US3190821A - Nickel plating brightener - Google Patents

Nickel plating brightener Download PDF

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Publication number
US3190821A
US3190821A US168229A US16822962A US3190821A US 3190821 A US3190821 A US 3190821A US 168229 A US168229 A US 168229A US 16822962 A US16822962 A US 16822962A US 3190821 A US3190821 A US 3190821A
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Prior art keywords
pyridinium
nickel
chloride
brightener
brighteners
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Expired - Lifetime
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US168229A
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English (en)
Inventor
Todt Hans Gunther
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Bayer Pharma AG
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Schering AG
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Filing date
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Classifications

    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D213/00Heterocyclic compounds containing six-membered rings, not condensed with other rings, with one nitrogen atom as the only ring hetero atom and three or more double bonds between ring members or between ring members and non-ring members
    • C07D213/02Heterocyclic compounds containing six-membered rings, not condensed with other rings, with one nitrogen atom as the only ring hetero atom and three or more double bonds between ring members or between ring members and non-ring members having three double bonds between ring members or between ring members and non-ring members
    • C07D213/04Heterocyclic compounds containing six-membered rings, not condensed with other rings, with one nitrogen atom as the only ring hetero atom and three or more double bonds between ring members or between ring members and non-ring members having three double bonds between ring members or between ring members and non-ring members having no bond between the ring nitrogen atom and a non-ring member or having only hydrogen or carbon atoms directly attached to the ring nitrogen atom
    • C07D213/06Heterocyclic compounds containing six-membered rings, not condensed with other rings, with one nitrogen atom as the only ring hetero atom and three or more double bonds between ring members or between ring members and non-ring members having three double bonds between ring members or between ring members and non-ring members having no bond between the ring nitrogen atom and a non-ring member or having only hydrogen or carbon atoms directly attached to the ring nitrogen atom containing only hydrogen and carbon atoms in addition to the ring nitrogen atom
    • C07D213/16Heterocyclic compounds containing six-membered rings, not condensed with other rings, with one nitrogen atom as the only ring hetero atom and three or more double bonds between ring members or between ring members and non-ring members having three double bonds between ring members or between ring members and non-ring members having no bond between the ring nitrogen atom and a non-ring member or having only hydrogen or carbon atoms directly attached to the ring nitrogen atom containing only hydrogen and carbon atoms in addition to the ring nitrogen atom containing only one pyridine ring
    • C07D213/20Quaternary compounds thereof
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D215/00Heterocyclic compounds containing quinoline or hydrogenated quinoline ring systems
    • C07D215/02Heterocyclic compounds containing quinoline or hydrogenated quinoline ring systems having no bond between the ring nitrogen atom and a non-ring member or having only hydrogen atoms or carbon atoms directly attached to the ring nitrogen atom
    • C07D215/04Heterocyclic compounds containing quinoline or hydrogenated quinoline ring systems having no bond between the ring nitrogen atom and a non-ring member or having only hydrogen atoms or carbon atoms directly attached to the ring nitrogen atom with only hydrogen atoms or radicals containing only hydrogen and carbon atoms, directly attached to the ring carbon atoms
    • C07D215/10Quaternary compounds
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00Electroplating: Baths therefor
    • C25D3/02Electroplating: Baths therefor from solutions
    • C25D3/12Electroplating: Baths therefor from solutions of nickel or cobalt
    • C25D3/14Electroplating: Baths therefor from solutions of nickel or cobalt from baths containing acetylenic or heterocyclic compounds
    • C25D3/18Heterocyclic compounds

Definitions

  • This invention relates to the electrodeposition of-n ickel, and more particularly to organic compounds which may be added to conventional nickel plating electrolytes, and whichcause the normally dull nickel deposit to be bright and lustrous.
  • Heterocyclic organic nitrogen compounds have previously been found to be particularly effective primary brigh-teners when employed singly or in conjunction with such secondary brighteners as the aforementioned sulfonic acids, sulfonamides, and sulfonimides.
  • known nitrogen bearing cyclic compounds as a class have anunfavorable efiect on the ductility of the nickel coating.
  • the brighteners of the invention are salt-like compounds in which two nitrogen bearing ring systems are connected by the positive charge of one-ring system and the negative charge of a radical attached to the other ring system.
  • Suitable ring systems arejderived from pyridine, the diazines, such as pyrimidine, and py-r-azi-ne, benzopyridines, such as quinoline and isoquinoline, and benzodiazines, such as quinazoline and quinoxaline.
  • the cyclic cores of these ring systems may be substituted at one or more carbon atoms by lower alkyl and alkenyl radicals such as methyl, ethyl, or vinyl radicals, by lower alkoxy radicals such as methoxy and ethoxy radicals, by loweralkaminoradicals such as methylamino and ethylamino radicals, by lower alkanoyl groups such as wherein Yet, the p extent that hairline cracks spontaneously form.
  • lower alkyl and alkenyl radicals such as methyl, ethyl, or vinyl radicals
  • lower alkoxy radicals such as methoxy and ethoxy radicals
  • loweralkaminoradicals such as methylamino and ethylamino radicals
  • lower alkanoyl groups such as wherein Yet, the p extent that hairline cracks spontaneously form.
  • the preferred negatively charged radicals R are the the nickel sulfamate bath, or the nickel fluoborate bath.
  • the brightening compounds of the invention have a strong inhibitor effect. As it is possible to employ them at relatively high concentrations without loss of desirable mechanical properties in the nickel deposit, electrolytes including the brighteners of the invention have excellent levelling propertes, and are superior in this respect to the best known brighteners based on pyridine or quinoline derivatives. Nickel plated objects having satisfactory surface fiatness and high luster may thus be obtained by nickel plating on coarsely prepared base metal.
  • the nitrogen bearing heterocyclic compounds of the invention are effective brighteners when employed singly. Greatest brightness and best levelling are achieved when the brighteners of the invention are employed jointly with known secondary brighteners such as aliphatic and aromatic sulfonic acids, sulfonamides, and sulfonimides.
  • secondary brighteners such as aliphatic and aromatic sulfonic acids, sulfonamides, and sulfonimides.
  • the nickel salts, alkali metal salts, and other soluble salts of the sulfonic acids which are compatible with the plating solution will be understood to be included in the term sulfonic acid as employed in this specification and the appended claims.
  • the addition agents usually employed in nickel plating electrolytes to control pore formation due to hydrogen bubbles, wetting agents and the like may be employed concurrently with the brighteners and brightener combinations of the invention.
  • the novel brighteners are also compatible with cobalt salts and many known brighteners so that those skilled in the art will find it possible to modify existing bright nickel plating electrolytes by gradually replacing conventional brighteners with those of the invention.
  • Nickel plating electrolytes and preferred conditions of their operation are given in the following examples, but it will be understood that the invention is not limited to the specific brightening compounds mentioned in these examples, and that other brighteners satisfying the structural requirements initially set forth, and more specifically the compounds listed in Table I may be substituted for the primary brighteners mentioned in the examples without materially affecting the results achieved.
  • Example I Nickel sulfate grams per liter 260 Nickel chloride d0 50 Boric acid d0 40 Sodium o formylbenzenesulfonate do 2.0 Pyridinium-(pyridinium-N-acetate) chloride do 0.6 Temperature, C. 55 pH 4.6 Cathode current density, actual, amperes per square decimeter 0.5 to 6.0 Cathode current density, average, amperes per square decimeter 5.0
  • Example II Nickel sulfate "grams per liter..- 240 Sodium chloride do 40 Boric acid do 30 Sodium vinylsulfonate do 0.5 O-Benzoylsulfonimide do 0.5 Pyrimidinium-(pyridinium-N-methylsulfonate) chloride grams per liter-.. 0.4 Temperature, C. '50
  • Cathode current density actual, amperes per square decimeter 0.5 to 5.0
  • Cathode current density average, amperes per square decimeter 4.0
  • Example IV Nickel sulf-amate grams per liter 300 Nickel chloride do.. 30 Boric acid do 30 Sodium vinylsul-fonate d-o 0.5 Dibenzene-disulfonimide do.... 0.5 4 Cyanopyridinium (pyridinium N propylsulfo nate)chloride grarns per liter 0.4 Temperature, C. 40 pH 4.0 Cathode current density, actual, amperes per square decimeter 0.5 to 6.0 Cathode current density, average, amperes per square decimeter 5.0
  • An electrolyte for the electrodeposition of bright ductile nickel coatings comprising in aqueous solution at least one nickel salt and a brightener which is an organic heterocyclic nitrogen compound of the formula are nitrogen bearing rings, 11 is an integer between 1 and 5, and R is an anion selected from the group consisting of halogen and the hydroxyl radical.
  • An electrolyte for the electrodeposition of bright ductile nickel coatings comprising in aqueous solution at least one nickel salt and a brightener which is an organic heterocyclic nitrogen compound of the formula are nitrogen bearing rings, n is an integer between 1 and 5, and R is an anion selected from the group consisting of halogen and the hydroxyl radical.
  • An electrolyte for the electrodeposition of bright ductile nickel coatings comprising in aqueous solution at least one nickel salt and a brightener which is an organic heterocyclic nitrogen compound of the formula wherein n is an integer between 1 and 5,
  • 6 Y -R' is an anion selected from the group consisting of a halogen and a hydroxyl radical.

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Electroplating And Plating Baths Therefor (AREA)
  • Pyridine Compounds (AREA)
US168229A 1961-02-10 1962-01-23 Nickel plating brightener Expired - Lifetime US3190821A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DESCH29218A DE1173762B (de) 1961-02-10 1961-02-10 Saures galvanisches Nickelbad

Publications (1)

Publication Number Publication Date
US3190821A true US3190821A (en) 1965-06-22

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ID=7431357

Family Applications (1)

Application Number Title Priority Date Filing Date
US168229A Expired - Lifetime US3190821A (en) 1961-02-10 1962-01-23 Nickel plating brightener

Country Status (4)

Country Link
US (1) US3190821A (xx)
DE (1) DE1173762B (xx)
GB (1) GB921560A (xx)
NL (2) NL274123A (xx)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3300395A (en) * 1962-09-05 1967-01-24 Dehydag Gmbh Nickel electroplating baths and processes
US3953304A (en) * 1975-06-23 1976-04-27 Dart Industries Inc. Electroplating baths for nickel and brightener-leveler compositions therefor
US20110160187A1 (en) * 2004-05-08 2011-06-30 Neurogen Corporation 3-aryl-5,6-disubstituted pyridazines
CN111065763A (zh) * 2017-09-13 2020-04-24 德国艾托特克公司 以镍或镍合金填充工件的垂直互连通道或沟的浴和方法

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB638868A (en) * 1946-04-20 1950-06-14 Udylite Corp Improvement in electrodeposition of nickel from an acid bath
US2644789A (en) * 1951-08-02 1953-07-07 Harshaw Chem Corp Electrodeposition of nickel
DE1004011B (de) * 1955-03-16 1957-03-07 Dehydag Gmbh Saures galvanisches Nickelbad
US2839460A (en) * 1956-11-16 1958-06-17 Hanson Van Winkle Munning Co Electrolating
DE1092744B (de) * 1958-12-17 1960-11-10 Dehydag Gmbh Saures galvanisches Nickelbad
US3008883A (en) * 1958-12-18 1961-11-14 Metal & Thermit Corp Electrodeposition of bright nickel

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2644788A (en) * 1951-03-31 1953-07-07 Harshaw Chem Corp Electrodeposition of nickel

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB638868A (en) * 1946-04-20 1950-06-14 Udylite Corp Improvement in electrodeposition of nickel from an acid bath
US2644789A (en) * 1951-08-02 1953-07-07 Harshaw Chem Corp Electrodeposition of nickel
DE1004011B (de) * 1955-03-16 1957-03-07 Dehydag Gmbh Saures galvanisches Nickelbad
US2839460A (en) * 1956-11-16 1958-06-17 Hanson Van Winkle Munning Co Electrolating
DE1092744B (de) * 1958-12-17 1960-11-10 Dehydag Gmbh Saures galvanisches Nickelbad
US3008883A (en) * 1958-12-18 1961-11-14 Metal & Thermit Corp Electrodeposition of bright nickel

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3300395A (en) * 1962-09-05 1967-01-24 Dehydag Gmbh Nickel electroplating baths and processes
US3953304A (en) * 1975-06-23 1976-04-27 Dart Industries Inc. Electroplating baths for nickel and brightener-leveler compositions therefor
US20110160187A1 (en) * 2004-05-08 2011-06-30 Neurogen Corporation 3-aryl-5,6-disubstituted pyridazines
US8338591B2 (en) * 2004-05-08 2012-12-25 Novartis International Pharmaceutical Ltd. 3-aryl-5,6-disubstituted pyridazines
CN111065763A (zh) * 2017-09-13 2020-04-24 德国艾托特克公司 以镍或镍合金填充工件的垂直互连通道或沟的浴和方法
CN111065763B (zh) * 2017-09-13 2022-10-11 德国艾托特克公司 以镍或镍合金填充工件的垂直互连通道或沟的浴和方法

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Publication number Publication date
NL132763C (xx)
GB921560A (en) 1963-03-20
DE1173762B (de) 1964-07-09
NL274123A (xx)

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