US20200215509A1 - Method of manufacturing a large-grain crystallized metal chalcogenide film, and a crystallized metal chalcogenide film prepared using the method - Google Patents
Method of manufacturing a large-grain crystallized metal chalcogenide film, and a crystallized metal chalcogenide film prepared using the method Download PDFInfo
- Publication number
- US20200215509A1 US20200215509A1 US16/820,984 US202016820984A US2020215509A1 US 20200215509 A1 US20200215509 A1 US 20200215509A1 US 202016820984 A US202016820984 A US 202016820984A US 2020215509 A1 US2020215509 A1 US 2020215509A1
- Authority
- US
- United States
- Prior art keywords
- film
- layer
- substrate
- metal chalcogenide
- solution
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
Links
- 229910052751 metal Inorganic materials 0.000 title claims abstract description 93
- 239000002184 metal Substances 0.000 title claims abstract description 90
- 150000004770 chalcogenides Chemical class 0.000 title claims abstract description 67
- 238000000034 method Methods 0.000 title claims abstract description 57
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 12
- 239000000758 substrate Substances 0.000 claims abstract description 60
- 239000002105 nanoparticle Substances 0.000 claims abstract description 57
- 239000007787 solid Substances 0.000 claims abstract description 27
- 238000010521 absorption reaction Methods 0.000 claims abstract description 14
- 229910002475 Cu2ZnSnS4 Inorganic materials 0.000 claims abstract description 12
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 43
- 239000002904 solvent Substances 0.000 claims description 42
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 claims description 40
- 229910001868 water Inorganic materials 0.000 claims description 40
- 229910052717 sulfur Inorganic materials 0.000 claims description 28
- 239000010949 copper Substances 0.000 claims description 27
- 239000011135 tin Substances 0.000 claims description 27
- 229910052718 tin Inorganic materials 0.000 claims description 23
- 239000011701 zinc Substances 0.000 claims description 22
- 239000011521 glass Substances 0.000 claims description 20
- 229910052802 copper Inorganic materials 0.000 claims description 18
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 claims description 17
- 229910052750 molybdenum Inorganic materials 0.000 claims description 17
- 239000011733 molybdenum Substances 0.000 claims description 17
- 229910052725 zinc Inorganic materials 0.000 claims description 14
- 238000010438 heat treatment Methods 0.000 claims description 13
- 229910052711 selenium Inorganic materials 0.000 claims description 13
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 claims description 12
- 239000004065 semiconductor Substances 0.000 claims description 12
- 229910052760 oxygen Inorganic materials 0.000 claims description 11
- 238000002425 crystallisation Methods 0.000 claims description 10
- 230000008025 crystallization Effects 0.000 claims description 10
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 claims description 9
- 239000007789 gas Substances 0.000 claims description 9
- 229910052799 carbon Inorganic materials 0.000 claims description 8
- 238000009835 boiling Methods 0.000 claims description 7
- 229910052980 cadmium sulfide Inorganic materials 0.000 claims description 7
- 239000000463 material Substances 0.000 claims description 7
- PJXISJQVUVHSOJ-UHFFFAOYSA-N indium(iii) oxide Chemical compound [O-2].[O-2].[O-2].[In+3].[In+3] PJXISJQVUVHSOJ-UHFFFAOYSA-N 0.000 claims description 6
- 231100000252 nontoxic Toxicity 0.000 claims description 6
- 230000003000 nontoxic effect Effects 0.000 claims description 6
- 239000013110 organic ligand Substances 0.000 claims description 6
- 239000011787 zinc oxide Substances 0.000 claims description 6
- 230000003746 surface roughness Effects 0.000 claims description 5
- 238000000280 densification Methods 0.000 claims description 4
- 229910000831 Steel Inorganic materials 0.000 claims description 3
- 239000011358 absorbing material Substances 0.000 claims description 3
- 229910045601 alloy Inorganic materials 0.000 claims description 3
- 239000000956 alloy Substances 0.000 claims description 3
- 239000004411 aluminium Substances 0.000 claims description 3
- 229910052782 aluminium Inorganic materials 0.000 claims description 3
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 3
- 239000012159 carrier gas Substances 0.000 claims description 3
- 229910003437 indium oxide Inorganic materials 0.000 claims description 3
- 239000004571 lime Substances 0.000 claims description 3
- 150000002739 metals Chemical class 0.000 claims description 3
- 239000010959 steel Substances 0.000 claims description 3
- XTQHKBHJIVJGKJ-UHFFFAOYSA-N sulfur monoxide Chemical compound S=O XTQHKBHJIVJGKJ-UHFFFAOYSA-N 0.000 claims description 3
- WUPHOULIZUERAE-UHFFFAOYSA-N 3-(oxolan-2-yl)propanoic acid Chemical group OC(=O)CCC1CCCO1 WUPHOULIZUERAE-UHFFFAOYSA-N 0.000 claims description 2
- GKCNVZWZCYIBPR-UHFFFAOYSA-N sulfanylideneindium Chemical compound [In]=S GKCNVZWZCYIBPR-UHFFFAOYSA-N 0.000 claims description 2
- 239000000243 solution Substances 0.000 description 119
- 239000010408 film Substances 0.000 description 69
- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 description 61
- 239000000084 colloidal system Substances 0.000 description 59
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 36
- 239000002243 precursor Substances 0.000 description 36
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 32
- 238000000151 deposition Methods 0.000 description 28
- 239000000203 mixture Substances 0.000 description 28
- 230000008021 deposition Effects 0.000 description 25
- 239000002245 particle Substances 0.000 description 23
- 238000005507 spraying Methods 0.000 description 23
- 238000004627 transmission electron microscopy Methods 0.000 description 23
- 238000000137 annealing Methods 0.000 description 18
- 230000015572 biosynthetic process Effects 0.000 description 18
- 239000006185 dispersion Substances 0.000 description 18
- 239000003446 ligand Substances 0.000 description 18
- 238000006243 chemical reaction Methods 0.000 description 17
- 229910052757 nitrogen Inorganic materials 0.000 description 16
- 239000011669 selenium Substances 0.000 description 16
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 15
- 230000001476 alcoholic effect Effects 0.000 description 14
- 239000011593 sulfur Substances 0.000 description 14
- 238000003786 synthesis reaction Methods 0.000 description 13
- 238000002360 preparation method Methods 0.000 description 12
- 239000012535 impurity Substances 0.000 description 11
- 239000007788 liquid Substances 0.000 description 11
- 239000000843 powder Substances 0.000 description 11
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 10
- 238000001228 spectrum Methods 0.000 description 10
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 9
- 229910052787 antimony Inorganic materials 0.000 description 9
- 239000007864 aqueous solution Substances 0.000 description 9
- 238000002149 energy-dispersive X-ray emission spectroscopy Methods 0.000 description 9
- 230000007062 hydrolysis Effects 0.000 description 9
- 238000006460 hydrolysis reaction Methods 0.000 description 9
- 150000003839 salts Chemical class 0.000 description 9
- 238000002441 X-ray diffraction Methods 0.000 description 8
- 239000002002 slurry Substances 0.000 description 8
- 229910052959 stibnite Inorganic materials 0.000 description 8
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 7
- 238000005119 centrifugation Methods 0.000 description 7
- -1 chalcogenide compounds Chemical class 0.000 description 7
- 238000002156 mixing Methods 0.000 description 7
- 239000001301 oxygen Substances 0.000 description 7
- 238000004626 scanning electron microscopy Methods 0.000 description 7
- 231100000331 toxic Toxicity 0.000 description 7
- 230000002588 toxic effect Effects 0.000 description 7
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 6
- OAKJQQAXSVQMHS-UHFFFAOYSA-N Hydrazine Chemical compound NN OAKJQQAXSVQMHS-UHFFFAOYSA-N 0.000 description 6
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 6
- 239000002253 acid Substances 0.000 description 6
- 238000004458 analytical method Methods 0.000 description 6
- 230000008901 benefit Effects 0.000 description 6
- 238000004090 dissolution Methods 0.000 description 6
- 239000006193 liquid solution Substances 0.000 description 6
- 238000005259 measurement Methods 0.000 description 6
- 230000003647 oxidation Effects 0.000 description 6
- 238000007254 oxidation reaction Methods 0.000 description 6
- 239000012071 phase Substances 0.000 description 6
- 239000000126 substance Substances 0.000 description 6
- 238000005303 weighing Methods 0.000 description 6
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 5
- 238000000354 decomposition reaction Methods 0.000 description 5
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 5
- DQWPFSLDHJDLRL-UHFFFAOYSA-N triethyl phosphate Chemical compound CCOP(=O)(OCC)OCC DQWPFSLDHJDLRL-UHFFFAOYSA-N 0.000 description 5
- 239000011592 zinc chloride Substances 0.000 description 5
- JIAARYAFYJHUJI-UHFFFAOYSA-L zinc dichloride Chemical compound [Cl-].[Cl-].[Zn+2] JIAARYAFYJHUJI-UHFFFAOYSA-L 0.000 description 5
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 4
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 4
- VMQMZMRVKUZKQL-UHFFFAOYSA-N Cu+ Chemical compound [Cu+] VMQMZMRVKUZKQL-UHFFFAOYSA-N 0.000 description 4
- BUGBHKTXTAQXES-UHFFFAOYSA-N Selenium Chemical compound [Se] BUGBHKTXTAQXES-UHFFFAOYSA-N 0.000 description 4
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 4
- 229910021627 Tin(IV) chloride Inorganic materials 0.000 description 4
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 4
- 230000002776 aggregation Effects 0.000 description 4
- 150000001768 cations Chemical class 0.000 description 4
- 229910052798 chalcogen Inorganic materials 0.000 description 4
- 150000001787 chalcogens Chemical class 0.000 description 4
- 150000001875 compounds Chemical class 0.000 description 4
- 239000013078 crystal Substances 0.000 description 4
- VDQVEACBQKUUSU-UHFFFAOYSA-M disodium;sulfanide Chemical compound [Na+].[Na+].[SH-] VDQVEACBQKUUSU-UHFFFAOYSA-M 0.000 description 4
- 238000002003 electron diffraction Methods 0.000 description 4
- 238000001493 electron microscopy Methods 0.000 description 4
- 238000000386 microscopy Methods 0.000 description 4
- 230000007935 neutral effect Effects 0.000 description 4
- 229910052759 nickel Inorganic materials 0.000 description 4
- 239000003960 organic solvent Substances 0.000 description 4
- 229910052709 silver Inorganic materials 0.000 description 4
- 239000004332 silver Substances 0.000 description 4
- 239000006228 supernatant Substances 0.000 description 4
- 238000010345 tape casting Methods 0.000 description 4
- 229910052714 tellurium Inorganic materials 0.000 description 4
- HPGGPRDJHPYFRM-UHFFFAOYSA-J tin(iv) chloride Chemical compound Cl[Sn](Cl)(Cl)Cl HPGGPRDJHPYFRM-UHFFFAOYSA-J 0.000 description 4
- 229910004613 CdTe Inorganic materials 0.000 description 3
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 3
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 3
- 229910021591 Copper(I) chloride Inorganic materials 0.000 description 3
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 3
- 239000012080 ambient air Substances 0.000 description 3
- 230000005540 biological transmission Effects 0.000 description 3
- 229910052797 bismuth Inorganic materials 0.000 description 3
- 239000006227 byproduct Substances 0.000 description 3
- XIEPJMXMMWZAAV-UHFFFAOYSA-N cadmium nitrate Inorganic materials [Cd+2].[O-][N+]([O-])=O.[O-][N+]([O-])=O XIEPJMXMMWZAAV-UHFFFAOYSA-N 0.000 description 3
- 239000000460 chlorine Substances 0.000 description 3
- 230000000536 complexating effect Effects 0.000 description 3
- OXBLHERUFWYNTN-UHFFFAOYSA-M copper(I) chloride Chemical compound [Cu]Cl OXBLHERUFWYNTN-UHFFFAOYSA-M 0.000 description 3
- 239000008367 deionised water Substances 0.000 description 3
- 229910021641 deionized water Inorganic materials 0.000 description 3
- IDGUHHHQCWSQLU-UHFFFAOYSA-N ethanol;hydrate Chemical group O.CCO IDGUHHHQCWSQLU-UHFFFAOYSA-N 0.000 description 3
- 229910052732 germanium Inorganic materials 0.000 description 3
- 238000002347 injection Methods 0.000 description 3
- 239000007924 injection Substances 0.000 description 3
- 239000012528 membrane Substances 0.000 description 3
- 229910001510 metal chloride Inorganic materials 0.000 description 3
- 229910021645 metal ion Inorganic materials 0.000 description 3
- 239000012299 nitrogen atmosphere Substances 0.000 description 3
- 239000011780 sodium chloride Substances 0.000 description 3
- 229910052979 sodium sulfide Inorganic materials 0.000 description 3
- 230000002269 spontaneous effect Effects 0.000 description 3
- RMZAYIKUYWXQPB-UHFFFAOYSA-N trioctylphosphane Chemical compound CCCCCCCCP(CCCCCCCC)CCCCCCCC RMZAYIKUYWXQPB-UHFFFAOYSA-N 0.000 description 3
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 2
- 229910021626 Tin(II) chloride Inorganic materials 0.000 description 2
- PDYXSJSAMVACOH-UHFFFAOYSA-N [Cu].[Zn].[Sn] Chemical compound [Cu].[Zn].[Sn] PDYXSJSAMVACOH-UHFFFAOYSA-N 0.000 description 2
- 230000001464 adherent effect Effects 0.000 description 2
- 238000005054 agglomeration Methods 0.000 description 2
- 238000004220 aggregation Methods 0.000 description 2
- 150000001412 amines Chemical class 0.000 description 2
- WATWJIUSRGPENY-UHFFFAOYSA-N antimony atom Chemical compound [Sb] WATWJIUSRGPENY-UHFFFAOYSA-N 0.000 description 2
- FAPDDOBMIUGHIN-UHFFFAOYSA-K antimony trichloride Chemical compound Cl[Sb](Cl)Cl FAPDDOBMIUGHIN-UHFFFAOYSA-K 0.000 description 2
- 239000012736 aqueous medium Substances 0.000 description 2
- 229910052786 argon Inorganic materials 0.000 description 2
- 239000012298 atmosphere Substances 0.000 description 2
- 230000005587 bubbling Effects 0.000 description 2
- OKIIEJOIXGHUKX-UHFFFAOYSA-L cadmium iodide Chemical compound [Cd+2].[I-].[I-] OKIIEJOIXGHUKX-UHFFFAOYSA-L 0.000 description 2
- 239000013626 chemical specie Substances 0.000 description 2
- 239000003795 chemical substances by application Substances 0.000 description 2
- 230000001627 detrimental effect Effects 0.000 description 2
- 229960001760 dimethyl sulfoxide Drugs 0.000 description 2
- 238000001035 drying Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000004070 electrodeposition Methods 0.000 description 2
- 238000001704 evaporation Methods 0.000 description 2
- 230000008020 evaporation Effects 0.000 description 2
- 239000010931 gold Substances 0.000 description 2
- XMBWDFGMSWQBCA-UHFFFAOYSA-N hydrogen iodide Chemical compound I XMBWDFGMSWQBCA-UHFFFAOYSA-N 0.000 description 2
- 229910052738 indium Inorganic materials 0.000 description 2
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 description 2
- 150000004694 iodide salts Chemical class 0.000 description 2
- 150000002500 ions Chemical class 0.000 description 2
- 238000003760 magnetic stirring Methods 0.000 description 2
- 239000002609 medium Substances 0.000 description 2
- 229910000069 nitrogen hydride Inorganic materials 0.000 description 2
- 150000007524 organic acids Chemical group 0.000 description 2
- 239000002244 precipitate Substances 0.000 description 2
- 239000011164 primary particle Substances 0.000 description 2
- 238000007639 printing Methods 0.000 description 2
- 239000000047 product Substances 0.000 description 2
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 2
- 230000005855 radiation Effects 0.000 description 2
- 239000000523 sample Substances 0.000 description 2
- 238000000926 separation method Methods 0.000 description 2
- 239000011734 sodium Substances 0.000 description 2
- 229910052708 sodium Inorganic materials 0.000 description 2
- VPQBLCVGUWPDHV-UHFFFAOYSA-N sodium selenide Chemical compound [Na+].[Na+].[Se-2] VPQBLCVGUWPDHV-UHFFFAOYSA-N 0.000 description 2
- 238000001308 synthesis method Methods 0.000 description 2
- 238000012360 testing method Methods 0.000 description 2
- 150000003573 thiols Chemical class 0.000 description 2
- UMGDCJDMYOKAJW-UHFFFAOYSA-N thiourea Chemical compound NC(N)=S UMGDCJDMYOKAJW-UHFFFAOYSA-N 0.000 description 2
- AXZWODMDQAVCJE-UHFFFAOYSA-L tin(II) chloride (anhydrous) Chemical compound [Cl-].[Cl-].[Sn+2] AXZWODMDQAVCJE-UHFFFAOYSA-L 0.000 description 2
- QPBYLOWPSRZOFX-UHFFFAOYSA-J tin(iv) iodide Chemical compound I[Sn](I)(I)I QPBYLOWPSRZOFX-UHFFFAOYSA-J 0.000 description 2
- 231100000419 toxicity Toxicity 0.000 description 2
- 230000001988 toxicity Effects 0.000 description 2
- UAYWVJHJZHQCIE-UHFFFAOYSA-L zinc iodide Chemical compound I[Zn]I UAYWVJHJZHQCIE-UHFFFAOYSA-L 0.000 description 2
- QGLWBTPVKHMVHM-KTKRTIGZSA-N (z)-octadec-9-en-1-amine Chemical compound CCCCCCCC\C=C/CCCCCCCCN QGLWBTPVKHMVHM-KTKRTIGZSA-N 0.000 description 1
- GNFTZDOKVXKIBK-UHFFFAOYSA-N 3-(2-methoxyethoxy)benzohydrazide Chemical compound COCCOC1=CC=CC(C(=O)NN)=C1 GNFTZDOKVXKIBK-UHFFFAOYSA-N 0.000 description 1
- MARUHZGHZWCEQU-UHFFFAOYSA-N 5-phenyl-2h-tetrazole Chemical compound C1=CC=CC=C1C1=NNN=N1 MARUHZGHZWCEQU-UHFFFAOYSA-N 0.000 description 1
- 229910000980 Aluminium gallium arsenide Inorganic materials 0.000 description 1
- 229910017214 AsGa Inorganic materials 0.000 description 1
- JBRZTFJDHDCESZ-UHFFFAOYSA-N AsGa Chemical compound [As]#[Ga] JBRZTFJDHDCESZ-UHFFFAOYSA-N 0.000 description 1
- FGUUSXIOTUKUDN-IBGZPJMESA-N C1(=CC=CC=C1)N1C2=C(NC([C@H](C1)NC=1OC(=NN=1)C1=CC=CC=C1)=O)C=CC=C2 Chemical compound C1(=CC=CC=C1)N1C2=C(NC([C@H](C1)NC=1OC(=NN=1)C1=CC=CC=C1)=O)C=CC=C2 FGUUSXIOTUKUDN-IBGZPJMESA-N 0.000 description 1
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 1
- 229910021595 Copper(I) iodide Inorganic materials 0.000 description 1
- 229910021592 Copper(II) chloride Inorganic materials 0.000 description 1
- 229910017518 Cu Zn Inorganic materials 0.000 description 1
- 239000012691 Cu precursor Substances 0.000 description 1
- 229910018034 Cu2Sn Inorganic materials 0.000 description 1
- 229910016345 CuSb Inorganic materials 0.000 description 1
- 229910005263 GaI3 Inorganic materials 0.000 description 1
- GYHNNYVSQQEPJS-UHFFFAOYSA-N Gallium Chemical compound [Ga] GYHNNYVSQQEPJS-UHFFFAOYSA-N 0.000 description 1
- 229910021621 Indium(III) iodide Inorganic materials 0.000 description 1
- REYJJPSVUYRZGE-UHFFFAOYSA-N Octadecylamine Chemical compound CCCCCCCCCCCCCCCCCCN REYJJPSVUYRZGE-UHFFFAOYSA-N 0.000 description 1
- 229910018828 PO3H2 Inorganic materials 0.000 description 1
- XYFCBTPGUUZFHI-UHFFFAOYSA-N Phosphine Natural products P XYFCBTPGUUZFHI-UHFFFAOYSA-N 0.000 description 1
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical group OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 1
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 1
- 239000004809 Teflon Substances 0.000 description 1
- 229920006362 Teflon® Polymers 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- XSQUKJJJFZCRTK-UHFFFAOYSA-N Urea Natural products NC(N)=O XSQUKJJJFZCRTK-UHFFFAOYSA-N 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- 230000001133 acceleration Effects 0.000 description 1
- 239000003570 air Substances 0.000 description 1
- 150000003973 alkyl amines Chemical class 0.000 description 1
- 150000001408 amides Chemical class 0.000 description 1
- 229910021529 ammonia Inorganic materials 0.000 description 1
- 239000003125 aqueous solvent Substances 0.000 description 1
- 238000004630 atomic force microscopy Methods 0.000 description 1
- 238000000889 atomisation Methods 0.000 description 1
- 239000005388 borosilicate glass Substances 0.000 description 1
- 229910052793 cadmium Inorganic materials 0.000 description 1
- BDOSMKKIYDKNTQ-UHFFFAOYSA-N cadmium atom Chemical compound [Cd] BDOSMKKIYDKNTQ-UHFFFAOYSA-N 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- 238000006555 catalytic reaction Methods 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 238000012512 characterization method Methods 0.000 description 1
- NCEXYHBECQHGNR-UHFFFAOYSA-N chembl421 Chemical compound C1=C(O)C(C(=O)O)=CC(N=NC=2C=CC(=CC=2)S(=O)(=O)NC=2N=CC=CC=2)=C1 NCEXYHBECQHGNR-UHFFFAOYSA-N 0.000 description 1
- 239000007795 chemical reaction product Substances 0.000 description 1
- 238000000224 chemical solution deposition Methods 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 150000003841 chloride salts Chemical class 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 238000010549 co-Evaporation Methods 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- ORTQZVOHEJQUHG-UHFFFAOYSA-L copper(II) chloride Chemical compound Cl[Cu]Cl ORTQZVOHEJQUHG-UHFFFAOYSA-L 0.000 description 1
- 239000002178 crystalline material Substances 0.000 description 1
- 230000001351 cycling effect Effects 0.000 description 1
- 238000006731 degradation reaction Methods 0.000 description 1
- 230000001687 destabilization Effects 0.000 description 1
- 230000001066 destructive effect Effects 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- 239000002360 explosive Substances 0.000 description 1
- 230000002349 favourable effect Effects 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- 239000010419 fine particle Substances 0.000 description 1
- 238000009472 formulation Methods 0.000 description 1
- 229910052733 gallium Inorganic materials 0.000 description 1
- DWRNSCDYNYYYHT-UHFFFAOYSA-K gallium(iii) iodide Chemical compound I[Ga](I)I DWRNSCDYNYYYHT-UHFFFAOYSA-K 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000010439 graphite Substances 0.000 description 1
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- H01L31/02—Details
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- H01L31/0248—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies
- H01L31/0256—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by the material
- H01L31/0264—Inorganic materials
- H01L31/032—Inorganic materials including, apart from doping materials or other impurities, only compounds not provided for in groups H01L31/0272 - H01L31/0312
- H01L31/0326—Inorganic materials including, apart from doping materials or other impurities, only compounds not provided for in groups H01L31/0272 - H01L31/0312 comprising AIBIICIVDVI kesterite compounds, e.g. Cu2ZnSnSe4, Cu2ZnSnS4
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- H01L31/0248—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies
- H01L31/036—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by their crystalline structure or particular orientation of the crystalline planes
- H01L31/0368—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by their crystalline structure or particular orientation of the crystalline planes including polycrystalline semiconductors
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- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/18—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
- H01L31/1828—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof the active layers comprising only AIIBVI compounds, e.g. CdS, ZnS, CdTe
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
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Definitions
- the present invention relates to a method for making a film or continuous thin layer of crystallized metal chalcogenide with large grains deposited on a substrate.
- the present invention relates to a solid photovoltaic device comprising a film or a so-called metal chalcogenide layer as an absorption layer.
- a metal chalcogenide layer according to the invention will be used as an absorption layer on a solid photovoltaic device, notably of the substrate type or of the superstrate type comprising at least:
- a solid photovoltaic device said to be of the superstrate type
- the layers above are completed with a glass layer forming the front face (sunny side) of the device, applied against said front contact layer.
- Solid photovoltaic devices with a structure of the substrate type or of the superstrate type are well known to one skilled in the art. For example they are described in the preface of the book «Thin film solar cells; manufacture, characterization and applications», edited by Jef Poortmans and Vladimir Arvicpov, Wiley 2007, ISBN 13 9780470 09126-5, (preface on page xxiv).
- the present invention also relates to a method for preparing a colloidal aqueous solution of amorphous nanoparticles of a metal chalcogenide according to the invention, to the obtained colloidal solution and to its use for making a film of metal chalcogenides with large grains.
- «colloidal solution» or «colloid is meant a liquid of a homogenous dispersion of particles for which the dimensions range from 2 to 500 nm, it being understood that below 2 nm, a liquid solution and not a so-called «colloidal solution» is obtained.
- the stability of such a homogenous dispersion is due to the slow separation of the two solid and respective liquid phases.
- material consisting of amorphous nanoparticles is meant a material containing no or very few crystallized particles, i.e. characterized by the absence of a diffraction peak, by diffraction of X-rays (XRD technique).
- the present invention relates to metal chalcogenides of formula M-C wherein:
- the highest photovoltaic conversion rates based on metal chalcogenides are greater than 20%; they are obtained today with photovoltaic cells comprising as an absorption layer, a layer of the type CuIn 1-1 , Ga x Se 2 .
- Cadmium telluride CdTe is another well known example from among metal chalcogenides which gives the possibility of obtaining photovoltaic devices with high yield (>17%). But, the relatively low abundance of cadmium and tellurium, as well as the toxicity of Cd are a problem.
- the metal chalcogenide compounds M-C as defined above are of particular interest for manufacturing an absorption layer of an inexpensive photovoltaic device with relatively high yield, since the metals M listed above are abundant and non-toxic.
- the present invention more particularly relates to absorption layers of the Cu 2 ZnSnS 4 (CZTS) type as well as to their derivatives Cu 2 Zn(Sn 1-y , Ge y )(S 1-x , Se x ) 4 (noted as CZTGSSe), SnS, Sb 2 S 3 and Cu 2 Zn(Sn 1-y , Sb y )(S 1-x , Se x ) 4 and/or CuSb(S, Se) 2 .
- CZTS Cu 2 ZnSnS 4
- the metal chalcogenide layers for photovoltaic cells are traditionally obtained with vacuum deposition methods such as co-evaporation (CIGSe), sublimation in a closed space (CdTe) or further sputtering (CZTSSe).
- vacuum deposition methods such as co-evaporation (CIGSe), sublimation in a closed space (CdTe) or further sputtering (CZTSSe).
- CGSe co-evaporation
- CdTe sublimation in a closed space
- CZTSSe further sputtering
- deposition methods at ambient pressure are therefore preferable, such as for example deposition in a chemical bath, electrochemical deposition, spraying, printing or tape casting.
- Deposition in a chemical bath is generally characterized by low deposition rates relatively to the desirable thickness for the active layer (of the order of one micrometer), by compromises between low chemical yield and thickness uniformities (a fortiori on large surfaces) and the formation of material with low crystalline quality (which requires subsequent annealing) with inclusion of more or less controlled impurities which makes the technique unsuitable for manufacturing the photovoltaic active layer.
- electrochemical deposition does not either allow continuous deposition and poses problems for controlling uniformity over large surfaces, which imposes relatively slow deposition rates.
- the colloidal solution has certain advantages.
- the useful species copper, tin, sulfur, etc.
- the solvent for example in ionic form (example Cut) or as ionic complexes (example Cu(CH 3 CN) 4 + , Cu(NH 3 )n] 2+ , Sn(OH) 6 ] 2 ⁇ etc.).
- a colloidal solution also-called a «colloid», solid particles are present in a suspension and consisting of useful chemical species; the size of these particles is less than 1 mm and typically of the order of a few tens of nanometers.
- a first benefit of the colloidal solution is to be able to separate the useful solid portion i.e. the particles, from the liquid portion (by filtration or sedimentation/centrifugation) and thus be able to rinse the colloid from its impurities and from possible secondary products, residues of chemical reactions which may have been used for making the colloid.
- a second benefit is that the useful chemical species are already gathered in a solid way at an atomic scale with stoichiometry/chemical composition equal to or close to the desired final composition, which ensures better control of the final composition, relatively to a liquid solution which may easily be poorly mixed.
- a third benefit of the colloidal solution is that it may be used as a starting solution for forming a dense layer with different methods, the nanoparticles may be dried and sintered so as to produce a more or less porous material (for then being used for diverse applications, such as electrodes for batteries, for catalysis, etc.) or else re-dispersed in a dispersion liquid allowing deposition by spraying or by tape casting on a substrate. Further, it is also possible to deposit the particles on an inside of a nano-porous substrate in order to modify the surface properties thereof.
- nano-porous films of nanocrystalline TiO 2 (n semi-conductor) of a photovoltaic device for example by soaking a nano-porous TiO 2 substrate in a so-called colloidal solution of a metal chalcogenide.
- WO2008/021604A2 Another relatively well documented method in the literature is the method said to be «by hot injection of precursors» (WO2008/021604A2).
- This method consists of conducting a chemical reaction, for several hours and at a high temperature (between 220° C. and 300° C.) between metal precursors (salts in the form of powders) dissolved in an oleylamine solvent or other solvents, also toxic or dangerous for humans and/or the environment, of the alkylamine or alkyl phosphine (TOPO) type, and of hot injecting a solution containing the chalcogen.
- metal sulfur, selenium or a salt based on sulfur is typically dissolved in TriOctylPhOsphine (TOPO) oxides.
- TriOctylPhOsphine oxide is extremely destructive for tissues of mucosas, of the upper respiratory tract, of the eyes and of the skin.
- the octadecylamine organic solvent used for dissolving the sulfur powder is a flammable, explosive and extremely dangerous solvent for the eyes, the skin and aquatic media. This is why more particularly the invention relates to a method for preparing a metal chalcogenide colloidal solution.
- the active absorbing layer of the photovoltaic device based on inorganic crystalline semi-conductors such as silicon, semi-conductors III-V (AsGa, AlGaAs etc.) or metal chalcogenides CdTe, CIGS or CZTS, consists of small grains, and that better photovoltaic cells are made from continuous layers with large grains.
- the desired grain sizes are of the order of the thickness of the layer, itself of the order of one micrometer.
- the colloidal synthesis methods are directed to making crystallized particles.
- the arguments put forward are generally greater purity, or else the obtaining of a less porous layer, or else further better control of the elementary composition of the particles at an atomic scale (before even forming the layer) and therefore of that of the final layer.
- the final crystalline layer which is targeted would be obtained more easily from crystalline particles, since they already incorporate the desired crystalline phase.
- these methods for making a colloidal solution of crystallized metal chalcogenide particles require addition of ligands, the crystal growth then being thermally activated at 200° C. or more, which represents long and costly methods.
- the films made from these colloidal solutions of crystalline metal chalcogenide nanoparticles nevertheless have then to be generally subject to additional heat treatment at higher temperatures, of the order of 400 to 600° C., this in order to densify, agglomerate and increase the size of the crystals, preferably up to a grain size close to the total thickness of the film, typically of the order of one micrometer. It would be advantageous, at least economically (lesser thermal budget), to conduct the colloidal synthesis of the particles without having to heat during the synthesis at 200° C.
- a technique known to one skilled in the art for efficiently reducing the problems of hydrolysis and of oxidation in an aqueous medium consists of protecting an ionic species in solution with a ligand.
- WO2011/066205 and WO2011/146791 a method for synthesis of a colloidal solution of crystalline copper chalcogenide nanoparticles is described, wherein metal and chalcogen precursor solutions are applied with ligands, in an acid medium for adjusting the pH and avoiding hydrolysis and/or oxidation of the metal ion species.
- ligand is meant here a coordination species consisting of an ion or a molecule bearing chemical functions allowing it to bind to one or several metal central atoms or ions through a covalent bond.
- copper chalcogenide nanoparticles are produced from a reaction mixture of precursor solutions with stirring for several hours and optionally with heating to 100° C. and beyond.
- the ligands are organic molecules comprising amine, thiol or organic acid groups. These organic ligands aim at complexing said metal in order to slow down the kinetics of the reaction between the metal precursors and the chalcogenide precursor with view to obtaining a colloidal solution of crystallized nanoparticles as shown in FIG. 3 (and not a colloidal solution of amorphous nanoparticles according to the present invention).
- the colloidal solutions obtained are not very stable and, the presence of ligands in said colloidal solutions obtained makes the method less easy (heating required), longer and more costly, and furthermore in the crystallized chalcogenide film obtained after deposition and annealing of the colloidal solution on a substrate, the carbon or oxide residues from the decomposition of the ligands is a drawback since they may prevent crystallization and/or limit the formation of large grains and/or generate impurities generating electric faults, which is detrimental to the photovoltaic properties of the film.
- acetonitrile is not mentioned as a ligand and does not correspond to the given definition of a ligand, but is mentioned as a formulation solvent of the colloidal solution after its preparation.
- a colloidal solution of a metal chalcogenide CuInGaSe 2 (CIGS) is more particularly prepared and in Zhang et al. above, a metal chalcogenide Cu 2 ZnSn(S,Se) 4 (CZTSSe) is prepared from a precursor solution in organic solvents, pyridine and methanol. More particularly, in this method, the question is to typically dissolve metal precursor salts i.e.
- iodides such as CuI, CdI 2 , ZnI 2 , SnI 4 , InI 3 , GaI 3 , in pyridine, and on the other hand dissolve a chalcogenide precursor salt (of sodium or potassium, such as Na 2 Te, Na 2 Se, or Na 2 S) in methanol. Both of these solutions are then mixed at ⁇ 78° C. or ⁇ 42° C. or further ⁇ 0° C. according to the published cases (and not by hot injection as this is the customary case in methods for colloidal synthesis of crystallized nanoparticles), by introducing the sulfur/methanol solution into the metal/pyridine solution, and then the mixture is brought back to room temperature for several minutes during which the unstable colloid naturally precipitates.
- a chalcogenide precursor salt of sodium or potassium, such as Na 2 Te, Na 2 Se, or Na 2 S
- the initial colloidal solutions (before forming a thin layer) were therefore colloidal non-aqueous solutions of non-crystallized (amorphous) or slightly crystallized nanoparticles.
- the CIGS films obtained always included an intermediate layer consisting of small grains, which does not correspond to the criteria of a high quality layer for a photovoltaic application. Indeed, the low photovoltaic performance of the CIGS cell was ascribed to the high series resistance of this intermediate, porous and small-grain layer.
- a first object of the present invention is therefore to provide a novel method for preparing a colloidal solution of metal chalcogenide nanoparticles which is fast and economical to carry out, notably a method which allows preparation of a colloidal solution at room temperature not requiring heating for hours at 100° C. and beyond and not requiring cooling down to 0° C. or below.
- Another object of the present invention is therefore to provide a method allowing preparation of metal chalcogenide colloidal solutions of formula M-C as defined above, not involving the application of toxic solvents or requiring cold reaction temperatures, in particular a temperature of less than or equal to 0° C.
- Another object of the present invention is to provide a method for making a film obtained from a colloidal solution with which it is possible to obtain metal chalcogenide crystals with large grains, said film being deposited on a substrate, useful for imparting high photovoltaic performances to a photovoltaic device comprising them.
- an object of the present invention is therefore to provide a method for preparing a colloidal solution of metal chalcogenide of formula M-C as defined above which is carried out at room temperature and at an atmospheric pressure not involving the application of a dangerous and/or toxic solvent or the application of a ligand with a covalent bond as defined above and/or without adding acid in precursor solutions upon preparing the colloidal solutions.
- an object of the present invention is to provide a stable colloidal solution of amorphous nanoparticles of a metal chalcogenide which allows it to be deposited at atmospheric pressure and at room temperature and then densified by annealing on a substrate in order to obtain a crystallized metal chalcogenide film in the form of large grains with a low roughness surface condition.
- the present invention provides a method for quasi-instantaneous preparation, and at room temperature, of a colloidal aqueous, alcoholic or hydro-alcoholic solution of amorphous nanoparticles of metal chalcogenides of formula M-C wherein:
- both of said first and second solutions of precursors are mixed at atmospheric pressure and at room temperature until a crude colloidal solution is obtained quasi-instantaneously, comprising primary amorphous nanoparticles with sizes of less than 30 nm, preferably 3 to 20 nm, and
- step d) the solid portion is separated from said colloidal solution of step c), preferably by centrifugation in order to obtain a solid residue after removing the liquid supernatant, and
- step d) the solid residue obtained in step d) is rinsed by pouring on it an aqueous, alcoholic or hydro-alcoholic solution in order to form a colloidal solution, the alcohol of said aqueous, alcoholic or hydro-alcoholic colloidal solution being other than methanol, preferably ethanol, and
- said humid paste from step f) is re-dispersed in a dispersion solvent comprising, preferably consisting, an aqueous, alcoholic or hydro-alcoholic solution, the alcohol of said alcoholic or hydro-alcoholic solution being, if necessary, a non-toxic alcohol, notably an alcohol other than methanol.
- a dispersion solvent comprising, preferably consisting, an aqueous, alcoholic or hydro-alcoholic solution, the alcohol of said alcoholic or hydro-alcoholic solution being, if necessary, a non-toxic alcohol, notably an alcohol other than methanol.
- the preliminary preparation is achieved at room temperature or requiring reduced heating of two separate solutions of precursors based on salts of M and respectively a salt of C with different solvents, without adding any ligand, notably steps a) and b), and their mixture at a reduced temperature notably at room temperature and under atmospheric pressure as defined in steps a) to c).
- step c) The smallest size of the nanoparticles obtained in step c) makes the rinsing steps d) to g) more effective for removing the by-products of the reaction as well as the synthesis solvent acetonitrile and other residual impurities.
- ligand is meant here an organic molecule (other than the molecule C) capable of binding and/or complexing a said first metal M, notably an organic molecule substituted with at least one group selected from the amine (—NH 2 ), thiol (—SH), amide or thioamide groups, notably —CONH 2 or —CSNH 2 , and/or organic acid groups (such as the carboxylic acid group —COOH) or a phosphoric acid group, notably —PO 3 H 2 .
- a colloidal solution stable at room temperature obtained without adding any ligand is not only easier to obtain and to apply, but further, it comprises less residual impurities, which contributes to improving the quality of a film obtained after deposition and annealing of the colloidal solution as described hereafter. In particular, this contributes to obtaining a crystallized continuous film with large grains and more homogenous with better photovoltaic performances.
- a dispersion solvent is applied, consisting in an aqueous, alcoholic or hydro-alcoholic solution, the alcohol of said alcoholic or hydro-alcoholic solution being a non-toxic alcohol having a boiling temperature of less than the boiling temperature of water, preferably ethanol or propanol, still preferably consisting in a water/ethanol mixture.
- dispersion solvents were selected for their property of dispersion of amorphous nanoparticles (concentration, stability of the colloid, viscosity, non-toxicity), giving the possibility of forming a liquid, homogenous and stable colloid with amorphous nanoparticles of small sizes, which do not naturally precipitate at room temperature before at least 24 hours, and may be deposited by spraying (viscosity, vapor pressure and evaporation temperature) under optimum conditions in order to obtain a continuous, homogenous film without any impurities as described hereafter.
- An alcohol having a boiling point below that of water is advantageous because in a method for making a film obtained by deposition, by spraying and annealing of the colloidal solution on a substrate as described hereafter, during the contact of the colloidal solution on the hot plate of the substrate, evaporation of the solvents occurs and it appears to be preferable that the alcohol evaporates before the water in order to set aside the risks of residual carbon contamination stemming from said alcohol within said film.
- Ethanol and propanol are preferred because of their total miscibility in water, in addition to their boiling temperature below that of water (and a vapour pressure greater than that of water).
- the room temperature used for the preparation of the solutions as well as during the mixing of steps a) to c) is defined as a temperature comprised between 0° C. and 50° C., preferably from 20 to 40° C.
- This method for preparing a colloidal solution according to the invention is therefore particularly advantageous in that:
- step c The rapidity of the reaction in step c), typically carried out in a time interval of less than one minute, even less than 5 seconds, is the consequence of the absence of any complexing ligand and binding said metal.
- This reaction rapidity of the precursors in step c), contributes to obtaining amorphous nanoparticles and of smaller sizes, the nanoparticles not having the time for growing at the expense of the others.
- the high concentrations and small sizes of nanoparticles impart greater stability to the colloid of nanoparticles obtained in step c), the latter remaining stable for at least two days at room temperature.
- the colloidal solution obtained further gives the possibility of obtaining a film of crystalline metal chalcogenide(s) with large grains according to the object of the present invention after deposition and annealing of a layer of amorphous metal chalcogenide nanoparticles on a substrate.
- Another advantage of the use during the colloidal synthesis, of an aqueous, alcoholic or hydro-alcoholic solvent according to the invention is that they allow easier dissolution of the chalcogenide precursor salts, i.e. in stronger concentrations, notably a concentration of more than 5 M (moles per liter) in the case of the NaSH or Na 2 S salts.
- the obtained colloids may thus be further concentrated.
- the reaction by-products are more easily dissolved and removed by means of a lesser number of rinsing steps with aqueous or hydro-alcoholic rinsing solvents.
- the metal halide salt or metal precursor M was often in the form of an iodide, the iodide being better dissolved than the chloride in the applied organic solvents.
- the application of chloride precursors according to the present invention, notably in an aqueous or hydro-alcoholic medium is, however, advantageous since chloride salts are more easy to access (and less expensive) and the colloid CZTS which results from them is more stable than with iodide precursors.
- M is a ternary mixture of Cu, Zn and Sn, and C is S, and preferably in step c) amorphous nanoparticles of Cu 2 ZnSnS 4 are obtained.
- metal chalcogenide only containing the chalcogen S without any selenium (Se) is advantageous since selenium reduces the band gap of the absorption layer and once it is applied in a photovoltaic device, the metal chalcogenide with only S gives the possibility of obtaining greater photovoltaic voltages (beyond 0.6 Volts according to the literature).
- M-C is selected from Sb 2 S 3 and SnS.
- M-C is selected from CuSbS 2 , Cu 2 Sn(S, Se) 3 , Cu 2 Zn(Sn, Sb)S 4 , Cu 3 BiS 3 and Cu 4 SnS 4 .
- Atmosphere without oxygen is meant an oxygen content of less than 1 ppm (parts per million).
- the present invention also provides a colloidal solution, or an ink formulated in a so-called dispersion solvent comprising an aqueous, alcoholic or hydro-alcoholic solution, obtained by the method for preparing a colloidal solution according to the invention, of amorphous nanoparticles comprising primary nanoparticles with sizes of less than 30 nm, preferably from 3 to 20 nm, the alcohol of said solution being a non-toxic alcohol notably other than methanol.
- said colloidal solution consists in said nanoparticles in dispersion in a dispersion solvent consisting in an aqueous, alcoholic or hydro-alcoholic solution of amorphous nanoparticles, said alcohol of said solution having a boiling temperature below that of water, said dispersion solvent preferably consisting in a water/ethanol mixture.
- colloidal solution does not contain any organic ligands as defined above.
- primary nanoparticles are meant here nanoparticles as obtained before their possible subsequent aggregation in the form of an aggregate of larger size of several primary nanoparticles together.
- Obtaining primary nanoparticles of smaller sizes dispersed in aqueous and/or alcoholic solvents of the present invention is advantageous for obtaining not only in a first phase a stable colloid without adding any ligand but also in a second phase, a homogeneous film with large crystallized grains without any residual impurities of organic ligands in the manufacturing method described hereafter.
- the present invention provides a method for manufacturing a polycrystalline film of metal chalcogenides with large crystalline grains with sizes at least equal to half the thickness of said film, by means of a colloidal solution according to the present invention, said film being deposited on one or more materials in layers forming a substrate, said metal chalcogenide being of formula M-C wherein:
- a layer of amorphous nanoparticles of metal chalcogenide(s) is deposited on said substrate from a said aqueous, alcoholic or hydro-alcoholic colloidal solution according to the invention
- heat treatment of said layer of metal chalcogenide(s) is carried out at a temperature of at least 300° C., preferably at least 450° C., in order to obtain densification of said layer of metal chalcogenide(s) and crystallization of the nanoparticles, over a thickness from 0.2 to 5 ⁇ m, preferably of about 1 ⁇ m.
- the preferential dispersion solvent is a water-ethanol mixture for producing after deposition by spraying and heat treatment, a continuous and dense (without any crack or hole) film of crystalline CZTS layers with a large grain, and adherent on a molybdenum substrate.
- said substrate is a substrate intended to be covered with a type p semi-conductor absorption layer in a solid photovoltaic device.
- said substrate consists of a glass or steel layer covered with a so-called rear contact layer, preferably consisting of a molybdenum layer, useful in a solid photovoltaic device of the substrate type.
- said substrate is a substrate intended to be covered with an absorption layer in a photovoltaic device of the superstrate type, said substrate consisting of a glass layer covered at least successively with:
- Said buffer layer of a type n semi-conductor is then a p-n junction with said absorption layer of type p, said buffer layer for example consisting of CdS, In 2 S 3 , or Zn(S, O, OH).
- the present invention also provides a film of crystallized metal chalcogenide(s) with large crystalline grains with a size at least equal to the half of the thickness of said film, continuously deposited on a substrate obtained by the method for making a film according to the invention.
- the film has surface roughness with an arithmetic mean height of the peaks Sa, according to the ISO 25178 standard, of less than half of the thickness e of the film, preferably less than 0.2 ⁇ e, preferably still less than 0.15 ⁇ e for a surface area of at least 20 ⁇ 20 ⁇ m 2 .
- This low surface roughness property of the film obtained by the method according to the invention is original and advantageous in that it avoids direct contact between both adjacent layers of the film.
- This continuity property of the layer is advantageous for avoiding electric short-circuits of the photovoltaic device.
- the film consists of metal chalcogenide(s) Cu 2 ZnSnS 4 (CZTS) in the Kesterite crystalline form, with a thickness from 0.1 to 5 ⁇ m, preferably about 1 ⁇ m.
- the size of a particle is measured by electron microscopy, either by scanning electron microscopy (SEM), or by transmission electron microscopy (TEM).
- the X-ray diffraction technique (for example in the ⁇ -2 ⁇ mode) also allows measurement of the size of the crystallite, from the integrated width of the diffraction peaks.
- the material must have diffraction lines (be crystalline) but also the crystallites have to be sufficiently small, of the order of 50 nm or less than 100 nm. Beyond, the technique is unsuitable because of the physical limits of the XRD equipment.
- TEM transmission electron microscopy
- the morphology of a crystalline film is characterized by the dimensions of its reliefs in particular the size of its grains and its roughness, which are observed by microscopy (optical microscopy, atomic force microscopy, SEM or TEM electron microscopy, etc.)
- the measurement of the surface roughness of a film was conducted with an atomic force microscope (AFM) and a local scanning probe microscope (SPM), of model AFM/SPM from Agilent Tech. (U.S.A.), series 5100.
- AFM atomic force microscope
- SPM local scanning probe microscope
- the present invention also provides a photovoltaic device comprising an absorption layer consisting of a said film deposited on a substrate according to the invention.
- the photovoltaic device according to the invention comprises the following successively stacked layers:
- FIGS. 1A and 1B represent TEM observation photographs of a crude CZTS colloid prepared in a water/acetonitrile mixture according to Example 1, by measurement with an STEM detector ( FIG. 1A ) and at a greater TEM magnification ( FIG. 1B ), FIG. 1C being a photograph of the diffraction spectrum obtained by electron diffraction ED on the dried powder.
- FIGS. 2A, 2B and 2C represent photographs of CZTS nanoparticles in colloidal form taken with an SEM type microscope ( FIG. 2A ), and after deposition as a film deposited by spraying on a substrate ( FIG. 2B ), and after annealing at 525° C. of said film ( FIG. 2C ).
- FIG. 3 is an X-ray diffraction spectrum measured on layers of nanoparticles of FIGS. 2A (curve a), 2 B (curve b) and 2 C (curve c).
- the Cps («Counts per second») values in ordinates are according to a linear scale ( «Lin»).
- FIGS. 4A ) to 4 D) represent photographs taken by electron microscopy, after crystallization annealing at 525° C., of the surface of a CZTS film according to Example 4 dispersed in a pure ethanol solvent and deposited by spraying at 75° C.
- FIG. 4A a TEP solvent and spraying at 300° C.
- FIG. 4B a TEP solvent and spraying at 300° C.
- FIG. 4C DMSO solvent and spraying at 300° C.
- FIG. 4D water solvent and spraying at 300° C.
- a colloid of nanoparticles Cu—Zn—Sn—S was made by reacting a mixture of metal salts, CuCl, ZnCl 2 , SnCl 4 .5H 2 O in water/acetonitrile with an aqueous solution of NaSH, at room temperature and under an inert nitrogen atmosphere, according to the global reaction:
- This reactive system is suitable in the sense that the byproducts of the reaction, for example NaCl or HCl are soluble in water while the nanoparticles are solid and dispersed as a colloid.
- the aqueous solution (0.12 M) of NaSH is prepared in a 50 ml bottle, by weighing 0.56 grams of hydrated NaSH powder (provider Aldrich, product 16,152,7) and adding 50 ml of deionized water, deoxygenated beforehand by bubbling for 30 minutes with nitrogen. This aqueous solution of the sulfur precursor NaSH is then sealed with a plug, and then stored.
- the colloidal synthesis reaction is conducted by pouring 10 ml of the NaSH solution (0.12 M) in 10 ml of a solution of metal precursors CZT (0.1 M). This synthesis carried out at ambient pressure and temperature is very rapid and gives rise to a colloidal CZTS solution, according to the global reaction indicated above.
- a sample holder consisting of a carbon membrane on a nickel grid was soaked in the non-diluted colloid and simply dried in ambient air before being introduced into the TEM vacuum chamber.
- the dried colloid forms aggregates of primary nanoparticles, the characteristic size of which is from 2 to 5 nm and with a rounded shape characteristic of amorphous particles.
- the average elementary analysis achieved by EDX measurement on many areas, indicates that these dried particles contain the majority elements Cu, Zn, Sn, S, and CI as impurities.
- FIG. 1B With larger TEM magnification ( FIG. 1B ), i.e.
- Electron diffraction analysis as illustrated with the example of FIG. 1C shows the presence of a diffuse diffraction ring, corresponding to atomic diffraction planes characterized by interatomic distances compatible with the known crystalline structure of kesterite Cu 2 ZnSnS 4 (CZTS).
- CZTS kesterite Cu 2 ZnSnS 4
- This crude colloid is then poured into a centrifugation tube and then centrifuged for 5 min at 6,000 rpm (Universal centrifuge 16 from Hettich Zentrifugen AG), i.e. an acceleration of 3,700 G expressed relatively to gravity. This allows separation of the solid and liquid portions.
- the transparent upper liquid portion (the supernatant) is removed by pouring it into a bottle of acid liquid waste.
- the lower solid portion is then rinsed by adding 20 ml of water. After introducing a magnetic bath covered with Teflon, this solution was placed on a magnetic plate and mixed with magnetic stirring at about 200 rpm for 5 minutes. New centrifugation for 10 min at 9,000 rpm (i.e.
- This slurry was then re-dispersed in a water/ethanol mixture (5 ml/5 ml), and then mixed with magnetic stirring for 5 minutes at room temperature; the obtained colloid is then stable for several days and may be used for deposition by spraying/atomization.
- the particles suspended in this rinsed colloid were then analyzed by TEM microscopy ( FIG. 2A ) by using the same procedure with a carbon membrane on a nickel grid, as described before for the TEM measurements of crude colloid ( FIG. 1A ).
- the microscopy with a STEM DF detector of FIG. 2A shows primary nanoparticles of a rounded shape, agglomerated and with a similar size between 2 and 7 nm typically.
- EDX analysis indicates the majority presence of elements Cu, Zn, Sn and S but the absence of the chlorine element, which illustrates the effect of the rinsing.
- the crystallographic characteristics were measured by X ray diffraction on the slurry from the rinsed crude colloid (but not re-dispersed), coarsely spread out on a glass plate of 2.5 ⁇ 2.5 cm 2 at room temperature.
- the X-ray diffraction measurements were conducted in a diffractometer of the Bruker AXS D8 series 2 type, by using an X-ray source corresponding to the copper emission line K ⁇ , in a grazing mode (with an angle of incidence set to 1°) and a detector movable over a circular arc in order to obtain a 2 ⁇ diffraction angle spectrum scanned from 10° to 70° with a pitch of 0.04.
- Curve A of FIG. 3 shows the diffraction spectrum of X-rays of the humid slurry of FIG. 2A .
- the particles making up the rinsed colloid and then dried in ambient air are in majority amorphous or slightly crystallized, in consistency with the TEM observations of FIGS. 1A and 1B (crude colloid) or TEM observations of FIG. 2A (rinsed and reconditioned or re-dispersed colloid).
- the solid nanoparticles of the crude colloid and of the rinsed and then re-dispersed colloid are both characterized by a nanometric size (2-7 nm), consisting of the elements Cu, Zn, Sn and S, of an amorphous crystalline or even very slightly crystallized structure.
- the concentration of the CZTS colloid noted in moles per liter (or M), is defined as the number of molecules of the compound CZTS (Cu 2 ZnSnS 4 or equivalent to the number of tin atoms) per unit volume.
- the concentration of the crude colloid is 0.0125 M.
- the concentration of the CZTS colloid was brought to 0.25 M, which is equivalent to about 100 mg/ml.
- One skilled in the art will recognize there a value corresponding to the typical concentration of a slightly diluted slurry, which may be deposited by tape casting. This illustrates the versatility of the colloidal synthesis method.
- an aqueous solution (6 M) of NaSH is prepared, by weighing 2.24 g thereof for 4 ml of solution.
- a solution of copper-zinc-tin (CZT) metal chlorides in acetonitrile is prepared by weighing 188 mg of CuCl, 166 mg of ZnCl 2 and 357 mg of SnCl 4 hydrate for 5 ml of solution.
- the synthesis is achieved by pouring, in a first phase, 11 ml of deionized and deoxygenated water into the solution of metal precursors, and then in a second phase, the 4 ml of NaSH solution.
- the thereby made crude colloid of the compound CZTS is concentrated (0.25 M) and, further has strong stability after adding water in the rinsing step indicated in Example 1 above.
- composition of the crystallized film Cu 2 ZnSnS 4 and the composition of the amorphous film deposited by spraying before annealing described in the form of Cu—Zn—Sn—S, are conventionally distinguished hereafter.
- Amorphous layers of Cu—Zn—Sn—S were deposited from suspended nanoparticles, by spraying on substrates of the Mo/glass type formed with sodium-lime glass with a thickness of 1 mm covered with a 700 nm molybdenum layer.
- a colloid according to Example 1 above was prepared and the colloid was then re-dispersed in a water/ethanol mixture (5 ml/5 ml).
- the spraying step was carried out in a glove box (model GP concept type T3 in stainless steel, from Jacomex S.A.S., France) filled with nitrogen and equipped with a purification unit ( ⁇ 1 ppm O 2 , ⁇ 10 ppm H 2 O) and with an airlock being used for introducing/extracting samples.
- Amorphous Cu—Zn—Sn—S films were deposited on Mo/glass substrates (2.5 cm ⁇ 2.5 cm) brought to a temperature of 250° C. by means of a heating plate (model 18 ⁇ 18 cm of standard ceramic, reference 444-0617 from VWR International SAS, France) with modified thermal regulation in a closed loop on a thermocouple of the K type placed under the substrate.
- An X-Y Cartesian robot was used (of the Yamaha type, FXYx 550 ⁇ 550 with an RCX222 controller, distributed in France by New-Mat France) for sweeping over a surface of more than 16 cm 2 with the spray nozzle used (a sprayer flask on a test tube in borosilicate glass from Glasskeller Basel AG).
- the spray nozzle used (a sprayer flask on a test tube in borosilicate glass from Glasskeller Basel AG).
- nitrogen pressure was controlled intermittently: open for 0.3 seconds and then a waiting time of 1.7 seconds; this 2 second cycling being maintained during the spraying duration.
- Good films were obtained with a nozzle-substrate distance of about 15 cm with an average flow of nitrogen carrier gas of 14 L/min at a cylinder nitrogen pressure of 0.2 bars.
- Thicknesses of 6 ⁇ 1 ⁇ m were obtained by deposition by spraying for two minutes of the colloid of concentration 10 mg/ml (i.e. a volume of about 2
- FIG. 2B is a sectional view of a Cu—Zn—Sn—S film deposited by spraying at 240° C. On this picture, the glass substrate may be seen, covered with a layer of 700 nm of polycrystalline molybdenum with a column structure, and the film Cu—Zn—Sn—S. It is possible to discern that this film is porous and consists of fine particles agglomerated together and separated by vacuum.
- the annealing step used for densifying and crystallizing the layer in order to form large crystalline grains was carried out in a nitrogen glass box (reference GT concept, from Jacomex SAS, France).
- the film deposited by spraying was then laid on a heated plate (model Titane plate with a Detlef control case, Harry Gesttechnik, GmbH) and heated gradually under nitrogen up to an annealing temperature of 525° C. maintained for 1 hour, and then cooled for 1 hour.
- FIG. 2C shows a sectional view of the film obtained after annealing: above the polycrystalline molybdenum layer, a polycrystalline film with a thickness of 1.8 ⁇ 0.2 ⁇ m expresses densification of the film which is accompanied by crystallization with formation of the desired large grains (from 1 to 2 ⁇ m) i.e. close to the thickness of the film.
- the surface condition of the film above was analyzed and its roughness Sa was measured according to the ISO 25178 standard.
- the average roughness Sa is defined as the arithmetic mean of the absolute values of the ordinates of the roughness profile. The following values were obtained for a film with a thickness of 1.8 ⁇ m: 313 nm for a surface of 50 ⁇ 50 ⁇ m 2 , 247 nm for a surface of 20 ⁇ 20 ⁇ m 2 .
- a CZTS colloid was prepared according to Example 1, except that the slurry rinsed with water and then centrifuged was then mixed in dispersion solvents different from the water-ethanol 50-50 mixture of Example 3.
- four were selected for the present example notably for their low vapor pressures at 20° C. for TEP (Tri-Ethyl-Phosphate) (40 Pa) or DMSO (80 Pa) or else high vapor pressures for water (2,330 Pa) and for ethanol (5,850 Pa).
- the concentration was adjusted to 10 g/L.
- the CZTS/Mo/glass samples obtained were then subject to crystallization heat treatment at 525° C. under nitrogen. The surface images of the obtained samples are shown in FIGS. 4A to 4D .
- This CZTS film is formed with crystallized CZTS grains, as indicated by the X diffraction spectra, (not shown).
- A) ethanol, B) Tri-Ethyl-Phosphate (TEP) or C) DiMethyl-SulfOxide (DMSO) the adhesion to the substrate is not sufficient, the covering level of the substrate is not complete, and the grain size is not homogeneous.
- TEP Tri-Ethyl-Phosphate
- DMSO DiMethyl-SulfOxide
- the present example shows that water is the preferred pure dispersion solvent.
- the dispersion solvent is preferentially a water-ethanol mixture, which is an abundant solvent, easy to use and non-toxic and which gives the possibility of making, after deposition by spraying followed by a crystallization heat treatment, continuous and dense (without any cracks or holes) crystalline CZTS layers with large grains, and adherent on the molybdenum substrate.
- a sulfur precursor solution is first prepared by mixing 18 ml of acetonitrile and 2 ml of water at room temperature, and then by pouring therein 18 mg of NaSH powder (0.321 mmol) which spontaneously dissolves. As the NaSH is not or very little soluble in acetonitrile, dissolution occurs in the aqueous portion of the water/acetonitrile mixture.
- An antimony metal precursor solution with a concentration of 10.7 mol/L is then prepared by dissolving 4 mg (0.214 mmol) of SbCl 3 powder (Aldrich) in a 20 ml solution of pure acetonitrile. No hydrolysis of the SbCl 3 salt is noticed during this dissolution.
- a metal solution of tin 0.05 M is prepared in a glass bottle with a capacity of 50 ml, into which is first poured 348 mg of tin precursor powder (SnCl 2 , anhydrous, Fluka 96529) and then 36 ml of acetonitrile solvent. Dissolution is facilitated at room temperature by ultrasonication for a few minutes.
- tin precursor powder SnCl 2 , anhydrous, Fluka 96529
- a sulfur-containing 0.2 M aqueous solution is prepared by weighing 1.12 g of NaSH powder, and then by adding 100 ml of deionized and deoxygenated pure water in order to achieve their spontaneous dissolution.
- the colloidal synthesis is then achieved by mixing at room temperature both solutions, for example by pouring 9 ml of the sulfur-containing 0.2M solution into 36 ml of 0.05 M metal tin solution.
- This colloid is stable under ambient conditions for several days.
- the TEM observation of this colloid thereby made and without any other treatment (without any rinsing, centrifugation, re-dispersion etc.) is shown hereafter.
- elementary analysis TEM-EDX indicates that the composition is in majority of tin sulfide, with presence of a chlorinated impurity, which is a residual impurity of the reaction according to the following composition (TEM EDX):
- the primary particles formed are relatively small, with a characteristic size of the order of 3 to 5 nm.
- This colloid may then be used in order to be rinsed and then re-formulated as a slurry or an ink which may be used for deposition of thin layers.
- a thin CZTS layer was prepared on a glass substrate probably molybdenum, annealed under an N 2 atmosphere, like in Example 3.
- a buffer layer of approximately 50 nm of CdS was deposited, by deposition in a chemical bath according to the customary procedure of the state of the art (see for example G. Hodes, Chemical Solution Deposition Of Semiconductor Films, ISBN 08247-0851-2, M. Dekker Inc.), by quenching in a mixture maintained at 60° C. of deionized water, of ammonia (NH 3 , 4M), cadmium nitrate (Cd(NO 3 ) 2 , 4mM) and of thio-urea (SC(NH 2 ) 2 , 0.2M). After 10 minutes, the samples were rinsed in deionized water and then dried under nitrogen flow.
- NH 3 , 4M ammonia
- Cd(NO 3 ) 2 , 4mM cadmium nitrate
- SC(NH 2 ) 2 , 0.2M thio-urea
- the substrate was divided into 16 electrically insulated cells, each with square dimensions 0.5 cm ⁇ 0.5 cm.
- a front face contact was made with a small spot of 0.5 mm of silver deposited by drying a lacquer loaded with silver, on the conductive ITO layer.
- the rear contact was also directly taken on the molybdenum, at the edge of the substrate.
- the photovoltaic yield (or photovoltaic efficiency) was computed from the current-voltage electric characteristics of the photovoltaic diode measured under light irradiation.
- This photovoltaic efficiency was measured with an electric test bench and which uses a solar simulator delivering an irradiation of 1000 W/m 2 corresponding to the AM1.5G standard.
- the measurement bench was calibrated according to the standard procedure on the basis of the known photocurrent of reference cells, as provided by different recognised official institutes.
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Abstract
The present invention relates to a method for preparing an aqueous or hydro-alcoholic colloidal solution of metal chalcogenide amorphous nanoparticles notably of the Cu2ZnSnS4 (CZTS) type and to the obtained colloidal solution.
The present invention also relates to a method for manufacturing a film of large-grain crystallized semi-conducting metal chalcogenide film notably of CZTS obtained from an aqueous or hydro-alcoholic colloidal solution according to the invention, said film being useful as an absorption layer deposited on a substrate applied in a solid photovoltaic device.
Description
- The present invention relates to a method for making a film or continuous thin layer of crystallized metal chalcogenide with large grains deposited on a substrate.
- More particularly, the present invention relates to a solid photovoltaic device comprising a film or a so-called metal chalcogenide layer as an absorption layer.
- Still more particularly, a metal chalcogenide layer according to the invention will be used as an absorption layer on a solid photovoltaic device, notably of the substrate type or of the superstrate type comprising at least:
-
- one optically transparent conductive layer, a so-called front contact layer, for example of the TCO (transparent conductive oxide) type, and
- one insulating and transparent compound layer, for example a layer of ZnO or ZnMgxO1-x, and
- one buffer layer of a type n semi-conductor, for example CdS or In2S3 or Zn(S, O, OH), and
- one so-called absorption layer of type p, and
- one layer of conductive material, a so-called rear contact layer, for example a metal layer of molybdenum (Mo), gold (Au), graphite (C), Nickel (Ni) or further aluminium (Al), silver (Ag) or indium (In).
- In a solid photovoltaic device said to be of the substrate type, the layers above are completed with:
-
- a metal grid applied against said front contact layer, thus forming the front face (sunny side) of the device, and
- a glass or steel layer applied against said rear contact layer.
- In a solid photovoltaic device said to be of the superstrate type, the layers above are completed with a glass layer forming the front face (sunny side) of the device, applied against said front contact layer.
- Solid photovoltaic devices with a structure of the substrate type or of the superstrate type are well known to one skilled in the art. For example they are described in the preface of the book «Thin film solar cells; manufacture, characterization and applications», edited by Jef Poortmans and Vladimir Arkhipov, Wiley 2007, ISBN 13 9780470 09126-5, (preface on page xxiv).
- The present invention also relates to a method for preparing a colloidal aqueous solution of amorphous nanoparticles of a metal chalcogenide according to the invention, to the obtained colloidal solution and to its use for making a film of metal chalcogenides with large grains.
- In the present description, by «colloidal solution» or «colloid», is meant a liquid of a homogenous dispersion of particles for which the dimensions range from 2 to 500 nm, it being understood that below 2 nm, a liquid solution and not a so-called «colloidal solution» is obtained. The stability of such a homogenous dispersion is due to the slow separation of the two solid and respective liquid phases.
- By «material consisting of amorphous nanoparticles», is meant a material containing no or very few crystallized particles, i.e. characterized by the absence of a diffraction peak, by diffraction of X-rays (XRD technique).
- Still more particularly, the present invention relates to metal chalcogenides of formula M-C wherein:
-
- M represents one or several identical or different metal elements selected from Cu, Zn, Sn, Ge, Sb and Bi, preferably Cu, Zn, Sn and Sb, and
- C represents one or several identical or different chalcogenide elements selected from S, Se and Te.
- The highest photovoltaic conversion rates based on metal chalcogenides are greater than 20%; they are obtained today with photovoltaic cells comprising as an absorption layer, a layer of the type CuIn1-1, GaxSe2.
- However, indium (In) and gallium (Ga) are not very abundant on Earth and are therefore expensive for mass production. Cadmium telluride CdTe is another well known example from among metal chalcogenides which gives the possibility of obtaining photovoltaic devices with high yield (>17%). But, the relatively low abundance of cadmium and tellurium, as well as the toxicity of Cd are a problem.
- The metal chalcogenide compounds M-C as defined above are of particular interest for manufacturing an absorption layer of an inexpensive photovoltaic device with relatively high yield, since the metals M listed above are abundant and non-toxic.
- The present invention more particularly relates to absorption layers of the Cu2ZnSnS4 (CZTS) type as well as to their derivatives Cu2Zn(Sn1-y, Gey)(S1-x, Sex)4 (noted as CZTGSSe), SnS, Sb2S3 and Cu2Zn(Sn1-y, Sby)(S1-x, Sex)4 and/or CuSb(S, Se)2.
- The metal chalcogenide layers for photovoltaic cells are traditionally obtained with vacuum deposition methods such as co-evaporation (CIGSe), sublimation in a closed space (CdTe) or further sputtering (CZTSSe). However, the production and maintenance costs associated with vacuum techniques are typically high, which limits their use in applications for mass markets. Also, chemical vapor deposition methods resort to vacuum techniques, which make them complicated and costly for continuously achieving deposition and on wide surfaces.
- In order to circumvent these limitations, deposition methods at ambient pressure are therefore preferable, such as for example deposition in a chemical bath, electrochemical deposition, spraying, printing or tape casting. Deposition in a chemical bath is generally characterized by low deposition rates relatively to the desirable thickness for the active layer (of the order of one micrometer), by compromises between low chemical yield and thickness uniformities (a fortiori on large surfaces) and the formation of material with low crystalline quality (which requires subsequent annealing) with inclusion of more or less controlled impurities which makes the technique unsuitable for manufacturing the photovoltaic active layer. Likewise, electrochemical deposition does not either allow continuous deposition and poses problems for controlling uniformity over large surfaces, which imposes relatively slow deposition rates.
- It is therefore preferable to achieve deposition of the active photovoltaic layer with a deposition method based on a solution, for example deposited by spraying or by printing, or on a slurry, for example deposited by tape casting. In every case, these deposition techniques at atmospheric pressure, potentially continuous techniques and on large surfaces are based on a more or less concentrated colloidal or liquid solution.
- As compared with a liquid solution, the colloidal solution has certain advantages. In a liquid solution, the useful species (copper, tin, sulfur, etc.) are dissolved in the solvent, for example in ionic form (example Cut) or as ionic complexes (example Cu(CH3CN)4 +, Cu(NH3)n]2+, Sn(OH)6]2− etc.). In a colloidal solution, also-called a «colloid», solid particles are present in a suspension and consisting of useful chemical species; the size of these particles is less than 1 mm and typically of the order of a few tens of nanometers.
- By comparison with the liquid solution, a first benefit of the colloidal solution is to be able to separate the useful solid portion i.e. the particles, from the liquid portion (by filtration or sedimentation/centrifugation) and thus be able to rinse the colloid from its impurities and from possible secondary products, residues of chemical reactions which may have been used for making the colloid. A second benefit is that the useful chemical species are already gathered in a solid way at an atomic scale with stoichiometry/chemical composition equal to or close to the desired final composition, which ensures better control of the final composition, relatively to a liquid solution which may easily be poorly mixed. A third benefit of the colloidal solution is that it may be used as a starting solution for forming a dense layer with different methods, the nanoparticles may be dried and sintered so as to produce a more or less porous material (for then being used for diverse applications, such as electrodes for batteries, for catalysis, etc.) or else re-dispersed in a dispersion liquid allowing deposition by spraying or by tape casting on a substrate. Further, it is also possible to deposit the particles on an inside of a nano-porous substrate in order to modify the surface properties thereof. For example this is the case of nano-porous films of nanocrystalline TiO2 (n semi-conductor) of a photovoltaic device, for example by soaking a nano-porous TiO2 substrate in a so-called colloidal solution of a metal chalcogenide.
- The best photovoltaic performances of cells based on CZTSSe films are obtained when the film is made by a method via a hybrid route between a liquid and a colloid (Todorov & al.: Thin solid Films Vol. 519, N° 21 (2011) pp 7378-81). However, the hydrazine solvent used by this team is both very highly toxic and very flammable in air, which requires precautions of use incompatible with industrial use. In order to reduce the risk of flammability, the hydrazine was also diluted down to 50% by adding water, which had the consequence of slightly reducing the performance from 9.6% to 8.2%. In spite of this, the toxicity and precautions of use related to hydrazine persist.
- Another relatively well documented method in the literature is the method said to be «by hot injection of precursors» (WO2008/021604A2). This method consists of conducting a chemical reaction, for several hours and at a high temperature (between 220° C. and 300° C.) between metal precursors (salts in the form of powders) dissolved in an oleylamine solvent or other solvents, also toxic or dangerous for humans and/or the environment, of the alkylamine or alkyl phosphine (TOPO) type, and of hot injecting a solution containing the chalcogen. For example metal sulfur, selenium or a salt based on sulfur is typically dissolved in TriOctylPhOsphine (TOPO) oxides. TriOctylPhOsphine oxide is extremely destructive for tissues of mucosas, of the upper respiratory tract, of the eyes and of the skin. In an alternative method, (Chinese patent CN102108540), of hot injection (180-280° C. for 2-60 min), the octadecylamine organic solvent used for dissolving the sulfur powder is a flammable, explosive and extremely dangerous solvent for the eyes, the skin and aquatic media. This is why more particularly the invention relates to a method for preparing a metal chalcogenide colloidal solution.
- It is generally recognized by one skilled in the art that low photovoltaic performances are obtained when the active absorbing layer of the photovoltaic device, based on inorganic crystalline semi-conductors such as silicon, semi-conductors III-V (AsGa, AlGaAs etc.) or metal chalcogenides CdTe, CIGS or CZTS, consists of small grains, and that better photovoltaic cells are made from continuous layers with large grains. Typically, the desired grain sizes are of the order of the thickness of the layer, itself of the order of one micrometer.
- On the other hand, it may be noted that in the large majority, the colloidal synthesis methods are directed to making crystallized particles. The arguments put forward are generally greater purity, or else the obtaining of a less porous layer, or else further better control of the elementary composition of the particles at an atomic scale (before even forming the layer) and therefore of that of the final layer. Finally, the final crystalline layer which is targeted, would be obtained more easily from crystalline particles, since they already incorporate the desired crystalline phase. However, these methods for making a colloidal solution of crystallized metal chalcogenide particles require addition of ligands, the crystal growth then being thermally activated at 200° C. or more, which represents long and costly methods. Further, the films made from these colloidal solutions of crystalline metal chalcogenide nanoparticles nevertheless have then to be generally subject to additional heat treatment at higher temperatures, of the order of 400 to 600° C., this in order to densify, agglomerate and increase the size of the crystals, preferably up to a grain size close to the total thickness of the film, typically of the order of one micrometer. It would be advantageous, at least economically (lesser thermal budget), to conduct the colloidal synthesis of the particles without having to heat during the synthesis at 200° C.
- The first colloidal synthesis studies, in the presence of water have rapidly shown problems of hydrolysis and/or oxidation of the metal ion species notably of the cations Cu+, Zn2+, Sn4+, Sb3+, In3+.
- A technique known to one skilled in the art for efficiently reducing the problems of hydrolysis and of oxidation in an aqueous medium consists of protecting an ionic species in solution with a ligand.
- In WO2011/066205 and WO2011/146791, a method for synthesis of a colloidal solution of crystalline copper chalcogenide nanoparticles is described, wherein metal and chalcogen precursor solutions are applied with ligands, in an acid medium for adjusting the pH and avoiding hydrolysis and/or oxidation of the metal ion species. By «ligand», is meant here a coordination species consisting of an ion or a molecule bearing chemical functions allowing it to bind to one or several metal central atoms or ions through a covalent bond. In WO2011/066205, copper chalcogenide nanoparticles are produced from a reaction mixture of precursor solutions with stirring for several hours and optionally with heating to 100° C. and beyond. In WO2011/146791, the application of water and of a colloidal aqueous solution is avoided in order to avoid problems of hydrolysis and/or oxidation of the metal ion species, notably of the cations Cu+, Zn2+, Sn4+, Sb3+. In both of these patents Wo2011/146791 and WO2011/066205, the role of the ligands is also to avoid agglomeration of the formed nanoparticles, an agglomeration which leads to precipitation and therefore to instability of the colloid. It was shown that the application of organic ligands is detrimental to the electric transport properties between the particles.
- In WO2011/0662205, the ligands are organic molecules comprising amine, thiol or organic acid groups. These organic ligands aim at complexing said metal in order to slow down the kinetics of the reaction between the metal precursors and the chalcogenide precursor with view to obtaining a colloidal solution of crystallized nanoparticles as shown in
FIG. 3 (and not a colloidal solution of amorphous nanoparticles according to the present invention). The colloidal solutions obtained are not very stable and, the presence of ligands in said colloidal solutions obtained makes the method less easy (heating required), longer and more costly, and furthermore in the crystallized chalcogenide film obtained after deposition and annealing of the colloidal solution on a substrate, the carbon or oxide residues from the decomposition of the ligands is a drawback since they may prevent crystallization and/or limit the formation of large grains and/or generate impurities generating electric faults, which is detrimental to the photovoltaic properties of the film. - In WO 2011/0662205, acetonitrile is not mentioned as a ligand and does not correspond to the given definition of a ligand, but is mentioned as a formulation solvent of the colloidal solution after its preparation.
- In publications Schulz et al. 1997/2000 (Photovoltaics Program Review edited by AIP Press, New York 1997, WO99/37832) and Zhang et al. 2012 (Applied Physics Express 5, 2012, 012301), methods are described for preparing a colloidal solution of metal chalcogenides consisting of amorphous or slightly crystallized nanoparticles for producing a semi-conducting absorbing film of a photovoltaic device. In both of these publications, the colloidal metal chalcogenide solution is made from a mixture of a first precursor solution of said metal M and of a second precursor solution of said chalcogen. In Schulz et al. above, a colloidal solution of a metal chalcogenide CuInGaSe2 (CIGS) is more particularly prepared and in Zhang et al. above, a metal chalcogenide Cu2ZnSn(S,Se)4 (CZTSSe) is prepared from a precursor solution in organic solvents, pyridine and methanol. More particularly, in this method, the question is to typically dissolve metal precursor salts i.e. iodides such as CuI, CdI2, ZnI2, SnI4, InI3, GaI3, in pyridine, and on the other hand dissolve a chalcogenide precursor salt (of sodium or potassium, such as Na2Te, Na2Se, or Na2S) in methanol. Both of these solutions are then mixed at −78° C. or −42° C. or further −0° C. according to the published cases (and not by hot injection as this is the customary case in methods for colloidal synthesis of crystallized nanoparticles), by introducing the sulfur/methanol solution into the metal/pyridine solution, and then the mixture is brought back to room temperature for several minutes during which the unstable colloid naturally precipitates.
- The initial colloidal solutions (before forming a thin layer) were therefore colloidal non-aqueous solutions of non-crystallized (amorphous) or slightly crystallized nanoparticles.
- Under the conditions applied in these publications, it is proposed that water causes destabilization, aggregation and decomposition of the colloid by ion exchange of the methanol or acetonitrile by water which adheres to the surface of the particles, which would then introduce oxygen into the deposited layers and would degrade their photovoltaic performance.
- In references Schulz et al. 1997/2000 and Zhang et al. 2012 above, the synthesis of a colloidal solution of amorphous nanoparticles by mixing a solution of precursors is achieved under cold conditions (−178° C., −42° C. or 0° C.) which represents a restriction and a cost and forces the use of organic solvents compatible with these temperatures, but relatively toxic, notably methanol and/or pyridine.
- These temperature conditions seem to be imposed by the requirement of stabilizing the relevant metal chalcogenide colloid in the relevant solvent. Further, in references Schulz et al. 1997/2000 and Zhang et al. 2012 above, the thin layer films deposited on a substrate obtained by deposition from these colloidal solutions consisting of amorphous or slightly crystallized particles are characterized by small grain sizes, even after annealing at a high temperature, with which it is not possible to obtain high quality photovoltaic performances. In particular in WO99/37832 (Schulz et al.), the CIGS layer with small grains obtained after deposition by spraying has too large porosity and was not able to be densified in spite of various heat treatments. Indeed, in spite of many annealing attempts, the CIGS films obtained always included an intermediate layer consisting of small grains, which does not correspond to the criteria of a high quality layer for a photovoltaic application. Indeed, the low photovoltaic performance of the CIGS cell was ascribed to the high series resistance of this intermediate, porous and small-grain layer.
- A disadvantage of the method described in Schulz et al 1997/2000 above from amorphous nanoparticles stemming from a methanol/pyridine mixture, is therefore such that it does not give the possibility of producing a dense CIGS layer with large grains, which are required for making a high yield photovoltaic device.
- In Zhang et al. 2012 above, the film obtained by deposition of the colloidal solution of metal chalcogenide nanoparticles comprised nanoparticles of relatively large sizes (80 nm) and after annealing on a substrate did not exhibit any large grains. On the other hand, in Zhang et al. 2012, the authors did not succeed in obtaining a colloidal solution when the metal chalcogenide only comprised sulfur and not a combination of sulfur S and of selenium Se. In Zhang et al. 2012 above, the solution of methanol comprising both Na2S and Na2Se, led to the formation of a strongly aggregated and amorphous solid colloid, in which the authors distinguish rounded particles with a size of 80 nm of CZTSSe (Cu2ZnSn(S,Se)4). After deposition on molybdenum and then densification annealing, a negligible photovoltaic result (0.0002%) was obtained when the annealing at 550° C. was carried out only under nitrogen, because of crystalline decomposition of the film (according to XRD analysis). A photovoltaic result of 2.2% is obtained when the 550° C. annealing is carried out under nitrogen with addition of tin, which would avoid decomposition. Except for an X diffraction spectrum proving the presence of CZTSSe crystals after the heat treatment step at a high temperature (550° C.), no indication on the size of the film grains is given.
- A first object of the present invention is therefore to provide a novel method for preparing a colloidal solution of metal chalcogenide nanoparticles which is fast and economical to carry out, notably a method which allows preparation of a colloidal solution at room temperature not requiring heating for hours at 100° C. and beyond and not requiring cooling down to 0° C. or below.
- Another object of the present invention is therefore to provide a method allowing preparation of metal chalcogenide colloidal solutions of formula M-C as defined above, not involving the application of toxic solvents or requiring cold reaction temperatures, in particular a temperature of less than or equal to 0° C.
- Another object of the present invention is to provide a method for making a film obtained from a colloidal solution with which it is possible to obtain metal chalcogenide crystals with large grains, said film being deposited on a substrate, useful for imparting high photovoltaic performances to a photovoltaic device comprising them.
- More particularly, an object of the present invention is therefore to provide a method for preparing a colloidal solution of metal chalcogenide of formula M-C as defined above which is carried out at room temperature and at an atmospheric pressure not involving the application of a dangerous and/or toxic solvent or the application of a ligand with a covalent bond as defined above and/or without adding acid in precursor solutions upon preparing the colloidal solutions.
- Finally, an object of the present invention is to provide a stable colloidal solution of amorphous nanoparticles of a metal chalcogenide which allows it to be deposited at atmospheric pressure and at room temperature and then densified by annealing on a substrate in order to obtain a crystallized metal chalcogenide film in the form of large grains with a low roughness surface condition.
- According to the present invention, it was discovered that for preparing a colloidal solution of metal chalcogenide of formula M-C as defined above, it is possible to operate in an aqueous medium without decomposition of the colloid in return for conditions for application of the method for preparing a colloidal aqueous or hydro-alcoholic solution defined hereafter and allowing application of a method for making a film of crystallized semi-conducting metal chalcogenide nanoparticles with large grains as also defined hereafter.
- To do this, the present invention provides a method for quasi-instantaneous preparation, and at room temperature, of a colloidal aqueous, alcoholic or hydro-alcoholic solution of amorphous nanoparticles of metal chalcogenides of formula M-C wherein:
-
- M represents one or several first metals, either identical or different, selected from Cu, Zn, Sn, Ge, Sb and Bi, preferably Cu, Zn, Sn and Sb and
- C represents one or several chalcogenide elements either identical or different selected from S, Se and Te,
- characterised in that the following successive steps are carried out at a temperature from 0° to 50° C., preferably from 20° to 40° C. wherein:
- a) a first solution of precursor(s) of said first metal(s) M, other than one or more chalcogenide salts C in solution, is prepared, in a solvent consisting of pure acetonitrile or mixed with water and/or an alcohol other than methanol, preferably ethanol, and
- b) a second aqueous, alcoholic or hydro-alcoholic solution of precursor(s) of chalcogenide(s) C consisting of one or more chalcogenide salts of second metal(s), other than one or more first metal(s) M, is prepared, the alcohol of said second solution being other than methanol, preferably ethanol, and
- c) both of said first and second solutions of precursors are mixed at atmospheric pressure and at room temperature until a crude colloidal solution is obtained quasi-instantaneously, comprising primary amorphous nanoparticles with sizes of less than 30 nm, preferably 3 to 20 nm, and
- d) the solid portion is separated from said colloidal solution of step c), preferably by centrifugation in order to obtain a solid residue after removing the liquid supernatant, and
- e) the solid residue obtained in step d) is rinsed by pouring on it an aqueous, alcoholic or hydro-alcoholic solution in order to form a colloidal solution, the alcohol of said aqueous, alcoholic or hydro-alcoholic colloidal solution being other than methanol, preferably ethanol, and
- f) again the solid portion is separated from said colloidal solution of step e), preferably by centrifugation in order to obtain after removing the liquid supernatant, a rinsed solid residue as a humid paste, and
- g) said humid paste from step f) is re-dispersed in a dispersion solvent comprising, preferably consisting, an aqueous, alcoholic or hydro-alcoholic solution, the alcohol of said alcoholic or hydro-alcoholic solution being, if necessary, a non-toxic alcohol, notably an alcohol other than methanol.
- According to the present invention, in the method for preparing the colloidal solution, the preliminary preparation is achieved at room temperature or requiring reduced heating of two separate solutions of precursors based on salts of M and respectively a salt of C with different solvents, without adding any ligand, notably steps a) and b), and their mixture at a reduced temperature notably at room temperature and under atmospheric pressure as defined in steps a) to c).
- The smallest size of the nanoparticles obtained in step c) makes the rinsing steps d) to g) more effective for removing the by-products of the reaction as well as the synthesis solvent acetonitrile and other residual impurities.
- By «ligand», is meant here an organic molecule (other than the molecule C) capable of binding and/or complexing a said first metal M, notably an organic molecule substituted with at least one group selected from the amine (—NH2), thiol (—SH), amide or thioamide groups, notably —CONH2 or —CSNH2, and/or organic acid groups (such as the carboxylic acid group —COOH) or a phosphoric acid group, notably —PO3H2.
- A colloidal solution stable at room temperature obtained without adding any ligand is not only easier to obtain and to apply, but further, it comprises less residual impurities, which contributes to improving the quality of a film obtained after deposition and annealing of the colloidal solution as described hereafter. In particular, this contributes to obtaining a crystallized continuous film with large grains and more homogenous with better photovoltaic performances.
- Preferably, in step g) a dispersion solvent is applied, consisting in an aqueous, alcoholic or hydro-alcoholic solution, the alcohol of said alcoholic or hydro-alcoholic solution being a non-toxic alcohol having a boiling temperature of less than the boiling temperature of water, preferably ethanol or propanol, still preferably consisting in a water/ethanol mixture.
- These dispersion solvents were selected for their property of dispersion of amorphous nanoparticles (concentration, stability of the colloid, viscosity, non-toxicity), giving the possibility of forming a liquid, homogenous and stable colloid with amorphous nanoparticles of small sizes, which do not naturally precipitate at room temperature before at least 24 hours, and may be deposited by spraying (viscosity, vapor pressure and evaporation temperature) under optimum conditions in order to obtain a continuous, homogenous film without any impurities as described hereafter.
- An alcohol having a boiling point below that of water is advantageous because in a method for making a film obtained by deposition, by spraying and annealing of the colloidal solution on a substrate as described hereafter, during the contact of the colloidal solution on the hot plate of the substrate, evaporation of the solvents occurs and it appears to be preferable that the alcohol evaporates before the water in order to set aside the risks of residual carbon contamination stemming from said alcohol within said film.
- Ethanol and propanol are preferred because of their total miscibility in water, in addition to their boiling temperature below that of water (and a vapour pressure greater than that of water).
- The room temperature used for the preparation of the solutions as well as during the mixing of steps a) to c) is defined as a temperature comprised between 0° C. and 50° C., preferably from 20 to 40° C. This method for preparing a colloidal solution according to the invention is therefore particularly advantageous in that:
-
- it is carried out at a reduced temperature notably at room temperature and at atmospheric pressure,
- it is quasi-instantaneous and provides a homogenous and stable colloid, and
- it allows application of an aqueous solvent in the absence of any toxic solvent and/or organic ligand with a covalent bond and without adding any acid, and
- the pH is self-controlled at an acid pH below 2, without adjusting any pH, because of the applied solvents and precursors, and
- acetonitrile is not a dangerous or toxic solvent and allows protection of the atoms of the metal cations against oxidation thereby playing the role of a protective ligand against hydrolysis of the precursors and/or of the formed particles, without being engaged into a covalent bond unlike a ligand.
- The rapidity of the reaction in step c), typically carried out in a time interval of less than one minute, even less than 5 seconds, is the consequence of the absence of any complexing ligand and binding said metal.
- This reaction rapidity of the precursors in step c), contributes to obtaining amorphous nanoparticles and of smaller sizes, the nanoparticles not having the time for growing at the expense of the others.
- On the other hand, the high concentrations and small sizes of nanoparticles impart greater stability to the colloid of nanoparticles obtained in step c), the latter remaining stable for at least two days at room temperature.
- The colloidal solution obtained further gives the possibility of obtaining a film of crystalline metal chalcogenide(s) with large grains according to the object of the present invention after deposition and annealing of a layer of amorphous metal chalcogenide nanoparticles on a substrate.
- Another advantage of the use during the colloidal synthesis, of an aqueous, alcoholic or hydro-alcoholic solvent according to the invention is that they allow easier dissolution of the chalcogenide precursor salts, i.e. in stronger concentrations, notably a concentration of more than 5 M (moles per liter) in the case of the NaSH or Na2S salts. The obtained colloids may thus be further concentrated. In the same way, the reaction by-products are more easily dissolved and removed by means of a lesser number of rinsing steps with aqueous or hydro-alcoholic rinsing solvents.
- According to other preferred more particular features:
-
- in step a), said salt of said first metal M is a halide, preferably a chloride, and
- in step b), said chalcogenide of second metal (other than M) is an alkaline or earth-alkaline salt, preferably a sodium or potassium salt, preferably Na2S or NaSH.
- In prior publications, the metal halide salt or metal precursor M was often in the form of an iodide, the iodide being better dissolved than the chloride in the applied organic solvents. The application of chloride precursors according to the present invention, notably in an aqueous or hydro-alcoholic medium is, however, advantageous since chloride salts are more easy to access (and less expensive) and the colloid CZTS which results from them is more stable than with iodide precursors.
- Still preferably, M is a ternary mixture of Cu, Zn and Sn, and C is S, and preferably in step c) amorphous nanoparticles of Cu2ZnSnS4 are obtained.
- The application of a metal chalcogenide only containing the chalcogen S without any selenium (Se) is advantageous since selenium reduces the band gap of the absorption layer and once it is applied in a photovoltaic device, the metal chalcogenide with only S gives the possibility of obtaining greater photovoltaic voltages (beyond 0.6 Volts according to the literature).
- In another embodiment M-C is selected from Sb2S3 and SnS.
- In other further embodiments M-C is selected from CuSbS2, Cu2Sn(S, Se)3, Cu2Zn(Sn, Sb)S4, Cu3BiS3 and Cu4SnS4.
- According to other advantageous particular features:
-
- in step a) said first solution is carried out containing CuCl2, ZnCl2 and SnCl4, and
- in step b), said second aqueous solution of NaSH is carried out preferably at a concentration of more than 5 M, and
- in step c), amorphous nanoparticles of Cu2ZnSnS4 are obtained notably with a size from 3 to 20 nm.
- Another advantageous effect of the application of a hydro-sulfide salt of a chalcogenide such as NaSH or KSH is that their reaction with metal chlorides reinforces the acidity of the thereby obtained colloidal solutions, which reduces the risks of degradation of the nanoparticles by possible hydrolysis by the OH− ions. The pH adjustment, by an additional step for example consisting of adding an acid, is thus unnecessary and the method is easier and therefore advantageous.
- According to other particular features:
-
- in step b), said second aqueous solution of precursor(s) of chalcogenide(s) consist in a solution only containing water as a solvent; and
- in step a), the solvent of said first solution of precursor(s) of metal(s) M consists in acetonitrile mixed with water, preferably in an acetonitrile/water ratio of at least 50/50, preferably pure acetonitrile; and
- steps f) and g) for rinsing the colloid are repeated once or several times by centrifugation and then re-dispersion in an aqueous, alcoholic or hydro-alcoholic solvent; and
- the water and the solvents used are deoxygenated beforehand by sparging/bubbling with a gas not containing any oxygen, preferably a neutral gas, still preferably nitrogen, and the mixture of step c) is made in a vacuum chamber or containing an atmosphere without any oxygen, preferably with a neutral gas, still preferably nitrogen. This latter feature gives the possibility of avoiding oxidation and/or hydrolysis of the metal cations in the precursor solutions and in the colloidal solution.
- In the present application, by «atmosphere without oxygen», is meant an oxygen content of less than 1 ppm (parts per million).
- The present invention also provides a colloidal solution, or an ink formulated in a so-called dispersion solvent comprising an aqueous, alcoholic or hydro-alcoholic solution, obtained by the method for preparing a colloidal solution according to the invention, of amorphous nanoparticles comprising primary nanoparticles with sizes of less than 30 nm, preferably from 3 to 20 nm, the alcohol of said solution being a non-toxic alcohol notably other than methanol.
- More particularly, said colloidal solution consists in said nanoparticles in dispersion in a dispersion solvent consisting in an aqueous, alcoholic or hydro-alcoholic solution of amorphous nanoparticles, said alcohol of said solution having a boiling temperature below that of water, said dispersion solvent preferably consisting in a water/ethanol mixture.
- Still more particularly, said colloidal solution does not contain any organic ligands as defined above. By «primary nanoparticles» are meant here nanoparticles as obtained before their possible subsequent aggregation in the form of an aggregate of larger size of several primary nanoparticles together.
- Obtaining primary nanoparticles of smaller sizes dispersed in aqueous and/or alcoholic solvents of the present invention is advantageous for obtaining not only in a first phase a stable colloid without adding any ligand but also in a second phase, a homogeneous film with large crystallized grains without any residual impurities of organic ligands in the manufacturing method described hereafter.
- The present invention provides a method for manufacturing a polycrystalline film of metal chalcogenides with large crystalline grains with sizes at least equal to half the thickness of said film, by means of a colloidal solution according to the present invention, said film being deposited on one or more materials in layers forming a substrate, said metal chalcogenide being of formula M-C wherein:
-
- M represents one or several metal elements, either identical or different, selected from Cu, Zn, Sn, Ge, Sb and Bi, preferably Cu, Zn, Sn and Sb, and
- C represents one or several chalcogenide elements either identical or different selected from S, Se and Te,
- wherein the following successive steps are carried out:
- 1) a layer of amorphous nanoparticles of metal chalcogenide(s) is deposited on said substrate from a said aqueous, alcoholic or hydro-alcoholic colloidal solution according to the invention, and
- 2) heat treatment of said layer of metal chalcogenide(s) is carried out at a temperature of at least 300° C., preferably at least 450° C., in order to obtain densification of said layer of metal chalcogenide(s) and crystallization of the nanoparticles, over a thickness from 0.2 to 5 μm, preferably of about 1 μm.
- In examples 3 and 4 hereafter, it is shown that the preferential dispersion solvent is a water-ethanol mixture for producing after deposition by spraying and heat treatment, a continuous and dense (without any crack or hole) film of crystalline CZTS layers with a large grain, and adherent on a molybdenum substrate.
- More particularly, in the method for manufacturing a film according to the invention:
-
- in step 1), a said aqueous colloidal solution is sprayed with a carrier gas consisting of a gas without any oxygen preferably a neutral gas, still preferably nitrogen, at atmospheric pressure and at a substrate temperature brought to at least 100° C., in order to form on a so-called substrate, a layer of said colloidal solution with a thickness from 0.5 to 15 μm preferably of about 3 μm, and,
- steps 1) and 2) are carried out in a vacuum chamber or filled with a gas without any oxygen, preferably a neutral gas, still preferably nitrogen.
- Advantageously, said substrate is a substrate intended to be covered with a type p semi-conductor absorption layer in a solid photovoltaic device.
- More particularly, said substrate consists of a glass or steel layer covered with a so-called rear contact layer, preferably consisting of a molybdenum layer, useful in a solid photovoltaic device of the substrate type.
- Still more particularly, said substrate is a substrate intended to be covered with an absorption layer in a photovoltaic device of the superstrate type, said substrate consisting of a glass layer covered at least successively with:
-
- a transparent front contact conductive layer, and
- preferably a transparent and insulating compound layer, and
- a buffer layer of a type n semi-conductor.
- Said buffer layer of a type n semi-conductor is then a p-n junction with said absorption layer of type p, said buffer layer for example consisting of CdS, In2S3, or Zn(S, O, OH).
- The present invention also provides a film of crystallized metal chalcogenide(s) with large crystalline grains with a size at least equal to the half of the thickness of said film, continuously deposited on a substrate obtained by the method for making a film according to the invention.
- More particularly, the film has surface roughness with an arithmetic mean height of the peaks Sa, according to the ISO 25178 standard, of less than half of the thickness e of the film, preferably less than 0.2×e, preferably still less than 0.15×e for a surface area of at least 20×20 μm2.
- This low surface roughness property of the film obtained by the method according to the invention, is original and advantageous in that it avoids direct contact between both adjacent layers of the film. This continuity property of the layer is advantageous for avoiding electric short-circuits of the photovoltaic device.
- Still more particularly, the film consists of metal chalcogenide(s) Cu2ZnSnS4 (CZTS) in the Kesterite crystalline form, with a thickness from 0.1 to 5 μm, preferably about 1 μm.
- In order to determine whether a thin layer of a dried colloidal solution is crystallized or amorphous, the X-ray diffraction technique is therefore applied, (see for example the text book of René Guinebretière, 2nd edition Lavoisier, Paris, ISBN 2-7462-1238-2).
- The size of a particle is measured by electron microscopy, either by scanning electron microscopy (SEM), or by transmission electron microscopy (TEM).
- The X-ray diffraction technique (for example in the ϑ-2ϑ mode) also allows measurement of the size of the crystallite, from the integrated width of the diffraction peaks. For this, the material must have diffraction lines (be crystalline) but also the crystallites have to be sufficiently small, of the order of 50 nm or less than 100 nm. Beyond, the technique is unsuitable because of the physical limits of the XRD equipment.
- In order to determine the size of an amorphous/slightly crystallized nanoparticle at a scale of a few tens of nanometers, transmission electron microscopy (TEM) is therefore preferred (for example see the text book Transmission Electron Microscopy, Volumes I, II, III and IV according to Williams and Carter, Springer editions 1996, ISBN 978-0-306-45324-3).
- The morphology of a crystalline film is characterized by the dimensions of its reliefs in particular the size of its grains and its roughness, which are observed by microscopy (optical microscopy, atomic force microscopy, SEM or TEM electron microscopy, etc.)
- In the case of crystallized films with large grains, the technique of choice for measuring grain sizes of the order of one micrometer is then the scanning electron microscope (SEM) (see for example the text book «Microscopie Electronique a Balayage et Microanalyses» (Scanning Electron Microscopy and Microanalyses), Ed. Brisset, EDP Science 2008, ISBN 978-7598-0082-7).
- The measurement of the surface roughness of a film was conducted with an atomic force microscope (AFM) and a local scanning probe microscope (SPM), of model AFM/SPM from Agilent Tech. (U.S.A.), series 5100.
- The present invention also provides a photovoltaic device comprising an absorption layer consisting of a said film deposited on a substrate according to the invention.
- More particularly, the photovoltaic device according to the invention comprises the following successively stacked layers:
-
- a substrate, preferably of sodium-lime glass, covered with a thin conductive molybdenum layer used as a rear electric contact layer,
- a said thin absorbing material layer, preferably essentially consisting of CZTS,
- a buffer layer, preferably a layer made on the basis of a type n semi-conductor, such as cadmium sulfide CdS, or indium sulfide In2S3, or further oxysulfide alloys such as Zn(S, O, OH),
- a conductive transparent layer, preferably a layer consisting of a first so-called intrinsic (non-doped) ZnO layer, covered with a transparent conductive layer, preferably of tin-doped indium oxide (ITO) or aluminium-doped zinc oxide (AZO), and
- a metal grid (of aluminium, nickel, and/or silver) of the electric contact face before being deposited on said transparent layer.
- Other features and advantages of the present invention will become apparent in the light of the detailed exemplary embodiments which will follow with reference to the following figures.
-
FIGS. 1A and 1B represent TEM observation photographs of a crude CZTS colloid prepared in a water/acetonitrile mixture according to Example 1, by measurement with an STEM detector (FIG. 1A ) and at a greater TEM magnification (FIG. 1B ),FIG. 1C being a photograph of the diffraction spectrum obtained by electron diffraction ED on the dried powder. -
FIGS. 2A, 2B and 2C represent photographs of CZTS nanoparticles in colloidal form taken with an SEM type microscope (FIG. 2A ), and after deposition as a film deposited by spraying on a substrate (FIG. 2B ), and after annealing at 525° C. of said film (FIG. 2C ). - These photographs are taken by electron microscopy, measured at different steps of the manufacturing of the film, on a glass substrate covered with molybdenum (
FIG. 2B and 2C ). -
FIG. 3 is an X-ray diffraction spectrum measured on layers of nanoparticles ofFIGS. 2A (curve a), 2B (curve b) and 2C (curve c). The Cps («Counts per second») values in ordinates are according to a linear scale («Lin»). -
FIGS. 4A ) to 4D) represent photographs taken by electron microscopy, after crystallization annealing at 525° C., of the surface of a CZTS film according to Example 4 dispersed in a pure ethanol solvent and deposited by spraying at 75° C. (FIG. 4A ), a TEP solvent and spraying at 300° C. (FIG. 4B ), a DMSO solvent and spraying at 300° C. (FIG. 4C ) and a water solvent and spraying at 300° C. (FIG. 4D ). -
FIG. 5 represents a characteristic current-voltage curve under a solar simulator (100 mW/cm2) of a photovoltaic cell Cu2ZnSnS4 in a Mo substrate structure according to Example 7 (active surface area=0.25 cm2). - A colloid of nanoparticles Cu—Zn—Sn—S was made by reacting a mixture of metal salts, CuCl, ZnCl2, SnCl4.5H2O in water/acetonitrile with an aqueous solution of NaSH, at room temperature and under an inert nitrogen atmosphere, according to the global reaction:
-
2CuCl+ZnCl2+SnCl4+4NaSH⇔Cu2ZnSnS4+4NaCl+4HCl - This reactive system is suitable in the sense that the byproducts of the reaction, for example NaCl or HCl are soluble in water while the nanoparticles are solid and dispersed as a colloid.
- The aqueous solution (0.12 M) of NaSH is prepared in a 50 ml bottle, by weighing 0.56 grams of hydrated NaSH powder (provider Aldrich, product 16,152,7) and adding 50 ml of deionized water, deoxygenated beforehand by bubbling for 30 minutes with nitrogen. This aqueous solution of the sulfur precursor NaSH is then sealed with a plug, and then stored.
- The solution of copper-zinc-tin (CZT) metal chlorides in water/acetonitrile is prepared in a nitrogen glove box by:
- 1. weighing 469 mg of copper precursor powder: CuCl (provider Aldrich 224332), 415 mg of zinc precursor powder: ZnCl2 (provider Aldrich 208086) and 893 mg of tin precursor powder: hydrated SnCl4 (Aldrich 244678); and then
- 2. by adding 10 ml of anhydrous acetonitrile (Aldrich 271004);
- 3. after dissolution and mixing with ultrasound for a few minutes, a yellow-greenish solution is obtained with a concentration of 1 mol/L (Cu+Zn+Sn) which is then diluted 5 times in acetonitrile (volumes in a ratio from 1 to 4) and then itself diluted twice with water (volumes 1 and 1) and thereby obtaining a concentration of 0.1 mol/L.
- The colloidal synthesis reaction is conducted by pouring 10 ml of the NaSH solution (0.12 M) in 10 ml of a solution of metal precursors CZT (0.1 M). This synthesis carried out at ambient pressure and temperature is very rapid and gives rise to a colloidal CZTS solution, according to the global reaction indicated above.
- The pH of this crude colloid was measured to be equal to pH=0.3 which defines a very strongly pronounced acidity, favorable for avoiding hydrolysis of the metal elements or particles.
- This crude colloid was analysed by Transmission Electron Microscopy. A model 2100
FEG 200 kV from JEOL (Japan), equipped with EDX (Energy-dispersive X-ray Spectroscopy) detectors, STEM BF (Scanning Transmission Electron Microscope Bright Field) and STEM DF (Surface Transmission Electron Microscope Dark Field) with a wide angle HAADF (High Angular Annular Dark Field) is used. - For this, a sample holder consisting of a carbon membrane on a nickel grid was soaked in the non-diluted colloid and simply dried in ambient air before being introduced into the TEM vacuum chamber. According to
FIG. 1A , the dried colloid forms aggregates of primary nanoparticles, the characteristic size of which is from 2 to 5 nm and with a rounded shape characteristic of amorphous particles. The average elementary analysis achieved by EDX measurement on many areas, indicates that these dried particles contain the majority elements Cu, Zn, Sn, S, and CI as impurities. With larger TEM magnification (FIG. 1B ), i.e. by concentrating the beam of incident electrons, certain crystalline planes seem to be observable, ascribable to probable crystallization under the beam, during the TEM observation. Electron diffraction analysis as illustrated with the example ofFIG. 1C , shows the presence of a diffuse diffraction ring, corresponding to atomic diffraction planes characterized by interatomic distances compatible with the known crystalline structure of kesterite Cu2ZnSnS4 (CZTS). The crude colloid observed under TEM therefore appears to be amorphous or slightly crystallized in the probable kesterite structure (in particular with crystallization during TEM observation with strong magnification). - The analysis of the composition (TEM EDX) is the following:
-
Cu Zn Sn S Ni Cl at. % 24.2 15.7 10.4 47.4 0.0 2.3 100 - This crude colloid is then poured into a centrifugation tube and then centrifuged for 5 min at 6,000 rpm (Universal centrifuge 16 from Hettich Zentrifugen AG), i.e. an acceleration of 3,700 G expressed relatively to gravity. This allows separation of the solid and liquid portions. The transparent upper liquid portion (the supernatant) is removed by pouring it into a bottle of acid liquid waste. The lower solid portion is then rinsed by adding 20 ml of water. After introducing a magnetic bath covered with Teflon, this solution was placed on a magnetic plate and mixed with magnetic stirring at about 200 rpm for 5 minutes. New centrifugation for 10 min at 9,000 rpm (i.e. 8,400 G) is carried out, followed by removal of the supernatant. This rinsing procedure aims at removing the reaction products such as NaCl, HCl and other excess ionic species. We measured that the lower and humid solid residual portion forms a slurry which consists of about 100 mg of dry material (CZTS) and 500 mg of liquid, by weighing before and after drying in vacuo.
- This slurry was then re-dispersed in a water/ethanol mixture (5 ml/5 ml), and then mixed with magnetic stirring for 5 minutes at room temperature; the obtained colloid is then stable for several days and may be used for deposition by spraying/atomization.
- The particles suspended in this rinsed colloid were then analyzed by TEM microscopy (
FIG. 2A ) by using the same procedure with a carbon membrane on a nickel grid, as described before for the TEM measurements of crude colloid (FIG. 1A ). The microscopy with a STEM DF detector ofFIG. 2A shows primary nanoparticles of a rounded shape, agglomerated and with a similar size between 2 and 7 nm typically. EDX analysis (not shown) indicates the majority presence of elements Cu, Zn, Sn and S but the absence of the chlorine element, which illustrates the effect of the rinsing. As high resolution TEM analysis and electron diffraction is unreliable because of the crystallization under a beam of electrons, the crystallographic characteristics were measured by X ray diffraction on the slurry from the rinsed crude colloid (but not re-dispersed), coarsely spread out on a glass plate of 2.5×2.5 cm2 at room temperature. - The X-ray diffraction measurements were conducted in a diffractometer of the Bruker
AXS D8 series 2 type, by using an X-ray source corresponding to the copper emission line Kα, in a grazing mode (with an angle of incidence set to 1°) and a detector movable over a circular arc in order to obtain a 2ϑ diffraction angle spectrum scanned from 10° to 70° with a pitch of 0.04. - Curve A of
FIG. 3 (lower spectrum) shows the diffraction spectrum of X-rays of the humid slurry ofFIG. 2A . This spectrum does not exhibit well-defined diffraction peaks but rather two very wide bumps, for which the positions in 2ϑ=28.4° and 2ϑ=47.3° may correspond to those of the two main peaks (112) and (220)/(204) respectively, of the kesterite crystalline structure from X-ray diffraction reference spectra measured on powder crystalline materials. Thus, the particles making up the rinsed colloid and then dried in ambient air, are in majority amorphous or slightly crystallized, in consistency with the TEM observations ofFIGS. 1A and 1B (crude colloid) or TEM observations ofFIG. 2A (rinsed and reconditioned or re-dispersed colloid). - The solid nanoparticles of the crude colloid and of the rinsed and then re-dispersed colloid are both characterized by a nanometric size (2-7 nm), consisting of the elements Cu, Zn, Sn and S, of an amorphous crystalline or even very slightly crystallized structure.
- The concentration of the CZTS colloid noted in moles per liter (or M), is defined as the number of molecules of the compound CZTS (Cu2ZnSnS4 or equivalent to the number of tin atoms) per unit volume. In Example 1 above, the concentration of the crude colloid is 0.0125 M. In the present example, the concentration of the CZTS colloid was brought to 0.25 M, which is equivalent to about 100 mg/ml. One skilled in the art will recognize there a value corresponding to the typical concentration of a slightly diluted slurry, which may be deposited by tape casting. This illustrates the versatility of the colloidal synthesis method.
- In this alternative, an aqueous solution (6 M) of NaSH is prepared, by weighing 2.24 g thereof for 4 ml of solution. A solution of copper-zinc-tin (CZT) metal chlorides in acetonitrile is prepared by weighing 188 mg of CuCl, 166 mg of ZnCl2 and 357 mg of SnCl4 hydrate for 5 ml of solution. The synthesis is achieved by pouring, in a first phase, 11 ml of deionized and deoxygenated water into the solution of metal precursors, and then in a second phase, the 4 ml of NaSH solution.
- The thereby made crude colloid of the compound CZTS is concentrated (0.25 M) and, further has strong stability after adding water in the rinsing step indicated in Example 1 above.
- The composition of the crystallized film Cu2ZnSnS4 and the composition of the amorphous film deposited by spraying before annealing described in the form of Cu—Zn—Sn—S, are conventionally distinguished hereafter.
- Amorphous layers of Cu—Zn—Sn—S were deposited from suspended nanoparticles, by spraying on substrates of the Mo/glass type formed with sodium-lime glass with a thickness of 1 mm covered with a 700 nm molybdenum layer.
- In the present example of deposition by spraying, a colloid according to Example 1 above was prepared and the colloid was then re-dispersed in a water/ethanol mixture (5 ml/5 ml).
- The spraying step was carried out in a glove box (model GP concept type T3 in stainless steel, from Jacomex S.A.S., France) filled with nitrogen and equipped with a purification unit (<1 ppm O2, <10 ppm H2O) and with an airlock being used for introducing/extracting samples. Amorphous Cu—Zn—Sn—S films were deposited on Mo/glass substrates (2.5 cm×2.5 cm) brought to a temperature of 250° C. by means of a heating plate (model 18×18 cm of standard ceramic, reference 444-0617 from VWR International SAS, France) with modified thermal regulation in a closed loop on a thermocouple of the K type placed under the substrate. An X-Y Cartesian robot was used (of the Yamaha type, FXYx 550×550 with an RCX222 controller, distributed in France by New-Mat France) for sweeping over a surface of more than 16 cm2 with the spray nozzle used (a sprayer flask on a test tube in borosilicate glass from Glasskeller Basel AG). For injecting the colloidal solution into the nozzle, application of nitrogen pressure was controlled intermittently: open for 0.3 seconds and then a waiting time of 1.7 seconds; this 2 second cycling being maintained during the spraying duration. Good films were obtained with a nozzle-substrate distance of about 15 cm with an average flow of nitrogen carrier gas of 14 L/min at a cylinder nitrogen pressure of 0.2 bars. Thicknesses of 6±1 μm were obtained by deposition by spraying for two minutes of the colloid of
concentration 10 mg/ml (i.e. a volume of about 2 ml). - The morphology of the thereby deposited amorphous layers Cu—Zn—Sn—S was determined by Scanning Electron Microscopy SEM (Hitachi Ltd, model S-4700 equipped with an EDX analyser and data processing by the software package NORAN).
FIG. 2B is a sectional view of a Cu—Zn—Sn—S film deposited by spraying at 240° C. On this picture, the glass substrate may be seen, covered with a layer of 700 nm of polycrystalline molybdenum with a column structure, and the film Cu—Zn—Sn—S. It is possible to discern that this film is porous and consists of fine particles agglomerated together and separated by vacuum. - The amorphous/slightly crystallized nature of the films obtained by spray deposition from CZTS colloids, was shown by X-ray diffraction measurement as indicated by the spectrum of
FIG. 3 (middle curve b). There again, no diffraction peak is clearly detectable. - The annealing step used for densifying and crystallizing the layer in order to form large crystalline grains was carried out in a nitrogen glass box (reference GT concept, from Jacomex SAS, France). The film deposited by spraying was then laid on a heated plate (model Titane plate with a Detlef control case, Harry Gestigkeit, GmbH) and heated gradually under nitrogen up to an annealing temperature of 525° C. maintained for 1 hour, and then cooled for 1 hour.
FIG. 2C shows a sectional view of the film obtained after annealing: above the polycrystalline molybdenum layer, a polycrystalline film with a thickness of 1.8±0.2 μm expresses densification of the film which is accompanied by crystallization with formation of the desired large grains (from 1 to 2 μm) i.e. close to the thickness of the film. - The surface condition of the film above was analyzed and its roughness Sa was measured according to the ISO 25178 standard. The average roughness Sa is defined as the arithmetic mean of the absolute values of the ordinates of the roughness profile. The following values were obtained for a film with a thickness of 1.8 μm: 313 nm for a surface of 50×50 μm2, 247 nm for a surface of 20×20 μm2.
- In the present example, a CZTS colloid was prepared according to Example 1, except that the slurry rinsed with water and then centrifuged was then mixed in dispersion solvents different from the water-ethanol 50-50 mixture of Example 3. Among the latter, four were selected for the present example notably for their low vapor pressures at 20° C. for TEP (Tri-Ethyl-Phosphate) (40 Pa) or DMSO (80 Pa) or else high vapor pressures for water (2,330 Pa) and for ethanol (5,850 Pa). The concentration was adjusted to 10 g/L. After deposition by spraying in a glove box according to the invention, the CZTS/Mo/glass samples obtained were then subject to crystallization heat treatment at 525° C. under nitrogen. The surface images of the obtained samples are shown in
FIGS. 4A to 4D . - This CZTS film is formed with crystallized CZTS grains, as indicated by the X diffraction spectra, (not shown). However, in the cases, A) ethanol, B) Tri-Ethyl-Phosphate (TEP) or C) DiMethyl-SulfOxide (DMSO), the adhesion to the substrate is not sufficient, the covering level of the substrate is not complete, and the grain size is not homogeneous. Only the water solvent (
FIG. 4 —case D) gives the possibility of obtaining both a high covering level of the CZTS film with large crystalline grains and good adhesion on the molybdenum/glass substrate. - The present example shows that water is the preferred pure dispersion solvent. Examples 3 and 4 show that the dispersion solvent is preferentially a water-ethanol mixture, which is an abundant solvent, easy to use and non-toxic and which gives the possibility of making, after deposition by spraying followed by a crystallization heat treatment, continuous and dense (without any cracks or holes) crystalline CZTS layers with large grains, and adherent on the molybdenum substrate.
- A sulfur precursor solution is first prepared by mixing 18 ml of acetonitrile and 2 ml of water at room temperature, and then by pouring therein 18 mg of NaSH powder (0.321 mmol) which spontaneously dissolves. As the NaSH is not or very little soluble in acetonitrile, dissolution occurs in the aqueous portion of the water/acetonitrile mixture.
- An antimony metal precursor solution with a concentration of 10.7 mol/L is then prepared by dissolving 4 mg (0.214 mmol) of SbCl3 powder (Aldrich) in a 20 ml solution of pure acetonitrile. No hydrolysis of the SbCl3 salt is noticed during this dissolution.
- By pouring the sulfur precursor solution into the metal solution at room temperature, orange coloration is immediately observed, characteristic of the amorphous solid phase Sb2S3, resulting from spontaneous formation and within a few seconds, of a stable colloid. This colloid is difficult to centrifuge, which shows the great stability of the colloid, which is related to the small size/mass of the primary suspended nanoparticles. Indeed, an analysis by transmission microscopy (TEM) is then conducted: a copper grid with a carbon membrane is soaked for a few seconds in the colloidal liquid so as to collect a small portion of it, and then it is left to dry in ambient air. Observation under TEM indicates agglomerated small primary particles, the individual size of which is of about 20 nanometers. Elementary analysis TEM+EDX shows a majority composition of Sb2S3 as well as the presence of chlorinated impurities (of the order of 1 atomic percent). No crystalline phase is identifiable by electron diffraction under a TEM electron beam, which indicates that the solid particles of the colloid consist of amorphous antimony sulfide Sb2S3. The colloidal synthesis by mixing both antimony/acetonitrile and sulfur/water solutions was then achieved according to the global reaction: 2SbCl3+3NaSH<=>Sb2S3+3NaCl+3HCl.
- By using two sulfur and metal solutions prepared under identical conditions with those of the example above, the mixing order was reversed by pouring the metal solution into the sulfur-containing solution. There also, an orange coloration was immediately observed with spontaneous formation of an amorphous colloid Sb2S3 with a characteristic orange color.
- A metal solution of tin 0.05 M is prepared in a glass bottle with a capacity of 50 ml, into which is first poured 348 mg of tin precursor powder (SnCl2, anhydrous, Fluka 96529) and then 36 ml of acetonitrile solvent. Dissolution is facilitated at room temperature by ultrasonication for a few minutes.
- As in the examples above, a sulfur-containing 0.2 M aqueous solution is prepared by weighing 1.12 g of NaSH powder, and then by adding 100 ml of deionized and deoxygenated pure water in order to achieve their spontaneous dissolution.
- The colloidal synthesis is then achieved by mixing at room temperature both solutions, for example by pouring 9 ml of the sulfur-containing 0.2M solution into 36 ml of 0.05 M metal tin solution. A black colloid is then formed spontaneously according to the global reaction: SnCl2+NaSH<=>SnS+NaCl+HCl. This colloid is stable under ambient conditions for several days. The TEM observation of this colloid thereby made and without any other treatment (without any rinsing, centrifugation, re-dispersion etc.) is shown hereafter. In particular, elementary analysis TEM-EDX indicates that the composition is in majority of tin sulfide, with presence of a chlorinated impurity, which is a residual impurity of the reaction according to the following composition (TEM EDX):
-
Sn S Cl C N O at. % 45.2 52.3 2.5 0.0 0.0 0.0 100 - The primary particles formed are relatively small, with a characteristic size of the order of 3 to 5 nm. This colloid may then be used in order to be rinsed and then re-formulated as a slurry or an ink which may be used for deposition of thin layers.
- A thin CZTS layer was prepared on a glass substrate probably molybdenum, annealed under an N2 atmosphere, like in Example 3.
- On the crystallized continuous CZTS layer with large grains, a buffer layer of approximately 50 nm of CdS was deposited, by deposition in a chemical bath according to the customary procedure of the state of the art (see for example G. Hodes, Chemical Solution Deposition Of Semiconductor Films, ISBN 08247-0851-2, M. Dekker Inc.), by quenching in a mixture maintained at 60° C. of deionized water, of ammonia (NH3, 4M), cadmium nitrate (Cd(NO3)2, 4mM) and of thio-urea (SC(NH2)2, 0.2M). After 10 minutes, the samples were rinsed in deionized water and then dried under nitrogen flow.
- On this buffer layer, two optically transparent layers were deposited successively by magnetron sputtering with the use of a commercial apparatus H2 from Intercovamex: A first insulating layer of about 50 nm of ZnO [135 W RF, 0.5 Pa of argon] followed by a conductive transparent layer of about 250 nm of indium oxide doped with 10% by mass of tin (ITO) [70 W RF, 0.25 Pa of argon]. The square resistance of the obtained ITO layer is approximately 30 ohms per unit square.
- Next, the substrate was divided into 16 electrically insulated cells, each with square dimensions 0.5 cm×0.5 cm. In order to collect the current and measure the photovoltaic performance, a front face contact was made with a small spot of 0.5 mm of silver deposited by drying a lacquer loaded with silver, on the conductive ITO layer. The rear contact was also directly taken on the molybdenum, at the edge of the substrate.
- The photovoltaic yield (or photovoltaic efficiency) was computed from the current-voltage electric characteristics of the photovoltaic diode measured under light irradiation. The conversion yield is the percentage of the electric power delivered by the device at the maximum power point, relatively to the power of the incident radiation: η=(electric power at the maximum power point)/(power of the incident radiation). This photovoltaic efficiency was measured with an electric test bench and which uses a solar simulator delivering an irradiation of 1000 W/m2 corresponding to the AM1.5G standard. The measurement bench was calibrated according to the standard procedure on the basis of the known photocurrent of reference cells, as provided by different recognised official institutes.
- As illustrated in
FIG. 5 , the preliminary yields as described in this example, were of the order of 1%, the short-circuit currents were around 8 mA/cm2 and the open circuit voltages around Voc=0.25V.
Claims (12)
1. A method for manufacturing a film of polycrystalline metal chalcogenide(s) with large crystalline grains of sizes at least equal to half the thickness of said film, by means of a colloidal solution consisting of: primary amorphous nanoparticles of metal chalcogenides of formula M-C dispersed in a hydro-alcoholic solvent,
wherein:
M represents one or several first metals, either identical or different, selected from the group consisting of Cu, Zn, and Sn, and
C represents one or several chalcogenide elements, either identical or different, selected from S and Se,
wherein said primary amorphous nanoparticles have a size of less than 30 nm, wherein the alcohol is a non-toxic alcohol having a boiling temperature below the boiling temperature of water, and wherein the hydro-alcoholic solution does not contain organic ligands, said film being deposited on one or more layered material(s) forming a substrate, said metal chalcogenide being of formula M-C wherein:
M represents Cu, Zn, and Sn, and
C represents one or more chalcogenide elements, either identical or different, selected from S and Se, wherein the following successive steps are carried out:
1) a layer of amorphous nanoparticles of metal chalcogenide(s) is deposited on said substrate from said aqueous, or hydro-alcoholic colloidal solution, and
2) heat treatment of said layer of metal chalcogenide(s) is carried out at a temperature of at least 300° C. in order to obtain densification of said layer of metal chalcogenide(s) and crystallization of the nanoparticles, over a thickness from 0.2 to 5 μm.
2. The method according to claim 1 , wherein, in step 1), said aqueous or hydro-alcoholic colloidal solution is sprayed with a carrier gas consisting of an oxygen-free gas, at atmospheric pressure and at a substrate temperature brought to at least 100° C., in order to form on said substrate, a layer of said colloidal solution with a thickness from 0.5 to 15 μm, and, wherein steps 1) and 2) are carried out in a vacuum chamber or filled with an oxygen-free gas.
3. The method according to claim 1 , wherein said substrate is a substrate intended to be covered with a type p semi-conductor absorption layer in a solid photovoltaic device, wherein said substrate consists of a glass or steel layer covered with a rear contact layer, consisting of a molybdenum layer, useful in a solid photovoltaic device of the substrate type.
4. The method according to claim 1 , wherein a film of crystallized metal chalcogenide(s) of Cu, Zn, and Sn with large crystalline grains with a size of at least half the thickness of the thickness of said film, continuously deposited on said substrate is obtained, said film having surface roughness with an arithmetic mean height of the peaks of Sa, according to the ISO 25178 standard, of less than half of the thickness e of the film, for a surface area of at least 20×20 μm2.
5. A film of crystallized metal chalcogenide(s) manufactured according to the method of claim 1 .
6. The film according to claim 5 , with large crystalline grains with a size of at least half the thickness of the thickness of said film, wherein said film has a surface roughness with an arithmetic mean height of the peaks of Sa, according to the ISO 25178 standard, of less than half of the thickness of the film, for a surface area of at least 20×20 μm2.
7. The film according to claim 5 , wherein the crystallized metal chalcogenide(s) consist of Cu2ZnSnS4 in a Kesterite crystalline form, with a thickness of from 0.2 to 5 μm.
8. A photovoltaic device comprising an absorption layer consisting of the film according to claim 5 deposited on a substrate.
9. The device according to claim 8 , comprising successively stacked layers of:
said substrate, wherein said substrate is made of sodium-lime glass, covered with a thin conductive layer of molybdenum being used as a rear electric contact layer,
said film of an absorbing material,
a buffer layer made of a layer made on the basis of an n-type semi-conductor, and
a conductive transparent layer consisting of a first layer of a not doped intrinsic ZnO layer, covered with a transparent conductive layer made of indium oxide doped with tin (ITO) or zinc oxide doped with aluminium (AZO), and a metal grid of a front face electric contact deposited on said transparent layer.
10. The device according to claim 9 , wherein said absorbing material comprises Cu2ZnSnS4.
11. The device according to claim 9 , wherein the n-type semi-conductor is selected from the group consisting of cadmium sulfide CdS, indium sulfide In2S3, and an oxysulfide alloy.
12. The device according to claim 11 , wherein the oxysulfide alloy is Zn(S, O, OH).
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US14/413,316 Expired - Fee Related US9731262B2 (en) | 2012-07-26 | 2013-07-04 | Large-grain crystallized metal chalcogenide film, colloidal solution of amorphous particles, and preparation methods |
US15/655,952 Expired - Fee Related US10632441B2 (en) | 2012-07-26 | 2017-07-21 | Large-grain crystallized metal chalcogenide film, colloidal solution of amorphous particles, and preparation methods |
US16/820,984 Abandoned US20200215509A1 (en) | 2012-07-26 | 2020-03-17 | Method of manufacturing a large-grain crystallized metal chalcogenide film, and a crystallized metal chalcogenide film prepared using the method |
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US14/413,316 Expired - Fee Related US9731262B2 (en) | 2012-07-26 | 2013-07-04 | Large-grain crystallized metal chalcogenide film, colloidal solution of amorphous particles, and preparation methods |
US15/655,952 Expired - Fee Related US10632441B2 (en) | 2012-07-26 | 2017-07-21 | Large-grain crystallized metal chalcogenide film, colloidal solution of amorphous particles, and preparation methods |
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EP (1) | EP2877277B1 (en) |
JP (2) | JP6312668B2 (en) |
FR (1) | FR2993792B1 (en) |
WO (1) | WO2014016489A2 (en) |
Families Citing this family (16)
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CN104028285A (en) * | 2014-05-17 | 2014-09-10 | 北京工业大学 | Preparation method of Cu2ZnSnS4/La2Ti2O7 heterojunction photocatalytic composite material |
FR3022074B1 (en) | 2014-06-05 | 2018-02-16 | Imra Europe Sas | PROCESS FOR THE PREPARATION OF THIN FILM OF SULFIDE ABSORBER (S) AND SELENIOR (S) OF COPPER, ZINC AND TIN, RECESSED THIN LAYER AND PHOTOVOLTAIC DEVICE OBTAINED |
US10730012B2 (en) * | 2014-07-25 | 2020-08-04 | Chemical and Metal Technologies LLC | Extraction of target materials using CZTS sorbent |
US10888836B2 (en) * | 2014-07-25 | 2021-01-12 | Chemical and Metal Technologies LLC | Extraction of target materials using CZTS sorbent |
US10283357B2 (en) * | 2014-12-01 | 2019-05-07 | The University Of Chicago | Compositionally matched molecular solders for semiconductors |
US9825214B1 (en) * | 2016-06-22 | 2017-11-21 | Mainstream Engineering Corporation | Films and the like produced from particles by processing with electron beams, and a method for production thereof |
KR102432093B1 (en) * | 2017-10-20 | 2022-08-16 | 한국과학기술연구원 | Amorphous Nanostructure made up of Inorganic Polymer and Method of manufacturing the same |
US11167262B2 (en) * | 2017-09-29 | 2021-11-09 | Korea Institute Of Science And Technology | Amorphous nanostructure composed of inorganic polymer and method for manufacturing the same |
CN111051390B (en) * | 2017-09-29 | 2022-03-22 | 韩国科学技术研究院 | Amorphous nanostructure composed of inorganic polymer and method for producing same |
KR102458627B1 (en) * | 2018-08-21 | 2022-10-25 | 한국과학기술연구원 | Fractal-shaped Alloy Nanostructure formed by using Amorphous Nanostructure and Method of manufacturing the same |
KR102407233B1 (en) | 2018-08-21 | 2022-06-10 | 한국과학기술연구원 | Composite Body in which Nanoparticles are uniformly dispersed in nanosized Pores of a Support and Method of manufacturing the same |
CN111474142B (en) * | 2020-05-21 | 2021-08-03 | 中南大学 | Method for detecting concentration of micro-plastic by using near-infrared 1550nm laser |
CN113321555A (en) * | 2021-07-05 | 2021-08-31 | 多农多收技术研究(江苏)有限公司 | Medicament and method capable of effectively preventing grain crops from absorbing cadmium in soil |
CN115108581B (en) * | 2022-07-05 | 2024-03-15 | 许昌学院 | Chemical method for preparing copper zinc tin sulfide nanocrystalline at normal temperature |
CN115231608B (en) * | 2022-07-06 | 2024-03-15 | 许昌学院 | Chemical method for preparing multi-sulfide nanocrystalline at normal temperature |
KR102671502B1 (en) * | 2022-11-28 | 2024-05-30 | 전남대학교산학협력단 | Thin-film solar cell having double buffer layers and method of manufacturing the thin-film solar cell |
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US4645619A (en) * | 1985-05-28 | 1987-02-24 | Xerox Corporation | Process for the preparation of colloidal dispersions of chalcogens and chalcogenide alloys |
US6126740A (en) * | 1995-09-29 | 2000-10-03 | Midwest Research Institute | Solution synthesis of mixed-metal chalcogenide nanoparticles and spray deposition of precursor films |
JP2005032475A (en) | 2003-07-08 | 2005-02-03 | Sharp Corp | Semiconductor thin film electrode using organic dye as photosensitizer, photoelectric conversion element using the same, and photo-electrochemical solar cell |
US8895427B2 (en) | 2008-09-04 | 2014-11-25 | Kaneka Corporation | Substrate having a transparent electrode and method for producing the same |
WO2010048581A2 (en) * | 2008-10-24 | 2010-04-29 | Life Technologies Corporation | Stable nanoparticles and methods of making and using such particles |
EP2430112B1 (en) * | 2009-04-23 | 2018-09-12 | The University of Chicago | Materials and methods for the preparation of nanocomposites |
US7972899B2 (en) | 2009-07-30 | 2011-07-05 | Sisom Thin Films Llc | Method for fabricating copper-containing ternary and quaternary chalcogenide thin films |
JP2013512311A (en) * | 2009-11-25 | 2013-04-11 | イー・アイ・デュポン・ドウ・ヌムール・アンド・カンパニー | Aqueous production process for crystalline copper chalcogenide nanoparticles, nanoparticles so produced, and inks and coated substrates incorporating these nanoparticles |
JP2013512306A (en) * | 2009-11-25 | 2013-04-11 | イー・アイ・デュポン・ドウ・ヌムール・アンド・カンパニー | CZTS / Se precursor ink, CZTS / Se thin film, and method for producing CZTS / Se photovoltaic cell |
JP5454214B2 (en) | 2010-02-22 | 2014-03-26 | Tdk株式会社 | Method for producing compound semiconductor buffer layer and method for producing compound semiconductor thin film solar cell |
EP2589066B1 (en) | 2010-06-29 | 2015-10-21 | Merck Patent GmbH | Preparation of semiconductor films |
US8617915B2 (en) * | 2010-09-20 | 2013-12-31 | International Business Machines Corporation | Annealing thin films |
US20130037110A1 (en) * | 2011-08-10 | 2013-02-14 | International Business Machines Corporation | Particle-Based Precursor Formation Method and Photovoltaic Device Thereof |
TWI460869B (en) * | 2011-12-30 | 2014-11-11 | Ind Tech Res Inst | The fabrication method for light absorption layer of solar cell |
FR3001467B1 (en) * | 2013-01-29 | 2016-05-13 | Imra Europe Sas | PROCESS FOR PREPARING THIN FILM OF SULFIDE (S) COPPER, ZINC AND TIN SULFIDE ABSORBER, RECESSED THIN LAYER AND PHOTOVOLTAIC DEVICE OBTAINED |
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2012
- 2012-07-26 FR FR1257242A patent/FR2993792B1/en not_active Expired - Fee Related
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2013
- 2013-07-04 EP EP13745450.0A patent/EP2877277B1/en not_active Not-in-force
- 2013-07-04 US US14/413,316 patent/US9731262B2/en not_active Expired - Fee Related
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2018
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JP6312668B2 (en) | 2018-04-18 |
EP2877277B1 (en) | 2020-10-14 |
US9731262B2 (en) | 2017-08-15 |
FR2993792A1 (en) | 2014-01-31 |
EP2877277A2 (en) | 2015-06-03 |
JP6629374B2 (en) | 2020-01-15 |
JP2018113471A (en) | 2018-07-19 |
WO2014016489A2 (en) | 2014-01-30 |
WO2014016489A3 (en) | 2014-09-12 |
FR2993792B1 (en) | 2017-09-15 |
US20150194548A1 (en) | 2015-07-09 |
US20170320037A1 (en) | 2017-11-09 |
US10632441B2 (en) | 2020-04-28 |
JP2015532611A (en) | 2015-11-12 |
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