US20150068399A1 - Device and Method for Evacuating a Chamber and Purifying the Gas Extracted From Said Chamber - Google Patents

Device and Method for Evacuating a Chamber and Purifying the Gas Extracted From Said Chamber Download PDF

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Publication number
US20150068399A1
US20150068399A1 US14/364,802 US201214364802A US2015068399A1 US 20150068399 A1 US20150068399 A1 US 20150068399A1 US 201214364802 A US201214364802 A US 201214364802A US 2015068399 A1 US2015068399 A1 US 2015068399A1
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US
United States
Prior art keywords
vacuum pump
pressure
gas
dry
outlet
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
US14/364,802
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English (en)
Inventor
Heiner Kösters
Uwe Gottschlich
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sterling Industry Consult GmbH
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Sterling Industry Consult GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
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Assigned to STERLING INDUSTRY CONSULT GMBH reassignment STERLING INDUSTRY CONSULT GMBH ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). Assignors: GOTTSCHLICH, UWE, KOSTERS, HEINER
Publication of US20150068399A1 publication Critical patent/US20150068399A1/en
Abandoned legal-status Critical Current

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Classifications

    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04C—ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT PUMPS
    • F04C19/00—Rotary-piston pumps with fluid ring or the like, specially adapted for elastic fluids
    • F04C19/004—Details concerning the operating liquid, e.g. nature, separation, cooling, cleaning, control of the supply
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D47/00—Separating dispersed particles from gases, air or vapours by liquid as separating agent
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04C—ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT PUMPS
    • F04C23/00—Combinations of two or more pumps, each being of rotary-piston or oscillating-piston type, specially adapted for elastic fluids; Pumping installations specially adapted for elastic fluids; Multi-stage pumps specially adapted for elastic fluids
    • F04C23/005—Combinations of two or more pumps, each being of rotary-piston or oscillating-piston type, specially adapted for elastic fluids; Pumping installations specially adapted for elastic fluids; Multi-stage pumps specially adapted for elastic fluids of dissimilar working principle
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04C—ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT PUMPS
    • F04C25/00—Adaptations of pumps for special use of pumps for elastic fluids
    • F04C25/02—Adaptations of pumps for special use of pumps for elastic fluids for producing high vacuum
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04C—ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT PUMPS
    • F04C18/00—Rotary-piston pumps specially adapted for elastic fluids
    • F04C18/08—Rotary-piston pumps specially adapted for elastic fluids of intermeshing-engagement type, i.e. with engagement of co-operating members similar to that of toothed gearing
    • F04C18/12—Rotary-piston pumps specially adapted for elastic fluids of intermeshing-engagement type, i.e. with engagement of co-operating members similar to that of toothed gearing of other than internal-axis type
    • F04C18/14—Rotary-piston pumps specially adapted for elastic fluids of intermeshing-engagement type, i.e. with engagement of co-operating members similar to that of toothed gearing of other than internal-axis type with toothed rotary pistons
    • F04C18/16—Rotary-piston pumps specially adapted for elastic fluids of intermeshing-engagement type, i.e. with engagement of co-operating members similar to that of toothed gearing of other than internal-axis type with toothed rotary pistons with helical teeth, e.g. chevron-shaped, screw type
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04C—ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT PUMPS
    • F04C2220/00—Application
    • F04C2220/10—Vacuum
    • F04C2220/12—Dry running
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04C—ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT PUMPS
    • F04C2240/00—Components
    • F04C2240/80—Other components
    • F04C2240/81—Sensor, e.g. electronic sensor for control or monitoring
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04C—ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT PUMPS
    • F04C2280/00—Arrangements for preventing or removing deposits or corrosion
    • F04C2280/02—Preventing solid deposits in pumps, e.g. in vacuum pumps with chemical vapour deposition [CVD] processes

Definitions

  • the invention relates to a device by means of which a chamber can be evacuated and the gas that is extracted from the chamber can be purified of entrained foreign substances.
  • the device comprises a dry-compression vacuum pump, the inlet of which is connected to the chamber to be evacuated.
  • the vacuum pump is suitable for keeping the inlet pressure constant despite variable conditions at the outlet, in particular despite variable pressure at the outlet.
  • the invention also relates to a corresponding method.
  • Such devices may be used for example in deposition processes, such as, for example, CVD (Chemical Vapor Deposition) processes.
  • CVD processes are utilized in many industrial sectors to produce coatings on different substrates at reduced pressure.
  • gaseous metal compounds are converted into the desired coating system on the substrate surface at high temperatures and/or with plasma assistance.
  • the relatively high gas pressures that can be realized permit high growth rates and have thus become widely used in all sectors of vacuum coating technology.
  • a disadvantage of said high growth rates is that the deposition reactions take place not only on the substrate, but also in all regions of the coating installation. This applies not only to the process chamber walls, but also to the lines and devices between the process chamber and the outlet for the waste gases.
  • the gaseous outlet and intermediate products are generally toxic and corrosive, and such CVD installations are thus always also equipped with a corresponding waste-gas treatment arrangement.
  • etching processes are performed between the process steps, which etching processes convert the deposits in the process chamber into easily evaporable substances.
  • a typical representative of said substances is ammonium chloride which tends to repeatedly build up on the walls further along the line. This applies in particular to the vacuum pump and to the pressure side of the vacuum pump, because here, in accordance with the law of continuity, the volume flow rate decreases significantly and thus makes it possible for the solid substances to build up.
  • a pump is suitable for keeping the inlet pressure constant despite variable conditions at the outlet only if the pump comprises a multiplicity of working chambers arranged in series. The inlet and outlet are then separated from one another by a multiplicity of sealing gaps.
  • An example of a pump which can perform this task is a screw-type vacuum pump.
  • An example of a pump which is not suitable for keeping the inlet pressure constant despite variable conditions at the outlet is a Roots-type pump.
  • Roots-type pumps are thus typically used as forepumps in an arrangement comprising multiple pumps.
  • a liquid ring vacuum pump is connected to the outlet of the dry-compression vacuum pump via an intermediate line.
  • the liquid ring vacuum pump would not be suitable for being directly connected to the chamber to be evacuated, for two reasons. Firstly, the liquid ring vacuum pump cannot generate a vacuum lower than the vapor pressure of the operating liquid. A lower pressure is, however, often required in the chamber to be evacuated. Secondly, a vapor partial pressure can escape from the operating liquid of the liquid ring vacuum pump in the direction of the suction side. This is not acceptable, because it must be possible to maintain defined conditions in the chamber to be evacuated.
  • an atmosphere prevails in which the solid substances are dissolved in the gas.
  • the pressure of the gas it is firstly necessary for the pressure of the gas to be kept low, and it is secondly necessary for the volume flow rate to be kept high, such that the gas moves at an adequate speed.
  • the dry-compression vacuum pump is used to increase the pressure, but to a value that is still considerably lower than atmospheric pressure.
  • the pressure is low enough, and the speed high enough, that condensation does not yet take place.
  • Condensation occurs for the first time in the liquid ring vacuum pump.
  • the substances can however be immediately absorbed by the operating liquid of the liquid ring vacuum pump and transported away, such that as a result, undesired deposits do not form.
  • the expression “condensation” encompasses in particular a situation in which a substance changes directly from the gaseous phase into the solid phase. A further waste-gas scrubber downstream of the liquid ring vacuum pump is not required in the device.
  • the pressure at the inlet side of the dry-compression vacuum pump may for example lie between 1 mbar and 40 mbar, preferably between 2 mbar and 30 mbar, and more preferably between 5 mbar and 20 mbar.
  • the pressure in the intermediate line may for example lie between 80 mbar and 300 mbar, preferably between 100 mbar and 150 mbar.
  • a further possibility for counteracting the condensation resides in a scavenging gas being fed in at the outlet of the dry-compression vacuum pump and/or in the intermediate line. Feeding the scavenging gas in said region has the advantage that a considerable increase in the volume flow rate, and thus speed, can be achieved with a small amount of gas.
  • the opening for the feed of the scavenging gas may be a suitably arranged valve. It is also possible for the scavenging gas to be fed through an opening which is formed in the dry-compression vacuum pump between a shaft and the housing and which must be sealed off in any case. In this case, the scavenging gas can simultaneously serve as barrier gas of the dry-compression vacuum pump.
  • the liquid ring vacuum pump is preferably provided with an inlet and an outlet for the operating liquid. Said inlet and outlet are furthermore preferably designed so as to permit an inflow and an outflow of the operating liquid during the operation of the pump. This is desirable in order that operating liquid that has been enriched with foreign substances can be replaced with fresh operating liquid.
  • the pump may be designed such that the housing of the liquid ring vacuum pump is provided with an inlet opening for the inflow of the operating liquid and with an outlet opening for the outflow of the operating liquid. Configurations are also possible in which the operating liquid initially emerges from the pump through the same outlet as the gas flow. The operating liquid can be separated from the gas flow in the subsequent line.
  • the liquid that is discharged from the liquid ring vacuum pump may be disposed of and replaced with a corresponding amount of fresh liquid. Also conceivable is a circuit in which the liquid discharged from the liquid ring vacuum pump is partially or entirely fed back to the pump. Provision may also be made for the heat of compression to be dissipated by means of an installed heat exchanger.
  • the operating liquid it is desirable for the operating liquid to be disposed of only when it has become sufficiently enriched with foreign substances.
  • the content of foreign substances can be inferred from the conductivity.
  • the sensor may be arranged for example on the liquid ring vacuum pump or on a line or on a vessel through which the operating liquid is conducted.
  • the device may be designed such that operating liquid is fed in and discharged only in required amounts in a manner dependent on the content of foreign substances.
  • the operating liquid may be water. It is also possible for the operating liquid to contain a solvent which is coordinated with the foreign substances contained in the gas. Such a solvent can contribute to particularly effective purification of the gas.
  • the operating liquid may correspondingly be opposingly alkaline or acidic.
  • a pH sensor may be provided in order to determine the pH value of the operating liquid.
  • a control device may be provided which adjusts the pH value as a function of the measurement values from the pH sensor. This may be realized, for example, by virtue of water being added to the operating liquid if it is sought merely to neutralize the operating liquid. It is also possible for an acid or an alkaline solution to be fed to the operating liquid if the pH value is to be adjusted in the corresponding direction.
  • a combustion device may be provided which is preferably arranged in the intermediate line.
  • Said combustion device may operate with thermal combustion, that is to say with a flame fed with natural gas, for example, which flame is brought into contact with the gas.
  • a catalytic combustion in which the gas is brought into contact with a heated surface composed of a catalytic material.
  • the invention also relates to a method for evacuating a chamber and for purifying the gas that is extracted from the chamber of entrained foreign substances.
  • gas is drawn out of the chamber by suction.
  • the pressure is increased to a value below atmospheric pressure, wherein a pump is used which is suitable for keeping the inlet pressure constant even if the outlet pressure is variable.
  • the gas is conducted onward to a liquid ring vacuum pump which outputs the gas at atmospheric pressure.
  • the pressure and the volume flow rate of the gas that is conducted onward to the liquid ring vacuum pump are set such that condensation of the foreign substances does not yet take place.
  • the foreign substances condense for the first time in the liquid ring vacuum pump, and are absorbed by the operating liquid in the latter and discharged.
  • the method may be refined with further features that have been described above with reference to the device.
  • FIG. 1 shows an embodiment of the device.
  • a process chamber of a CVD process forms the chamber 14 to be evacuated.
  • the inlet 17 of a screw-type vacuum pump 15 is connected to the chamber 14 to be evacuated.
  • a pressure reduction valve 16 is arranged in the line between the chamber 14 to be evacuated and the screw-type vacuum pump 15 , by means of which pressure reduction valve the pressure in the chamber 14 can be set to be higher than the pressure at the inlet 17 of the screw-type vacuum pump 15 .
  • a pressure of 80 mbar prevails in the chamber 14
  • a pressure of 20 mbar prevails at the inlet 17 of the screw-type vacuum pump 15 .
  • the screw-type vacuum pump 15 has the task of keeping the pressure at the inlet 17 constant even if the conditions at the outlet 18 of the screw-type vacuum pump 15 vary. By means of the screw-type vacuum pump 15 , the gas is compressed to a pressure of approximately 120 mbar and output via the outlet 18 .
  • the outlet 18 of the screw-type vacuum pump 15 is adjoined by an intermediate line 19 which leads to a liquid ring vacuum pump 20 .
  • the liquid ring vacuum pump 20 compresses the gas further such that it can be output at atmospheric pressure via the outlet 21 .
  • the screw-type vacuum pump 15 and the liquid ring vacuum pump 20 are coordinated with one another such that, in the intermediate line 19 , the pressure of the gas is low enough, and the volume flow rate high enough, that no condensation of the foreign substances entrained by the gas takes place therein. Condensation occurs the first time as a result of the further pressure rise in the liquid ring vacuum pump 20 . The foreign substances are then immediately absorbed by the operating liquid of the liquid ring vacuum pump 20 and consequently cannot be deposited on elements of the device.
  • a valve 22 via which air from the environment can be admitted, as scavenging gas, into the intermediate line 19 .
  • scavenging gas By virtue of scavenging gas being admitted at this location, a small volume of scavenging gas is sufficient to considerably increase the volume flow rate in the intermediate line 19 . The deposition of the foreign substances can thus be counteracted further by means of the scavenging gas.
  • the operating liquid is enriched with an ever-increasing amount of foreign substances. It is thus possible for new operating liquid to be fed to the liquid ring vacuum pump 20 and for old operating liquid to be discharged from the liquid ring vacuum pump, respectively, via an inlet 23 and an outlet 24 during operation.
  • a closed circuit for the operating liquid exists between the liquid ring vacuum pump 20 and a storage vessel 25 via a feed line 26 and a return line 27 . Accordingly, during operation, operating liquid is continuously exchanged, whereby the material present in the storage vessel 25 is enriched with foreign substances to an ever greater extent.
  • the conductivity of the operating liquid in the storage vessel 25 is continuously measured by means of a sensor 28 .
  • the content of foreign substances can be inferred from the conductivity, such that the operating liquid can cease to be used when a predefined threshold value is exceeded.
  • the measurement values from the sensor 28 are fed to a control unit 30 . If the threshold value is exceeded, the control unit 30 actuates a valve 31 , such that some of the no longer usable operating liquid is extracted from the vessel 25 . The vessel 25 is subsequently filled with a corresponding amount of fresh operating liquid. Furthermore, by means of the control unit 30 , a pump 32 is actuated by means of which the operating liquid is fed to the liquid ring vacuum pump 20 .
  • the pH value of the operating liquid in the storage vessel 25 is measured by means of a further sensor 29 . If, for example, acidic foreign substances are entrained in the gas, it may be advantageous, for the purification of the gas, for the operating liquid to be alkaline. The absorption of the acidic foreign substances has the effect that the pH value of the operating liquid falls until, at some point, the absorption of the acidic foreign substances is no longer ensured. This is determined by means of the sensor 29 . When a corresponding measurement value is output by the sensor 29 , the device 30 actuates a valve 33 by means of which additional alkaline solution is fed to the operating liquid. In this way, the operating liquid permanently maintains the desired alkaline characteristics.
  • a combustion device 34 is arranged in the intermediate line 19 . Said combustion device is activated if foreign substances that can be absorbed by the operating liquid of the liquid ring vacuum pump 20 only after combustion are entrained in the gas.

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  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • General Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Compressors, Vaccum Pumps And Other Relevant Systems (AREA)
  • Treating Waste Gases (AREA)
  • Degasification And Air Bubble Elimination (AREA)
  • Applications Or Details Of Rotary Compressors (AREA)
  • Gas Separation By Absorption (AREA)
  • Vaporization, Distillation, Condensation, Sublimation, And Cold Traps (AREA)
US14/364,802 2011-12-14 2012-12-12 Device and Method for Evacuating a Chamber and Purifying the Gas Extracted From Said Chamber Abandoned US20150068399A1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
EP11193573 2011-12-14
EP11193573.0 2011-12-14
PCT/EP2012/075262 WO2013087713A2 (de) 2011-12-14 2012-12-12 Vorrichtung und verfahren zum evakuieren eines raums und zum reinigen des aus dem raum abgesaugten gases

Related Parent Applications (1)

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PCT/EP2012/075262 A-371-Of-International WO2013087713A2 (de) 2011-12-14 2012-12-12 Vorrichtung und verfahren zum evakuieren eines raums und zum reinigen des aus dem raum abgesaugten gases

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US17/015,590 Division US11802562B2 (en) 2011-12-14 2020-09-09 Device and method for evacuating a chamber and purifying the gas extracted from said chamber

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US14/364,802 Abandoned US20150068399A1 (en) 2011-12-14 2012-12-12 Device and Method for Evacuating a Chamber and Purifying the Gas Extracted From Said Chamber
US17/015,590 Active 2034-03-14 US11802562B2 (en) 2011-12-14 2020-09-09 Device and method for evacuating a chamber and purifying the gas extracted from said chamber

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Country Status (6)

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US (2) US20150068399A1 (enrdf_load_stackoverflow)
EP (1) EP2791508B1 (enrdf_load_stackoverflow)
JP (1) JP6138144B2 (enrdf_load_stackoverflow)
KR (1) KR101935336B1 (enrdf_load_stackoverflow)
CN (1) CN104066989B (enrdf_load_stackoverflow)
WO (1) WO2013087713A2 (enrdf_load_stackoverflow)

Cited By (6)

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Publication number Priority date Publication date Assignee Title
CN108344221A (zh) * 2017-12-22 2018-07-31 佛山精迅能冷链科技有限公司 一种可调控压力的真空预冷机
JP2018523567A (ja) * 2015-07-22 2018-08-23 エドワーズ リミテッド 処理チャンバから腐食性の流出ガス流を排気する装置
FR3112177A1 (fr) * 2020-07-09 2022-01-07 Pfeiffer Vacuum Ligne de vide et procédé de contrôle d’une ligne de vide
FR3112086A1 (fr) * 2020-07-09 2022-01-07 Pfeiffer Vacuum Dispositif de traitement des gaz et ligne de vide
FR3129851A1 (fr) * 2021-12-08 2023-06-09 Pfeiffer Vacuum Ligne de vide et installation comportant la ligne de vide
WO2023160793A1 (en) * 2022-02-24 2023-08-31 Ihi Bernex Ag Chemical vapor deposition apparatus

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CN112011785A (zh) * 2020-10-10 2020-12-01 常州艾恩希纳米镀膜科技有限公司 一种用于cvd涂层设备的废气中和系统

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US7465375B2 (en) * 2002-11-13 2008-12-16 Deka Products Limited Partnership Liquid ring pumps with hermetically sealed motor rotors
US20110142740A1 (en) * 2008-08-11 2011-06-16 Metso Power Ab Method and system for treatment of malodorous gases emanating from a pulp mill

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Cited By (10)

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FR3112177A1 (fr) * 2020-07-09 2022-01-07 Pfeiffer Vacuum Ligne de vide et procédé de contrôle d’une ligne de vide
FR3112086A1 (fr) * 2020-07-09 2022-01-07 Pfeiffer Vacuum Dispositif de traitement des gaz et ligne de vide
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WO2013087713A3 (de) 2013-12-27
KR20140107397A (ko) 2014-09-04
JP6138144B2 (ja) 2017-05-31
EP2791508A2 (de) 2014-10-22
US11802562B2 (en) 2023-10-31
JP2015500944A (ja) 2015-01-08
WO2013087713A2 (de) 2013-06-20
CN104066989A (zh) 2014-09-24
US20200408211A1 (en) 2020-12-31
EP2791508B1 (de) 2019-03-06
KR101935336B1 (ko) 2019-01-04

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