US3121644A - Chemical nickel plating of magnesium and its alloys - Google Patents
Chemical nickel plating of magnesium and its alloys Download PDFInfo
- Publication number
- US3121644A US3121644A US159745A US15974561A US3121644A US 3121644 A US3121644 A US 3121644A US 159745 A US159745 A US 159745A US 15974561 A US15974561 A US 15974561A US 3121644 A US3121644 A US 3121644A
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- nickel
- plating bath
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- workpiece
- metal surface
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- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 title claims description 160
- 238000007747 plating Methods 0.000 title claims description 96
- 229910052759 nickel Inorganic materials 0.000 title claims description 83
- 239000000126 substance Substances 0.000 title claims description 49
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 title claims description 28
- 239000011777 magnesium Substances 0.000 title claims description 23
- 229910052749 magnesium Inorganic materials 0.000 title claims description 23
- 229910045601 alloy Inorganic materials 0.000 title description 15
- 239000000956 alloy Substances 0.000 title description 15
- 238000000576 coating method Methods 0.000 claims description 46
- 239000011248 coating agent Substances 0.000 claims description 38
- 229910052751 metal Inorganic materials 0.000 claims description 37
- 239000002184 metal Substances 0.000 claims description 37
- 238000000034 method Methods 0.000 claims description 29
- 239000002253 acid Substances 0.000 claims description 20
- VEQPNABPJHWNSG-UHFFFAOYSA-N Nickel(2+) Chemical compound [Ni+2] VEQPNABPJHWNSG-UHFFFAOYSA-N 0.000 claims description 17
- 238000005554 pickling Methods 0.000 claims description 15
- 229910001453 nickel ion Inorganic materials 0.000 claims description 14
- 150000001450 anions Chemical class 0.000 claims description 11
- 238000004140 cleaning Methods 0.000 claims description 6
- ACVYVLVWPXVTIT-UHFFFAOYSA-M phosphinate Chemical compound [O-][PH2]=O ACVYVLVWPXVTIT-UHFFFAOYSA-M 0.000 claims description 3
- -1 nickel cations Chemical class 0.000 description 58
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 27
- 230000008569 process Effects 0.000 description 20
- 229910052810 boron oxide Inorganic materials 0.000 description 16
- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 description 15
- 229910052783 alkali metal Inorganic materials 0.000 description 14
- 239000007864 aqueous solution Substances 0.000 description 12
- 239000000203 mixture Substances 0.000 description 12
- 239000002738 chelating agent Substances 0.000 description 10
- 230000003139 buffering effect Effects 0.000 description 9
- 150000003839 salts Chemical class 0.000 description 9
- DHMQDGOQFOQNFH-UHFFFAOYSA-N Glycine Chemical compound NCC(O)=O DHMQDGOQFOQNFH-UHFFFAOYSA-N 0.000 description 8
- 229910000861 Mg alloy Inorganic materials 0.000 description 8
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 7
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 6
- 239000002131 composite material Substances 0.000 description 6
- 238000010438 heat treatment Methods 0.000 description 5
- 150000002500 ions Chemical class 0.000 description 5
- MOWNZPNSYMGTMD-UHFFFAOYSA-N oxidoboron Chemical class O=[B] MOWNZPNSYMGTMD-UHFFFAOYSA-N 0.000 description 5
- OFNHPGDEEMZPFG-UHFFFAOYSA-N phosphanylidynenickel Chemical compound [P].[Ni] OFNHPGDEEMZPFG-UHFFFAOYSA-N 0.000 description 5
- 229910001096 P alloy Inorganic materials 0.000 description 4
- 150000007513 acids Chemical class 0.000 description 4
- 230000015572 biosynthetic process Effects 0.000 description 4
- 230000007547 defect Effects 0.000 description 4
- 229960002449 glycine Drugs 0.000 description 4
- 235000013905 glycine and its sodium salt Nutrition 0.000 description 4
- 229910052739 hydrogen Inorganic materials 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 4
- XXSPKSHUSWQAIZ-UHFFFAOYSA-L 36026-88-7 Chemical compound [Ni+2].[O-]P=O.[O-]P=O XXSPKSHUSWQAIZ-UHFFFAOYSA-L 0.000 description 3
- DDFHBQSCUXNBSA-UHFFFAOYSA-N 5-(5-carboxythiophen-2-yl)thiophene-2-carboxylic acid Chemical compound S1C(C(=O)O)=CC=C1C1=CC=C(C(O)=O)S1 DDFHBQSCUXNBSA-UHFFFAOYSA-N 0.000 description 3
- MIMUSZHMZBJBPO-UHFFFAOYSA-N 6-methoxy-8-nitroquinoline Chemical compound N1=CC=CC2=CC(OC)=CC([N+]([O-])=O)=C21 MIMUSZHMZBJBPO-UHFFFAOYSA-N 0.000 description 3
- 238000005234 chemical deposition Methods 0.000 description 3
- 230000001276 controlling effect Effects 0.000 description 3
- 230000001419 dependent effect Effects 0.000 description 3
- JKWMSGQKBLHBQQ-UHFFFAOYSA-N diboron trioxide Chemical compound O=BOB=O JKWMSGQKBLHBQQ-UHFFFAOYSA-N 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- LGQLOGILCSXPEA-UHFFFAOYSA-L nickel sulfate Chemical compound [Ni+2].[O-]S([O-])(=O)=O LGQLOGILCSXPEA-UHFFFAOYSA-L 0.000 description 3
- 229910000363 nickel(II) sulfate Inorganic materials 0.000 description 3
- ACVYVLVWPXVTIT-UHFFFAOYSA-N phosphinic acid Chemical compound O[PH2]=O ACVYVLVWPXVTIT-UHFFFAOYSA-N 0.000 description 3
- 241000894007 species Species 0.000 description 3
- ALRHLSYJTWAHJZ-UHFFFAOYSA-N 3-hydroxypropionic acid Chemical compound OCCC(O)=O ALRHLSYJTWAHJZ-UHFFFAOYSA-N 0.000 description 2
- KWSLGOVYXMQPPX-UHFFFAOYSA-N 5-[3-(trifluoromethyl)phenyl]-2h-tetrazole Chemical compound FC(F)(F)C1=CC=CC(C2=NNN=N2)=C1 KWSLGOVYXMQPPX-UHFFFAOYSA-N 0.000 description 2
- VHUUQVKOLVNVRT-UHFFFAOYSA-N Ammonium hydroxide Chemical compound [NH4+].[OH-] VHUUQVKOLVNVRT-UHFFFAOYSA-N 0.000 description 2
- CKLJMWTZIZZHCS-UHFFFAOYSA-N D-OH-Asp Natural products OC(=O)C(N)CC(O)=O CKLJMWTZIZZHCS-UHFFFAOYSA-N 0.000 description 2
- RGHNJXZEOKUKBD-SQOUGZDYSA-N D-gluconic acid Chemical compound OC[C@@H](O)[C@@H](O)[C@H](O)[C@@H](O)C(O)=O RGHNJXZEOKUKBD-SQOUGZDYSA-N 0.000 description 2
- AEMRFAOFKBGASW-UHFFFAOYSA-N Glycolic acid Chemical compound OCC(O)=O AEMRFAOFKBGASW-UHFFFAOYSA-N 0.000 description 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 2
- CKLJMWTZIZZHCS-REOHCLBHSA-N L-aspartic acid Chemical compound OC(=O)[C@@H](N)CC(O)=O CKLJMWTZIZZHCS-REOHCLBHSA-N 0.000 description 2
- 241000080590 Niso Species 0.000 description 2
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 2
- 239000000908 ammonium hydroxide Substances 0.000 description 2
- UCMIRNVEIXFBKS-UHFFFAOYSA-N beta-alanine Chemical compound NCCC(O)=O UCMIRNVEIXFBKS-UHFFFAOYSA-N 0.000 description 2
- 150000001768 cations Chemical class 0.000 description 2
- KRVSOGSZCMJSLX-UHFFFAOYSA-L chromic acid Substances O[Cr](O)(=O)=O KRVSOGSZCMJSLX-UHFFFAOYSA-L 0.000 description 2
- 239000000470 constituent Substances 0.000 description 2
- 230000000875 corresponding effect Effects 0.000 description 2
- 238000000354 decomposition reaction Methods 0.000 description 2
- 238000010790 dilution Methods 0.000 description 2
- 239000012895 dilution Substances 0.000 description 2
- AWJWCTOOIBYHON-UHFFFAOYSA-N furo[3,4-b]pyrazine-5,7-dione Chemical compound C1=CN=C2C(=O)OC(=O)C2=N1 AWJWCTOOIBYHON-UHFFFAOYSA-N 0.000 description 2
- 239000001257 hydrogen Substances 0.000 description 2
- ROBFUDYVXSDBQM-UHFFFAOYSA-N hydroxymalonic acid Chemical compound OC(=O)C(O)C(O)=O ROBFUDYVXSDBQM-UHFFFAOYSA-N 0.000 description 2
- 239000004615 ingredient Substances 0.000 description 2
- JVTAAEKCZFNVCJ-UHFFFAOYSA-N lactic acid Chemical compound CC(O)C(O)=O JVTAAEKCZFNVCJ-UHFFFAOYSA-N 0.000 description 2
- ORUIBWPALBXDOA-UHFFFAOYSA-L magnesium fluoride Chemical compound [F-].[F-].[Mg+2] ORUIBWPALBXDOA-UHFFFAOYSA-L 0.000 description 2
- 229910001635 magnesium fluoride Inorganic materials 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 229910052698 phosphorus Inorganic materials 0.000 description 2
- 239000011574 phosphorus Substances 0.000 description 2
- 235000021110 pickles Nutrition 0.000 description 2
- 239000002244 precipitate Substances 0.000 description 2
- 238000001556 precipitation Methods 0.000 description 2
- 230000001681 protective effect Effects 0.000 description 2
- 238000002791 soaking Methods 0.000 description 2
- PUZPDOWCWNUUKD-UHFFFAOYSA-M sodium fluoride Chemical compound [F-].[Na+] PUZPDOWCWNUUKD-UHFFFAOYSA-M 0.000 description 2
- 229910001379 sodium hypophosphite Inorganic materials 0.000 description 2
- 159000000000 sodium salts Chemical class 0.000 description 2
- 230000002269 spontaneous effect Effects 0.000 description 2
- 239000003381 stabilizer Substances 0.000 description 2
- 230000000087 stabilizing effect Effects 0.000 description 2
- VGVLFMIJNWWPBR-UHFFFAOYSA-N 2,2,3-trihydroxypentanedioic acid Chemical compound OC(=O)CC(O)C(O)(O)C(O)=O VGVLFMIJNWWPBR-UHFFFAOYSA-N 0.000 description 1
- QWCKQJZIFLGMSD-UHFFFAOYSA-N 2-Aminobutanoic acid Natural products CCC(N)C(O)=O QWCKQJZIFLGMSD-UHFFFAOYSA-N 0.000 description 1
- QNAYBMKLOCPYGJ-UHFFFAOYSA-N D-alpha-Ala Natural products CC([NH3+])C([O-])=O QNAYBMKLOCPYGJ-UHFFFAOYSA-N 0.000 description 1
- QWCKQJZIFLGMSD-GSVOUGTGSA-N D-alpha-aminobutyric acid Chemical compound CC[C@@H](N)C(O)=O QWCKQJZIFLGMSD-GSVOUGTGSA-N 0.000 description 1
- RGHNJXZEOKUKBD-UHFFFAOYSA-N D-gluconic acid Natural products OCC(O)C(O)C(O)C(O)C(O)=O RGHNJXZEOKUKBD-UHFFFAOYSA-N 0.000 description 1
- QNAYBMKLOCPYGJ-REOHCLBHSA-N L-alanine Chemical compound C[C@H](N)C(O)=O QNAYBMKLOCPYGJ-REOHCLBHSA-N 0.000 description 1
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
- 229910020282 Pb(OH) Inorganic materials 0.000 description 1
- PMZURENOXWZQFD-UHFFFAOYSA-L Sodium Sulfate Chemical compound [Na+].[Na+].[O-]S([O-])(=O)=O PMZURENOXWZQFD-UHFFFAOYSA-L 0.000 description 1
- FEWJPZIEWOKRBE-UHFFFAOYSA-N Tartaric Acid Chemical compound [H+].[H+].[O-]C(=O)C(O)C(O)C([O-])=O FEWJPZIEWOKRBE-UHFFFAOYSA-N 0.000 description 1
- NPTTZSYLTYJCPR-UHFFFAOYSA-N Trihydroxy-glutarsaeure Natural products OC(=O)C(O)C(O)C(O)C(O)=O NPTTZSYLTYJCPR-UHFFFAOYSA-N 0.000 description 1
- 229910009369 Zn Mg Inorganic materials 0.000 description 1
- MQRWBMAEBQOWAF-UHFFFAOYSA-N acetic acid;nickel Chemical compound [Ni].CC(O)=O.CC(O)=O MQRWBMAEBQOWAF-UHFFFAOYSA-N 0.000 description 1
- 230000009471 action Effects 0.000 description 1
- 230000001464 adherent effect Effects 0.000 description 1
- 229910001515 alkali metal fluoride Inorganic materials 0.000 description 1
- 150000008044 alkali metal hydroxides Chemical class 0.000 description 1
- 150000001340 alkali metals Chemical class 0.000 description 1
- BFNBIHQBYMNNAN-UHFFFAOYSA-N ammonium sulfate Chemical compound N.N.OS(O)(=O)=O BFNBIHQBYMNNAN-UHFFFAOYSA-N 0.000 description 1
- 229910052921 ammonium sulfate Inorganic materials 0.000 description 1
- 235000011130 ammonium sulphate Nutrition 0.000 description 1
- 229910021538 borax Inorganic materials 0.000 description 1
- 235000010338 boric acid Nutrition 0.000 description 1
- KGBXLFKZBHKPEV-UHFFFAOYSA-N boric acid Chemical compound OB(O)O KGBXLFKZBHKPEV-UHFFFAOYSA-N 0.000 description 1
- 229960002645 boric acid Drugs 0.000 description 1
- 238000005266 casting Methods 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 239000008139 complexing agent Substances 0.000 description 1
- 230000002596 correlated effect Effects 0.000 description 1
- 238000005238 degreasing Methods 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000001125 extrusion Methods 0.000 description 1
- 238000005242 forging Methods 0.000 description 1
- 239000000174 gluconic acid Substances 0.000 description 1
- 235000012208 gluconic acid Nutrition 0.000 description 1
- 229960004275 glycolic acid Drugs 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-M hydroxide Chemical compound [OH-] XLYOFNOQVPJJNP-UHFFFAOYSA-M 0.000 description 1
- 230000000977 initiatory effect Effects 0.000 description 1
- 235000012245 magnesium oxide Nutrition 0.000 description 1
- AXZKOIWUVFPNLO-UHFFFAOYSA-N magnesium;oxygen(2-) Chemical class [O-2].[Mg+2] AXZKOIWUVFPNLO-UHFFFAOYSA-N 0.000 description 1
- BJEPYKJPYRNKOW-UHFFFAOYSA-N malic acid Chemical compound OC(=O)C(O)CC(O)=O BJEPYKJPYRNKOW-UHFFFAOYSA-N 0.000 description 1
- 235000012054 meals Nutrition 0.000 description 1
- 229940078494 nickel acetate Drugs 0.000 description 1
- 229910000008 nickel(II) carbonate Inorganic materials 0.000 description 1
- ZULUUIKRFGGGTL-UHFFFAOYSA-L nickel(ii) carbonate Chemical compound [Ni+2].[O-]C([O-])=O ZULUUIKRFGGGTL-UHFFFAOYSA-L 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- 230000008520 organization Effects 0.000 description 1
- 239000007800 oxidant agent Substances 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- 235000013024 sodium fluoride Nutrition 0.000 description 1
- 239000011775 sodium fluoride Substances 0.000 description 1
- 229910052938 sodium sulfate Inorganic materials 0.000 description 1
- 235000011152 sodium sulphate Nutrition 0.000 description 1
- 239000004328 sodium tetraborate Substances 0.000 description 1
- 235000010339 sodium tetraborate Nutrition 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/31—Coating with metals
- C23C18/32—Coating with nickel, cobalt or mixtures thereof with phosphorus or boron
- C23C18/34—Coating with nickel, cobalt or mixtures thereof with phosphorus or boron using reducing agents
- C23C18/36—Coating with nickel, cobalt or mixtures thereof with phosphorus or boron using reducing agents using hypophosphites
Definitions
- the present invention relates to chemical nickel plating of magnesium and its alloys, and more particularly to processes for effecting such plating with aqueous chemical nickel plating baths of the nickel cation-hypophosphite anion type.
- the metal surface is highly susceptible to oxidation and filmsover prior to or upon contact with the aqueous chemical nickel plating bath; whereby there is a film at the interface between the magnesium metal surface and the coating of nickel-phosphorus alloy that is inherently produced by a plating bath of this type; which film at the interface prevents proper initiation of the plating and intimate bonding between the magnesium alloy metal surface and the coating, with the result that the coating is characterized by blisters and other defects evidencing lack of continuity and uniformity of adhesion thereof with respect to the metal surface of the workpiece.
- Another object of the invention is to provide a process of coating the magnesium alloy surface of a workpiece with a chemical nickel plating bath of the nickel cationhypophosphite anion type so that the coating thus produced is intimately bonded thereto and devoid of blisters or other defects characteristic of lack of adhesion.
- Another object of the invention is to provide a process of chemical nickel plating upon a previously prepared magnesium alloy surface of a workpiece that is productive of a continuous smooth coating of nickel-phosphorus alloy that is devoid of blisters and other defects characteristic of lack of adhesion.
- a further object of the invention is to provide a process of the character noted that employs a chemical nickel plating bath of the nickel cation-hypophosphite anion type of improved composition which has a pH in the alkaline range and that is entirely stable notwithstanding this circumstance.
- Another object of the invention is to provide a process of the character noted that utilizes an improved lowtemperature heat-treating step following the chemical nickel plating of the coating upon the metal surface of the workpiece, whereby the coating is intimately bonded to the underlying metal surface of the workpiece.
- a further object of the invention is to provide a chemical nickel plating bath of the nickel cation-hypophosphite anion type and of improved composition which has a pH in the alkaline range and that is entirely stable notwithstanding this circumstance.
- a still further object of the invention is to provide an improved process of producing, as an article of manufacture, a workpiece having a metal outer surface formed essentially of magnesium alloy and carrying a smooth and continuous coating intimately bonded thereto and essentially comprising a nickel-phosphorus alloy.
- a workpiece or article of manufacture having an outer surface formed essentially of magnesium or an alloy thereof; and ordinarily the workpiece is first ma chined, or otherwise finished, and thereafter subjected to the process so as to provide on the metal surface thereof a continuous uniform and smooth coating intimately bonded thereto and formed of a nickel-phosphorus ally that is inherently produced by chemical deposition from a plating bath of the nickel cation-hypophosphite anion type.
- the workpiece 'is machined, or otherwise finished it is first subjected to certain pretreatment steps, then it is subjected to chemical deposition from a first plating bath of the type noted having a pH in the alkaline range, then it is subjected to chemical deposition from a second plating bath of the type noted having a pH in the acid range, and ultimately it is subjected to a heat-treatment step in order to render the composite coating product in the two chemical nickel plating steps mentioned intimately bonded thereto and of finished character.
- the present process has been applied in coating the typical magnesium alloys: AZ-3l, ZK-60A, AZ-9l, AZ-6l, AZ-92 and AZ-80.
- These typical magnesium alloys have the following compositions by weight.
- AZ-31 Percent A1 3 Zn 1 Mg Balance ZK-60A:
- the alloy AZ-91 is also identified as AZ91A and comprises a casting alloy; the alloy AZ-61 corresponds to Dow alloy K-l and comprises an extrusion alloy; and the alloy AZ-8l corresponds to Dow alloy C l and comprises a forging alloy.
- the workpiece is subjected to the following steps in the order named:
- This pickling bath employed in the pretreatment essentially comprises an aqueous solution of chromic acid, nitric acid and hydrofluoric acid and has the general composition:
- This bath may be conveniently formulated by dissolving in water about 280 g./l. of CrO and by adding thereto 10 ml./l. of 42 B. (technical) HNO and by adding thereto 1 ml./l. of an aqueous solution of 70% HF.
- This treatment bath employed in the pretreatment essentially comprises an aqueous solution of sodium hydroxide and has the general composition: NaOH-about 0.1 m.p.l.
- This bath may be conveniently formulated as a 10% sodium hydroxide aqueous solution.
- magnesium as well as its alloys, is an extremely reactive metal, which is substantially attacked by water at temperatures as low as 70 C., and that the rate of attack is substantially increased at elevated temperatures. Therefore,
- the pickling bath No. l dissolves all the magnesium oxides from the magnesium surface of the workpiece. Moreover, there is a chemical polishing action, due to the presence of chromic acid (an oxidizing agent), which, in conjunction with the nitric and hydrofiuoric acids, attacks the convex irregularities of the surface at a higher rate.
- chromic acid an oxidizing agent
- the pickling bath No. 2 first attacks the clean metal surface obtained by the pickling bath N0. 1, as shown by hydrogen evolution. Hydrogen evolution then subsides, and an insoluble film of magnesium fluoride is formed upon the clean magnesium surface of the workpiece.
- the treatment bath No. 3 effects an alternation of the film upon the magnesium surface that was deposited thereupon by the pickling bath No. 2; and more particularly, the treatment hath No. 3 first neutralizes any acid that may be present on the surface of the workpiece, and then alters the magnesium fluoride fihn upon the magnesium surface of the workpiece and forms a final protective film of basic magnesium fluoridemagnesium hydroxide thereon. It has been found that this film upon the magnesium surface of the workpiece initiates plating very rapidly in the first chemical nickel plating bath previously mentioned and is also highly useful in obtaining adhesion of the coating and lack of blistering thereof upon the workpiece.
- first chemical nickel plating bath of the nickel cation-hypophosphite anion type having a pH in the alkaline range and immersed therein throughout a first time interval sufficiently long to produce an initial nickel coating having a thickness of at least about 0.1 mil upon the exterior surface thereof; which first plating bath is normally maintained at a relatively high temperature in the general range 92 C. to 98 C.
- the initial plating or coating that is inherently produced by this first plating bath essentially comprises about 92% to 97% nickel and about 3% .to 8% phosphorus by weight; which plating proceeds at a rate of at least 1.0 mil/hour.
- This first plating bath essentially comprises an aqueous solution of nickel cations, hypophosphite anions, a first chelating and exalting agent selected from the class consisting of short chain aliphatic aminocarboxylic acids and salts thereof, a second chelating agent selected from the class consisting .of short chain aliphatic hydroxycarboxylic acids and salts thereof, ammonium cations, fluoride anions, sufiicient hydroxide anions (OH”) to produce a pH in the approximate range 7.0 to 9.0, a buffering system comprising alkali metal cations and boron oxide anions, and AsO anions.
- This first plating bath contains Ni++ and H Po, the absolute concentration of H2PO2 being in the range 0.15 to 1.20 moles per liter, and the ratio between Ni and H PO being in the rang 0.25 to 1.60.
- This first plating bath has the general composition:
- the fundamental purpose of the pretreatment is not only (AsO Stabilizing content.
- composition of this first plating bath is as follows:
- Suitable examples of this first plating bath are as follows:
- the Ni++ may be derived from nickel hypophosphite, nickel acetate, nickel sulfate, nickel carbonate, etc.
- the H POr may be derived from nickel hypophosphite, hypophosphorous acid, alkali metal hypophosphite, etc.
- the NH may be derived from ammonium hydroxide, ammonium fluoride, ammonium sulfate, ammonium bifluoride, etc.
- the F- may be derived from hydrofluoric acid, ammonium fluoride, ammonium bifluor-ide, alkali metal fluoride, etc.
- the short chain aliphatic aminocarboxylic acid radical may be derived from either the corresponding acid or the alkali metal salt thereof; this class of acids includes aminoacetic acid, alpha-aminopropionic acid, beta-aminopropionic acid, alpha-aminobutyric acid, aminosuccinic acid, etc.
- the short chain aliphatic hydroxycarboxylic acid radical may be derived from either the corresponding acid or the alkali metal salt thereof; this class of acids includes hydroxyacetic acid, monohydroxysuccinic acid, dihydroxysuccinic acid, gluconic acid, citric acid, hydroxymalonic acid, trihydroxyglutaric acid, alpha-hydroxypropionic acid, beta-hydroxypropionic acid, l-beta-hydroxybutyric acid, etc.
- the hydroxyl ions may be derived from ammonium hydroxide, or a suitable alkali metal hydroxide, sodium hydroxide being preferred; and any H+ adjustment of the pH is preferably derived from H
- the AsO,,-- anions may be conveniently derived by dissolving As 0 into the bath, the AsO anion being stable in the alkaline range of the bath.
- the boron oxide anions may be derived from H BO H B O Na BO or Na B O or any desired combination thereof.
- the aminocarboxylic acid radical constitutes a first chelating agent, as well as an exaltant increasing the rate of deposition; and. the hydroxycarboxylic acid radical constitutes a second chelating agent; which two chelating agents named are present in amounts sufficient to form mixed chelates of all of the nickel ions in the bath.
- the NH constitutes a complexing agent, thereby to insure that all of the nickel ions are tied-up or complexed either by way of the mixed chelates mentioned or by way of the ammoniacal complexes mentioned.
- the FT is employed fundamentally for the purpose of preventing blistering of the first coating as it is applied to the magnesium metal surface of the workpiece.
- This first plating bath includes the fundamental buffering system comprising alkali metal cations (Na+) and boron oxide anions.
- the plating bath inherently contains a substantial concentration of Na+ cations by virtue of the utilization of the sodium salts of the various acids involved in composing the same and by the utilization of NaOH in establishing the pH thereof in the alkaline range.
- the concentration thereof may be readily adjusted utilizing a suitable sodium salt such, for example, as sodium sulfate.
- this first plating bath includes two auxiliary buffering systems.
- the first auxiliary buffering system comprises alkali metal cations (Na+) and the aminocarboxylic acid radical; and the second auxiliary buffering system comprises alkali metal cations (Na+) and the hydroxycarboxylic acid radical.
- this first plating bath is highly buffered so as accurately to maintain the desired pH thereof within the range 8.0 to 9.0 as previously noted.
- this first plating bath comprises a boron oxide-sodium oxide-water system; whereby the source of the boron oxides present therein is not only immaterial, but the ultimate composition of the ionic species of the boron oxides in the plating bath is always the same, irrespective of the source of boxon oxide employed, under the same controlling equilibria conditions of concentration, temperature and pH.
- a 0.6 M aqueous solution of H BO essentially comprises:
- a 0.1 M aqueous solution of H BO essentially comprises:
- a dilute aqueous solution prepared by a Na B4O addition essentially comprises:
- the plating bath contains boron oxide anions that are equivalent to an addition of Na B O in the range 0.05 to 0.20 m.p.l.
- This content of boron oxide is also equivalent to an addition of H 80 in the range of 0.20 to 0.80 m.p.l. While any one of these sources of boron oxide may be employed, as previously explained, the utilization of ordinary borax is recommended, because of factors pertaining to simplicity and economy.
- the AsOpanions are employed for the purpose of achieving stability thereof so as to prevent spontaneous decomposition of the first plating bath by the rapid and random formation therethrough of black precipitate.
- the stabilizing content of ASO4 anions is ordinarily within the range to 150 parts per 1,000,000 parts of the bath by weight.
- nickel cations and hypophosphite anions are depleted; whereby either continuously or periodically the bath is regenerated in use by the addition of these ingredients noted in order to maintain the ranges thereof set forth.
- the workpiece After the workpiece has been given an initial coating having a thickness of at least about 0.1 mil in the first chemical nickel plating bath described above, it is transferred to a second chemical nickel plating bath of the nickel cation-hypophosphite anion type having a pH in the acid range and immersed therein throughout a second time interval sufficiently long to produce a final composite nickel coating having the desired thickness upon the exterior surface thereof; which second plating bath is normally maintained at a relatively high temperature in the general range 93 C. to 98 C.
- the plating or coating that is inherently produced by this second plating bath essentially comprises about 88% to 94% nickel and about 6% to 12% phosphorus by weight; which plating proceeds at a rate of about 0.9 mil/hour.
- This second chemical nickel plating bath is preferably of the composition of that disclosed in US. Patent No. 2,822,294, granted on February 4, 1958, to Gregoire Gutzeit, Paul Talmey and Warren G. Lee; which plating bath is essentially of the nickel cation-hypophosphite anion type also containing lactic anion and propionic anion and having a pH in the acid range 4.0 to 6.0.
- this plating bath essentially comprises nickel cations, hypophosphite anions within the range 0.15 to 1.20 moles/ liter, a ratio between nickel cations and hypophosphite anions Within the range 0.25 to 1.60, lactic anions within the range 0.25 to 0.60 mole/liter, and propionic anions within the range 0.025 to 0.060 mole/ liter.
- a typical example of this second chemical nickel plating bath has the following composition:
- the workpiece carrying the composite plating or coating is heated to a temperature of about 400 F. for a time interval of about 1 hour; which heat-treatment effects intimate bonding between the chemically deposited composite plating and the magnesium metal surface of the workpiece so that an adherent, smooth, continuous and uniform coating is provided thereon.
- the initial coating be deposited upon the magnesium surface of the workpiece in the first chemical nickel plating bath having a pH in the alkaline range, and that this step be continued throughout a suitable time interval in order to obtain a thickness of at least about 0.1 mil of the initial coating mentioned, thereby to prevent attack of the magnesium metal surface of the workpiece.
- the heat-treatment step is very important as it not only integrates the composite coating upon the magnesium meal surface of the workpiece, but it also materially enhances the adhesion so that such a workpiece having a coating thickness from 1 to 3 mils has an average salt spray life in the approximate range 120 to 250 hours, depending upon the thickness of the final coating.
- An aqueous chemical nickel plating bath comprising nickel ions, hypophosite ions in the range 0.15 to 1.20 moles per liter, the ratio between nickel ions and hypophosphite ions being in the range 0.25 to 1.60, a first chelating agent selected from the class consisting of short chain aliphatic aminocarboxylic acids and salts thereof and in the range 0.08 to 0.12 mole per liter, a second chelating agent selected from the class consisting of short chain aliphatic hydroxycarboxylic acids and salts thereof and in the range 0.06 to 0.10 mole per liter, ammonium ions in the range 0.05 to 0.20 mole per liter, fluoride ions in the range 0.10 to 0.40 mole per liter, sufiicient hydroxyl ions to produce a pH in the approximate range 7.0 to 9.0, and a buffering system comprising alkali metal cations and boron oxide anions and equivalent to an addition of alkali metal tetraborate in the
- An aqueous chemical nickel plating bath comprising nickel ions, hypophosphite ions in the range 0.15 to 1.20 moles per liter, the ratio between nickel ions and hypophosphite ions being in the range 0.25 to 1.60, a first chelating agent selected from the class consisting of arni-noacetic acid and salts thereof and in the range 0.08 to 0.12 mole per liter, a second chelating agent selected from the class consisting of citric acid and salts thereof and in the range 0.06 to 0.10 mole per liter, ammonium ions in the range 0.05 to 0.20 mole per liter, fluoride ions in the range 0.10 to 0.40 mole per liter, sufiicient hydroxyl ions to produce a pH in the approximate range 7.0 to 9.0, and a buffering system comprising alkali metal cations and boron oxide anions and equivalent to an addition of alkali metal tetraborate in the range 0.05 to 0.20 mole per liter
- An aqueous chemical nickel plating bath comprising nickel ions, hypophosphite ions in the range 0.15 to 1.20 moles per liter, the ratio between nickel ions and hyposphophite ions being in the range 0.25 to 1.60, a first chelating agent selected from the class consisting of short chain aliphatic aminocarboxylic acids and salts thereof and in the range 0.08 to 0.12 mole per liter, a second chelating agent selected trom the class consisting of short chain aliphatic hydroxycarboxylic acids and salts thereof and in the range 0.06 to 0.10 mole per liter, ammonium bifluoride in the range 0.05 to 0.20 mole per liter, sufficient hydroxyl ions to produce a pH in the approximate range 7.0 to 9.0, and a. buffering system comprising alkali metal cations and boron oxide and equivalent to an addition of alkali metal tetraborate in the range 0.05 to 0.20 mole per liter.
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- Chemical & Material Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Chemically Coating (AREA)
- Electroplating And Plating Baths Therefor (AREA)
- Chemical Treatment Of Metals (AREA)
Priority Applications (9)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US159745A US3121644A (en) | 1961-12-15 | 1961-12-15 | Chemical nickel plating of magnesium and its alloys |
| GB42228/62A GB989250A (en) | 1961-12-15 | 1962-11-08 | Chemical nickel plating of magnesium and its alloys |
| ES282772A ES282772A1 (es) | 1961-12-15 | 1962-11-24 | Un procedimiento para preparar un baño acuoso de niquelado químico |
| FI2122/62A FI42656B (da) | 1961-12-15 | 1962-11-26 | |
| CH1403962A CH419771A (fr) | 1961-12-15 | 1962-11-29 | Procédé de nickelage chimique du magnésium et de ses alliages et bain pour sa mise en oeuvre |
| DK519862AA DK105308C (da) | 1961-12-15 | 1962-11-30 | Vandigt, kemisk nikkelpletteringsbad og fremgangsmåde til plettering med dette bad. |
| LU42802D LU42802A1 (da) | 1961-12-15 | 1962-12-03 | |
| SE13057/62A SE304892B (da) | 1961-12-15 | 1962-12-04 | |
| AT950462A AT247683B (de) | 1961-12-15 | 1962-12-04 | Verfahren und Bad zur chemischen Vernickelung von Magnesium und dessen Legierungen |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US159745A US3121644A (en) | 1961-12-15 | 1961-12-15 | Chemical nickel plating of magnesium and its alloys |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| US3121644A true US3121644A (en) | 1964-02-18 |
Family
ID=22573836
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| US159745A Expired - Lifetime US3121644A (en) | 1961-12-15 | 1961-12-15 | Chemical nickel plating of magnesium and its alloys |
Country Status (9)
| Country | Link |
|---|---|
| US (1) | US3121644A (da) |
| AT (1) | AT247683B (da) |
| CH (1) | CH419771A (da) |
| DK (1) | DK105308C (da) |
| ES (1) | ES282772A1 (da) |
| FI (1) | FI42656B (da) |
| GB (1) | GB989250A (da) |
| LU (1) | LU42802A1 (da) |
| SE (1) | SE304892B (da) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4171393A (en) * | 1977-06-20 | 1979-10-16 | Eastman Kodak Company | Electroless plating method requiring no reducing agent in the plating bath |
Citations (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2694017A (en) * | 1952-09-16 | 1954-11-09 | Gen American Transporation Cor | Process of chemical nickel plating of aluminum and its alloys and baths therefor |
| US2762723A (en) * | 1953-06-03 | 1956-09-11 | Gen American Transporation Cor | Processes of chemical nickel plating and baths therefor |
| US2766138A (en) * | 1953-09-18 | 1956-10-09 | Gen Am Transport | Processes of chemical nickel plating |
| US2884344A (en) * | 1957-10-07 | 1959-04-28 | Reynolds Metals Co | Nickel plating |
| US2916401A (en) * | 1958-02-10 | 1959-12-08 | Gen Motors Corp | Chemical reduction nickel plating bath |
| US2935425A (en) * | 1954-12-29 | 1960-05-03 | Gen Am Transport | Chemical nickel plating processes and baths therefor |
| US2983634A (en) * | 1958-05-13 | 1961-05-09 | Gen Am Transport | Chemical nickel plating of magnesium and its alloys |
| US2994369A (en) * | 1959-04-02 | 1961-08-01 | Pittsburgh Plate Glass Co | Nickel plating chemical composition |
-
1961
- 1961-12-15 US US159745A patent/US3121644A/en not_active Expired - Lifetime
-
1962
- 1962-11-08 GB GB42228/62A patent/GB989250A/en not_active Expired
- 1962-11-24 ES ES282772A patent/ES282772A1/es not_active Expired
- 1962-11-26 FI FI2122/62A patent/FI42656B/fi active
- 1962-11-29 CH CH1403962A patent/CH419771A/fr unknown
- 1962-11-30 DK DK519862AA patent/DK105308C/da active
- 1962-12-03 LU LU42802D patent/LU42802A1/xx unknown
- 1962-12-04 SE SE13057/62A patent/SE304892B/xx unknown
- 1962-12-04 AT AT950462A patent/AT247683B/de active
Patent Citations (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2694017A (en) * | 1952-09-16 | 1954-11-09 | Gen American Transporation Cor | Process of chemical nickel plating of aluminum and its alloys and baths therefor |
| US2762723A (en) * | 1953-06-03 | 1956-09-11 | Gen American Transporation Cor | Processes of chemical nickel plating and baths therefor |
| US2766138A (en) * | 1953-09-18 | 1956-10-09 | Gen Am Transport | Processes of chemical nickel plating |
| US2935425A (en) * | 1954-12-29 | 1960-05-03 | Gen Am Transport | Chemical nickel plating processes and baths therefor |
| US2884344A (en) * | 1957-10-07 | 1959-04-28 | Reynolds Metals Co | Nickel plating |
| US2916401A (en) * | 1958-02-10 | 1959-12-08 | Gen Motors Corp | Chemical reduction nickel plating bath |
| US2983634A (en) * | 1958-05-13 | 1961-05-09 | Gen Am Transport | Chemical nickel plating of magnesium and its alloys |
| US2994369A (en) * | 1959-04-02 | 1961-08-01 | Pittsburgh Plate Glass Co | Nickel plating chemical composition |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4171393A (en) * | 1977-06-20 | 1979-10-16 | Eastman Kodak Company | Electroless plating method requiring no reducing agent in the plating bath |
Also Published As
| Publication number | Publication date |
|---|---|
| ES282772A1 (es) | 1963-03-16 |
| AT247683B (de) | 1966-06-27 |
| SE304892B (da) | 1968-10-07 |
| FI42656B (da) | 1970-06-01 |
| DK105308C (da) | 1966-09-12 |
| CH419771A (fr) | 1966-08-31 |
| LU42802A1 (da) | 1963-02-04 |
| GB989250A (en) | 1965-04-14 |
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