US20120083062A1 - Method of manufacturing organic light emitting device - Google Patents
Method of manufacturing organic light emitting device Download PDFInfo
- Publication number
- US20120083062A1 US20120083062A1 US13/326,924 US201113326924A US2012083062A1 US 20120083062 A1 US20120083062 A1 US 20120083062A1 US 201113326924 A US201113326924 A US 201113326924A US 2012083062 A1 US2012083062 A1 US 2012083062A1
- Authority
- US
- United States
- Prior art keywords
- light emitting
- emitting device
- organic light
- electron injection
- medium
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
Links
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 25
- 239000000463 material Substances 0.000 claims abstract description 64
- 239000002019 doping agent Substances 0.000 claims abstract description 61
- 238000002347 injection Methods 0.000 claims abstract description 50
- 239000007924 injection Substances 0.000 claims abstract description 50
- 239000000758 substrate Substances 0.000 claims abstract description 27
- 238000000034 method Methods 0.000 claims abstract description 12
- 150000002894 organic compounds Chemical class 0.000 claims abstract description 11
- 230000008016 vaporization Effects 0.000 claims abstract description 8
- 239000002994 raw material Substances 0.000 claims abstract description 4
- FJDQFPXHSGXQBY-UHFFFAOYSA-L caesium carbonate Chemical compound [Cs+].[Cs+].[O-]C([O-])=O FJDQFPXHSGXQBY-UHFFFAOYSA-L 0.000 claims description 35
- 229910000024 caesium carbonate Inorganic materials 0.000 claims description 31
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 claims description 30
- 229910052721 tungsten Inorganic materials 0.000 claims description 30
- 239000010937 tungsten Substances 0.000 claims description 30
- 238000000354 decomposition reaction Methods 0.000 claims description 10
- 229910052751 metal Inorganic materials 0.000 claims description 10
- 239000002184 metal Substances 0.000 claims description 10
- 150000001339 alkali metal compounds Chemical class 0.000 claims description 6
- 150000001341 alkaline earth metal compounds Chemical class 0.000 claims description 5
- 239000010410 layer Substances 0.000 description 55
- 238000000151 deposition Methods 0.000 description 34
- 238000007740 vapor deposition Methods 0.000 description 31
- 229910052792 caesium Inorganic materials 0.000 description 14
- TVFDJXOCXUVLDH-UHFFFAOYSA-N caesium atom Chemical compound [Cs] TVFDJXOCXUVLDH-UHFFFAOYSA-N 0.000 description 12
- 238000011156 evaluation Methods 0.000 description 10
- 230000000694 effects Effects 0.000 description 9
- 230000032258 transport Effects 0.000 description 9
- 239000011651 chromium Substances 0.000 description 8
- 230000000052 comparative effect Effects 0.000 description 7
- -1 phenanthroline compound Chemical class 0.000 description 7
- 239000002585 base Substances 0.000 description 6
- 238000006243 chemical reaction Methods 0.000 description 6
- 229910052757 nitrogen Inorganic materials 0.000 description 6
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 5
- 238000010438 heat treatment Methods 0.000 description 5
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 4
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 4
- 230000002411 adverse Effects 0.000 description 4
- 229910052804 chromium Inorganic materials 0.000 description 4
- 238000009826 distribution Methods 0.000 description 4
- 230000005525 hole transport Effects 0.000 description 4
- AMGQUBHHOARCQH-UHFFFAOYSA-N indium;oxotin Chemical compound [In].[Sn]=O AMGQUBHHOARCQH-UHFFFAOYSA-N 0.000 description 4
- 150000002736 metal compounds Chemical class 0.000 description 4
- 238000004544 sputter deposition Methods 0.000 description 4
- 239000000126 substance Substances 0.000 description 4
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 3
- 229910052783 alkali metal Inorganic materials 0.000 description 3
- 150000001340 alkali metals Chemical class 0.000 description 3
- 229910052782 aluminium Inorganic materials 0.000 description 3
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 3
- 230000006866 deterioration Effects 0.000 description 3
- 239000012044 organic layer Substances 0.000 description 3
- 229910052710 silicon Inorganic materials 0.000 description 3
- 239000010703 silicon Substances 0.000 description 3
- VTYYLEPIZMXCLO-UHFFFAOYSA-L Calcium carbonate Chemical compound [Ca+2].[O-]C([O-])=O VTYYLEPIZMXCLO-UHFFFAOYSA-L 0.000 description 2
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 description 2
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 2
- 239000007983 Tris buffer Substances 0.000 description 2
- 238000004458 analytical method Methods 0.000 description 2
- 230000004888 barrier function Effects 0.000 description 2
- 239000006227 byproduct Substances 0.000 description 2
- 230000008859 change Effects 0.000 description 2
- VBVAVBCYMYWNOU-UHFFFAOYSA-N coumarin 6 Chemical compound C1=CC=C2SC(C3=CC4=CC=C(C=C4OC3=O)N(CC)CC)=NC2=C1 VBVAVBCYMYWNOU-UHFFFAOYSA-N 0.000 description 2
- 230000003247 decreasing effect Effects 0.000 description 2
- 230000007547 defect Effects 0.000 description 2
- 239000002274 desiccant Substances 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 230000006698 induction Effects 0.000 description 2
- 238000001095 inductively coupled plasma mass spectrometry Methods 0.000 description 2
- IBHBKWKFFTZAHE-UHFFFAOYSA-N n-[4-[4-(n-naphthalen-1-ylanilino)phenyl]phenyl]-n-phenylnaphthalen-1-amine Chemical compound C1=CC=CC=C1N(C=1C2=CC=CC=C2C=CC=1)C1=CC=C(C=2C=CC(=CC=2)N(C=2C=CC=CC=2)C=2C3=CC=CC=C3C=CC=2)C=C1 IBHBKWKFFTZAHE-UHFFFAOYSA-N 0.000 description 2
- BWHMMNNQKKPAPP-UHFFFAOYSA-L potassium carbonate Chemical compound [K+].[K+].[O-]C([O-])=O BWHMMNNQKKPAPP-UHFFFAOYSA-L 0.000 description 2
- TVIVIEFSHFOWTE-UHFFFAOYSA-K tri(quinolin-8-yloxy)alumane Chemical compound [Al+3].C1=CN=C2C([O-])=CC=CC2=C1.C1=CN=C2C([O-])=CC=CC2=C1.C1=CN=C2C([O-])=CC=CC2=C1 TVIVIEFSHFOWTE-UHFFFAOYSA-K 0.000 description 2
- KOPBYBDAPCDYFK-UHFFFAOYSA-N Cs2O Inorganic materials [O-2].[Cs+].[Cs+] KOPBYBDAPCDYFK-UHFFFAOYSA-N 0.000 description 1
- KKCBUQHMOMHUOY-UHFFFAOYSA-N Na2O Inorganic materials [O-2].[Na+].[Na+] KKCBUQHMOMHUOY-UHFFFAOYSA-N 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- 229910000019 calcium carbonate Inorganic materials 0.000 description 1
- ODINCKMPIJJUCX-UHFFFAOYSA-N calcium oxide Inorganic materials [Ca]=O ODINCKMPIJJUCX-UHFFFAOYSA-N 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 238000010924 continuous production Methods 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 230000002542 deteriorative effect Effects 0.000 description 1
- AKUNKIJLSDQFLS-UHFFFAOYSA-M dicesium;hydroxide Chemical compound [OH-].[Cs+].[Cs+] AKUNKIJLSDQFLS-UHFFFAOYSA-M 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000005286 illumination Methods 0.000 description 1
- 239000001095 magnesium carbonate Substances 0.000 description 1
- ZLNQQNXFFQJAID-UHFFFAOYSA-L magnesium carbonate Chemical compound [Mg+2].[O-]C([O-])=O ZLNQQNXFFQJAID-UHFFFAOYSA-L 0.000 description 1
- 229910000021 magnesium carbonate Inorganic materials 0.000 description 1
- CPLXHLVBOLITMK-UHFFFAOYSA-N magnesium oxide Inorganic materials [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 229910000027 potassium carbonate Inorganic materials 0.000 description 1
- NOTVAPJNGZMVSD-UHFFFAOYSA-N potassium monoxide Inorganic materials [K]O[K] NOTVAPJNGZMVSD-UHFFFAOYSA-N 0.000 description 1
- 238000001556 precipitation Methods 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- 150000005838 radical anions Chemical class 0.000 description 1
- 238000006722 reduction reaction Methods 0.000 description 1
- WPFGFHJALYCVMO-UHFFFAOYSA-L rubidium carbonate Chemical compound [Rb+].[Rb+].[O-]C([O-])=O WPFGFHJALYCVMO-UHFFFAOYSA-L 0.000 description 1
- 229910000026 rubidium carbonate Inorganic materials 0.000 description 1
- 229910001953 rubidium(I) oxide Inorganic materials 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 229910000029 sodium carbonate Inorganic materials 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- LEDMRZGFZIAGGB-UHFFFAOYSA-L strontium carbonate Chemical compound [Sr+2].[O-]C([O-])=O LEDMRZGFZIAGGB-UHFFFAOYSA-L 0.000 description 1
- 229910000018 strontium carbonate Inorganic materials 0.000 description 1
- IATRAKWUXMZMIY-UHFFFAOYSA-N strontium oxide Inorganic materials [O-2].[Sr+2] IATRAKWUXMZMIY-UHFFFAOYSA-N 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/243—Crucibles for source material
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K50/00—Organic light-emitting devices
- H10K50/10—OLEDs or polymer light-emitting diodes [PLED]
- H10K50/17—Carrier injection layers
- H10K50/171—Electron injection layers
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
- H10K71/10—Deposition of organic active material
- H10K71/16—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering
- H10K71/164—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering using vacuum deposition
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
- H10K71/30—Doping active layers, e.g. electron transporting layers
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
- H10K71/40—Thermal treatment, e.g. annealing in the presence of a solvent vapour
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
Definitions
- the present invention relates to a method of manufacturing an organic light emitting device and vapor deposition system.
- An organic light emitting device is generally formed of a laminated structure including a substrate, an anode, a hole transport layer, a light emitting layer, an electron transport layer, an electron injection layer, and a cathode.
- a metal, a metal compound, a metal salt, or the like having a low work function is used as a dopant.
- An organic layer containing such a dopant is used as the electron injection layer, and the dopant functions as a donor (electron donative) dopant.
- a metal having a low work function donates electrons to put organic molecules in a radical anion state. This makes it possible for adjoining molecules to donate or accept electrons smoothly, and an injection barrier from the cathode is lowered to improve the electron injectability. Further, electron transportability by a hopping mechanism in the organic layer can also be improved.
- Japanese Patent Application Laid-Open Nos. 2000-182774, 2004-311403, and 2005-123094 disclose lowering of an electron injection barrier by forming an electron injection layer so as to contain a metal compound and reducing the metal compound in the electron injection layer.
- an object of the present invention is to provide a method of manufacturing an organic light emitting device which has high electron injection efficiency and can be driven at a low voltage, and to provide a vapor deposition system.
- a method of manufacturing an organic light emitting device including: a substrate; an anode and a cathode provided on the substrate; a light emitting layer provided between the anode and the cathode; and an electron injection layer provided on a side of the cathode with respect to the light emitting layer, the electron injection layer including an organic compound and a dopant
- the method including the step of forming the electron injection layer in which the step of forming the electron injection layer includes the steps of: vaporizing in a container a dopant material as a raw material of the dopant; causing the vaporized dopant material to pass a heated medium between the container and the substrate; and forming the organic compound into the electron injection layer.
- a vapor deposition system including: a container for containing a vapor deposition material therein; heating means for vaporizing the vapor deposition material contained in the container; a medium provided in a position between the container and a base material to be vapor-deposited where the vaporized vapor deposition material passes; and a shielding member provided between the medium and the base material to be vapor-deposited, for shielding heat generated by the medium.
- the electron-injecting dopant in the electron injection layer can be caused to function more efficiently.
- the organic light emitting device manufactured according to the present invention has high electron injection efficiency and can be driven at a low voltage. Further, according to the present invention, continuous production over a long period of time without deteriorating device characteristics can be carried out.
- FIG. 1 is a schematic view of an exemplary laminated structure of an organic light emitting device manufactured according to the present invention.
- FIG. 2 is a schematic view of an exemplary vapor depositing source used in the present invention.
- FIG. 3 is a schematic view of another exemplary vapor depositing source used in the present invention.
- FIG. 4 is a schematic view of still another exemplary vapor depositing source used in the present invention.
- FIG. 5 is a schematic view of yet another exemplary vapor depositing source used in the present invention.
- FIG. 6 is a schematic view of still another exemplary vapor depositing source used in the present invention.
- FIG. 7 is a schematic view of yet another exemplary vapor depositing source used in the present invention.
- FIG. 8 is a schematic view of still another exemplary vapor depositing source used in the present invention.
- FIG. 9 is a schematic view of yet another exemplary vapor depositing source used in the present invention.
- FIG. 10 is a schematic view of still another exemplary vapor depositing source used in the present invention.
- FIG. 11 is a schematic view of yet another exemplary vapor depositing source used in the present invention.
- the present invention relates to a method of manufacturing an organic light emitting device having an organic layer as an electron injection layer, which contains a dopant material (electron-injecting dopant material) which functions as a donor (electron donative) dopant for improving electron injection efficiency as, for example, illustrated in FIG. 1 .
- the manufacturing method according to the present invention is a method of manufacturing an organic light emitting device having a substrate, an anode and a cathode provided on the substrate, a light emitting layer provided between the anode and the cathode, and an electron injection layer provided on a side of the cathode with respect to the light emitting layer, the electron injection layer including an organic compound and a dopant.
- a dopant material electron-injecting dopant material
- reference numerals 10 , 11 , 12 , 13 , 14 , 15 , and 16 designate the substrate, the anode, a hole transport layer, the light emitting layer, an electron transport layer, the electron injection layer, and the cathode, respectively.
- the electron transport layer 14 is preferably formed only of an organic compound.
- the step of forming the electron injection layer includes the step of vaporizing in a container the dopant material which is a raw material of the dopant, the step of causing the vaporized dopant material to pass a heated medium between the container and the substrate, and the step of forming an organic compound into the electron injection layer.
- a substance directly heated by energization or a substance indirectly heated by a heat source is used as the medium.
- a substance heated by induction heating may be used as the medium. Induction heating make unnecessary wiring for feeding and terminal section which come to be a high temperature, enables to suppress thermal effect to the substrate and the circumference, and enables to design the vapor depositing source compactly.
- the inventors considers that by causing the vaporized dopant material to pass the heated medium between the container and the substrate, decomposition of the dopant material is accelerated and more active state where electrons are likely to be given is obtained,
- the vaporized state refers not only to a state where the dopant material itself is vaporized but also to a state where a product of the decomposition of the dopant material is vaporized.
- the present invention is specifically described in the context of forming the electron injection layer 15 by vapor deposition, the present invention is not limited thereto.
- FIG. 2 illustrates an exemplary vapor depositing source used in the present invention.
- a medium 1 is a coiled tungsten filament heated by energization.
- a heat source 2 heats a container (crucible) 3 .
- Reference numerals 4 and 5 denote a shielding member (upper lid) and an electron-injecting dopant material, respectively. It is to be noted that in FIGS. 3 , 4 , 5 , 6 , and 7 , like reference numerals designate like members illustrated in FIG. 2 .
- alkali metal compounds for example, alkali metal compounds, alkaline earth metal compounds, or the like can be used.
- a metal having a low work function or a compound thereof is used as the dopant.
- Exemplary metals having a low work function include alkali metals.
- alkali metals react vigorously with moisture in the air and thus, it is difficult to handle them in the atmosphere. It follows that, in the present invention, it is preferable to use an alkali metal compound or an alkaline earth metal compound which are relatively easily handled in the atmosphere, and more preferably an alkali metal compound.
- Exemplary alkali metal compounds include Na 2 O, K 2 O, Rb 2 O, Cs 2 O, Na 2 CO 3 , K 2 CO 3 , Rb 2 CO 3 , and Cs 2 CO 3
- exemplary alkaline earth metal compounds include MgO, CaO, SrO, MgCO 3 , CaCO 3 , and SrCO 3 .
- cesium carbonate is more preferable, because cesium carbonate is stable in the atmosphere and is easily handled, and the atomic radius of cesium is large and therefore diffusion into an adjoining layer is less liable to occur.
- the electron injection layer manufactured according to the present invention is a layer where an electron-injecting dopant material is doped in an organic compound which transports electrons.
- an organic compound which transports electrons a well-known material such as an alumiquinolinol complex and a phenanthroline compound may be used.
- the substance used as the medium 1 is not particularly limited, a metal which decomposes the electron-injecting dopant material by chemical reaction with the electron-injecting dopant material is preferable, because, in addition to decomposition due to heat, decomposition due to chemical reaction such as reduction reaction can also be expected.
- the medium 1 is preferably provided at a location where it is in contact with the vaporized electron-injecting dopant material 5 .
- the medium 1 is preferably provided at a location where it is in contact with the vaporized electron-injecting dopant material 5 .
- the location where the medium 1 is provided is not necessarily limited to the inside of the container 3 , and, as illustrated in FIG. 3 , the medium 1 may be provided immediately above the container 3 .
- the medium 1 is apart from the electron-injecting dopant material 5 .
- the medium 1 is provided so as not to be in contact with the electron-injecting dopant material 5 .
- the medium 1 is made of a metal which causes decomposition of the electron-injecting dopant material by chemical reaction with the electron-injecting dopant material
- direct contact of the medium 1 with the electron-injecting dopant material 5 changes the contact area, which may result in variations.
- the surface of the medium is covered with a by-product or a residue formed by direct reaction, the medium may be deteriorated or the effect may be lowered.
- the medium 1 is provided at a location where it is not in contact with the solid electron-injecting dopant material 5 but is in contact with the vaporized electron-injecting dopant material 5 , the surface of the medium is less liable to be covered with a residue or a by-product of the reaction, so even after vapor deposition over a long period of time, decomposition by the chemical reaction is expected, and the characteristics of the device can be maintained.
- the shape of the medium 1 is not limited to the coiled filament, and is preferably formed in a shape in accordance with the vapor depositing source.
- the shape may be spherical ( FIG. 4 ), plate-like ( FIG. 5 ), mesh-like ( FIG. 6 ), or rod-like ( FIG. 7 ).
- the medium 1 can accelerate the decomposition more efficiently by increasing the contact area thereof, it is also preferable that a plurality of the medium 1 are provided as illustrated in, for example, FIGS. 4 and 5 .
- the temperature of the medium 1 is preferably equal to or higher than the vaporizing temperature of the electron-injecting dopant material 5 under vacuum, and more preferably 200 ° C. or higher. Further, although it is preferable that the temperature of the medium 1 is high from the viewpoint of accelerating the decomposition, taking into consideration the adverse effect of radiant heat on the organic light emitting device and on a region around the vapor depositing source, the temperature is preferably 2000° C. or lower. More preferably, the temperature is in the neighborhood of 1000° C., where the effect of the present invention is adequate and, at the same time, the adverse effect of radiant heat can be suppressed relatively easily.
- the present invention provides a vapor deposition system having a container for containing a vapor deposition material therein, heating means for vaporizing the vapor deposition material contained in the container, a medium provided between the container and a base material to be vapor-deposited where the vaporized vapor deposition material passes, and a shielding member provided between the medium and the base material to be vapor-deposited, for shielding heat generated by the medium.
- FIGS. 8 , 10 , and 11 are schematic views each illustrating an exemplary vapor deposition system according to the present invention. In FIGS.
- reference numerals 21 , 22 , 23 , 24 , 25 , 26 , and 27 denote a medium, a heat source, a container, a shielding member (upper lid), a dopant material, another shielding member, and a reflector, respectively.
- the shielding member 24 prevents the base material to be formed in film from being directly exposed to radiant heat from the medium 21 , the adverse effect of heat on the base material to be formed in film and on the region around the vapor depositing source can be further suppressed. Therefore, when the organic light emitting device is manufactured, deterioration of performance of the device due to adverse effect on the organic compound forming the device and the like can be suppressed.
- the shielding member 24 is provided at an opening of the container 23 .
- the medium 21 is preferably provided in a space defined by the shielding member 24 and the container 23 .
- the shielding member 24 functions as a lid of the container 23 . It is to be noted that the shielding member 24 has the opening such that the vaporized dopant material 25 moves toward the base material to be vapor-deposited.
- shielding member 26 is provided between the dopant material 25 and the medium 21 . Provision of the shielding member 26 more positively brings the vaporized dopant material 25 into contact with the medium 21 . As a result, the light emitting performance of the organic light emitting device can be further improved.
- the dopant material 25 is likely to be formed as a film as a clod (hereinafter “cluster”).
- the cluster leads to generate non-luminous points, resulting that there is a possibility that deterioration of device properties and defects of device occur.
- provision of the shielding member 24 or another shielding member 26 enables to suppress generation of cluster.
- a device illustrated in FIG. 1 was manufactured.
- chromium (Cr) which functions as a reflecting electrode was used as the anode 11 and indium tin oxide (ITO) which functions as a transparent electrode for taking out emitted light was used as the cathode 16 to manufacture a top emission type device.
- ITO indium tin oxide
- a chromium (Cr) film was formed on the substrate 10 by sputtering in a thickness of 200 nm to obtain the anode 11 . After that, the substrate was cleaned with UV/ozone.
- the cleaned substrate and the material were loaded on a vacuum vapor deposition system (manufactured by ULVAC KIKO, Inc.). After exhausting air such that the pressure inside becomes 1 ⁇ 10 ⁇ 6 Torr, an N, N′- ⁇ -dinaphthylbenzidine ( ⁇ -NPD) film was formed on the anode 11 in a thickness of 60 nm to form the hole transport layer 12 . Further, a co-deposited film of coumarin 6 (1.0 wt %) and tris (8-hydroxyquinolinato) aluminum (Alq 3 ) was formed thereon in a thickness of 30 nm to form the light emitting layer 13 . Then, as the electron transport layer 14 , a phenanthroline compound film was formed in a thickness of 10 nm.
- a film formed of a phenanthroline compound and cesium carbonate as the electron-injecting dopant material was formed on the electron transport layer 14 in a thickness of 40 nm to constitute the electron injection layer 15 .
- the vapor depositing source of cesium carbonate the one illustrated in FIG. 2 was used. More specifically, an alumina crucible was used as the container 3 , a tungsten filament as the medium 1 was provided in the container 3 which is in contact with the vaporized cesium carbonate most, and vapor deposition was carried out with the tungsten filament being heated by energization. A covered thermocouple was welded to several arbitrarily chosen points on the tungsten filament to measure the temperature. The lowest temperature was about 700° C. while the highest temperature was about 1000° C.
- ITO indium tin oxide
- Direct current voltage was applied to the obtained organic light emitting device with the voltage varied from V in increments of 0.1 V, and light emitting characteristics were examined.
- the current density of the device when the applied voltage was 5.0 V was calculated to be 80.5 mA/cm2 and the light emitting efficiency when the applied voltage was 5.0 V was calculated to be 4.2 cd/A.
- the organic light emitting device was manufactured by the same manufacturing procedure.
- the current density of the device when the applied voltage was 5.0 V was calculated to be 80.0 mA/cm 2 and the light emitting efficiency when the applied voltage was 5.0 V was calculated to be 4.3 cd/A. It was confirmed that there was almost no change.
- a device was manufactured by a method similar to that of Example 1 except that vapor deposition of cesium carbonate was carried out without using a tungsten filament, and evaluation was made. The result is shown in Table 1.
- a device was manufactured by a method similar to that of Comparative Example 1 except that vapor deposition was carried out such that the concentration of cesium in the electron injection layer 15 was about 4 wt %, and evaluation was made. The result is shown in Table 1.
- a vapor depositing source of cesium carbonate one illustrated in FIG. 3 was used. More specifically, a tungsten filament as the medium 1 was provided above the alumina crucible 3 , and vapor deposition was carried out with the tungsten filament heated by energization.
- a device was manufactured by a method similar to that of Example 1 except for the above, and evaluation was made. The result is shown in Table 1.
- a vapor depositing source of cesium carbonate one illustrated in FIG. 4 was used. More specifically, spherical tungsten as the medium 1 was provided in the alumina crucible 3 , and vapor deposition was carried out with the spherical tungsten indirectly heated by heat from the heat source 2 . A thermocouple was attached to a bottom surface of the crucible 3 to measure the temperature, and the temperature was about 700° C.
- a device was manufactured by a method similar to that of Example 1 except for the above, and evaluation was made. The result is shown in Table 1.
- a device was manufactured by a method similar to that of Example 1 except that vapor deposition of cesium carbonate was carried out with less electric current for energizing the tungsten filament, and evaluation was made. The result is shown in Table 1.
- the temperature was measured at arbitrarily chosen points on the tungsten filament.
- the lowest temperature was about 500° C. at a point near the top of the crucible 3 while the highest temperature was about 700° C. at a point near the center of the filament.
- a device was manufactured by a method similar to that of Example 2 except that vapor deposition of cesium carbonate was carried out with less electric current for energizing the tungsten filament, and evaluation was made. The result is shown in Table 1.
- the temperature was measured at arbitrarily chosen points on the tungsten filament.
- the lowest temperature was about 200° C. at a point near the top of the crucible 3 while the highest temperature was about 500° C. at a point near the center of the filament.
- a device was manufactured by a method similar to that of Example 2 except that vapor deposition of cesium carbonate was carried out without energizing the tungsten filament, and evaluation was made. The result is shown in Table 1.
- the dopant can be made to function more efficiently. Further, even at a temperature equal to or higher than 1000° C., effects comparable to or greater than those of Example 1 can be expected.
- a device illustrated in FIG. 1 was manufactured.
- chromium (Cr) which functions as a reflecting electrode was used as the anode 11 and indium tin oxide (ITO) which functions as a transparent electrode for taking out emitted light was used as the cathode 16 to manufacture a top emission type device.
- ITO indium tin oxide
- a chromium (Cr) film was formed on the substrate 10 by sputtering in a thickness of 200 nm to obtain the anode 11 . After that, the substrate was cleaned with UV/ozone.
- the cleaned substrate and the material were loaded on a vacuum vapor deposition system (manufactured by ULVAC KIKO, Inc.). After exhausting air such that the pressure inside becomes 1 ⁇ 10 ⁇ 6 Torr, an N, N′- ⁇ -dinaphthylbenzidine ( ⁇ -NPD) film was formed on the anode 11 in a thickness of 60 nm to form the hole transport layer 12 . Further, a co-deposited film of coumarin 6 (1.0 wt %) and tris (8-hydroxyquinolinato) aluminum (Alq 3 ) was formed thereon in a thickness of 30 nm to form the light emitting layer 13 . Then, as the electron transport layer 14 , a phenanthroline compound film was formed in a thickness of 10 nm.
- a film formed of a phenanthroline compound and cesium carbonate as the electron-injecting dopant material was formed on the electron transport layer 14 in a thickness of 40 nm to constitute the electron injection layer 15 .
- the vapor depositing source of cesium carbonate the one illustrated in FIG. 8 was used. More specifically, alumina was used for the container 23 , the shielding member (upper lid) 24 , and the other shielding member (middle lid) 26 , and the medium 21 was provided between the upper lid 24 and the middle lid 26 in the container 23 .
- the middle lid 26 preferably has a plurality of openings formed therein, and the locations of the openings are preferably vertically offset from the opening in the upper lid 24 . Further, it is preferable that the conductance of the openings in the middle lid 26 is larger than that of the opening in the upper lid 24 .
- the diameter ⁇ of the opening in the upper lid 24 used here was 2 mm.
- the diameter ⁇ of the openings in the middle lid 26 was 1 mm and there were six openings in the middle lid 26 around the periphery.
- the numbers and diameters of the openings in the upper lid 24 and the middle lid 26 are not limited thereto.
- This structure allows positive contact of the medium 21 provided between the upper lid 24 and the middle lid 26 with the vaporized cesium carbonate to improve the device characteristics. Further, because cesium carbonate undergoes vapor deposition through the middle lid 26 and the upper lid 24 , the number of clusters is decreased and device defects are decreased.
- the vapor depositing source was used to carry out vapor deposition of cesium carbonate with the tungsten filament heated by energization.
- thermocouple was welded to several arbitrarily chosen points on the tungsten filament to measure the temperature. The lowest temperature was about 700° C. while the highest temperature was about 1000° C.
- the substrate temperature 250 mm above the vapor depositing source was 43° C.
- a single film was separately formed on a cleaned silicon wafer under the same conditions as those for the electron injection layer 15 and an aluminum film was formed in a thickness of 300 nm so as to cover the film.
- Ten such samples were manufactured, and the surface where the film was formed was observed with a microscope under dark field illumination, and the number of bright spots within a diameter of 10 mm was counted. When the vapor depositing source for Cs 2 CO 3 in the present example was used, no bright spots were recognized.
- ITO indium tin oxide
- Direct current voltage was applied to the obtained organic light emitting device with the voltage varied from 0 V in increments of 0.1 V, and light emitting characteristics were examined.
- the current density of the device when the applied voltage was 5.0 V was calculated to be 83.0 mA/cm 2 and the light emitting efficiency when the applied voltage was 5.0 V was calculated to be 4.7 cd/A.
- the organic light emitting device was manufactured by the same manufacturing procedure.
- the current density of the device when the applied voltage was 5.0 V was calculated to be 82.8 mA/cm 2 and the light emitting efficiency when the applied voltage was 5.0 V was calculated to be 4.7 cd/A. It was confirmed that there was almost no change.
- a device was manufactured using a vapor depositing source structure similar to that of Example 6 but without the middle lid and the upper lid ( FIG. 9 ) under the same conditions as those for Example 6, and characteristics were evaluated.
- like reference numerals designate like members illustrated in FIG. 8 .
- the result is shown in Table 2. It is assumed that, because there was no middle lid and no upper lid, the tungsten filament and cesium carbonate were not sufficiently in contact with each other, and thus, even though the amount of cesium in the film was the same, the amount of cesium effective for the device characteristics was small, and thus, the characteristics were inferior to those of Example 6.
- the concentration distribution of cesium within a diameter of 75 mm of a film formed 250 mm above the vapor depositing source was ⁇ 10.6%.
- the substrate temperature 250 mm above the vapor depositing source was 108° C.
- Example 6 the number of clusters of Cs 2 CO 3 counted in the same way as in Example 6 was 518 on average of the ten samples.
- a device was manufactured using a vapor depositing source similar to that of Example 6, but without the middle lid under the same conditions as those for Example 6, and evaluation was made. The result is shown in Table 2.
- the concentration distribution of cesium within a diameter of 75 mm of a film formed 250 mm above the vapor depositing source and the substrate temperature 250 mm above the vapor depositing source were substantially equal to those of Example 6.
- the number of clusters of Cs 2 CO 3 counted was 1.6 on average of the ten samples.
- spherical tungsten as the medium 21 was provided in the alumina crucible 23 between the middle lid 26 and the upper lid 24 , and vapor deposition was carried out with the spherical tungsten indirectly heated by heat from the heat source 22 .
- a device was manufactured by a method similar to that of Example 6 except for the above, and evaluation was made. The result is shown in Table 2.
- a device was manufactured by a method similar to that of Example 6 except that vapor deposition was carried out such that the concentration of cesium in the electron injection layer 15 was about 1 wt %, and evaluation was made. The result is shown in Table 2.
- Example 9 62.3 mA/cm 2 55.4 mA/cm 2 ⁇ 2.5% 48° C. 0 4.4 cd/A 4.6 cd/A
- Example 10 81.2 mA/cm 2 80.8 mA/cm 2 ⁇ 2.4% 41° C. 0 4.4 cd/A 4.4 cd/A
- cesium carbonate and the tungsten filament are more positively brought into contact with each other, and thus, even if the concentration of cesium is low, a device with excellent characteristics can be manufactured.
Abstract
Provided is a method of manufacturing an organic light emitting device including the step of forming an electron injection layer. The step of forming the electron injection layer includes the steps of: vaporizing in a container a dopant material as a raw material of a dopant; causing the vaporized dopant material to pass a heated medium between the container and the substrate; and forming the organic compound into the electron injection layer. According to the method the organic light emitting device which has high electron injection efficiency and can be driven at a low voltage can be obtained.
Description
- This application is a divisional application of U.S. application Ser. No. 11/610,022, filed Dec. 13, 2006, which claims the benefit of JP 2005-360025, filed Dec. 14, 2005 and JP 2006-325113, filed Dec. 1, 2006, which are incorporated by reference herein in their entirety.
- 1. Field of the Invention
- The present invention relates to a method of manufacturing an organic light emitting device and vapor deposition system.
- 2. Description of the Related Art
- An organic light emitting device is generally formed of a laminated structure including a substrate, an anode, a hole transport layer, a light emitting layer, an electron transport layer, an electron injection layer, and a cathode. In order to make lower the voltage of such an organic light emitting device, it is important to improve electron injectability from the cathode. More specifically, in order to improve electron injection efficiency, a metal, a metal compound, a metal salt, or the like having a low work function is used as a dopant. An organic layer containing such a dopant is used as the electron injection layer, and the dopant functions as a donor (electron donative) dopant.
- In an organic film of the electron injection layer, a metal having a low work function donates electrons to put organic molecules in a radical anion state. This makes it possible for adjoining molecules to donate or accept electrons smoothly, and an injection barrier from the cathode is lowered to improve the electron injectability. Further, electron transportability by a hopping mechanism in the organic layer can also be improved.
- Japanese Patent Application Laid-Open Nos. 2000-182774, 2004-311403, and 2005-123094 disclose lowering of an electron injection barrier by forming an electron injection layer so as to contain a metal compound and reducing the metal compound in the electron injection layer.
- However, according to the technology disclosed in Japanese Patent Application Laid-Open Nos. 2000-182774, 2004-311403, and 2005-123094, when the metal compound is not reduced and remains in an organic film, it does not sufficiently function as a donor dopant, and even if a doping concentration is improved, drive voltage is not lowered. On the contrary, there is a possibility that the drive voltage may rise.
- In view of the above, an object of the present invention is to provide a method of manufacturing an organic light emitting device which has high electron injection efficiency and can be driven at a low voltage, and to provide a vapor deposition system.
- That is, according to an aspect of the present invention, there is provided a method of manufacturing an organic light emitting device, the organic light emitting device including: a substrate; an anode and a cathode provided on the substrate; a light emitting layer provided between the anode and the cathode; and an electron injection layer provided on a side of the cathode with respect to the light emitting layer, the electron injection layer including an organic compound and a dopant, the method including the step of forming the electron injection layer in which the step of forming the electron injection layer includes the steps of: vaporizing in a container a dopant material as a raw material of the dopant; causing the vaporized dopant material to pass a heated medium between the container and the substrate; and forming the organic compound into the electron injection layer.
- Further, according to another aspect of the present invention, there is provided a vapor deposition system including: a container for containing a vapor deposition material therein; heating means for vaporizing the vapor deposition material contained in the container; a medium provided in a position between the container and a base material to be vapor-deposited where the vaporized vapor deposition material passes; and a shielding member provided between the medium and the base material to be vapor-deposited, for shielding heat generated by the medium.
- According to the present invention, the electron-injecting dopant in the electron injection layer can be caused to function more efficiently. As a result, the organic light emitting device manufactured according to the present invention has high electron injection efficiency and can be driven at a low voltage. Further, according to the present invention, continuous production over a long period of time without deteriorating device characteristics can be carried out.
- Further features of the present invention will become apparent from the following description of exemplary embodiments with reference to the attached drawings.
-
FIG. 1 is a schematic view of an exemplary laminated structure of an organic light emitting device manufactured according to the present invention. -
FIG. 2 is a schematic view of an exemplary vapor depositing source used in the present invention. -
FIG. 3 is a schematic view of another exemplary vapor depositing source used in the present invention. -
FIG. 4 is a schematic view of still another exemplary vapor depositing source used in the present invention. -
FIG. 5 is a schematic view of yet another exemplary vapor depositing source used in the present invention. -
FIG. 6 is a schematic view of still another exemplary vapor depositing source used in the present invention. -
FIG. 7 is a schematic view of yet another exemplary vapor depositing source used in the present invention. -
FIG. 8 is a schematic view of still another exemplary vapor depositing source used in the present invention. -
FIG. 9 is a schematic view of yet another exemplary vapor depositing source used in the present invention. -
FIG. 10 is a schematic view of still another exemplary vapor depositing source used in the present invention. -
FIG. 11 is a schematic view of yet another exemplary vapor depositing source used in the present invention. - Embodiments of the present invention are now described in detail in the following.
- The present invention relates to a method of manufacturing an organic light emitting device having an organic layer as an electron injection layer, which contains a dopant material (electron-injecting dopant material) which functions as a donor (electron donative) dopant for improving electron injection efficiency as, for example, illustrated in
FIG. 1 . The manufacturing method according to the present invention is a method of manufacturing an organic light emitting device having a substrate, an anode and a cathode provided on the substrate, a light emitting layer provided between the anode and the cathode, and an electron injection layer provided on a side of the cathode with respect to the light emitting layer, the electron injection layer including an organic compound and a dopant. InFIG. 1 ,reference numerals electron transport layer 14 is preferably formed only of an organic compound. - In the manufacturing method according to the present invention, the step of forming the electron injection layer includes the step of vaporizing in a container the dopant material which is a raw material of the dopant, the step of causing the vaporized dopant material to pass a heated medium between the container and the substrate, and the step of forming an organic compound into the electron injection layer.
- More specifically, when the
electron injection layer 15 is formed, a substance directly heated by energization or a substance indirectly heated by a heat source is used as the medium. Alternatively, a substance heated by induction heating may be used as the medium. Induction heating make unnecessary wiring for feeding and terminal section which come to be a high temperature, enables to suppress thermal effect to the substrate and the circumference, and enables to design the vapor depositing source compactly. The inventors considers that by causing the vaporized dopant material to pass the heated medium between the container and the substrate, decomposition of the dopant material is accelerated and more active state where electrons are likely to be given is obtained, - As a result, an organic light emitting device which can be driven at a low voltage can be manufactured. It is to be noted that the vaporized state refers not only to a state where the dopant material itself is vaporized but also to a state where a product of the decomposition of the dopant material is vaporized. Although, in the following, the present invention is specifically described in the context of forming the
electron injection layer 15 by vapor deposition, the present invention is not limited thereto. -
FIG. 2 illustrates an exemplary vapor depositing source used in the present invention. InFIG. 2 , amedium 1 is a coiled tungsten filament heated by energization. Aheat source 2 heats a container (crucible) 3.Reference numerals FIGS. 3 , 4, 5, 6, and 7, like reference numerals designate like members illustrated inFIG. 2 . - For the electron-injecting
dopant material 5, for example, alkali metal compounds, alkaline earth metal compounds, or the like can be used. In order to improve electron injection efficiency, it is preferable that a metal having a low work function or a compound thereof is used as the dopant. Exemplary metals having a low work function include alkali metals. However, alkali metals react vigorously with moisture in the air and thus, it is difficult to handle them in the atmosphere. It follows that, in the present invention, it is preferable to use an alkali metal compound or an alkaline earth metal compound which are relatively easily handled in the atmosphere, and more preferably an alkali metal compound. Exemplary alkali metal compounds include Na2O, K2O, Rb2O, Cs2O, Na2CO3, K2CO3, Rb2CO3, and Cs2CO3, and exemplary alkaline earth metal compounds include MgO, CaO, SrO, MgCO3, CaCO3, and SrCO3. Among them, cesium carbonate is more preferable, because cesium carbonate is stable in the atmosphere and is easily handled, and the atomic radius of cesium is large and therefore diffusion into an adjoining layer is less liable to occur. - While an alkali metal alone may be used as the electron injection layer, an alkali metal compound and an alkaline earth metal compound have, differently from a metal, low conductivity. Therefore, the electron injection layer manufactured according to the present invention is a layer where an electron-injecting dopant material is doped in an organic compound which transports electrons. For the organic compound which transports electrons, a well-known material such as an alumiquinolinol complex and a phenanthroline compound may be used.
- Although the substance used as the
medium 1 is not particularly limited, a metal which decomposes the electron-injecting dopant material by chemical reaction with the electron-injecting dopant material is preferable, because, in addition to decomposition due to heat, decomposition due to chemical reaction such as reduction reaction can also be expected. - The
medium 1 is preferably provided at a location where it is in contact with the vaporized electron-injectingdopant material 5. By bringing the vaporized electron-injectingdopant material 5 into contact with themedium 1, secondary decomposition of the electron-injectingdopant material 5 can be accelerated. Further, the location where themedium 1 is provided is not necessarily limited to the inside of thecontainer 3, and, as illustrated inFIG. 3 , themedium 1 may be provided immediately above thecontainer 3. - Further, it is preferable that the
medium 1 is apart from the electron-injectingdopant material 5. In other words, it is preferable that themedium 1 is provided so as not to be in contact with the electron-injectingdopant material 5. For example, when themedium 1 is made of a metal which causes decomposition of the electron-injecting dopant material by chemical reaction with the electron-injecting dopant material, direct contact of the medium 1 with the electron-injectingdopant material 5 changes the contact area, which may result in variations. Further, if the surface of the medium is covered with a by-product or a residue formed by direct reaction, the medium may be deteriorated or the effect may be lowered. If themedium 1 is provided at a location where it is not in contact with the solid electron-injectingdopant material 5 but is in contact with the vaporized electron-injectingdopant material 5, the surface of the medium is less liable to be covered with a residue or a by-product of the reaction, so even after vapor deposition over a long period of time, decomposition by the chemical reaction is expected, and the characteristics of the device can be maintained. - The shape of the
medium 1 is not limited to the coiled filament, and is preferably formed in a shape in accordance with the vapor depositing source. For example, the shape may be spherical (FIG. 4 ), plate-like (FIG. 5 ), mesh-like (FIG. 6 ), or rod-like (FIG. 7 ). Further, because the medium 1 can accelerate the decomposition more efficiently by increasing the contact area thereof, it is also preferable that a plurality of the medium 1 are provided as illustrated in, for example,FIGS. 4 and 5 . - From the viewpoint of preventing precipitation of the electron-injecting
dopant material 5, the temperature of themedium 1 is preferably equal to or higher than the vaporizing temperature of the electron-injectingdopant material 5 under vacuum, and more preferably 200° C. or higher. Further, although it is preferable that the temperature of themedium 1 is high from the viewpoint of accelerating the decomposition, taking into consideration the adverse effect of radiant heat on the organic light emitting device and on a region around the vapor depositing source, the temperature is preferably 2000° C. or lower. More preferably, the temperature is in the neighborhood of 1000° C., where the effect of the present invention is adequate and, at the same time, the adverse effect of radiant heat can be suppressed relatively easily. - Further, the present invention provides a vapor deposition system having a container for containing a vapor deposition material therein, heating means for vaporizing the vapor deposition material contained in the container, a medium provided between the container and a base material to be vapor-deposited where the vaporized vapor deposition material passes, and a shielding member provided between the medium and the base material to be vapor-deposited, for shielding heat generated by the medium.
FIGS. 8 , 10, and 11 are schematic views each illustrating an exemplary vapor deposition system according to the present invention. InFIGS. 8 , 10, and 11,reference numerals - Because provision of the shielding
member 24 prevents the base material to be formed in film from being directly exposed to radiant heat from the medium 21, the adverse effect of heat on the base material to be formed in film and on the region around the vapor depositing source can be further suppressed. Therefore, when the organic light emitting device is manufactured, deterioration of performance of the device due to adverse effect on the organic compound forming the device and the like can be suppressed. - The shielding
member 24 is provided at an opening of thecontainer 23. The medium 21 is preferably provided in a space defined by the shieldingmember 24 and thecontainer 23. By providing and confining the medium 21 in the space, the vaporizeddopant material 25 can be positively brought into contact with the medium 21. In this case, the shieldingmember 24 functions as a lid of thecontainer 23. It is to be noted that the shieldingmember 24 has the opening such that the vaporizeddopant material 25 moves toward the base material to be vapor-deposited. - Further, as illustrated in
FIGS. 8 and 11 , it is preferable that another shielding member (middle lid) 26 is provided between thedopant material 25 and the medium 21. Provision of the shieldingmember 26 more positively brings the vaporizeddopant material 25 into contact with the medium 21. As a result, the light emitting performance of the organic light emitting device can be further improved. - Further, when there is no shielding
member 24 or another shielding member, thedopant material 25 is likely to be formed as a film as a clod (hereinafter “cluster”). The cluster leads to generate non-luminous points, resulting that there is a possibility that deterioration of device properties and defects of device occur. However, provision of the shieldingmember 24 or another shieldingmember 26 enables to suppress generation of cluster. - Although examples of the present invention are described in the following, the present invention is not limited thereto.
- A device illustrated in
FIG. 1 was manufactured. In this example, chromium (Cr) which functions as a reflecting electrode was used as theanode 11 and indium tin oxide (ITO) which functions as a transparent electrode for taking out emitted light was used as thecathode 16 to manufacture a top emission type device. - A chromium (Cr) film was formed on the
substrate 10 by sputtering in a thickness of 200 nm to obtain theanode 11. After that, the substrate was cleaned with UV/ozone. - Then, the cleaned substrate and the material were loaded on a vacuum vapor deposition system (manufactured by ULVAC KIKO, Inc.). After exhausting air such that the pressure inside becomes 1×10−6 Torr, an N, N′-α-dinaphthylbenzidine (α-NPD) film was formed on the
anode 11 in a thickness of 60 nm to form thehole transport layer 12. Further, a co-deposited film of coumarin 6 (1.0 wt %) and tris (8-hydroxyquinolinato) aluminum (Alq3) was formed thereon in a thickness of 30 nm to form thelight emitting layer 13. Then, as theelectron transport layer 14, a phenanthroline compound film was formed in a thickness of 10 nm. - Then, a film formed of a phenanthroline compound and cesium carbonate as the electron-injecting dopant material was formed on the
electron transport layer 14 in a thickness of 40 nm to constitute theelectron injection layer 15. As the vapor depositing source of cesium carbonate, the one illustrated inFIG. 2 was used. More specifically, an alumina crucible was used as thecontainer 3, a tungsten filament as themedium 1 was provided in thecontainer 3 which is in contact with the vaporized cesium carbonate most, and vapor deposition was carried out with the tungsten filament being heated by energization. A covered thermocouple was welded to several arbitrarily chosen points on the tungsten filament to measure the temperature. The lowest temperature was about 700° C. while the highest temperature was about 1000° C. - It is to be noted that a single film was separately formed on a silicon wafer under the same conditions as those for the
electron injection layer 15 and the concentration of cesium ions was determined by ICP-MS analysis. It was confirmed that the concentration of cesium in theelectron injection layer 15 was about 2 wt %. - Finally, an indium tin oxide (ITO) film was formed on the
electron injection layer 15 by sputtering in a thickness of 150 nm to obtain thetransparent cathode 16 for taking out emitted light. After that, the substrate was moved into a glove box, and the device was encapsulated using a glass cap having a desiccant provided therein in an atmosphere of nitrogen. - Direct current voltage was applied to the obtained organic light emitting device with the voltage varied from V in increments of 0.1 V, and light emitting characteristics were examined. As a result, the current density of the device when the applied voltage was 5.0 V was calculated to be 80.5 mA/cm2 and the light emitting efficiency when the applied voltage was 5.0 V was calculated to be 4.2 cd/A.
- Further, after vapor deposition of cesium carbonate of the
electron injection layer 15 was continuously carried out, the organic light emitting device was manufactured by the same manufacturing procedure. The current density of the device when the applied voltage was 5.0 V was calculated to be 80.0 mA/cm2 and the light emitting efficiency when the applied voltage was 5.0 V was calculated to be 4.3 cd/A. It was confirmed that there was almost no change. - A device was manufactured by a method similar to that of Example 1 except that vapor deposition of cesium carbonate was carried out without using a tungsten filament, and evaluation was made. The result is shown in Table 1.
- A device was manufactured by a method similar to that of Comparative Example 1 except that vapor deposition was carried out such that the concentration of cesium in the
electron injection layer 15 was about 4 wt %, and evaluation was made. The result is shown in Table 1. - As shown in Table 1, even though the doping concentration was higher than that in Example 1, the characteristics of the device were inferior to those of the device in Example 1.
- As a vapor depositing source of cesium carbonate, one illustrated in
FIG. 3 was used. More specifically, a tungsten filament as themedium 1 was provided above thealumina crucible 3, and vapor deposition was carried out with the tungsten filament heated by energization. - A device was manufactured by a method similar to that of Example 1 except for the above, and evaluation was made. The result is shown in Table 1.
- As a vapor depositing source of cesium carbonate, one illustrated in
FIG. 4 was used. More specifically, spherical tungsten as themedium 1 was provided in thealumina crucible 3, and vapor deposition was carried out with the spherical tungsten indirectly heated by heat from theheat source 2. A thermocouple was attached to a bottom surface of thecrucible 3 to measure the temperature, and the temperature was about 700° C. - A device was manufactured by a method similar to that of Example 1 except for the above, and evaluation was made. The result is shown in Table 1.
- It is to be noted that, after vapor deposition of cesium carbonate was continuously carried out, the color of the spherical tungsten was changed to black, and the surface was covered with a residue. However, as shown in Table 1, although the initial value could not be maintained, it was confirmed that the characteristics could be continuously maintained.
- A device was manufactured by a method similar to that of Example 1 except that vapor deposition of cesium carbonate was carried out with less electric current for energizing the tungsten filament, and evaluation was made. The result is shown in Table 1.
- It is to be noted that, similarly to the case of Example 1, the temperature was measured at arbitrarily chosen points on the tungsten filament. The lowest temperature was about 500° C. at a point near the top of the
crucible 3 while the highest temperature was about 700° C. at a point near the center of the filament. - A device was manufactured by a method similar to that of Example 2 except that vapor deposition of cesium carbonate was carried out with less electric current for energizing the tungsten filament, and evaluation was made. The result is shown in Table 1.
- It is to be noted that, similarly to the case of Example 1, the temperature was measured at arbitrarily chosen points on the tungsten filament. The lowest temperature was about 200° C. at a point near the top of the
crucible 3 while the highest temperature was about 500° C. at a point near the center of the filament. - After vapor deposition of cesium carbonate was continuously carried out, the color of the tungsten filament was slightly changed to brown. However, as shown in Table 1, although deterioration proceeded more than that in Example 1, it was confirmed that the effect was maintained.
- A device was manufactured by a method similar to that of Example 2 except that vapor deposition of cesium carbonate was carried out without energizing the tungsten filament, and evaluation was made. The result is shown in Table 1.
-
TABLE 1 Heater Characteristics Characteristics Material Result of where after Location for Heater Cesium 5.0 V was Continuous Provision Temperature Detection applied Production Example 1 Tungsten 700-1000° C. 2 wt % 80.5 mA/cm2 80.0 mA/cm2 Filament 4.2 cd/A 4.3 cd/A in Crucible Comparative No Heater Crucible 2 wt % 43.2 mA/cm2 — Example 1 Material Temperature 4.0 cd/A 600-700° C. Comparative No Heater Crucible 4 wt % 60.8 mA/cm2 — Example 2 Material Temperature 4.1 cd/A 600-700° C. Example 2 Tungsten 800-1100° C. 2 wt % 79.6 mA/cm2 80.3 mA/cm2 Filament 4.3 cd/A 4.2 cd/A above Crucible Example 3 Spherical 700° C. 2 wt % 62.3 mA/cm2 55.4 mA/cm2 Tungsten 4.4 cd/A 4.6 cd/A in Crucible Example 4 Tungsten 500-700° C. 2 wt % 68.9 mA/cm2 65.3 mA/cm2 Filament 4.5 cd/A 4.4 cd/A in Crucible Example 5 Tungsten 200-500° C. 2 wt % 55.8 mA/cm2 50.3 mA/cm2 Filament 4.4 cd/A 4.0 cd/A above Crucible Comparative Tungsten No 2 wt % 43.8 mA/cm2 — Example 3 Filament Energization 4.1 cd/A above Crucible - From the results shown above, it is assumed that, at least by heating, the dopant can be made to function more efficiently. Further, even at a temperature equal to or higher than 1000° C., effects comparable to or greater than those of Example 1 can be expected.
- A device illustrated in
FIG. 1 was manufactured. In the present example, chromium (Cr) which functions as a reflecting electrode was used as theanode 11 and indium tin oxide (ITO) which functions as a transparent electrode for taking out emitted light was used as thecathode 16 to manufacture a top emission type device. - A chromium (Cr) film was formed on the
substrate 10 by sputtering in a thickness of 200 nm to obtain theanode 11. After that, the substrate was cleaned with UV/ozone. - Then, the cleaned substrate and the material were loaded on a vacuum vapor deposition system (manufactured by ULVAC KIKO, Inc.). After exhausting air such that the pressure inside becomes 1×10−6 Torr, an N, N′-α-dinaphthylbenzidine (α-NPD) film was formed on the
anode 11 in a thickness of 60 nm to form thehole transport layer 12. Further, a co-deposited film of coumarin 6 (1.0 wt %) and tris (8-hydroxyquinolinato) aluminum (Alq3) was formed thereon in a thickness of 30 nm to form thelight emitting layer 13. Then, as theelectron transport layer 14, a phenanthroline compound film was formed in a thickness of 10 nm. - Then, a film formed of a phenanthroline compound and cesium carbonate as the electron-injecting dopant material was formed on the
electron transport layer 14 in a thickness of 40 nm to constitute theelectron injection layer 15. As the vapor depositing source of cesium carbonate, the one illustrated inFIG. 8 was used. More specifically, alumina was used for thecontainer 23, the shielding member (upper lid) 24, and the other shielding member (middle lid) 26, and the medium 21 was provided between theupper lid 24 and themiddle lid 26 in thecontainer 23. - The
middle lid 26 preferably has a plurality of openings formed therein, and the locations of the openings are preferably vertically offset from the opening in theupper lid 24. Further, it is preferable that the conductance of the openings in themiddle lid 26 is larger than that of the opening in theupper lid 24. The diameter φ of the opening in theupper lid 24 used here was 2 mm. The diameter φ of the openings in themiddle lid 26 was 1 mm and there were six openings in themiddle lid 26 around the periphery. - The numbers and diameters of the openings in the
upper lid 24 and themiddle lid 26 are not limited thereto. - This structure allows positive contact of the medium 21 provided between the
upper lid 24 and themiddle lid 26 with the vaporized cesium carbonate to improve the device characteristics. Further, because cesium carbonate undergoes vapor deposition through themiddle lid 26 and theupper lid 24, the number of clusters is decreased and device defects are decreased. - The vapor depositing source was used to carry out vapor deposition of cesium carbonate with the tungsten filament heated by energization.
- A covered thermocouple was welded to several arbitrarily chosen points on the tungsten filament to measure the temperature. The lowest temperature was about 700° C. while the highest temperature was about 1000° C.
- It is to be noted that a single film was separately formed on a silicon wafer under the same conditions as those for the
electron injection layer 15 and the concentration of cesium ions was determined by ICP-MS analysis. It was confirmed that the concentration of cesium in theelectron injection layer 15 was about 2 wt % The concentration distribution of cesium within a diameter of 75 mm of a film formed 250 mm above the vapor depositing source was ±2.3%. - The substrate temperature 250 mm above the vapor depositing source was 43° C.
- With regard to the number of clusters of Cs2CO3, a single film was separately formed on a cleaned silicon wafer under the same conditions as those for the
electron injection layer 15 and an aluminum film was formed in a thickness of 300 nm so as to cover the film. Ten such samples were manufactured, and the surface where the film was formed was observed with a microscope under dark field illumination, and the number of bright spots within a diameter of 10 mm was counted. When the vapor depositing source for Cs2CO3in the present example was used, no bright spots were recognized. - Finally, an indium tin oxide (ITO) film was formed on the
electron injection layer 15 by sputtering in a thickness of 150 nm to obtain thetransparent cathode 16 for taking out emitted light. After that, the substrate was moved into a glove box, and the device was encapsulated using a glass cap having a desiccant provided therein in an atmosphere of nitrogen. - Direct current voltage was applied to the obtained organic light emitting device with the voltage varied from 0 V in increments of 0.1 V, and light emitting characteristics were examined. As a result, the current density of the device when the applied voltage was 5.0 V was calculated to be 83.0 mA/cm2 and the light emitting efficiency when the applied voltage was 5.0 V was calculated to be 4.7 cd/A.
- Further, after vapor deposition of cesium carbonate of the
electron injection layer 15 was continuously carried out, the organic light emitting device was manufactured by the same manufacturing procedure. The current density of the device when the applied voltage was 5.0 V was calculated to be 82.8 mA/cm2 and the light emitting efficiency when the applied voltage was 5.0 V was calculated to be 4.7 cd/A. It was confirmed that there was almost no change. - A device was manufactured using a vapor depositing source structure similar to that of Example 6 but without the middle lid and the upper lid (
FIG. 9 ) under the same conditions as those for Example 6, and characteristics were evaluated. InFIG. 9 , like reference numerals designate like members illustrated inFIG. 8 . The result is shown in Table 2. It is assumed that, because there was no middle lid and no upper lid, the tungsten filament and cesium carbonate were not sufficiently in contact with each other, and thus, even though the amount of cesium in the film was the same, the amount of cesium effective for the device characteristics was small, and thus, the characteristics were inferior to those of Example 6. - Further, the concentration distribution of cesium within a diameter of 75 mm of a film formed 250 mm above the vapor depositing source was ±10.6%.
- When the vapor depositing source was used, because the substrate was directly exposed to radiant heat generated by the tungsten filament, the substrate temperature 250 mm above the vapor depositing source was 108° C.
- Further, the number of clusters of Cs2CO3 counted in the same way as in Example 6 was 518 on average of the ten samples.
- As the vapor depositing source of cesium carbonate, one illustrated in
FIG. 10 was used. - A device was manufactured using a vapor depositing source similar to that of Example 6, but without the middle lid under the same conditions as those for Example 6, and evaluation was made. The result is shown in Table 2.
- The concentration distribution of cesium within a diameter of 75 mm of a film formed 250 mm above the vapor depositing source and the substrate temperature 250 mm above the vapor depositing source were substantially equal to those of Example 6.
- The number of clusters of Cs2CO3counted was 1.6 on average of the ten samples.
- As the vapor depositing source of cesium carbonate, one illustrated in
FIG. 11 was used. More specifically, spherical tungsten as the medium 21 was provided in thealumina crucible 23 between themiddle lid 26 and theupper lid 24, and vapor deposition was carried out with the spherical tungsten indirectly heated by heat from theheat source 22. A device was manufactured by a method similar to that of Example 6 except for the above, and evaluation was made. The result is shown in Table 2. - A device was manufactured by a method similar to that of Example 6 except that vapor deposition was carried out such that the concentration of cesium in the
electron injection layer 15 was about 1 wt %, and evaluation was made. The result is shown in Table 2. -
TABLE 2 Substrate Number of temperature Clusters Characteristics Characteristics Concentration 250 mm (φ10 mm, where after Distribution above Vapor Average 5.0 V was Continuous of Cs2CO3 Depositing of Ten Applied Production (φ75 mm) Source Samples) Example 6 83.0 mA/cm2 82.8 mA/cm2 ±2.3% 43° C. 0 4.7 cd/A 4.7 cd/A Example 7 76.2 mA/cm2 75.2 mA/cm2 ±10.6% 108° C. 518 4.1 cd/A 4.1 cd/A Example 8 80.5 mA/cm2 80.0 mA/cm2 ±2.5% 44° C. 1.6 4.2 cd/A 4.3 cd/A Example 9 62.3 mA/cm2 55.4 mA/cm2 ±2.5% 48° C. 0 4.4 cd/A 4.6 cd/A Example 10 81.2 mA/cm2 80.8 mA/cm2 ±2.4% 41° C. 0 4.4 cd/A 4.4 cd/A - By using the vapor depositing source according to the present invention, cesium carbonate and the tungsten filament are more positively brought into contact with each other, and thus, even if the concentration of cesium is low, a device with excellent characteristics can be manufactured.
- While the present invention has been described with reference to exemplary embodiments, it is to be understood that the invention is not limited to the disclosed exemplary embodiments. The scope of the following claims is to be accorded the broadest interpretation so as to encompass all such modifications and equivalent structures and functions.
Claims (10)
1. A method of manufacturing an organic light emitting device,
the organic light emitting device comprising:
a substrate;
an anode and a cathode provided on the substrate;
a light emitting layer provided between the anode and the cathode; and
an electron injection layer provided on a side of the cathode with respect to the light emitting layer, the electron injection layer comprising an organic compound and a dopant,
the method comprising the step of forming the electron injection layer,
wherein the step of forming the electron injection layer comprises the steps of:
vaporizing in a container a dopant material as a raw material of the dopant;
causing the vaporized dopant material to pass a heated medium between the container and the substrate; and
forming the organic compound into the electron injection layer.
2. The method of manufacturing an organic light emitting device according to claim 1 , wherein the medium is heated by energization.
3. The method of manufacturing an organic light emitting device according to claim 1 , wherein the medium is spaced apart from the dopant material.
4. The method of manufacturing an organic light emitting device according to claim 1 , wherein a temperature of the medium is equal to or higher than the vaporizing temperature of the dopant material under vacuum.
5. The method of manufacturing an organic light emitting device according to claim 1 , wherein a temperature of the medium is equal to or higher than 200° C. and equal to or lower than 2000° C.
6. The method of manufacturing an organic light emitting device according to claim 1 , wherein the medium comprises a metal.
7. The method of manufacturing an organic light emitting device according to claim 6 , wherein the metal comprises tungsten.
8. The method of manufacturing an organic light emitting device according to claim 1 , wherein the dopant material comprises an alkali metal compound or an alkaline earth metal compound.
9. The method of manufacturing an organic light emitting device according to claim 8 , wherein the dopant material comprises cesium carbonate.
10. The method of manufacturing an organic light emitting device according to claim 1 , wherein the step of causing the vaporized dopant material to pass a heated medium comprises the step of accelerating decomposition of the dopant material.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US13/326,924 US20120083062A1 (en) | 2005-12-14 | 2011-12-15 | Method of manufacturing organic light emitting device |
Applications Claiming Priority (6)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2005360025 | 2005-12-14 | ||
JP2005-360025 | 2005-12-14 | ||
JP2006325113A JP5268249B2 (en) | 2005-12-14 | 2006-12-01 | Manufacturing method of organic light emitting device |
JP2006-325113 | 2006-12-01 | ||
US11/610,022 US8398774B2 (en) | 2005-12-14 | 2006-12-13 | Method of manufacturing organic light emitting device and vapor deposition system |
US13/326,924 US20120083062A1 (en) | 2005-12-14 | 2011-12-15 | Method of manufacturing organic light emitting device |
Related Parent Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US11/610,022 Division US8398774B2 (en) | 2005-12-14 | 2006-12-13 | Method of manufacturing organic light emitting device and vapor deposition system |
Publications (1)
Publication Number | Publication Date |
---|---|
US20120083062A1 true US20120083062A1 (en) | 2012-04-05 |
Family
ID=38139705
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US11/610,022 Expired - Fee Related US8398774B2 (en) | 2005-12-14 | 2006-12-13 | Method of manufacturing organic light emitting device and vapor deposition system |
US13/326,924 Abandoned US20120083062A1 (en) | 2005-12-14 | 2011-12-15 | Method of manufacturing organic light emitting device |
Family Applications Before (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US11/610,022 Expired - Fee Related US8398774B2 (en) | 2005-12-14 | 2006-12-13 | Method of manufacturing organic light emitting device and vapor deposition system |
Country Status (2)
Country | Link |
---|---|
US (2) | US8398774B2 (en) |
JP (1) | JP5268249B2 (en) |
Families Citing this family (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5241173B2 (en) * | 2007-08-28 | 2013-07-17 | キヤノン株式会社 | Manufacturing method of organic EL element |
DE102008011185A1 (en) | 2008-02-27 | 2009-09-03 | Osram Opto Semiconductors Gmbh | Process for producing a doped organic semiconducting layer |
JP2009238910A (en) * | 2008-03-26 | 2009-10-15 | Canon Inc | Organic light emitting device |
KR101069520B1 (en) * | 2008-10-01 | 2011-09-30 | 주식회사 엘지화학 | Organic light emitting device and method for fabricating the same |
JP4782219B2 (en) * | 2009-07-02 | 2011-09-28 | 三菱重工業株式会社 | Vacuum deposition equipment |
JP4831841B2 (en) * | 2009-07-10 | 2011-12-07 | 三菱重工業株式会社 | Vacuum deposition apparatus and method |
WO2012124524A1 (en) * | 2011-03-11 | 2012-09-20 | シャープ株式会社 | Vapor deposition particle projection device and vapor deposition device |
KR20120116720A (en) * | 2011-04-13 | 2012-10-23 | 에스엔유 프리시젼 주식회사 | Apparatus for supplying materials |
CN103741097B (en) * | 2013-12-30 | 2016-02-03 | 深圳市华星光电技术有限公司 | Vacuum deposition apparatus |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3984585A (en) * | 1974-05-30 | 1976-10-05 | Fuji Xerox Co., Ltd. | Vacuum evaporation plating method |
US20040173929A1 (en) * | 2003-03-07 | 2004-09-09 | Eastman Kodak Company | Making and using compacted pellets for OLED displays |
US20040235209A1 (en) * | 2001-11-22 | 2004-11-25 | Toshinori Hasegawa | Light-emitting element, production method thereof, and light-emitting apparatus |
Family Cites Families (27)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3811940A (en) * | 1969-10-09 | 1974-05-21 | United Aircraft Corp | High frequency heating method for vapor deposition of coatings onto filaments |
US4526132A (en) * | 1982-11-24 | 1985-07-02 | Konishiroku Photo Industry Co., Ltd. | Evaporator |
US4878989A (en) * | 1986-11-26 | 1989-11-07 | Texas Instruments Incorporated | Chemical beam epitaxy system |
DE4104415C1 (en) * | 1991-02-14 | 1992-06-04 | 4P Verpackungen Ronsberg Gmbh, 8951 Ronsberg, De | |
JPH05139882A (en) * | 1991-11-20 | 1993-06-08 | Hitachi Ltd | Molecular beam source |
JPH0610118A (en) * | 1992-06-29 | 1994-01-18 | Nec Kansai Ltd | Vapor deposition method and evaporation device |
JPH0770741A (en) * | 1993-07-02 | 1995-03-14 | Mitsubishi Electric Corp | Evaporation source |
JPH07258828A (en) * | 1994-03-24 | 1995-10-09 | Matsushita Electric Works Ltd | Film formation |
US5558718A (en) * | 1994-04-08 | 1996-09-24 | The Regents, University Of California | Pulsed source ion implantation apparatus and method |
JPH0961603A (en) * | 1995-08-24 | 1997-03-07 | Olympus Optical Co Ltd | Formation of antireflection film |
JPH11172421A (en) * | 1997-10-09 | 1999-06-29 | Nikon Corp | Production method and producing device of fluoride thin film |
JP4142765B2 (en) * | 1998-05-07 | 2008-09-03 | 株式会社アルバック | Ion plating apparatus for forming sublimable metal compound thin films |
US6202591B1 (en) * | 1998-11-12 | 2001-03-20 | Flex Products, Inc. | Linear aperture deposition apparatus and coating process |
JP4505067B2 (en) | 1998-12-16 | 2010-07-14 | 淳二 城戸 | Organic electroluminescent device |
JP4982004B2 (en) * | 2000-01-17 | 2012-07-25 | 株式会社アルバック | Protection plate device |
JP2003031363A (en) * | 2001-07-16 | 2003-01-31 | Sharp Corp | Sputtering device, method for manufacturing organic el element panel using the same, and organic el element |
TWI264473B (en) * | 2001-10-26 | 2006-10-21 | Matsushita Electric Works Ltd | Vacuum deposition device and vacuum deposition method |
JP3754380B2 (en) * | 2002-02-06 | 2006-03-08 | 株式会社エイコー・エンジニアリング | Molecular beam source cell for thin film deposition and thin film deposition method |
JP2003247062A (en) * | 2002-02-26 | 2003-09-05 | Sony Corp | Method and apparatus for depositing thin film |
US6749906B2 (en) * | 2002-04-25 | 2004-06-15 | Eastman Kodak Company | Thermal physical vapor deposition apparatus with detachable vapor source(s) and method |
JP4405715B2 (en) * | 2002-08-23 | 2010-01-27 | キヤノンアネルバ株式会社 | Method of forming silicon nanocrystal structure terminated with oxygen or nitrogen and silicon nanocrystal structure terminated with oxygen or nitrogen formed thereby |
JP2004281247A (en) * | 2003-03-17 | 2004-10-07 | Pioneer Electronic Corp | Organic electroluminescent display panel and its manufacturing method |
JP2004311403A (en) * | 2003-03-27 | 2004-11-04 | Seiko Epson Corp | Electroluminescent element and its manufacturing method |
JP4683829B2 (en) * | 2003-10-17 | 2011-05-18 | 淳二 城戸 | Organic electroluminescent device and manufacturing method thereof |
JP2006059640A (en) * | 2004-08-19 | 2006-03-02 | Tdk Corp | Vapor deposition device and vapor deposition method |
US7829444B2 (en) * | 2004-11-10 | 2010-11-09 | Canon Kabushiki Kaisha | Field effect transistor manufacturing method |
JP4402016B2 (en) * | 2005-06-20 | 2010-01-20 | キヤノン株式会社 | Vapor deposition apparatus and vapor deposition method |
-
2006
- 2006-12-01 JP JP2006325113A patent/JP5268249B2/en not_active Expired - Fee Related
- 2006-12-13 US US11/610,022 patent/US8398774B2/en not_active Expired - Fee Related
-
2011
- 2011-12-15 US US13/326,924 patent/US20120083062A1/en not_active Abandoned
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3984585A (en) * | 1974-05-30 | 1976-10-05 | Fuji Xerox Co., Ltd. | Vacuum evaporation plating method |
US20040235209A1 (en) * | 2001-11-22 | 2004-11-25 | Toshinori Hasegawa | Light-emitting element, production method thereof, and light-emitting apparatus |
US20040173929A1 (en) * | 2003-03-07 | 2004-09-09 | Eastman Kodak Company | Making and using compacted pellets for OLED displays |
Also Published As
Publication number | Publication date |
---|---|
JP2007188870A (en) | 2007-07-26 |
US20070134405A1 (en) | 2007-06-14 |
US8398774B2 (en) | 2013-03-19 |
JP5268249B2 (en) | 2013-08-21 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US20120083062A1 (en) | Method of manufacturing organic light emitting device | |
US8524313B2 (en) | Method for manufacturing a device | |
US5922396A (en) | Electron transporting and light emitting layers based on organic free radicals | |
Hung et al. | Interface engineering in preparation of organic surface-emitting diodes | |
US7830089B2 (en) | Electronic device with a layer structure of organic layers | |
TWI408995B (en) | Organic light emitting display | |
US20080160669A1 (en) | Light-emitting component and process for its preparation | |
TW200306131A (en) | Manufacturing system, manufacturing method, method of operating a manufacturing apparatus, and light emitting device | |
US6946319B2 (en) | Electrode for an electronic device | |
US7150669B2 (en) | Electroluminescent panel and a manufacturing method therefor | |
JP4916385B2 (en) | Organic light emitting device manufacturing method and vapor deposition apparatus | |
JP3877613B2 (en) | Method for manufacturing organic electroluminescence display device | |
JP2005063910A (en) | Organic light emitting element and its manufacturing method | |
JP4310843B2 (en) | Method for manufacturing organic electroluminescent device | |
US20060269656A1 (en) | Reducing contamination in OLED processing systems | |
JP2003229269A (en) | Organic el element | |
CN114420878A (en) | Inverted OLED device with high thermal stability and preparation method thereof | |
CN1322600C (en) | Optical element and its making method | |
JP2004006311A (en) | Method and apparatus for manufacturing light-emitting device | |
US8491820B2 (en) | Process for growing an electron injection layer to improve the efficiency of organic light emitting diodes | |
US20020182307A1 (en) | Organic electroluminescent devices with organic layers deposited at elevated substrate temperatures | |
JP2013108182A (en) | Vapor deposition apparatus | |
US9172056B2 (en) | Organic light emitting diode with transparent electrode and method of making same | |
KR100565587B1 (en) | Organic Electroluminescene Device and Fabricating Method thereof | |
US20070228939A1 (en) | Organic electroluminescent device and display apparatus using the same |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
STCB | Information on status: application discontinuation |
Free format text: ABANDONED -- FAILURE TO RESPOND TO AN OFFICE ACTION |