US3309291A - Method of electroplating selected portions of an electrically conductive object - Google Patents
Method of electroplating selected portions of an electrically conductive object Download PDFInfo
- Publication number
- US3309291A US3309291A US207778A US20777862A US3309291A US 3309291 A US3309291 A US 3309291A US 207778 A US207778 A US 207778A US 20777862 A US20777862 A US 20777862A US 3309291 A US3309291 A US 3309291A
- Authority
- US
- United States
- Prior art keywords
- portions
- layer
- electrically conductive
- solution
- electrolytic
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 238000000034 method Methods 0.000 title claims description 23
- 238000009713 electroplating Methods 0.000 title claims description 5
- 238000000151 deposition Methods 0.000 claims description 15
- 229910044991 metal oxide Inorganic materials 0.000 claims description 10
- 150000004706 metal oxides Chemical class 0.000 claims description 9
- 239000000243 solution Substances 0.000 description 25
- 230000008021 deposition Effects 0.000 description 13
- 229910052751 metal Inorganic materials 0.000 description 11
- 239000002184 metal Substances 0.000 description 11
- 238000000576 coating method Methods 0.000 description 9
- 238000005868 electrolysis reaction Methods 0.000 description 9
- 239000002253 acid Substances 0.000 description 8
- 150000002739 metals Chemical class 0.000 description 8
- 239000000126 substance Substances 0.000 description 7
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 6
- 150000001875 compounds Chemical class 0.000 description 6
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 6
- 239000011248 coating agent Substances 0.000 description 5
- 230000000694 effects Effects 0.000 description 5
- 239000003792 electrolyte Substances 0.000 description 5
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 4
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 4
- 229910052804 chromium Inorganic materials 0.000 description 4
- 239000011651 chromium Substances 0.000 description 4
- 239000000463 material Substances 0.000 description 4
- BWHMMNNQKKPAPP-UHFFFAOYSA-L potassium carbonate Chemical compound [K+].[K+].[O-]C([O-])=O BWHMMNNQKKPAPP-UHFFFAOYSA-L 0.000 description 4
- 150000003839 salts Chemical class 0.000 description 4
- 238000007792 addition Methods 0.000 description 3
- 238000013019 agitation Methods 0.000 description 3
- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 description 3
- 238000005323 electroforming Methods 0.000 description 3
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 3
- 229910052737 gold Inorganic materials 0.000 description 3
- 239000010931 gold Substances 0.000 description 3
- 229910052721 tungsten Inorganic materials 0.000 description 3
- 229910052720 vanadium Inorganic materials 0.000 description 3
- COQLPRJCUIATTQ-UHFFFAOYSA-N Uranyl acetate Chemical compound O.O.O=[U]=O.CC(O)=O.CC(O)=O COQLPRJCUIATTQ-UHFFFAOYSA-N 0.000 description 2
- 150000007513 acids Chemical class 0.000 description 2
- 239000000654 additive Substances 0.000 description 2
- 230000000996 additive effect Effects 0.000 description 2
- 239000007864 aqueous solution Substances 0.000 description 2
- 239000002585 base Substances 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 239000004020 conductor Substances 0.000 description 2
- 238000005260 corrosion Methods 0.000 description 2
- 230000007797 corrosion Effects 0.000 description 2
- BDAGIHXWWSANSR-UHFFFAOYSA-N methanoic acid Natural products OC=O BDAGIHXWWSANSR-UHFFFAOYSA-N 0.000 description 2
- 229910052750 molybdenum Inorganic materials 0.000 description 2
- 229910052759 nickel Inorganic materials 0.000 description 2
- 229910052758 niobium Inorganic materials 0.000 description 2
- 239000010955 niobium Substances 0.000 description 2
- 229910000027 potassium carbonate Inorganic materials 0.000 description 2
- 230000001603 reducing effect Effects 0.000 description 2
- 238000011160 research Methods 0.000 description 2
- 229910052702 rhenium Inorganic materials 0.000 description 2
- 235000011121 sodium hydroxide Nutrition 0.000 description 2
- OSWFIVFLDKOXQC-UHFFFAOYSA-N 4-(3-methoxyphenyl)aniline Chemical compound COC1=CC=CC(C=2C=CC(N)=CC=2)=C1 OSWFIVFLDKOXQC-UHFFFAOYSA-N 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 1
- PWHULOQIROXLJO-UHFFFAOYSA-N Manganese Chemical compound [Mn] PWHULOQIROXLJO-UHFFFAOYSA-N 0.000 description 1
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 1
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 1
- KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical compound [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 description 1
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 1
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 1
- 239000005864 Sulphur Substances 0.000 description 1
- 229910052770 Uranium Inorganic materials 0.000 description 1
- 229910052783 alkali metal Inorganic materials 0.000 description 1
- 150000001340 alkali metals Chemical class 0.000 description 1
- 229910052784 alkaline earth metal Inorganic materials 0.000 description 1
- 150000001342 alkaline earth metals Chemical class 0.000 description 1
- BFNBIHQBYMNNAN-UHFFFAOYSA-N ammonium sulfate Chemical compound N.N.OS(O)(=O)=O BFNBIHQBYMNNAN-UHFFFAOYSA-N 0.000 description 1
- 229910052921 ammonium sulfate Inorganic materials 0.000 description 1
- 239000001166 ammonium sulphate Substances 0.000 description 1
- 235000011130 ammonium sulphate Nutrition 0.000 description 1
- 150000008064 anhydrides Chemical class 0.000 description 1
- 239000010953 base metal Substances 0.000 description 1
- 150000007514 bases Chemical class 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000003153 chemical reaction reagent Substances 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- KRVSOGSZCMJSLX-UHFFFAOYSA-L chromic acid Substances O[Cr](O)(=O)=O KRVSOGSZCMJSLX-UHFFFAOYSA-L 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 235000019253 formic acid Nutrition 0.000 description 1
- AWJWCTOOIBYHON-UHFFFAOYSA-N furo[3,4-b]pyrazine-5,7-dione Chemical compound C1=CN=C2C(=O)OC(=O)C2=N1 AWJWCTOOIBYHON-UHFFFAOYSA-N 0.000 description 1
- 238000000227 grinding Methods 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 125000004435 hydrogen atom Chemical class [H]* 0.000 description 1
- 229910052748 manganese Inorganic materials 0.000 description 1
- 239000011572 manganese Substances 0.000 description 1
- 239000011702 manganese sulphate Substances 0.000 description 1
- 235000007079 manganese sulphate Nutrition 0.000 description 1
- SQQMAOCOWKFBNP-UHFFFAOYSA-L manganese(II) sulfate Chemical compound [Mn+2].[O-]S([O-])(=O)=O SQQMAOCOWKFBNP-UHFFFAOYSA-L 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- -1 molyb- 6 denum Chemical compound 0.000 description 1
- MEFBJEMVZONFCJ-UHFFFAOYSA-N molybdate Chemical compound [O-][Mo]([O-])(=O)=O MEFBJEMVZONFCJ-UHFFFAOYSA-N 0.000 description 1
- VLAPMBHFAWRUQP-UHFFFAOYSA-L molybdic acid Chemical compound O[Mo](O)(=O)=O VLAPMBHFAWRUQP-UHFFFAOYSA-L 0.000 description 1
- 230000007935 neutral effect Effects 0.000 description 1
- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 description 1
- 239000011574 phosphorus Substances 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 229910052700 potassium Inorganic materials 0.000 description 1
- 239000011591 potassium Substances 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 230000003449 preventive effect Effects 0.000 description 1
- WUAPFZMCVAUBPE-UHFFFAOYSA-N rhenium atom Chemical compound [Re] WUAPFZMCVAUBPE-UHFFFAOYSA-N 0.000 description 1
- 229910052703 rhodium Inorganic materials 0.000 description 1
- 239000010948 rhodium Substances 0.000 description 1
- MHOVAHRLVXNVSD-UHFFFAOYSA-N rhodium atom Chemical compound [Rh] MHOVAHRLVXNVSD-UHFFFAOYSA-N 0.000 description 1
- 229910052707 ruthenium Inorganic materials 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 229960001922 sodium perborate Drugs 0.000 description 1
- XMVONEAAOPAGAO-UHFFFAOYSA-N sodium tungstate Chemical compound [Na+].[Na+].[O-][W]([O-])(=O)=O XMVONEAAOPAGAO-UHFFFAOYSA-N 0.000 description 1
- YKLJGMBLPUQQOI-UHFFFAOYSA-M sodium;oxidooxy(oxo)borane Chemical compound [Na+].[O-]OB=O YKLJGMBLPUQQOI-UHFFFAOYSA-M 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
- CMPGARWFYBADJI-UHFFFAOYSA-L tungstic acid Chemical compound O[W](O)(=O)=O CMPGARWFYBADJI-UHFFFAOYSA-L 0.000 description 1
- DNYWZCXLKNTFFI-UHFFFAOYSA-N uranium Chemical compound [U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U] DNYWZCXLKNTFFI-UHFFFAOYSA-N 0.000 description 1
- 125000005289 uranyl group Chemical group 0.000 description 1
- GPPXJZIENCGNKB-UHFFFAOYSA-N vanadium Chemical compound [V]#[V] GPPXJZIENCGNKB-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/02—Electroplating of selected surface areas
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D9/00—Electrolytic coating other than with metals
- C25D9/04—Electrolytic coating other than with metals with inorganic materials
- C25D9/08—Electrolytic coating other than with metals with inorganic materials by cathodic processes
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25F—PROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROM OBJECTS; APPARATUS THEREFOR
- C25F3/00—Electrolytic etching or polishing
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25F—PROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROM OBJECTS; APPARATUS THEREFOR
- C25F3/00—Electrolytic etching or polishing
- C25F3/16—Polishing
Definitions
- the present invention has for its object a process which permits of the electrolytic formation of defined portions on the surface of a conductive material, that is to say to produce as a final result a deposit by electrolytic means only on certain portions of the surface of this material.
- conductive material is understood to mean not only those materials or objects which are inherently conductive but also those materials which are not themselves conductive but which are made superficially so by means of an appropriate process.
- the present invention makes use of the process which mainly consists, in a first phase of the process, in producing an appropriate deposition on those portions of the conductive surface which must appear as separately defined portions, and then in subsequently etfecting the final'deposition, the first deposit being such that the second deposit will not adhere to the surface thereof.
- the object to be treated is then found to be coated with the second deposit solely in those places which have not been touched by the first deposit.
- Those portions of the object to be treated to which the final deposit does not have to be applied can therefore be coated with such oxidized combinations, this being effected either by electrolytic anodic treatment of the object itself, or by anodic deposition of metallic oxides starting from an aqueous solution of metals such as lead, copper, etc. or other non-electrolytic processes.
- the object is subjected to the intense reducing action of the cathode zone which is rich in active hydrogen, and the abovementioned oxidized combinations are non-stable, so that under these conditions, they are more or less rapidly destroyed. It is consequently not possible to apply the said oxidized combinations in very thin layers as it would be desirable to do.
- the layers which are employed in the present invention for the purpose of forming the defined portions are accordingly produced by electrolytic cathodic deposition from solutions of salts of these metals with acids or else of salts obtained from the anhydrides or the acid oxides of these metals and alkali metals or alkaline-earth metals, etc. It will be understood that the electrolysis solution could comprise known additions in order to make conductive or to stabilize the solutions which have just been defined.
- the coatings which are thus formed in the first phase of the process are stable during the normal electrolysis which constitutes the second phase of the said process since the said coatings have been formed in a cathodic reducing medium. It can therefore be made possible to execute these depositions of resists or defined portions only in such manner as to form layers of extremely small thickness which can be appreciably less than one hundredth of a micron.
- resists of oxide which can be eliminated by chemical dissolving or by anodic treatment in solutions, for example, which have low conductivity and at voltages such that the base metal is at a potential which is lower than the anode potential of corrosion of the workpiece.
- the resists thus produced can have extremely accurate definition since their thickness is extraordinarily small. Their adherence is perfect and they are stable in the cathode zone of normal electrolysls.
- conductive printed circuits having a very marked definition. Accordingly, when a pattern made of a material which is non-soluble in solutions of salts has been placed on a conductive plate, the work-piece is treated so as to permit of the first deposition, that is to say, so as to receive a cathodic coating of an oxidized compound which is formed only on that surface of the work-piece which is not covered by the pattern. It is subsequently merely necessary to remove this pattern, for example by means of a solvent, thereby leaving the metallic surface uncovered solely in the place occupied by this pattern.
- an electrolytic treatment for the deposition for example, of gold, which does not adhere to the oxidized layer when this latter is constituted by V, Mo, W, etc.
- the final coating can be of any thickness desired but the base thereof follows the initial outline with great precision and can, for example, serve to provide protection from a dissolving action on the metallic base.
- the work-piece to be treated can, for example, be entirely coated with the oxidized resist layer such as has been described in the foregoing, following which it is possible to impress any outline desired on this layer by means of a substance which is proof against anodic re-solution. If this anodic re-solution is then carried into effect, the work-piece is provided with a defined portion of small thickness which is identical to the impressed outline.
- the operation can be carried out in a similar manner, but the above-mentioned outline can be formed by mechanical means and only the uncovered portions will receive the electrolytic deposition which is effected in the second phase of the process.
- the process in accordance with the invention also facilitates various combinations of phases which are either diflicult or impossible to carry into practical effect by means of processes of the prior art. It is possible, for example, to coat the surface to be treated following an outline which is determined by an oxidized compound, then to proceed to the execution of the second phase, the electrolytic deposit only adhering to those portions which are not coated with the oxidized compound. The object is then made anodic, thereby dissolving the oxidized coating, and this is continued by the normal electrolytic deposition which then takes place over the entire surface of the object.
- the process in accordance with the invention can be put into operation in electrochemical anode treatment such as, for example, electropolishing, electroforming and similar processes.
- electrochemical anode treatment such as, for example, electropolishing, electroforming and similar processes.
- the action of the electrolyte attacks the part or parts which are subjected to the treatment and which constitute an anode; the parts which serve as cathodes have an auxiliary function and must not be adulterated by deposits, especially by deposits which are liable to form owing to the electrolysis of the solution of the substances attacked.
- the cathodes can be treated in accordance with the invention, and prior to the utilization of the said cathodes in the electropolishing or electroforming cycle, this treatment being carried out, for example, with one of the solutions which are indicated hereunder by way of example.
- Steps will be taken to ensure, however, for example by means of a preliminary test, that the solution which is employed and which serves as an additive is compatible with electrolyte employed and that, for example, the additive has an acid reaction when the principal electrolyte itself has an acid reaction.
- the solutions which are introduced by way of addition agents can be mixed with the electrochemical treatment bath proper, either prior to starting the treatment contemplated or during the said treatment, or finally in an intermittent manner, while the said solutions can also be introduced in the said bath in a continuous manner.
- Example I 100 grams of hydrated manganese sulphate, then 100 grams of ammonium sulphate and 8 grams of crystallized citric acid are dissolved in a sufficient quantity of water to make 1 litre.
- the electrolysis must then be effected by placing the metal to be protected as the cathode and the operation carried out at a voltage of 6 to 8 volts and a current density of 30 to A./dm. for a period of 20 to 30 seconds.
- the layer thus formed is sufiicient to prevent subsequently any deposition of chromium, for example in baths of chromic acid or of trivalent chromium.
- Example 11 Dissolve 100 grams of uranyl acetate in 1 litre of water and, in addition, 300 grams of potassium carbonate in 2 litres of water. Pour the solution of potassium carbonate while agitating into the solution of uranyl acetate; there is initially formed a non-soluble basic compound which is subsequently dissolved in the excess reagent so as to form a compound of uranyl and soluble potassium.
- the electrolysis voltage is from 5 to 7 volts at a current density of 20 to 50 A./dm. for a period of 15 to 20 seconds.
- the layer which is thus formed is sufiicient to prevent electrolytic deposits form acid baths of nickel and of chromium in particular.
- Example III (a) Preparation of a solution of molybdate of sodium, this latter being obtained by dissolving 320 grams of anhydrous sodium carbonate in 700 to 800 millilitres of water which is brought to 0.; there is then progressively added with agitation grams of powdered molybdic acid (M00 When the entire mixture has dis-- solved, it is cooled, filtered and diluted to 1 litre.
- a method of electroplating selected portions of an electrically conductive object which comprises providing 5 a cathodically electrodeposited thin layer of a metal oxide on portions of the object, electrolytically depositing a metallic layer on the portions of the object not coated with the layer of metal oxide and anodically removing the cathodically deposited metal oxide layer.
- a method of electroplating selected portions of an electrically conductive object which comprises in sequence topically applying to the portions of said object to be plated a substance resistant to cathodic deposition, cathodically electrodepositing a thin layer of a metal oxide on the portions of said object unprotected by the resistant substance, removing the resistant substance, electrodpositing a metal on the portions of the object from Which the resistant substance has been removed and anodically removing the cathodically deposited metal oxide layer.
- cathodically electrodeposited metal oxide is an oxide of a metal selected from the group consisting of vanadium, molyb- 6 denum, tungsten, uranium, rhenium, ruthenium, manganese and niobium.
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Electroplating And Plating Baths Therefor (AREA)
- ing And Chemical Polishing (AREA)
- Manufacturing Of Printed Circuit Boards (AREA)
- Electroplating Methods And Accessories (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR867298A FR1301433A (fr) | 1961-07-07 | 1961-07-07 | Procédé pour l'obtention électrolytique de réserves sur une surface conductrice,et objets obtenus par application de ce procédé |
FR897892A FR81670E (fr) | 1961-07-07 | 1962-05-17 | Procédé pour l'obtention électrolytique de réserves sur une surface conductrice, et objets obtenus par application de ce procédé |
Publications (1)
Publication Number | Publication Date |
---|---|
US3309291A true US3309291A (en) | 1967-03-14 |
Family
ID=26191376
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US207778A Expired - Lifetime US3309291A (en) | 1961-07-07 | 1962-07-05 | Method of electroplating selected portions of an electrically conductive object |
Country Status (10)
Country | Link |
---|---|
US (1) | US3309291A (en, 2012) |
BE (1) | BE619563A (en, 2012) |
CH (1) | CH420776A (en, 2012) |
DE (1) | DE1446009B2 (en, 2012) |
DK (1) | DK123752B (en, 2012) |
ES (1) | ES279178A1 (en, 2012) |
FR (2) | FR1301433A (en, 2012) |
GB (1) | GB1007662A (en, 2012) |
NL (2) | NL280474A (en, 2012) |
SE (1) | SE312257B (en, 2012) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5215606A (en) * | 1988-08-15 | 1993-06-01 | Zivaco, Co., Ltd. | Method for preparing decorative lacquered Ti-based articles |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3708403A (en) * | 1971-09-01 | 1973-01-02 | L Terry | Self-aligning electroplating mask |
JPS51112439A (en) * | 1975-03-28 | 1976-10-04 | Hitachi Maxell | Method of fabricating matrix for electrocasting |
US4217181A (en) | 1978-06-09 | 1980-08-12 | National Research Development Corporation | Recovery of uranium oxides by electrolysis |
US5122256A (en) * | 1991-05-24 | 1992-06-16 | Waskiewicz Walter P | Method for selectively coating surfaces of components |
Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2215167A (en) * | 1937-03-30 | 1940-09-17 | Crosse & Blackwell Ltd | Process of protecting metal surfaces by electrodeposition |
US2541083A (en) * | 1945-08-25 | 1951-02-13 | Sperry Corp | Electroplating on aluminum |
US2594820A (en) * | 1947-04-10 | 1952-04-29 | Stern Charles | Process for manufacturing timepiece dials |
US2631115A (en) * | 1949-08-06 | 1953-03-10 | Manganese Battery Corp | Electrodes for electrochemical cells |
US2794775A (en) * | 1954-05-21 | 1957-06-04 | Western Union Telegraph Co | Electroplating with tungsten |
US2846378A (en) * | 1956-02-07 | 1958-08-05 | American Potash & Chem Corp | Electrode and its manufacture |
US2965551A (en) * | 1956-08-08 | 1960-12-20 | Pechiney Prod Chimiques Sa | Metal plating process |
-
0
- NL NL137511D patent/NL137511C/xx active
- NL NL280474D patent/NL280474A/xx unknown
-
1961
- 1961-07-07 FR FR867298A patent/FR1301433A/fr not_active Expired
-
1962
- 1962-05-17 FR FR897892A patent/FR81670E/fr not_active Expired
- 1962-06-27 GB GB24610/62A patent/GB1007662A/en not_active Expired
- 1962-06-29 BE BE619563A patent/BE619563A/fr unknown
- 1962-07-02 CH CH800762A patent/CH420776A/fr unknown
- 1962-07-04 DK DK297562AA patent/DK123752B/da unknown
- 1962-07-05 US US207778A patent/US3309291A/en not_active Expired - Lifetime
- 1962-07-06 SE SE7611/62A patent/SE312257B/xx unknown
- 1962-07-06 ES ES0279178A patent/ES279178A1/es not_active Expired
- 1962-07-06 DE DE19621446009 patent/DE1446009B2/de not_active Withdrawn
Patent Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2215167A (en) * | 1937-03-30 | 1940-09-17 | Crosse & Blackwell Ltd | Process of protecting metal surfaces by electrodeposition |
US2541083A (en) * | 1945-08-25 | 1951-02-13 | Sperry Corp | Electroplating on aluminum |
US2594820A (en) * | 1947-04-10 | 1952-04-29 | Stern Charles | Process for manufacturing timepiece dials |
US2631115A (en) * | 1949-08-06 | 1953-03-10 | Manganese Battery Corp | Electrodes for electrochemical cells |
US2794775A (en) * | 1954-05-21 | 1957-06-04 | Western Union Telegraph Co | Electroplating with tungsten |
US2846378A (en) * | 1956-02-07 | 1958-08-05 | American Potash & Chem Corp | Electrode and its manufacture |
US2965551A (en) * | 1956-08-08 | 1960-12-20 | Pechiney Prod Chimiques Sa | Metal plating process |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5215606A (en) * | 1988-08-15 | 1993-06-01 | Zivaco, Co., Ltd. | Method for preparing decorative lacquered Ti-based articles |
Also Published As
Publication number | Publication date |
---|---|
BE619563A (fr) | 1962-12-31 |
SE312257B (en, 2012) | 1969-07-07 |
GB1007662A (en) | 1965-10-22 |
DK123752B (da) | 1972-07-31 |
DE1446009B2 (de) | 1970-10-15 |
FR81670E (fr) | 1963-10-25 |
CH420776A (fr) | 1966-09-15 |
NL280474A (en, 2012) | |
ES279178A1 (es) | 1962-12-01 |
NL137511C (en, 2012) | |
FR1301433A (fr) | 1962-08-17 |
DE1446009A1 (de) | 1969-01-16 |
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