US3352669A - Photoconductive member and processes of preparing and using same - Google Patents
Photoconductive member and processes of preparing and using same Download PDFInfo
- Publication number
- US3352669A US3352669A US341774A US34177464A US3352669A US 3352669 A US3352669 A US 3352669A US 341774 A US341774 A US 341774A US 34177464 A US34177464 A US 34177464A US 3352669 A US3352669 A US 3352669A
- Authority
- US
- United States
- Prior art keywords
- barrier layer
- photoconductive
- supporting substrate
- selenium
- layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 238000000034 method Methods 0.000 title description 22
- 230000008569 process Effects 0.000 title description 16
- 230000004888 barrier function Effects 0.000 claims description 41
- BUGBHKTXTAQXES-UHFFFAOYSA-N Selenium Chemical compound [Se] BUGBHKTXTAQXES-UHFFFAOYSA-N 0.000 claims description 22
- 239000011669 selenium Substances 0.000 claims description 22
- 229910052711 selenium Inorganic materials 0.000 claims description 22
- 239000000758 substrate Substances 0.000 claims description 22
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 20
- 239000000203 mixture Substances 0.000 claims description 18
- 239000002253 acid Substances 0.000 claims description 14
- 229910052500 inorganic mineral Inorganic materials 0.000 claims description 8
- 239000011707 mineral Substances 0.000 claims description 8
- 239000000126 substance Substances 0.000 claims description 3
- 101100459267 Crotalus durissus terrificus CRO3 gene Proteins 0.000 claims 1
- 230000003319 supportive effect Effects 0.000 claims 1
- 239000000243 solution Substances 0.000 description 29
- 239000000463 material Substances 0.000 description 22
- 229910001369 Brass Inorganic materials 0.000 description 16
- 239000010951 brass Substances 0.000 description 16
- 239000011888 foil Substances 0.000 description 10
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 9
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 9
- KRVSOGSZCMJSLX-UHFFFAOYSA-L chromic acid Substances O[Cr](O)(=O)=O KRVSOGSZCMJSLX-UHFFFAOYSA-L 0.000 description 9
- 229910052802 copper Inorganic materials 0.000 description 9
- 239000010949 copper Substances 0.000 description 9
- AWJWCTOOIBYHON-UHFFFAOYSA-N furo[3,4-b]pyrazine-5,7-dione Chemical compound C1=CN=C2C(=O)OC(=O)C2=N1 AWJWCTOOIBYHON-UHFFFAOYSA-N 0.000 description 9
- 229910052725 zinc Inorganic materials 0.000 description 9
- 239000011701 zinc Substances 0.000 description 9
- 238000000151 deposition Methods 0.000 description 7
- 235000010755 mineral Nutrition 0.000 description 7
- 239000012190 activator Substances 0.000 description 6
- 150000003839 salts Chemical class 0.000 description 6
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 5
- 239000011810 insulating material Substances 0.000 description 5
- 238000004519 manufacturing process Methods 0.000 description 5
- 229910017604 nitric acid Inorganic materials 0.000 description 5
- 238000006243 chemical reaction Methods 0.000 description 4
- 239000011651 chromium Substances 0.000 description 4
- JIAARYAFYJHUJI-UHFFFAOYSA-L zinc dichloride Chemical compound [Cl-].[Cl-].[Zn+2] JIAARYAFYJHUJI-UHFFFAOYSA-L 0.000 description 4
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 3
- WGLPBDUCMAPZCE-UHFFFAOYSA-N Trioxochromium Chemical compound O=[Cr](=O)=O WGLPBDUCMAPZCE-UHFFFAOYSA-N 0.000 description 3
- ZCDOYSPFYFSLEW-UHFFFAOYSA-N chromate(2-) Chemical compound [O-][Cr]([O-])(=O)=O ZCDOYSPFYFSLEW-UHFFFAOYSA-N 0.000 description 3
- 229910052804 chromium Inorganic materials 0.000 description 3
- 239000012535 impurity Substances 0.000 description 3
- 239000012224 working solution Substances 0.000 description 3
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 2
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 239000008367 deionised water Substances 0.000 description 2
- 229910021641 deionized water Inorganic materials 0.000 description 2
- 238000001035 drying Methods 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 238000002156 mixing Methods 0.000 description 2
- YEXPOXQUZXUXJW-UHFFFAOYSA-N oxolead Chemical compound [Pb]=O YEXPOXQUZXUXJW-UHFFFAOYSA-N 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- IOLCXVTUBQKXJR-UHFFFAOYSA-M potassium bromide Chemical compound [K+].[Br-] IOLCXVTUBQKXJR-UHFFFAOYSA-M 0.000 description 2
- KMUONIBRACKNSN-UHFFFAOYSA-N potassium dichromate Chemical compound [K+].[K+].[O-][Cr](=O)(=O)O[Cr]([O-])(=O)=O KMUONIBRACKNSN-UHFFFAOYSA-N 0.000 description 2
- 230000005855 radiation Effects 0.000 description 2
- 238000004064 recycling Methods 0.000 description 2
- JHJLBTNAGRQEKS-UHFFFAOYSA-M sodium bromide Chemical compound [Na+].[Br-] JHJLBTNAGRQEKS-UHFFFAOYSA-M 0.000 description 2
- GEHJYWRUCIMESM-UHFFFAOYSA-L sodium sulfite Chemical compound [Na+].[Na+].[O-]S([O-])=O GEHJYWRUCIMESM-UHFFFAOYSA-L 0.000 description 2
- 239000007921 spray Substances 0.000 description 2
- 239000008399 tap water Substances 0.000 description 2
- 235000020679 tap water Nutrition 0.000 description 2
- VNDYJBBGRKZCSX-UHFFFAOYSA-L zinc bromide Chemical compound Br[Zn]Br VNDYJBBGRKZCSX-UHFFFAOYSA-L 0.000 description 2
- 239000011592 zinc chloride Substances 0.000 description 2
- 235000005074 zinc chloride Nutrition 0.000 description 2
- JHWIEAWILPSRMU-UHFFFAOYSA-N 2-methyl-3-pyrimidin-4-ylpropanoic acid Chemical compound OC(=O)C(C)CC1=CC=NC=N1 JHWIEAWILPSRMU-UHFFFAOYSA-N 0.000 description 1
- BMYNFMYTOJXKLE-UHFFFAOYSA-N 3-azaniumyl-2-hydroxypropanoate Chemical compound NCC(O)C(O)=O BMYNFMYTOJXKLE-UHFFFAOYSA-N 0.000 description 1
- DJHGAFSJWGLOIV-UHFFFAOYSA-K Arsenate3- Chemical class [O-][As]([O-])([O-])=O DJHGAFSJWGLOIV-UHFFFAOYSA-K 0.000 description 1
- CWYNVVGOOAEACU-UHFFFAOYSA-N Fe2+ Chemical compound [Fe+2] CWYNVVGOOAEACU-UHFFFAOYSA-N 0.000 description 1
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 1
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 1
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 1
- PMZURENOXWZQFD-UHFFFAOYSA-L Sodium Sulfate Chemical compound [Na+].[Na+].[O-]S([O-])(=O)=O PMZURENOXWZQFD-UHFFFAOYSA-L 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- 150000001242 acetic acid derivatives Chemical class 0.000 description 1
- 230000002378 acidificating effect Effects 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
- 230000003213 activating effect Effects 0.000 description 1
- 229910001514 alkali metal chloride Inorganic materials 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- SWLVFNYSXGMGBS-UHFFFAOYSA-N ammonium bromide Chemical compound [NH4+].[Br-] SWLVFNYSXGMGBS-UHFFFAOYSA-N 0.000 description 1
- JOSWYUNQBRPBDN-UHFFFAOYSA-P ammonium dichromate Chemical compound [NH4+].[NH4+].[O-][Cr](=O)(=O)O[Cr]([O-])(=O)=O JOSWYUNQBRPBDN-UHFFFAOYSA-P 0.000 description 1
- 239000002585 base Substances 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 150000001649 bromium compounds Chemical class 0.000 description 1
- 229910052793 cadmium Inorganic materials 0.000 description 1
- BDOSMKKIYDKNTQ-UHFFFAOYSA-N cadmium atom Chemical compound [Cd] BDOSMKKIYDKNTQ-UHFFFAOYSA-N 0.000 description 1
- 150000001845 chromium compounds Chemical class 0.000 description 1
- 239000003086 colorant Substances 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- RKTYLMNFRDHKIL-UHFFFAOYSA-N copper;5,10,15,20-tetraphenylporphyrin-22,24-diide Chemical compound [Cu+2].C1=CC(C(=C2C=CC([N-]2)=C(C=2C=CC=CC=2)C=2C=CC(N=2)=C(C=2C=CC=CC=2)C2=CC=C3[N-]2)C=2C=CC=CC=2)=NC1=C3C1=CC=CC=C1 RKTYLMNFRDHKIL-UHFFFAOYSA-N 0.000 description 1
- 239000013527 degreasing agent Substances 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000012777 electrically insulating material Substances 0.000 description 1
- 150000004673 fluoride salts Chemical class 0.000 description 1
- 238000009472 formulation Methods 0.000 description 1
- 230000008570 general process Effects 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 238000007731 hot pressing Methods 0.000 description 1
- 239000004615 ingredient Substances 0.000 description 1
- ICIWUVCWSCSTAQ-UHFFFAOYSA-N iodic acid Chemical class OI(=O)=O ICIWUVCWSCSTAQ-UHFFFAOYSA-N 0.000 description 1
- 229910052749 magnesium Inorganic materials 0.000 description 1
- 239000011777 magnesium Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- JLKDVMWYMMLWTI-UHFFFAOYSA-M potassium iodate Chemical compound [K+].[O-]I(=O)=O JLKDVMWYMMLWTI-UHFFFAOYSA-M 0.000 description 1
- 239000001230 potassium iodate Substances 0.000 description 1
- 235000006666 potassium iodate Nutrition 0.000 description 1
- 229940093930 potassium iodate Drugs 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 238000006479 redox reaction Methods 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- 235000015424 sodium Nutrition 0.000 description 1
- 239000001632 sodium acetate Substances 0.000 description 1
- 235000017281 sodium acetate Nutrition 0.000 description 1
- 229940075581 sodium bromide Drugs 0.000 description 1
- 235000010265 sodium sulphite Nutrition 0.000 description 1
- VGTPCRGMBIAPIM-UHFFFAOYSA-M sodium thiocyanate Chemical compound [Na+].[S-]C#N VGTPCRGMBIAPIM-UHFFFAOYSA-M 0.000 description 1
- AKHNMLFCWUSKQB-UHFFFAOYSA-L sodium thiosulfate Chemical compound [Na+].[Na+].[O-]S([O-])(=O)=S AKHNMLFCWUSKQB-UHFFFAOYSA-L 0.000 description 1
- 235000019345 sodium thiosulphate Nutrition 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 150000003567 thiocyanates Chemical class 0.000 description 1
- -1 thisulfates Chemical class 0.000 description 1
- 239000011135 tin Substances 0.000 description 1
- 229910052718 tin Inorganic materials 0.000 description 1
- 239000004408 titanium dioxide Substances 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
- 229940102001 zinc bromide Drugs 0.000 description 1
- 239000011787 zinc oxide Substances 0.000 description 1
- UQMZPFKLYHOJDL-UHFFFAOYSA-N zinc;cadmium(2+);disulfide Chemical compound [S-2].[S-2].[Zn+2].[Cd+2] UQMZPFKLYHOJDL-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
- G03G5/00—Recording members for original recording by exposure, e.g. to light, to heat, to electrons; Manufacture thereof; Selection of materials therefor
- G03G5/10—Bases for charge-receiving or other layers
- G03G5/102—Bases for charge-receiving or other layers consisting of or comprising metals
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
- G03G5/00—Recording members for original recording by exposure, e.g. to light, to heat, to electrons; Manufacture thereof; Selection of materials therefor
- G03G5/14—Inert intermediate or cover layers for charge-receiving layers
- G03G5/142—Inert intermediate layers
- G03G5/144—Inert intermediate layers comprising inorganic material
Definitions
- This invention relates to electrophotography and more particularly to an improved photoconductive member adapted for use in electrophotography.
- electrophotography it is known electrostatic images on the surface of a photoconductive insulating layer are produced by uniformly charging the insulating layer and then dissipating this charge on that portion of the layer which is exposed to light.
- the latent image formed thereon will correspond to the configuration of the light image passing through the master to be reproduced.
- This image is rendered visible by depositing on the insulating layer a finely divided developing material comprising a colorant called a toner and a toner carrier.
- the developing material will be attracted to that portion of the layer retaining a charge thereby distributing itself over the layer in a manner corresponding to the electrostatic image.
- the powder image may then be transformed to paper or other recording surfaces by placing the surface of the paper in contact with the powdered layer and applying an electrostatic charge to the paper.
- the paper upon being separated from the insulating layer, will bear the powdered image which may subsequently be made permanent by heating or other suitable fixing means.
- the means supporting the photoconductive insulating material above described usually comprises a metallic or conductive backing member supporting on one surface thereof a barrier layer or interfacial barrier. Over this barrier layer or to form an interfacial barrier, the above mentioned photoconductive electrically insulating material is then deposited.
- Several suitable processes may be followed to form this photoconductive layer such as, for example, that process disclosed in United States Patent 2,970,906.
- a purpose of the barrier in a photoconductive plate of the type described in the above patents is to reduce the charge leakage in the absence of activating radiation (dark discharge) but not preventing the charge dissipation in the presence of such radiation.
- the barrier also must be designed to prevent or reduce variation in performance of the plate upon reuse or/and recycling of the plate. This variation in performance upon recycling is known as charge fatigue.
- the interface or barrier layer prevents the passage of charge from the conductive backing member to the photoconductive insulating layer and hence prevents discharge of the said photoconductive layer.
- barrier layers have been used to form barrier layers. Many, however, have inherent disadvantages making them commercially undesirable. Those, for example, which coat the metallic or conducting surface in a non-uniform manner are not suitable since the plate potential will vary as will other properties along the surface. Also, materials reactive with the photoconductive material will, over a period of time, cause a variation in the performance of the photoconductive plate due to changes in the chemical composition thereof. This reactivity has been observed when selenium is used as the photoconductive material. Because of the chemical reaction of the selenium with the barrier layer, non-uniform performance of the electrophotographic process occurred. Another problem encountered is that of adhesion of the photoconductive material to the barrier layers heretofore used. Poor and non-uniform adhesion of the photoconductive layer to the barrier layer leads to plate failure by element separation in use.
- Another object of this invention is to provide an improved electrophotographic plate comprising a novel barrier layer which will substantially minimize dark discharge and charge fatigue.
- Another object is to provide a novel method for the production of an electrophotographic plate.
- Still another object of this invention is to provide a barrier layer which will reduce significantly any chemical reaction with the photoconductive material.
- Another still further object of this invention is to provide a barrier layer for use in an electrophotographic plate which will maintain at a minimum the variation of properties in the photoconductive material during use.
- Yet another still further object of this invention is to provide an electrophotographic plate which performs in a substantially consistent manner upon reuse.
- a further object of this invention is to provide an electrophotographic plate having desirable adhesion of the photoconductor to the barrier layer.
- a photoconductive member comprising a barrier layer obtained by contacting an aqueous mineral acid solution containing chromic acid anhydride (G0,) or chromic acid (H CrO in a predominating amount, with a conductive supporting substrate.
- chromic acid anhydride G0,
- H CrO chromic acid
- Typical water soluble salts are: potassium dichromate, KzCI'gO sodium dichromate, Na Cr O ammonium dichromate (NH Cr O and mixtures thereof.
- predominating amount for the purposes of this disclosure, is meant in an amount by Weight of at least about 50% of the solute used in said acidic water solvent, to about 100%.
- the supporting substrate may be of several desirable conductive materials such as aluminum, copper, nickel, magnesium, tin, zinc, cadmium, silver, ferrous material, their alloys and mixtures thereof.
- the preferred supporting substrate is a brass material having from about 60% to about copper and the remainder zinc.
- a chromate conversion activator is normally used.
- Any suitable activator may be used such as, for example, zinc chloride, halogenated mineral acids, alkali metal chlorides, acid soluble bromides, thiocyanates, thisulfates, iodates, fluorides, arsenates, acetates and mixtures thereof.
- activators are potassium bromide, potassium iodate, sodium thiocyanate, sodium thiosulfate, hydrochloric acid, hydrobromic acid, ammonium bromide, sodium bro mide, zinc bromide, zinc chloride, sodium sulfite, sodium r, O sulfate, sodium acetate and mixtures thereofrlt has been considered, however, that the activator may promote oxidation-reduction reactions between the metal surface to be treated and the particular chromium compound present in the solution. It has been further considered that the activators cause formation of a chromic compound at the surface of the metal forming thereon a chromate type.
- any suitable photoconductive layer or material may be used such as amorphous selenium, zinc oxide, zinc-cadmium sulfide, tetragonal lead monoxide, titanium dioxide and mixtures thereof.
- the barrier layer thickness may be controlled to obtain desirable properties or optimum combinations of desirable properties depending on the material of the supporting substrate, the formulation, concentration and other materials used and functional needs, etc.
- the CrO or H' CrO can be used in an acid medium such as, for example, H PO HCl HNO H 80 and mixtures thereof.
- a barrier layer having a thickness of up to about one-half micron is formed by contacting thesurface of the conductive supporting substrate with an aqueous nitric acid. solution containing the CrO or H CrO moiety.
- aqueous nitric acid. solution containing the CrO or H CrO moiety containing the CrO or H CrO moiety.
- the proportions of this material will vary depending upon the particular desired result; however, it is preferred that an acid solution containing nitric acid and a composition comprising from about 80% to 95% CrO and from about 5% to Na SO be used. It is considered also that commercial grade materials may be used which, of course, will contain a number of minor impurities, none of which are known to have any appreciable effect upon the desired barrier layer.
- Example I A chromic acid solution from which the barrier layer is formed is prepared by mixing for each gallon of water about two ounces of a composition containing about 6% Na SO about 90% CrO about 2% Cr (SO and the remainder various substantially insignificant impurities.
- a brass support or supporting substrate having a composition of about 70% copper and about 30% zinc is used in the form of a brass foil, or a brass plate, or a brass drum. All of these brass supports can be used and will function in substantially the same manner.
- the brass support is immersed in the aqueous working chromic acid solution above defined. The solution is maintained at. a temperature of about 100 F. while the support is immersed for a period of about twenty seconds.
- the treated support is rinsed for a period of about sixty seconds with water at a temperature of about 100 F.
- the rinsing is followed by two cold tap water rinses and then a cold deionized Water rinse, all about fifteen seconds each.
- the treated support is then dried for about fifteen minutes at a temperature of about 100 F.
- the treated support is then placed in a high vacuum evaporator where selenium is deposited on the support by known vacuum evaporation methods such as that described in U.S. Patent 2,970,906.
- Other known methods to deposit the selenium may also be used.
- the selenium coating is accomplished by conducting vaporized selenium from a body of selenium to a plate in an upwardly directed path for approximately ten minutes while maintaining the treated support at a temperature of from about 100 C. to about 120 C.
- Other suitable selenium deposition methods such as spraying and hot pressing suitable for use in the present process are disclosed in the above noted patent U.S. 2,970,906.
- a selenium layer of about 40 microns is thereby formed over the barrier layer to provide the finished xerographic plate.
- Example II A working solution is prepared by admixing one gallon of water with one ounce of a composition containing about 13% Na SO and about 86% CIO;,, and about 12 ml. of a concentrated nitric acid (40 B.).
- the brass supporting substrate is immersed in a manner similar to that described in Example I.
- the support is immersed while maintaining the solution at a temperature of from about F. to about 145 F.
- the support is maintained in the solution for a period of about ten to sixty seconds and then upon removing is rinsed with water in the same manner as indicated above in Example I.
- the treated support is then dried for a period of about ten to twenty-five minutes at a temperature of about 85 F. to about 145 F. and coated with selenium by the method disclosed in Example I.
- the photoconductive plate produced has a barrier layer over the brass support and has coated thereon a selenium layer ranging from about 20 to 80 microns.
- Example III Various chromic acid solutions are formulated by mixing with one gallon of water from about two to about sixteen ounces of a material containing about 90% CrO about 2% Cr (SO about 6% Na SO and the remainder various substantially insignificant impurities.
- the process using each of the solutions formulated is as follows:
- a brass support having a composition of about 70% copper and about 30% zinc and in the form of a foil, plate or drum, is immersed in the solution as above indicated.
- the brass support is maintained in the solution for a period of about ten to thirty seconds at a temperature of from about 85 F. to about 145 F.
- the support is then removed from the working solution and rinsed with water at a temperature of from about 85 F. to about 145 F. for a period of about thirty to ninety seconds.
- the support is then further rinsed by cold tap water and subsequently a cold deionized water rinse, each rinse conducted from about ten to about twenty-five seconds.
- the treated sup! port is then dried for about ten to about twenty-five minutes at a temperature of about F. to about F.
- the selenium coating is then deposited thereon in a manner similar to that discussed in the above Examples I and II.
- Example IV The working solution described in Example I is deposited'in a suitable containing vessel and a continuous brass foil strip is passed therethrough. Prior to entering the vessel containing the chromic acid solution, the foil will pass through a triohloroethylene vapor degreaser. After the foil has passed through'the chromic acid solution, it is fed through a. hot water rinse tank, two-spray cold water rinsing means, a cOld deionized spray rinsing means, and then through a drying oven. The brass strip isthen re-rolled on a take-up spool and is ready for selenium deposition.
- the specific chromic acid working solution contains about eight ounces of a composition containing about 7% Na SO 91% Q0 and about 2% Cr (SO per gallon of Water.
- the temperature of this solution is kept at about 100 F. and the foil maintained in the solution for a period of about thirty-five seconds.
- the hot water rinse is adjusted to a temperature of about 100 F., the oven is maintained at a temperature of about F. and the foil remains in the oven for approximately one and one-half minutes.
- the foil from the take-up spool is then transported to a high vacuum evaporator where selenium is deposited on the foil by any known method, forexample, one described in United States Patent 2,970,906.
- the final photoconductive plate prepared has a barrier layer with a selenium photoconductive layer of about 60 microns thickness.
- a photoconductive member comprising an electrically conductive supporting substrate, a barrier layer in electro-chemical contact with and directly overlying at least a portion of said supporting substrate, and a substantially vitreous photoconductive insulating layer comprising amorphous selenium substantially permanently aflixed to said barrier layer, said barrier layer obtained by contacting said supporting substrate with an aqueous mineral acid solution comprising a member selected from the group consisting of H CrO CrO their Water soluble salts, and mixtures thereof.
- the process for the production of a photoconductive plate adapted for use in electrophotography which comprises contacting a mineral acid solution of a member selected from the group consisting of CrO H CrO their water soluble salts and mixtures thereof; and about 0.10% to about 15 Na SO based on the total weight of the solute used, with an electrically conductive metallic supporting substrate comprising from about 5% to about 40% zinc and the remainder copper to form thereon a barrier layer, said acid solution contacted with said electrically conductive supporting substrate until a barrier layer having a thickness of from about 0.0005 to about 2.0 microns is formed thereon, and subsequently depositing over at least a portion of said barrier layer a substantially vitreous photoconductive insulating material comprising amorphous selenium.
- the process for the production of a photoconductive plate adapted for use in electrophotography which comprises contacting a nitric acid solution of about 80% to about 95% CrO and from about 5% to about 15% N21 SO based on the total weight or" the solute used, with an electrically conductive metallic supporting substrate comprising from about 5% to about 40% zinc and the remainder copper to form thereon a barrier layer, said acid solution contacted with said electrically conductive supporting substrate until a barrier layer having a thickness not greater than about 0.5 micron is formed thereon, and subsequently depositing over at least a portion of said barrier layer a substantially vitreous photoconductivet insulating material comprising amorphous selenium.
- the process for the production of a photoconductive plate adapted for use in electrophotography which comprises contacting a mineral acid solution comprising nitric acid and a solute comprising CrO in an amount of from about to about based on the total weight of the solute and the remainder of said solute a chromate conversion activator, with an electrically conductive metallic supporting substrate comprising from about5% to about 40% zinc and the remainder copper to form thereon a barrier layer, and subsequently depositing over at least a portion of said barrier layer a substantially vitreous photoconductive insulating material comprising amorphous selenium.
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- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Inorganic Chemistry (AREA)
- Photoreceptors In Electrophotography (AREA)
Priority Applications (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GB1052970D GB1052970A (enrdf_load_stackoverflow) | 1964-01-31 | ||
US341774A US3352669A (en) | 1964-01-31 | 1964-01-31 | Photoconductive member and processes of preparing and using same |
NL6500309A NL6500309A (enrdf_load_stackoverflow) | 1964-01-31 | 1965-01-12 | |
FR3223A FR1422625A (fr) | 1964-01-31 | 1965-01-25 | élément photoconducteur pour l'électro-photographie |
DE1497194A DE1497194C3 (de) | 1964-01-31 | 1965-01-27 | Verfahren zur Herstellung eines elektrophotographischen Aufzeichnungsmaterials |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US341774A US3352669A (en) | 1964-01-31 | 1964-01-31 | Photoconductive member and processes of preparing and using same |
Publications (1)
Publication Number | Publication Date |
---|---|
US3352669A true US3352669A (en) | 1967-11-14 |
Family
ID=23338982
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US341774A Expired - Lifetime US3352669A (en) | 1964-01-31 | 1964-01-31 | Photoconductive member and processes of preparing and using same |
Country Status (4)
Country | Link |
---|---|
US (1) | US3352669A (enrdf_load_stackoverflow) |
DE (1) | DE1497194C3 (enrdf_load_stackoverflow) |
GB (1) | GB1052970A (enrdf_load_stackoverflow) |
NL (1) | NL6500309A (enrdf_load_stackoverflow) |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3440045A (en) * | 1964-09-01 | 1969-04-22 | Azoplate Corp | Electrophotographic process for the manufacture of a highly heat-resistant image |
US3620723A (en) * | 1967-05-29 | 1971-11-16 | Ricoh Kk | Electrophotographic copying material containing assistant sensitizers and its manufacturing method |
US3634078A (en) * | 1965-10-06 | 1972-01-11 | Kalle Ag | Aluminum supports for planographic printing plates |
US4123271A (en) * | 1974-01-22 | 1978-10-31 | Mita Industrial Company, Limited | Alkali metal dichromate as memory resistance improver for zinc oxide photoconductors in electrostatic photography |
US4265987A (en) * | 1976-01-20 | 1981-05-05 | Coulter Systems Corporation | Lithographic printing plate and method for the preparation of same |
Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2035380A (en) * | 1933-05-13 | 1936-03-24 | New Jersey Zinc Co | Method of coating zinc or cadmium base metals |
US2434525A (en) * | 1943-08-23 | 1948-01-13 | Rheem Mfg Co | Coating on metals |
US2760891A (en) * | 1951-12-24 | 1956-08-28 | Borg Warner | Protective coating and method of applying same to metal parts |
US2824031A (en) * | 1954-04-20 | 1958-02-18 | Metal & Thermit Corp | Dip process for forming transparent surface conversion coatings on zinc, and compositions for dip solutions |
US2904414A (en) * | 1954-08-04 | 1959-09-15 | Allied Res Products Inc | Formulation for producing a protective bright chemically polished surface on zinc and cadmium |
US3121032A (en) * | 1960-09-27 | 1964-02-11 | M & T Chemicals Inc | Process for applying a protective transparent coating to zinc and cadmium and composition therefor |
US3231375A (en) * | 1962-03-23 | 1966-01-25 | Rca Corp | Electrostatic printing |
-
0
- GB GB1052970D patent/GB1052970A/en active Active
-
1964
- 1964-01-31 US US341774A patent/US3352669A/en not_active Expired - Lifetime
-
1965
- 1965-01-12 NL NL6500309A patent/NL6500309A/xx unknown
- 1965-01-27 DE DE1497194A patent/DE1497194C3/de not_active Expired
Patent Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2035380A (en) * | 1933-05-13 | 1936-03-24 | New Jersey Zinc Co | Method of coating zinc or cadmium base metals |
US2434525A (en) * | 1943-08-23 | 1948-01-13 | Rheem Mfg Co | Coating on metals |
US2760891A (en) * | 1951-12-24 | 1956-08-28 | Borg Warner | Protective coating and method of applying same to metal parts |
US2824031A (en) * | 1954-04-20 | 1958-02-18 | Metal & Thermit Corp | Dip process for forming transparent surface conversion coatings on zinc, and compositions for dip solutions |
US2904414A (en) * | 1954-08-04 | 1959-09-15 | Allied Res Products Inc | Formulation for producing a protective bright chemically polished surface on zinc and cadmium |
US3121032A (en) * | 1960-09-27 | 1964-02-11 | M & T Chemicals Inc | Process for applying a protective transparent coating to zinc and cadmium and composition therefor |
US3231375A (en) * | 1962-03-23 | 1966-01-25 | Rca Corp | Electrostatic printing |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3440045A (en) * | 1964-09-01 | 1969-04-22 | Azoplate Corp | Electrophotographic process for the manufacture of a highly heat-resistant image |
US3634078A (en) * | 1965-10-06 | 1972-01-11 | Kalle Ag | Aluminum supports for planographic printing plates |
US3620723A (en) * | 1967-05-29 | 1971-11-16 | Ricoh Kk | Electrophotographic copying material containing assistant sensitizers and its manufacturing method |
US4123271A (en) * | 1974-01-22 | 1978-10-31 | Mita Industrial Company, Limited | Alkali metal dichromate as memory resistance improver for zinc oxide photoconductors in electrostatic photography |
US4265987A (en) * | 1976-01-20 | 1981-05-05 | Coulter Systems Corporation | Lithographic printing plate and method for the preparation of same |
Also Published As
Publication number | Publication date |
---|---|
DE1497194A1 (de) | 1969-05-22 |
DE1497194C3 (de) | 1975-02-13 |
NL6500309A (enrdf_load_stackoverflow) | 1965-08-02 |
GB1052970A (enrdf_load_stackoverflow) | |
DE1497194B2 (de) | 1974-07-04 |
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