US3549561A - Method of producing electrically semiconductive material - Google Patents

Method of producing electrically semiconductive material Download PDF

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Publication number
US3549561A
US3549561A US849234A US3549561DA US3549561A US 3549561 A US3549561 A US 3549561A US 849234 A US849234 A US 849234A US 3549561D A US3549561D A US 3549561DA US 3549561 A US3549561 A US 3549561A
Authority
US
United States
Prior art keywords
weight
mixture
semiconductive material
silicon dioxide
electrically semiconductive
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
US849234A
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English (en)
Inventor
Willem Westerveld
Jan Willem Harmsen
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
US Philips Corp
Original Assignee
US Philips Corp
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Filing date
Publication date
Application filed by US Philips Corp filed Critical US Philips Corp
Application granted granted Critical
Publication of US3549561A publication Critical patent/US3549561A/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01CRESISTORS
    • H01C17/00Apparatus or processes specially adapted for manufacturing resistors
    • H01C17/06Apparatus or processes specially adapted for manufacturing resistors adapted for coating resistive material on a base
    • H01C17/065Apparatus or processes specially adapted for manufacturing resistors adapted for coating resistive material on a base by thick film techniques, e.g. serigraphy
    • H01C17/06506Precursor compositions therefor, e.g. pastes, inks, glass frits
    • H01C17/06513Precursor compositions therefor, e.g. pastes, inks, glass frits characterised by the resistive component
    • H01C17/06533Precursor compositions therefor, e.g. pastes, inks, glass frits characterised by the resistive component composed of oxides
    • CCHEMISTRY; METALLURGY
    • C04CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04BLIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B35/00Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
    • C04B35/01Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics
    • C04B35/03Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics based on magnesium oxide, calcium oxide or oxide mixtures derived from dolomite
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01BCABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B1/00Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01BCABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B1/00Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors
    • H01B1/06Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors mainly consisting of other non-metallic substances
    • H01B1/08Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors mainly consisting of other non-metallic substances oxides
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01CRESISTORS
    • H01C7/00Non-adjustable resistors formed as one or more layers or coatings; Non-adjustable resistors made from powdered conducting material or powdered semi-conducting material with or without insulating material
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01CRESISTORS
    • H01C7/00Non-adjustable resistors formed as one or more layers or coatings; Non-adjustable resistors made from powdered conducting material or powdered semi-conducting material with or without insulating material
    • H01C7/001Mass resistors
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01CRESISTORS
    • H01C7/00Non-adjustable resistors formed as one or more layers or coatings; Non-adjustable resistors made from powdered conducting material or powdered semi-conducting material with or without insulating material
    • H01C7/06Non-adjustable resistors formed as one or more layers or coatings; Non-adjustable resistors made from powdered conducting material or powdered semi-conducting material with or without insulating material including means to minimise changes in resistance with changes in temperature

Definitions

  • the invention relates to a method of producing an electrically semiconductive material and to a semiconductor made from this material.
  • electrically semiconductive material having a small temperature coeflicient of resistance may be made from a mixture of an insulating oxide, such as magnesium oxide, and at most 3% of an oxide of one of the metals titanium, vanadium or niobium, by sintering the mixture at a temperature above 1700 C. in a reducing atmosphere.
  • an insulating oxide such as magnesium oxide
  • an oxide of one of the metals titanium, vanadium or niobium by sintering the mixture at a temperature above 1700 C. in a reducing atmosphere.
  • semiconductors satisfying the aforementioned stringent requirements can be produced from semiconductor material obtained by sintering under reducing conditions a mixture consisting mainly of magnesiumoxide and containing from 0.5% to 3% by weight of titanium dioxide and from 1% to 30% by weight, preferably from 1.3% to 2.0% by weight, of silicon dioxide.
  • the invention relates to a method of producing electrically semiconductive material by sintering in a reducing atmosphere a mixture consisting mainly of magnesium oxide and containing titanum doxide, and is characterized in that the mixture contains from 0.5% to 3.0% by weight of titanium dioxide and from 1.0% to 3.0% by weight of silicon dioxide, the proportion of both oxides together ice amounting to from 2% to 5% by weight.
  • the specific resistivity of these materials ranges from about 300 to 3000 ohm/cm.
  • semiconductors of high temperature stability i.e. semiconductors the resistance values of which change hardly or not at all when they are exposed to high temperatures for long periods of time, are obtained by starting from a mixture containing from 2.5% to 4.0% by weight and particularly from 2.8% to 3.6% by weight of titanium dioxide and silicon dioxide taken together, and especially if the proportion of titanium dioxide is from 1.5% to 2.5% by weight and the proportion of silicon dioxide is from 1.3 to 2.0% by weight and more particularly if these proportions are approximately 1.7% by weight and 1.4% by weight respectively.
  • magnesium oxide may be capable of producing magnesium oxide upon heating, for example magnesium carbonate.
  • titanium dioxide and silicon dioxide may be present as such or entirely or in part, in combined form, for example, as magnesium titanate and magnesium silicate respectively.
  • the use of at least one oxide and preferably of both oxides as such is preferred. In these cases the sintering process yields semiconductors having very satisfactory chemical properties.
  • the starting mixture preferably contains, in addition to the aforementioned components, an organic binder, such as methyl cellulose or nitrocellulose.
  • an organic binder such as methyl cellulose or nitrocellulose.
  • the binder may be removed by heating to a lower temperature, for example, to a temperature of from 1300 C. to 1400 C. During this lower temperature heating process a small amount of sintering takes place.
  • the process of sintering in a reducing atmosphere may be effected in a gas mixture consisting of approximately by volume of nitrogen and approximately 15% by volume of hydrogen containing up to 0.1% by volume and preferably less than 0.01 by volume of oxygen, at temperatures between 1700 C., and 2000" C. and preferably by heatin g at about 1800 C., for example, for about from 5 to 30 minutes.
  • the temperature coefiicient of resistance of the rods is rather small; by increasing the temperature from 20 C. to 350 C. the resistance increases by about 50% in total, between 350 C. and 500 C. the resistance remains almost constant and above 500 C. the temperature coefficient of resistance shows a small negative value.
  • Resistances containing less than 1% by 'weight of silicon dioxide show at temperatures above about 500 C. a negative temperature coefiicient of relatively high value. Due thereto such resistances cannot be used in the highpressure mercury-vapor lamps as referred to above.

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Chemical & Material Sciences (AREA)
  • Electromagnetism (AREA)
  • Physics & Mathematics (AREA)
  • Ceramic Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Materials Engineering (AREA)
  • Structural Engineering (AREA)
  • Organic Chemistry (AREA)
  • Apparatuses And Processes For Manufacturing Resistors (AREA)
  • Conductive Materials (AREA)
  • Compositions Of Oxide Ceramics (AREA)
US849234A 1963-09-27 1969-07-22 Method of producing electrically semiconductive material Expired - Lifetime US3549561A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
NL63298534A NL139838B (nl) 1963-09-27 1963-09-27 Werkwijze voor het bereiden van elektrisch halfgeleidermateriaal en uit dit materiaal vervaardigde halfgeleider.

Publications (1)

Publication Number Publication Date
US3549561A true US3549561A (en) 1970-12-22

Family

ID=19755090

Family Applications (1)

Application Number Title Priority Date Filing Date
US849234A Expired - Lifetime US3549561A (en) 1963-09-27 1969-07-22 Method of producing electrically semiconductive material

Country Status (6)

Country Link
US (1) US3549561A (fr)
CH (1) CH463604A (fr)
DE (1) DE1261437B (fr)
FR (1) FR1409070A (fr)
GB (1) GB1023260A (fr)
NL (2) NL298534A (fr)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3856567A (en) * 1972-08-04 1974-12-24 J Pitha Electrode for porous ceramic and method of making same
US4264914A (en) * 1978-12-27 1981-04-28 The United States Of America As Represented By The United States Department Of Energy Wide-band-gap, alkaline-earth-oxide semiconductor and devices utilizing same
US20080303542A1 (en) * 2007-06-05 2008-12-11 Jing-Syun Wang Testing circuit and integrated circuit

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2289211A (en) * 1939-05-24 1942-07-07 Norton Co Titanium oxide composition
US2507233A (en) * 1941-06-06 1950-05-09 Hartford Nat Bank & Trust Co Electric resistance and method of making
US3036018A (en) * 1958-05-05 1962-05-22 Renault Refractory, dielectric, semi-conducting material, and method of preparing same

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB805792A (en) * 1956-02-27 1958-12-10 Welwyn Electrical Lab Ltd Improvements in or relating to electrical resistors

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2289211A (en) * 1939-05-24 1942-07-07 Norton Co Titanium oxide composition
US2507233A (en) * 1941-06-06 1950-05-09 Hartford Nat Bank & Trust Co Electric resistance and method of making
US3036018A (en) * 1958-05-05 1962-05-22 Renault Refractory, dielectric, semi-conducting material, and method of preparing same

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3856567A (en) * 1972-08-04 1974-12-24 J Pitha Electrode for porous ceramic and method of making same
US4264914A (en) * 1978-12-27 1981-04-28 The United States Of America As Represented By The United States Department Of Energy Wide-band-gap, alkaline-earth-oxide semiconductor and devices utilizing same
US20080303542A1 (en) * 2007-06-05 2008-12-11 Jing-Syun Wang Testing circuit and integrated circuit
US7750658B2 (en) * 2007-06-05 2010-07-06 Jing-Syun Wang Integrated circuit and testing circuit therein for testing and failure analysis

Also Published As

Publication number Publication date
FR1409070A (fr) 1965-08-20
CH463604A (de) 1968-10-15
NL139838B (nl) 1973-09-17
GB1023260A (en) 1966-03-23
DE1261437B (de) 1968-02-15
NL298534A (fr) 1965-11-25

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