US20170045051A1 - Pumping method in a system for pumping and system of vacuum pumps - Google Patents

Pumping method in a system for pumping and system of vacuum pumps Download PDF

Info

Publication number
US20170045051A1
US20170045051A1 US15/306,175 US201415306175A US2017045051A1 US 20170045051 A1 US20170045051 A1 US 20170045051A1 US 201415306175 A US201415306175 A US 201415306175A US 2017045051 A1 US2017045051 A1 US 2017045051A1
Authority
US
United States
Prior art keywords
ejector
rotary vane
vacuum pump
lubricated rotary
return valve
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
US15/306,175
Other languages
English (en)
Inventor
Didier Müller
Jean-Eric Larcher
Théodore Iltchev
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ateliers Busch SA
Original Assignee
Ateliers Busch SA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ateliers Busch SA filed Critical Ateliers Busch SA
Assigned to ATELIERS BUSCH SA reassignment ATELIERS BUSCH SA ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). Assignors: ILTCHEV, Théodore, LARCHER, JEAN-ERIC, MÜLLER, Didier
Publication of US20170045051A1 publication Critical patent/US20170045051A1/en
Abandoned legal-status Critical Current

Links

Images

Classifications

    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04C—ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT PUMPS
    • F04C23/00—Combinations of two or more pumps, each being of rotary-piston or oscillating-piston type, specially adapted for elastic fluids; Pumping installations specially adapted for elastic fluids; Multi-stage pumps specially adapted for elastic fluids
    • F04C23/005—Combinations of two or more pumps, each being of rotary-piston or oscillating-piston type, specially adapted for elastic fluids; Pumping installations specially adapted for elastic fluids; Multi-stage pumps specially adapted for elastic fluids of dissimilar working principle
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04B—POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS
    • F04B37/00—Pumps having pertinent characteristics not provided for in, or of interest apart from, groups F04B25/00 - F04B35/00
    • F04B37/10—Pumps having pertinent characteristics not provided for in, or of interest apart from, groups F04B25/00 - F04B35/00 for special use
    • F04B37/14—Pumps having pertinent characteristics not provided for in, or of interest apart from, groups F04B25/00 - F04B35/00 for special use to obtain high vacuum
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04C—ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT PUMPS
    • F04C18/00—Rotary-piston pumps specially adapted for elastic fluids
    • F04C18/30—Rotary-piston pumps specially adapted for elastic fluids having the characteristics covered by two or more of groups F04C18/02, F04C18/08, F04C18/22, F04C18/24, F04C18/48, or having the characteristics covered by one of these groups together with some other type of movement between co-operating members
    • F04C18/34—Rotary-piston pumps specially adapted for elastic fluids having the characteristics covered by two or more of groups F04C18/02, F04C18/08, F04C18/22, F04C18/24, F04C18/48, or having the characteristics covered by one of these groups together with some other type of movement between co-operating members having the movement defined in group F04C18/08 or F04C18/22 and relative reciprocation between the co-operating members
    • F04C18/344—Rotary-piston pumps specially adapted for elastic fluids having the characteristics covered by two or more of groups F04C18/02, F04C18/08, F04C18/22, F04C18/24, F04C18/48, or having the characteristics covered by one of these groups together with some other type of movement between co-operating members having the movement defined in group F04C18/08 or F04C18/22 and relative reciprocation between the co-operating members with vanes reciprocating with respect to the inner member
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04C—ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT PUMPS
    • F04C25/00—Adaptations of pumps for special use of pumps for elastic fluids
    • F04C25/02—Adaptations of pumps for special use of pumps for elastic fluids for producing high vacuum
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04C—ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT PUMPS
    • F04C28/00—Control of, monitoring of, or safety arrangements for, pumps or pumping installations specially adapted for elastic fluids
    • F04C28/06—Control of, monitoring of, or safety arrangements for, pumps or pumping installations specially adapted for elastic fluids specially adapted for stopping, starting, idling or no-load operation
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04C—ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT PUMPS
    • F04C29/00—Component parts, details or accessories of pumps or pumping installations, not provided for in groups F04C18/00 - F04C28/00
    • F04C29/0021—Systems for the equilibration of forces acting on the pump
    • F04C29/0028—Internal leakage control
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04C—ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT PUMPS
    • F04C29/00—Component parts, details or accessories of pumps or pumping installations, not provided for in groups F04C18/00 - F04C28/00
    • F04C29/02—Lubrication; Lubricant separation
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04F—PUMPING OF FLUID BY DIRECT CONTACT OF ANOTHER FLUID OR BY USING INERTIA OF FLUID TO BE PUMPED; SIPHONS
    • F04F5/00—Jet pumps, i.e. devices in which flow is induced by pressure drop caused by velocity of another fluid flow
    • F04F5/14—Jet pumps, i.e. devices in which flow is induced by pressure drop caused by velocity of another fluid flow the inducing fluid being elastic fluid
    • F04F5/16—Jet pumps, i.e. devices in which flow is induced by pressure drop caused by velocity of another fluid flow the inducing fluid being elastic fluid displacing elastic fluids
    • F04F5/20—Jet pumps, i.e. devices in which flow is induced by pressure drop caused by velocity of another fluid flow the inducing fluid being elastic fluid displacing elastic fluids for evacuating
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04F—PUMPING OF FLUID BY DIRECT CONTACT OF ANOTHER FLUID OR BY USING INERTIA OF FLUID TO BE PUMPED; SIPHONS
    • F04F5/00—Jet pumps, i.e. devices in which flow is induced by pressure drop caused by velocity of another fluid flow
    • F04F5/54—Installations characterised by use of jet pumps, e.g. combinations of two or more jet pumps of different type

Definitions

  • the present invention relates to a pumping method making it possible to reduce the consumption of electrical energy as well as improve the performance in terms of flow rate and final vacuum in a pumping system in which the main pump is a lubricated rotary vane vacuum pump.
  • the invention likewise relates to a pumping system which can be used to achieve the method according to the present invention.
  • the present invention has as object to propose a pumping method in a pumping system making it possible to reduce the electrical energy necessary for putting a chamber under vacuum and for maintaining the vacuum in this chamber, as well as to achieve a decrease in the temperature of the exit gas.
  • the present invention also has as object to propose a pumping method in a pumping system making it possible to obtain a higher flow rate at low pressure than that which can be obtained with the aid of a single lubricated rotary vane vacuum pump during the pumping of a vacuum chamber.
  • the present invention likewise has as object to propose a pumping method in a pumping system making it possible to obtain a better vacuum than that which can be obtained with the aid of a single lubricated rotary vane vacuum pump in a vacuum chamber.
  • a pumping method which is achieved within the framework of a pumping system, the configuration of which consists essentially of a primary lubricated rotary vane vacuum pump equipped with a gas inlet port connected to a vacuum chamber and with a gas outlet port leading into a conduit which is equipped with a non-return valve before coming out into the atmosphere or into other apparatuses.
  • the suction end of an ejector is connected in parallel to this non-return valve, its exit going into the atmosphere or rejoining the conduit of the primary pump after the non-return valve.
  • the method consists essentially of feeding the ejector with working fluid and making it operate continuously all the while that the primary lubricated rotary vane vacuum pump pumps the gases contained in the vacuum chamber through the gas inlet port, but also all the while that the primary lubricated rotary vane vacuum pump maintains a defined pressure (for example the final vacuum) in the chamber by discharging the gases rising through its outlet.
  • a defined pressure for example the final vacuum
  • the invention resides in the fact that the coupling of the primary lubricated rotary vane vacuum pump and of the ejector does not require measurements and specific devices (for example sensors for pressure, temperature, current, etc.), servo-controls or data management and calculation. Consequently, the pumping system suitable for implementing the pumping method according to the present invention comprises a minimal number of components, has great simplicity and is far less expensive than the existing systems.
  • the ejector integrated in the pumping system can always operate without damage according to the present pumping method. Its dimensioning is determined by a minimal consumption of working fluid for the operation of the device. It is normally single-staged. Its nominal flow rate is selected depending upon the volume of the exit conduit of the primary lubricated rotary vane vacuum pump, limited by the non-return valve. This flow rate can be 1/500 to 1/20 of the nominal flow rate of the primary lubricated rotary vane vacuum pump, but can also be less or greater than these values.
  • the working fluid for the ejector can be compressed air, but also other gases, for example nitrogen.
  • the non-return valve, placed in the conduit at the outlet of the primary lubricated rotary vane vacuum pump can be a commercially available standard element. It is dimensioned according to the nominal flow rate of the primary lubricated rotary vane vacuum pump. In particular, it is foreseen that the non-return valve closes when the pressure at the suction end of the primary lubricated rotary vane vacuum pump is between 500 mbar absolute and the final vacuum (for example 100 mbar).
  • the ejector is multi-staged.
  • the ejector can be made of material having chemical resistance to substances and gases commonly used in the chemical industry and the semi-conductor industry, just as well in the single-staged ejector variant as in that of the multi-staged ejector.
  • the ejector is preferably of small size.
  • the ejector is integrated in a cartridge which incorporates the non-return valve.
  • the ejector is integrated in a cartridge which incorporates the non-return valve and this cartridge itself is accommodated in the oil separator of the primary lubricated rotary vane vacuum pump.
  • the flow rate of gas at the pressure necessary for the operation of the ejector is controlled in an “all or nothing” way.
  • the controlling consists in measuring one or more parameters and in putting the ejector into operation or stopping it, depending upon certain predefined rules.
  • the parameters provided by suitable sensors, are, for example, the motor current of the lubricated rotary vane vacuum pump, the temperature or the pressure of the gases in the space of the exit conduit of the primary lubricated rotary vane vacuum pump, limited by the non-return valve, or a combination of these parameters.
  • the pressure there is elevated for example equal to the atmospheric pressure.
  • the pressure of the gases discharged at its outlet is higher than the atmospheric pressure (if the gases at the outlet of the primary pump are discharged directly into the atmosphere) or higher than the pressure at the inlet of another apparatus connected downstream. This causes the opening of the non-return valve.
  • This slight difference reduces the internal leaks in the primary lubricated rotary vane vacuum pump and causes at the same time a reduction of the pressure in the chamber, which makes it possible to improve the final vacuum.
  • the primary lubricated rotary vane vacuum pump consumes less and less energy for the compression and produces less and less compression heat.
  • the ejector In the case of controlling of the ejector, there exists an initial position for start-up of the pumping system when the sensors are in a defined state or give initial values.
  • the primary lubricated rotary vane vacuum pump pumps the gases of the vacuum chamber, the parameters such as the current of its motor, the temperature and the pressure of the gases in the space of the exit conduit begin to change and reach threshold values detected by the sensors. This causes the switching on of the ejector.
  • these parameters return to the initial ranges (outside the set values) with a time lag, the ejector is stopped.
  • the flow of gas at the pressure necessary for the operation of the ejector is provided by a compressor.
  • this compressor can be driven by the primary lubricated rotary vane pump or, alternatively or in addition, in an autonomous way, independently of the primary lubricated rotary vane pump.
  • This compressor can suction the atmospheric air or gases in the gas exit conduit after the non-return valve. The presence of such a compressor renders the lubricated rotary vane vacuum pump systems independent of a compressed gas source, which can meet the demands of certain industrial environments.
  • the compressor can provide the flow of gas at the pressure necessary for the operation of a plurality of ejectors, respectively forming part of a plurality of vacuum pump systems having as primary pumps lubricated rotary vane pumps.
  • the compressor forms part of the system also in the case of continuous operation of the ejector as well as in the case of its controlling according to the parameters, controlled by suitable sensors.
  • FIG. 1 represents in a diagrammatic way a pumping system suitable for implementation of a pumping method according to a first embodiment of the present invention
  • FIG. 2 represents in a diagrammatic way a pumping system suitable for implementation of a pumping method according to a second embodiment of the present invention.
  • FIG. 3 represents in a diagrammatic way a pumping system suitable for implementation of a pumping method according to a third embodiment of the present invention.
  • FIG. 1 represents a pumping system SP suitable for implementing a pumping method according to a first embodiment of the present invention.
  • This pumping system SP comprises a chamber 1 , which is connected to a suction port 2 of a primary lubricated rotary vane vacuum pump 3 .
  • the gas outlet port of the primary lubricated rotary vane vacuum pump 3 is connected to a conduit 5 .
  • a non-return discharge valve 6 is placed in the conduit 5 , which after this non-return valve 6 continues into a gas exit conduit 8 .
  • the non-return valve 6 when it is closed, allows the formation of a space 4 , contained between the gas outlet port of the primary vacuum pump 3 and itself.
  • the pumping system SP also comprises an ejector 7 , connected in parallel to the non-return valve 6 .
  • the suction port of the ejector is connected to the space 4 of the conduit 5 , and its discharge port is connected to the conduit 8 .
  • the feed conduit 9 provides the working fluid for the ejector 7 .
  • the working fluid for the ejector 7 is injected through the feed conduit 9 .
  • the primary lubricated rotary vane vacuum pump 3 suctions the gases in the chamber 1 through the port 2 connected at its inlet and compresses them to discharge them afterwards at its outlet in the conduit 5 through the non-return valve 6 .
  • the closure pressure for the non-return valve 6 is reached, it closes.
  • the pumping of the ejector 7 makes the pressure in the space 4 decrease progressively to the value of its limit pressure.
  • the power consumed by the primary lubricated rotary vane vacuum pump 3 decreases progressively. This takes place in a short time period, for example for a certain cycle in 5 to 10 seconds.
  • FIG. 2 represents a pumping system SP suitable for implementation of a pumping method according to a second embodiment of the present invention.
  • the system represented in FIG. 2 further comprises a compressor 10 which provides the flow of gas at the pressure necessary for the operation of the ejector 7 .
  • this compressor 10 can suction the atmospheric air or gases in the gas exit 8 after the non-return valve 6 . Its presence renders the pumping system independent of a compressed gas source, which can meet the demands of certain industrial environments.
  • the compressor 10 can be driven by the primary lubricated rotary vane pump 3 or by its own electric motor, thus in a manner completely independent from the pump 3 . In all cases the consumption of energy of the compressor 10 when it provides the flow of gas at the pressure necessary in order to make the ejector 7 operate is substantially smaller compared with the benefit achieved in the consumption of energy of the main pump 3 .
  • FIG. 3 represents a system of vacuum pumps SPP suitable for implementing a pumping method according to a third embodiment of the present invention.
  • the system represented in FIG. 3 corresponds to a controlled pumping system, which further comprises sensors 11 , 12 , 13 which control, for example, the motor current (sensor 11 ) of the primary lubricated rotary vane vacuum pump 3 , the pressure (sensor 13 ) of gases in the space of the exit conduit of the primary lubricated rotary vane vacuum pump (limited by the non-return valve 6 ), the temperature (sensor 12 ) of gases in the space of the exit conduit of the primary lubricated rotary vane vacuum pump (limited by the non-return valve 6 ) or a combination of these parameters.
  • sensors 11 , 12 , 13 which control, for example, the motor current (sensor 11 ) of the primary lubricated rotary vane vacuum pump 3 , the pressure (sensor 13 ) of gases in the space of the exit conduit of the primary lubricated rotary vane vacuum pump (limited by the non-return valve 6 ), the temperature (sensor 12 ) of gases in the space of the exit conduit of the primary lubricated rotary
  • these cited parameters in particular the current of its motor, the temperature and the pressure of gases in the space of the exit conduit 4 .
  • the ejector is stopped (again after a certain time lag).
  • the controlled pumping system SSP can have as compressed gas source a supply network or a compressor 10 in the conditions described in FIG. 2 .

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • General Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Fluid Mechanics (AREA)
  • Applications Or Details Of Rotary Compressors (AREA)
  • Jet Pumps And Other Pumps (AREA)
  • Compressors, Vaccum Pumps And Other Relevant Systems (AREA)
US15/306,175 2014-05-01 2014-05-01 Pumping method in a system for pumping and system of vacuum pumps Abandoned US20170045051A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/EP2014/058948 WO2015165544A1 (fr) 2014-05-01 2014-05-01 Méthode de pompage dans un système de pompage et système de pompes à vide

Publications (1)

Publication Number Publication Date
US20170045051A1 true US20170045051A1 (en) 2017-02-16

Family

ID=50639522

Family Applications (1)

Application Number Title Priority Date Filing Date
US15/306,175 Abandoned US20170045051A1 (en) 2014-05-01 2014-05-01 Pumping method in a system for pumping and system of vacuum pumps

Country Status (15)

Country Link
US (1) US20170045051A1 (fr)
EP (1) EP3137771B1 (fr)
JP (1) JP6410836B2 (fr)
KR (1) KR102235562B1 (fr)
CN (1) CN106255828A (fr)
AU (1) AU2014392229B2 (fr)
BR (1) BR112016024380B1 (fr)
CA (1) CA2944825C (fr)
DK (1) DK3137771T3 (fr)
ES (1) ES2797400T3 (fr)
PL (1) PL3137771T3 (fr)
PT (1) PT3137771T (fr)
RU (1) RU2666379C2 (fr)
TW (1) TWI698585B (fr)
WO (1) WO2015165544A1 (fr)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20170089339A1 (en) * 2014-03-24 2017-03-30 Ateliers Busch Sa Pumping method in a system of vacuum pumps and system of vacuum pumps

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR3094762B1 (fr) * 2019-04-05 2021-04-09 Pfeiffer Vacuum Pompe à vide de type sèche et installation de pompage
CN113621936A (zh) * 2021-10-12 2021-11-09 陛通半导体设备(苏州)有限公司 一种真空镀膜中真空泵系统的工作方法及真空泵系统

Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4426450A (en) * 1981-08-24 1984-01-17 Fermentec Corporation Fermentation process and apparatus
US4921406A (en) * 1987-06-30 1990-05-01 Alcatel Hochvakuumtechnik Gmbh Mechanical primary vacuum pump including a spring-loaded non-return flap valve
US20050268644A1 (en) * 2004-02-18 2005-12-08 Denso Corporation Vapor compression cycle having ejector
US20060086649A1 (en) * 2004-10-26 2006-04-27 Wieczorek Mark T Automatic water drain for suction fuel water separators
US20080166247A1 (en) * 2005-02-26 2008-07-10 Michael Holzemer Single-Shaft Vacuum Positive Displacement Pump
US20110263406A1 (en) * 2008-11-14 2011-10-27 Mann+Hummel Gmbh Centrifugal separator with venturi arrangement
US20120080134A1 (en) * 2005-01-20 2012-04-05 Jaime Leonard Harris Eductor assembly with dual-material eductor body
US20120219443A1 (en) * 2009-11-18 2012-08-30 Adixen Vacuum Products Method And Device For Pumping With Reduced Power Use

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS52128885A (en) * 1976-04-22 1977-10-28 Fujitsu Ltd Treatment in gas phase
SU1700283A1 (ru) * 1989-05-05 1991-12-23 Предприятие П/Я А-3634 Вакуумный насос
JPH08178438A (ja) * 1994-12-21 1996-07-12 Yanmar Diesel Engine Co Ltd エンジンヒートポンプ
US5848538A (en) * 1997-11-06 1998-12-15 American Standard Inc. Oil and refrigerant pump for centrifugal chiller
KR100876318B1 (ko) * 2001-09-06 2008-12-31 가부시키가이샤 아루박 진공배기장치 및 진공배기장치의 운전방법
US6589023B2 (en) * 2001-10-09 2003-07-08 Applied Materials, Inc. Device and method for reducing vacuum pump energy consumption
SE0201335L (sv) * 2002-05-03 2003-03-25 Piab Ab Vakuumpump och sätt att tillhandahålla undertryck
JP4745779B2 (ja) * 2005-10-03 2011-08-10 神港精機株式会社 真空装置
DE102008019472A1 (de) * 2008-04-17 2009-10-22 Oerlikon Leybold Vacuum Gmbh Vakuumpumpe
JP5389419B2 (ja) * 2008-11-14 2014-01-15 株式会社テイエルブイ 真空ポンプ装置
GB201007814D0 (en) * 2010-05-11 2010-06-23 Edwards Ltd Vacuum pumping system
US20120261011A1 (en) * 2011-04-14 2012-10-18 Young Man Cho Energy reduction module using a depressurizing vacuum apparatus for vacuum pump
FR2993614B1 (fr) * 2012-07-19 2018-06-15 Pfeiffer Vacuum Procede et dispositif de pompage d'une chambre de procedes

Patent Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4426450A (en) * 1981-08-24 1984-01-17 Fermentec Corporation Fermentation process and apparatus
US4921406A (en) * 1987-06-30 1990-05-01 Alcatel Hochvakuumtechnik Gmbh Mechanical primary vacuum pump including a spring-loaded non-return flap valve
US20050268644A1 (en) * 2004-02-18 2005-12-08 Denso Corporation Vapor compression cycle having ejector
US20060086649A1 (en) * 2004-10-26 2006-04-27 Wieczorek Mark T Automatic water drain for suction fuel water separators
US20120080134A1 (en) * 2005-01-20 2012-04-05 Jaime Leonard Harris Eductor assembly with dual-material eductor body
US20080166247A1 (en) * 2005-02-26 2008-07-10 Michael Holzemer Single-Shaft Vacuum Positive Displacement Pump
US20110263406A1 (en) * 2008-11-14 2011-10-27 Mann+Hummel Gmbh Centrifugal separator with venturi arrangement
US20120219443A1 (en) * 2009-11-18 2012-08-30 Adixen Vacuum Products Method And Device For Pumping With Reduced Power Use

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20170089339A1 (en) * 2014-03-24 2017-03-30 Ateliers Busch Sa Pumping method in a system of vacuum pumps and system of vacuum pumps
US10260502B2 (en) * 2014-03-24 2019-04-16 Ateliers Busch Sa Pumping method in a system of vacuum pumps and system of vacuum pumps

Also Published As

Publication number Publication date
RU2016142607A3 (fr) 2018-06-01
BR112016024380A2 (pt) 2017-08-15
TW201608134A (zh) 2016-03-01
CA2944825A1 (fr) 2015-11-05
ES2797400T3 (es) 2020-12-02
DK3137771T3 (da) 2020-06-08
TWI698585B (zh) 2020-07-11
JP2017515031A (ja) 2017-06-08
AU2014392229A1 (en) 2016-11-03
PL3137771T3 (pl) 2020-10-05
RU2666379C2 (ru) 2018-09-07
AU2014392229B2 (en) 2018-11-22
RU2016142607A (ru) 2018-06-01
EP3137771A1 (fr) 2017-03-08
CN106255828A (zh) 2016-12-21
WO2015165544A1 (fr) 2015-11-05
BR112016024380B1 (pt) 2022-06-28
JP6410836B2 (ja) 2018-10-24
CA2944825C (fr) 2021-04-27
KR102235562B1 (ko) 2021-04-05
EP3137771B1 (fr) 2020-05-06
PT3137771T (pt) 2020-05-29
KR20170005410A (ko) 2017-01-13

Similar Documents

Publication Publication Date Title
US11725662B2 (en) Method of pumping in a system of vacuum pumps and system of vacuum pumps
US10808730B2 (en) Pumping system for generating a vacuum and method for pumping by means of this pumping system
AU2014392229B2 (en) Method of pumping in a pumping system and vacuum pump system
AU2014406724B2 (en) Vacuum-generating pumping system and pumping method using this pumping system
US10260502B2 (en) Pumping method in a system of vacuum pumps and system of vacuum pumps

Legal Events

Date Code Title Description
AS Assignment

Owner name: ATELIERS BUSCH SA, SWITZERLAND

Free format text: ASSIGNMENT OF ASSIGNORS INTEREST;ASSIGNORS:MUELLER, DIDIER;LARCHER, JEAN-ERIC;ILTCHEV, THEODORE;REEL/FRAME:040900/0158

Effective date: 20161214

STPP Information on status: patent application and granting procedure in general

Free format text: FINAL REJECTION MAILED

STPP Information on status: patent application and granting procedure in general

Free format text: RESPONSE AFTER FINAL ACTION FORWARDED TO EXAMINER

STPP Information on status: patent application and granting procedure in general

Free format text: ADVISORY ACTION MAILED

STPP Information on status: patent application and granting procedure in general

Free format text: DOCKETED NEW CASE - READY FOR EXAMINATION

STCB Information on status: application discontinuation

Free format text: ABANDONED -- FAILURE TO RESPOND TO AN OFFICE ACTION