US2523190A - Electrodeposition of nickel from an acid bath - Google Patents
Electrodeposition of nickel from an acid bath Download PDFInfo
- Publication number
- US2523190A US2523190A US603753A US60375345A US2523190A US 2523190 A US2523190 A US 2523190A US 603753 A US603753 A US 603753A US 60375345 A US60375345 A US 60375345A US 2523190 A US2523190 A US 2523190A
- Authority
- US
- United States
- Prior art keywords
- nickel
- mixture
- bath
- acid
- chloride
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical group [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 title claims description 63
- 229910052759 nickel Inorganic materials 0.000 title claims description 28
- 239000002253 acid Substances 0.000 title description 11
- 238000004070 electrodeposition Methods 0.000 title description 2
- 229910021586 Nickel(II) chloride Inorganic materials 0.000 claims description 18
- QMMRZOWCJAIUJA-UHFFFAOYSA-L nickel dichloride Chemical compound Cl[Ni]Cl QMMRZOWCJAIUJA-UHFFFAOYSA-L 0.000 claims description 18
- -1 CHLOR VINYL SULFONIC ACID Chemical compound 0.000 claims description 15
- 239000000203 mixture Substances 0.000 claims description 14
- LGQLOGILCSXPEA-UHFFFAOYSA-L nickel sulfate Chemical compound [Ni+2].[O-]S([O-])(=O)=O LGQLOGILCSXPEA-UHFFFAOYSA-L 0.000 claims description 12
- 229910000363 nickel(II) sulfate Inorganic materials 0.000 claims description 12
- 239000000463 material Substances 0.000 claims description 7
- 150000002894 organic compounds Chemical class 0.000 claims description 6
- NLVXSWCKKBEXTG-UHFFFAOYSA-N vinylsulfonic acid Chemical compound OS(=O)(=O)C=C NLVXSWCKKBEXTG-UHFFFAOYSA-N 0.000 claims description 6
- 239000011260 aqueous acid Substances 0.000 claims description 3
- 230000002378 acidificating effect Effects 0.000 description 7
- 150000003839 salts Chemical class 0.000 description 7
- 229910052708 sodium Inorganic materials 0.000 description 7
- 239000011734 sodium Substances 0.000 description 7
- 229920002554 vinyl polymer Polymers 0.000 description 6
- 230000009286 beneficial effect Effects 0.000 description 5
- 150000001875 compounds Chemical class 0.000 description 5
- UIIIBRHUICCMAI-UHFFFAOYSA-N prop-2-ene-1-sulfonic acid Chemical compound OS(=O)(=O)CC=C UIIIBRHUICCMAI-UHFFFAOYSA-N 0.000 description 5
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 5
- 150000007513 acids Chemical class 0.000 description 4
- 238000007792 addition Methods 0.000 description 4
- 150000003460 sulfonic acids Chemical class 0.000 description 4
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 description 3
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 3
- VVJKKWFAADXIJK-UHFFFAOYSA-N Allylamine Chemical compound NCC=C VVJKKWFAADXIJK-UHFFFAOYSA-N 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 2
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 2
- 125000001931 aliphatic group Chemical group 0.000 description 2
- XXROGKLTLUQVRX-UHFFFAOYSA-N allyl alcohol Chemical compound OCC=C XXROGKLTLUQVRX-UHFFFAOYSA-N 0.000 description 2
- KGBXLFKZBHKPEV-UHFFFAOYSA-N boric acid Chemical compound OB(O)O KGBXLFKZBHKPEV-UHFFFAOYSA-N 0.000 description 2
- 239000004327 boric acid Substances 0.000 description 2
- 238000005282 brightening Methods 0.000 description 2
- 229910052793 cadmium Inorganic materials 0.000 description 2
- BDOSMKKIYDKNTQ-UHFFFAOYSA-N cadmium atom Chemical compound [Cd] BDOSMKKIYDKNTQ-UHFFFAOYSA-N 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- 239000010949 copper Substances 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000012535 impurity Substances 0.000 description 2
- 239000002932 luster Substances 0.000 description 2
- XTEGVFVZDVNBPF-UHFFFAOYSA-N naphthalene-1,5-disulfonic acid Chemical compound C1=CC=C2C(S(=O)(=O)O)=CC=CC2=C1S(O)(=O)=O XTEGVFVZDVNBPF-UHFFFAOYSA-N 0.000 description 2
- 229910052725 zinc Inorganic materials 0.000 description 2
- 239000011701 zinc Substances 0.000 description 2
- BHMLFPOTZYRDKA-IRXDYDNUSA-N (2s)-2-[(s)-(2-iodophenoxy)-phenylmethyl]morpholine Chemical compound IC1=CC=CC=C1O[C@@H](C=1C=CC=CC=1)[C@H]1OCCNC1 BHMLFPOTZYRDKA-IRXDYDNUSA-N 0.000 description 1
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- OQFSYHWITGFERZ-UHFFFAOYSA-N 2-bromoethanesulfonic acid Chemical compound OS(=O)(=O)CCBr OQFSYHWITGFERZ-UHFFFAOYSA-N 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 1
- KRKNYBCHXYNGOX-UHFFFAOYSA-K Citrate Chemical compound [O-]C(=O)CC(O)(CC([O-])=O)C([O-])=O KRKNYBCHXYNGOX-UHFFFAOYSA-K 0.000 description 1
- RWSOTUBLDIXVET-UHFFFAOYSA-N Dihydrogen sulfide Chemical class S RWSOTUBLDIXVET-UHFFFAOYSA-N 0.000 description 1
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 1
- 235000008331 Pinus X rigitaeda Nutrition 0.000 description 1
- 235000011613 Pinus brutia Nutrition 0.000 description 1
- 241000018646 Pinus brutia Species 0.000 description 1
- KZTYYGOKRVBIMI-UHFFFAOYSA-N S-phenyl benzenesulfonothioate Natural products C=1C=CC=CC=1S(=O)(=O)C1=CC=CC=C1 KZTYYGOKRVBIMI-UHFFFAOYSA-N 0.000 description 1
- QAOWNCQODCNURD-UHFFFAOYSA-L Sulfate Chemical compound [O-]S([O-])(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-L 0.000 description 1
- LSNNMFCWUKXFEE-UHFFFAOYSA-N Sulfurous acid Chemical class OS(O)=O LSNNMFCWUKXFEE-UHFFFAOYSA-N 0.000 description 1
- 230000001464 adherent effect Effects 0.000 description 1
- 150000001447 alkali salts Chemical class 0.000 description 1
- BUSBFZWLPXDYIC-UHFFFAOYSA-N arsonic acid Chemical compound O[AsH](O)=O BUSBFZWLPXDYIC-UHFFFAOYSA-N 0.000 description 1
- 125000003118 aryl group Chemical group 0.000 description 1
- 125000005228 aryl sulfonate group Chemical group 0.000 description 1
- 125000004421 aryl sulphonamide group Chemical group 0.000 description 1
- 150000008331 benzenesulfonamides Chemical class 0.000 description 1
- 150000008107 benzenesulfonic acids Chemical class 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- CCIVGXIOQKPBKL-UHFFFAOYSA-M ethanesulfonate Chemical compound CCS([O-])(=O)=O CCIVGXIOQKPBKL-UHFFFAOYSA-M 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- PSZYNBSKGUBXEH-UHFFFAOYSA-N naphthalene-1-sulfonic acid Chemical class C1=CC=C2C(S(=O)(=O)O)=CC=CC2=C1 PSZYNBSKGUBXEH-UHFFFAOYSA-N 0.000 description 1
- 150000002815 nickel Chemical class 0.000 description 1
- QFVGCVZHAQQIMT-UHFFFAOYSA-L nickel(2+);prop-2-enoate Chemical compound [Ni+2].[O-]C(=O)C=C.[O-]C(=O)C=C QFVGCVZHAQQIMT-UHFFFAOYSA-L 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- VPJDULFXCAQHRC-UHFFFAOYSA-N prop-2-enylurea Chemical compound NC(=O)NCC=C VPJDULFXCAQHRC-UHFFFAOYSA-N 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 238000002310 reflectometry Methods 0.000 description 1
- CVHZOJJKTDOEJC-UHFFFAOYSA-N saccharin Chemical compound C1=CC=C2C(=O)NS(=O)(=O)C2=C1 CVHZOJJKTDOEJC-UHFFFAOYSA-N 0.000 description 1
- 239000007858 starting material Substances 0.000 description 1
- CESKLHVYGRFMFP-UHFFFAOYSA-N sulfonmethane Chemical compound CCS(=O)(=O)C(C)(C)S(=O)(=O)CC CESKLHVYGRFMFP-UHFFFAOYSA-N 0.000 description 1
- 238000003786 synthesis reaction Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/12—Electroplating: Baths therefor from solutions of nickel or cobalt
Definitions
- This invention relates to the electrodepositlon of'nickel from aqueous acidic nickel baths.
- the object of this invention is to decrease the grain size and increase the luster and brightncss of the nickel deposit without decreasing appreciably the ductility of the plate or the current density range of the nickel bath.
- Table I are listed a number of alpha and beta unsaturated aliphatic sulfonic acids and their optimum concentrations in the nickel baths. Actually they all can be used up to saturation in the baths, that is, they do not have critical upper concentration limits.
- Th brighteners listed in Table I can be used in any type of operating acidic nickel baths with beneficial effects.
- Table II are listed by way of illustration a number of such acidic nickel baths.
- the nickel plate obtained with the alpha and beta unsaturated sulfonic acids present in the acidic baths is very fine-grained, of good color and ductile, and remarkably free from pitting. On bufied surfaces the plate obtained is as good in reflectivity and brightness as the base.
- nickel brighteners such as, for example, zinc or cadmium in a concentration of about 0.1-0.5 g./l.
- the plate obtained is brighter than with either material alone in the bath.
- the bath can tolerate larger concentrations of the zinc and cadmium than the plain bath without getting brittle, darkish, poorly adherent plate. This is also true with respect to thallous and mercuric salts in about the same concentrations.
- the impurity, copper which does not produce any appreciable brightness when present in small concentrations, but tends, instead to very readily produce dark deposits, first appearing at the lowest current densities and extending upward as the concentration or copper is increased.
- the vinyl and allyl sulfonic acids ar extremely good. That is, they are very effective for the very low current density values while at the same time being very efiective for the middle and high current density values.
- beta unsaturated aliphatic sulfonic acids e. g., allyl sulfonic acid
- alpha unsaturated sulfonic acids e. g., vinyl sulfonic acid
- the vinyl sulionic acid makes possibl a toleration of somewhat larger concentrations of materials (both inorganic and organic) which plate out preferentially to nickel and which when alone in the bath cause brittle and easily stained plate of poor color.
- the beta olefinic double bond as present in allyl sulfonic acid does exert an eilect on, or transmits an eilect to, the sulfonic group and increases its reactivity, but not as strongly as does an alpha unsaturated bond.
- the sulfonic group affects the active unsaturation characteristics of the alpha carbon double bonds more strongly than the more distant beta, that is, the beta double bonds are more strongly olefinic in character, and thus allyl sulfonic acid also exerts a brightening effect in a somewhat similar manner as does allyl alcohol, allyl amine, allyl urea, arsonic acid, and acrylic acid. The latter, however, do not increase the toleration of impurities,
- the alpha and beta unsaturated sulfonic acids can be used with beneficial effects in other acidic nickel baths, besides those listed in Table II, for example, in baths made up with nickel sulfamate allyl the naphthalene sulfonic acids, the benzene sulfonic acids, the benzene sulfonamides, the diphenyl sulfone sulfonic acids, in that the ductility of the plate and the brightness in the recesses .(low current density areas) is improved. This is especially true'if-ithe chloride concentration of such nickel baths'is above '75 g./l. NiClaGHzO.
- Mixtures of compounds of Table I can be used with beneficial eifects (improved brightness of plate) as, for example, allyl sulfonic acid with vinyl sulfonic.
- beneficial eifects improved brightness of plate
- mixtures of the compounds of Table I with aryl sulfonates, aryl sulfonamides, aryl sulfimides, aryl sulfone sulfonic acids enhance or improve the brightness of the plate.
- 0.1-.2 g./l. of o-benzoyl sulfimide with 0.1- 3 g./l. of vinyl and allyl sulfonic acids In general the nickel salts of the alpha or beta unsaturated aliphatic sulfonic acids are preferred for additions instead of the free acids in order not to alter the pH of the baths very much.
- a method for electrodepositing fine-grained, lustrous nickel comprising the step of electrodepositing fine-grained, lustrous nickel from an aqueous acid solution consisting essentially of a material selected from the group consisting of nickel chloride, nickel sulfate, a mixture of nickel sulfate and nickel chloride, a mixture of nickel REFERENCES CITED fiuoborate and nickel chloride, a mixture of nickel
- aqueous acid solution consisting essentially of a material selected from the group consisting of nickel chloride, nickel sulfate, a mixture of nickel sulfate and nickel chloride, a mixture of nickel REFERENCES CITED fiuoborate and nickel chloride, a mixture of nickel
- the following references are of record in the fiuoborate and nickel sulfate, a mixture of nickel me of this patent:
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Electroplating And Plating Baths Therefor (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
Priority Applications (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| FR955898D FR955898A (en)van) | 1945-07-07 | ||
| US603753A US2523190A (en) | 1945-07-07 | 1945-07-07 | Electrodeposition of nickel from an acid bath |
| GB13288/46A GB611483A (en) | 1945-07-07 | 1946-05-02 | Improvements in the electrodeposition of nickel from aqueous acidic nickel baths |
| US22489A US2523191A (en) | 1945-07-07 | 1948-04-21 | Electrodeposition of nickel from an acid bath |
| DEU622A DE845732C (de) | 1945-07-07 | 1950-09-24 | Bad fuer die galvanische Vernickelung |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US603753A US2523190A (en) | 1945-07-07 | 1945-07-07 | Electrodeposition of nickel from an acid bath |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| US2523190A true US2523190A (en) | 1950-09-19 |
Family
ID=24416763
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| US603753A Expired - Lifetime US2523190A (en) | 1945-07-07 | 1945-07-07 | Electrodeposition of nickel from an acid bath |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US2523190A (en)van) |
| DE (1) | DE845732C (en)van) |
| FR (1) | FR955898A (en)van) |
| GB (1) | GB611483A (en)van) |
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2550449A (en) * | 1946-04-20 | 1951-04-24 | Udylite Corp | Electrodeposition of nickel from an acid bath |
| DE1001078B (de) * | 1953-08-13 | 1957-01-17 | Dehydag Gmbh | Galvanische Baeder zur Herstellung von Metallueberzuegen |
| US3095362A (en) * | 1960-11-21 | 1963-06-25 | Incar Inc | Zinc plating composition and process |
| US3109784A (en) * | 1960-11-21 | 1963-11-05 | Incar Inc | Copper plating composition and process |
| US3152975A (en) * | 1961-02-07 | 1964-10-13 | Hanson Van Winkle Munning Co | Electrodeposition of nickel |
| US3417005A (en) * | 1965-12-27 | 1968-12-17 | Gen Motors Corp | Neutral nickel-plating process and bath therefor |
| US6045682A (en) * | 1998-03-24 | 2000-04-04 | Enthone-Omi, Inc. | Ductility agents for nickel-tungsten alloys |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| NL238490A (en)van) * | 1958-04-26 | |||
| GB2171114A (en) * | 1985-02-06 | 1986-08-20 | Canning W Materials Ltd | Trivalent chromium electroplating baths and rejuvenation thereof |
| DE4221970C2 (de) * | 1992-06-30 | 1996-01-18 | Atotech Deutschland Gmbh | Verfahren zur Vermeidung der Halogengasentwicklung in Metallabscheidungsbädern mit mindestens zwei Elektrolyträumen |
Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US1818229A (en) * | 1928-02-23 | 1931-08-11 | Grasselli Chemical Co | Electroplating |
| US2029387A (en) * | 1934-03-14 | 1936-02-04 | Harshaw Chem Corp | Method and means of electrodeposition |
| US2112818A (en) * | 1934-08-15 | 1938-03-29 | Mcgean Chem Co Inc | Electrodeposition of metals |
| US2125229A (en) * | 1936-04-14 | 1938-07-26 | Harshaw Chem Corp | Electrodeposition of metals |
| US2171842A (en) * | 1936-07-13 | 1939-09-05 | Du Pont | Electroplating |
| US2198267A (en) * | 1939-12-14 | 1940-04-23 | Harshaw Chem Corp | Electrodeposition of metals |
-
0
- FR FR955898D patent/FR955898A/fr not_active Expired
-
1945
- 1945-07-07 US US603753A patent/US2523190A/en not_active Expired - Lifetime
-
1946
- 1946-05-02 GB GB13288/46A patent/GB611483A/en not_active Expired
-
1950
- 1950-09-24 DE DEU622A patent/DE845732C/de not_active Expired
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US1818229A (en) * | 1928-02-23 | 1931-08-11 | Grasselli Chemical Co | Electroplating |
| US2029387A (en) * | 1934-03-14 | 1936-02-04 | Harshaw Chem Corp | Method and means of electrodeposition |
| US2112818A (en) * | 1934-08-15 | 1938-03-29 | Mcgean Chem Co Inc | Electrodeposition of metals |
| US2125229A (en) * | 1936-04-14 | 1938-07-26 | Harshaw Chem Corp | Electrodeposition of metals |
| US2171842A (en) * | 1936-07-13 | 1939-09-05 | Du Pont | Electroplating |
| US2198267A (en) * | 1939-12-14 | 1940-04-23 | Harshaw Chem Corp | Electrodeposition of metals |
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2550449A (en) * | 1946-04-20 | 1951-04-24 | Udylite Corp | Electrodeposition of nickel from an acid bath |
| DE1001078B (de) * | 1953-08-13 | 1957-01-17 | Dehydag Gmbh | Galvanische Baeder zur Herstellung von Metallueberzuegen |
| US3095362A (en) * | 1960-11-21 | 1963-06-25 | Incar Inc | Zinc plating composition and process |
| US3109784A (en) * | 1960-11-21 | 1963-11-05 | Incar Inc | Copper plating composition and process |
| US3152975A (en) * | 1961-02-07 | 1964-10-13 | Hanson Van Winkle Munning Co | Electrodeposition of nickel |
| US3417005A (en) * | 1965-12-27 | 1968-12-17 | Gen Motors Corp | Neutral nickel-plating process and bath therefor |
| US6045682A (en) * | 1998-03-24 | 2000-04-04 | Enthone-Omi, Inc. | Ductility agents for nickel-tungsten alloys |
Also Published As
| Publication number | Publication date |
|---|---|
| GB611483A (en) | 1948-10-29 |
| FR955898A (en)van) | 1950-01-20 |
| DE845732C (de) | 1952-08-04 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US2712522A (en) | Bright nickel plating | |
| US2830014A (en) | Electroplating process | |
| US2436316A (en) | Bright alloy plating | |
| US2523190A (en) | Electrodeposition of nickel from an acid bath | |
| US2191813A (en) | Electrodeposition of nickel from an acid bath | |
| US2882208A (en) | Electrodeposition of nickel | |
| US2466677A (en) | Electrodeposition of nickel from an acid bath | |
| US2770587A (en) | Bath for plating bright copper | |
| US2550449A (en) | Electrodeposition of nickel from an acid bath | |
| US2849353A (en) | Bright nickel plating | |
| US2773022A (en) | Electrodeposition from copper electrolytes containing dithiocarbamate addition agents | |
| US2427280A (en) | Nickel electroplating composition | |
| US2523191A (en) | Electrodeposition of nickel from an acid bath | |
| US3220940A (en) | Electrodeposition of nickel | |
| US2972571A (en) | Nickel plating solutions | |
| US2694041A (en) | Electrodeposition of nickel | |
| US2383798A (en) | Electroplating | |
| US3580821A (en) | Bright silver electroplating | |
| US3219558A (en) | Bright silver plating bath and process | |
| US2541700A (en) | Electroplating copper | |
| US4435254A (en) | Bright nickel electroplating | |
| US3401097A (en) | Electrodeposition of nickel | |
| US3969399A (en) | Electroplating processes and compositions | |
| US2648628A (en) | Electroplating of nickel | |
| US3000799A (en) | Nickel plating solutions |