US2872359A - Copper sensitizers - Google Patents

Copper sensitizers Download PDF

Info

Publication number
US2872359A
US2872359A US625616A US62561656A US2872359A US 2872359 A US2872359 A US 2872359A US 625616 A US625616 A US 625616A US 62561656 A US62561656 A US 62561656A US 2872359 A US2872359 A US 2872359A
Authority
US
United States
Prior art keywords
copper
substrate
metal
hydroxide
deposited
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
US625616A
Inventor
Edward B Saubestre
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
GTE Sylvania Inc
Original Assignee
Sylvania Electric Products Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sylvania Electric Products Inc filed Critical Sylvania Electric Products Inc
Priority to US625616A priority Critical patent/US2872359A/en
Application granted granted Critical
Publication of US2872359A publication Critical patent/US2872359A/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/18Pretreatment of the material to be coated
    • C23C18/20Pretreatment of the material to be coated of organic surfaces, e.g. resins
    • C23C18/28Sensitising or activating
    • C23C18/30Activating or accelerating or sensitising with palladium or other noble metal
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/18Pretreatment of the material to be coated
    • C23C18/20Pretreatment of the material to be coated of organic surfaces, e.g. resins
    • C23C18/28Sensitising or activating

Definitions

  • a metallic substrate is inserted in a bath containing in aqueous solution a salt, such as a chloride or sulfate of a metal to be deposited, a reducing agent, such as a hypophosphite salt, and a suitable buffering or pH controlling agent, such as sodium acetate.
  • a salt such as a chloride or sulfate of a metal to be deposited
  • a reducing agent such as a hypophosphite salt
  • a suitable buffering or pH controlling agent such as sodium acetate
  • This process is defined as chemical reduction plating 0r deposition to differentiate it from the conventional electroplating or electrolytic deposition techniques.
  • the insulator is sensitized by immersion in a solution containing a chloride salt of a metal selected from the class composed of silver, gold, platinum and palladium, these metals being defined as catalytic metals.
  • chloride salts described above are effective sensitizers when such metals as nickel, cobalt, silver and chromium are to be subsequently deposited on a sensitized surface, these salts are totally ineffective as sensitizers when copper is to be subsequently deposited.
  • Another object is to utilize chemical reduction plating to deposit copper upon a sensitized surface of an electrically non-conductive substrate.
  • Still another object is to sensitize a surface of an electrically non-conductive substrate through the use of "ice the hydroxide complexes of gold, platinum or palladium.
  • the sensitizing operation proceeds in the following manner.
  • the sensitizer salt is sorbed on the surface to be sensitized.
  • the salt is reduced to metal by the reducing agent in the plating solution.
  • the metal coating thus formed acts as a catalyst for initiating the subsequent copper deposition.
  • Silver hydroxide being insoluble, does not form such a complex and consequently, cannot be used as a sensitizer.
  • Example I Platinum chloride was dissolved in a sodium hydroxide solution to produce a platinate hydroxide complex Parts/v01. Rochelle salt sol n 25 Copper sulphat 25 Formaldehyde (37% concentration) 10 The deposition and reduction process was then initiated and a well bonded copper coating was deposited on the sensitized surface of the substrate.
  • Example II The process of Example I was repeated using an aurate hydroxide complex (HAuo the gold content being about .003% by weight, Substantially the same results were obtained.
  • Example III The process of Example I was repeated using a palladium hydroxide complex (Pd(OH) the palladium content being about .2% by weight. Substantially the same results were obtained.
  • Pd(OH) palladium hydroxide complex
  • the percentage content by weight of gold, platinum and palladium can be increased as desired providing that the hydroxide solution in which the metal is dissolved contains at least the appropriate stoichiometric quantity 1 of hydroxide.
  • An excess quantity of free hydroxide can be present in the sensitizer solution, its presence not being deleterious.
  • the percentage content by weight of the precious metals can be extremely low. I have found, for example, that when aurate hydroxide is used, the gold percentage content by weight can be as low as .001%.
  • hydroxide solutions of materials other than sodium can be used, as for plexes of gold (HAuO platinum (Pt(OH) and palladium (Pd(OH) and electrolessly depositing copper upon the substrate so treated.
  • a method for sensitizing an electrically non-conductive substrate which comprises the steps of immersing said substrate in an alkaline solution containing at least one component selected from the class consisting of the hydroxide complexes of gold (HAu(O platinum (Pt(OH) and palladium (Pd(OH) the hydroxide content of said solution being present in at least stoichiometric proportions; and electrolessly depositing copper upon the substrate so treated.
  • a method for depositing copper upon an insulator substrate the steps of immersing said substrate in an alkaline solution containing at least one component selected from the class consisting of the hydroxide complexes of gold (HAuO platinum (Pt(OI-I) and palladium (Pd(OH) the hydroxide content of said solution being present in at least stoichiometric proportions; removing said substratefrom said alkaline solution, and immersing said substrate in a chemical reduction copper plating bath whereby copper ions are reduced to metallic copper on said substrate.

Landscapes

  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemically Coating (AREA)

Description

United States Patent COPPER SENSITIZERS Edward B. Saubestre, Elmhurst, N. Y., assignor to Sylvania Electric Products Inc., a corporation of Massachusetts No Drawing. Application December 3, 1956 Serial No. 625,616
3 Claims. 01. 117-213 My invention relates to processes in which metal ions are chemically reduced to metal and deposited on a suitable electrically non-conductive substrate.
As known to the art, in this type of process, a metallic substrate is inserted in a bath containing in aqueous solution a salt, such as a chloride or sulfate of a metal to be deposited, a reducing agent, such as a hypophosphite salt, and a suitable buffering or pH controlling agent, such as sodium acetate. In the ensuing reaction, the metal salt is decomposed, and the metal itself is deposited on the surface of the substrate. While the mechanism of this process is not fully understood, it is believed that the hypophosphite ion continuously reduces the dissolved metal salt to the metallic state on the surface of the substrate by means of a catalytic action involving the surface.
It is well known that cobalt, silver, nickel, and chromium can be deposited in this manner. Other metals, however, can also be so deposited. For example, in the copending patent application of Philip H. Eisenberg, Serial No. 561,670, filed January 26, 1956, and
assigned to the assignee of the present application, there is disclosed a process for the deposition of iron, and, in my copending application, Serial No. 625,615, filed December 3, 1956, there is disclosed a process for depositing copper.
This process is defined as chemical reduction plating 0r deposition to differentiate it from the conventional electroplating or electrolytic deposition techniques.
It has been proposed to adapt this reduction technique for use in the printed circuit art by depositing metal upon the surface of an electrically non-conductive or insulator substrate. In order to deposit metals in this manner, it has been found necessary to first treat or sensitize the substrate surface in such manner that the metal to be deposited will be selectively deposited on this surface and will not be deposited elsewhere.
In the present state of the art, the insulator is sensitized by immersion in a solution containing a chloride salt of a metal selected from the class composed of silver, gold, platinum and palladium, these metals being defined as catalytic metals.
I have discovered that while the chloride salts described above are effective sensitizers when such metals as nickel, cobalt, silver and chromium are to be subsequently deposited on a sensitized surface, these salts are totally ineffective as sensitizers when copper is to be subsequently deposited.
Accordingly, it is an object of my invention to sensitize a surface of an electrically non-conductive substrate in such a manner that copper ions can be deposited and chemically reduced to metal on the sensitized surface.
Another object is to utilize chemical reduction plating to deposit copper upon a sensitized surface of an electrically non-conductive substrate.
Still another object is to sensitize a surface of an electrically non-conductive substrate through the use of "ice the hydroxide complexes of gold, platinum or palladium.
These and other objects of my invention will either be explained or will become apparent hereinafter.
In my studies of sensitizers, I have learned that the sensitizing operation proceeds in the following manner. First, the sensitizer salt is sorbed on the surface to be sensitized. Secondly, when this surface is immersed in the chemical reduction plating solution, the salt is reduced to metal by the reducing agent in the plating solution. Thirdly, the metal coating thus formed acts as a catalyst for initiating the subsequent copper deposition.
As is well known to the art, the ease of reduction of metal cations to metal is often greatly dependent upon the nature of the anion present. When I discovered that the chloride salts of the catalytic metals would not sensitize in such manneras to permit subsequent electroless deposition of copper, I postulated that the chloride, and not the catalytic metal itself, was preventing successful copper deposition.
In further investigations I discovered that the chloride was not fully disassociated from the catalytic metal, but rather that a chloride complex as for example palladium hexachloride, platinum hexachloride, or aurate tetrachloride, was formed. 'Such complexes are relatively stable. When the metal -to be deposited is easily reducible from an ionized state to its metal, as is the case for silver, for example, 'the relative stability'of these complexes has no deleterious effect. However, copper is not as easily reduced; apparently the relative stability of the chloride complexes is such as to prevent reduction of copper ions to metallic copper.
In experimenting with salts of catalytic metals other than chlorides, I discovered that the hydroxide complexes of platinum, palladium and gold'can be used as sensitizers and further that insulator surfaces sensitized by these hydroxide complexes can be readily coated with copper. (Silver hydroxide, being insoluble, does not form such a complex and consequently, cannot be used as a sensitizer.)
My invention will now be described in detail with reference to the examples which follow.
Example I Platinum chloride was dissolved in a sodium hydroxide solution to produce a platinate hydroxide complex Parts/v01. Rochelle salt sol n 25 Copper sulphat 25 Formaldehyde (37% concentration) 10 The deposition and reduction process was then initiated and a well bonded copper coating was deposited on the sensitized surface of the substrate.
Example II The process of Example I was repeated using an aurate hydroxide complex (HAuo the gold content being about .003% by weight, Substantially the same results were obtained.
3 Example III The process of Example I was repeated using a palladium hydroxide complex (Pd(OH) the palladium content being about .2% by weight. Substantially the same results were obtained.
The percentage content by weight of gold, platinum and palladium can be increased as desired providing that the hydroxide solution in which the metal is dissolved contains at least the appropriate stoichiometric quantity 1 of hydroxide. An excess quantity of free hydroxide can be present in the sensitizer solution, its presence not being deleterious.
As indicated by the preceding examples, the percentage content by weight of the precious metals can be extremely low. I have found, for example, that when aurate hydroxide is used, the gold percentage content by weight can be as low as .001%.
In forming the hydroxide complex, hydroxide solutions of materials other than sodium can be used, as for plexes of gold (HAuO platinum (Pt(OH) and palladium (Pd(OH) and electrolessly depositing copper upon the substrate so treated.
2. A method for sensitizing an electrically non-conductive substrate which comprises the steps of immersing said substrate in an alkaline solution containing at least one component selected from the class consisting of the hydroxide complexes of gold (HAu(O platinum (Pt(OH) and palladium (Pd(OH) the hydroxide content of said solution being present in at least stoichiometric proportions; and electrolessly depositing copper upon the substrate so treated.
3. In a method for depositing copper upon an insulator substrate, the steps of immersing said substrate in an alkaline solution containing at least one component selected from the class consisting of the hydroxide complexes of gold (HAuO platinum (Pt(OI-I) and palladium (Pd(OH) the hydroxide content of said solution being present in at least stoichiometric proportions; removing said substratefrom said alkaline solution, and immersing said substrate in a chemical reduction copper plating bath whereby copper ions are reduced to metallic copper on said substrate.
References Cited in the file of this patent UNITED STATES PATENTS 2,278,722 Loiseleur Apr. 7, 1942 FOREIGN PATENTS 503,034 Great Britain Mar. 30, 1939

Claims (1)

1. A METHOD FOR SENSITIZING AN INSULATOR SUBSTRATE WHICH COMPRISES THE STEP OF IMMERSING SAID SUBSTRATE IN AN ALKALINE SOLUTION CONTAINING AT LEAST ONE COMPLEX SELECTED FROM THE CLASS CONSISTING OF THE HYDROXIDE COMPLEXES OF GOLD (HAUO3-2), PLATINUM (PT(OH)6-2) AND PALADIUM (PD(OH)6-2); AND ELECTROLESSLY DEPOSITING COPPER UPON THE SUBSTRATE SO TREATED.
US625616A 1956-12-03 1956-12-03 Copper sensitizers Expired - Lifetime US2872359A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
US625616A US2872359A (en) 1956-12-03 1956-12-03 Copper sensitizers

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US625616A US2872359A (en) 1956-12-03 1956-12-03 Copper sensitizers

Publications (1)

Publication Number Publication Date
US2872359A true US2872359A (en) 1959-02-03

Family

ID=24506876

Family Applications (1)

Application Number Title Priority Date Filing Date
US625616A Expired - Lifetime US2872359A (en) 1956-12-03 1956-12-03 Copper sensitizers

Country Status (1)

Country Link
US (1) US2872359A (en)

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3011920A (en) * 1959-06-08 1961-12-05 Shipley Co Method of electroless deposition on a substrate and catalyst solution therefor
US3033703A (en) * 1958-12-08 1962-05-08 Photocircuits Corp Electroless plating of copper
US3046159A (en) * 1957-12-17 1962-07-24 Hughes Aircraft Co Method of copper plating by chemical reduction
US3135046A (en) * 1960-09-30 1964-06-02 Corning Glass Works Method of forming metallic films on glass
US3486928A (en) * 1965-10-21 1969-12-30 Int Nickel Co Bath and process for platinum and platinum alloys
US3607352A (en) * 1968-11-29 1971-09-21 Enthone Electroless metal plating
DE2844425A1 (en) * 1978-10-12 1980-04-17 Licentia Gmbh Activation of plastics surface before metallisation - by roughening, complexing treatment, exchange with noble metal complex salt and redn. to metal nuclei (NL 15.4.80)
US5310580A (en) * 1992-04-27 1994-05-10 International Business Machines Corporation Electroless metal adhesion to organic dielectric material with phase separated morphology

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB503034A (en) * 1936-10-21 1939-03-30 Saint Gobain Wet-method process of metallization
US2278722A (en) * 1936-10-21 1942-04-07 Saint Gobain Metallic coating

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB503034A (en) * 1936-10-21 1939-03-30 Saint Gobain Wet-method process of metallization
US2278722A (en) * 1936-10-21 1942-04-07 Saint Gobain Metallic coating

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3046159A (en) * 1957-12-17 1962-07-24 Hughes Aircraft Co Method of copper plating by chemical reduction
US3033703A (en) * 1958-12-08 1962-05-08 Photocircuits Corp Electroless plating of copper
US3011920A (en) * 1959-06-08 1961-12-05 Shipley Co Method of electroless deposition on a substrate and catalyst solution therefor
US3135046A (en) * 1960-09-30 1964-06-02 Corning Glass Works Method of forming metallic films on glass
US3249467A (en) * 1960-09-30 1966-05-03 Corning Glass Works Method of forming metallic films on glass
US3486928A (en) * 1965-10-21 1969-12-30 Int Nickel Co Bath and process for platinum and platinum alloys
US3607352A (en) * 1968-11-29 1971-09-21 Enthone Electroless metal plating
DE2844425A1 (en) * 1978-10-12 1980-04-17 Licentia Gmbh Activation of plastics surface before metallisation - by roughening, complexing treatment, exchange with noble metal complex salt and redn. to metal nuclei (NL 15.4.80)
US5310580A (en) * 1992-04-27 1994-05-10 International Business Machines Corporation Electroless metal adhesion to organic dielectric material with phase separated morphology

Similar Documents

Publication Publication Date Title
US3993799A (en) Electroless plating process employing non-noble metal hydrous oxide catalyst
US3403035A (en) Process for stabilizing autocatalytic metal plating solutions
US3532518A (en) Colloidal metal activating solutions for use in chemically plating nonconductors,and process of preparing such solutions
US3438798A (en) Electroless plating process
US4136216A (en) Non-precious metal colloidal dispersions for electroless metal deposition
US4181760A (en) Method for rendering non-platable surfaces platable
US3668003A (en) Printed circuits
US2872359A (en) Copper sensitizers
US3485725A (en) Method of increasing the deposition rate of electroless solutions
US3607352A (en) Electroless metal plating
US3178311A (en) Electroless plating process
US3783005A (en) Method of depositing a metal on a surface of a nonconductive substrate
US4153746A (en) Method of sensitizing copper surfaces with sensitizing solution containing stannous ions, precious metal ions and EDTA
US4321285A (en) Electroless plating
US4762560A (en) Copper colloid and method of activating insulating surfaces for subsequent electroplating
US3672940A (en) Process for chemically depositing nickel on a synthetic resin base material
US3841881A (en) Method for electroless deposition of metal using improved colloidal catalyzing solution
GB1348793A (en) Method of electroless deposition of metals with improved sensitizer
US4681630A (en) Method of making copper colloid for activating insulating surfaces
GB1242995A (en) Electroless nickel plating on a nonconductive substrate
US3650913A (en) An electroless plating process employing a specially prepared palladium-tin activator solution
US3130072A (en) Silver-palladium immersion plating composition and process
US4820547A (en) Activators for colloidal catalysts in electroless plating processes
US3664860A (en) Electrolessly nickel plating on a non-metallic basis material
GB1198193A (en) Prevention of Skip Plating in an Electroless Nickel Bath