US20150027375A1 - Deposition source for deposition device - Google Patents
Deposition source for deposition device Download PDFInfo
- Publication number
- US20150027375A1 US20150027375A1 US14/083,091 US201314083091A US2015027375A1 US 20150027375 A1 US20150027375 A1 US 20150027375A1 US 201314083091 A US201314083091 A US 201314083091A US 2015027375 A1 US2015027375 A1 US 2015027375A1
- Authority
- US
- United States
- Prior art keywords
- heater
- deposition source
- external
- unit
- crucible
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
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Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/26—Vacuum evaporation by resistance or inductive heating of the source
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C20/00—Chemical coating by decomposition of either solid compounds or suspensions of the coating forming compounds, without leaving reaction products of surface material in the coating
- C23C20/02—Coating with metallic material
- C23C20/04—Coating with metallic material with metals
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/243—Crucibles for source material
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- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
- General Chemical & Material Sciences (AREA)
Abstract
A deposition source for a deposition device includes a crucible. A heater is disposed outside of the crucible and the heater has a plate shape. The deposition source includes a heater guide. The heater is disposed within the heater guide, and the heater guide supports the heater. An external supporter is connected to the heater guide.
Description
- This application claims priority under 35 U.S.C. §119 to Korean Patent Application No. 10-2013-0088104, filed on Jul. 25, 2013, in the Korean Intellectual Property Office, the disclosure of which is incorporated by reference herein in its entirety.
- 1. Technical Field
- Exemplary embodiments of the present invention relate to a deposition source, and more particularly to a deposition source for a deposition device.
- 2. Discussion of Related Art
- Mobile electronic devices are commonly used. In addition, tablet personal computers and small electronic devices such as, for example, mobile cellular phones are also commonly used.
- Mobile electronic devices include display units that provide visual information such as images or pictures to users. Sizes of the components for driving a display unit are becoming smaller. The importance of display units in electronic devices has been gradually increasing and configurations for bending a display unit by certain angles are being developed.
- Display units may be formed by laminating or depositing various layers. For example, display units may generally include a light emitting layer formed of an organic material and a cathode electrode and an anode electrode respectively formed on a bottom and a top of the light emitting layer. Anode electrodes, cathode electrodes, and light emitting layers may be formed, for example, by evaporating and depositing metallic materials or organic materials. A heater may be installed in a crucible to heat metallic materials or organic materials for deposition. For example, heaters may be formed in a plate shape to increase the convenience of design and installation.
- Exemplary embodiments of the present invention include deposition sources for deposition devices which are capable of preventing damage to heaters.
- According to one or more exemplary embodiments of the present invention, a deposition source for a deposition device includes a crucible. A heater is disposed outside the crucible and has a plate shape. The deposition source for a deposition device includes a heater guide. The heater is positioned in the heater guide. The heater guide supports the heater. An external supporter is connected to the heater guide.
- According to an exemplary embodiment of the present invention, the crucible may have an open top.
- According to an exemplary embodiment of the present invention, the heater may include a first heater unit and a second heater unit. The second heater unit may be separated from the first heater unit. The second heater unit may be connected to the first heater unit.
- According to an exemplary embodiment of the present invention, an insertion hole may be formed in the heater guide. The first heater unit and the second heater unit may be positioned in the insertion hole.
- According to an exemplary embodiment of the present invention, the heater guide may include a contact-preventing protrusion. The contact-preventing protrusion may be positioned in the insertion hole. The contact-preventing protrusion may prevent contact between the first heater unit and the second heater unit.
- According to an exemplary embodiment of the present invention, the heater guide may include a first heater guide unit into which the first heater unit and the second heater unit are positioned. A second heater guide unit may be coupled to the first heater guide unit. The first heater unit and the second heater unit may be positioned in the second heater guide unit to separate the first heater unit and the second heater unit from each other.
- According to an exemplary embodiment of the present invention, a plurality of heater guides and a plurality of external supporters may be provided. The plurality of external supporters may be installed between the plurality of heater guides.
- According to an exemplary embodiment of the present invention, each of the plurality of external supporters may have different heights from each other.
- According to an exemplary embodiment of the present invention, the heights of the plurality of external supporters may be increasingly higher from a bottom to the top of the crucible.
- According to an exemplary embodiment of the present invention, the deposition source may further include a reflector disposed outside the external supporter.
- According to an exemplary embodiment of the present invention, the deposition source may further include an external shield disposed outside the reflector.
- According to an exemplary embodiment of the present invention, the deposition source may further include a cooling jacket disposed outside the external shield.
- According to an exemplary embodiment of the present invention, the external supporter may include a ceramic material.
- According to an exemplary embodiment of the present invention, the external supporter may have a cylindrical shape. The external supporter may surround an external surface of the heater.
- The above and other features of the present invention will become more apparent by describing in detail exemplary embodiments thereof, with reference to the accompanying drawings in which:
-
FIG. 1 is a cross-sectional view illustrating a deposition source for a deposition device according to an exemplary embodiment of the present invention; -
FIG. 2 is a perspective view illustrating a part of the deposition source shown inFIG. 1 ; -
FIG. 3 is a perspective view illustrating a heater guide shown inFIG. 2 ; and -
FIG. 4 is a top view illustrating the heater guide shown inFIG. 3 . - Hereinafter, exemplary embodiments of the present invention will be described in detail with reference to the accompanying drawings. However, the present invention should not be construed as limited to the exemplary embodiments set forth herein and may be embodied in different forms.
- It will be understood that although the terms “first”, “second”, etc. may be used herein to describe various components, these components should not be limited by these terms. These terms are only used to distinguish one component from another.
-
FIG. 1 is a cross-sectional view illustrating adeposition source 100 for a deposition device according to an exemplary embodiment of the present invention.FIG. 2 is a perspective view illustrating a part of thedeposition source 100.FIG. 3 is a perspective view illustrating a heater guide shown inFIG. 2 . - Referring to
FIGS. 1 to 3 , thedeposition source 100 includes acrucible 111. A space is formed in thecrucible 111 and a top of thecrucible 111 is formed to be open. A deposition material may be disposed in the space formed in thecrucible 111. Thecrucible 111 may be formed to allow the deposition material to be evaporated outward through an open part of thecrucible 111. - The
deposition source 100 may include anexternal crucible 112. Theexternal crucible 112 may surround the outside of thecrucible 111. For example, theexternal crucible 112 may be extended outward from the open part of thecrucible 111, thereby preventing the deposition material in thecrucible 111 from leaking onto other components in the event that the deposition material overflows out of thecrucible 111. - The
deposition source 100 may include aheater 120. Theheater 120 may have a plate shape and may be disposed outside theexternal crucible 112. For example, a plurality ofheaters 120 may be provided, and the plurality ofheaters 120 may be separated from each other by a predetermined interval. Each heater of the plurality ofheaters 120 may include afirst heater unit 121 and asecond heater unit 122 connected to thefirst heater unit 121. For example, thesecond heater unit 122 may be bent with respect to thefirst heater unit 121 and may be disposed parallel to thefirst heater unit 121. Thefirst heater unit 121 and thesecond heater unit 122 may be separated from each other. - The
deposition source 100 may include aheater guide 130. Theheater 120 may be positioned in theheater guide 130 and supported thereby. For example, theheater guide 130 may be formed in a ring shape with a space therein, and thecrucible 111 and theexternal crucible 112 may be positioned in the space. A plurality of heater guides 130 may be provided, and the plurality of heater guides 130 may be disposed in a longitudinal direction with respect to theheater 120. The plurality of heater guides 130 may be separated from each other. - The
heater guide 130 may be formed in various shapes, and theheater guide 130 may fix theheater 120. For example, theheater 120 may be positioned in into aninsertion hole 131. Theinsertion hole 131 may be formed in theheater guide 130. Theheater guide 130 may include a contact-preventingprotrusion 132 formed in theinsertion hole 131. The contact-preventingprotrusion 132 may prevent thefirst heater unit 121 and thesecond heater unit 122 from coming into contact with each other. For example, the contact-preventingprotrusion 132 may be formed to traverse a width of theinsertion hole 131 and may separate thefirst heater unit 121 and thesecond heater unit 122 from each other. - The
heater guide 130 may include a first heater guide unit, in which thefirst heater unit 121 and thesecond heater unit 122 are positioned, and a second heater guide unit coupled with the first heater guide unit. Thefirst heater unit 121 and thesecond heater unit 122 may be positioned in the second heater guide unit while being separated from each other. Theinsertion hole 131 and the contact-preventingprotrusion 132 may be formed in the second heater guide unit. Theinsertion hole 131 may be formed in the first heater guide unit without the contact-preventingprotrusion 132. Thefirst heater unit 121 and thesecond heater unit 122 may be prevented from being in contact with each other. Hereafter, for convenience of explanation, an exemplary embodiment of the present invention will be described, in which theheater guide 130 is formed as a single heater guide and theinsertion hole 131 and the contact-preventingprotrusion 132 are formed in theheater guide 130. - The
deposition source 100 may include anexternal supporter 150 connected to theheater guide 130. For example, theexternal supporter 150 may include a ceramic material. - A plurality of
external supporters 150 may be provided. For example, the plurality ofexternal supporters 150 may include a firstexternal supporter 151 to a thirdexternal supporter 153. The firstexternal supporter 151 may be installed on a lower side of thecrucible 111 and the thirdexternal supporter 153 may be installed on an upper side of thecrucible 111. A secondexternal supporter 152 may be disposed between the firstexternal supporter 151 and the thirdexternal supporter 153. The number of the plurality ofexternal supporters 150 is not limited thereto and may be formed in various quantities, as desired. Hereafter, for convenience of explanation, an exemplary embodiment of the present invention in which theexternal supporter 150 includes the firstexternal supporter 151 to the thirdexternal supporter 153 will be described in detail. - The first
external supporter 151 to the thirdexternal supporter 153 may have different heights from each other. Among the firstexternal supporter 151 to the thirdexternal supporter 153, a height of the firstexternal supporter 151 may be the lowest and a height of the thirdexternal supporter 153 may be the highest. For example, when deformation of an upper portion of theheater 120 occurs, the thirdexternal supporter 153 may prevent the upper portion of theheater 120 from coming into contact with another structure disposed outside the thirdexternal supporter 153. - The
deposition source 100 may include a reflector 160 disposed outside theexternal supporter 150. The reflector 160 may surround theexternal supporter 150. The reflector 160 may be formed of a metallic material or an insulating material, for example. The reflector 160 may prevent heat generated by theheater 120 from being radiated outwardly. - The
deposition source 100 may include an external shield 170. The external shield may be disposed outside the reflector 160. For example, the external shield 170 may be formed of a metallic material or an insulating material. The external shield 170 may surround the reflector 160. The external shield 170 may prevent a deposition material evaporated from thecrucible 111 from flowing into an inside of a space between the reflector 160 and theexternal crucible 112. The external shield 170 may prevent a deposition material evaporated from thecrucible 111 from attaching to an outer surface of the reflector 160 and flowing into an inside of the reflector 160. For example, the external shield 170 may be coupled to a part of theexternal crucible 112. - The
deposition source 100 may include acooling jacket 181 separated from the external shield 170. The coolingjacket 181 may block heat generated by thedeposition source 100, thereby preventing an increase in temperature of components outside thedeposition source 100. - The
deposition source 100 may include a coolingwater connecting pipe 182 connected to thecooling jacket 181. The coolingwater connecting pipe 182 may allow cooling water to be supplied to thecooling jacket 181. The coolingwater connecting pipe 182 may allow cooling water to circulate through the coolingjacket 181, and then, to be discharged outward. The coolingwater connecting pipe 182 may be connected to an external cooling water supplying unit (not shown) to supply cooling water to thecooling jacket 181 and to guide the cooling water circulating through the coolingjacket 181 to an outside of the coolingwater connecting pipe 182. - The
deposition source 100 may include aheater electrode 183. Theheater electrode 183 may be connected to theheater 120. Thedeposition source 100 may include athermocouple 184. Thethermocouple 184 may be disposed on a bottom of thecrucible 111. Athermocouple connector 185 may be connected to thethermocouple 184. Athermocouple supporter 186 may be disposed on a bottom of thethermocouple 184 and may support and protect a shape of thethermocouple 184. - The
deposition source 100 may include a supportingframe 191. Thethermocouple supporter 186, theheater electrode 183, and thethermocouple connector 185 may be positioned in the supportingframe 191. Thedeposition source 100 may include abase frame 193. Thebase frame 193 may be separated from the supportingframe 191. Thebase frame 193 may support thethermocouple supporter 186. - The
deposition source 100 may be installed in a chamber (not shown). Various deposition materials positioned in thecrucible 111 and evaporated therefrom may be formed, for example, when thedeposition source 100 is installed in the chamber. For example, the deposition material may be an organic material forming a light emitting layer (not shown) of a display unit (not shown). The deposition material may be a metallic material forming a cathode electrode (not shown) of the display unit, for example. The deposition material may include aluminum. Hereafter, for convenience of explanation, an exemplary embodiment of the present invention in which the deposition material includes aluminum will be described in detail. - The deposition material may be positioned in the
crucible 111 and electric power may be supplied to theheater 120 to heat thecrucible 111. Theheater 120 may heat theexternal crucible 112 and a temperature of theexternal crucible 112 may be increased, thereby heating thecrucible 111. - When the
crucible 111 is heated, a deposition material in thecrucible 111 may be evaporated and may be discharged through an open top of thecrucible 111. For example, a vacuum may be formed inside the chamber, thereby allowing the deposition material to be evaporated. - The deposition material evaporated as described above may be deposited onto a substrate (not shown) through a mask (not shown) carried together with the substrate. For example, a deposition hole (not shown) may be formed on the mask to allow the deposition material to pass therethrough.
- While the deposition material is being evaporated, for example, as described above, the
external crucible 112 and the external shield 170 may prevent the deposition material from flowing into the inside of the reflector 160. Cooling water may circulate through the coolingjacket 181, thereby preventing components outside thedeposition source 100 from overheating. - The
heater 120 may be deformed due to heat. For example, when a deposition process is performed in an environment of high temperature, thefirst heater unit 121 and thesecond heater unit 122 may be deformed due to external heat. - When the
heater 120 is deformed as described above, an end portion of thefirst heater unit 121 or an end portion of thesecond heater unit 122 may bend toward theexternal supporter 150. - When the
external supporter 150 is not provided, thefirst heater unit 121 and thesecond heater unit 122 may come in contact with the reflector 160. When thefirst heater unit 121 and thesecond heater unit 122 are in contact with the reflector 160, at least one of thefirst heater unit 121 and thesecond heater unit 122 may be damaged. - In an exemplary embodiment of the present invention, the
heater 120 may be installed in a general heater supporter (not shown). When thefirst heater unit 121 and thesecond heater unit 122 are damaged, as described above, theheater 120 may develop a crack or may be damaged, for example, due to different thermal coefficients of thefirst heater unit 121 and thesecond heater unit 122 with respect to each other. - According to exemplary embodiments of the present invention, when the
heater 120 is deformed, as described above, thefirst heater unit 121 and thesecond heater unit 122 may come in contact with theexternal supporter 150. When thefirst heater unit 121 and thesecond heater unit 122 are deformed, theexternal supporter 150 may prevent thefirst heater unit 121 and thesecond heater unit 122 from coming into contact with the reflector 160. Theexternal supporter 150 may, thereby, prevent a dielectric breakdown of thefirst heater unit 121 and/or thesecond heater unit 122. - Accordingly, the
deposition source 100 may prevent theheater 120 from being broken down or damaged by, for example, reducing thermal deformation of theheater 120. Thedeposition source 100 may prevent the dielectric breakdown of theheater 120 by, for example, blocking a contact between theheater 120 and the reflector 160 when theheater 120 is deformed due to heat. - While the present invention has been shown and described with reference to the exemplary embodiments thereof, it will be apparent to those of ordinary skill in the art that various changes in form and detail may be made thereto without departing from the spirit and scope of the present invention.
Claims (20)
1. A deposition source for a deposition device, comprising:
a crucible;
a heater disposed outside of the crucible, the heater having a plate shape;
a heater guide, inside which the heater is disposed, the heater guide supports the heater; and
an external supporter is connected to the heater guide.
2. The deposition source of claim 1 , wherein the crucible has an open top.
3. The deposition source of claim 1 , wherein the heater comprises:
a first heater unit; and
a second heater unit, wherein the first heater unit and the second heater unit are separated from each other.
4. The deposition source of claim 3 , wherein an insertion hole is disposed in the heater guide, and the first heater unit and the second heater unit are disposed in the insertion hole.
5. The deposition source of claim 4 , wherein the heater guide comprises a contact-preventing protrusion disposed in the insertion hole, wherein the contact-preventing protrusion prevents contact between the first heater unit and the second heater unit.
6. The deposition source of claim 3 , wherein the heater guide comprises:
a first heater guide unit within which the first heater unit and the second heater unit are disposed; and
a second heater guide unit coupled to the first heater guide unit, wherein the first heater unit and the second heater unit are disposed in the second heater guide unit and the first heater guide unit and the second heater guide united are separated from each other.
7. The deposition source of claim 1 , wherein a plurality of heater guides and a plurality of external supporters are provided, and
wherein each of the plurality of external supporters is disposed between the plurality of heater guides.
8. The deposition source of claim 7 , wherein each of the plurality of external supporters have a different height from each other.
9. The deposition source of claim 8 , wherein the heights of the plurality of external supporters are increasingly higher from a bottom to a top of the crucible.
10. The deposition source of claim 1 , further comprising a reflector disposed outside the external supporter.
11. The deposition source of claim 9 , further comprising an external shield disposed outside the reflector.
12. The deposition source of claim 11 , further comprising a cooling jacket disposed outside the external shield.
13. The deposition source of claim 1 , wherein the external supporter comprises a ceramic material.
14. The deposition source of claim 1 , wherein the external supporter has a cylindrical shape, and the external supporter surrounds an external surface of the heater.
15. A deposition source, comprising:
an internal crucible coupled to an external crucible, wherein the external crucible is configured to surround an outside of the internal crucible;
a heater disposed outside of the crucible, wherein the heater comprises a first heater unit and a second heater unit, and the heater is configured to generate heat and provide the generated heat to the internal crucible;
a heater guide coupled to the internal crucible, wherein the heater guide comprises an insertion hole and a contact-preventing protrusion, the first heater unit and the second heater unit are disposed within the insertion hole and the contact-preventing guide is configured to maintain a separation between the first heater unit and the second heater unit; and
a reflector configured to prevent the heat generated by the heater from being radiated or conducted outside of the deposition source.
16. The deposition source of claim 15 , further comprising a cooling jacket disposed outside of the reflector.
17. The deposition source of claim 15 , further comprising an external shield disposed outside the reflector.
18. The deposition source of claim 15 , further comprising a cooling water connecting pipe coupled to a cooling jacket, wherein the cooling water connecting pipe and the cooling jacket are configured to reduce heating of components outside of the deposition source by the heater.
19. The deposition source of claim 15 , further comprising an external supporter coupled to the heater guide.
20. The deposition source of claim 15 , wherein the crucible has an open top.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
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KR10-2013-0088104 | 2013-07-25 | ||
KR1020130088104A KR102155735B1 (en) | 2013-07-25 | 2013-07-25 | Source for deposition device |
Publications (1)
Publication Number | Publication Date |
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US20150027375A1 true US20150027375A1 (en) | 2015-01-29 |
Family
ID=52389390
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
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US14/083,091 Abandoned US20150027375A1 (en) | 2013-07-25 | 2013-11-18 | Deposition source for deposition device |
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US (1) | US20150027375A1 (en) |
KR (1) | KR102155735B1 (en) |
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CN106399943A (en) * | 2015-08-03 | 2017-02-15 | 三星显示有限公司 | Deposition source |
CN107686968A (en) * | 2017-08-14 | 2018-02-13 | 武汉华星光电半导体显示技术有限公司 | Crucible and deposition system is deposited |
CN111051564A (en) * | 2017-09-14 | 2020-04-21 | 艾尔法普拉斯株式会社 | Vacuum evaporation source |
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US11395557B2 (en) | 2016-08-03 | 2022-07-26 | Koninklijke Douwe Egberts B.V. | Apparatus and method for preparing a beverage and system comprising the apparatus and an exchangeable capsule |
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2013
- 2013-07-25 KR KR1020130088104A patent/KR102155735B1/en active IP Right Grant
- 2013-11-18 US US14/083,091 patent/US20150027375A1/en not_active Abandoned
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Cited By (12)
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CN106399943A (en) * | 2015-08-03 | 2017-02-15 | 三星显示有限公司 | Deposition source |
US10966564B2 (en) | 2016-08-03 | 2021-04-06 | Koninklijke Douwe Egberts B.V. | System for preparing a quantity of beverage suitable for consumption |
US11096516B2 (en) | 2016-08-03 | 2021-08-24 | Koninklijke Douwe Egberts B.V. | System, apparatus, method, capsule and kit of capsules for preparing a beverage |
US11129493B2 (en) | 2016-08-03 | 2021-09-28 | Koninklijke Douwe Egberts B.V. | System for preparing a beverage |
US11129492B2 (en) | 2016-08-03 | 2021-09-28 | Koninklijke Douwe Egberts B.V. | System for preparing a beverage |
US11197574B2 (en) | 2016-08-03 | 2021-12-14 | Koninklijke Douwe Egberts B.V. | System and method for preparing a beverage field and background |
US11304555B2 (en) | 2016-08-03 | 2022-04-19 | Koninklijke Douwe Egberts B.V. | System and apparatus for preparing a beverage |
US11395557B2 (en) | 2016-08-03 | 2022-07-26 | Koninklijke Douwe Egberts B.V. | Apparatus and method for preparing a beverage and system comprising the apparatus and an exchangeable capsule |
US11576519B2 (en) | 2016-08-03 | 2023-02-14 | Koninklijke Douwe Egberts B.V. | System, apparatus, method, capsule and kit of capsules for preparing a beverage |
CN107686968A (en) * | 2017-08-14 | 2018-02-13 | 武汉华星光电半导体显示技术有限公司 | Crucible and deposition system is deposited |
CN111051564A (en) * | 2017-09-14 | 2020-04-21 | 艾尔法普拉斯株式会社 | Vacuum evaporation source |
WO2022221038A1 (en) * | 2021-04-15 | 2022-10-20 | Applied Materials, Inc. | Evaporation source cooling mechanism |
Also Published As
Publication number | Publication date |
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KR102155735B1 (en) | 2020-09-15 |
KR20150012514A (en) | 2015-02-04 |
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