US20120114855A1 - Coating installation and coating method - Google Patents

Coating installation and coating method Download PDF

Info

Publication number
US20120114855A1
US20120114855A1 US13/375,926 US201013375926A US2012114855A1 US 20120114855 A1 US20120114855 A1 US 20120114855A1 US 201013375926 A US201013375926 A US 201013375926A US 2012114855 A1 US2012114855 A1 US 2012114855A1
Authority
US
United States
Prior art keywords
activation element
recipient
contact elements
coating device
contact
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
US13/375,926
Inventor
Tino Harig
Markus Höfer
Artur Laukart
Lothar Schäfer
Markus Armgardt
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fraunhofer Gesellschaft zur Forderung der Angewandten Forschung eV
Original Assignee
Fraunhofer Gesellschaft zur Forderung der Angewandten Forschung eV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fraunhofer Gesellschaft zur Forderung der Angewandten Forschung eV filed Critical Fraunhofer Gesellschaft zur Forderung der Angewandten Forschung eV
Assigned to FRAUNHOFER-GESELLSCHAFT ZUR FORDERUNG DER ANGEWANDTEN FORSCHUNG E.V. reassignment FRAUNHOFER-GESELLSCHAFT ZUR FORDERUNG DER ANGEWANDTEN FORSCHUNG E.V. ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). Assignors: ARMGARDT, MARKUS, HARIG, TINO, HOFER, MARKUS, LAUKART, ARTUR, SCHAFER, LOTHAR
Publication of US20120114855A1 publication Critical patent/US20120114855A1/en
Abandoned legal-status Critical Current

Links

Images

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/46Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for heating the substrate
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/24Deposition of silicon only
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/26Deposition of carbon only
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/26Deposition of carbon only
    • C23C16/27Diamond only
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/26Deposition of carbon only
    • C23C16/27Diamond only
    • C23C16/271Diamond only using hot filaments
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/28Deposition of only one other non-metal element
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104Forming layers
    • H01L21/02365Forming inorganic semiconducting materials on a substrate
    • H01L21/02612Formation types
    • H01L21/02617Deposition types
    • H01L21/0262Reduction or decomposition of gaseous compounds, e.g. CVD

Abstract

A coating method can use a coating device containing at least one recipient which can be evacuated and which is adapted to accommodate a substrate, at least one gas supply device which is used to introduce at least one gaseous precursor into the recipient and at least one heatable activation element which has a definable longitudinal extension and which is fastened by means of at least one associated mechanical fastening device. Electric current can be supplied to the activation element via at least two contact elements and the contact elements are fastened so as to be virtually immobile relative to the recipient. The activation element is arranged so as to be mobile relative to the recipient.

Description

    BACKGROUND
  • The invention relates to a coating device, comprising at least one recipient (10), which can be evacuated and which is adapted to receive a substrate (30), at least one gas supply device (20, 21, 22), being adapted to introduce at least one gaseous precursor into the recipient (10), and at least one heatable activation element (40), which has a predeterminable longitudinal extent and is fastened by means of at least one dedicated mechanical fastening device. The invention also relates to a corresponding coating method.
  • Coating devices of the type mentioned are intended according to the prior art for coating a substrate by means of a hot-wire activated chemical vapor deposition. The deposited layers may, for example, comprise carbon, silicon or germanium. Correspondingly, the gaseous precursors may, for example, comprise methane, monosilane, monogermanium, ammonia or trimethylsilane.
  • K. Honda, K. Ohdaira and H. Matsumura, Jpn. J. App. Phys., Vol. 47, No. 5, discloses using a coating device of the type mentioned at the beginning for depositing silicon. For this purpose, silane (SiH4) is supplied as a precursor by means of the gas supply device. According to the prior art, the precursor is disassociated and activated at the heated tungsten surface of an activation element, so that a layer of silicon or a layer comprising silicon can be deposited on a substrate.
  • However, a disadvantage of the cited prior art is that an undesired reaction of the material of the activation element with the precursor takes place, particularly at the colder clamping points of the activation element.
  • For example, the use of a silane compound as a precursor may lead to the formation of silicide phases on the activation element.
  • The silicide phases occurring during the reaction generally lead to changes in volume of the activation element, are brittle in comparison with the starting material and cannot withstand such great mechanical forces, and they often exhibit a changed electrical resistance. This has the effect that the activation element is often already destroyed after being in operation for a few hours. For example, the activation element may be used under mechanical prestress in the recipient and rupture under the influence of this mechanical prestress. In order to prevent rupturing of the activation element under mechanical prestress, the prior art proposes flushing the clamping points with an inert gas. Although the prior art does show that the service life is extended to a limited extent, this is still insufficient when performing relatively long coating processes or for carrying out a number of shorter coating processes one directly after the other. Furthermore, the inert gas that is used influences the coating process.
  • The invention is consequently based on the object of extending the service life of an activation element in a coating device for hot-wire activated chemical vapor deposition without disadvantageously influencing the coating process. The object of the invention is also to increase the stability of the process and/or to simplify the control of the process.
  • SUMMARY
  • According to the invention, it is proposed in a way known per se to introduce a substrate to be coated into a recipient which can be evacuated. The recipient may, for example, consist of aluminum, high-grade steel, ceramic and/or glass. The recipient is closed off in a substantially airtight manner in a way known per se, for example by sealing elements of metal or polymer or by welded and soldered or brazed connections. The recipient may be evacuated by means of a vacuum pump.
  • At least one gaseous precursor with a predeterminable partial pressure is introduced into the recipient by way of a gas supply device. For example, the precursor may comprise methane or other hydrocarbons, silanes, germaniums, ammonia, trimethylsilane, oxygen and/or hydrogen.
  • For the depositing of a layer, at least one activation element arranged in the space inside the recipient is heated. In some embodiments of the invention, the heating of the activation element may be performed by electron-impact heating and/or electrical resistance heating. The activation element substantially comprises a refractory metal. This may be selected from the group comprising molybdenum, niobium, tungsten, tantalum or an alloy of these metals. In addition, the activation element may comprise further chemical elements, which either represent unavoidable impurities or, as an alloying constituent, adapt the properties of the activation element to the desired properties. The activation element may take the form of a wire, a plate, a tube, a cylinder and/or further, more complex geometries.
  • At the surface of the activation element, the molecules of the gaseous precursor are at least partially disassociated or excited. The excitation and/or disassociation may be enhanced by catalytic properties of the surface of the activation element. The molecules activated in this way reach the surface of the substrate, where they form the desired coating. In addition, molecules of the gaseous precursor may be at least partially reacted with the material of the activation element. Depending on the temperature of the activation element, the excitation and/or the disassociation and/or the reaction with the material of the activation element may be suppressed or accelerated.
  • In order to supply an electrical current to the activation element, at least two contact elements are provided, by means of which the activation element can be connected to an electrical current or voltage source. In an activation element with a homogeneous material composition and constant cross section, the thermal energy deposited when an electrical current flows through is introduced uniformly along the longitudinal extent.
  • On account of the increased thermal conductivity and/or the increased heat dissipation of the contact element, the activation element may have a lower temperature in a portion near the contact element, as compared with a portion at a greater distance from the contact element. In this case, the temperature of the activation element may fall so far in a portion near the contact element that the material of the activation element preferentially undergoes a chemical reaction with the precursor. For example, an activation element comprising tungsten may form a tungsten-silicide phase with a precursor comprising silicon.
  • To solve this problem, it is proposed according to the invention to move the activation element by means of a movable fastening device over fixed contact elements, so that these contact the activation element at changing contact points. The relative movement has the effect that the shifting of the contact element is accompanied by a shifting of those points at which the activation element has a reduced temperature. As a result, the activation element does not undergo an undesired phase transformation or acceleration of such a phase transformation at the same place during the entire duration of the coating process.
  • In some embodiments of the invention, an initially occurring undesired phase transformation, for example the formation of a carbide or silicide, can also be reversed again if the surface area or partial portion of the activation element that has been transformed in an undesired way is subsequently heated up to an elevated temperature. In this way, the lifetime of the activation element can be increased.
  • According to the invention, the formation of changing contact points is brought about by movement of the activation element which is imparted by way of a movement of the fastening device, whereas the contact elements remain immovable in relation to the surrounding recipient. In the sense of the present description, the contact element is also immovable whenever it undergoes a small change in length due to thermal expansion or comprises a holding device which can compensate for a thermal expansion.
  • In some embodiments of the invention, an elongate activation element may have a greater length than the region used for activating the precursor. However, the activation element is always arranged completely in the recipient and not for instance accommodated in a reservoir. By displacing the activation element, a respectively changing partial portion of the activation element is heated. Since the contact elements are fixedly arranged, the heated partial portion that is arranged between the contact elements remains constant. This simplifies the electrical control of the power consumption and/or the temperature of the activation element. The displacement of the activation element in relation to the contact element can be imparted by a translation of the fastening device and/or a rotation of the fastening device. In the latter case, the activation element may be formed as an endless ring or a loop.
  • In some embodiments of the invention, the activation element may comprise at least one wire. In the sense of the present invention, a wire may have a round, oval or polygonal cross section. In this way, the ratio of surface to volume of the activation element can be increased. In some embodiments of the invention, such an activation element may be guided or deflected by way of at least one roller. The roller may be part of a contact element and/or a fastening device.
  • BRIEF DESCRIPTION OF THE DRAWINGS
  • The invention is intended to be explained in more detail below on the basis of exemplary embodiments and figures, without restricting the general concept of the invention. In the figures:
  • FIG. 1 shows the basic structure of a coating device according to the invention,
  • FIG. 2 illustrates a plan view of activation elements which are led endlessly through the active zone,
  • FIG. 3 shows an exemplary embodiment of an activation element proposed according to the invention, wherein the movement is imparted by a translation of the fastening device,
  • FIG. 4 shows an embodiment wherein a movable activation element is led over a number of fixed contact elements.
  • DESCRIPTION OF PREFERRED EMBODIMENTS
  • FIG. 1 shows a cross section through a coating device 1. The coating device 1 comprises a recipient 10, which is, for example, produced from high-grade steel, aluminum, glass or a combination of these materials. The recipient 10 is closed off from the surroundings in a substantially airtight manner. A vacuum pump (not represented) may be connected by way of a pump flange 103. For example, the recipient 10 may be evacuated to a pressure of less than 100 mbar, less than 10−2 mbar or less than 10−6 mbar.
  • Inside the recipient 10 there is a holding device 104, wherein a substrate 30 may be mounted. The substrate 30 may, for example, consist of glass, silicon, plastic, ceramic, metal or an alloy. The substrate may be a semiconductor wafer, an architectural glass or a tool. It may have a planar or curved surface. The materials mentioned are only mentioned here by way of example. The invention does not teach the use of a specific substrate as a principle for providing a solution. During the operation of the coating device 1, a coating 105 is deposited on the substrate 30.
  • The composition of the coating 105 is influenced by the choice of the gaseous precursor. In one embodiment of the invention, the precursor may comprise methane, so that the coating 105 comprises diamond or diamond-like carbon. In another embodiment of the invention, the precursor may comprise monosilane and/or monogermanium, so that the coating comprises crystalline or amorphous silicon and/or germanium.
  • The gaseous precursor is introduced into the interior of the recipient 10 by way of at least one gas supply device 20. The gas supply device 20 obtains the gaseous precursor from a storage vessel 21. The amount of precursor taken from the storage vessel 21 can be influenced by way of a control valve 22. If the coating 105 is made up of a number of different precursors, the storage vessel 21 may comprise a prepared gas mixture, or else a number of gas supply devices 20 may be provided, each introducing a component of the made-up precursor into the recipient 10.
  • The amount of precursor supplied to the gas supply device 20 by way of the control valve 22 is monitored by way of a control device 101. The control device 101 is supplied with an actual value of a partial or absolute pressure by a measuring device 100.
  • For the activation of the gaseous precursor, an activation element 40 is available. The activation element 40 comprises one or more catalytically active surfaces, for example in the form of a metal sheet or a wire. For example, the activation element 40 may comprise tungsten, molybdenum, and niobium and/or tantalum. During the operation of the activation element, there forms inside the recipient 10 an active zone 50, wherein disassociated and/or excited constituents of the precursor are detectable.
  • The activation element 40 is fastened to at least one fastening device 44. The fastening device 44 guides the activation element 40 to a predeterminable position and/or with a predeterminable mechanical stress. At least one fastening device 44 may be configured in an electrically insulated manner, in order to bring the activation element at least partially to a predeterminable electrical potential.
  • The activity of the surface of the activation element 40 is achieved at an elevated temperature in comparison with room temperature. For the heating of the activation element 40, it is envisaged according to FIG. 1 to provide at least two electrical contact elements 43. At least one contact element 43 may be connected to a power source 107 by means of a vacuum-tight leadthrough 108. In this case, the heating of the activation element 40 is performed by resistance heating. If the activation element consists of a homogeneous material and has a uniform thickness, the heating power E introduced along the longitudinal extent x of the activation element is constant:
  • E x = const .
  • On account of the heat conduction and/or heat radiation of the fastening devices 44 and/or the contact elements 43, the temperature of the activation element 40 decreases from the geometrical center to the periphery if the heating power is substantially constant over the length of the wire. In this case, a temperature at which the material of the activation element 40 is reacted at an accelerated rate with the gaseous precursor to form undesired phases, for example carbides and/or silicides and/or germanides, may be established near the contact element 43.
  • In order to minimize the harmful influence of the precursor on the activation element, it is proposed according to FIG. 1 to use an activation element 40 of which the geometrical dimensions are greater than the dimensions of the active zone 50. The activation element 40 is mounted inside the recipient 10 in an electrically insulated manner by means of the fastening devices 44. The two contact elements 43 lie in contact with the activation element 40, for example, by way of rollers, rolls, sliding contacts or similar elements.
  • The contact elements 43 are installed substantially fixedly in the recipient. The spacing of the contact elements 43 determines the length of the partial portion of the activation element 40 that is heated by current flow.
  • The fastening devices 44 are movable along a transporting direction 49, which may in some embodiments run along the longitudinal extent of the activation element 40. The movement of the fastening devices 44 along the transporting direction 49 may be harmonic or anharmonic, and take place continuously or with intermittent breaks.
  • The movement of the fastening devices 44 has the effect that the location of lower temperature that forms near the contact point of the contact element 43 on the activation element 40 is locally variable. In this way, the harmful influence of the precursor on the activation element 40 is distributed over a greater surface area or longitudinal portion of the activation element, so that the overall lifetime of the activation element is increased. In some embodiments of the invention, it may additionally be provided that a region that is damaged in the presence of the precursor at low temperatures is regenerated again by increasing the temperature when moving the contact element 43 away, in that the undesired phases of the activation element 40 undergo a renewed reaction.
  • FIG. 2 shows a further embodiment of an activation element 40. In this embodiment of the invention, the active surface of the activation element 40 is formed by a wire 41, which, for example, comprises tungsten, niobium, molybdenum or tantalum. The cross section may be polygonal or round, so that the visual impression of a strip can be obtained.
  • The activation element 40 according to FIG. 6 comprises three wires 41 a, 41 b and 41 c. The ends of each individual wire are connected to one another, for example by spot welding, so that an endless loop is obtained. Each of these endless loops is led over two rollers 46, which form both the contact element 43 and the holding element 44. The two rollers 46 dedicated to a wire 41 a, 41 b or 41 c lie at different electrical potentials, so that through the respective wire 41 there flows an electrical current, which heats the wire 41. In this way there forms between the wires 41 a, 41 b and 41 c and the surface of the substrate 30 once again an active zone 50, wherein the disassociated and/or excited molecules for the depositing of a layer are detectable.
  • On account of the heat removal by way of the rollers 46, the temperature of the wire 41 decreases from the center of the active zone to the peripheral region with the rollers 46. In order to slow down or prevent the embrittlement or rupture of the wire 41, it is proposed to set at least one roller 46 in rotation, for example by means of an electric motor or a spring tensioning means. In this way, the wire 41 cyclically passes through the region with the least heat removal and the highest temperature at the center of the active zone 50 and the region with the greatest heat removal and the lowest temperature at the rollers 46. In this way, undesired carbide, germanide or silicide phases, which form in the colder region near the rollers 46, can be reduced again in the center of the active zone 50. At least, however, the wire 41 undergoes a uniform reaction over its entire length, so that the lifetime thereof to mechanical failure is increased. The uniform aging of the wire has the effect that its electrical properties change only slowly, so that the monitoring of the coating process can be simplified.
  • The embodiment according to FIG. 3 shows an activation element 40, which comprises a wire 41, in three different phases of movement. In a first position, which is represented at the top in FIG. 3, the fastening devices 44 are in a neutral position, which is illustrated by the lines 200. Stretched between the fastening devices 44 is the wire 41, which provides the active surface of the activation element 40. The spacing of the two fastening devices 44 is substantially constant, but in some embodiments it may be provided that the spacing is variable to a slight extent to compensate for thermal expansion. In this case, a device which ensures a constant mechanical stress of the wire 41, for example by means of at least one spring, may be integrated.
  • As already explained in conjunction with FIG. 1, two contact elements 43 are provided, arranged substantially fixedly inside the recipient. In the case represented, one contact element 43 comprises a roller 46, which is rotatably fastened on a roller mount 47.
  • The circumferential surface of the roller may incorporate a groove, in order to prevent the wire 41 from running off the roller 46. A potential difference is applied to two contact elements 46 by means of a power source 107. The circuit closes by way of the wire 41, so that the heated partial portion of the activation element 40 comes to lie between the contact elements.
  • As can be seen in the middle representation of FIG. 3, the fastening devices 44 can be moved to the left from the neutral position along the direction of movement 49. This has the effect of displacing the heated, and consequently active, partial portion of the activation element. However, the overall length of the partial portion remains constant, so that simple control of the temperature or the power requirement is made possible. In this way, the harmful influence of the precursor on the activation element 40 is distributed over a larger surface area or longitudinal portion of the activation element, so that the overall lifetime of the activation element is increased. In some embodiments of the invention, it may additionally be provided that a region that is damaged in the presence of the precursor at low temperatures is regenerated again by increasing the temperature when moving the contact element 43 away, in that the undesired phases of the activation element 40 undergo a renewed reaction.
  • As can be seen in the lower representation of FIG. 3, when an end position is reached, the direction of movement can be reversed, so that the fastening devices are moved to the right. This has the effect of displacing the heated, and consequently active, partial portion of the activation element. However, the overall length of the partial portion and the relative position thereof with respect to the recipient remain constant. After reaching the end position represented in the figure, the direction of movement can change once again, so that the positions represented in FIG. 3 are passed through cyclically. The movement may in this case take place continuously or discontinuously.
  • The embodiment according to FIG. 4 shows an activation element 40, which comprises a wire 41, in three different phases of movement. In a first position, which is represented in FIG. 4 a, the fastening devices 44 are in a neutral position. Stretched between the fastening devices 44 is the wire 41, which provides the active surface of the activation element 40. The spacing of the two fastening devices 44 is substantially constant, as explained in conjunction with FIG. 3.
  • The activation element 40 is led over four contact elements 43 or two pairs of contact elements, which are arranged substantially fixedly within the recipient. In the case represented, one contact element 43 comprises a roller 46, which is rotatably mounted. The circumferential surface of the roller may incorporate a groove, in order to prevent the wire 41 from running off the roller 46. A potential difference is respectively applied to two contact elements 43 by means of a power source (not represented), so that a predeterminable electrical power is deposited in each partial portion between two contact elements 43. The circuit closes by way of the wire 41, so that the heated partial portion of the activation element 40 comes to lie between the contact elements. Between the respectively outermost contact element 43 and the fastening device 44 there is an unheated partial portion.
  • As can be seen in FIG. 4 b, the fastening devices 44 can be moved to the left from the neutral position along the direction of movement 49. This has the effect of displacing the heated, and consequently active, partial portion of the activation element. However, the overall length of the partial portion remains constant, so that simple control of the temperature or the power requirement is made possible. Similarly, the position of the partial portion and consequently the position of the active zone 50 within the recipient remain constant. Nevertheless, the harmful influence of the precursor on the activation element 40 is distributed over a larger surface area or longitudinal portion of the activation element, so that the overall lifetime of the activation element is increased. In some embodiments of the invention, it may additionally be provided that a region that is damaged in the presence of the precursor at low temperatures is regenerated again by increasing the temperature when moving the contact element 43 away, in that the undesired phases of the activation element 40 undergo a renewed reaction.
  • As can be seen in FIG. 4 c, when an end position is reached, the direction of movement can be reversed, so that the fastening devices 44 are moved to the right. This has the effect of displacing the heated, and consequently active, partial portion of the activation element. However, the overall length of the partial portion and the relative position thereof with respect to the recipient remain constant. After reaching the end position represented in the figure, the direction of movement can change once again, so that the positions represented in FIGS. 4 a to 4 c are passed through cyclically. The movement may in this case take place continuously or discontinuously.
  • In some embodiments, the overall length of the activation element is intended to be arranged within the recipient and to run in a substantially stretched-out manner. This allows the overall available length to be used cyclically for the activation of the vapor phase, without the wire 41 having to be wound up in a reservoir or unwound from a reservoir. The reliability of the device can be increased as a result.
  • It goes without saying that the features represented in FIGS. 1 to 4 may also be combined in order in this way to obtain further embodiments of the activation element according to the invention or of the proposed coating device. Therefore, the above description should not be regarded as restrictive, but as explanatory. The claims which follow should be understood as meaning that a feature which is mentioned is present in at least one embodiment of the invention. This does not exclude the presence of further features. Wherever the claims define “first” and “second” features, this designation serves for distinguishing between two identical features, without giving them any priority.

Claims (22)

1.-16. (canceled)
17. A coating device, comprising at least one recipient, which can be evacuated and which is adapted to receive a substrate, at least one gas supply device, being adapted to introduce at least one gaseous precursor into the recipient, and at least one heatable activation element, which has a predeterminable longitudinal extent and is fastened by means of at least one dedicated mechanical fastening device, wherein an electrical current can be supplied to the activation element by means of at least two contact elements, the contact elements being fastened nearly immovably in relation to the recipient and the activation element being arranged movably in relation to the recipient.
18. The coating device according to claim 17, wherein the longitudinal extent of the activation element is arranged completely inside the recipient.
19. The coating device according to claim 17, wherein the activation element comprises at least one wire.
20. The coating device according to claims 17, wherein the contact element comprises at least one roller, which is provided for being in contact with the activation element.
21. The coating device according to claim 19, wherein the wire is led repeatedly through the active zone.
22. The coating device according to claim 17, wherein a plurality of contact elements to which a predeterminable electrical potential difference can be respectively applied are arranged along the longitudinal extent of the activation element.
23. The coating device according to claim 17, wherein the mechanical fastening device is electrically insulated.
24. The coating device according to claim 17, wherein the activation element can be moved in relation to the recipient by a translatory movement of the mechanical fastening device.
25. The coating device according to claim 17, wherein the activation element can be moved inside the recipient by a rotation of the mechanical fastening device.
26. A coating device, comprising at least one recipient, which can be evacuated and which is adapted to receive a substrate, at least one gas supply device, being adapted to introduce at least one gaseous precursor into the recipient, and at least one heatable activation element, which has a predeterminable longitudinal extent and is fastened by means of at least one dedicated mechanical fastening device, wherein an electrical current is supplyable to the activation element by means of at least two contact elements, the contact elements being fastened nearly immovably in relation to the recipient and the activation element being arranged movably in relation to the recipient, wherein the movement of the activation element is induced by a movement of the mechanical fastening device.
27. The coating device according to claim 26, wherein the activation element comprises at least one wire.
28. The coating device according to claims 26, wherein the contact element comprises at least one roller, which is provided for being in contact with the activation element.
29. The coating device according to claim 27, wherein a plurality of contact elements are arranged along the longitudinal extent of the activation element, said contact elements being adapted to be supplied by a respective electrical potential difference.
30. The coating device according to claim 26, wherein the activation element is movable in relation to the recipient by a translatory movement of the mechanical fastening device and/or the activation element is movable inside the recipient by a rotation of the mechanical fastening device.
31. A method for producing a coating on a substrate, wherein the substrate is introduced into a recipient which can be evacuated and at least one gaseous precursor is introduced into the recipient by way of at least one gas supply device and is activated by means of at least one electrically heated activation element, wherein an electrical current is supplied to the activation element by means of at least two contact elements, wherein at least one of the contact elements is arranged nearly fixedly in the recipient and the activation element is moved in relation to the recipient.
32. The method according to claim 31, wherein the movement is performed in an oscillating manner.
33. The method according to claim 31, wherein the activation element is moved in the recipient by a rotation of the mechanical fastening device.
34. The method according to claim 31, wherein the activation element is moved in relation to the recipient by a translatory movement of the mechanical fastening device.
35. The method according to claim 31, wherein the activation element comprises at least one wire.
36. The method according to claim 35, wherein the wire repeatedly passes the active zone.
37. The process according to claim 31, wherein a plurality of contact elements along the longitudinal extent of the activation element are in contact with the latter and a predeterminable electrical potential difference is applied to each contact element.
US13/375,926 2009-06-02 2010-05-17 Coating installation and coating method Abandoned US20120114855A1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE102009023471A DE102009023471B4 (en) 2009-06-02 2009-06-02 Coating plant and process
DE102009023471.3 2009-06-02
PCT/EP2010/056719 WO2010139547A1 (en) 2009-06-02 2010-05-17 Coating installation and coating method

Publications (1)

Publication Number Publication Date
US20120114855A1 true US20120114855A1 (en) 2012-05-10

Family

ID=42543130

Family Applications (2)

Application Number Title Priority Date Filing Date
US13/375,971 Active 2032-06-20 US8986452B2 (en) 2009-06-02 2010-05-13 Coating device and coating method
US13/375,926 Abandoned US20120114855A1 (en) 2009-06-02 2010-05-17 Coating installation and coating method

Family Applications Before (1)

Application Number Title Priority Date Filing Date
US13/375,971 Active 2032-06-20 US8986452B2 (en) 2009-06-02 2010-05-13 Coating device and coating method

Country Status (7)

Country Link
US (2) US8986452B2 (en)
EP (2) EP2438206B1 (en)
JP (2) JP5540084B2 (en)
KR (2) KR20120027300A (en)
CN (2) CN102459694B (en)
DE (1) DE102009023471B4 (en)
WO (2) WO2010139543A1 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20110287192A1 (en) * 2008-11-24 2011-11-24 Cemecon Ag Device and method for coating a substrate using cvd

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102009023471B4 (en) 2009-06-02 2012-08-30 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Coating plant and process
KR20140023325A (en) * 2011-03-22 2014-02-26 어플라이드 머티어리얼스, 인코포레이티드 Apparatus and method for coating using a hot wire
JP6322131B2 (en) * 2014-12-24 2018-05-09 東京エレクトロン株式会社 Silicon film forming method and film forming apparatus

Citations (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4422918A (en) * 1980-01-25 1983-12-27 Inoue-Japax Research Incorporated Current-conducting assembly for a traveling wire-electrode
US4661690A (en) * 1983-10-24 1987-04-28 Matsushita Electric Industrial Co., Ltd. PTC heating wire
US4733038A (en) * 1985-11-22 1988-03-22 Charmilles Technologies S.A. Contact member for supplying electrical current to an electro-erosion wire electrode
JPS63186763A (en) * 1987-01-28 1988-08-02 Sumitomo Bakelite Co Ltd Polyamide resin composition
US5424096A (en) * 1994-02-14 1995-06-13 General Electric Company HF-CVD method for forming diamond
JPH07254566A (en) * 1994-03-16 1995-10-03 Fuji Electric Co Ltd Thin film forming apparatus
US5833753A (en) * 1995-12-20 1998-11-10 Sp 3, Inc. Reactor having an array of heating filaments and a filament force regulator
US6045877A (en) * 1997-07-28 2000-04-04 Massachusetts Institute Of Technology Pyrolytic chemical vapor deposition of silicone films
US6427622B2 (en) * 1998-08-28 2002-08-06 Mv Systems, Inc. Hot wire chemical vapor deposition method and apparatus using graphite hot rods
US20040083965A1 (en) * 2002-11-06 2004-05-06 Luping Wang Vapor delivery system for solid precursors and method of using same
US20050152826A1 (en) * 2002-02-28 2005-07-14 Qinetiq Limited Method and apparatus for the production of carbon nanostructures
US20080095937A1 (en) * 2006-05-18 2008-04-24 California Institute Of Technology Robust filament assembly for a hot-wire chemical vapor deposition system
JP2008140945A (en) * 2006-11-30 2008-06-19 Sanyo Electric Co Ltd cat-CVD DEVICE AND FILAMENT REPLACEMENT METHOD
US20090023274A1 (en) * 2007-07-07 2009-01-22 Xinmin Cao Hybrid Chemical Vapor Deposition Process Combining Hot-Wire CVD and Plasma-Enhanced CVD
US20100047475A1 (en) * 2008-08-22 2010-02-25 Ray Paul Durman Coated filaments and their manufacture
WO2010139547A1 (en) * 2009-06-02 2010-12-09 Fraunhofer Gesellschaft zur Förderung der angewandten Forschung e.V. Coating installation and coating method
US20110318490A1 (en) * 2009-03-02 2011-12-29 Fraunhofer Gesellschaft zur Förderung der angewandten Forschung e.V. Method for depositing a coating
US20120107501A1 (en) * 2009-06-02 2012-05-03 Tino Harig Coating device and coating method
US20120135144A1 (en) * 2009-06-02 2012-05-31 Tino Harig Coating device and coating method

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
ZA877921B (en) * 1986-12-22 1988-04-21 General Electric Company Condensate diamond
JPH0421777A (en) * 1990-05-14 1992-01-24 Seiko Instr Inc Device for synthesizing diamond
DE19809675C1 (en) * 1998-03-06 1999-11-25 Fraunhofer Ges Forschung Apparatus and method for diamond coating of tubular components of limited length
JP3780364B2 (en) * 2000-09-14 2006-05-31 国立大学法人北陸先端科学技術大学院大学 Heating element CVD equipment
JP4435395B2 (en) * 2000-09-14 2010-03-17 キヤノンアネルバ株式会社 Heating element CVD equipment
KR100382943B1 (en) * 2001-02-26 2003-05-09 프리시젼다이아몬드 주식회사 A chemical vapor deposition apparatus
JP3775500B2 (en) * 2002-03-12 2006-05-17 ソニー株式会社 Method and apparatus for forming semiconductor thin film, and catalyst nozzle
US20040182600A1 (en) * 2003-03-20 2004-09-23 Fujitsu Limited Method for growing carbon nanotubes, and electronic device having structure of ohmic connection to carbon element cylindrical structure body and production method thereof
KR100688838B1 (en) 2005-05-13 2007-03-02 삼성에스디아이 주식회사 Apparatus for catalyst enhanced chemical vapor deposition and the catalyst enhanced chemical vapor deposition method
CN100412231C (en) 2006-03-27 2008-08-20 南京航空航天大学 Hot wire for diamond film growth device and electrode structure thereof
JP2009235426A (en) * 2006-06-22 2009-10-15 Japan Advanced Institute Of Science & Technology Hokuriku Method for preventing denaturation of catalyst body in catalytic chemical vapor deposition process
TW200809924A (en) * 2006-08-09 2008-02-16 Kinik Co Chemical vapor thin film deposition device
TW200811310A (en) 2006-08-23 2008-03-01 Kinik Co Apparatus for chemical gas phase thin film sedimentation
JP4856010B2 (en) * 2007-06-04 2012-01-18 株式会社アルバック Catalytic chemical vapor deposition system
EP2098608A1 (en) 2008-03-05 2009-09-09 Applied Materials, Inc. Coating apparatus with rotation module
JP2009038398A (en) 2008-11-04 2009-02-19 Canon Anelva Corp Method for fabricating silicon film and silicon nitride film

Patent Citations (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4422918A (en) * 1980-01-25 1983-12-27 Inoue-Japax Research Incorporated Current-conducting assembly for a traveling wire-electrode
US4661690A (en) * 1983-10-24 1987-04-28 Matsushita Electric Industrial Co., Ltd. PTC heating wire
US4733038A (en) * 1985-11-22 1988-03-22 Charmilles Technologies S.A. Contact member for supplying electrical current to an electro-erosion wire electrode
JPS63186763A (en) * 1987-01-28 1988-08-02 Sumitomo Bakelite Co Ltd Polyamide resin composition
US5424096A (en) * 1994-02-14 1995-06-13 General Electric Company HF-CVD method for forming diamond
JPH07254566A (en) * 1994-03-16 1995-10-03 Fuji Electric Co Ltd Thin film forming apparatus
US5833753A (en) * 1995-12-20 1998-11-10 Sp 3, Inc. Reactor having an array of heating filaments and a filament force regulator
US6045877A (en) * 1997-07-28 2000-04-04 Massachusetts Institute Of Technology Pyrolytic chemical vapor deposition of silicone films
US6427622B2 (en) * 1998-08-28 2002-08-06 Mv Systems, Inc. Hot wire chemical vapor deposition method and apparatus using graphite hot rods
US20050152826A1 (en) * 2002-02-28 2005-07-14 Qinetiq Limited Method and apparatus for the production of carbon nanostructures
US20040083965A1 (en) * 2002-11-06 2004-05-06 Luping Wang Vapor delivery system for solid precursors and method of using same
US20080095937A1 (en) * 2006-05-18 2008-04-24 California Institute Of Technology Robust filament assembly for a hot-wire chemical vapor deposition system
JP2008140945A (en) * 2006-11-30 2008-06-19 Sanyo Electric Co Ltd cat-CVD DEVICE AND FILAMENT REPLACEMENT METHOD
US20090023274A1 (en) * 2007-07-07 2009-01-22 Xinmin Cao Hybrid Chemical Vapor Deposition Process Combining Hot-Wire CVD and Plasma-Enhanced CVD
US20100047475A1 (en) * 2008-08-22 2010-02-25 Ray Paul Durman Coated filaments and their manufacture
US20110318490A1 (en) * 2009-03-02 2011-12-29 Fraunhofer Gesellschaft zur Förderung der angewandten Forschung e.V. Method for depositing a coating
WO2010139547A1 (en) * 2009-06-02 2010-12-09 Fraunhofer Gesellschaft zur Förderung der angewandten Forschung e.V. Coating installation and coating method
DE102009023471A1 (en) * 2009-06-02 2010-12-09 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Coating plant and process
US20120100310A1 (en) * 2009-06-02 2012-04-26 Tino Harig Coating device and coating method
US20120107501A1 (en) * 2009-06-02 2012-05-03 Tino Harig Coating device and coating method
US20120135144A1 (en) * 2009-06-02 2012-05-31 Tino Harig Coating device and coating method

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
Korean Intellectual Property Office, 5 June 2013 Notice of Preliminary Rejection, Korean Application 10-2011-7028817 *

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20110287192A1 (en) * 2008-11-24 2011-11-24 Cemecon Ag Device and method for coating a substrate using cvd
US9127350B2 (en) * 2008-11-24 2015-09-08 Diaccon Gmbh Device and method for coating a substrate using CVD

Also Published As

Publication number Publication date
JP5540084B2 (en) 2014-07-02
DE102009023471B4 (en) 2012-08-30
EP2438207A1 (en) 2012-04-11
JP2012528936A (en) 2012-11-15
JP2012528937A (en) 2012-11-15
KR20120014192A (en) 2012-02-16
CN102803557A (en) 2012-11-28
WO2010139547A1 (en) 2010-12-09
DE102009023471A1 (en) 2010-12-09
CN102459694A (en) 2012-05-16
US20120100310A1 (en) 2012-04-26
CN102459694B (en) 2013-11-06
KR20120027300A (en) 2012-03-21
EP2438206B1 (en) 2014-06-25
EP2438206A1 (en) 2012-04-11
WO2010139543A1 (en) 2010-12-09
US8986452B2 (en) 2015-03-24

Similar Documents

Publication Publication Date Title
US20120114855A1 (en) Coating installation and coating method
US9233851B2 (en) Method for manufacturing high quality graphene by heating carbon-based self-assembly monolayers
EP1258914B1 (en) Heating element cvd device
IE901886A1 (en) Apparatus for synthetic diamond deposition including¹spring-tensioned filaments
JPH03115576A (en) Synthetic diamond vacuum deposition apparatus with curved filament and base sheet cooling device
JP5919482B2 (en) Catalytic chemical vapor deposition apparatus, film forming method using the same, and surface treatment method for catalyst body
US20160060764A1 (en) Catalytic Chemical Vapor Deposition Apparatus
CA3038816C (en) Device and method for applying a carbon layer
KR20210022037A (en) SP3-bonded carbon material, preparation method and use thereof
JP5603340B2 (en) Device and method for coating a substrate using chemical vapor deposition
JP2012509826A (en) Device and method for coating a substrate using chemical vapor deposition
WO2007148457A1 (en) Apparatus for catalytic chemical vapor deposition
US20130230651A1 (en) Film formation apparatus and film formation method using the same
JP4221489B2 (en) Heating element CVD apparatus and heating element CVD method using the same
EP2408946B1 (en) Filament arrangement for hot wire chemical vapour deposition
JP4714328B2 (en) Method for controlling the diameter of graphite nanofibers
JP5704757B2 (en) Electric heating wire, method for manufacturing electric heating wire, and vacuum processing apparatus
CN103339286A (en) Filament for hot wire chemical vapour deposition
CA2015513A1 (en) Apparatus for synthetic diamond deposition including spring-tensioned filaments and substrate cooling means

Legal Events

Date Code Title Description
AS Assignment

Owner name: FRAUNHOFER-GESELLSCHAFT ZUR FORDERUNG DER ANGEWAND

Free format text: ASSIGNMENT OF ASSIGNORS INTEREST;ASSIGNORS:HARIG, TINO;HOFER, MARKUS;LAUKART, ARTUR;AND OTHERS;REEL/FRAME:027377/0474

Effective date: 20111202

STCB Information on status: application discontinuation

Free format text: ABANDONED -- FAILURE TO RESPOND TO AN OFFICE ACTION