US20060134338A1 - Method and apparatus for forming a metallic feature on a substrate - Google Patents
Method and apparatus for forming a metallic feature on a substrate Download PDFInfo
- Publication number
- US20060134338A1 US20060134338A1 US11/333,009 US33300906A US2006134338A1 US 20060134338 A1 US20060134338 A1 US 20060134338A1 US 33300906 A US33300906 A US 33300906A US 2006134338 A1 US2006134338 A1 US 2006134338A1
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- United States
- Prior art keywords
- mould
- selected area
- substrate
- catalytic particles
- stamp
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- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/02—Electroplating of selected surface areas
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/1601—Process or apparatus
- C23C18/1603—Process or apparatus coating on selected surface areas
- C23C18/1607—Process or apparatus coating on selected surface areas by direct patterning
- C23C18/1608—Process or apparatus coating on selected surface areas by direct patterning from pretreatment step, i.e. selective pre-treatment
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/18—Pretreatment of the material to be coated
- C23C18/20—Pretreatment of the material to be coated of organic surfaces, e.g. resins
- C23C18/2006—Pretreatment of the material to be coated of organic surfaces, e.g. resins by other methods than those of C23C18/22 - C23C18/30
- C23C18/2026—Pretreatment of the material to be coated of organic surfaces, e.g. resins by other methods than those of C23C18/22 - C23C18/30 by radiant energy
- C23C18/2033—Heat
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/18—Pretreatment of the material to be coated
- C23C18/20—Pretreatment of the material to be coated of organic surfaces, e.g. resins
- C23C18/28—Sensitising or activating
- C23C18/30—Activating or accelerating or sensitising with palladium or other noble metal
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/54—Electroplating of non-metallic surfaces
- C25D5/56—Electroplating of non-metallic surfaces of plastics
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/10—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
- H05K3/107—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern by filling grooves in the support with conductive material
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/10—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
- H05K3/18—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material
- H05K3/181—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material by electroless plating
- H05K3/182—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material by electroless plating characterised by the patterning method
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
- H05K2201/09—Shape and layout
- H05K2201/09009—Substrate related
- H05K2201/09118—Moulded substrate
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/01—Tools for processing; Objects used during processing
- H05K2203/0104—Tools for processing; Objects used during processing for patterning or coating
- H05K2203/0108—Male die used for patterning, punching or transferring
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/07—Treatments involving liquids, e.g. plating, rinsing
- H05K2203/0703—Plating
- H05K2203/0709—Catalytic ink or adhesive for electroless plating
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
- H10K71/821—Patterning of a layer by embossing, e.g. stamping to form trenches in an insulating layer
Definitions
- This invention relates to a method and apparatus for forming a metallic feature on a substrate, and in particular to a method and apparatus for forming fine metallic features in close proximity to one another on a substrate.
- PCB printed circuit board
- packaging industries most notably the printed circuit board (PCB), flexible circuit and packaging industries.
- PCB printed circuit board
- the formation of smaller, more densely arranged components on the surface of a substrate allows the manufacture of PCB's that are cheap and operate quickly (due to the proximity of the components), and for flip chip applications the packaging industry requires the accurate patterning of solder bumps onto PCB's for connection to chips.
- More recent techniques comprise the application of catalytic particles to the surface of a substrate by a soft stamp, the particles being applied in a pattern which corresponds to the metallic features that are to be created on the surface of the substrate.
- the substrate Prior stamping, the substrate must first be activated by oxidation and/or silanization in order to ensure the particles will adhere to it.
- metal will only plate to the substrate where catalytic particles have been deposited. In this manner, small-scale metallic surface features can be created.
- one drawback of this process is that the depth of the metallic features is limited by the amount of metal that can be deposited on a region of a substrate containing catalytic particles before lateral spreading of the metal takes place. This clearly places an upper limit both on the density of surface features that can be created using this technique and on the minimum distance between any two features.
- a further drawback of this technique is that the oxidation and silanization steps are lengthy. Furthermore, since these surface treatments form a very thin (nanometer-sized) active layer on the surface, any moulding or deformation of the substrate during the stamping process is not practical. This precludes using the existing method for moulding non-planar circuitry during the stamping process. The stamping process using the previously described technique is also slow.
- one aspect of the present invention provides a method of forming a metallic feature on a substrate, comprising the steps of: providing a stamp having a raised region; depositing catalytic particles on a selected area of the stamp, including the raised region thereof; providing a substrate; applying the stamp to the substrate, such that the raised region of the stamp causes a corresponding indented region in the substrate and at least some of the catalytic particles are transferred to a selected area of the substrate; and plating the selected area of the substrate.
- the step of depositing catalytic particles on the selected area of the stamp comprises the step of immersing at least the selected area of the stamp in a suspension comprising the catalytic particles.
- the step of immersing at least the selected area of the stamp in a suspension comprising the catalytic particles comprises the step of immersing at least the selected area of the stamp in an aqueous suspension comprising the catalytic particles.
- the method further comprises the step of drying at least the selected area of the stamp, after immersion thereof in the suspension.
- the step of drying at least the selected area of the stamp comprises the step of blow drying at least the selected area of the stamp with a gas.
- the step of blow drying at least the selected area with a gas comprises the step of blow drying the selected area with nitrogen, helium or air.
- the step of depositing catalytic particles on the selected area of the stamp comprises the step of depositing polymer-stabilised catalytic particles on the selected area of the stamp.
- the step of depositing polymer-stabilised catalytic particles on the selected area of the stamp comprises the step of depositing catalytic particles stabilised by polyvinylpyrrolidone, poly-2-vinylpyridine or polyvinyl alcohol on the selected area of the stamp
- the step of providing a substrate comprises the step of providing a substrate formed from a glass or a metal.
- the step of providing a substrate comprises the step of providing a polymeric substrate.
- the step of providing a polymeric substrate comprises the step of providing a substrate formed from a polystyrene, a polyimide, an acrylic or an epoxy.
- the step of applying the stamp to the substrate further comprises the step of heating at least one of the stamp or the substrate.
- the step of heating at least one of the stamp or the substrate comprises the step of heating one of the stamp or the substrate to around or above the glass transition temperature of the substrate.
- the method further comprises the step of modifying at least the selected area of the substrate to facilitate the deposition of the catalytic particles thereon.
- the step of modifying at least the selected area of the substrate comprises the step of chemically modifying the selected area of the substrate.
- the step of chemically modifying at least the selected area of the substrate comprises the step of silanising at least the selected area of the substrate.
- the method further comprises the step of removing some of the catalytic particles from the stamp.
- the step of removing some of the catalytic particles from the stamp comprises the steps of: applying an adhesive surface to the stamp; and subsequently removing the adhesive surface from the stamp.
- the step of depositing catalytic particles on the selected area of the stamp comprises the step of depositing palladium-based catalytic particles on the selected area of the stamp.
- Another aspect of the present invention provides a method of forming a metallic feature on a substrate, comprising the steps of: providing a mould, an inner surface thereof having a raised region, depositing catalytic particles on a selected area of the inner surface of the mould, including the raised region thereof; providing a substrate material; moulding the substrate material within the mould, such that a resulting substrate has an indented region corresponding to the raised region of the inner surface of the mould and at least some of the catalytic particles are transferred to a selected area of the substrate; and plating the selected area of the substrate.
- the step of depositing catalytic particles on the selected area of the inner surface of the mould comprises the step of immersing at least the selected area of the inner surface of the mould in a suspension comprising the catalytic particles.
- the step of immersing at least the selected area of the inner surface of the mould in a suspension comprising the catalytic particles comprises the step of immersing at least the selected area of the inner surface of the mould in an aqueous suspension comprising the catalytic particles.
- the method further comprises the step of drying at least the selected area of the mould, after immersion thereof in the suspension.
- the step of drying at least the selected area of the mould comprises the step of blow drying at least the selected area of the mould with a gas.
- the step of blow drying the selected area with a gas comprises the step of blow drying the selected area with nitrogen, helium or air.
- the step of depositing catalytic particles on the selected area of the inner surface of the mould comprises the step of depositing polymer-stabilised catalytic particles on the selected area of the inner surface of the mould.
- the step of depositing polymer-stabilised catalytic particles on the selected area of the inner surface of the mould comprises the step of depositing catalytic particles stabilised by polyvinylpyrrolidone, poly-2-vinylpyridine or polyvinyl alcohol on the selected area of the inner surface of the mould.
- the step of providing a substrate material comprises the step of providing a glass or metal substrate material.
- the step of providing a substrate material comprises the step of providing a polymeric substrate material.
- the step of providing a polymeric substrate material comprises the step of providing a substrate formed from a polystyrene, a polyimide, an acrylic or an epoxy.
- the step of providing a polymeric substrate material comprises the step of providing a thermoset substrate material, and wherein the step of moulding the substrate material comprises the steps of: moulding the substrate material in an uncured or partially cured state; and curing the substrate material in the mould.
- the step of providing a polymeric substrate material comprises the step of providing a thermoplastic substrate material, and wherein the step of moulding the substrate material comprises the step of heating the substrate material to around or above the glass transition temperature thereof.
- the method further comprises the step of removing some of the catalytic particles from the inner surface of the mould.
- the step of removing some of the catalytic particles from the inner surface of the mould comprises the steps of: applying an adhesive surface to the inner surface of the mould, and subsequently removing the adhesive surface from the inner surface of the mould.
- the step of depositing catalytic particles on the selected area of the inner surface of the mould comprises the step of depositing palladium-based catalytic particles on the inner surface of the mould.
- further aspect of the present invention provides a method of forming a metallic feature on a substrate, comprising the steps of: providing a stamp; depositing polymer-stabilised catalytic particles on a selected area of the stamp; providing a substrate; applying the stamp to the substrate such that at least some of the polymer-stabilised catalytic particles are transferred to a selected area of the substrate; and plating the selected area of the substrate.
- the step of depositing polymer-stabilised catalytic particles on the selected area of the stamp comprises the step of depositing catalytic particles stabilised by polyvinylpyrrolidone, poly-2-vinylpyridine or polyvinyl alcohol on the selected area of the stamp
- the selected area of the stamp comprises a raised region of the stamp.
- the step of applying the stamp to the substrate comprises the step of pressing the stamp and the substrate against one another such that the raised region of the stamp causes a corresponding indented region in the substrate.
- the step of depositing polymer-stabilised catalytic particles on the selected area of the stamp comprises the step of immersing at least the selected area of the stamp in a suspension comprising the polymer-stabilised catalytic particles.
- the step of immersing at least the selected area of the stamp in a suspension comprising the polymer-stabilised catalytic particles comprises the step of immersing at least the selected area of the stamp in an aqueous suspension comprising the polymer-stabilised catalytic particles.
- the method further comprises the step of drying at least the selected area of the stamp, after immersion thereof in the suspension.
- the step of drying at least the selected area of the stamp comprises the step of blow drying at least the selected area of the stamp with a gas.
- the step of blow drying at least the selected area of the stamp with a gas comprises the step of blow drying the selected area with nitrogen, helium or air.
- the step of providing a substrate comprises the step of providing a glass or metal substrate.
- the step of providing a substrate comprises the step of providing a polymeric substrate.
- the step of providing a polymeric substrate comprises the step of providing a substrate formed from a polystyrene, a polyimide, an acrylic or an epoxy.
- the step of applying the stamp to the substrate further comprises the step of heating at least one of the stamp or the substrate.
- the step of heating at least one of the stamp or the substrate comprises the step of heating at least one of the stamp or the substrate to around or above the glass transition temperature of the substrate.
- the method further comprises the step of modifying at least the selected area of the substrate to facilitate the position of the polymer-stabilised catalytic particles thereon.
- the step of modifying at least the selected area of the substrate comprises the step of chemically modifying at least the selected area of the substrate.
- the step of chemically modifying at least the selected area of the substrate comprises the step of silanising at least the selected area of the substrate.
- the method further comprises the step of removing some of the polymer-stabilised catalytic particles from the stamp prior to the application thereof to the substrate.
- the step of removing some of the polymer-stabilised catalytic particles from the stamp comprises the steps of: applying an adhesive surface to the stamp; and subsequently removing the adhesive surface from the stamp.
- the step of applying an adhesive surface to the stamp comprises the step of applying a patterned adhesive surface to the stamp.
- the step of depositing polymer-stabilised catalytic particles on the selected area of the stamp comprises the step of depositing palladium-based polymer-stabilised catalytic particles on the selected area of the stamp.
- Another aspect of the present invention provides a stamp for application to a substrate, having a selected area comprising a raised region on a surface thereof and at least the selected area of the surface having catalytic particles deposited thereon.
- the catalytic particles are polymer-stabilised catalytic particles.
- a further aspect of the present invention provides a stamp for application to a substrate, comprising polymer-stabilised catalytic particles deposited on a selected area of a surface thereof.
- the selected area of the surface of the stamp comprises at least one raised region.
- Another aspect of the present invention provides an apparatus for preparing a substrate, comprising: a stamp according to the above; and means to apply the stamp to a substrate.
- the apparatus further comprises means to selectively remove some of the catalytic particles from the stamp.
- the apparatus further comprises means to plate the substrate.
- the means to plate the substrate comprise means to electroless plate or immersion plate the substrate
- FIG. 1 shows a cross-sectional view of a stamp
- FIG. 2 shows a cross-sectional view of the stamp of FIG. 1 , with catalytic particles deposited thereon, embodying the present invention
- FIG. 3 shows a cross-sectional view of the stamp of FIG. 2 being applied to a substrate
- FIG. 4 shows a cross-sectional view of the substrate of FIG. 3 after application thereto of the stamp of FIG. 2 .
- FIG. 5 shows a cross-sectional view of the substrate of FIG. 4 following metalisation thereof
- FIG. 6 shows a cross-sectional view of a further stamp embodying the present invention
- FIG. 7 shows a cross-sectional view of the stamp of FIG. 6 , with a length of adhesive tape applied thereto;
- FIG. 8 shows a cross-sectional view of the stamp of FIG. 7 , after removal of the adhesive tape
- FIG. 9 shows a cross-sectional view of a further substrate, following application of the further stamp thereto and metalisation thereof.
- FIG. 10 shows a cross-sectional view of a third stamp embodying the present invention.
- FIG. 11 shows a cross-sectional view of the stamp of FIG. 10 after application of an adhesive surface thereto;
- FIG. 12 shows a cross-sectional view of the stamp of FIG. 11 being applied to a third substrate
- FIG. 13 shows the substrate of FIG. 13 following metalisation thereof.
- the stamp 1 may be formed from silicon, or may be formed from any other suitable material such as glass, a metal or a polymer.
- a stamping surface 2 of the stamp 1 is formed to have raised regions 3 thereon, there being sunken channels 4 between the raised regions 3 .
- the pattern of raised regions 3 corresponds to a pattern of metallic features that are to be formed on a substrate.
- the stamping surface 2 of the stamp 1 is coated with a layer of catalytic particles 5 , as shown in FIG. 2 .
- the stamp 1 now embodies the present invention.
- the catalytic particles 5 comprise nanometer-sized palladium particles.
- the catalytic particles 5 are coated with molecules of polyvinylpyrrolidone, poly-2-vinylpyridine or polyvinyl alcohol, which coating confers the beneficial effect of stabilising the colloidal suspension of the catalytic particles 5 against agglomeration.
- the layer of catalytic particles 5 is deposited on the stamping surface 2 of the stamp 1 by immersion of the stamp 1 in a suspension of the catalytic particles 5 .
- the catalytic particles 5 are adsorbed weakly to the stamping surface 2 of the stamp 1 .
- the stamp 1 is removed from the suspension and blown dry with a gas, such as nitrogen, helium or air. Immersion of the stamp 1 in the suspension may take place for a few seconds, or longer (e.g., several minutes or tens of minutes), as required. It may also be done repeatedly with a drying step in between, if required.
- the stamp 1 is pressed against a surface of a substrate 6 , the stamping surface 2 of the stamp 1 being placed in contact with the substrate 6 .
- This step is shown in FIG. 3 .
- the stamp 1 is pressed against the substrate 6 sufficiently forcefully that the raised regions 3 on the stamping surface 2 of the stamp 1 form corresponding indented regions 7 in the surface of the substrate 6 , but not so forcefully that the sunken regions 4 of the stamping surface 2 come into contact with the surface of the substrate 6 .
- the substrate 6 is a polymeric substrate.
- the substrate 6 is formed from a thermoplastic material, and the stamp 1 is heated to around or above the glass transition temperature of the substrate material before or during application of the stamp 1 to the substrate 6 .
- the material of the substrate 6 is selected to be sufficiently soft (or to become sufficiently soft on heating) that formation of the indented regions 7 by the raised regions 3 of the stamp 1 occurs readily.
- the substrate 6 is formed from a partially cured thermoset polymer, and the substrate 6 is cured during or after the stamping process.
- the substrate 6 forms either direct or indirect bonds with the catalytic particles 5 on the stamping surface 2 of the stamp 1 . These bonds are stronger than those between the catalytic particles 5 and the stamping surface 2 of the stamp 1 . Hence, when the stamp 1 is removed from the substrate 6 , many of the catalytic particles 5 remain in the indented regions 7 of the surface of the substrate 6 , as shown in FIG. 4 .
- the surface of the substrate 6 is modified to facilitate the deposition of the catalytic particles 5 thereon.
- modification may be chemical (for instance, silanising of the substrate surface), and a skilled person will appreciate that there are several ways in which the substrate surface may be advantageously modified.
- the substrate 6 is now ready for plating.
- the plating may be electroless plating, or may be performed by any other suitable method, for example immersion plating.
- the catalytic particles 5 perform as activators for the plating. Consequently, when the substrate 6 is plated, plating occurs only where the catalytic particles 5 are present on the surface of the substrate 6 . It will be clear that, since the catalytic particles 5 are present only in the indented regions 7 of the surface of the substrate 6 , metalisation of the surface of the substrate 6 during the plating process will only occur in the indented regions 7 thereof.
- FIG. 5 shows the substrate 6 after metalisation thereof, and it can be seen that the deposited metal 8 is restricted to the indented regions 7 of the surface of the substrate 6 .
- the metallic features can be of relatively great depth, and the width of the features is independent of this depth, allowing greater control over the exact dimensions of the metallic features.
- the catalytic particles 5 may be selectively removed from the surface of a stamp prior to the application of the stamp to the substrate. An example of this is shown in FIGS. 6 to 9 .
- FIG. 6 shows a further stamp 9 , which has a stamping surface 10 which is patterned to have raised regions 11 with sunken regions 12 therebetween.
- the stamping surface 10 of the further stamp 9 is coated with catalytic particles 5 , as described above.
- a layer of adhesive tape 13 is placed over the stamping surface 10 of the further stamp 9 , as shown in FIG. 7 .
- the catalytic particles 5 deposited on the raised regions 11 of the stamping surface 10 of the further stamp 9 will come into contact with the adhesive tape 13 .
- the catalytic particles in the sunken regions 12 of the stamping surface 10 of the further stamp 9 do not come into contact with the adhesive tape 13 .
- the adhesive tape 13 is subsequently removed from the stamping surface 10 of the further stamp 9 , and the catalytic particles 5 with which the adhesive tape 13 was in contact are also removed.
- the raised regions 11 of the further stamp 9 have no catalytic particles 5 thereon, but the sunken regions 12 of the further stamp 9 have catalytic particles 5 adhered thereto.
- the further stamp 9 is then applied to a further substrate 14 .
- the further stamp 9 is pressed against the further substrate 14 with sufficient force for the entirety of the stamping surface 10 of the further stamp 9 , including the sunken regions 12 thereof, to come into contact with the surface of the further substrate 14 .
- catalytic particles 5 are only bonded to the further substrate 14 in regions thereof corresponding to the sunken regions 12 of the further stamp 9 , as shown in FIG. 9 .
- the above example also illustrates how the method of the present invention may be employed to create metallic features that protrude above the surface of a substrate.
- the surface of the further substrate 14 will comprise peaks (corresponding to the sunken regions 12 of the further stamp 9 ) and troughs (corresponding to the raised regions 11 of the further stamp 9 ).
- the peaks will be metallised.
- metallic features that protrude above the surface of the further substrate 14 may be created.
- the finely-controlled formation of such features as provided by embodiments of the present invention is useful in, for example, the provision of bumps on a PCB for connection to a chip.
- the stamp 1 or the further stamp 9 is provided as part of a mould, to be used in an injection or compression moulding process. Liquid substrate material is placed in the mould, and upon hardening of the substrate material a substrate having a surface with indented regions 7 corresponding to the raised regions 3 , 11 on the stamping surface 2 , 10 of the stamp 1 or the further stamp 9 is formed.
- this method of forming a substrate may be employed with a wide variety of substrate materials.
- the substrate material is a thermoset polymer
- the substrate material is preferably moulded in an uncured or partially cured state and cured whilst in the mould.
- the substrate material is a thermoplastic polymer
- the substrate material is preferably heated to above the glass transition temperature thereof and cooled in the mould as known in the art.
- the present invention involves the use of polymer-stabilised catalytic particles.
- Known methods employ catalytic particles that are stabilised by surfactants, for example tetraoctadecylammonium bromide in toluene.
- polymer-stabilised catalytic particles allows stamping to be done without any surface treatment of the substrate being necessary. This is important as it allows the substrate to be significantly deformed during stamping or moulding. Consequently, non-planar surfaces and conformal circuitry can be formed during the stamping process.
- the present method and apparatus allow the particles to weakly adhere to a stamp within seconds, thus expediting the preparation of the stamp and reducing manufacturing time.
- suitable polymers that may be used to stabilise catalytic particles include polyvinylpyrrolidone, poly-2-vinylpyridine and polyvinyl alcohol.
- the present invention is not limited to these specific polymers.
- FIG. 10 shows a planar third stamp 15 with a layer of polymer-stabilised catalytic particles 16 deposited on a stamping surface 17 thereof.
- An adhesive surface 18 having raised regions 19 thereon, is pressed against the stamping surface 17 of the third stamp 15 to selectively remove some of the polymer-stabilised catalytic particles 16 therefrom.
- the raised regions 19 of the adhesive surface 18 correspond to the gaps between metallic features that it is desired to form on a substrate.
- the adhesive surface 18 is removed from the stamping surface 16 of the third stamp 15 , leaving polymer-stabilised catalytic particles 16 only on those regions of the stamping surface 17 of the third stamp that did not come into contact with the adhesive surface 18 , i.e. those corresponding to the gaps between the raised regions 19 of the adhesive surface 18 as shown in FIG. 11 .
- the third stamp 15 is then applied to a planar third substrate 20 , as shown in FIG. 12 .
- the pressing of third stamp 15 against the third substrate 20 does not create any significant indentations therein, as the stamping surface 17 of the third stamp 15 is substantially planar.
- the polymer-stabilised catalytic particles 16 will be transferred from the third stamp 15 to the third substrate 20 .
- the third substrate 20 is electroless plated with a metal 21 resulting in metalisation of the third substrate 20 only in the regions thereof on which polymer-stabilised catalytic particles 16 have been deposited. (as shown in FIG. 13 ).
- the above invention is not limited to use in the PCB, flexible circuit and packaging industries, and it is envisaged that the present invention could also be used to pattern magnetic features (such as nickel/cobalt alloys) onto disks to form patterned media disk drives. Alternatively, fine metal lines produced using the present invention could be used for optical or other gratings.
- magnetic features such as nickel/cobalt alloys
- fine metal lines produced using the present invention could be used for optical or other gratings.
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Abstract
Description
- This invention relates to a method and apparatus for forming a metallic feature on a substrate, and in particular to a method and apparatus for forming fine metallic features in close proximity to one another on a substrate.
- The formation of fine metallic features in close proximity to one another is of great commercial interest in several industries, most notably the printed circuit board (PCB), flexible circuit and packaging industries. The formation of smaller, more densely arranged components on the surface of a substrate allows the manufacture of PCB's that are cheap and operate quickly (due to the proximity of the components), and for flip chip applications the packaging industry requires the accurate patterning of solder bumps onto PCB's for connection to chips.
- Many conventional methods of forming metallic features on substrates involve the use of photolithography to define a pattern on the substrate. However, this technique is cumbersome and expensive, and the size the of metallic features that can be produced thereby on, for example, PCB's is limited to around 30 .mu.m and above. Moreover, the controlled formation of three-dimensional features (i.e. those which are raised above the surface of the substrate) is difficult using such conventional methods.
- More recent techniques comprise the application of catalytic particles to the surface of a substrate by a soft stamp, the particles being applied in a pattern which corresponds to the metallic features that are to be created on the surface of the substrate. Prior stamping, the substrate must first be activated by oxidation and/or silanization in order to ensure the particles will adhere to it. During subsequent electroless plating of the substrate, metal will only plate to the substrate where catalytic particles have been deposited. In this manner, small-scale metallic surface features can be created.
- However, one drawback of this process is that the depth of the metallic features is limited by the amount of metal that can be deposited on a region of a substrate containing catalytic particles before lateral spreading of the metal takes place. This clearly places an upper limit both on the density of surface features that can be created using this technique and on the minimum distance between any two features.
- A further drawback of this technique is that the oxidation and silanization steps are lengthy. Furthermore, since these surface treatments form a very thin (nanometer-sized) active layer on the surface, any moulding or deformation of the substrate during the stamping process is not practical. This precludes using the existing method for moulding non-planar circuitry during the stamping process. The stamping process using the previously described technique is also slow.
- It is an object of the present invention to seek to provide a method and apparatus for forming metallic features on a substrate that alleviate some or all of the above drawbacks.
- Accordingly, one aspect of the present invention provides a method of forming a metallic feature on a substrate, comprising the steps of: providing a stamp having a raised region; depositing catalytic particles on a selected area of the stamp, including the raised region thereof; providing a substrate; applying the stamp to the substrate, such that the raised region of the stamp causes a corresponding indented region in the substrate and at least some of the catalytic particles are transferred to a selected area of the substrate; and plating the selected area of the substrate.
- Advantageously, the step of depositing catalytic particles on the selected area of the stamp comprises the step of immersing at least the selected area of the stamp in a suspension comprising the catalytic particles.
- Preferably, the step of immersing at least the selected area of the stamp in a suspension comprising the catalytic particles comprises the step of immersing at least the selected area of the stamp in an aqueous suspension comprising the catalytic particles.
- Conveniently, the method further comprises the step of drying at least the selected area of the stamp, after immersion thereof in the suspension.
- Advantageously, the step of drying at least the selected area of the stamp comprises the step of blow drying at least the selected area of the stamp with a gas.
- Preferably, the step of blow drying at least the selected area with a gas comprises the step of blow drying the selected area with nitrogen, helium or air.
- Conveniently, the step of depositing catalytic particles on the selected area of the stamp comprises the step of depositing polymer-stabilised catalytic particles on the selected area of the stamp.
- Advantageously, the step of depositing polymer-stabilised catalytic particles on the selected area of the stamp comprises the step of depositing catalytic particles stabilised by polyvinylpyrrolidone, poly-2-vinylpyridine or polyvinyl alcohol on the selected area of the stamp
- Preferably, the step of providing a substrate comprises the step of providing a substrate formed from a glass or a metal.
- Conveniently, the step of providing a substrate comprises the step of providing a polymeric substrate.
- Advantageously, the step of providing a polymeric substrate comprises the step of providing a substrate formed from a polystyrene, a polyimide, an acrylic or an epoxy.
- Preferably, the step of applying the stamp to the substrate further comprises the step of heating at least one of the stamp or the substrate.
- Conveniently, the step of heating at least one of the stamp or the substrate comprises the step of heating one of the stamp or the substrate to around or above the glass transition temperature of the substrate.
- Advantageously, the method further comprises the step of modifying at least the selected area of the substrate to facilitate the deposition of the catalytic particles thereon.
- Preferably, the step of modifying at least the selected area of the substrate comprises the step of chemically modifying the selected area of the substrate.
- Conveniently, the step of chemically modifying at least the selected area of the substrate comprises the step of silanising at least the selected area of the substrate.
- Advantageously, the method further comprises the step of removing some of the catalytic particles from the stamp.
- Preferably, the step of removing some of the catalytic particles from the stamp comprises the steps of: applying an adhesive surface to the stamp; and subsequently removing the adhesive surface from the stamp.
- Conveniently, the step of depositing catalytic particles on the selected area of the stamp comprises the step of depositing palladium-based catalytic particles on the selected area of the stamp.
- Another aspect of the present invention provides a method of forming a metallic feature on a substrate, comprising the steps of: providing a mould, an inner surface thereof having a raised region, depositing catalytic particles on a selected area of the inner surface of the mould, including the raised region thereof; providing a substrate material; moulding the substrate material within the mould, such that a resulting substrate has an indented region corresponding to the raised region of the inner surface of the mould and at least some of the catalytic particles are transferred to a selected area of the substrate; and plating the selected area of the substrate.
- Advantageously, the step of depositing catalytic particles on the selected area of the inner surface of the mould comprises the step of immersing at least the selected area of the inner surface of the mould in a suspension comprising the catalytic particles.
- Preferably, the step of immersing at least the selected area of the inner surface of the mould in a suspension comprising the catalytic particles comprises the step of immersing at least the selected area of the inner surface of the mould in an aqueous suspension comprising the catalytic particles.
- Conveniently, the method further comprises the step of drying at least the selected area of the mould, after immersion thereof in the suspension.
- Advantageously, the step of drying at least the selected area of the mould comprises the step of blow drying at least the selected area of the mould with a gas.
- Preferably, the step of blow drying the selected area with a gas comprises the step of blow drying the selected area with nitrogen, helium or air.
- Conveniently, the step of depositing catalytic particles on the selected area of the inner surface of the mould comprises the step of depositing polymer-stabilised catalytic particles on the selected area of the inner surface of the mould.
- Advantageously, the step of depositing polymer-stabilised catalytic particles on the selected area of the inner surface of the mould comprises the step of depositing catalytic particles stabilised by polyvinylpyrrolidone, poly-2-vinylpyridine or polyvinyl alcohol on the selected area of the inner surface of the mould.
- Preferably, the step of providing a substrate material comprises the step of providing a glass or metal substrate material.
- Conveniently, the step of providing a substrate material comprises the step of providing a polymeric substrate material.
- Advantageously, the step of providing a polymeric substrate material comprises the step of providing a substrate formed from a polystyrene, a polyimide, an acrylic or an epoxy.
- Preferably, the step of providing a polymeric substrate material comprises the step of providing a thermoset substrate material, and wherein the step of moulding the substrate material comprises the steps of: moulding the substrate material in an uncured or partially cured state; and curing the substrate material in the mould.
- Conveniently, the step of providing a polymeric substrate material comprises the step of providing a thermoplastic substrate material, and wherein the step of moulding the substrate material comprises the step of heating the substrate material to around or above the glass transition temperature thereof.
- Advantageously, the method further comprises the step of removing some of the catalytic particles from the inner surface of the mould.
- Preferably, the step of removing some of the catalytic particles from the inner surface of the mould comprises the steps of: applying an adhesive surface to the inner surface of the mould, and subsequently removing the adhesive surface from the inner surface of the mould.
- Conveniently, the step of depositing catalytic particles on the selected area of the inner surface of the mould comprises the step of depositing palladium-based catalytic particles on the inner surface of the mould. further aspect of the present invention provides a method of forming a metallic feature on a substrate, comprising the steps of: providing a stamp; depositing polymer-stabilised catalytic particles on a selected area of the stamp; providing a substrate; applying the stamp to the substrate such that at least some of the polymer-stabilised catalytic particles are transferred to a selected area of the substrate; and plating the selected area of the substrate.
- Advantageously, the step of depositing polymer-stabilised catalytic particles on the selected area of the stamp comprises the step of depositing catalytic particles stabilised by polyvinylpyrrolidone, poly-2-vinylpyridine or polyvinyl alcohol on the selected area of the stamp
- Preferably, the selected area of the stamp comprises a raised region of the stamp.
- Conveniently, the step of applying the stamp to the substrate comprises the step of pressing the stamp and the substrate against one another such that the raised region of the stamp causes a corresponding indented region in the substrate.
- Advantageously, the step of depositing polymer-stabilised catalytic particles on the selected area of the stamp comprises the step of immersing at least the selected area of the stamp in a suspension comprising the polymer-stabilised catalytic particles.
- Preferably, the step of immersing at least the selected area of the stamp in a suspension comprising the polymer-stabilised catalytic particles comprises the step of immersing at least the selected area of the stamp in an aqueous suspension comprising the polymer-stabilised catalytic particles.
- Conveniently, the method further comprises the step of drying at least the selected area of the stamp, after immersion thereof in the suspension.
- Advantageously, the step of drying at least the selected area of the stamp comprises the step of blow drying at least the selected area of the stamp with a gas.
- Preferably, the step of blow drying at least the selected area of the stamp with a gas comprises the step of blow drying the selected area with nitrogen, helium or air.
- Conveniently, the step of providing a substrate comprises the step of providing a glass or metal substrate.
- Advantageously, the step of providing a substrate comprises the step of providing a polymeric substrate.
- Preferably, the step of providing a polymeric substrate comprises the step of providing a substrate formed from a polystyrene, a polyimide, an acrylic or an epoxy.
- Conveniently, the step of applying the stamp to the substrate further comprises the step of heating at least one of the stamp or the substrate. Advantageously, the step of heating at least one of the stamp or the substrate comprises the step of heating at least one of the stamp or the substrate to around or above the glass transition temperature of the substrate.
- Preferably, the method further comprises the step of modifying at least the selected area of the substrate to facilitate the position of the polymer-stabilised catalytic particles thereon.
- Conveniently, the step of modifying at least the selected area of the substrate comprises the step of chemically modifying at least the selected area of the substrate.
- Advantageously, the step of chemically modifying at least the selected area of the substrate comprises the step of silanising at least the selected area of the substrate.
- Preferably, the method further comprises the step of removing some of the polymer-stabilised catalytic particles from the stamp prior to the application thereof to the substrate.
- Conveniently, the step of removing some of the polymer-stabilised catalytic particles from the stamp comprises the steps of: applying an adhesive surface to the stamp; and subsequently removing the adhesive surface from the stamp.
- Advantageously, the step of applying an adhesive surface to the stamp comprises the step of applying a patterned adhesive surface to the stamp.
- Preferably, the step of depositing polymer-stabilised catalytic particles on the selected area of the stamp comprises the step of depositing palladium-based polymer-stabilised catalytic particles on the selected area of the stamp.
- Another aspect of the present invention provides a stamp for application to a substrate, having a selected area comprising a raised region on a surface thereof and at least the selected area of the surface having catalytic particles deposited thereon.
- Conveniently, the catalytic particles are polymer-stabilised catalytic particles.
- A further aspect of the present invention provides a stamp for application to a substrate, comprising polymer-stabilised catalytic particles deposited on a selected area of a surface thereof.
- Advantageously, the selected area of the surface of the stamp comprises at least one raised region.
- Another aspect of the present invention provides an apparatus for preparing a substrate, comprising: a stamp according to the above; and means to apply the stamp to a substrate.
- Preferably, the apparatus further comprises means to selectively remove some of the catalytic particles from the stamp.
- Conveniently, the apparatus further comprises means to plate the substrate.
- Advantageously, the means to plate the substrate comprise means to electroless plate or immersion plate the substrate
- In order that the present invention may be more readily understood, embodiments thereof will now be described, by way of example, with reference to the accompanying drawings, in which:
-
FIG. 1 shows a cross-sectional view of a stamp; -
FIG. 2 shows a cross-sectional view of the stamp ofFIG. 1 , with catalytic particles deposited thereon, embodying the present invention; -
FIG. 3 shows a cross-sectional view of the stamp ofFIG. 2 being applied to a substrate; -
FIG. 4 shows a cross-sectional view of the substrate ofFIG. 3 after application thereto of the stamp ofFIG. 2 . -
FIG. 5 shows a cross-sectional view of the substrate ofFIG. 4 following metalisation thereof; -
FIG. 6 shows a cross-sectional view of a further stamp embodying the present invention; -
FIG. 7 shows a cross-sectional view of the stamp ofFIG. 6 , with a length of adhesive tape applied thereto; -
FIG. 8 shows a cross-sectional view of the stamp ofFIG. 7 , after removal of the adhesive tape; -
FIG. 9 shows a cross-sectional view of a further substrate, following application of the further stamp thereto and metalisation thereof. -
FIG. 10 shows a cross-sectional view of a third stamp embodying the present invention; -
FIG. 11 shows a cross-sectional view of the stamp ofFIG. 10 after application of an adhesive surface thereto; -
FIG. 12 shows a cross-sectional view of the stamp ofFIG. 11 being applied to a third substrate; and -
FIG. 13 shows the substrate ofFIG. 13 following metalisation thereof. - Turning firstly to
FIG. 1 , astamp 1 is shown. Thestamp 1 may be formed from silicon, or may be formed from any other suitable material such as glass, a metal or a polymer. A stampingsurface 2 of thestamp 1 is formed to have raisedregions 3 thereon, there beingsunken channels 4 between the raisedregions 3. The pattern of raisedregions 3 corresponds to a pattern of metallic features that are to be formed on a substrate. - In a first step of a method embodying the present invention, the stamping
surface 2 of thestamp 1 is coated with a layer ofcatalytic particles 5, as shown inFIG. 2 . Thestamp 1 now embodies the present invention. In a preferred embodiment, thecatalytic particles 5 comprise nanometer-sized palladium particles. Advantageously, thecatalytic particles 5 are coated with molecules of polyvinylpyrrolidone, poly-2-vinylpyridine or polyvinyl alcohol, which coating confers the beneficial effect of stabilising the colloidal suspension of thecatalytic particles 5 against agglomeration. - The layer of
catalytic particles 5 is deposited on the stampingsurface 2 of thestamp 1 by immersion of thestamp 1 in a suspension of thecatalytic particles 5. Thecatalytic particles 5 are adsorbed weakly to the stampingsurface 2 of thestamp 1. After immersion in the suspension thestamp 1 is removed from the suspension and blown dry with a gas, such as nitrogen, helium or air. Immersion of thestamp 1 in the suspension may take place for a few seconds, or longer (e.g., several minutes or tens of minutes), as required. It may also be done repeatedly with a drying step in between, if required. - In a subsequent step of the method of the present invention, the
stamp 1 is pressed against a surface of asubstrate 6, the stampingsurface 2 of thestamp 1 being placed in contact with thesubstrate 6. This step is shown inFIG. 3 . Thestamp 1 is pressed against thesubstrate 6 sufficiently forcefully that the raisedregions 3 on the stampingsurface 2 of thestamp 1 form corresponding indented regions 7 in the surface of thesubstrate 6, but not so forcefully that thesunken regions 4 of the stampingsurface 2 come into contact with the surface of thesubstrate 6. - Advantageously, the
substrate 6 is a polymeric substrate. In a preferred embodiment of the invention, thesubstrate 6 is formed from a thermoplastic material, and thestamp 1 is heated to around or above the glass transition temperature of the substrate material before or during application of thestamp 1 to thesubstrate 6. The material of thesubstrate 6 is selected to be sufficiently soft (or to become sufficiently soft on heating) that formation of the indented regions 7 by the raisedregions 3 of thestamp 1 occurs readily. - Alternatively, the
substrate 6 is formed from a partially cured thermoset polymer, and thesubstrate 6 is cured during or after the stamping process. - During the application of the
stamp 1 to thesubstrate 6, thesubstrate 6 forms either direct or indirect bonds with thecatalytic particles 5 on the stampingsurface 2 of thestamp 1. These bonds are stronger than those between thecatalytic particles 5 and the stampingsurface 2 of thestamp 1. Hence, when thestamp 1 is removed from thesubstrate 6, many of thecatalytic particles 5 remain in the indented regions 7 of the surface of thesubstrate 6, as shown inFIG. 4 . - In a preferred embodiment of the present invention, the surface of the
substrate 6 is modified to facilitate the deposition of thecatalytic particles 5 thereon. Such modification may be chemical (for instance, silanising of the substrate surface), and a skilled person will appreciate that there are several ways in which the substrate surface may be advantageously modified. - The
substrate 6 is now ready for plating. The plating may be electroless plating, or may be performed by any other suitable method, for example immersion plating. Thecatalytic particles 5 perform as activators for the plating. Consequently, when thesubstrate 6 is plated, plating occurs only where thecatalytic particles 5 are present on the surface of thesubstrate 6. It will be clear that, since thecatalytic particles 5 are present only in the indented regions 7 of the surface of thesubstrate 6, metalisation of the surface of thesubstrate 6 during the plating process will only occur in the indented regions 7 thereof. - This means that, as metalisation of the surface of the
substrate 6 progresses, the deposited metal will be contained within the walls formed by the non-indented regions of the surface of thesubstrate 6, and no lateral progress of the deposited metal across the surface of thesubstrate 6 will be possible.FIG. 5 shows thesubstrate 6 after metalisation thereof, and it can be seen that the depositedmetal 8 is restricted to the indented regions 7 of the surface of thesubstrate 6. - It will be appreciated that the above method allows the formation of metallic features on the surface of a substrate very close to one another, with very little possibility of the metallic features interfering with one another, due to the presence of the walls of substance material therebetween.
- In addition, the metallic features can be of relatively great depth, and the width of the features is independent of this depth, allowing greater control over the exact dimensions of the metallic features.
- In another embodiment of the present invention, the
catalytic particles 5 may be selectively removed from the surface of a stamp prior to the application of the stamp to the substrate. An example of this is shown in FIGS. 6 to 9. -
FIG. 6 shows afurther stamp 9, which has a stampingsurface 10 which is patterned to have raisedregions 11 withsunken regions 12 therebetween. The stampingsurface 10 of thefurther stamp 9 is coated withcatalytic particles 5, as described above. - Prior to the application of the
further stamp 9 to a substrate, a layer ofadhesive tape 13 is placed over the stampingsurface 10 of thefurther stamp 9, as shown inFIG. 7 . Thecatalytic particles 5 deposited on the raisedregions 11 of the stampingsurface 10 of thefurther stamp 9 will come into contact with theadhesive tape 13. However, the catalytic particles in thesunken regions 12 of the stampingsurface 10 of thefurther stamp 9 do not come into contact with theadhesive tape 13. - The
adhesive tape 13 is subsequently removed from the stampingsurface 10 of thefurther stamp 9, and thecatalytic particles 5 with which theadhesive tape 13 was in contact are also removed. Hence, as shown inFIG. 8 , the raisedregions 11 of thefurther stamp 9 have nocatalytic particles 5 thereon, but thesunken regions 12 of thefurther stamp 9 havecatalytic particles 5 adhered thereto. - The
further stamp 9 is then applied to afurther substrate 14. However, in contrast to the above-described application of thestamp 1 to thesubstrate 6, thefurther stamp 9 is pressed against thefurther substrate 14 with sufficient force for the entirety of the stampingsurface 10 of thefurther stamp 9, including thesunken regions 12 thereof, to come into contact with the surface of thefurther substrate 14. Once thefurther stamp 9 is removed from thefurther substrate 14,catalytic particles 5 are only bonded to thefurther substrate 14 in regions thereof corresponding to thesunken regions 12 of thefurther stamp 9, as shown inFIG. 9 . - It will be appreciated that the selective removal of
catalytic particles 5 from the surface of a stamp prior to application thereof to a substrate allows corresponding selective metalisation of the substrate during subsequent electroplating. - The above example also illustrates how the method of the present invention may be employed to create metallic features that protrude above the surface of a substrate. After application of the
further stamp 9 to thefurther substrate 14, the surface of thefurther substrate 14 will comprise peaks (corresponding to thesunken regions 12 of the further stamp 9) and troughs (corresponding to the raisedregions 11 of the further stamp 9). The peaks will be metallised. Hence, metallic features that protrude above the surface of thefurther substrate 14 may be created. The finely-controlled formation of such features as provided by embodiments of the present invention is useful in, for example, the provision of bumps on a PCB for connection to a chip. - In an alternative embodiment of the present invention, the
stamp 1 or thefurther stamp 9 is provided as part of a mould, to be used in an injection or compression moulding process. Liquid substrate material is placed in the mould, and upon hardening of the substrate material a substrate having a surface with indented regions 7 corresponding to the raisedregions surface stamp 1 or thefurther stamp 9 is formed. - It will be appreciated that this method of forming a substrate may be employed with a wide variety of substrate materials. For instance, if the substrate material is a thermoset polymer, the substrate material is preferably moulded in an uncured or partially cured state and cured whilst in the mould. In contrast, if the substrate material is a thermoplastic polymer, the substrate material is preferably heated to above the glass transition temperature thereof and cooled in the mould as known in the art.
- In another aspect, the present invention involves the use of polymer-stabilised catalytic particles. Known methods employ catalytic particles that are stabilised by surfactants, for example tetraoctadecylammonium bromide in toluene.
- The use of polymer-stabilised catalytic particles, however, allows stamping to be done without any surface treatment of the substrate being necessary. This is important as it allows the substrate to be significantly deformed during stamping or moulding. Consequently, non-planar surfaces and conformal circuitry can be formed during the stamping process. In addition, the present method and apparatus allow the particles to weakly adhere to a stamp within seconds, thus expediting the preparation of the stamp and reducing manufacturing time. Examples of suitable polymers that may be used to stabilise catalytic particles include polyvinylpyrrolidone, poly-2-vinylpyridine and polyvinyl alcohol. However, the present invention is not limited to these specific polymers.
- This aspect of the present invention is not limited to use with a stamp having raised regions on a stamping surface thereof, and may be used with planar stamps.
FIG. 10 shows a planarthird stamp 15 with a layer of polymer-stabilisedcatalytic particles 16 deposited on a stampingsurface 17 thereof. - An
adhesive surface 18, having raisedregions 19 thereon, is pressed against the stampingsurface 17 of thethird stamp 15 to selectively remove some of the polymer-stabilisedcatalytic particles 16 therefrom. In this embodiment of the invention, as will be seen below, the raisedregions 19 of theadhesive surface 18 correspond to the gaps between metallic features that it is desired to form on a substrate. Theadhesive surface 18 is removed from the stampingsurface 16 of thethird stamp 15, leaving polymer-stabilisedcatalytic particles 16 only on those regions of the stampingsurface 17 of the third stamp that did not come into contact with theadhesive surface 18, i.e. those corresponding to the gaps between the raisedregions 19 of theadhesive surface 18 as shown inFIG. 11 . - The
third stamp 15 is then applied to a planarthird substrate 20, as shown inFIG. 12 . In contrast to the above described embodiments, the pressing ofthird stamp 15 against thethird substrate 20 does not create any significant indentations therein, as the stampingsurface 17 of thethird stamp 15 is substantially planar. As described above, the polymer-stabilisedcatalytic particles 16 will be transferred from thethird stamp 15 to thethird substrate 20. - Following removal of the
third stamp 15 from thethird substrate 20, thethird substrate 20 is electroless plated with ametal 21 resulting in metalisation of thethird substrate 20 only in the regions thereof on which polymer-stabilisedcatalytic particles 16 have been deposited. (as shown inFIG. 13 ). - The above invention is not limited to use in the PCB, flexible circuit and packaging industries, and it is envisaged that the present invention could also be used to pattern magnetic features (such as nickel/cobalt alloys) onto disks to form patterned media disk drives. Alternatively, fine metal lines produced using the present invention could be used for optical or other gratings.
- In the present specification “comprises” means “includes or consists of” and “comprising” means “including or consisting of”.
- The features disclosed in the foregoing description, or the following claims, or the accompanying drawings, expressed in their specific forms or in terms of a means for performing the disclosed function, or a method or process for attaining the disclosed result, as appropriate, may, separately, or in any combination of such features, be utilised for realising the invention in diverse forms thereof.
Claims (21)
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US11/333,009 US20060134338A1 (en) | 2001-02-23 | 2006-01-17 | Method and apparatus for forming a metallic feature on a substrate |
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US11/333,009 US20060134338A1 (en) | 2001-02-23 | 2006-01-17 | Method and apparatus for forming a metallic feature on a substrate |
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US11/333,009 Abandoned US20060134338A1 (en) | 2001-02-23 | 2006-01-17 | Method and apparatus for forming a metallic feature on a substrate |
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Also Published As
Publication number | Publication date |
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SG108820A1 (en) | 2005-02-28 |
US20020119251A1 (en) | 2002-08-29 |
US7026012B2 (en) | 2006-04-11 |
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