US20170129008A1 - Method for modifying nickel microparticles and method for producing nickel microparticles - Google Patents
Method for modifying nickel microparticles and method for producing nickel microparticles Download PDFInfo
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- US20170129008A1 US20170129008A1 US15/320,022 US201515320022A US2017129008A1 US 20170129008 A1 US20170129008 A1 US 20170129008A1 US 201515320022 A US201515320022 A US 201515320022A US 2017129008 A1 US2017129008 A1 US 2017129008A1
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- United States
- Prior art keywords
- nickel
- nickel microparticles
- processing
- acid
- microparticles
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- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 title claims abstract description 657
- 229910052759 nickel Inorganic materials 0.000 title claims abstract description 325
- 239000011859 microparticle Substances 0.000 title claims abstract description 310
- 238000000034 method Methods 0.000 title claims abstract description 81
- 230000000051 modifying effect Effects 0.000 title claims abstract description 41
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 19
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 claims abstract description 180
- 239000002253 acid Substances 0.000 claims abstract description 120
- 230000004580 weight loss Effects 0.000 claims abstract description 73
- 239000002904 solvent Substances 0.000 claims abstract description 26
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 claims abstract description 23
- 229910017604 nitric acid Inorganic materials 0.000 claims abstract description 23
- RPAJSBKBKSSMLJ-DFWYDOINSA-N (2s)-2-aminopentanedioic acid;hydrochloride Chemical class Cl.OC(=O)[C@@H](N)CCC(O)=O RPAJSBKBKSSMLJ-DFWYDOINSA-N 0.000 claims abstract description 19
- 238000002715 modification method Methods 0.000 claims abstract description 16
- 238000010438 heat treatment Methods 0.000 claims abstract description 14
- 150000007513 acids Chemical class 0.000 claims abstract description 13
- 239000000203 mixture Substances 0.000 claims abstract description 9
- 238000012545 processing Methods 0.000 claims description 274
- 238000005259 measurement Methods 0.000 claims description 99
- 239000012530 fluid Substances 0.000 claims description 70
- 239000000843 powder Substances 0.000 claims description 47
- BFDHFSHZJLFAMC-UHFFFAOYSA-L nickel(ii) hydroxide Chemical compound [OH-].[OH-].[Ni+2] BFDHFSHZJLFAMC-UHFFFAOYSA-L 0.000 claims description 44
- 239000012298 atmosphere Substances 0.000 claims description 23
- 238000003756 stirring Methods 0.000 claims description 20
- 239000000126 substance Substances 0.000 claims description 19
- 239000010409 thin film Substances 0.000 claims description 8
- 238000013459 approach Methods 0.000 claims description 7
- 239000012299 nitrogen atmosphere Substances 0.000 claims description 7
- 238000004455 differential thermal analysis Methods 0.000 claims description 5
- 238000006243 chemical reaction Methods 0.000 claims description 4
- 239000000243 solution Substances 0.000 description 45
- 230000000052 comparative effect Effects 0.000 description 32
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 31
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 28
- 230000000694 effects Effects 0.000 description 19
- 238000003860 storage Methods 0.000 description 18
- 238000002156 mixing Methods 0.000 description 14
- 230000007246 mechanism Effects 0.000 description 13
- 239000002245 particle Substances 0.000 description 13
- 238000005406 washing Methods 0.000 description 13
- 239000000919 ceramic Substances 0.000 description 10
- 239000003638 chemical reducing agent Substances 0.000 description 10
- 230000015572 biosynthetic process Effects 0.000 description 8
- 230000009467 reduction Effects 0.000 description 8
- 230000007774 longterm Effects 0.000 description 7
- 229910052751 metal Inorganic materials 0.000 description 7
- 239000002184 metal Substances 0.000 description 7
- 239000010414 supernatant solution Substances 0.000 description 7
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 6
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 6
- 230000008859 change Effects 0.000 description 6
- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 description 6
- 238000005336 cracking Methods 0.000 description 6
- 239000006185 dispersion Substances 0.000 description 6
- 239000002002 slurry Substances 0.000 description 6
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 5
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 5
- 230000007547 defect Effects 0.000 description 5
- 238000001035 drying Methods 0.000 description 5
- 239000007791 liquid phase Substances 0.000 description 5
- 230000008569 process Effects 0.000 description 5
- 239000000047 product Substances 0.000 description 5
- 150000003839 salts Chemical class 0.000 description 5
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 4
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 4
- 238000004945 emulsification Methods 0.000 description 4
- 239000003995 emulsifying agent Substances 0.000 description 4
- 239000007789 gas Substances 0.000 description 4
- 230000001590 oxidative effect Effects 0.000 description 4
- 238000000926 separation method Methods 0.000 description 4
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 3
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 3
- 230000002378 acidificating effect Effects 0.000 description 3
- 239000007864 aqueous solution Substances 0.000 description 3
- 239000011248 coating agent Substances 0.000 description 3
- 238000000576 coating method Methods 0.000 description 3
- 235000014113 dietary fatty acids Nutrition 0.000 description 3
- 238000004090 dissolution Methods 0.000 description 3
- 238000009826 distribution Methods 0.000 description 3
- 239000000194 fatty acid Substances 0.000 description 3
- 229930195729 fatty acid Natural products 0.000 description 3
- 239000001257 hydrogen Substances 0.000 description 3
- 229910052739 hydrogen Inorganic materials 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 150000002816 nickel compounds Chemical class 0.000 description 3
- 230000003647 oxidation Effects 0.000 description 3
- 238000007254 oxidation reaction Methods 0.000 description 3
- 230000002123 temporal effect Effects 0.000 description 3
- DTQVDTLACAAQTR-UHFFFAOYSA-N Trifluoroacetic acid Chemical compound OC(=O)C(F)(F)F DTQVDTLACAAQTR-UHFFFAOYSA-N 0.000 description 2
- 230000001133 acceleration Effects 0.000 description 2
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 2
- QZPSXPBJTPJTSZ-UHFFFAOYSA-N aqua regia Chemical compound Cl.O[N+]([O-])=O QZPSXPBJTPJTSZ-UHFFFAOYSA-N 0.000 description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 2
- 239000002585 base Substances 0.000 description 2
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 2
- -1 fatty acid salt Chemical class 0.000 description 2
- 239000010408 film Substances 0.000 description 2
- IKDUDTNKRLTJSI-UHFFFAOYSA-N hydrazine hydrate Chemical compound O.NN IKDUDTNKRLTJSI-UHFFFAOYSA-N 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-M hydroxide Chemical compound [OH-] XLYOFNOQVPJJNP-UHFFFAOYSA-M 0.000 description 2
- 239000001301 oxygen Substances 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- 239000003002 pH adjusting agent Substances 0.000 description 2
- 150000002978 peroxides Chemical class 0.000 description 2
- 239000012071 phase Substances 0.000 description 2
- 238000001228 spectrum Methods 0.000 description 2
- POILWHVDKZOXJZ-ARJAWSKDSA-M (z)-4-oxopent-2-en-2-olate Chemical compound C\C([O-])=C\C(C)=O POILWHVDKZOXJZ-ARJAWSKDSA-M 0.000 description 1
- QTBSBXVTEAMEQO-UHFFFAOYSA-M Acetate Chemical compound CC([O-])=O QTBSBXVTEAMEQO-UHFFFAOYSA-M 0.000 description 1
- CIWBSHSKHKDKBQ-JLAZNSOCSA-N Ascorbic acid Natural products OC[C@H](O)[C@H]1OC(=O)C(O)=C1O CIWBSHSKHKDKBQ-JLAZNSOCSA-N 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 1
- UEEJHVSXFDXPFK-UHFFFAOYSA-N N-dimethylaminoethanol Chemical compound CN(C)CCO UEEJHVSXFDXPFK-UHFFFAOYSA-N 0.000 description 1
- 229910002651 NO3 Inorganic materials 0.000 description 1
- VEQPNABPJHWNSG-UHFFFAOYSA-N Nickel(2+) Chemical compound [Ni+2] VEQPNABPJHWNSG-UHFFFAOYSA-N 0.000 description 1
- NHNBFGGVMKEFGY-UHFFFAOYSA-N Nitrate Chemical compound [O-][N+]([O-])=O NHNBFGGVMKEFGY-UHFFFAOYSA-N 0.000 description 1
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- QAOWNCQODCNURD-UHFFFAOYSA-L Sulfate Chemical compound [O-]S([O-])(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-L 0.000 description 1
- 238000005299 abrasion Methods 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 239000005456 alcohol based solvent Substances 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- 229910001854 alkali hydroxide Inorganic materials 0.000 description 1
- 150000008044 alkali metal hydroxides Chemical class 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 150000001412 amines Chemical class 0.000 description 1
- 239000003849 aromatic solvent Substances 0.000 description 1
- 239000011668 ascorbic acid Substances 0.000 description 1
- 229960005070 ascorbic acid Drugs 0.000 description 1
- 235000010323 ascorbic acid Nutrition 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 238000003889 chemical engineering Methods 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 239000000571 coke Substances 0.000 description 1
- 239000000084 colloidal system Substances 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 229960002887 deanol Drugs 0.000 description 1
- 230000018044 dehydration Effects 0.000 description 1
- 238000006297 dehydration reaction Methods 0.000 description 1
- 238000000113 differential scanning calorimetry Methods 0.000 description 1
- 239000007772 electrode material Substances 0.000 description 1
- 239000003759 ester based solvent Substances 0.000 description 1
- 239000004210 ether based solvent Substances 0.000 description 1
- 150000004665 fatty acids Chemical class 0.000 description 1
- 229940093915 gynecological organic acid Drugs 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 150000002367 halogens Chemical class 0.000 description 1
- 150000004677 hydrates Chemical class 0.000 description 1
- 150000002429 hydrazines Chemical class 0.000 description 1
- 150000004678 hydrides Chemical class 0.000 description 1
- QOSATHPSBFQAML-UHFFFAOYSA-N hydrogen peroxide;hydrate Chemical compound O.OO QOSATHPSBFQAML-UHFFFAOYSA-N 0.000 description 1
- 239000005453 ketone based solvent Substances 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- TYQCGQRIZGCHNB-JLAZNSOCSA-N l-ascorbic acid Chemical compound OC[C@H](O)[C@H]1OC(O)=C(O)C1=O TYQCGQRIZGCHNB-JLAZNSOCSA-N 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 150000007522 mineralic acids Chemical class 0.000 description 1
- 239000012046 mixed solvent Substances 0.000 description 1
- 230000007935 neutral effect Effects 0.000 description 1
- 229910001453 nickel ion Inorganic materials 0.000 description 1
- 229910000480 nickel oxide Inorganic materials 0.000 description 1
- RRIWRJBSCGCBID-UHFFFAOYSA-L nickel sulfate hexahydrate Chemical compound O.O.O.O.O.O.[Ni+2].[O-]S([O-])(=O)=O RRIWRJBSCGCBID-UHFFFAOYSA-L 0.000 description 1
- 229940116202 nickel sulfate hexahydrate Drugs 0.000 description 1
- AIBQNUOBCRIENU-UHFFFAOYSA-N nickel;dihydrate Chemical compound O.O.[Ni] AIBQNUOBCRIENU-UHFFFAOYSA-N 0.000 description 1
- 150000002825 nitriles Chemical class 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 150000007524 organic acids Chemical class 0.000 description 1
- 235000005985 organic acids Nutrition 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- GNRSAWUEBMWBQH-UHFFFAOYSA-N oxonickel Chemical compound [Ni]=O GNRSAWUEBMWBQH-UHFFFAOYSA-N 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 238000000634 powder X-ray diffraction Methods 0.000 description 1
- 229910052594 sapphire Inorganic materials 0.000 description 1
- 239000010980 sapphire Substances 0.000 description 1
- 238000010008 shearing Methods 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 239000012279 sodium borohydride Substances 0.000 description 1
- 229910000033 sodium borohydride Inorganic materials 0.000 description 1
- 239000012453 solvate Substances 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 150000003462 sulfoxides Chemical class 0.000 description 1
- 239000008399 tap water Substances 0.000 description 1
- 235000020679 tap water Nutrition 0.000 description 1
- YNJBWRMUSHSURL-UHFFFAOYSA-N trichloroacetic acid Chemical compound OC(=O)C(Cl)(Cl)Cl YNJBWRMUSHSURL-UHFFFAOYSA-N 0.000 description 1
- 238000011144 upstream manufacturing Methods 0.000 description 1
Images
Classifications
-
- B22F1/0003—
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
- B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
- B22F1/00—Metallic powder; Treatment of metallic powder, e.g. to facilitate working or to improve properties
- B22F1/14—Treatment of metallic powder
- B22F1/145—Chemical treatment, e.g. passivation or decarburisation
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
- B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
- B22F1/00—Metallic powder; Treatment of metallic powder, e.g. to facilitate working or to improve properties
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
- B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
- B22F1/00—Metallic powder; Treatment of metallic powder, e.g. to facilitate working or to improve properties
- B22F1/14—Treatment of metallic powder
- B22F1/142—Thermal or thermo-mechanical treatment
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
- B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
- B22F9/00—Making metallic powder or suspensions thereof
- B22F9/16—Making metallic powder or suspensions thereof using chemical processes
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
- B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
- B22F2301/00—Metallic composition of the powder or its coating
- B22F2301/15—Nickel or cobalt
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
- B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
- B22F2998/00—Supplementary information concerning processes or compositions relating to powder metallurgy
- B22F2998/10—Processes characterised by the sequence of their steps
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
- B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
- B22F2999/00—Aspects linked to processes or compositions used in powder metallurgy
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
- B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
- B22F9/00—Making metallic powder or suspensions thereof
- B22F9/16—Making metallic powder or suspensions thereof using chemical processes
- B22F9/18—Making metallic powder or suspensions thereof using chemical processes with reduction of metal compounds
- B22F9/24—Making metallic powder or suspensions thereof using chemical processes with reduction of metal compounds starting from liquid metal compounds, e.g. solutions
Definitions
- the present invention relates to a method for modifying nickel microparticles and a method for producing nickel microparticles.
- Nickel microparticles which are a widely used material as an electrically conductive material including a laminated ceramic condenser and a substrate thereof, as well as an electrode material, have been used as ones controlled in crystallite diameter and particle diameter and particle size distribution according to purpose.
- the methods for producing nickel microparticles include a method using a gas phase method as known in Patent Document 1 and a method using a liquid phase method as known in Patent Document 2.
- nickel microparticles also have a problem in storage stability, and also often form nickel hydroxide in a few days to a few weeks when stored under an air atmosphere, and there has been a problem such that use of nickel microparticles becomes difficult in that case.
- Patent Document 3 a method where hydrogen reduction processing using hydrogen gas is performed after oxidizing nickel powder to some degree is proposed in Patent Document 3
- a method where nickel microparticles having a nickel hydroxide coating are processed by a plasma of oxygen-containing gas generated by glow discharge to form a coating of nickel oxide is proposed in Patent Document 5.
- Patent Document 3 has such problems as requiring explosion-proof measures for facilities and involving danger in the production of microparticles due to the use of hydrogen gas.
- the method of Patent Document 4 has such problems that the process becomes extremely complex, productivity is still low, it is difficult to remove the fatty acid salt absorbed to the nickel microparticle surfaces, and heat treatment is required.
- Patent Document 5 there are such problems as requiring high energy and an expensive apparatus for processing by the plasma of the oxygen-containing gas.
- the conventional arts not only have difficulties in reducing the weight loss rate in the simultaneous TG-DTA measurement but also do not provide an industrially inexpensive simple solution suited for mass production.
- Patent Document 6 relates to a method of separating nickel microparticles in a thin film fluid formed between processing surfaces which are able to approach and separate from each other and rotate relative to each other.
- Patent Document 7 there is described a method for making nickel microparticles have a sharper particle diameter distribution, a method for controlling particle diameter, and a method for controlling crystallite diameter.
- the present invention provides a method for modifying nickel microparticles with a reduced weight loss rate in simultaneous TG-DTA measurement and a method for producing nickel microparticles comprising this method for modifying nickel microparticles.
- the inventor of the presently applied invention have found that the abovementioned object can be achieved by a method for modifying nickel microparticles to be described hereinafter and a method for producing nickel microparticles comprising this method for modifying nickel microparticles and thereby could accomplish the presently applied invention.
- the present invention relates to a method for modifying nickel microparticles comprising a step of making an acid and/or hydrogen peroxide act on nickel microparticles weight loss of which occurs due to heat treatment such as burning.
- the present invention relates to a method for modifying nickel microparticles, wherein the step of making an acid and/or hydrogen peroxide act reduces a rate of weight loss due to heat treatment of the nickel microparticles.
- the present invention may be executed as an embodiment wherein the rate of weight loss due to heat treatment of the nickel microparticles is a weight loss rate in simultaneous thermogravimetry-differential thermal analysis measurement, and the weight loss rate in a simultaneous thermogravimetry-differential thermal analysis measurement under a nitrogen atmosphere of the nickel microparticles is 1% or less in a range of 40° C. to 400° C.
- the present invention relates to a method for modifying nickel microparticles, wherein nitric acid or a mixture of acids that include nitric acid is used as the acid.
- the present invention relates to a method for modifying nickel microparticles, wherein the nickel microparticles and acid and/or hydrogen peroxide are made to act in a ketonic solvent.
- the present invention relates to a method for modifying nickel microparticles, wherein a molar ratio of the acid to the nickel microparticles is in a range of 0.001 to 0.1.
- the present invention relates to a method for modifying nickel microparticles, wherein a molar ratio of the hydrogen peroxide to the nickel microparticles is in a range of 0.001 to 2.0.
- the present invention relates to a method for modifying nickel microparticles, wherein the step of making an acid and/or hydrogen peroxide act includes an ultrasonic processing, a stirring processing, or a microwave processing.
- the present invention may be executed as an embodiment wherein the stirring processing is performed using a stirrer provided with a rotating stirring blade.
- the present invention relates to a method for modifying nickel microparticles, wherein powder of the nickel microparticles on which the acid and/or hydrogen peroxide was made to act is stored under an air atmosphere.
- the present invention relates to a method for modifying nickel microparticles, wherein the nickel microparticles are nickel microparticles separated by a microreactor which makes at least two kinds of fluids to be processed react.
- the present invention relates to a method for modifying nickel microparticles comprising a step of making a substance which reacts with nickel hydroxide act on nickel microparticles on at least surfaces of which nickel hydroxide is present to reduce the nickel hydroxide.
- the present invention relates to a method for producing nickel microparticles comprising a method for modifying nickel microparticles described above.
- the present invention relates to a method for producing nickel microparticles, being a method for producing the nickel microparticles using a microreactor, the said microreactor comprising a first processing surface and a second processing surface which are disposed facing each other so as to be able to approach and/or separate from each other, at least one of which rotates relative to the other, comprising a step of introducing at least two kinds of fluids to be processed between the first processing surface and the second processing surface, a step of generating a separating force which acts in a direction to separate the first processing surface and the second processing surface from each other by an introducing pressure of the at least two kinds of fluids to be processed imparted to between the first processing surface and the second processing surface, a step of forming a thin film fluid by making the at least two kinds of fluids to be processed converge with each other between the first processing surface and the second processing surface kept at a minute distance and pass through between the first processing surface and the second processing surface while keeping the minute distance between the first processing surface and the second processing
- the rate and amount of weight loss in simultaneous TG-DTA measurement of nickel microparticles can be reduced, and the problem of a defect such as cracking in a burning process when, for example, a laminated ceramic condenser is produced using slurry of nickel microparticles for an internal electrode.
- nickel microparticles modified by the modification method of the present invention are excellent in long-term storage stability such as suppressing the formation of nickel hydroxide.
- the method for modifying nickel microparticles of the present invention is applied to nickel microparticles produced using a microreactor which makes at least two kinds of fluids to be processed react, a method for producing nickel microparticles comprising the method for modifying nickel microparticles that thoroughly exhibits its performance and is low cost and capable of mass production can be provided.
- FIG. 1 A first figure.
- FIG. 12 (A) to FIG. 12 (G) are the XRD measurement results of the nickel microparticles obtained after acid processing and/or hydrogen peroxide processing in Examples 1, 2, 4, 8, 10, 17, and 24 of the present invention.
- the nickel microparticle is a microparticle made mainly of nickel metal.
- a nickel microparticle hydroxylated or oxidized at least in part is also called a nickel microparticle.
- the nickel microparticle can also be one containing an element(s) other than nickel to an extent not to affect the present invention.
- the nickel microparticle is not particularly restricted in particle diameter or crystallite diameter.
- the nickel microparticles ones that are commonly commercially available may be purchased and the modification method of the present invention may be applied thereto, or the modification method of the present invention may be applied to nickel microparticles separately prepared according to purpose.
- nickel microparticles to which the modification method of the present invention is applicable can be any as long as weight loss thereof occurs due to heat treatment, and nickel microparticles produced by any method can be used such as ones prepared with a gas phase method and ones prepared with a liquid phase method, but the effect is particularly great when the nickel microparticles were prepared with a liquid phase method.
- the effect of reducing the weight loss rate in simultaneous TG-DTA measurement can be obtained.
- FIG. 7 shows the results of a simultaneous TG-DTA measurement under a nitrogen atmosphere of nickel hydroxide.
- the measurement range is 40° C. to 400° C.
- the TG curve shows a weight loss rate of about 19%, which is the ratio (a theoretical value) of water contained in nickel hydroxide (Ni(OH) 2 ) from near 250° C., and in the entire measurement range, a weight loss rate of about 20%.
- FIG. 4 shows the results of a simultaneous TG-DTA measurement of conventional nickel microparticles, which are described in Comparative Example 1 of the presently applied invention to be described later.
- the measurement range is 40° C. to 400° C.
- the TG curve shows weight loss observed from near 250° C., and eventually shows a weight loss rate of about 1.25% in the entire measurement range, which approximates to the shape of the TG curve of nickel hydroxide mentioned above. That is, the weight loss at near 250° C. or above indicates the possibility that a reaction including dehydration from nickel hydroxide was being effected, which is considered to lead to cracking and other defects in the burning process when a laminated ceramic condenser is produced.
- nickel microparticles can be produced which, even when stored for a long period of time, do not produce cracking and other defects in the burning process during production of a laminated ceramic condenser.
- An illustrative example of the acid to be made to act on the abovementioned nickel microparticles includes inorganic acids such as hydrochloric acid, nitric acid, sulfuric acid, phosphoric acid, aqua regia, and mixed acid; and organic acids such as acetic acid and citric acid. A mixture of two or more kinds of acid may also be used.
- inorganic acids such as hydrochloric acid, nitric acid, sulfuric acid, phosphoric acid, aqua regia, and mixed acid
- organic acids such as acetic acid and citric acid.
- a mixture of two or more kinds of acid may also be used.
- the nickel microparticles it is preferable to add the nickel microparticles to the solvent containing the acid and to perform a stirring processing of a fixed time by ultrasonic processing or by use of any of various stirrers or to perform a microwave processing.
- the abovementioned acids also have the ability to dissolve the nickel microparticles and therefore a molar ratio of any of the abovementioned acids with respect to the nickel microparticles is preferably within a range of 0.001 to 0.1 and even more preferably within a range of 0.005 to 0.05. If the molar ratio falls below 0.001, the possibility that the effects of the present invention will not be obtained becomes high, and if the molar ratio exceeds 0.1, a problem such as dissolution of the nickel microparticles may occur.
- the hydrogen peroxide to be made to act on the abovementioned nickel microparticles a commonly commercially available hydrogen peroxide water may be used.
- the mechanism by which the weight loss in simultaneous TG-DTA measurement of the nickel microparticles can be reduced by making the abovementioned hydrogen peroxide act is not clear, as in the case of making the acid act on the nickel microparticles, it is considered that the reduction is due to dissolution of nickel hydroxide, etc. present on the surfaces of the particles or due to oxidation of nickel or further due to oxidation of nickel hydroxide.
- a molar ratio of the abovementioned hydrogen peroxide with respect to the nickel microparticles is preferably within a range of 0.001 to 2.0 and even more preferably within a range of 0.001 to 1.0.
- the hydrogen peroxide is low in the possibility of dissolving the nickel microparticles, in view of the effect of reducing the weight loss, the molar ratio of the hydrogen peroxide with respect to the abovementioned nickel microparticles is preferably 1.0 or less.
- the present invention may also be carried out by replacing the hydrogen peroxide with ozone.
- the processing of making any of the abovementioned acids act (acid processing) and the processing of making the hydrogen peroxide act (hydrogen peroxide processing) may be respectively carried out solely or both may be carried out.
- the weight loss rate in the simultaneous TG-DTA measurement can be reduced greatly by performing the hydrogen peroxide processing on the nickel microparticles on which the acid processing has been performed. Also, the same effect is provided by performing the acid processing on the nickel microparticles on which the hydrogen peroxide processing has been performed.
- the above-described acid processing and/or hydrogen peroxide processing are or is performed in any of various solvents.
- solvents water (tap water, RO water, pure water, etc.) and organic solvents (alcohol solvents, ketone solvents, ether solvents, aromatic solvents, carbon disulfide, aliphatic solvents, nitrile solvents, sulfoxide solvents, halogen solvents, ester solvents, and ionic solutions) can be cited.
- the present invention may be carried out by selecting one kind or a mixed solvent mixing two or more kinds from among such solvents according to purpose.
- a ketone solvent such as acetone, methyl ethyl ketone, and cyclohexanone, and especially preferable to use acetone as the at least one kind of solvent.
- An example of an embodiment of the present invention is to perform the above-described acid processing or hydrogen peroxide processing by preparing a solution by mixing any of the abovementioned acids or hydrogen peroxide to any of the abovementioned solvents, adding the nickel microparticles into the solution, and performing the stirring processing by ultrasonic processing or by use of any of various stirrers or performing the microwave processing.
- stirring processing in the modification method according to the present invention a known stirrer or stirring means may be used and stirring energy may be controlled as appropriate. Details concerning the stirring energy are described in Japanese Patent Laid-Open Publication No. H04-114725 by Applicant of the presently applied invention.
- the method for stirring in the present invention is not particularly restricted and may be carried out using a stirrer or dissolver, emulsifier, disperser, homogenizer, etc. of any of various shearing types, a friction type, a high-pressure jet type, an ultrasonic type, etc.
- a continuous type emulsifier such as Ultra-Turrax (manufactured by IKA Japan K.K.), Polytron (manufactured by Kinematica AG), TK Homomixer (manufactured by PRIMIX Corporation), Ebara Milder (manufactured by EBARA CORPORATION), TK Homomic Line Flow (manufactured by PRIMIX Corporation), Colloid Mill (manufactured by Shinko Pantec Co., Ltd.), Slasher (manufactured by NIPPON COKE & ENGINEERING CO., LTD.), Trigonal Wet Pulverizer (manufactured by Mitsui Miike Chemical Engineering Machinery Co., Ltd.), Cavitron (manufactured by Eurotec, Ltd.), Fine Flow Mill (manufactured by Pacific Machinery & Engineering Co., Ltd.), a batch-type emulsifier, such as Clearmix (manufactured by M.
- the stirring processing is preferably performed using a stirrer provided with a rotating stirring blade, especially the Clearmix (manufactured by M. Technique Co., Ltd.) or Clearmix Dissolver (manufactured by M. Technique Co., Ltd.) mentioned above.
- a nickel-containing fluid with which nickel metal or a nickel compound is dissolved or dispersed in a solvent, and a reducing agent fluid, containing a reducing agent, are prepared.
- the nickel compound is not particularly restricted, and an illustrative example thereof includes inorganic salts of nickel such as a nitrate, sulfate, chloride, and hydroxide of nickel and hydrates of such inorganic salts; and organic salts such as an acetate and acetylacetonate of nickel and organic solvates of such organic salts. These may be used solely or a plurality may be used.
- the reducing agent is not particularly restricted as long as it exhibits a property of reducing nickel ions, and an illustrative example thereof includes hydrides such as sodium borohydride; hydrazines; and polyvalent alcohols such as ethylene glycol. These may also be used solely or a plurality may be used by mixing or other method.
- the abovementioned nickel-containing fluid and reducing agent fluid may be used upon mixing, dissolving, or dispersing the abovementioned nickel metal, nickel compound, or reducing agent in any of various solvents.
- various solvents the same solvents as the solvents used in the above-described acid processing and/or hydrogen peroxide processing may be used and a pH adjuster for adjusting the pH of the nickel-containing fluid and the reducing agent fluid may be added.
- An illustrative example of the pH adjuster includes inorganic or organic acidic substances such as hydrochloric acid, sulfuric acid, nitric acid, aqua regia, trichloroacetic acid, trifluoroacetic acid, phosphoric acid, citric acid, and ascorbic acid; alkali hydroxides such as sodium hydroxide and potassium hydroxide; basic substances such as amines including triethylamine and dimethylamino ethanol; and salts of these acidic substances and basic substances.
- These pH adjusters may be used solely or as a combination of two or more of them. Any of various stirrers may be used to prepare the abovementioned nickel-containing fluid and reducing agent fluid.
- the abovementioned fluids that have been prepared are mixed and the nickel component and the reducing agent component in the fluids are made to react to separate the nickel microparticles.
- a case where a microreactor is used to mix the abovementioned fluids and separate the nickel microparticles shall be illustrated below.
- FIG. 1 the one shown in FIG. 1 , which is the same as the apparatuses described in Patent Document 6 and Patent Document 7, can be used.
- reference character R indicates a rotational direction.
- the microreactor (hereinafter, referred to also as an apparatus) of the present embodiment is provided with two processing members of a first processing member 10 and a second processing member 20 arranged opposite to each other, wherein the first processing member 10 rotates.
- the surfaces arranged opposite to each other of the respective processing members 10 and 20 are made to be the respective processing surfaces.
- the first processing member 10 is provided with a first processing surface 1 and the second processing member 20 is provided with a second processing surface 2 .
- Each of the processing surfaces 1 and 2 is connected to a flow path d 1 , d 2 of the fluid to be processed and constitutes part of the flow path of the fluid to be processed.
- Distance between these processing surfaces 1 and 2 is controlled so as to form a minute space usually in the range of 1 mm or less, for example, 0.1 ⁇ m to 50 ⁇ m. With this, the fluid to be processed passing through between the processing surfaces 1 and 2 becomes a forced thin film fluid forced by the processing surfaces 1 and 2 .
- this apparatus performs a fluid processing in which first and second fluids to be processed are reacted to separate nickel microparticles between the processing surfaces 1 and 2 .
- this apparatus is provided with a first holder 11 for holding the first processing member 10 , a second holder 21 for holding the second processing member 20 , a surface-approaching pressure imparting mechanism 43 , a rotation drive mechanism (not shown in drawings), a first introduction part d 1 , a second introduction part d 2 , and fluid pressure imparting mechanisms p 1 and p 2 .
- the fluid pressure imparting mechanisms p 1 and p 2 can be compressors or other pumps.
- the first processing member 10 and the second processing member 20 are disks with ring forms.
- Material of the processing members 10 and 20 is not only metal but also carbon, ceramics, sintered metal, abrasion-resistant steel, sapphire, and other metal subjected to hardening treatment, and rigid material subjected to lining, coating, or plating.
- the first and the second surfaces 1 and 2 arranged opposite to each other are mirror-polished, and arithmetic average roughness is 0.01 ⁇ m to 1.0 ⁇ m.
- the second holder 21 is fixed to the apparatus, the first holder 11 attached to a rotary shaft 50 of the rotation drive mechanism fixed to the same apparatus rotates, and thereby the first processing member 10 attached to this first holder 11 rotates relative to the second processing member 20 .
- the second processing member 20 may be made to rotate, or the both may be made to rotate.
- the rotation can be set to a speed of, for example, 350 to 5000 rpm.
- the second processing member 20 approaches and separates from the first processing member 10 in the direction of the rotary shaft 50 , wherein a side of the second processing member 20 opposite to the second processing surface 2 is accepted in an accepting part 41 arranged in the second holder 21 so as to be able to rise and set.
- the first processing member 10 may approach and separate from the second processing member 20 , or both the processing members 10 and 20 may approach and separate from each other.
- the abovementioned accepting part 41 is a concave portion for accepting the side of the second processing member 20 opposite to the second processing surface 2 , and this concave portion is a groove being formed into a ring. This accepting part 41 accepts the second processing member 20 with sufficient clearance so that the side of the second processing member 20 opposite to the second processing surface 2 may rise and set.
- the surface-approaching pressure imparting mechanism is a mechanism to generate force (hereinafter, surface-approaching pressure) to press the first processing surface 1 of the first processing member 10 and the second processing surface 2 of the second processing member 20 in the direction to make them approach each other.
- the mechanism generates a thin film fluid having minute thickness in a level of nanometer or micrometer while keeping the distance between the processing surfaces 1 and 2 in a predetermined minute distance by the balance between the surface-approaching pressure and the force due to the fluid pressure to separate the processing surfaces 1 and 2 from each other.
- the surface-approaching pressure imparting mechanism supplies the surface-approaching pressure by biasing the second processing member 20 toward the first processing member 10 by a spring 43 arranged in the second holder 21 .
- the first fluid to be processed which is pressurized with the fluid pressure imparting mechanism p 1 is introduced from the first introduction part d 1 to the space inside the processing members 10 and 20 .
- the second fluid to be processed which is pressurized with the fluid pressure imparting mechanism p 2 is introduced from the second introduction part d 2 via a path arranged inside the second processing member 20 to the space inside the processing members 10 and 20 through an opening d 20 formed in the second processing surface.
- the first fluid to be processed and the second fluid to be processed converge and mix with each other.
- the mixed fluid to be processed becomes a forced thin film fluid by the processing surfaces 1 and 2 that keep the minute space therebetween, whereby the fluid is forced to move out from the circular, processing surfaces 1 and 2 .
- the first processing member 10 is rotating; and thus, the mixed fluid to be processed does not move linearly from inside the circular, processing surfaces 1 and 2 to outside thereof, but does move spirally from the inside to the outside thereof by a resultant vector acting on the fluid to be processed, the vector being composed of a moving vector toward the radius direction of the circle and a moving vector toward the circumferential direction.
- a groove-like depression 13 extended toward an outer side from the central part of the first processing member 10 , namely in a radius direction, may be formed.
- the depression 13 may be, as a plane view, curved or spirally extended on the first processing surface 1 , or, though not shown in the drawing, may be extended straight radially, or bent at a right angle, or jogged; and the concave portion may be continuous, intermittent, or branched.
- this depression 13 may be formed also on the second processing surface 2 , or on both the first and second processing surfaces 1 and 2 .
- the base edge of the depression 13 reach the inner periphery of the first processing member 10 .
- the front edge of the depression 13 is extended to the direction of the outer periphery of the first processing surface 1 ; the depth thereof is made gradually shallower (smaller) from the base edge to the front edge.
- a flat plane 16 Between the front edge of the depression 13 and the outer peripheral of the first processing surface 1 is formed a flat plane 16 not having the depression 13 .
- the opening d 20 described above is arranged preferably at a position opposite to the flat surface of the first processing surface 1 .
- the opening d 20 is arranged especially preferably at a position opposite to the flat surface 16 located in the downstream of a position where the direction of flow of the first fluid to be processed upon introduction by the micro-pump effect is changed to the direction of a spiral and laminar flow formed between the processing surfaces.
- the second introduction part d 2 preferably has directionality.
- the direction of introduction from the opening d 20 of the second processing surface 2 may be inclined at a predetermined elevation angle relative to the second processing surface 2 , and introduction from the opening d 20 of the second processing surface 2 may have directionality in a plane along the second processing surface 2 , and the direction of introduction of this second fluid may be in the outward direction departing from the center in a radial component of the processing surface and in the forward direction in a rotation component of the fluid between the rotating processing surfaces.
- the flow of the first fluid to be processed at the opening d 20 is a laminar flow and the second introduction part d 2 has directionality, whereby the second fluid to be processed can be introduced between the processing surfaces 1 and 2 while suppressing the generation of turbulence to the flow of the first fluid to be processed.
- the fluid discharged to outside the processing members 10 and 20 is collected via a vessel v into a beaker b as a discharged solution.
- the discharged solution contains nickel microparticles as to be described later.
- each processing member is not particularly restricted in its form, size, and number; and these may be changed as appropriate.
- shape of the opening d 20 may be a concentric circular ring shape which encircles the central opening of the processing surface 2 having a form of a ring-like disk, and the opening having the circular ring shape may be any of continuous and discontinuous.
- the opening for introduction may be arranged just before the first and second processing surfaces 1 and 2 or in the side of further upstream thereof.
- first or second for each fluid has a meaning for merely discriminating an n th fluid among a plurality of the fluids present; and therefore, a third or more fluids can also exist as in the foregoing.
- the uniform and homogeneous nickel microparticles can be provided with an effect of reducing the weight loss in simultaneous TG-DTA measurement, particularly, an effect of reducing the weight loss that is observed from near 250° C., and long-term storage stability such as suppressing the formation of nickel hydroxide.
- the nickel microparticles are microparticles made mainly of nickel metal in the present invention.
- the nickel microparticles can be from any source.
- the modification method of the present invention may be applied to commonly commercially available nickel microparticles, or the modification method of the present invention may be applied to nickel microparticles separately prepared according to purpose.
- nickel microparticles to which the modification method of the present invention is applicable can be any as long as weight loss thereof occurs due to heat treatment, and can be produced by any method.
- the modification method of the present invention is applicable to all nickel microparticles weight loss of which occurs due to heat treatment among nickel microparticles that exist in the world, and the modifying effect is particularly great on nickel microparticles prepared with a liquid phase method.
- nickel microparticles modified by the modification method of the present invention do not require heat treatment.
- the nickel microparticles are preferably washed using a solvent such as pure water and then dried, and it is preferable to apply the modification method of the present invention to washed and dried nickel microparticle powders, that is, to perform acid processing and/or hydrogen peroxide processing on washed and dried nickel microparticle powders.
- unwashed nickel microparticles On the surface of unwashed nickel microparticles, various substances used for the separation reaction such as, for example, a reducing agent and its decomposed matter remain, and if acid processing and/or hydrogen peroxide processing is performed using the unwashed nickel microparticles, the substances may provide an adverse effect such that the amount of an acid and/or hydrogen peroxide to be used for the acid processing and/or hydrogen peroxide processing is increased.
- the solution A corresponds to a first fluid to be processed that is introduced from the first introduction part d 1 of the microreactor shown in FIG. 1
- the solution B corresponds to a second fluid to be processed that is introduced from the second introduction part d 2 of the same.
- the first introduction part d 1 and the second introduction part d 2 can be switched arbitrarily. Obtained nickel microparticles were analyzed under the following conditions.
- XRD measurement was made by using the powder X-ray diffraction measurement instrument (product name: Empyrean, manufactured by PANalytical B. V.). The measurement conditions were as follows: measurement range of 10 to 1000, Cu anticathode, tube voltage of 45 kV, tube current of 40 mA, Bragg-Brentano HD (BBHD) used as an optical system, and scanning speed of 9°/min.
- the crystallite diameter D was calculated with use of the peak appeared near to 44° by using the Scherrer's equation with reference to the silicon polycrystal plate.
- ⁇ is the wavelength of the X-ray tube used
- ⁇ is the half-width
- ⁇ is the diffraction angle
- TEM observation was made by using the transmission electron microscope JEM-2100 (manufactured by JEOL Ltd.). The observation condition with the acceleration voltage of 200 kV was used.
- a simultaneous TG-DTA measurement was made using the simultaneous high-temperature differential scanning calorimetry/thermogravimetric analyzer TG/DTA6300 (manufactured by Hitachi, Ltd.) was used.
- the measurement conditions were as follows: alumina used as a reference, rate of temperature increase of 5° C./min., measurement range of 40 to 400° C. and measurement under a nitrogen atmosphere. A weight loss rate from 40° C., which is at the start of measurement, to 400° C. was confirmed. In addition, the weight of the sample was provided as 45 mg ( ⁇ 2 mg).
- Solution A was prepared by mixing and dissolving each of the nickel sulfate hexahydrate/concentrated sulfuric acid/ethylene glycol/pure water (weight ratio of 2.33/0.86/83.54/13.27) by stirring for 60 minutes with a rotation number of 20000 rpm and a processing temperature of 24 to 60° C. using a high-speed emulsification/dispersion apparatus Cleamix (product name: CLM-2.2S, manufactured by M. Technique Co., Ltd.).
- Solution B was prepared by mixing and dissolving each of the hydrazine monohydrate/sodium hydroxide/pure water (weight ratio of 70/5/25) by stirring for 30 minutes with a rotation number of 20000 rpm and a processing temperature of 25° C. using the same high-speed emulsification/dispersion apparatus Cleamix (product name: CLM-2.2S, manufactured by M. Technique Co., Ltd.).
- the solution A was introduced at 165° C. and 600 ml/min. from the first introduction part d 1 of the microreactor shown in FIG. 1 between the processing surfaces 1 and 2 , and while the processing member 10 was rotated at 1700 rpm, the solution B was introduced at 60° C. and 65 ml/min. from the second introduction part d 2 between the processing surfaces 1 and 2 , whereby the solution A and the solution B were mixed between the processing surfaces 1 and 2 to separate nickel microparticles.
- a slurry liquid containing the nickel microparticles separated between the processing surfaces 1 and 2 was discharged from between the processing surfaces 1 and 2 , and collected via the vessel v into the beaker b.
- the discharged solution collected into the beaker b was allowed to stand until it was cooled to 60° C. or less, and the nickel microparticles were settled.
- the PH of the discharged solution was 8.45 (measurement temperature: 42.5° C.).
- the supernatant solution in the beaker b was removed, and pure water 20 to 1500 times the weight of the settled nickel microparticles was added, and stirred for five minutes with a rotation number of 6000 rpm and a processing temperature of 25° C. using Cleamix 2.2S to wash the nickel microparticles. The washing operation was repeated for 3 times, and then the nickel microparticles were again settled, and the supernatant solution was removed to obtain an aqueous wet cake ( 1 ) of nickel microparticles.
- the aqueous wet cake ( 1 ) of nickel microparticles was dried at ⁇ 0.10 MpaG and 20° C. for 15 hours or more to obtain nickel microparticle powders.
- the content of water in the nickel microparticle powders was 89 ⁇ g/g. It is preferable to dry the nickel microparticle powders until the content of water therein becomes 1000 ⁇ g/g or less, preferably, 500 ⁇ g/g or less, and more preferably, 100 ⁇ g/g or less.
- a SEM picture of the nickel microparticle powders after drying is shown in FIG. 3 as Comparative Example 1 of the presently applied invention, and XRD measurement results thereof, in FIG.
- FIG. 11 spectrum (A)
- the average particle diameter of the nickel microparticles was 86.4 nm
- the crystallite diameter was 41.5 nm.
- a dispersion solution obtained by dispersing the nickel microparticle powders after drying in acetone was allowed to drip onto a collodion film to obtain a TEM observation sample.
- a TEM picture is shown in FIG. 8 .
- a thin membranous substance was observed on the surface of the nickel microparticles.
- FIG. 8 XRD measurement results
- peaks derived from nickel hydroxide were detected besides peaks derived from nickel, and it was confirmed that 3.4% by weight of nickel hydroxide was contained in the nickel powder.
- the peaks with filled circles are the peaks of nickel hydroxide.
- results of a simultaneous TG-DTA measurement of the nickel microparticle powders after drying are shown in FIG. 4 . Weight loss of 1.256% was confirmed in the measurement range mentioned above.
- FIG. 6 A SEM picture of nickel microparticles after the nickel microparticle powders of Comparative Example 1 mentioned above were stored for two weeks under an air atmosphere is shown in FIG. 6 , and XRD measurement results thereof, in FIG. 10(B) , and an enlarged view of the essential part of the XRD measurement results thereof, in FIG. 11 (spectrum (B)).
- FIG. 6 a substance that seemed to have separated due to a temporal change was observed between the nickel microparticles.
- the washing operation was repeated for 3 times, and an aqueous wet cake ( 2 ) of nickel microparticles obtained after the washing was prepared, and then, the aqueous wet cake ( 2 ) was dried at ⁇ 0.10 MpaG and 20° C. for 15 hours or more to obtain nickel microparticle powders.
- the content of water in the nickel microparticle powders was 36 ⁇ g/g. It is preferable to dry the nickel microparticle powders until the content of water therein becomes 1000 ⁇ g/g or less, preferably, 500 ⁇ g/g or less, and more preferably, 100 ⁇ g/g or less.
- a dispersion solution obtained by dispersing the nickel microparticle powders obtained by the acid processing in acetone was allowed to drip onto a collodion film to obtain a TEM observation sample.
- a TEM picture is shown in FIG. 9 .
- the TEM picture ( FIG. 8 ) of the nickel microparticles obtained in Comparative Example 1 no thin membranous substance was observed on the surface of the nickel microparticles.
- the thin membranous substance on the surface of nickel microparticles is a hydroxide of nickel, and considered to be the thin membranous substance dissolved by the acid processing.
- Results of a simultaneous TG-DTA measurement of the nickel microparticle powders after the acid processing are shown in FIG. 5 .
- the weight loss rate was 0.793%.
- the weight loss rate in the simultaneous TG-DTA measurement could be reduced as compared with Comparative Example 1.
- XRD measurement results of the nickel microparticle powders obtained in Example 1 are shown in FIG. 12(A) . As shown in FIG. 12(A) , no peaks derived from nickel hydroxide were detected.
- Example 2 Processing of Making Acid Act on Nickel Microparticles Using Stirrer Provided with Rotating Stirring Blade
- the washing operation was repeated for 3 times, and an aqueous wet cake ( 3 ) of nickel microparticles obtained after the washing was prepared, and then, the aqueous wet cake ( 3 ) was dried at ⁇ 0.10 MpaG and 20° C. for 15 hours or more to obtain nickel microparticle powders.
- Example 3 to Example 7 and Example 16 to Example 19 which were changed in the method for separating nickel microparticles or in the molar ratio of an acid to nickel microparticles when acid processing was performed will be described later.
- the molar ratio of an acid to nickel microparticles when acid processing was performed was changed by adjusting the weight ratio of nitric acid/water/acetone in the solution (ultrasonic disperser: 14.85 g, stirrer: 1485 g) to be used for the acid processing relative to the nickel microparticle powders (ultrasonic disperser: 0.15 g, stirrer: 15 g) to be subjected to the acid processing.
- the nickel microparticles in the solution were settled, the supernatant solution was removed, and pure water 20 to 1500 times the weight of the nickel microparticles was added and washed the nickel microparticles by the ultrasonic cleaner described above.
- the washing operation was repeated for 3 times, and an aqueous wet cake ( 4 ) of nickel microparticles obtained after the washing was prepared, and then, the aqueous wet cake ( 4 ) of nickel microparticles was dried at ⁇ 0.10 MpaG and 20° C. for 15 hours or more to obtain nickel microparticle powders.
- the content of water in the nickel microparticle powders was 42 ⁇ g/g. It is preferable to dry the nickel microparticle powders until the content of water therein becomes 1000 ⁇ g/g or less, preferably, 500 ⁇ g/g or less, and more preferably, 100 ⁇ g/g or less.
- Example 8 As a result of TEM observation of the nickel microparticle powders obtained in Example 8 made by the same method as in Comparative Example 1, the thin membranous substance observed on the surface of the nickel microparticles obtained in Comparative Example 1 was not observed. From the results of a simultaneous TG-DTA measurement of the nickel microparticle powders after the hydrogen peroxide processing, the weight loss rate in the measurement range was 0.989%. By thus subjecting nickel microparticles to hydrogen peroxide processing by an acetone solution containing hydrogen peroxide, the weight loss rate in the simultaneous TG-DTA measurement could be reduced as compared with Comparative Example 1. In addition, XRD measurement results of the nickel microparticle powders obtained in Example 8 are shown in FIG. 12(B) . As shown in FIG.
- Example 9 to Example 14 and Example 20 to Example 23 will be described later.
- the molar ratio of hydrogen peroxide to nickel microparticles when hydrogen peroxide processing was performed was changed by adjusting the weight ratio of hydrogen peroxide/water/acetone in the solution (ultrasonic disperser: 14.85 g, stirrer: 1485 g) to be used for the hydrogen peroxide processing relative to the nickel microparticle powders (ultrasonic disperser: 0.15 g, stirrer: 15 g) to be subjected to the hydrogen peroxide processing.
- Example 15 Explanation will be made as to Example 15 in which both of the acid processing and hydrogen peroxide processing mentioned above were applied to nickel microparticles.
- the nickel microparticles contained in the solution were settled, the supernatant solution was removed, and pure water 20 to 1500 times the weight of the nickel microparticles was added and the nickel microparticles were washed by the ultrasonic cleaner described above.
- the washing operation was repeated for 3 times, and an aqueous wet cake ( 5 ) of nickel microparticles obtained after the washing was prepared, and then, the aqueous wet cake ( 5 ) was dried at ⁇ 0.10 MpaG and 20° C. for 15 hours or more to obtain nickel microparticle powders.
- nickel microparticle powders 0.15 g was charged into 14.85 g of a solution obtained by mixing hydrogen peroxide/water/acetone at a weight ratio of 0.010/0.023/99.967 and stirred for 15 minutes with a processing temperature of 20° C. by the ultrasonic disperser described above to thereby perform hydrogen peroxide processing on the nickel microparticles.
- the nickel microparticles contained in the solution were settled, the supernatant solution was removed, and pure water 20 to 1500 times the weight of the nickel microparticles was added and washed the nickel microparticles by the ultrasonic cleaner.
- the washing operation was repeated for 3 times, and an aqueous wet cake ( 6 ) of nickel microparticles obtained after the washing was prepared, and then, the aqueous wet cake ( 6 ) was dried at ⁇ 0.10 MpaG and 20° C. for 15 hours or more to obtain nickel microparticle powders.
- the molar ratio of an acid to nickel microparticles when acid processing was performed was changed by adjusting the weight ratio of nitric acid/water/acetone in the solution (ultrasonic disperser: 14.85 g, stirrer: 1485 g) to be used for the acid processing relative to the nickel microparticle powders (ultrasonic disperser: 0.15 g, stirrer: 15 g) to be subjected to the acid processing, and the molar ratio of hydrogen peroxide to nickel microparticles when hydrogen peroxide processing was performed was changed by adjusting the weight ratio of hydrogen peroxide/water/acetone in the solution (ultrasonic disperser: 14.85 g, stirrer: 1485 g) to be used for the hydrogen peroxide processing relative to the nickel microparticle powders (ultrasonic disperser: 0.15 g, stirrer: 15 g) to be subjected to the hydrogen peroxide processing.
- XRD measurement results of the nickel microparticle powders obtained in Example 4 are shown in FIG. 12(D)
- XRD measurement results of the nickel microparticle powders obtained in Example 10 are shown in FIG. 12(E) .
- no peaks derived from nickel hydroxide were detected in the XRD measurement results, and even after storage for a month under an air atmosphere, no such substance that seemed to have separated as observed in the SEM picture of FIG. 6 was confirmed, and no peaks derived from nickel hydroxide were detected in the XRD measurement results.
- XRD measurement results of the nickel microparticle powders obtained in Example 17 are shown in FIG. 12 (F)
- XRD measurement results of the nickel microparticle powders obtained in Example 24 are shown in FIG. 12(G) .
- no peaks derived from nickel hydroxide were detected in the XRD measurement results, and even after storage for a month under an air atmosphere, no such substance that seemed to have separated as observed in the SEM picture of FIG. 6 was confirmed, and no peaks derived from nickel hydroxide were detected in the XRD measurement results.
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EP3903924A4 (de) * | 2018-12-26 | 2022-06-22 | M. Technique Co., Ltd. | Fluidbehandlungsvorrichtung |
CN116426951A (zh) * | 2023-03-17 | 2023-07-14 | 湘南学院 | 一种叶状阵列非晶相镍氧化物/镍泡沫电极及其制备方法和应用 |
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KR20220038023A (ko) * | 2019-07-31 | 2022-03-25 | 스미토모 긴조쿠 고잔 가부시키가이샤 | 니켈 분말, 니켈 분말의 제조 방법 |
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US7261761B2 (en) * | 2002-08-28 | 2007-08-28 | Toho Titanium Co., Ltd. | Metallic nickel powder and process for production thereof |
KR100709822B1 (ko) * | 2004-12-15 | 2007-04-23 | 삼성전기주식회사 | 산 용액을 이용한 니켈 입자의 표면 처리 방법 |
JP2009082902A (ja) * | 2007-07-06 | 2009-04-23 | M Technique Co Ltd | 強制超薄膜回転式処理法を用いたナノ粒子の製造方法 |
KR101378048B1 (ko) * | 2007-07-06 | 2014-03-27 | 엠. 테크닉 가부시키가이샤 | 금속 미립자의 제조 방법 및 그 금속 미립자를 함유하는 금속 콜로이드 용액 |
JP4737249B2 (ja) * | 2008-08-12 | 2011-07-27 | ソニー株式会社 | 薄膜の製造方法及びその装置、並びに電子装置の製造方法 |
JPWO2012014530A1 (ja) * | 2010-07-28 | 2013-09-12 | エム・テクニック株式会社 | 粒子径を制御された微粒子の製造方法 |
JP5213292B2 (ja) * | 2010-08-26 | 2013-06-19 | エム・テクニック株式会社 | 単離可能な酸化物微粒子または水酸化物微粒子の製造方法 |
JP5376483B1 (ja) * | 2012-09-12 | 2013-12-25 | エム・テクニック株式会社 | ニッケル微粒子の製造方法 |
EP2896475B1 (de) * | 2012-09-12 | 2017-11-22 | M Technique Co., Ltd. | Verfahren zur herstellung von nickelmikropartikeln |
JP6042747B2 (ja) * | 2013-02-26 | 2016-12-14 | 新日鉄住金化学株式会社 | ニッケル微粒子、その使用方法及びニッケル微粒子の製造方法 |
JP6082278B2 (ja) * | 2013-03-07 | 2017-02-15 | 新日鉄住金化学株式会社 | ニッケルナノ粒子の表面改質方法 |
-
2015
- 2015-05-15 KR KR1020167034179A patent/KR20180005589A/ko unknown
- 2015-05-15 JP JP2017518638A patent/JPWO2016185529A1/ja active Pending
- 2015-05-15 EP EP15892529.7A patent/EP3296040A4/de not_active Withdrawn
- 2015-05-15 WO PCT/JP2015/064107 patent/WO2016185529A1/ja active Application Filing
- 2015-05-15 CN CN201580012915.7A patent/CN106660115A/zh active Pending
- 2015-05-15 US US15/320,022 patent/US20170129008A1/en not_active Abandoned
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP3903924A4 (de) * | 2018-12-26 | 2022-06-22 | M. Technique Co., Ltd. | Fluidbehandlungsvorrichtung |
CN116426951A (zh) * | 2023-03-17 | 2023-07-14 | 湘南学院 | 一种叶状阵列非晶相镍氧化物/镍泡沫电极及其制备方法和应用 |
Also Published As
Publication number | Publication date |
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JPWO2016185529A1 (ja) | 2018-03-01 |
EP3296040A1 (de) | 2018-03-21 |
CN106660115A (zh) | 2017-05-10 |
EP3296040A4 (de) | 2019-01-23 |
WO2016185529A1 (ja) | 2016-11-24 |
KR20180005589A (ko) | 2018-01-16 |
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