US20080279752A1 - Method for producing a single-wall carbon nanotube - Google Patents

Method for producing a single-wall carbon nanotube Download PDF

Info

Publication number
US20080279752A1
US20080279752A1 US11/808,208 US80820807A US2008279752A1 US 20080279752 A1 US20080279752 A1 US 20080279752A1 US 80820807 A US80820807 A US 80820807A US 2008279752 A1 US2008279752 A1 US 2008279752A1
Authority
US
United States
Prior art keywords
carbon nanotube
wall carbon
producing
catalyst
dehydrated alcohol
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
US11/808,208
Other languages
English (en)
Inventor
Masaki Suzuki
Kouji Ishibashi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
RIKEN Institute of Physical and Chemical Research
Original Assignee
RIKEN Institute of Physical and Chemical Research
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by RIKEN Institute of Physical and Chemical Research filed Critical RIKEN Institute of Physical and Chemical Research
Assigned to RIKEN reassignment RIKEN ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). Assignors: ISHIBASHI, KOUJI, SUZUKI, MASAKI
Publication of US20080279752A1 publication Critical patent/US20080279752A1/en
Abandoned legal-status Critical Current

Links

Images

Classifications

    • DTEXTILES; PAPER
    • D01NATURAL OR MAN-MADE THREADS OR FIBRES; SPINNING
    • D01FCHEMICAL FEATURES IN THE MANUFACTURE OF ARTIFICIAL FILAMENTS, THREADS, FIBRES, BRISTLES OR RIBBONS; APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OF CARBON FILAMENTS
    • D01F9/00Artificial filaments or the like of other substances; Manufacture thereof; Apparatus specially adapted for the manufacture of carbon filaments
    • D01F9/08Artificial filaments or the like of other substances; Manufacture thereof; Apparatus specially adapted for the manufacture of carbon filaments of inorganic material
    • D01F9/12Carbon filaments; Apparatus specially adapted for the manufacture thereof
    • D01F9/127Carbon filaments; Apparatus specially adapted for the manufacture thereof by thermal decomposition of hydrocarbon gases or vapours or other carbon-containing compounds in the form of gas or vapour, e.g. carbon monoxide, alcohols
    • D01F9/1277Other organic compounds
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B82NANOTECHNOLOGY
    • B82YSPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y30/00Nanotechnology for materials or surface science, e.g. nanocomposites
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B82NANOTECHNOLOGY
    • B82YSPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00Manufacture or treatment of nanostructures
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01BNON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B32/00Carbon; Compounds thereof
    • C01B32/15Nano-sized carbon materials
    • C01B32/158Carbon nanotubes
    • C01B32/16Preparation
    • C01B32/162Preparation characterised by catalysts
    • DTEXTILES; PAPER
    • D01NATURAL OR MAN-MADE THREADS OR FIBRES; SPINNING
    • D01FCHEMICAL FEATURES IN THE MANUFACTURE OF ARTIFICIAL FILAMENTS, THREADS, FIBRES, BRISTLES OR RIBBONS; APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OF CARBON FILAMENTS
    • D01F9/00Artificial filaments or the like of other substances; Manufacture thereof; Apparatus specially adapted for the manufacture of carbon filaments
    • D01F9/08Artificial filaments or the like of other substances; Manufacture thereof; Apparatus specially adapted for the manufacture of carbon filaments of inorganic material
    • D01F9/12Carbon filaments; Apparatus specially adapted for the manufacture thereof
    • D01F9/127Carbon filaments; Apparatus specially adapted for the manufacture thereof by thermal decomposition of hydrocarbon gases or vapours or other carbon-containing compounds in the form of gas or vapour, e.g. carbon monoxide, alcohols
    • D01F9/133Apparatus therefor
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01BNON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B2202/00Structure or properties of carbon nanotubes
    • C01B2202/02Single-walled nanotubes
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01BNON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B2202/00Structure or properties of carbon nanotubes
    • C01B2202/20Nanotubes characterized by their properties
    • C01B2202/34Length
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01BNON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B2202/00Structure or properties of carbon nanotubes
    • C01B2202/20Nanotubes characterized by their properties
    • C01B2202/36Diameter

Definitions

  • the present invention relates to a method for producing a single-wall carbon nanotube, which is hereinafter also called “SWCNT” in some cases.
  • the arc-discharge is a method in which multiwall carbon nanotubes that are hereinafter also called “MWCNT” in some cases, are produced on an anode by arc-discharging between carbon rods in an atmosphere such as argon at a pressure slightly lower than the atmospheric pressure.
  • MWCNT multiwall carbon nanotubes that are hereinafter also called “MWCNT” in some cases
  • SWCNTs can be formed on an inner side of a container.
  • This arc-discharging method has an advantage that CNTs having a relatively good quality can be produced with fewer defects.
  • this method has the problems that (i) amorphous carbon is simultaneously produced, and (ii) it is costly and (iii) unsuitable for the mass production.
  • the laser ablation is a method in which the CNTs are produced by irradiating a strong pulse beam such as YAG laser upon carbon into which catalyst such as Ni/Co is mixed in a high-temperature atmosphere of 900 to 1300° C.
  • a strong pulse beam such as YAG laser upon carbon into which catalyst such as Ni/Co is mixed in a high-temperature atmosphere of 900 to 1300° C.
  • the CNTs is produced by bringing a carbon compound as a carbon source into contact with fine particles of a catalytic metal at 500 to 1200° C., and both of the MWCNTs and the SWCNTs can be produced.
  • a catalyst is arranged on a substrate, MWCNTs can be obtained, while oriented vertically onto the surface of the substrate.
  • a method for producing the SWCNTs by using the CVD method As the method for producing the SWCNTs by using the CVD method, a method is known from a pamphlet of WO2003/068676, in which a carbon source composed of a compound having oxygen or a mixture of a compound having oxygen and a compound having carbon is contacted with a catalyst at a heating temperature.
  • a method has been sought, which can produce SWCNTs and which can realize high growth rate, growth efficiency, vertical synthesis, etc.
  • the present invention is aimed at solving the above problems, and is to provide a method for producing an SWCNT, which can realize high growth rate, growth efficiency, vertical synthesis, etc.
  • a method for producing a single-wall carbon nanotube comprising contacting an organic dehydrated alcohol with a catalyst in a closed space in vacuum at a temperature of 600 to 900° C.
  • FIG. 1 is a schematic view of a CVD apparatus used in Examples.
  • FIG. 2 is an AFM photograph of SWCNTs obtained in Example 1.
  • FIG. 3 is an enlarged photograph of a part of FIG. 2 .
  • FIG. 4 is an enlarged photograph of a part of FIG. 3 .
  • FIG. 5 is a diagram showing growth distribution proportions of the SWCNTs obtained in Example 1.
  • FIG. 7 shows a result of a Raman spectroscopic analysis (around 100 to 400 cm ⁇ 1 ) of the SWCNT obtained in Example 1.
  • FIG. 8 shows an SEM photograph of SWCNTs obtained in Example 2.
  • FIG. 9 is an enlarged photograph of a part of FIG. 8 .
  • FIG. 10 shows a sectional photograph of SWCNTs obtained in Comparative Example 1.
  • FIG. 11 shows an enlarged photograph of a part of FIG. 10 .
  • FIG. 12 shows a sectional photograph of SWCNTs obtained in Comparative Example 2.
  • FIG. 13 shows an enlarged photograph of a part of FIG. 12 .
  • the method for producing the SWCNTs according to the present invention comprises contacting an organic dehydrated alcohol with a catalyst in a closed space in vacuum at a temperature of 600 to 900° C.
  • the closed space in the present invention is in vacuum when the organic dehydrated alcohol is contacted with the catalyst.
  • the space is in the vacuum state, remaining gases, materials, etc. can easily removed, so that the SWCNTs having a high quality can be obtained.
  • the “vacuum” means a state in which the pressure is reduced and no gas flows, and for example, it means the space obtainable by carrying out a vacuum exhaust of a closed space using a vacuum pump.
  • the degree of the reduced pressure of the vacuum space is preferably at most 1 ⁇ 10 ⁇ 2 Pa, more preferably at most 1 ⁇ 10 ⁇ 4 Pa, and further preferably at most 1 ⁇ 10 ⁇ 5 Pa.
  • a quartz tube can be recited.
  • the vacuum space can be attained by using one or more vacuum pumps, depending upon the degree of the vacuum.
  • the temperature inside the closed space in the present invention is set to a temperature at which the SWCNTs are formed from the organic dehydrated alcohol, and that temperature is preferably 600 to 900° C., and more preferably 700 to 800° C. Such temperature conditions are ordinarily set by raising the temperature in the state that the metal catalyst is introduced into the closed space.
  • the organic dehydrated alcohol is contacted with the metal catalyst.
  • the organic dehydrated alcohol in the present invention includes not only an organic dehydrated alcohol in which water is completely removed, but also an organic dehydrated alcohol containing water in small amount that it is ordinarily regarded as a dehydrated alcohol. For example, those which contain at most 0.005 wt % of water are included in the organic dehydrated alcohol referred to in the present invention.
  • the kind, etc. of the organic dehydrated alcohol used in the present invention are not particularly specified, and two or more kinds of the mixed alcohols suffice.
  • the organic dehydrated alcohol used in the present invention mention may be made of, for example, methanol, ethanol, n-propanol, iso-propanol, n-butanol, iso-butanol, sec-butanol, tert-butanol, n-pentanol, iso-pentanol, n-amyl alcohol, iso-amyl alcohol, n-hexanol, n-heptanol, n-octanol, n-nonylalcohol, n-decanol, etc.
  • the organic dehydrated alcohol including at least one kind selected from methanol, ethanol and iso-propanol as a main component is preferable, and one including ethanol as the main component is more preferable.
  • the main component means a component having the maximum content proportion as calculated by weight, and preferably amounting to at least 99.5 wt %.
  • the pressure at which the organic dehydrated alcohol is contacted with the catalyst is preferably 1 Pa to 100 kPa, and more preferably 100 Pa to 40 kPa, and further preferably 1 kPa to 4 kPa.
  • the organic dehydrated alcohol is contacted with the catalyst.
  • the catalyst used in the present invention is not particularly limited, and one or more kinds of the catalysts may be used together.
  • the metal catalyst is preferable. More specifically, the metal catalyst is at least one kind of Fe, Co, Ni, Mo, Pt, Pd, Rh, Ir, Y, La, Ce, Pr, Nd, Gd, Tb, Dy, Ho, Er and Lu and their oxides, and Co and Fe are more preferable.
  • Fe/Co, Fe/Mo, Co/Mo, Fe/Ti, Fe/TiO 2 , Fe/Al, Fe/Al 2 O 3 , Co/Ti, Co/TiO 2 , Co/Al, and Co/Al 2 O 3 are preferable.
  • the catalyst used in the present invention is preferably deposited on the substrate.
  • a resist method, a dip coating method or the like can be employed.
  • any one of a negative type electron beam resist (for example, a method described in JAPP 43 (2004) 1356) and a positive type electron beam resist (for example, a method described in J. AM. CHEM. SOC. 127 (2005) 11942) is preferable, and the positive type electron beam resist is more preferable.
  • the catalyst is vapor deposited on a portion of the substrate where the resist is removed. At this time, it is preferable angularly to vapor and deposit the catalyst. This measure is preferably employed, because it can provide a catalyst pattern smaller than an actual pattern.
  • the resist method is preferably for a case where a single CNT is grown on the substrate.
  • a catalyst layer is formed by dipping a substrate into a solution containing a catalyst.
  • the amount of the catalyst can be regulated by adjusting the concentration of the catalyst in the catalyst-containing solution.
  • the dip coating method is preferable in a case where fine catalyst particles are formed on the entire surface of the substrate.
  • the substrate can be appropriately selected depending upon the use, etc. of the SWCNTs produced, and is preferably silicon, SiO 2 , and Al 2 O 3 .
  • the surface of the substrate may be oxidized before the catalyst is deposited. This treatment is preferably employed, because it is likely to suppress the formation of a silicide of the catalyst metal.
  • any carrier may be provided between the substrate and the catalyst.
  • the inside of the closed space is preferably washed before the organic dehydrated alcohol is contacted therewith.
  • the closed space is preferably cleaned by oxygen cleaning, ozone cleaning, plasma cleaning, vacuum thermal cleaning or the like.
  • the oxygen cleaning, the ozone cleaning, and the plasma cleaning are preferable.
  • the pressure of the cleaning gas in the case of the cleaning with oxygen, the ozone cleaning, and the plasma cleaning is preferably 1 to 100 kPa, and more preferably 1 to 3 kPa.
  • the pressure of the cleaning gas in the case of the vacuum thermal cleaning is preferably at most 1 Pa, and more preferably at most 6.6 ⁇ 10 ⁇ 4 Pa.
  • the temperature on cleaning is preferably 500 to 1000° C., and more preferably 800 to 1000° C.
  • the SWCNTs can be produced in the state that the probability that the single-wall carbon nanotube grows from one particle is high (the above probability being also called “growth rate” in some cases in this specification).
  • the growth rate in the producing method of the present invention can be preferably at least 50%, more preferably at least 60%, further preferably at least 80%, and further more preferably 100%.
  • a SWCNT can be grown long. Meanwhile, how long a SWCNT grows is called “growth efficiency” in some case in the present specification.
  • the SWCNT having a length of preferably at least 50 nm, more preferably at least 1000 nm, further preferably at least 3000 nm can be obtained.
  • the diameters of the SWCNTs can be 0.5 to 1.7 mm, and further can be 0.5 to 1.2 nm.
  • the SWCNTs can be synthesized vertically to the substrate.
  • variations in the configurations of the SWCNTs obtained can be reduced.
  • at least 60% (preferably at least 80%) of the SWCNTs can be adjusted to fall in a diameter range of 0.5 to 1.5 nm.
  • the SWCNTs grown according to the method of the present invention can be preferably used as a post-silicon material for field-effect transistors and the like, probes for scanning type probe microscopes, field-emission type electron sources, etc.
  • the SWCNTs can be grown vertically to the carrier in the form of the substrate, they can be expected to be applied to the field-emission type electron source.
  • PMMA Polymethylmethacrylate
  • a silicon substrate of which had been thermally oxidized hereinafter called also “thermally oxidized silicon substrate” in some cases
  • spin coating thereby obtaining a thin film of about 50 nm.
  • rectangular patterns having sizes of 20 to 60 nm were formed by electron beam lithography.
  • Co was deposited, in the average thickness of 0.1 nm, on the resultant by vacuum deposition, and Co patterns were formed by a lift-off technique with acetone.
  • a chemical vapor deposition apparatus constituted by a quartz tube, an electric furnace, a rotary pump and a turbo molecular pump as shown in FIG. 1 was used.
  • Heat treatment was carried out, while an oxygen gas was being flown to clean the interior of the quartz tube and a quartz boat.
  • the quartz tube was vacuum evacuated down to 2 Pa (coarse sucking) by the rotary pump, and then while the oxygen gas was being flown at a flow rate of 0.5 l/min., the tube was heated up to 800° C., and thermally treated at 800° C. for 10 minutes. At that time, the pressure was adjusted by switching a valve to a needle valve so that the inner pressure of the quartz tube might be about 2.7 kPa.
  • the oxygen gas was stopped, the quartz tube was cooled, while the tube was being evacuated to vacuum by the turbo molecular pump.
  • the oxygen gas used was at a G1 grade (99.99995%). Cleaning can be also performed by the oxygen plasma cleaning, the ozone cleaning or the like.
  • a thermally oxidized silicon substrate on which the catalyst metal of Co was formed in a discrete fashion was placed on the quartz boat, the boat was placed in the heating furnace, the interior of the quartz tube was vacuum evacuated down to 6.6 ⁇ 10 ⁇ 4 Pa by using the rotary pump and the turbo molecular pump, and the temperature was raised from room temperature up to 800° C. in about 15 minutes. After the temperature reached the growing temperature, waiting was done for 10 minutes so that the temperature might be stabilized. At that time, the inner pressure of the quartz tube was 6.0 ⁇ 10 ⁇ 5 Pa (the pressure of the closed space at the time of contracting the organic dehydrated alcohol).
  • dehydrated ethanol for organic synthesis (water content: at most 50 ppm, manufactured by Wako Pure Chemical Industries, Ltd.) (pressure at the time of introduction: 6.6 ⁇ 10 ⁇ 5 Pa) was introduced into the quartz tube, and SWCNs were grown in the closed quartz tube at the inner pressure of 1.5 kPa (the pressure at which the organic dehydrated alcohol contacts with the catalyst) for 1 minutes. Thereafter, while the interior of the quartz tube was being evacuated to vacuum using the rotary pump and the turbo molecular pump, the furnace was cooled, and then the substrate was taken outside, thereby obtaining SWCNTs. The pressure inside the quartz tube immediately before taking the sample outside was 9.3 ⁇ 10 ⁇ 5 Pa.
  • FIGS. 2 to 4 A photograph of the SWCNTs obtained was taken by means of an atomic force microscope (AFM). Results are shown in FIGS. 2 to 4 .
  • FIG. 3 is an enlarged photograph of a part of FIG. 2
  • FIG. 4 is an enlarged photograph of a part of FIG. 3 .
  • FIG. 6 and FIG. 7 show results in the Raman spectroscopic analysis (excitation wavelength: 488 nm) of a single SWCNT obtained. It was also confirmed that the ratio (G/D) between the height of a peak near 1590 cm ⁇ 1 and that of a peak near 1350 cm ⁇ 1 was 9.2 in FIG. 6 and that since a peak was observed near 164 cm ⁇ 1 in FIG. 7 , a SWCNT having a high quality was synthesized.
  • Catalyst patterns were formed according to a method described in Chem. Phys. Lett. 403 (2005) 320. Specifically, two kinds of solutions were prepared, which had cobalt acetate tetrahydrate and molybdenum acetate dissolved in an ethanol solutions each in an amount of 0.01 wt %, respectively (cobalt acetate solution and molybdenum acetate solution).
  • a thermally oxidized silicon substrate was dipped in the molybdenum acetate solution, then thermally treated at 400° C. in air for 5 minutes, successively dipped in the cobalt acetate solution, and thereafter thermally treated at 400° C. in air for 5 minutes. Thereby, catalyst patterns in which a catalyst of Co/Mo is deposited on a surface of the substrate at a high density were obtained.
  • SWCNTs were grown in the same manner as in Example 2, except that the organic synthesis ethanol was replaced by a special-grade ethanol (manufactured by Kanto Chemical Co., Ltd.) having 0.4% of water at the maximum.
  • the sectional photograph of the obtained SWCNTs taken by the SEM revealed that they did not grow vertically to the substrate, but hugging the substrate as shown in FIGS. 10 and 11 , while no vertical growth was observed unlike the present invention.
  • SWCNTs were grown in the same manner as in Example 2, except that the interior of the quartz tube was not cleaned. Although the SWCNTs obtained were inferior to those in Example 2, the better SWCNTs were obtained in Example 3 as compared with Comparative Examples 1 and 2.
  • SWCNTs were grown in the same manner as in Example 2, except that instead of the vacuum evacuation of down to 6.6 ⁇ 10 ⁇ 4 Pa, the temperature was raised, while argon gas was filled inside the quartz tube at 0.3 SLM and a pressure of 40 kPa under controlling and that before growing, the interior of the quartz tube was vacuum evacuated to 2 Pa through its one end by the rotary pump.
  • the sectional photograph of the obtained SWCNTs taken by the SEM revealed that they did grow not vertically to the substrate, but hugging the substrate as shown in FIGS. 12 and 13 . Thus, it was recognized that no vertical growth was observed unlike the present invention.
  • Example 2 the interior of the quartz tube was evacuated to vacuum, and the temperature was raised to 800° C., while the pressure was kept at around 2 Pa, and then SWCNTs were grown at 2 Pa.
  • a sectional photograph of the obtained SWCNTs taken by the SEM confirmed that although the SWCNTs obtained were inferior to those in Example 2, the better SWCNTs were obtained in Example 4 as compared with Comparative Examples 1 and 2.
  • the SWCNTs having excellent growth efficiency and growth rate could come to be produced by employing the SWCNT producing method of the present invention. Further, the SWCNTs could come to be grown vertically to the substrate by employing the producing method of the present invention.

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Nanotechnology (AREA)
  • Materials Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Thermal Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Textile Engineering (AREA)
  • Organic Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Composite Materials (AREA)
  • Inorganic Chemistry (AREA)
  • Carbon And Carbon Compounds (AREA)
US11/808,208 2006-06-09 2007-06-07 Method for producing a single-wall carbon nanotube Abandoned US20080279752A1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2006160690A JP2007326751A (ja) 2006-06-09 2006-06-09 単層カーボンナノチューブの製造方法
JP2006-160690 2006-06-09

Publications (1)

Publication Number Publication Date
US20080279752A1 true US20080279752A1 (en) 2008-11-13

Family

ID=38927490

Family Applications (1)

Application Number Title Priority Date Filing Date
US11/808,208 Abandoned US20080279752A1 (en) 2006-06-09 2007-06-07 Method for producing a single-wall carbon nanotube

Country Status (2)

Country Link
US (1) US20080279752A1 (ja)
JP (1) JP2007326751A (ja)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8591858B2 (en) * 2008-05-01 2013-11-26 Honda Motor Co., Ltd. Effect of hydrocarbon and transport gas feedstock on efficiency and quality of grown single-walled nanotubes
US9174847B2 (en) * 2008-05-01 2015-11-03 Honda Motor Co., Ltd. Synthesis of high quality carbon single-walled nanotubes
JP2010030837A (ja) * 2008-07-29 2010-02-12 Denso Corp Cnt合成用基板、cnt、及びそれらの製造方法
JP2010208918A (ja) * 2009-03-12 2010-09-24 Hitachi Zosen Corp Cvd副生物の除去方法
JP2020029385A (ja) * 2018-08-23 2020-02-27 学校法人 名城大学 単層カーボンナノチューブの製造方法
CN111841561A (zh) * 2020-07-09 2020-10-30 江西铜业技术研究院有限公司 一种生长碳纳米管的高效催化剂及其制备和使用方法

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20050079118A1 (en) * 2002-02-13 2005-04-14 Shigeo Maruyama Process for producing single-walled carbon nanotube, single-walled carbon nanotube, and composition containing single-walled carbon nanotube
US20060024227A1 (en) * 2003-10-16 2006-02-02 Shigeo Maruyama Array of single-walled carbon nanotubes and process for preparaton thereof

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20050079118A1 (en) * 2002-02-13 2005-04-14 Shigeo Maruyama Process for producing single-walled carbon nanotube, single-walled carbon nanotube, and composition containing single-walled carbon nanotube
US20060024227A1 (en) * 2003-10-16 2006-02-02 Shigeo Maruyama Array of single-walled carbon nanotubes and process for preparaton thereof

Also Published As

Publication number Publication date
JP2007326751A (ja) 2007-12-20

Similar Documents

Publication Publication Date Title
JP4584142B2 (ja) 単層カーボンナノチューブ製造用触媒金属微粒子形成方法
US7727504B2 (en) Fibers comprised of epitaxially grown single-wall carbon nanotubes, and a method for added catalyst and continuous growth at the tip
JP6048591B2 (ja) カーボンナノチューブ
US9045344B2 (en) Method for producing aligned carbon nanotube aggregate
JP3963893B2 (ja) 単層カーボンナノチューブの製造方法
Prasek et al. Methods for carbon nanotubes synthesis
US8349404B2 (en) Methods for growing and harvesting carbon nanotubes
Liu et al. Growth of single-walled carbon nanotubes from ceramic particles by alcohol chemical vapor deposition
US8252405B2 (en) Single-walled carbon nanotubes and methods of preparation thereof
US20070020167A1 (en) Method of preparing catalyst for manufacturing carbon nanotubes
JP4730707B2 (ja) カーボンナノチューブ合成用触媒及びその製造方法、触媒分散液、並びに、カーボンナノチューブの製造方法
US20080279752A1 (en) Method for producing a single-wall carbon nanotube
JP4706852B2 (ja) カーボンナノチューブの製造方法
JP5770166B2 (ja) 調整可能な新種のガス貯蔵材料及びガス感知材料
JP4977982B2 (ja) 線状炭素材料の製造方法及び機能デバイスの製造方法
Prasek et al. Chemical vapor depositions for carbon nanotubes synthesis
JP2020531391A (ja) カーボンナノチューブの合成のための方法及び装置
Bertoni et al. Growth of multi-wall and single-wall carbon nanotubes with in situ high vacuum catalyst deposition
JP6623512B2 (ja) 炭素ナノ構造体集合物およびその製造方法
JP6762005B2 (ja) カーボンナノチューブ集合体の製造方法
CN112638821A (zh) 碳纳米管复合体、碳纳米管复合体的制造方法、以及精制碳纳米管的制造方法
WO2015099195A1 (ja) カーボンナノチューブ、カーボンナノチューブ集合体およびカーボンナノチューブ集合体の製造方法
Jaybhaye et al. Taguchi methodology to grow single-walled carbon nanotubes on silicon wafer
WO2016072096A1 (ja) 炭素ナノ構造体集合物およびその製造方法
JP2007246380A (ja) カーボンナノチューブの成長方法

Legal Events

Date Code Title Description
AS Assignment

Owner name: RIKEN, JAPAN

Free format text: ASSIGNMENT OF ASSIGNORS INTEREST;ASSIGNORS:SUZUKI, MASAKI;ISHIBASHI, KOUJI;REEL/FRAME:019819/0139

Effective date: 20070810

STCB Information on status: application discontinuation

Free format text: ABANDONED -- FAILURE TO RESPOND TO AN OFFICE ACTION