CN103811246B - Heater and plasma processing device - Google Patents

Heater and plasma processing device Download PDF

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Publication number
CN103811246B
CN103811246B CN201210457542.2A CN201210457542A CN103811246B CN 103811246 B CN103811246 B CN 103811246B CN 201210457542 A CN201210457542 A CN 201210457542A CN 103811246 B CN103811246 B CN 103811246B
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Prior art keywords
heater
pallet
wiring
support base
protective hood
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CN201210457542.2A
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CN103811246A (en
Inventor
张阳
赵梦欣
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Beijing North Microelectronics Co Ltd
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Beijing North Microelectronics Co Ltd
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Abstract

A kind of heater and plasma processing device, it carries the pallet of workpiece to be machined for heating, and it includes supporting base, support column and heating unit, and wherein, heating unit is arranged on the top supporting base;Support column is fixing with support base to be connected, and the top of support column is higher than the top of heating unit, in order to support described pallet;Heating unit includes the heater element using thermal-radiating mode towards pallet radiations heat energy, heater element includes helical form radiant body, the helical form radiant body centrage around pallet and the radially uniform winding along described pallet, and helical form radiant body have close pallet centrage the first terminals and near second terminals at edge of pallet.The heater that the present invention provides is not only simple in structure, and can improve the heating uniformity of heater, such that it is able to improve product quality.

Description

Heater and plasma processing device
Technical field
The present invention relates to semiconductor equipment manufacturing technology field, in particular it relates to a kind of heater and plasma processing device.
Background technology
Plasma processing device is the common equipment of processing semiconductor device, such as etching, sputter, in the technical process such as physical vapour deposition (PVD) and chemical gaseous phase deposition, usually need by heater, workpiece to be machined to be heated, such as carrying out ITO (Indium TinOxide, tin-doped indium oxide) thin film deposition processes time, need by heater, sapphire substrate is heated to about 300 DEG C.
In addition, existing plasma processing device generally uses the mode of pallet carrying to realize simultaneously and carries and heat multiple workpiece to be machined, to improve production efficiency, this just heating uniformity to heater propose certain requirement, heat with the workpiece to be machined guaranteeing to be opposite to equably on pallet.Present stage, heater generally uses linear fluorescent tube, and this linear fluorescent tube is arranged on the lower section of pallet, in order to use thermal-radiating mode to heat pallet, thus indirectly heats the workpiece to be machined being placed on pallet.
But, above-mentioned linear fluorescent tube is inevitably present problems with in actual applications: owing to the linear fluorescent tube of single straight cannot be evenly distributed in the lower section of pallet because of the restriction of own form, thus heat that the region of the close linear fluorescent tube of pallet is obtained is more than the heat that the region away from linear fluorescent tube of pallet is obtained, cause the non-uniform temperature of pallet, so that the non-uniform temperature of the workpiece to be machined being placed on pallet, and then reduce product quality.Although by using the many linear fluorescent tubes relative to the distribution of pallet place uniform plane; can also realize being uniformly heated up pallet; but; this there will be again problems with; that is: more due to the quantity of the terminals of many linear fluorescent tubes; which increase the quantity of the conductive component being connected with these terminals, and for coated with conductive parts to prevent the structural complexity of the protective cover of its vacuum sparking, thus improve difficulty of processing and the manufacturing cost of heater.
Summary of the invention
It is contemplated that at least solve one of technical problem present in prior art, propose a kind of heater and plasma processing device, its not only difficulty of processing and low cost of manufacture, and the heating uniformity of heater can be improved, such that it is able to improve product quality.
Thering is provided a kind of heater for realizing the purpose of the present invention, carry the pallet of workpiece to be machined for heating, it includes supporting base, support column and heating unit, and wherein, described heating unit is arranged on the top of described support base;Described support column is fixing with described support base to be connected, and the top of described support column is higher than the top of described heating unit, in order to support described pallet;Described heating unit includes the heater element using thermal-radiating mode towards described pallet radiations heat energy, described heater element includes helical form radiant body, the described helical form radiant body centrage around described pallet and the radially uniform winding along described pallet, and described helical form radiant body has the first terminals of the centrage near described pallet and near second terminals at edge of described pallet;The lower section of described support base is provided with lowering or hoisting gear, described lowering or hoisting gear includes pedestal, lift drive mechanism, sealing member and cooling water pipeline, wherein, described pedestal is connected with described support base, described lift drive mechanism is connected with described pedestal, under the driving of described lift drive mechanism, described pedestal drives described support base to rise or fall;Described sealing member is arranged at described pedestal and supports between base, in order to by the gap sealing between described pedestal and support base;At the upper surface of described pedestal and the inner side of described sealing member or outside are provided with groove, or, at the lower surface of described support base and the inner side of described sealing member or outside are provided with groove, described cooling water pipeline is arranged at described inside grooves, is passed through cooling water to cool down described sealing member in described cooling water pipeline.
Wherein, described heater element is infrared radiation lamp or resistance wire.
Wherein, described heater element also includes the first wiring, the second wiring, the first wiring protective hood and the second wiring protective hood; wherein; the top of described first wiring protective hood is connected with described first terminals; the bottom of described first wiring protective hood runs through the thickness of described support base at the marginal position of described support base, and extends to the lower section of described support base;Described first wiring is positioned at the inside of described first wiring protective hood, and one end of described first wiring is connected with described first terminals;The top of described second wiring protective hood is connected with described second terminals, and the bottom of described second wiring protective hood runs through the thickness of described support base at the marginal position of described support base, and extends to the lower section of described support base;Described second wiring is positioned at the inside of described second wiring protective hood, and one end of described second wiring is connected with described second terminals;Described first wiring protective hood and the second wiring protective hood use pottery or quartz to make.
Wherein, described heating unit also includes: conductive component, vacuum electrode and power supply, and wherein, described vacuum electrode is fixed on described support base, and the top of described vacuum electrode is higher than the upper surface of described support base, the bottom of described vacuum electrode is less than the lower surface of described support base;The other end of described first wiring and the other end of the second wiring are each passed through described first wiring protective hood and the second wiring protective hood, and the top by described conductive component with described vacuum electrode electrically connects;Described power supply electrically connects with the bottom of described vacuum electrode, and it is for providing electric energy to described heater element.
Wherein, described heating unit also includes conductive component protective cover, and described conductive component cladding is got up by described conductive component protective cover;Described conductive component protective cover uses pottery or quartz to make.
Wherein, described conductive component protective cover is to be coated on the insulating barrier outside described conductive component by what ceramic fine bead was formed.
Wherein, described heating unit also includes electrode protection cover, and the top of described vacuum electrode is coated with by described electrode protection cover;Described electrode protection cover uses pottery or quartz to make.
Wherein, described heater also includes that support member, described support member are used for supporting described helical form radiant body, to be fixed in the top of described support base.
As another technical scheme, the present invention also provides for a kind of plasma processing device, and it includes reaction chamber, and the bottom in described reaction chamber is provided with heater, and described heater have employed the above-mentioned heater that the present invention provides.
The method have the advantages that
The heater that the present invention provides, its heater element have employed the helical form radiant body of the centrage around pallet and the radially uniform winding along pallet, this is compared with linear fluorescent tube of the prior art, owing to single helical form radiant body can realize being distributed relative to pallet place uniform plane, thus it can not only be evenly towards the regional radiations heat energy of pallet, so that the temperature of pallet regional tends to uniform, and then the temperature homogeneity of the workpiece to be machined being placed on pallet can be improved, thus improve product quality;And; owing to above-mentioned helical form radiant body only has two terminals; that is: near pallet centrage the first terminals and near second terminals at edge of pallet; the negligible amounts of terminals; such that it is able to reduce the quantity of the conductive component being connected with terminals; and reduce for being coated with this conductive component to prevent the structural complexity of the protective cover of its vacuum sparking, and then difficulty of processing and the manufacturing cost of heater can be reduced.
The plasma processing device that the present invention provides, it, by using above-mentioned heater, is possible not only to make the temperature of pallet regional tend to uniform, such that it is able to improve the temperature homogeneity of the workpiece to be machined being placed on pallet, and then can improve product quality;Moreover, it is also possible to reduce difficulty of processing and the manufacturing cost of equipment.
Accompanying drawing explanation
The structural representation of the heater that Fig. 1 provides for the present invention;
Fig. 2 is the top view in Fig. 1 along line A-A;And
Fig. 3 is the axonometric chart of heater element in Fig. 1.
Detailed description of the invention
For making those skilled in the art be more fully understood that technical scheme, the heater and the plasma processing device that come below in conjunction with the accompanying drawings to provide the present invention are described in detail.
The structural representation of the heater that Fig. 1 provides for the present invention.Fig. 2 is the top view in Fig. 1 along line A-A.Fig. 3 is the axonometric chart of heater element in Fig. 1.Seeing also Fig. 1, Fig. 2 and Fig. 3, heater carries the pallet 23 of workpiece to be machined for heating, and it includes supporting base 20, support column 22 and heating unit, and wherein, heating unit is arranged on the top supporting base 20;Support column 22 is fixing with support base 20 to be connected, and the top of support column 22 is higher than the top of heating unit, in order to support pallet 23.In actual applications, the quantity of support column 22 can be more than three, and is uniformly distributed along the circumference supporting base 20, and support column 22 is fixed on and supports on base 20 and arrange against the edge supporting base 20.
Heating unit includes heater element, and it can be to use the thermal-radiating mode thermal source towards pallet 23 radiations heat energy being positioned above, thus can indirectly heating and be placed in the workpiece to be machined on pallet 23 of such as infrared radiation lamp or resistance wire etc..Heater element includes helical form radiant body 21, the helical form radiant body 21 centrage around pallet 23 and the radially uniform winding along pallet 23, i.e., in the plane at pallet 23 place, the projection of shape of helical form radiant body 21 is spiral yarn shaped relative to the distribution of pallet 23 place uniform plane, and helical form radiant body has first terminals 211 of centrage of close pallet 23 and second terminals 212 at the edge of close pallet 23.In other words, helical form radiant body 21 can be by an infra-red radiation fluorescent tube or resistance wire using the position of the centrage near pallet 23 as starting point, centrage around pallet 23 and the radially uniform winding along pallet 23, until being wound to the final position at the edge near pallet 23, above-mentioned infra-red radiation fluorescent tube or the two ends laying respectively at beginning and end position of resistance wire, be the first terminals 211 and the second terminals 212.It can thus be appreciated that, helical form radiant body 21 is compared with linear fluorescent tube of the prior art, it can not only be distributed relative to pallet 23 place uniform plane, it is thus possible to the heat of the regional radiation evenly towards pallet 23, so that the temperature of pallet 23 regional tends to uniform, and then the temperature homogeneity of the workpiece to be machined being placed on pallet 23 can be improved, improve product quality.And; owing to helical form radiant body 21 only has two terminals; that is: the first terminals 211 and the second terminals 212; the negligible amounts of terminals; such that it is able to reduce the quantity of the conductive component being connected with terminals; and reduce for being coated with this conductive component to prevent the structural complexity of the protective cover of its vacuum sparking, and then difficulty of processing and the manufacturing cost of heater can be reduced.
In the present embodiment, heater element also includes the first wiring, the second wiring and the first wiring protective hood 213 and the second wiring protective hood 214 using pottery or quartz to make.Wherein, the top of the first wiring protective hood 213 is connected with the first terminals 211, and the bottom of the first wiring protective hood 213 runs through the thickness supporting base 20 at the marginal position supporting base 20, and extends to support the lower section of base 20;First wiring (not shown) is positioned at the inside of the first wiring protective hood 213, and one end of the first wiring electrically connects with the first terminals 211;The top of the second wiring protective hood 214 is connected with the second terminals 212, and the bottom of the second wiring protective hood 214 runs through the thickness supporting base 20 at the marginal position supporting base 20, and extends to support the lower section of base 20;Second wiring (not shown) is positioned at the inside of the second wiring protective hood 214, and one end of the second wiring electrically connects with the second terminals 212.By means of the first wiring protective hood 213 and the second wiring protective hood 214; it is possible not only to make the first wiring and the second wiring and external insulation; thus prevent vacuum sparking; but also the position that the first wiring and the second wiring are connected with conductive component can extend to support the lower section of base 20; i.e.; extend to the position away from helical form radiant body 21, thus avoid the first wiring, the second wiring and the two junction being connected with conductive component overheated.
In the present embodiment, heating unit also includes conductive component (not shown), vacuum electrode 24 and power supply (not shown), wherein, vacuum electrode 24 is fixed on support base 20, and the top 241 of vacuum electrode 24 is higher than the upper surface of support base 20, the bottom 242 of vacuum electrode 24 is less than the lower surface supporting base 20;The other end of the first wiring and the other end of the second wiring are each passed through the first wiring protective hood 213 and the second wiring protective hood 214, and electrically connect with the top 241 of vacuum electrode 24 by conductive component;Power supply electrically connects with the bottom 242 of vacuum electrode 24, and it is for providing electric energy to heater element.
In the present embodiment; heating unit also includes conductive component protective cover (not shown), and conductive component protective cover uses pottery or quartz to make, and conductive component cladding is got up by it; to ensure that conductive component with extraneous electric insulation, thus can prevent conductive component vacuum sparking.Preferably, conductive component protective cover can be the insulating barrier being coated on outside conductive component formed by ceramic fine bead, and so-called ceramic fine bead refers to the ceramic material of the shapes such as bulk, lamellar, powder or tubulose.
In the present embodiment; heating unit also includes electrode protection cover 25; electrode protection cover 25 is for being coated with by the top 241 of vacuum electrode 24; and electrode protection cover 25 uses pottery or quartz to make; in order to make the top 241 of vacuum electrode 24 with extraneous electric insulation, thus vacuum electrode 24 vacuum sparking can be prevented.
In the present embodiment, heater also includes support member 26, and support member 26 is for support helix shape radiant body 21, to be fixed in the top supporting base 20.
In the present embodiment, being additionally provided with lowering or hoisting gear in the lower section supporting base 20, lowering or hoisting gear includes pedestal 30, lift drive mechanism 31, sealing member 32 and cooling water pipeline 33, and wherein, pedestal 30 is positioned at the bottom supporting base 20, and is connected with supporting base 20;Lift drive mechanism 31 is connected with pedestal 30, and under the driving of lift drive mechanism 31, pedestal 30 drives support base 20 to rise or fall.During loading workpiece to be machined, pallet 23 is transmitted to the top supporting base 20 by the mechanical hand of conveying tray 23;Lift drive mechanism drives support base 20 to rise, so that it drives support column 22 to synchronize to rise, until support column 22 is by pallet 23 jack-up;The top of mechanical hand self-supporting base 20 is removed, and i.e. completes the loading of workpiece to be machined.
Sealing member 32 is arranged at pedestal 30 and supports between base 20, in order to by the gap sealing between pedestal 30 and support base 20.And, at the upper surface of pedestal 30 and the inner side of sealing member 32 or outside are provided with groove, or, supporting the lower surface of base 20 and the inner side of sealing member 32 or outside are being provided with groove, cooling water pipeline 33 is arranged at the inside of this groove, is passed through cooling water with coolant seal part 32 in cooling water pipeline 33.
In sum, the heater that the present invention provides, its heater element have employed the helical form radiant body of the centrage around pallet and the radially uniform winding along pallet, this is compared with linear fluorescent tube of the prior art, owing to single helical form radiant body can realize being distributed relative to pallet place uniform plane, thus it can not only be evenly towards the regional radiations heat energy of pallet, so that the temperature of pallet regional tends to uniform, and then the temperature homogeneity of the workpiece to be machined being placed on pallet can be improved, thus improve product quality;And; owing to above-mentioned helical form radiant body only has two terminals; that is: near pallet centrage the first terminals and near second terminals at edge of pallet; the negligible amounts of terminals; such that it is able to reduce the quantity of the conductive component being connected with terminals; and reduce for being coated with this conductive component to prevent the structural complexity of the protective cover of its vacuum sparking, and then difficulty of processing and the manufacturing cost of heater can be reduced.
The present invention also provides for a kind of plasma processing device, and it includes reaction chamber, and the bottom in reaction chamber is provided with heater, and this heater uses the above-mentioned heater that the present embodiment provides.
The above-mentioned plasma processing device that the present embodiment provides, its above-mentioned heater provided by using the present embodiment, it is possible not only to the regional of pallet is uniformly heated such that it is able to improve the temperature homogeneity of the workpiece to be machined being placed on pallet, and then product quality can be improved;Moreover, it is also possible to reduce difficulty of processing and the manufacturing cost of equipment.
It is understood that the principle that is intended to be merely illustrative of the present of embodiment of above and the illustrative embodiments that uses, but the invention is not limited in this.For those skilled in the art, without departing from the spirit and substance in the present invention, can make various modification and improvement, these modification and improvement are also considered as protection scope of the present invention.

Claims (9)

1. a heater, carries the pallet of workpiece to be machined for heating, and it includes Supporting base, support column and heating unit, wherein, described heating unit is arranged on described support The top of base;Described support column is fixing with described support base to be connected, and described support column Top higher than the top of described heating unit, in order to support described pallet;Described heating unit Including using the thermal-radiating mode heater element towards described pallet radiations heat energy, its feature exists In, described heater element includes helical form radiant body, and described helical form radiant body is around described torr The centrage of dish and the radially uniform winding along described pallet, and
Described helical form radiant body have near described pallet centrage the first terminals and The second terminals near the edge of described pallet;
The lower section of described support base is provided with lowering or hoisting gear, and described lowering or hoisting gear includes base Seat, lift drive mechanism, sealing member and cooling water pipeline, wherein
Described pedestal is connected with described support base, described lift drive mechanism and described pedestal Connecting, under the driving of described lift drive mechanism, described pedestal drives on described support base Rise or decline;
Described sealing member is arranged at described pedestal and supports between base, in order to by described pedestal And the gap sealing supported between base;
At the upper surface of described pedestal and it is provided with recessed against the inner side of described sealing member or outside Groove, or, at the lower surface of described support base and against the inner side of described sealing member or outside Being provided with groove, described cooling water pipeline is arranged at described inside grooves, at described cooling water pipe Cooling water it is passed through to cool down described sealing member in road.
Heater the most according to claim 1, it is characterised in that described heating unit Part is infrared radiation lamp or resistance wire.
Heater the most according to claim 1, it is characterised in that described heating unit Part also includes the first wiring, the second wiring, the first wiring protective hood and the second wiring protective hood, Wherein
The top of described first wiring protective hood is connected with described first terminals, and described first The bottom of wiring protective hood runs through described support base at the marginal position of described support base Thickness, and extend to the lower section of described support base;
Described first wiring is positioned at the inside of described first wiring protective hood, and described first connects One end of line is connected with described first terminals;
The top of described second wiring protective hood is connected with described second terminals, and described second The bottom of wiring protective hood runs through described support base at the marginal position of described support base Thickness, and extend to the lower section of described support base;
Described second wiring is positioned at the inside of described second wiring protective hood, and described second connects One end of line is connected with described second terminals;
Described first wiring protective hood and the second wiring protective hood use pottery or quartz to make.
Heater the most according to claim 3, it is characterised in that described heating list Unit also includes: conductive component, vacuum electrode and power supply, wherein
Described vacuum electrode is fixed on described support base, and the top of described vacuum electrode Higher than the upper surface of described support base, the bottom of described vacuum electrode is less than described support base Lower surface;
The other end of described first wiring and the other end of the second wiring are each passed through described first Wiring protective hood and the second wiring protective hood, and by described conductive component and described vacuum electrode Top electrical connection;
Described power supply electrically connects with the bottom of described vacuum electrode, and it is for described heating unit Part provides electric energy.
Heater the most according to claim 4, it is characterised in that described heating list Unit also includes that described conductive component is coated with by conductive component protective cover, described conductive component protective cover Get up;
Described conductive component protective cover uses pottery or quartz to make.
Heater the most according to claim 5, it is characterised in that described conductive part Part protective cover is to be coated on the insulating barrier outside described conductive component by what ceramic fine bead was formed.
Heater the most according to claim 4, it is characterised in that described heating list Unit also includes that the top of described vacuum electrode is coated with by electrode protection cover, described electrode protection cover Come;
Described electrode protection cover uses pottery or quartz to make.
Heater the most according to claim 1, it is characterised in that described in add hot charging Putting and also include support member, described support member is used for supporting described helical form radiant body, to incite somebody to action It is fixed on the top of described support base.
9. a plasma processing device, it includes reaction chamber, at described reaction chamber Interior bottom is provided with heater, it is characterised in that described heater uses claim Heater described in 1-8 any one claim.
CN201210457542.2A 2012-11-14 2012-11-14 Heater and plasma processing device Active CN103811246B (en)

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JP2018531324A (en) * 2015-10-09 2018-10-25 北京北方華創微電子装備有限公司Beijing Naura Microelectronics Equipment Co., Ltd. Heating device and heating chamber
CN106801222B (en) * 2015-11-26 2018-06-19 中晟光电设备(上海)股份有限公司 A kind of chip tray and MOCVD systems

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EP1046729A1 (en) * 1994-11-30 2000-10-25 Applied Materials, Inc. CVD processing chamber

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JPH03270012A (en) * 1990-03-19 1991-12-02 Fujitsu Ltd Semiconductor manufacturing apparatus
JPH0471228A (en) * 1990-07-12 1992-03-05 Sumitomo Electric Ind Ltd Lamp annealing equipment
JP3275330B2 (en) * 1991-09-26 2002-04-15 株式会社日立国際電気 Semiconductor manufacturing equipment
JP2006310535A (en) * 2005-04-28 2006-11-09 Hitachi Kokusai Electric Inc Substrate processor

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Address after: 100176 No. 8 Wenchang Avenue, Beijing economic and Technological Development Zone

Patentee after: Beijing North China microelectronics equipment Co Ltd

Address before: 100176 Beijing economic and Technological Development Zone, Wenchang Road, No. 8, No.

Patentee before: Beifang Microelectronic Base Equipment Proces Research Center Co., Ltd., Beijing

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