US3466487A - Device for moving a beam of charged particles - Google Patents

Device for moving a beam of charged particles Download PDF

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Publication number
US3466487A
US3466487A US646677A US3466487DA US3466487A US 3466487 A US3466487 A US 3466487A US 646677 A US646677 A US 646677A US 3466487D A US3466487D A US 3466487DA US 3466487 A US3466487 A US 3466487A
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US
United States
Prior art keywords
cathode
shield
moving
emitting surface
glow discharge
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
US646677A
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English (en)
Inventor
Jack W Davis
Fernand J Ferreira
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Raytheon Technologies Corp
Original Assignee
United Aircraft Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by United Aircraft Corp filed Critical United Aircraft Corp
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Publication of US3466487A publication Critical patent/US3466487A/en
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
    • H01J37/147—Arrangements for directing or deflecting the discharge along a desired path
    • H01J37/15—External mechanical adjustment of electron or ion optical components
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
    • H01J37/06—Electron sources; Electron guns
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
    • H01J37/06—Electron sources; Electron guns
    • H01J37/077—Electron guns using discharge in gases or vapours as electron sources
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
    • H01J37/09—Diaphragms; Shields associated with electron or ion-optical arrangements; Compensation of disturbing fields

Definitions

  • a nondissipative apertured mask for shaping an electron beam produced from a cathode operating in a glow discharge is shown. Relative movement of the electron beam is obtained by moving the apertured mask relative to the electron emitting surface of the cathode.
  • the chiciency of the contoured cathode may be substantially improved by the use of a shield surrounding those areas of the cathode from which no emission is desired.
  • These shields may be made of a conductor material or an insulator.
  • the shield is selectively spaced from the cathode to suppress the emission of electrons from those surfaces which would not contribute to the main beam.
  • the contoured cathode permits the design of a shield of unusual effectiveness in inhibiting the formation of a plasma in the gap between the shield and the cathode. It is further taught in the copending application that the shield may be used to mask the frontal emission surface of the cathode to thereby prevent the ions in the glow discharge from reaching the cathode surface and thus shaping the electron beam.
  • This object is obtained by providing a cathode structure operating in a glow discharge and producing a beam of electrons which are emitted from the cathode due to the bombardment of the emitting surface by ions, photons, metastables and fast neutrals and wherein a shield having an aperture therein is moved relative to the cathode emitting surface to produce a moving beam of electrons emanating through the aperture.
  • FIGURE 1 A first embodiment-is shown in FIGURE 1 wherein an annular contoured cathode is provided with an annular rotating beam obtained from a rotating mask or shield.
  • FIGURE 2 illustrates a linear contoured cathode with a slidable mask or shield provided with a plurality of apertures for obtaining a plurality of beams therefrom.
  • a contoured cathode 10 is surrounded by a shield 11 which may be at anode potential or electrically floating.
  • An anode 12 is provided at any convenient place within the chamber in which the cathode 10 is located.
  • the chamber is evacuated to a suitable pressure for establishing the glow discharge and an electron beam from the cathode.
  • the cathode 10 is annular and provided with a frontal surface 14 which is contoured in the axial direction.
  • a workpiece 15 is located concentric to the annular cathode 10.
  • a power supply 16 provides the high negative potential necessary for producing the glow discharge.
  • the shield 11 is spaced selectively therefrom to suppress the glow discharge in the gap between it and the cathode.
  • the precise spacing depends on the cathode voltage, the type of gas between the cathode and shield and the gas pressure in accordance with the well-known Law of Paschen.
  • the shield 11 has a rotating masked member 17, concentric with the annular cathode 10.
  • the shield member 17 is rotatably mounted on the shield 11 and opposite to the electron emitting surface of the cathode 10. Shield member 17 prevents the particles from reaching the surface 14 except for an aperture 18.
  • the aperture 18 may have any desired shape commensurate with the type of electron beam desired.
  • the top circumferential edge of the rotating shield member 17 is provided with teeth that mesh with a driving gear 19.
  • the driving gear in turn is coupled to a shaft 20 and then to a motor 21.
  • the motor is energized by a voltage source (not shown) to rotate the mask 17 relative to the emitting surface 14.
  • the shield member 17 is curved to maintain a predetermined distance from the frontal surface 14 to suppress the glow discharge everywhere but from that surface in front and opposite to the aperture 18. As a result, the particles are permitted to travel towards the frontal surface 14 and a beam of electrons from the surface towards the workpiece 15 is obtained. If thereafter the motor is energized to rotate the rotating mask 17, different areas of the cathode are allowed to emit thus effectively moving the beam of electrons and a circumferential Weld on the workpiece 15 may be performed.
  • FIGURE 2 a linear version of the cathode structure of FIGURE 1 is shown.
  • the cathode 25 is again surrounded by a shield 26.
  • the shield 26 is further provided with a slidable member 27 having multiple apertures 28, 29 and 30 therein.
  • the member 27 is moved relative to the frontal emitting surface 31 of the cathode 25 to thereby produce sliding electron beams from the various apertures. Motion may be imparted to the slidable member by appropriate mechanical means such as the motor of FIGURE 1.
  • the aperture 28 has a particular shape for similarly shaping the electron beam obtained therethrough.
  • a movable electron beam of this invention is obtained by moving a nondissipating mask relative to a contoured cathode and the electron beam may be rotated or moved in linear directions therewith.
  • a device for moving an electron beam formed primarily by secondary emission of electrons between a cathode structure and an anode ina gaseous environment having a predetermined pressure suitable for producing a glow discharge comprising:
  • said cathode structure having an electron emitting surface where the electrons emitted from said cathode structure are obtained primarily from the collision thereupon of particles traveling toward said emitting surface from the glow discharge,
  • a nondissipative shield selectively spaced from and surrounding said cathode structure for suppressing the glow discharge between the shield and the cathode and preventing said particles from impinging upon the emitting surface.
  • said shield having a masking portion positioned in confronting relationship with said electron emitting surface and movable with respect to said emitting surface, the portion having at least one aperture for exposing a limited region of the emitting surface, through which aperture said particles are permitted to reach the exposed region to emit an electron beam, and I means for moving said portion relative to the emitting surface for producing relative motion of the electron beam.
  • portion of the shield is annular and concentric with the annular emitting surface and is mounted for rotation with respect to the surface
  • a device as recited in claim 2 wherein said electron emitting surface is the internal surface of the annular cathode structure and emits the beam of electrons inwardly towards said axis, and

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  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Sources, Ion Sources (AREA)
  • Welding Or Cutting Using Electron Beams (AREA)
US646677A 1967-06-16 1967-06-16 Device for moving a beam of charged particles Expired - Lifetime US3466487A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US64667767A 1967-06-16 1967-06-16

Publications (1)

Publication Number Publication Date
US3466487A true US3466487A (en) 1969-09-09

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Family Applications (1)

Application Number Title Priority Date Filing Date
US646677A Expired - Lifetime US3466487A (en) 1967-06-16 1967-06-16 Device for moving a beam of charged particles

Country Status (4)

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US (1) US3466487A (de)
DE (1) DE1764063B1 (de)
FR (1) FR1557568A (de)
GB (1) GB1217037A (de)

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3614510A (en) * 1968-06-04 1971-10-19 United Ekingdom Atomic Energy Nonthermionic cathode discharge devices
US3660630A (en) * 1969-03-31 1972-05-02 Soudure Electr High temperature heating
US4080526A (en) * 1976-02-05 1978-03-21 Mitsubishi Jukogyo Kabushiki Kaisha Electron beam machining apparatus of the dynamic seal type
US4419561A (en) * 1979-09-19 1983-12-06 U.S. Philips Corporation Metal wire cathode for electron beam apparatus
US4760238A (en) * 1986-01-21 1988-07-26 The Welding Institute Charged particle beam generation
US5065034A (en) * 1989-05-10 1991-11-12 Hitachi, Ltd. Charged particle beam apparatus
CN107078004A (zh) * 2014-11-07 2017-08-18 应用材料公司 用于利用电子束处理具有大宽度柔性基板的设备和方法

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2346094A1 (fr) * 1976-03-29 1977-10-28 Sciaky Sa Pistolet de soudage

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US1997986A (en) * 1930-06-24 1935-04-16 Earl R Thomas Electric circuit controlling apparatus
US3383541A (en) * 1965-11-17 1968-05-14 United Aircraft Corp Glow discharge cathode having a large electron beam emitting aperture

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3381157A (en) * 1964-12-10 1968-04-30 United Aircraft Corp Annular hollow cathode discharge apparatus

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US1997986A (en) * 1930-06-24 1935-04-16 Earl R Thomas Electric circuit controlling apparatus
US3383541A (en) * 1965-11-17 1968-05-14 United Aircraft Corp Glow discharge cathode having a large electron beam emitting aperture

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3614510A (en) * 1968-06-04 1971-10-19 United Ekingdom Atomic Energy Nonthermionic cathode discharge devices
US3660630A (en) * 1969-03-31 1972-05-02 Soudure Electr High temperature heating
US4080526A (en) * 1976-02-05 1978-03-21 Mitsubishi Jukogyo Kabushiki Kaisha Electron beam machining apparatus of the dynamic seal type
US4419561A (en) * 1979-09-19 1983-12-06 U.S. Philips Corporation Metal wire cathode for electron beam apparatus
US4760238A (en) * 1986-01-21 1988-07-26 The Welding Institute Charged particle beam generation
US5065034A (en) * 1989-05-10 1991-11-12 Hitachi, Ltd. Charged particle beam apparatus
CN107078004A (zh) * 2014-11-07 2017-08-18 应用材料公司 用于利用电子束处理具有大宽度柔性基板的设备和方法
CN107078004B (zh) * 2014-11-07 2019-10-15 应用材料公司 用于利用电子束处理具有大宽度柔性基板的设备和方法

Also Published As

Publication number Publication date
GB1217037A (en) 1970-12-23
DE1764063B1 (de) 1970-09-16
FR1557568A (de) 1969-02-14

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