US20020180072A1 - Wet scrubber - Google Patents
Wet scrubber Download PDFInfo
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- US20020180072A1 US20020180072A1 US09/865,803 US86580301A US2002180072A1 US 20020180072 A1 US20020180072 A1 US 20020180072A1 US 86580301 A US86580301 A US 86580301A US 2002180072 A1 US2002180072 A1 US 2002180072A1
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- perforate
- gas conduit
- scrubbing
- scrubbing chamber
- gas
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
- B01D53/14—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by absorption
- B01D53/18—Absorbing units; Liquid distributors therefor
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S261/00—Gas and liquid contact apparatus
- Y10S261/09—Furnace gas scrubbers
Definitions
- the present invention relates to a scrubber for removing soluble materials from toxic gases, and more particularly to a scrubber for removing soluble materials from harmful gaseous effluents with high efficiency and safety.
- Semiconductor manufacturing facilities utilize chemical vapor deposition, etching and a wide variety of other unit operations in the fabrication of modern semiconductor devices using process gases such as SF 6 , SiCl 4 , SiH 2 Cl 2 , and WF 6 .
- the gaseous effluent from processing units in such facilities comprise the unconsumed process gases, as well as by-products of such gases.
- the gaseous effluent additionally may contain significant quantities of particulates such as silica, which must be removed, in addition to various water soluble components such as hydrochloric acid and residuals of phosphine and arsine.
- Water scrubbing is commonly used to remove such particulates and water-soluble gases from the process effluent stream.
- the effluent gas is intimately contacted with water, e.g., by passage of the gaseous effluent through a water spray, to dissolve the soluble gas components and wet and thereby remove the particulates.
- the scrubbing liquid may then be filtered, to remove the scrubbed particulates from the scrubbing medium.
- the water scrubber unit typically is deployed immediately upstream of a bulk exhaust for the entire plant facility, and is used to treat the process facility effluent, which may vary considerably in concentration of water-soluble components and particulates, depending on the specific types of semiconductor devices or subassembly parts which are being manufactured, and the resulting “mix” of unit operations being carried out in the process facility.
- FIG. 1A shows a conventional fume scrubber 100 .
- a scrubbing chamber 110 having a filter region 120 therein is shown.
- the filter region 120 comprises an upper perforate diverter plate 122 and a lower perforate plate 124 .
- a plurality of filter media 126 are packed into the filter region 120 and between the perforate diverter plate 122 and the perforate plate 124 .
- the detail structure of the filter media 126 is shown in FIG. 1B and the filter media 126 is comprised of plastic packing spheroids formed of open annular loops as shown in the figure.
- a gas inlet 112 a In the top of the scrubbing chamber 110 , there are a gas inlet 112 a , an opening 112 b , fluid inlets 114 a and 114 b .
- a dry exhaust pump 152 exhausts the gaseous effluent from processing units to the scrubbing chamber 110 through a gas exhaust conduit 132 connecting the gas inlet 112 a .
- An N 2 purge conduit 133 is connected to the gas exhaust conduit 132 .
- a gas discharge conduit 134 connecting to a main gas discharge conduit (not shown) is through the top of the scrubbing chamber 110 and the filter region 120 by the opening 112 b .
- the gas discharge conduit 134 has a gas inlet 135 with a tilt opening under the perforate plate 124 .
- a tap water supply pipe 136 connects the scrubbing chamber 110 by the fluid inlets 114 a . There are also a fluid outlet 116 a and an opening 116 b on the bottom of the scrubbing chamber 110 as shown in FIG. 1A.
- a recirculation pump 154 exhausts the scrubbing water from the bottom of the scrubbing chamber 110 back to the filter region 120 via a recirculation pipe 138 .
- the two ends of the recirculation pipe 138 individually connect the scrubbing chamber 110 at the fluid inlets 114 b and the fluid outlet 116 a .
- An over flow drain pipe 140 used to drain excess scrubbing water is disposed through the bottom of the scrubbing chamber 110 by the opening 116 b , and the over flow drain pipe 140 has a fluid outlet 142 used to drain the excess scrubbing water.
- the gaseous effluent from processing units is exhausted through the gas exhaust conduit 132 into the scrubbing chamber 110 by the dry exhaust pump 152 , wherein the N 2 purge conduit 133 provides dry N 2 gas to exclude moisture so that less contamination or clump of particulates will precipitate.
- the gaseous effluent passes the filter region 120 and contacts with the tap water from the tap water supply pipe 136 , and the water-soluble gas components will solve in the tap water. Owing to the open annular loops of the filter media 126 , the water-soluble gas components will solve in the tap water flowing along the open annular loops more effectively.
- the tap water transfers to scrubbing water and flows to the bottom of the scrubbing chamber 110 .
- the scrubbing water accumulates at the bottom of the scrubbing chamber 110 until the scrubbing water surface reaches the fluid outlet 142 , and the excess scrubbing water will be drain through the over flow drain pipe 140 to a main drain pipe which is not shown in FIG. 1A.
- the scrubbing water also will be exhausted through the recirculation pipe 138 back to the filter region 120 by the recirculation pump 154 .
- the scrubbing water will remix with the gaseous effluent through the recirculation cycle set forth. After passing the filter region 120 and mixing with the tap water and the scrubbing water, the gaseous effluent will be exhausted through the gas discharge conduit 134 to the main gas discharge conduit (not shown).
- the drawbacks of the conventional fume scrubber 100 present environment protection issues and production facility malfunctions, and even result in factory safety problems.
- the scrubbing water is usually exhausted together with the gaseous effluent through the gas discharge conduit 134 to the main gas discharge conduit (not shown) after passing the filter region 120 thereby results in the pump malfunctions of the production facilities connected to the main gas discharge conduit and even causes serious factory safety problems.
- the mixing efficiency of the gaseous effluent with the tap water and the scrubbing water is not satisfactory and the environment protection issues will arise from the interruption of the tap water, and thus the production facilities must be shut down.
- a scrubber of the invention for scrubbing gaseous effluents by a scrubbing liquid.
- the scrubber comprises a scrubbing chamber, a first gas conduit connecting the top of said scrubbing chamber, a manual valve, a second gas conduit connecting said first gas conduit by said manual valve, a gas exhaust pump exhausting a gaseous effluent to said second gas conduit, a check valve, a third gas conduit having a purge conduit used to transit a purge gas, said third gas conduit connecting said second gas conduit by said check valve, said third gas conduit connecting the bottom of said scrubbing chamber to transit said gaseous effluent into said scrubbing chamber, wherein only effluents from said second gas conduit to said third gas conduit can pass said check valve, a scrubbing liquid supply pipe used to transit a scrubbing liquid into said scrubbing chamber connecting the top of said scrubbing chamber, a
- the scrubbing chamber further comprises a filter region therein and at least two perforate plates disposed in sequence and under said perforate filter.
- the filter region comprises a perforate diverter, a perforate filter under said perforate diverter and a plurality of filter media packed between said perforate diverter and said perforate filter.
- FIG. 1A shows a schematic diagram of a conventional fume scrubber
- FIG. 1B shows a schematic diagram of a filter medium
- FIG. 2A shows a schematic diagram of a scrubber of this invention
- FIG. 2B shows openings of the upper perforate plate
- FIG. 2C shows openings of the lower perforate plate.
- a scrubber 200 of this invention is shown.
- a scrubbing chamber 210 having a filter region 220 therein is shown.
- the filter region 220 comprises a perforate diverter 222 and a perforate filter 224 .
- the perforate diverter 222 and the perforate filter 224 preferably comprise, but are limited to: a rotatable perforate plate and a perforate filter plate.
- the rotatable perforate plate and the perforate filter plate are made of acid-resisting materials.
- the perforate diverter 222 is used to divert or spread liquid came from above.
- a plurality of filter media 229 are packed into the filter region 220 and between the perforate diverter 222 and the perforate filter 224 .
- the filter media 229 preferably comprise filter media as shown in FIG. 1B.
- the detail structure of the filter media is shown in FIG. 1B.
- the filter media are comprised of plastic packing spheroids formed of open annular loops as shown in the figure.
- Two perforate plates 226 a and 226 b are disposed in the scrubbing chamber 210 and under the filter region 220 .
- the perforate plates 226 a and 226 b preferably comprise perforate plates made of acid-resisting materials.
- the perforate plates 226 a and 226 b preferably have openings 228 a and 228 b separately shown in FIG. 2B and FIG. 2C.
- the opening 228 a of the perforate plates 226 a has a size smaller than the size of the opening 228 b of the perforate plate 226 b .
- the size of the opening 228 a for example, can be about 1 centimeter.
- the opening 228 b can has a size of about 3 centimeter. It is noted that there can be more than two perforate plates similar to the perforate plates 226 a and 226 b disposed in the scrubbing chamber 210 and under the filter region 220 . Each of the perforate plates disposed has a size of openings which is different from the sizes of openings of other perforate plates, and the perforate plates are disposed in sequence of opening size so that the perforate plate having the smallest openings is disposed at the highest level or a position nearest the filter region 220 .
- a pump comprising a gas exhaust pump 252 exhausts gaseous effluents from processing units to the bottom of the scrubbing chamber 210 through a gas conduit 232 , a check valve 262 and a gas conduit 236 as shown in FIG. 2A.
- the flow path of the gaseous effluent set forth is the main gaseous effluent flow path of this invention.
- the gas conduit 236 further comprises a purge conduit 237 used to introduce a purge gas such as N 2 gas.
- a bypass comprising the gas conduit 232 , a manual valve 264 and a gas conduit 234 disposed on the top of the scrubbing chamber 210 connecting the gas outlet 212 to a main gas discharge pipe which is not shown.
- a scrubbing liquid supply pipe 242 used to transit a scrubbing liquid preferably comprising tap water into the scrubbing chamber 210 connects the fluid inlets 214 a to a scrubbing liquid supply source which is not shown.
- a recirculation pipe 238 connecting the fluid inlet 214 b and the fluid outlet 216 a is used to recirculate the scrubbing liquid supplied via the scrubbing liquid supply pipe 242 from the bottom of the scrubbing chamber- 210 back to the filter region 220 . This is done by a pump 254 comprising a recirculation pump exhausting the scrubbing liquid.
- a scrubbing liquid drain pipe 240 connecting a fluid outlet 216 b of the scrubbing chamber 210 to a main liquid drain pipe (not shown) is also shown in FIG. 2A.
- the scrubbing liquid drain pipe 240 is used to drain the excess scrubbing liquid.
- the fluid outlet 216 b is located on a sidewall of the scrubbing chamber 210 and at a level higher than the perforate plate 226 a or the highest perforate plate.
- the gaseous effluent from the processing units is exhausted to the gas conduit 232 by the pump 252 comprising a gas exhaust pump.
- the gaseous effluent then passes the check valve 262 to the gas conduit 236 .
- the manual valve 264 is closed in normal operation condition.
- the gaseous effluent next enters the scrubbing chamber 210 through the gas conduit 236 , meanwhile, a scrubbing liquid such as tap water flows into the scrubbing chamber 210 via the scrubbing liquid supply pipe 242 .
- the scrubbing liquid will accumulate at the bottom of the scrubbing chamber 210 . Because the gas conduit 236 connects the bottom of the scrubbing chamber 210 , the scrubbing liquid will flow into the gas conduit 236 , but the scrubbing liquid will be blocked by the check valve 262 so that the scrubbing liquid will not flow into the gas conduit 232 . The gas effluent passing through the check valve 262 will contact and sufficiently mix with the scrubbing liquid so that most of the soluble components of the gas effluent will solve in the scrubbing water.
- the perforate plates 226 a and 226 b having well-distributed openings are used.
- more than two perforate plates could be uitilized.
- Each of the perforate plates disposed in sequence has a size of openings which is different from the sizes of openings of other perforate plates, and the perforate plates are disposed in sequence of opening size so that the perforate plate having the smallest openings is disposed at the highest level or nearest the filter region 220 .
- the gaseous effluent passing through the perforate plates 226 a and 226 b and leaving the scrubbing liquid surface then are exhausted to the main gas discharge conduit (not shown) through the filter region 220 and the gas conduit 234 .
- the gaseous effluent will contact and remix with the scrubbing liquid flew through the filter media 229 of the filter region 220 .
- the scrubbing liquid accumulated on the bottom of the scrubbing chamber 210 will be exhausted back to the filter region 220 through the recirculation pipe 238 by the pump 254 .
- the scrubber of this invention provide a high recirculation efficiency of the harmful gaseous effluent and via twice mixes of the scrubbing liquid and the harmful gaseous effluent so that the standards of environment protection will be met. Furthermore, the scrubber of this invention prevents the problems of factory safety presenting in the conventional fume scrubber. Owing to the high efficiency of the mixing of the harmful gaseous effluent and the scrubbing liquid, the production facilities or processing units need not stop operating as the supply of the scrubbing liquid terminates.
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Abstract
A scrubber for removing soluble materials from harmful gaseous effluents with high efficiency and safety is disclosed. By using twice mixes of the scrubbing liquid and the harmful gaseous effluent, the scrubber meets the standards of environment protection. The scrubber of this invention also prevents the problems of factory safety presenting in the conventional fume scrubber. Owing to the high efficiency of the mixing of the harmful gaseous effluent and the scrubbing liquid, the production facilities or processing units need not stop operating once the supply of the scrubbing liquid terminates.
Description
- 1. Field of the Invention
- The present invention relates to a scrubber for removing soluble materials from toxic gases, and more particularly to a scrubber for removing soluble materials from harmful gaseous effluents with high efficiency and safety.
- 2. Description of the Related Art
- Semiconductor manufacturing facilities utilize chemical vapor deposition, etching and a wide variety of other unit operations in the fabrication of modern semiconductor devices using process gases such as SF6, SiCl4, SiH2Cl2, and WF6. The gaseous effluent from processing units in such facilities comprise the unconsumed process gases, as well as by-products of such gases. The gaseous effluent additionally may contain significant quantities of particulates such as silica, which must be removed, in addition to various water soluble components such as hydrochloric acid and residuals of phosphine and arsine.
- Water scrubbing is commonly used to remove such particulates and water-soluble gases from the process effluent stream. In such scrubbing, the effluent gas is intimately contacted with water, e.g., by passage of the gaseous effluent through a water spray, to dissolve the soluble gas components and wet and thereby remove the particulates. The scrubbing liquid may then be filtered, to remove the scrubbed particulates from the scrubbing medium. The water scrubber unit typically is deployed immediately upstream of a bulk exhaust for the entire plant facility, and is used to treat the process facility effluent, which may vary considerably in concentration of water-soluble components and particulates, depending on the specific types of semiconductor devices or subassembly parts which are being manufactured, and the resulting “mix” of unit operations being carried out in the process facility.
- FIG. 1A shows a
conventional fume scrubber 100. As shown in FIG. 1A, ascrubbing chamber 110 having afilter region 120 therein is shown. Thefilter region 120 comprises an upperperforate diverter plate 122 and a lowerperforate plate 124. A plurality offilter media 126 are packed into thefilter region 120 and between theperforate diverter plate 122 and theperforate plate 124. The detail structure of thefilter media 126 is shown in FIG. 1B and thefilter media 126 is comprised of plastic packing spheroids formed of open annular loops as shown in the figure. In the top of thescrubbing chamber 110, there are agas inlet 112 a, an opening 112 b,fluid inlets dry exhaust pump 152 exhausts the gaseous effluent from processing units to thescrubbing chamber 110 through agas exhaust conduit 132 connecting thegas inlet 112 a. An N2 purge conduit 133 is connected to thegas exhaust conduit 132. Agas discharge conduit 134 connecting to a main gas discharge conduit (not shown) is through the top of thescrubbing chamber 110 and thefilter region 120 by theopening 112 b. Thegas discharge conduit 134 has agas inlet 135 with a tilt opening under theperforate plate 124. A tapwater supply pipe 136 connects thescrubbing chamber 110 by thefluid inlets 114 a. There are also afluid outlet 116 a and an opening 116 b on the bottom of thescrubbing chamber 110 as shown in FIG. 1A. Arecirculation pump 154 exhausts the scrubbing water from the bottom of thescrubbing chamber 110 back to thefilter region 120 via arecirculation pipe 138. The two ends of therecirculation pipe 138 individually connect thescrubbing chamber 110 at thefluid inlets 114 b and thefluid outlet 116 a. An overflow drain pipe 140 used to drain excess scrubbing water is disposed through the bottom of thescrubbing chamber 110 by the opening 116 b, and the overflow drain pipe 140 has afluid outlet 142 used to drain the excess scrubbing water. - In the operation of the
conventional fume scrubber 100, the gaseous effluent from processing units is exhausted through thegas exhaust conduit 132 into thescrubbing chamber 110 by thedry exhaust pump 152, wherein the N2 purge conduit 133 provides dry N2 gas to exclude moisture so that less contamination or clump of particulates will precipitate. The gaseous effluent passes thefilter region 120 and contacts with the tap water from the tapwater supply pipe 136, and the water-soluble gas components will solve in the tap water. Owing to the open annular loops of thefilter media 126, the water-soluble gas components will solve in the tap water flowing along the open annular loops more effectively. After contacting and adsorbing the gas components, the tap water transfers to scrubbing water and flows to the bottom of thescrubbing chamber 110. The scrubbing water accumulates at the bottom of thescrubbing chamber 110 until the scrubbing water surface reaches thefluid outlet 142, and the excess scrubbing water will be drain through the overflow drain pipe 140 to a main drain pipe which is not shown in FIG. 1A. The scrubbing water also will be exhausted through therecirculation pipe 138 back to thefilter region 120 by therecirculation pump 154. The scrubbing water will remix with the gaseous effluent through the recirculation cycle set forth. After passing thefilter region 120 and mixing with the tap water and the scrubbing water, the gaseous effluent will be exhausted through thegas discharge conduit 134 to the main gas discharge conduit (not shown). - However, it is found that the drawbacks of the conventional fume scrubber100 present environment protection issues and production facility malfunctions, and even result in factory safety problems. For example, the scrubbing water is usually exhausted together with the gaseous effluent through the
gas discharge conduit 134 to the main gas discharge conduit (not shown) after passing thefilter region 120 thereby results in the pump malfunctions of the production facilities connected to the main gas discharge conduit and even causes serious factory safety problems. Furthermore, the mixing efficiency of the gaseous effluent with the tap water and the scrubbing water is not satisfactory and the environment protection issues will arise from the interruption of the tap water, and thus the production facilities must be shut down. In view of the drawbacks mentioned above, it is desirable to provide an advance scrubber that can prevent the problems of the conventional fume scrubber set forth, it is toward these goals that this invention specially directs. - It is therefore an object of the invention to provide an advance scrubber having high recirculation efficiency of the harmful gaseous effluent.
- It is another object of this invention to provide an advance scrubber which can meet the standards of environment protection and the requirements of factory safety.
- It is a further object of this invention to provide a reliable scrubber for removing soluble materials from harmful gaseous effluents with high efficiency and safety.
- It is another object of this invention to provide an advance scrubber which renders the production facilities or processing units continually operating as the supply of the scrubbing liquid terminates.
- To achieve these objects, and in accordance with the purpose of the invention, a scrubber of the invention for scrubbing gaseous effluents by a scrubbing liquid is provided. The scrubber comprises a scrubbing chamber, a first gas conduit connecting the top of said scrubbing chamber, a manual valve, a second gas conduit connecting said first gas conduit by said manual valve, a gas exhaust pump exhausting a gaseous effluent to said second gas conduit, a check valve, a third gas conduit having a purge conduit used to transit a purge gas, said third gas conduit connecting said second gas conduit by said check valve, said third gas conduit connecting the bottom of said scrubbing chamber to transit said gaseous effluent into said scrubbing chamber, wherein only effluents from said second gas conduit to said third gas conduit can pass said check valve, a scrubbing liquid supply pipe used to transit a scrubbing liquid into said scrubbing chamber connecting the top of said scrubbing chamber, a recirculation pump used to exhaust said scrubbing liquid connecting the bottom of said scrubbing chamber, a recirculation pipe used to recirculate said scrubbing liquid connecting said recirculation pump and the top of said scrubbing chamber, and a scrubbing liquid drain pipe connecting said scrubbing chamber at a level higher than said perforate plates. The scrubbing chamber further comprises a filter region therein and at least two perforate plates disposed in sequence and under said perforate filter. The filter region comprises a perforate diverter, a perforate filter under said perforate diverter and a plurality of filter media packed between said perforate diverter and said perforate filter.
- It is to be understood that both the foregoing general description and the following detailed description are exemplary and explanatory only and are not restrictive of the invention, as claimed.
- The foregoing aspects and many of the attendant advantages of this invention will become more readily appreciated as the same becomes better understood by reference to the following detailed description, when taken in conjunction with the accompanying drawings, wherein:
- FIG. 1A shows a schematic diagram of a conventional fume scrubber;
- FIG. 1B shows a schematic diagram of a filter medium;
- FIG. 2A shows a schematic diagram of a scrubber of this invention;
- FIG. 2B shows openings of the upper perforate plate; and
- FIG. 2C shows openings of the lower perforate plate.
- The present invention can be practiced in conjunction with various techniques that are used in the art, and only so much of the commonly used structures and operation steps are included herein as are necessary to provide an understanding of the present invention. The present invention will be described in detail with reference to the accompanying drawings. It should be noted that the drawings are in greatly simplified form and they are not drawn to scale. Moreover, dimensions have been exaggerated in order to provide a clear illustration and understanding of the present invention.
- Referring to FIG. 2A, a
scrubber 200 of this invention is shown. As shown in FIG. 2A, a scrubbingchamber 210 having afilter region 220 therein is shown. Thefilter region 220 comprises aperforate diverter 222 and aperforate filter 224. Theperforate diverter 222 and theperforate filter 224 preferably comprise, but are limited to: a rotatable perforate plate and a perforate filter plate. Furthermore, the rotatable perforate plate and the perforate filter plate are made of acid-resisting materials. Theperforate diverter 222 is used to divert or spread liquid came from above. A plurality offilter media 229 are packed into thefilter region 220 and between theperforate diverter 222 and theperforate filter 224. Thefilter media 229 preferably comprise filter media as shown in FIG. 1B. The detail structure of the filter media is shown in FIG. 1B. The filter media are comprised of plastic packing spheroids formed of open annular loops as shown in the figure. - Two
perforate plates scrubbing chamber 210 and under thefilter region 220. Theperforate plates perforate plates openings perforate plates 226 a has a size smaller than the size of theopening 228 b of theperforate plate 226 b. The size of the opening 228 a, for example, can be about 1 centimeter. Theopening 228 b can has a size of about 3 centimeter. It is noted that there can be more than two perforate plates similar to theperforate plates scrubbing chamber 210 and under thefilter region 220. Each of the perforate plates disposed has a size of openings which is different from the sizes of openings of other perforate plates, and the perforate plates are disposed in sequence of opening size so that the perforate plate having the smallest openings is disposed at the highest level or a position nearest thefilter region 220. - In the top of the scrubbing
chamber 210, there are agas outlet 212,fluid inlets chamber 210, there are afluid outlet 216 a and aneffluent inlet 218. A pump comprising agas exhaust pump 252 exhausts gaseous effluents from processing units to the bottom of the scrubbingchamber 210 through agas conduit 232, acheck valve 262 and agas conduit 236 as shown in FIG. 2A. The flow path of the gaseous effluent set forth is the main gaseous effluent flow path of this invention. Thegas conduit 236 further comprises apurge conduit 237 used to introduce a purge gas such as N2 gas. There is a bypass comprising thegas conduit 232, amanual valve 264 and agas conduit 234 disposed on the top of the scrubbingchamber 210 connecting thegas outlet 212 to a main gas discharge pipe which is not shown. A scrubbingliquid supply pipe 242 used to transit a scrubbing liquid preferably comprising tap water into the scrubbingchamber 210 connects thefluid inlets 214 a to a scrubbing liquid supply source which is not shown. Arecirculation pipe 238 connecting thefluid inlet 214 b and thefluid outlet 216 a is used to recirculate the scrubbing liquid supplied via the scrubbingliquid supply pipe 242 from the bottom of the scrubbing chamber-210 back to thefilter region 220. This is done by apump 254 comprising a recirculation pump exhausting the scrubbing liquid. A scrubbingliquid drain pipe 240 connecting afluid outlet 216 b of the scrubbingchamber 210 to a main liquid drain pipe (not shown) is also shown in FIG. 2A. The scrubbingliquid drain pipe 240 is used to drain the excess scrubbing liquid. Thefluid outlet 216 b is located on a sidewall of the scrubbingchamber 210 and at a level higher than theperforate plate 226 a or the highest perforate plate. - In the operation of the
scrubber 200, the gaseous effluent from the processing units is exhausted to thegas conduit 232 by thepump 252 comprising a gas exhaust pump. The gaseous effluent then passes thecheck valve 262 to thegas conduit 236. Themanual valve 264 is closed in normal operation condition. The gaseous effluent next enters the scrubbingchamber 210 through thegas conduit 236, meanwhile, a scrubbing liquid such as tap water flows into the scrubbingchamber 210 via the scrubbingliquid supply pipe 242. As the gaseous effluent continues flowing into the scrubbingchamber 210 via the main flow path set forth, the scrubbing liquid will accumulate at the bottom of the scrubbingchamber 210. Because thegas conduit 236 connects the bottom of the scrubbingchamber 210, the scrubbing liquid will flow into thegas conduit 236, but the scrubbing liquid will be blocked by thecheck valve 262 so that the scrubbing liquid will not flow into thegas conduit 232. The gas effluent passing through thecheck valve 262 will contact and sufficiently mix with the scrubbing liquid so that most of the soluble components of the gas effluent will solve in the scrubbing water. In case of formation of bubbles which are obstacles to the solution of the soluble components in the scrubbing liquid, theperforate plates filter region 220. The gaseous effluent passing through theperforate plates filter region 220 and thegas conduit 234. The gaseous effluent will contact and remix with the scrubbing liquid flew through thefilter media 229 of thefilter region 220. Moreover, the scrubbing liquid accumulated on the bottom of the scrubbingchamber 210 will be exhausted back to thefilter region 220 through therecirculation pipe 238 by thepump 254. - The scrubber of this invention provide a high recirculation efficiency of the harmful gaseous effluent and via twice mixes of the scrubbing liquid and the harmful gaseous effluent so that the standards of environment protection will be met. Furthermore, the scrubber of this invention prevents the problems of factory safety presenting in the conventional fume scrubber. Owing to the high efficiency of the mixing of the harmful gaseous effluent and the scrubbing liquid, the production facilities or processing units need not stop operating as the supply of the scrubbing liquid terminates.
- Other embodiments of the invention will appear to those skilled in the art from consideration of the specification and practice of the invention disclosed herein. It is intended that the specification and examples to be considered as exemplary only, with a true scope and spirit of the invention being indicated by the following claims.
Claims (20)
1. A scrubber for scrubbing gaseous effluents, said scrubber comprising:
a scrubbing chamber comprising:
a filter region therein, said filter region comprising:
a perforate diverter;
a perforate filter under said perforate diverter;
and a plurality of filter media packed between said perforate diverter and said perforate filter;
at least two perforate plates disposed under said perforate filter each having a plurality of openings;
a scrubbing liquid supply pipe connecting the top of said scrubbing chamber to transit a scrubbing liquid into said scrubbing chamber from a scrubbing liquid supply source;
a first gas conduit connecting the top of said scrubbing chamber at a first end of said first gas conduit to exhaust said gaseous effluents from said scrubbing chamber to a main gas discharge conduit;
a manual valve connecting a second end of said first gas conduit;
a second gas conduit connecting said manual valve at a first end of said second gas conduit;
a first pump connecting a second end of said second gas conduit to exhaust said gaseous effluents from processing units into said second gas conduit;
a check valve connecting a third end of said second gas conduit;
a third gas conduit connecting said check valve at a first end of said third gas conduit and the bottom of said scrubbing chamber at a second end of said third gas conduit to transit said gaseous effluents into said scrubbing chamber, wherein only effluents from said second gas conduit to said third gas conduit can pass said check valve;
a recirculation pipe connecting the bottom of said scrubbing chamber at a first end of said recirculation pipe and the top of said scrubbing chamber at a second end of said recirculation pipe;
a second pump disposed in the path of said recirculation pipe to exhaust said scrubbing liquid from the bottom of said scrubbing chamber to said filter region;
a scrubbing liquid drain pipe connecting said scrubbing chamber at a level higher than said perforate plates to drain the excess scrubbing liquid.
2. The scrubber according to claim 1 , wherein said perforate diverter comprises a rotatable perforate plate.
3. The scrubber according to claim 1 , wherein said filter media comprise plastic packing spheroids formed of open annular loops.
4. The scrubber according to claim 1 , wherein said perforate plates are disposed in sequence of opening size so that said perforate plate having the smallest openings is disposed at the highest level.
5. The scrubber according to claim 1 , wherein said perforate plates comprise acid-resisting perforate plates.
6. The scrubber according to claim 1 , wherein said first pump comprises a dry pump.
7. The scrubber according to claim 1 , wherein said scrubbing liquid comprises tap water.
8. A scrubber for scrubbing gaseous effluents, said scrubber comprising:
a scrubbing chamber comprising:
a filter region therein, said filter region comprising:
a perforate diverter;
a perforate filter under said perforate diverter;
and a plurality of filter media packed between said perforate diverter and said perforate filter;
at least two perforate plates disposed under said perforate filter each having a plurality of openings;
a scrubbing liquid supply pipe connecting the top of said scrubbing chamber to transit tap water into said scrubbing chamber from a tap water supply source;
a first gas conduit connecting the top of said scrubbing chamber at a first end of said first gas conduit to exhaust said gaseous effluents from said scrubbing chamber to a main gas discharge conduit;
a manual valve connecting a second end of said first gas conduit;
a second gas conduit connecting said manual valve at a first end of said second gas conduit;
a first pump connecting a second end of said second gas conduit to exhaust said gaseous effluents from processing units into said second gas conduit;
a check valve connecting a third end of said second gas conduit;
a third gas conduit connecting said check valve at a first end of said third gas conduit and the bottom of said scrubbing chamber at a second end of said third gas conduit to transit said gaseous effluents into said scrubbing chamber, and having a purge conduit to transit a purge gas, wherein only effluents from said second gas conduit to said third gas conduit can pass said check valve;
a recirculation pipe connecting the bottom of said scrubbing chamber at a first end of said recirculation pipe and the top of said scrubbing chamber at a second end of said recirculation pipe;
a second pump disposed in the path of said recirculation pipe to exhaust said tap water from the bottom of said scrubbing chamber to said filter region;
a scrubbing liquid drain pipe connecting said scrubbing chamber at a level higher than said perforate plates to drain the excess tap water.
9. The scrubber according to claim 8 , wherein said perforate diverter comprises a rotatable perforate plate.
10. The scrubber according to claim 8 , wherein said filter media comprise plastic packing spheroids formed of open annular loops.
11. The scrubber according to claim 8 , wherein said perforate plates are disposed in sequence of opening size so that said perforate plate having the smallest openings is disposed at the highest level.
12. The scrubber according to claim 8 , wherein said perforate plates comprise acid-resisting perforate plates.
13. The scrubber according to claim 8 , wherein said first pump comprises a dry pump.
14. The scrubber according to claim 8 , wherein said purge gas comprises nitrogen gas.
15. A scrubber for scrubbing gaseous effluents, said scrubber comprising:
a scrubbing chamber comprising:
a filter region therein, said filter region comprising:
a perforate diverter;
a perforate filter under said perforate diverter;
and a plurality of filter media packed between said perforate diverter and said perforate filter;
at least two perforate plates each having a plurality of openings disposed in sequence of opening size and under said perforate filter, wherein said perforate plate having the smallest openings is disposed at the highest level;
a scrubbing liquid supply pipe connecting the top of said scrubbing chamber to transit tap water into said scrubbing chamber from a tap water supply source;
a first gas conduit connecting the top of said scrubbing chamber at a first end of said first gas conduit to exhaust said gaseous effluents from said scrubbing chamber to a main gas discharge conduit;
a manual valve connecting a second end of said first gas conduit;
a second gas conduit connecting said manual valve at a first end of said second gas conduit;
a first pump connecting a second end of said second gas conduit to exhaust said gaseous effluents from processing units into said second gas conduit;
a check valve connecting a third end of said second gas conduit;
a third gas conduit connecting said check valve at a first end of said third gas conduit and the bottom of said scrubbing chamber at a second end of said third gas conduit to transit said gaseous effluents into said scrubbing chamber, and having a purge conduit used to transit a purge gas, wherein only effluents from said second gas conduit to said third gas conduit can pass said check valve;
a recirculation pipe connecting the bottom of said scrubbing chamber at a first end of said recirculation pipe and the top of said scrubbing chamber at a second end of said recirculation pipe;
a second pump disposed in the path of said recirculation pipe to exhaust said tap water from the bottom of said scrubbing chamber to said filter region;
a scrubbing liquid drain pipe connecting said scrubbing chamber at a level higher than said perforate plates to drain the excess tap water.
16. The scrubber according to claim 15 , wherein said perforate diverter comprises a rotatable perforate plate.
17. The scrubber according to claim 15 , wherein said filter media comprise plastic packing spheroids formed of open annular loops.
18. The scrubber according to claim 15 , wherein said perforate plates comprise acid-resisting perforate plates.
19. The scrubber according to claim 15 , wherein said first pump comprises a dry pump.
20. The scrubber according to claim 15 , wherein said purge gas comprises nitrogen gas.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US09/865,803 US6488269B1 (en) | 2001-05-29 | 2001-05-29 | Wet scrubber |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
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US09/865,803 US6488269B1 (en) | 2001-05-29 | 2001-05-29 | Wet scrubber |
Publications (2)
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US6488269B1 US6488269B1 (en) | 2002-12-03 |
US20020180072A1 true US20020180072A1 (en) | 2002-12-05 |
Family
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Family Applications (1)
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US09/865,803 Expired - Lifetime US6488269B1 (en) | 2001-05-29 | 2001-05-29 | Wet scrubber |
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Families Citing this family (3)
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CN110940203B (en) * | 2019-12-03 | 2021-07-27 | 大唐东营发电有限公司 | Smoke-discharging heat exchanger for power plant |
EP4089266A1 (en) * | 2021-05-12 | 2022-11-16 | Alfa Laval Corporate AB | Exhaust gas cleaning system and method for cleaning exhaust gas and use of exhaust gas cleaning system |
CN113731162B (en) * | 2021-08-25 | 2022-06-14 | 湖北玖恩智能科技有限公司 | Gas flow dispersing device and gas purification equipment |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
ES368060A1 (en) * | 1969-04-15 | 1971-05-01 | Olague Soria | Method and apparatus for purifying exhaust gases |
US3984219A (en) * | 1975-12-31 | 1976-10-05 | Huang Ming Dao | Engine exhaust purifier-muffler |
IT1087892B (en) * | 1977-11-10 | 1985-06-04 | Plasmati Eustachio | DOSER DEVICE INCLUDING AN AUTOMATIC MIXER FOR THE PRODUCTION OF THE SOLUTION FORMED BY THE VECTOR FLUID AND THE GAS TO BE DOSED. |
US4375977A (en) * | 1981-01-23 | 1983-03-08 | Latoka Engineering, Inc. | System of gas dehydration using liquid desiccants |
US4661130A (en) * | 1986-04-07 | 1987-04-28 | Ebeling Harold O | Absorber for dehydrating gas using desiccants |
US5335785A (en) * | 1993-05-19 | 1994-08-09 | Board Of Control Of Michigan Technological University | Flotation column with adjustable supported baffles |
US5858072A (en) * | 1995-02-08 | 1999-01-12 | Motoda Electronics, Co., Ltd | Gas suction filtration apparatus |
NL1006152C1 (en) * | 1996-11-27 | 1998-05-28 | Albert Van Duijn | Method and device for mixing a gas with a liquid. |
-
2001
- 2001-05-29 US US09/865,803 patent/US6488269B1/en not_active Expired - Lifetime
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