * | 1983-10-31 | 1989-01-10 | Arco Chemical Company | Additives for water-base drilling fluid and process |
US4983669A (en) * | 1988-03-07 | 1991-01-08 | Aristech Chemical Corporation | Thermosetting composition from maleimide, olefinic monomer and unsaturated polyester |
US5238706A (en) * | 1992-06-26 | 1993-08-24 | Minnesota Mining And Manufacturing Company | Antistatic film bases and their process of manufacturing |
US5759701A (en) * | 1994-02-15 | 1998-06-02 | Xerox Corporation | Recording sheets containing amine salts and quaternary choline halides |
US5674671A (en) * | 1994-07-18 | 1997-10-07 | Minnesota Mining And Manufacturing Company | Light senitive material having improved antistatic behavior |
EP2385425A1 (en) | 2010-05-07 | 2011-11-09 | Fujifilm Corporation | Silver halide photographic light-sensitive material for movie |
CN103275419A (zh) * | 2013-05-31 | 2013-09-04 | 苏州市景荣科技有限公司 | 一种pvc鞋底防静电剂及其制备方法 |
Also Published As
Publication number | Publication date |
---|---|
CH524158A (de) | 1972-06-15 |
BE742959A (enrdf_load_stackoverflow) | 1970-06-11 |
DE1815944C3 (de) | 1979-11-22 |
GB1265519A (enrdf_load_stackoverflow) | 1972-03-01 |
FR2026725A1 (enrdf_load_stackoverflow) | 1970-09-18 |
DE1815944A1 (de) | 1970-07-02 |
DE1815944B2 (de) | 1979-03-15 |
JPS4841208B1 (enrdf_load_stackoverflow) | 1973-12-05 |
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