US20020014615A1 - Anisotropic conductive adhesive film - Google Patents

Anisotropic conductive adhesive film Download PDF

Info

Publication number
US20020014615A1
US20020014615A1 US09/460,389 US46038999A US2002014615A1 US 20020014615 A1 US20020014615 A1 US 20020014615A1 US 46038999 A US46038999 A US 46038999A US 2002014615 A1 US2002014615 A1 US 2002014615A1
Authority
US
United States
Prior art keywords
conductive
particles
film
adhesive film
anisotropic conductive
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
US09/460,389
Other versions
US6344156B1 (en
Inventor
Yukio Yamada
Mikio Sakairi
Yasushi Akutsu
Tomoyuki Ishimatsu
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Dexerials Corp
Original Assignee
Sony Chemicals Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=18493480&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=US20020014615(A1) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Sony Chemicals Corp filed Critical Sony Chemicals Corp
Assigned to SONY CHEMICALS CORP. reassignment SONY CHEMICALS CORP. ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). Assignors: AKUTSU, YASUSHI, ISHIMATSU, TOMOYUKI, SAKAIRI, MIKIO, YAMADA, YUKIO
Application granted granted Critical
Publication of US6344156B1 publication Critical patent/US6344156B1/en
Publication of US20020014615A1 publication Critical patent/US20020014615A1/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Images

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01BCABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B1/00Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors
    • H01B1/20Conductive material dispersed in non-conductive organic material
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L24/00Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
    • H01L24/80Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
    • H01L24/83Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a layer connector
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J7/00Adhesives in the form of films or foils
    • C09J7/10Adhesives in the form of films or foils without carriers
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J9/00Adhesives characterised by their physical nature or the effects produced, e.g. glue sticks
    • C09J9/02Electrically-conducting adhesives
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01BCABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B1/00Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors
    • H01B1/20Conductive material dispersed in non-conductive organic material
    • H01B1/22Conductive material dispersed in non-conductive organic material the conductive material comprising metals or alloys
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L24/00Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
    • H01L24/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L24/26Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
    • H01L24/28Structure, shape, material or disposition of the layer connectors prior to the connecting process
    • H01L24/29Structure, shape, material or disposition of the layer connectors prior to the connecting process of an individual layer connector
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/30Assembling printed circuits with electric components, e.g. with resistor
    • H05K3/32Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits
    • H05K3/321Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits by conductive adhesives
    • H05K3/323Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits by conductive adhesives by applying an anisotropic conductive adhesive layer over an array of pads
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J2301/00Additional features of adhesives in the form of films or foils
    • C09J2301/30Additional features of adhesives in the form of films or foils characterized by the chemical, physicochemical or physical properties of the adhesive or the carrier
    • C09J2301/314Additional features of adhesives in the form of films or foils characterized by the chemical, physicochemical or physical properties of the adhesive or the carrier the adhesive layer and/or the carrier being conductive
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/10Bump connectors; Manufacturing methods related thereto
    • H01L2224/15Structure, shape, material or disposition of the bump connectors after the connecting process
    • H01L2224/16Structure, shape, material or disposition of the bump connectors after the connecting process of an individual bump connector
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/26Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
    • H01L2224/28Structure, shape, material or disposition of the layer connectors prior to the connecting process
    • H01L2224/29Structure, shape, material or disposition of the layer connectors prior to the connecting process of an individual layer connector
    • H01L2224/29001Core members of the layer connector
    • H01L2224/29099Material
    • H01L2224/2919Material with a principal constituent of the material being a polymer, e.g. polyester, phenolic based polymer, epoxy
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/26Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
    • H01L2224/28Structure, shape, material or disposition of the layer connectors prior to the connecting process
    • H01L2224/29Structure, shape, material or disposition of the layer connectors prior to the connecting process of an individual layer connector
    • H01L2224/29001Core members of the layer connector
    • H01L2224/29099Material
    • H01L2224/29198Material with a principal constituent of the material being a combination of two or more materials in the form of a matrix with a filler, i.e. being a hybrid material, e.g. segmented structures, foams
    • H01L2224/29298Fillers
    • H01L2224/29399Coating material
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/73Means for bonding being of different types provided for in two or more of groups H01L2224/10, H01L2224/18, H01L2224/26, H01L2224/34, H01L2224/42, H01L2224/50, H01L2224/63, H01L2224/71
    • H01L2224/732Location after the connecting process
    • H01L2224/73201Location after the connecting process on the same surface
    • H01L2224/73203Bump and layer connectors
    • H01L2224/73204Bump and layer connectors the bump connector being embedded into the layer connector
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/80Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
    • H01L2224/83Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a layer connector
    • H01L2224/8319Arrangement of the layer connectors prior to mounting
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/80Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
    • H01L2224/83Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a layer connector
    • H01L2224/838Bonding techniques
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/01Chemical elements
    • H01L2924/01004Beryllium [Be]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/01Chemical elements
    • H01L2924/01005Boron [B]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/01Chemical elements
    • H01L2924/01006Carbon [C]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/01Chemical elements
    • H01L2924/01013Aluminum [Al]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/01Chemical elements
    • H01L2924/01015Phosphorus [P]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/01Chemical elements
    • H01L2924/01019Potassium [K]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/01Chemical elements
    • H01L2924/01023Vanadium [V]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/01Chemical elements
    • H01L2924/01024Chromium [Cr]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/01Chemical elements
    • H01L2924/01027Cobalt [Co]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/01Chemical elements
    • H01L2924/01029Copper [Cu]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/01Chemical elements
    • H01L2924/01033Arsenic [As]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/01Chemical elements
    • H01L2924/01047Silver [Ag]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/01Chemical elements
    • H01L2924/01075Rhenium [Re]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/01Chemical elements
    • H01L2924/01078Platinum [Pt]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/01Chemical elements
    • H01L2924/01079Gold [Au]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/01Chemical elements
    • H01L2924/01082Lead [Pb]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/06Polymers
    • H01L2924/0665Epoxy resin
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/06Polymers
    • H01L2924/078Adhesive characteristics other than chemical
    • H01L2924/07802Adhesive characteristics other than chemical not being an ohmic electrical conductor
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/06Polymers
    • H01L2924/078Adhesive characteristics other than chemical
    • H01L2924/0781Adhesive characteristics other than chemical being an ohmic electrical conductor
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/06Polymers
    • H01L2924/078Adhesive characteristics other than chemical
    • H01L2924/0781Adhesive characteristics other than chemical being an ohmic electrical conductor
    • H01L2924/07811Extrinsic, i.e. with electrical conductive fillers
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/10Details of semiconductor or other solid state devices to be connected
    • H01L2924/11Device type
    • H01L2924/14Integrated circuits
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2201/00Indexing scheme relating to printed circuits covered by H05K1/00
    • H05K2201/02Fillers; Particles; Fibers; Reinforcement materials
    • H05K2201/0203Fillers and particles
    • H05K2201/0206Materials
    • H05K2201/0221Insulating particles having an electrically conductive coating
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2201/00Indexing scheme relating to printed circuits covered by H05K1/00
    • H05K2201/02Fillers; Particles; Fibers; Reinforcement materials
    • H05K2201/0203Fillers and particles
    • H05K2201/0206Materials
    • H05K2201/0233Deformable particles
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/03Metal processing
    • H05K2203/0307Providing micro- or nanometer scale roughness on a metal surface, e.g. by plating of nodules or dendrites
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00Stock material or miscellaneous articles
    • Y10T428/29Coated or structually defined flake, particle, cell, strand, strand portion, rod, filament, macroscopic fiber or mass thereof
    • Y10T428/2982Particulate matter [e.g., sphere, flake, etc.]
    • Y10T428/2991Coated
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00Stock material or miscellaneous articles
    • Y10T428/29Coated or structually defined flake, particle, cell, strand, strand portion, rod, filament, macroscopic fiber or mass thereof
    • Y10T428/2982Particulate matter [e.g., sphere, flake, etc.]
    • Y10T428/2991Coated
    • Y10T428/2998Coated including synthetic resin or polymer

Abstract

An anisotropic conductive adhesive film capable of maintaining a high connection reliability on connection electrodes with a fine pitch on which an oxide film is formed.
The anisotropic conductive adhesive film 1 comprises conductive particles 7 dispersed in an insulating binder 6. Each conductive particle 7 consists of a styrene resin particle 71 and a thin metal film 72 formed on the surface thereof by gold-plating, etc. Projections 72 a are formed on the surface of the thin metal film 72 of the conductive particle 7.

Description

    FIELD OF THE INVENTION
  • This invention relates to an anisotropic conductive adhesive film to be used in, for example, electrically connecting a liquid crystal display (LCD) to a circuit board. [0001]
  • BACKGROUND OF THE INVENTION
  • It has been a practice to connect, for example, a liquid crystal device to an integrated circuit board, etc. by using anisotropic conductive adhesive films. [0002]
  • These anisotropic conductive adhesive films are used in fixing and electrically connecting various terminals to each other, for example, in connecting the connection electrode of a tape carrier package (TCP) or an IC chip to a pattern electrode formed in the glass board of an LCD panel. [0003]
  • In general, an anisotropic conductive adhesive film comprises an insulating binder containing conductive particles. As the conductive particles in this case, use is made of those obtained by forming a conductive thin film by for example, nickel- or gold-plating on the surface of particles made of metals (nickel, silver, etc.) or resins. [0004]
  • A fine pitch (pitch: about 60 μm) and a high connective reliability (about 1,000 hours at 85° C. under relative humidity of 85%) are required in connecting an LCD panel with the use of a wiring pattern made of aluminum (Al) or chromium (Cr) on which an oxide film is frequently formed on the surface of an electrode pattern. [0005]
  • However, these requirements cannot be satisfied by the prior art. [0006]
  • In the case of an anisotropic conductive adhesive film comprising conductive particles made of a metal (Ni, etc.), namely, electricity passes through an oxide film formed on an electrode pattern but a fine pitch cannot be established due to the irregular particle diameter of the metallic particles. In this case, there arises an additional problem that the small linear expansion coefficient, compared with that of the binder, brings about a low connective reliability after heat aging. [0007]
  • In the case of an anisotropic conductive adhesive film with the use of conductive particles obtained by metal-plating resin particles, on the other hand, a fine pitch can be established on a pattern electrode on which no oxide film is formed. However, such an anisotropic conductive adhesive film suffers from a problem of having a high initial resistance to a pattern electrode on which an oxide film is formed. [0008]
  • SUMMARY OF THE INVENTION
  • The present invention, which has been made to solve these problems encountering in the prior art, aims at providing an anisotropic conductive adhesive film capable of maintaining a high connective reliability on connection electrodes with a fine pitch on which an oxide film is formed. [0009]
  • The present inventors have conducted intensive studies to achieve the above-described object. As a result, they have successfully found out that connection electrodes with a fine pitch each having an oxide film can be surely connected to each other by forming specific projections on the surface of a conductive thin film of conductive particles consisting of resin particles and the conductive thin film formed thereon, thus completing the present invention. [0010]
  • According to a present invention, which has been completed based on the finding as described above, relates to an anisotropic conductive adhesive film for electrically connecting terminals to each other which comprising an insulating adhesive formed in a film, and conductive particles being dispersed in an insulating adhesive, and consisting of resin particles having a conductive thin film on the surface thereof and wherein projections are formed on the surface of the conductive thin film. [0011]
  • In the present invention, projections are formed on the surface of the conductive thin film on resin particles. Under pressure, therefore, the projections of the conductive thin film of the conductive particles break through the oxide films of connection electrodes and thus the connection electrodes can be surely connected electrically to each other. [0012]
  • On the other hand, conductive particles having resin particles as the core are used therein, which makes it possible to achieve a regular particle diameter. When the insulating binder is loosened between the connection electrodes after the aging, moreover, the contact of the projections of the conductive thin film with the connection electrodes can be maintained owing to the elastic rebound of the resin particles, thus ensuring a high conductive reliability. [0013]
  • As described above, the present invention makes it possible to provide an anisotropic conductive adhesive film capable of maintaining a high connective reliability on connection electrodes with a fine pitch on which an oxide film is formed. [0014]
  • In the present invention, it is effective that the resin particles have such a hardness as giving a K value at 10% compressive deformation of from 1×10[0015] 2 to 2×103 kgf/mm2.
  • In the present invention, it is also effective that the resin particles have a recovery ratio from 10% compressive deformation of 5% or above. [0016]
  • In the present invention, it is also effective that the conductive thin film has a compressive elastic modulus of 1.5×10[0017] 4 kgf/mm2 or above.
  • When the hardness and the recovery ratio of the resin particles are defined each within a specific range, or the compressive elastic modulus of the conductive thin film is set to a level sufficiently higher than the hardness of the resin particles, the projection can break through the oxide film of the pattern electrode due to the elastic rebound of the resin particles caused by the compressive deformation under pressure. Thus, the connection electrodes can be surely connected to each other via these conductive particles. [0018]
  • In the present invention, it is also effective that 4 to 300, on average, projections are formed on the surface of the conductive thin film. [0019]
  • When 4 to 300 projections are formed on the conductive film, the conductive particles breaking through the oxide film can come into contact with the connective electrodes in a sufficiently large contact area and thus the electrodes can be satisfactorily connected to each other. [0020]
  • In the present invention, it is also effective that the content of the conductive particles is from 1 to 5% by volume. [0021]
  • According to the present invention, the connection electrodes can be more surely connected to each other via the conductive particles. [0022]
  • In the present invention, it is further effective that an insulation layer is formed on the surface of the conductive thin film of the conductive particles. [0023]
  • The constitution according to the present makes it possible to prevent electrical short circuit among the conductive particles, even though the conductive particles are used in a rather large amount and condense together. [0024]
  • These and other objects of the invention will become more apparent in the detailed description and examples which follow. [0025]
  • BRIEF DESCRIPTION OF THE DRAWINGS
  • FIG. 1 ([0026] a) is an illustration showing the constitution of an embodiment of the anisotropic conductive adhesive film according to the present invention which has been subjected to heat compression bonding.
  • FIG. 1 ([0027] b) is an enlarged view of the part surrounded by chain line A.
  • FIG. 1 ([0028] c) is an enlarged view of the part surrounded by chain line B.
  • FIG. 2 is an example of electron microscopic photographs (5,000×magnification) showing the particle structure of the conductive particles to be used in the present invention.[0029]
  • DETAILED DESCRIPTION OF THE INVENTION
  • FIG. 1 ([0030] a) to FIG. 1 (c) are illustrations showing a preferable embodiment of the anisotropic conductive adhesive film according to the present invention, wherein FIG. 1 (a) shows the constitution thereof after heat compression bonding, FIG. 1 (b) is an enlarged view of the part surrounded by chain line A, and FIG. 1 (c) is an enlarged view of the part surrounded by chain line B.
  • FIG. 2 is an example of electron microscopic photographs (5,000×magnification) showing the structure of the conductive particles to be used in the present invention. [0031]
  • As FIG. 1 shows, the anisotropic conductive [0032] adhesive film 1 of the present invention, which is to be used in, for example, connecting electrodes 3 of a circuit board 2 to electrodes 5 of a glass panel 4, comprises conductive particles 7 dispersed in a filmy insulating binder resin (insulating binder) 6. The electrodes 3 of the circuit board 2 adjacent to each other have a pitch of about 60 μm.
  • In this embodiment, an [0033] oxide film 8 is formed on the surface of the electrode 3 of the circuit board 2, as shown in FIG. 1 (c).
  • In the present invention, use can be made, as the [0034] insulating binder resin 6, of those containing epoxy resins as the main component together with coupling agents, curing agents, etc.
  • This anisotropic conductive [0035] adhesive film 1 is formed on a separate film made of, for example, polyethylene terephthalate (PET) and the surface of the anisotropic conductive adhesive film 1 may be covered, if necessary, with a cover film, though not shown in the figure.
  • As the [0036] conductive particles 7, on the other hand, use is made of those obtained by coating a resin particle 71 with a thin metal film (a conductive thin film) 72 and forming projections 72 a on the surface of the thin metal film 72, as will be described hereinafter.
  • As the [0037] resin particles 71, it is possible to use those made of resins such as epoxy resin, phenolic resin, acrylic resin, acrylonitrile/styrene (AS) resin, benzoguanamine resin, divinyl benzene resin, styrene resin, etc.
  • From the viewpoint of ensuring the adequate conductive reliability, the average particle diameter of the [0038] resin particles 71 preferably ranges from 2 to 10 μm, more preferably form 3 to 8 μm. To ensure the adequate conductive reliability too, it is preferable that the dispersion in the particle diameter of the resin particles 71 falls within a range of ±2 μm.
  • It is preferable that the [0039] resin particles 71 have such a hardness as giving a K value at 10% compressive deformation of from 100 to 2,000 kgf/mm2 (1 kgf/mm2=9.80665 MPa), more preferably from 200 to 1,500 kgf/mm2.
  • When the K value at 10% compressive deformation of the [0040] resin particles 71 is less than 100 kgf/mm2, the resin particles 71 are largely deformed under pressure and thus the projections 72 a of the thin metal film 72 cannot adequately break through the oxide film, thus resulting in a problem that the conductive resistance is elevated. When the K value thereof exceeds 2,000 kgf/mm2, on the other hand, the resin particles 71 cannot be adequately deformed so as to fail to make up for the dispersion in the thickness of the electrode terminals. In this case, there arise additional problems such as a high pressure being required in the pressuring step, the enlarged elastic rebound among the conductive particles causing interfacial separation, etc.
  • Further, it is preferable that the [0041] resin particles 71 have a recovery ratio from 10% compressive deformation of 5% or above, more preferably 7% or above.
  • When the recovery ratio of the [0042] resin particles 71 is less than 5%, the resin particles 71 in the deformed state cannot exhibit a sufficient elastic rebound. Thus, these resin particles 71 cannot follow up the displacement of the insulating binder resin 6, etc., which results in a problem that the conductive resistance is elevated.
  • The K value at 10% compressive deformation of the [0043] resin particles 71 is determined from the relationship between the compressive displacement and the compressive load on the resin particles 71 at 10% compressive deformation among the relationships between the compressive displacement and the compressive load on the resin particles 71.
  • Namely, the K value can be expressed on following equation.[0044]
  • K value=2.8 P/πd 2(kgf/mm 2)
  • P: The load at 10% compressive deformation of the [0045] resin particles 71
  • d: The mean diameter of the [0046] resin particle 71
  • The recovery ratio from 10% compressive deformation of the [0047] resin particles 71 is defined as the ratio (percentage) of the displacement (L1) of the resin particles 71 caused by compressing the resin particles 71 from the original load (0.1 gf) to the reverse load (1.0 gf) and the displacement(L2) thereof caused by relieving the load from the reverse load (1.0 gf) to the original load (0.1 gf).
  • Namely, the recovery ratio(R) can be expressed in following equation.[0048]
  • R(recovery ratio)=(L 1 /L 2)×100(%)
  • In the present invention, the [0049] thin metal film 72 is formed on the surface of the resin particles 71 by, for example, electrolessly plating. In this step, nickel, gold, etc. can be used as the material for forming the thin metal film 72.
  • It is preferable that the [0050] thin metal film 72 has a compressive elastic modulus of 1.5×104 kgf/mm2 or above, more preferably 2.0×104 kgf/mm2 or above on 10% compressive deformation.
  • When the compressive elastic modulus of the [0051] thin metal film 72 is less than 1.5×104 kgf/mm2, there arises a problem that projections 72 a of the thin metal film 72 are deformed under pressure and thus cannot adequately break through the oxide film 8.
  • In the present embodiment of the invention, the [0052] projections 72 a on the surface of the thin metal film 72 can be formed by, for example, changing the treatment temperature in the step of the electroless plating so as to change the reaction speed of nickel, etc.
  • The height of the [0053] projections 72 a of the thin metal film 72 preferably ranges from 0.01 to 3 μm, more preferably from 0.1 to 1.1 μm.
  • When the height of the [0054] projections 72 a of the thin metal film 72 is less than 0.01 μm, there arises a problem that the projections 72 a of the thin metal film 72 cannot break through the oxide film 8 and thus fail to reach the electrodes 3 of the circuit board 2, thereby achieving only insufficient connection of the electrodes 3 and 5. When the height thereof exceeds 3 μm, on the other hand, the projections 72 a can be formed only in a small number and thus the contact between the conductive particles 7 and the electrodes 3 becomes insufficient. In this case, only insufficient connection of the electrodes 3 and 5 can be achieved too.
  • It is preferable that 4 to 300, more preferably 4 to 200, on average, [0055] projections 72 a are formed on the surface of the thin metal film 72.
  • When the number of the [0056] projections 72 a of the thin metal film 72 is less than 4, the projections 72 a break through the oxide film 8 and come in contact with the electrodes 3 only in a small contact area. As a result, there arises a problem that adequate connection between the electrodes 3 and 5 cannot be ensured. When 300 or more projections 72 a are provided, on the other hand, the projections 72 a of the thin metal film 72 condense together, which makes the thickness of the thin metal film 72 irregular.
  • The content of the [0057] conductive particles 7 having the above-described constitution preferably ranges from 1 to 15% by volume, more preferably from 2 to 15% by volume.
  • When the content of the [0058] conductive particles 7 is less than 1% by volume, there arises a problem that the connection between the electrodes 3 and 5 is not ensured and thus the conductive resistance is elevated. When the content thereof exceeds 15% by volume, on the other hand, there arises another problem that the conductive particles 7 condense together and thus the insulation resistance between the electrodes 3 and 5 adjacent to each other is lowered.
  • When the content of the [0059] conductive particles 7 is from 5 to 15% by volume, on the other hand, it is favorable to form an insulation layer on the surface of the thin metal film 72 of the conductive particles 7.
  • The anisotropic conductive [0060] adhesive film 1 according to the present invention is produced in the following manner. First, conductive particles 7 dispersed in a solvent are added to a solution in which a definite epoxy resin is dissolved and mixed to give a binder paste.
  • Next, this binder paste is applied onto a separate film such as a polyester film and dried. Then a cover film is laminated thereon to give the anisotropic conductive [0061] adhesive film 1.
  • The [0062] electrodes 3 and 5 can be connected to each other by using the anisotropic conductive adhesive film 1 of the present invention by, for example, the following method. The anisotropic conductive adhesive film 1 is adhered to the surface of the glass panel 4. And the glass panel 4 followed by registration and temporal tacking to the circuit board 2. Next, heat compression bonding is carried out at definite temperature and pressure as shown in FIG. 1 (a). Thus, the insulating binder resin 6 is hardened while electrically connecting the electrodes 5 of the glass panel 4 to the electrodes 3 of the circuit board 2.
  • In the present invention, the [0063] projections 72 a of the thin metal film 72 break through the oxide film 8, due to the elastic rebound of the resin particles 71, and thus come into contact with the electrodes 3 of the circuit board 2 in the step of heat compression bonding, as FIG. 1 (c) shows. Thus, the electrodes 3 of the circuit board 2 are electrically connected to the electrodes 5 of the glass panel 4 via the thin metal film 72 of the conductive particles 7.
  • As a result, a high connective reliability on the [0064] electrodes 3 arranged with a fine pitch can be maintained even in the case where an oxide film 8 is formed on the electrodes 3.
  • Furthermore, the [0065] electrodes 3 of the circuit board 2 can be connected surely to the electrodes 5 of the glass panel 4 and thus a high connective reliability can be established by appropriately controlling the hardness of the resin particles 7, the compressive modules of the thin metal film 72, the number and height of the projections 72 a formed on the surface of the thin metal film 72 and the content of the conductive particles.
  • When the [0066] conductive particles 7 are used in an amount of from 5 to 15% by volume, the thin metal film 72 may be coated with an insulation layer. Thus, it becomes possible to prevent electrical short circuit among the conductive particles 7, even though the conductive particles condense together, thereby maintaining a high connective reliability.
  • Now, the anisotropic conductive adhesive film according to the present invention will be described in greater detail by reference to the following Examples and Comparative Examples. [0067]
  • EXAMPLE 1
  • First, an insulating binder resin solution (solid content:50%) was prepared by dissolving 48% by weight of a solid bisphenol A-type epoxy resin (EP1009™ manufactured by Yuka-Shell), 50% by weight of an imidazole-based curing agent (HX3941HP™ manufactured by Asahi Chemical Industry Co., Ltd.) and 2.0% by weight of a silane coupling agent (A187™ manufactured by Nippon Unicar Co., Ltd.) in toluene employed as a solvent. [0068]
  • To the obtained binder solution were added nickel-gold-plated benzoguanamine particles as conductive particles to give a binder paste containing 8% by volume of the conductive particles. [0069]
  • These benzoguanamine particles had an average diameter of 5 μm and that the dispersion in the particle diameter fell within a range of ±1 μm. The benzoguanamine particles showed such a hardness as giving a K value at 10% compressive deformation of 800 kgf/mm[0070] 2 and a recovery ratio from 10% compressive deformation of 10%.
  • As FIG. 2 shows, the plated conductive particles were photographed under an electron microscope (5,000×magnification) and the projections formed on the surface of the thin metal film of each conductive particles were counted by using the photograph. In this method, the projections formed on a hemisphere were counted and twice as much the obtained value was referred to as the number of the projections. The projections on 5 conductive particles were counted and the average thereof was referred to as the observed value. In this Example, 19.6 projections were observed on average. [0071]
  • On the surface of the thin metal film of the conductive particles, an insulation layer (thickness: 0.1 to 1 μm) was formed by the known hybridization treatment with the use of acryl/styrene particles having an average particle diameter of 1 μm. [0072]
  • Then the binder paste as described above was applied onto a separate PET film so as to give a thickness of 25 μm after drying thereby giving an anisotropic conductive adhesive film. This anisotropic conductive adhesive film was cut into slits and used as the sample of Example 1. [0073]
  • EXAMPLE 2
  • An anisotropic conductive adhesive film sample was produced as in Example 1 but using conductive particles having 25.6 projections on average, adjusting the content thereof to 2.5% by volume and forming no insulation layer on the surface of the conductive particles. [0074]
  • EXAMPLE 3
  • An anisotropic conductive adhesive film sample was produced as in Example 2 but using conductive particles having 20 projections on average. [0075]
  • EXAMPLE 4
  • An anisotropic conductive adhesive film sample was produced as in Example 2 but using nickel-plated resin particles having 25.6 projections on average as the conductive particles. [0076]
  • EXAMPLE 5
  • An anisotropic conductive adhesive film sample was produced as in Example 2 but using conductive particles having acrylonitrile/styrene particles as the core, which showed a K value at 10% compressive deformation of 480 kgf/mm[0077] 2 and a recovery ratio from 10% compressive deformation of 30%, and having 26 projections on average.
  • EXAMPLE 6
  • An anisotropic conductive adhesive film sample was produced as in Example 2 but using conductive particles having resin particles as the core, the dispersion in the particle diameter of which fell within a range of ±2 μm, and having 26 projections on average. [0078]
  • EXAMPLE 7
  • An anisotropic conductive adhesive film sample was produced as in Example 2 but using conductive particles having an average diameter of 3 μm and having 20 projections on average. [0079]
  • EXAMPLE 8
  • An anisotropic conductive adhesive film sample was produced as in Example 2 but forming an insulation layer on the surface of the conductive particles by the same method as in Example 1 and employing the conductive particles and adjusting the content thereof to 8% by volume. [0080]
  • These conductive particles had 25.6 projections on average similar to Example 2. [0081]
  • EXAMPLE 9
  • An anisotropic conductive adhesive film sample was produced as in Example 8 but using conductive particles having 25.6 projections on average and adjusting the content thereof to 15% by volume. [0082]
  • These conductive particles had 25.6 projections on average similar to Example 2. [0083]
  • COMPARATIVE EXAMPLE 1
  • An anisotropic conductive adhesive film sample was produced as in Example 2 but using conductive particles having styrene particles (degree of crosslinking: 5%) as the core, which showed a K value at 10% compressive deformation of 400 kgf/mm[0084] 2 and a recovery ratio from 10% compressive deformation of 0%, and having 26 projections on average.
  • COMPARATIVE EXAMPLE 2
  • An anisotropic conductive adhesive film sample was produced as in Example 2 but using conductive particles having 0.8 projections on average. [0085]
  • COMPARATIVE EXAMPLE 3
  • An anisotropic conductive adhesive film sample was produced as in Example 2 but using conductive particles showing the dispersion in the particle diameter of ±3 μm and having 26 projections on average. [0086]
  • COMPARATIVE EXAMPLE 4
  • An anisotropic conductive adhesive film sample was produced as in Example 2 but using conductive particles having styrene particles (degree of crosslinking: 1%) as the core, which showed a K value at 10% compressive deformation of 80 kgf/mm[0087] 2 and a recovery ratio from 10% compressive deformation of 0%, and having 30 projections on average.
  • COMPARATIVE EXAMPLE 5
  • An anisotropic conductive adhesive film sample was produced as in Example 2 but using conductive particles having an average diameter of 2 μm and having 18 projections on average. [0088]
  • COMPARATIVE EXAMPLE 6
  • An anisotropic conductive adhesive film sample was produced as in Example 2 but using as the conductive particles gold-plated nickel particles having no projection on the surface. [0089]
  • COMPARATIVE EXAMPLE 7
  • An anisotropic conductive adhesive film sample was produced as in Example 1 but using conductive particles having no insulation layer on the surface and adjusting the content thereof to 0.5% by volume. [0090]
  • The conductive particles had 19.6 projections on average similar to Example 1. [0091]
  • COMPARATIVE EXAMPLE 8
  • An anisotropic conductive adhesive film sample was produced as in Example 1 but adjusting the content of the conductive particles to 20% by volume. [0092]
  • The conductive particles had 19.6 projections on average similar to Example 1. [0093]
  • COMPARATIVE EXAMPLE 9
  • An anisotropic conductive adhesive film sample was produced as in Example 1 but using conductive particles having no insulation layer on the surface. [0094]
  • The conductive particles had 19.6 projections on average similar to Example 1. [0095]
  • COMPARATIVE EXAMPLE 10
  • An anisotropic conductive adhesive film sample was produced as in Example 2 but using conductive particles having 8 projections on average. [0096]
  • Evaluation Data [0097]
  • Conductive resistance [0098]
  • By using each of the above samples, a circuit board was compression bonded to a glass board and the conductive resistance was evaluated. As the circuit board in this case, use was made of a TCP prepared by forming an electrode pattern with a pitch of 50 μm, wherein a copper foil of 15 μm in thickness was nickel/gold-plated, on exclusively one face of a base board of 75 μm in thickness made of polyimide (UPIREX™ manufactured by Ube Industries, Ltd.). The width of the contact part (top width) of each electrode pattern was adjusted to 13 μm. [0099]
  • As the glass board, on the other hand, use was made of a test element group (TEG) formed by metallizing aluminum electrodes (thickness: 0.5 μm) on the whole face of a glass plate of 0.7 mm in thickness. [0100]
  • The compression bonding was performed at 170° C. under 40 kgf/cm[0101] 2 for 10 seconds. By using the above-described sample, the circuit board and the glass board were compression bonded in a width of 1 mm and then the conductive resistance between patterns adjacent to each other was measured. Table 1 shows the results.
  • In this evaluation, a sample showing a conductive resistance less than 1 Ω was regarded as good (◯), one showing a conductive resistance of 1 to 2 Ω was regarded as somewhat poor (Δ), and one showing a conductive resistance more than 2 Ω was regarded as poor (X). [0102]
  • Insulation resistance [0103]
  • By using each of the above samples, a glass plate having a thickness of 0.7 mm and a surface insulation resistance of 1×10[0104] 15 Ω or above was connected by compression bonding (connection width: 1 mm) to the TCP as described above at 170° C. under 40 kgf/cm2 for 10 seconds. Then a potential of 25V was applied between electrode patterns adjacent to each other and the insulation resistance was measured. Table 1 shows the results.
  • In this evaluation, a sample showing an insulation resistance more than 1×10[0105] 10 Ω was regarded as good (◯), one showing an insulation resistance of 1×108 to 1×1010 Ω was regarded as somewhat poor (Δ), and one showing an insulation resistance less than 1×108 Ω was regarded as poor (X).
  • Conductive reliability [0106]
  • The glass board and the TCP, which had been compression-bonded to each other, employed in the insulation resistance test were aged at 85° C. under a relative humidity of 85% for 1,000 hours. Then a potential of 25V was applied between electrode patterns adjacent to each other and the resistance was measured. Table 1 shows the results. [0107]
  • In this evaluation, a sample showing a resistance more than 1×10[0108] 10 Ω was regarded as being good in conductive reliability (◯), one showing a resistance of 1×108 to 1×1010 Ω was regarded as somewhat poor (Δ), and one showing a resistance less than 1×108 Ω was regarded as poor (X).
  • Table 1
  • [0109]
    TABLE 1
    Evaluation data of invention samples and comparative samples
    Scattering Compressive Re-
    Particle in particle elastic covery No. of Insu- Con-
    diameter diameter modulus ratio pro- Content lation ductive Insulation After
    Base (μm) (μm) (kgf/mm2) (%) Plating jection (vol %) layer resistance resistance aging
    ex. 1 benzoguanamine 5 ±1 800 10 niclkel/gold 19.6 8.0 Yes
    ex. 2 benzoguanamine 5 ±1 800 10 niclkel/gold 25.6 2.5 No
    ex. 3 benzoguanamine 5 ±1 800 10 niclkel/gold 20.0 2.5 No
    ex. 4 benzoguanamine 5 ±1 800 10 niclkel/gold 25.6 2.5 No
    ex. 5 acrylonitrile/ 5 ±1 480 30 niclkel 26.0 2.5 No
    stylene
    ex. 6 benzoguanamine 5 ±2 800 10 niclkel/gold 26.0 2.5 No
    ex. 7 benzoguanamine 3 ±1 800 10 nicikel/gold 20.0 2.5 No
    ex. 8 benzoguanamine 5 ±1 800 10 niclkel/gold 25.6 8.0 Yes
    ex. 9 benzoguanamine 5 ±1 800 10 niclkel/gold 25.6 15.0 Yes
    com. ex. 1 stylene 5 ±1 400  0 niclkel/gold 26.0 2.5 No Δ X
    com. ex. 2 benzoguanamine 5 ±1 800 10 niclkel/gold 0.8 2.5 No Δ X
    com. ex. 3 benzoguanamine 5 ±3 800 10 niclkel/gold 26.0 2.5 No Δ Δ Δ
    com. ex. 4 stylene 5 ±1  80  0 niclkel/gold 30.0 2.5 No Δ Δ
    com. ex. 5 benzoguanamine 2 ±1 800 10 niclkel/gold 18.0 2.5 No Δ Δ
    com. ex. 6 nickel 5 ±1 gold 2.5 No X
    com. ex. 7 benzoguanamine 5 ±1 800 10 niclkel/gold 19.6 0.5 No Δ Δ
    com. ex. 8 benzoguanamine 5 ±1 800 10 niclkel/gold 19.6 20.0 Yes Δ
    com. ex. 9 benzoguanamine 5 ±1 800 10 niclkel/gold 19.6 8.0 No Δ
    com. ex. benzoguanamine 5 ±1 800 10 niclkel/gold 8.0 2.5 No Δ X
    10
  • As Table 1 shows, when the K value at 10% compressive deformation and the recovery ratio therefrom of resin particles were changed as in Examples 2 and 5 and Comparative Examples 1 and 4, the samples of Examples 2 and 5 showed favorable data in all of the items examined, while the sample of Comparative Example 4 having a low compressive elastic modulus (80 kgf/mm[0110] 2) showed a somewhat poor conductive resistance and a somewhat poor conductive reliability after aging.
  • The sample of Comparative Example 1 having a low recovery ratio from 10% compressive deformation (0%) showed a somewhat poor conductive resistance and a poor conductive reliability after aging. [0111]
  • The sample of Comparative Example 6 with the use of nickel particles as the conductive particles (compressive elastic modulus 2.1×10[0112] 4 kgf/mm, recovery ratio 0%) showed a poor conductive reliability after aging.
  • When the number of projections of conductive particles were changed as in Examples 1 to 7 and Comparative Examples 2 and 10, the samples having 8 or less projections on a conductive particles showed each a somewhat poor conductive resistance and a poor conductive reliability after aging (Comparative Examples 2 and 10). [0113]
  • When the contents of the conductive particles were varied in the presence or absence of the insulation layer as in Examples 1, 2, 8 and 9 and Comparative Examples 7, 8 and 9, the sample containing an excessively small amount (0.5% by volume) of the conductive particles showed a somewhat poor conductive resistance and a somewhat poor conductive reliability after aging (Comparative Example 7). [0114]
  • When the conductive particles were employed in an amount of 8% by volume, on the other hand, the samples provided with the insulation layer (Examples 1 and 8) showed favorable data in all of the items tested, while the sample having no insulation layer (Comparative Example 9) showed a lowered insulation resistance. [0115]
  • The sample of Example 9 containing 15% by volume of the conductive particles and provided with the insulation layer, favorable data were obtained in all of the items examined. When the content of the conductive particles was increased to 20% by volume (Comparative Example 8), the insulation resistance was lowered. [0116]
  • As described above, the present invention makes it possible to provide an anisotropic conductive adhesive film capable of maintaining a high connective reliability on connection electrodes with a fine pitch on which an oxide film is formed. [0117]

Claims (16)

What is claimed is:
1. An anisotropic conductive adhesive film for electrically connecting terminals to each other which comprises:
an insulating adhesive formed in a film; and
conductive particles being dispersed in said insulating adhesive and consisting of resin particles having a conductive thin film on the surface thereof wherein projections are formed on the surface of said conductive thin film.
2. The anisotropic conductive adhesive film as claimed in claim 1, wherein said resin particles have such a hardness as giving a K value at 10% compressive deformation of from 1×102 to 2×103 kgf/mm2.
3. The anisotropic conductive adhesive film as claimed in claim 1, wherein said resin particles have a recovery ratio from 10% compressive deformation of 5% or above.
4. The anisotropic conductive adhesive film as claimed in claim 1, wherein said conductive thin film has a compressive elastic modulus of 1.5×104 kgf/mm2 or above.
5. The anisotropic conductive adhesive film as claimed in claim 1, wherein said projections formed on the surface of said conductive thin film are 0.01 to 3 μm in height.
6. The anisotropic conductive adhesive film as claimed in claim 1, wherein 4 to 300, on average, projections are formed on the surface of said conductive thin film.
7. The anisotropic conductive adhesive film as claimed in claim 1, wherein the content of said conductive particles is from 1 to 15% by volume.
8. The anisotropic conductive adhesive film as claimed in claim 1, wherein an insulation layer is formed on the surface of the conductive thin film of said conductive particles.
9. The anisotropic conductive adhesive film as claimed in claim 2, wherein said resin particles have a recovery ratio from 10% compressive deformation of 5% or above.
10. The anisotropic conductive adhesive film as claimed in claim 2, wherein said conductive thin film has a compressive elastic modulus of 1.5×104 kgf/mm2 or above.
11. The anisotropic conductive adhesive film as claimed in claim 3, wherein said conductive thin film has a compressive elastic modulus of 1.5×104 kgf/mm2 or above.
12. An anisotropic conductive adhesive film for electrically connecting terminals to each other which comprises:
an insulating adhesive formed in a film; and
conductive particles being dispersed in said insulating adhesive and consisting of resin particles having a conductive thin film on the surface thereof wherein projections are formed on the surface said the conductive thin film;
wherein said resin particles have such a hardness as giving a K value at 10% compressive deformation of from 1×102 to 2×103 kgf/mm2, said resin particles have a recovery ratio from 10% compressive deformation of 5% or above, and said conductive thin film has a compressive elastic modulus of 1.5×104 kgf/mm2 or above.
13. The anisotropic conductive adhesive film as claimed in claim 12, wherein said projections formed on the surface of said conductive thin film are 0.01 to 3 μm in height.
14. The anisotropic conductive adhesive film as claimed in claim 12, wherein 4 to 300, on average, projections are formed on the surface of said conductive thin film.
15. The anisotropic conductive adhesive film as claimed in claim 12, wherein the content of said conductive particles is from 1 to 15% by volume.
16. The anisotropic conductive adhesive film as claimed in claim 12, wherein an insulation layer is formed on the surface of the conductive thin film of said conductive particles.
US09/460,389 1998-12-25 1999-12-13 Anisotropic conductive adhesive film Expired - Lifetime US6344156B1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP36906898A JP3379456B2 (en) 1998-12-25 1998-12-25 Anisotropic conductive adhesive film
JP10-369068 1998-12-25

Publications (2)

Publication Number Publication Date
US6344156B1 US6344156B1 (en) 2002-02-05
US20020014615A1 true US20020014615A1 (en) 2002-02-07

Family

ID=18493480

Family Applications (1)

Application Number Title Priority Date Filing Date
US09/460,389 Expired - Lifetime US6344156B1 (en) 1998-12-25 1999-12-13 Anisotropic conductive adhesive film

Country Status (3)

Country Link
US (1) US6344156B1 (en)
JP (1) JP3379456B2 (en)
KR (2) KR100878175B1 (en)

Cited By (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20050173785A1 (en) * 2004-02-05 2005-08-11 Samsung Electronics Co., Ltd. Anisotropic conductive film and bump, and packaging structure of semiconductor having the same
US20050276918A1 (en) * 2004-07-07 2005-12-15 Xerox Corporation Adhesive film exhibiting anisotropic electrical conductivity
KR100650284B1 (en) 2005-02-22 2006-11-27 제일모직주식회사 Polymer Particles and Conductive Particles Having Enhanced Conducting Properties and an Anisotropic Conductive Packaging Materials Containing the Same
US20070281161A1 (en) * 2004-08-20 2007-12-06 Sekisui Chemical Co., Ltd. Conductive Fine Particles And Anisotropic Conductive Material
US20090133900A1 (en) * 2005-04-14 2009-05-28 Matsushita Electric Industrial Co., Ltd. Electronic circuit device and method for manufacturing same
US20090235972A1 (en) * 2006-04-26 2009-09-24 Hitachi Chemical Company, Ltd. Adhesive tape and solar cell module using the same
US20100025097A1 (en) * 2006-10-31 2010-02-04 Hitachi Chemical Company, Ltd. Circuit connection structure
US20100139947A1 (en) * 2007-05-15 2010-06-10 Hitachi Chemical Company, Ltd. Circuit-connecting material, and connection structure for circuit member
TWI395801B (en) * 2007-11-12 2013-05-11 Circuit connection material and circuit structure of the connection structure
US8609275B2 (en) 2010-09-01 2013-12-17 Samsung Sdi Co., Ltd. Connective structure between a battery cell and a connecting bar of a battery pack
CN104808398A (en) * 2015-05-22 2015-07-29 京东方科技集团股份有限公司 Display panel, production method thereof and display device
US9365749B2 (en) 2013-05-31 2016-06-14 Sunray Scientific, Llc Anisotropic conductive adhesive with reduced migration
US20170034964A1 (en) * 2009-06-22 2017-02-02 Eldrid Svasand Electrostatic discharge device and method for manufacturing the same
US9777197B2 (en) 2013-10-23 2017-10-03 Sunray Scientific, Llc UV-curable anisotropic conductive adhesive
CN107454741A (en) * 2016-05-30 2017-12-08 松下知识产权经营株式会社 Conducting particles, the connecting material of circuit block, connecting structure and connection method

Families Citing this family (45)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB9822822D0 (en) * 1998-10-19 1998-12-16 Dyno Particles As Particles
JP2000214804A (en) * 1999-01-20 2000-08-04 Fuji Photo Film Co Ltd Light modulation element, aligner, and planar display
JP3696429B2 (en) * 1999-02-22 2005-09-21 日本化学工業株式会社 Conductive electroless plating powder, method for producing the same, and conductive material comprising the plating powder
JP3633422B2 (en) * 2000-02-22 2005-03-30 ソニーケミカル株式会社 Connecting material
KR20040030393A (en) * 2000-08-04 2004-04-09 세키스이가가쿠 고교가부시키가이샤 Conductive fine particles, method for plating fine particles, and substrate structural body
JP4059486B2 (en) * 2002-11-01 2008-03-12 化研テック株式会社 Conductive powder, conductive composition, and method for producing conductive powder
TW540281B (en) * 2001-08-09 2003-07-01 Matsushita Electric Ind Co Ltd Manufacturing method of conductive paste material and manufacturing method of printing wiring base board
JP3780222B2 (en) * 2001-08-31 2006-05-31 三菱電機株式会社 Hollow sealing package and manufacturing method thereof
TW557237B (en) * 2001-09-14 2003-10-11 Sekisui Chemical Co Ltd Coated conductive particle, coated conductive particle manufacturing method, anisotropic conductive material, and conductive connection structure
JP2003234020A (en) * 2002-02-06 2003-08-22 Sekisui Chem Co Ltd Conductive minute particle
CN1308963C (en) 2002-03-25 2007-04-04 索尼化学株式会社 Conductive particle and adhesive agent
JP2004155957A (en) * 2002-11-07 2004-06-03 Three M Innovative Properties Co Anisotropic conductive adhesive and film
US8518304B1 (en) 2003-03-31 2013-08-27 The Research Foundation Of State University Of New York Nano-structure enhancements for anisotropic conductive material and thermal interposers
US7645512B1 (en) * 2003-03-31 2010-01-12 The Research Foundation Of The State University Of New York Nano-structure enhancements for anisotropic conductive adhesive and thermal interposers
KR100589799B1 (en) * 2003-05-06 2006-06-14 한화석유화학 주식회사 Anisotropic insulated conductive ball for electric connection, preparing method thereof and product using the same
EP2182585B1 (en) * 2003-06-25 2011-08-10 Hitachi Chemical Company, Ltd. Circuit member connecting structure
US7140101B2 (en) * 2003-09-29 2006-11-28 Chipmos Technologies (Bermuda) Ltd. Method for fabricating anisotropic conductive substrate
JP2005126569A (en) * 2003-10-23 2005-05-19 Sumitomo Bakelite Co Ltd Anisotropically electrically conductive adhesive, anisotropically electrically conductive adhesive film, and display device
KR100597391B1 (en) * 2004-05-12 2006-07-06 제일모직주식회사 Insulated Conductive Particles and an Anisotropic Conductive Adhesive Film containing the Particles
CN100590751C (en) * 2004-09-02 2010-02-17 积水化学工业株式会社 Electroconductive fine particle and anisotropically electroconductive material
KR100635053B1 (en) 2005-06-21 2006-10-16 도레이새한 주식회사 Adhesive tape for electronic components
KR100667374B1 (en) * 2004-12-16 2007-01-10 제일모직주식회사 Polymer Particles for Anisotropic Conductive Packaging Materials, Conductive Particles and an Anisotropic Conductive Packaging Materials Containing the Same
KR100720895B1 (en) * 2005-07-05 2007-05-22 제일모직주식회사 Conductive particle having a density-gradient in the complex plating layer and Preparation of the same and Conductive adhesives using the same
JP4950451B2 (en) * 2005-07-29 2012-06-13 積水化学工業株式会社 Conductive fine particles, anisotropic conductive material, and connection structure
DE102005061206B4 (en) * 2005-09-30 2019-10-17 Osram Opto Semiconductors Gmbh Use of a detector arrangement as ambient light sensor
CN101309993B (en) * 2005-11-18 2012-06-27 日立化成工业株式会社 Adhesive composition, circuit connecting material, connecting structure and circuit member connecting method
JP5033332B2 (en) * 2006-02-09 2012-09-26 ソニーケミカル&インフォメーションデバイス株式会社 Anisotropic conductive adhesive, anisotropic conductive adhesive film, and electrode connection method
KR100844383B1 (en) 2007-03-13 2008-07-07 도레이새한 주식회사 Adhesive film for stacking semiconductor chip
KR101302778B1 (en) * 2007-08-02 2013-09-02 히타치가세이가부시끼가이샤 Circuit connection material, and connection structure of circuit member and connection method of circuit member using the circuit connection material
KR101402892B1 (en) * 2007-09-11 2014-06-11 삼성디스플레이 주식회사 Anisotropic conductive adehesive having conductive particle, method for manufacturing the conductive particle, and method for manufacturing display apparatus using the anisotropic conductive adehesive
KR101180571B1 (en) * 2007-10-31 2012-09-06 히다치 가세고교 가부시끼가이샤 Circuit connecting material and connecting structure for circuit member
WO2011002084A1 (en) * 2009-07-02 2011-01-06 日立化成工業株式会社 Conductive particle
JP6061443B2 (en) * 2010-12-24 2017-01-18 デクセリアルズ株式会社 Anisotropic conductive adhesive film, connection structure and manufacturing method thereof
JP5310750B2 (en) * 2011-01-19 2013-10-09 デクセリアルズ株式会社 Anisotropic conductive film
KR101732633B1 (en) * 2011-05-26 2017-05-04 엘지전자 주식회사 Solar cell module
KR101298101B1 (en) 2012-12-26 2013-08-20 덕산하이메탈(주) Conductive particles, manufacturing method of the same, and conductive materials including the same
JP6306876B2 (en) * 2013-01-24 2018-04-04 積水化学工業株式会社 Base particle, conductive particle, conductive material, and connection structure
JP6438194B2 (en) * 2013-01-24 2018-12-12 積水化学工業株式会社 Base particle, conductive particle, conductive material, and connection structure
JP2015135878A (en) * 2014-01-16 2015-07-27 デクセリアルズ株式会社 Connection body, method for manufacturing connection body, connection method and anisotropic conductive adhesive
JP6394159B2 (en) * 2014-08-05 2018-09-26 デクセリアルズ株式会社 Anisotropic conductive adhesive, manufacturing method thereof, connection structure and manufacturing method thereof
JP6737572B2 (en) * 2014-08-14 2020-08-12 積水化学工業株式会社 Base particle, conductive particle, conductive material, and connection structure
JP2016215382A (en) * 2015-05-14 2016-12-22 コニカミノルタ株式会社 Inkjet head, inkjet head manufacturing method and inkjet recording device
TWI696300B (en) 2016-03-15 2020-06-11 晶元光電股份有限公司 A light-emitting device and the manufacturing method thereof
US10411218B2 (en) * 2017-10-30 2019-09-10 Wuhun China Star Optoelectronics Semiconductor Display Technology Co., Ltd. Quasi crystalline conductive particles between a substrate and IC chip
JP7125319B2 (en) * 2018-10-04 2022-08-24 三菱マテリアル電子化成株式会社 Silver-coated resin particles and method for producing the same

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4740657A (en) * 1986-02-14 1988-04-26 Hitachi, Chemical Company, Ltd Anisotropic-electroconductive adhesive composition, method for connecting circuits using the same, and connected circuit structure thus obtained
JPH0651337A (en) * 1992-08-03 1994-02-25 Smk Corp Connecting structure for electric circuit
US5336443A (en) * 1993-02-22 1994-08-09 Shin-Etsu Polymer Co., Ltd. Anisotropically electroconductive adhesive composition
JPH07140480A (en) 1993-11-19 1995-06-02 Hitachi Chem Co Ltd Anisotropically conductive and adhesive film
JP3391870B2 (en) * 1993-12-17 2003-03-31 住友ベークライト株式会社 Anisotropic conductive film
JP3137578B2 (en) * 1996-02-27 2001-02-26 ソニーケミカル株式会社 Conductive particles for anisotropic conductive adhesive film, method for producing the same, and anisotropic conductive adhesive film
US6034331A (en) * 1996-07-23 2000-03-07 Hitachi Chemical Company, Ltd. Connection sheet and electrode connection structure for electrically interconnecting electrodes facing each other, and method using the connection sheet

Cited By (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20050173785A1 (en) * 2004-02-05 2005-08-11 Samsung Electronics Co., Ltd. Anisotropic conductive film and bump, and packaging structure of semiconductor having the same
US7528486B2 (en) * 2004-02-05 2009-05-05 Samsung Electronics Co., Ltd. Anisotropic conductive film and bump, and packaging structure of semiconductor having the same
US20050276918A1 (en) * 2004-07-07 2005-12-15 Xerox Corporation Adhesive film exhibiting anisotropic electrical conductivity
US7078095B2 (en) 2004-07-07 2006-07-18 Xerox Corporation Adhesive film exhibiting anisotropic electrical conductivity
US7294358B2 (en) 2004-07-07 2007-11-13 Xerox Corporation Adhesive film exhibiting anisotropic electrical conductivity
US20070281161A1 (en) * 2004-08-20 2007-12-06 Sekisui Chemical Co., Ltd. Conductive Fine Particles And Anisotropic Conductive Material
US7470416B2 (en) 2004-08-20 2008-12-30 Sekisui Chemical Co., Ltd. Conductive fine particles and anisotropic conductive material
KR100650284B1 (en) 2005-02-22 2006-11-27 제일모직주식회사 Polymer Particles and Conductive Particles Having Enhanced Conducting Properties and an Anisotropic Conductive Packaging Materials Containing the Same
US20090133900A1 (en) * 2005-04-14 2009-05-28 Matsushita Electric Industrial Co., Ltd. Electronic circuit device and method for manufacturing same
US8969706B2 (en) 2006-04-26 2015-03-03 Hitachi Chemical Company, Ltd. Adhesive tape and solar cell module using the same
US20090235972A1 (en) * 2006-04-26 2009-09-24 Hitachi Chemical Company, Ltd. Adhesive tape and solar cell module using the same
US8969707B2 (en) 2006-04-26 2015-03-03 Hitachi Chemical Company, Ltd. Adhesive tape and solar cell module using the same
US20100025097A1 (en) * 2006-10-31 2010-02-04 Hitachi Chemical Company, Ltd. Circuit connection structure
CN103198878A (en) * 2006-10-31 2013-07-10 日立化成工业株式会社 Circuit connection structure
US20100139947A1 (en) * 2007-05-15 2010-06-10 Hitachi Chemical Company, Ltd. Circuit-connecting material, and connection structure for circuit member
TWI395801B (en) * 2007-11-12 2013-05-11 Circuit connection material and circuit structure of the connection structure
US20170034964A1 (en) * 2009-06-22 2017-02-02 Eldrid Svasand Electrostatic discharge device and method for manufacturing the same
US8609275B2 (en) 2010-09-01 2013-12-17 Samsung Sdi Co., Ltd. Connective structure between a battery cell and a connecting bar of a battery pack
US9365749B2 (en) 2013-05-31 2016-06-14 Sunray Scientific, Llc Anisotropic conductive adhesive with reduced migration
US9777197B2 (en) 2013-10-23 2017-10-03 Sunray Scientific, Llc UV-curable anisotropic conductive adhesive
CN104808398A (en) * 2015-05-22 2015-07-29 京东方科技集团股份有限公司 Display panel, production method thereof and display device
CN107454741A (en) * 2016-05-30 2017-12-08 松下知识产权经营株式会社 Conducting particles, the connecting material of circuit block, connecting structure and connection method

Also Published As

Publication number Publication date
KR20000048223A (en) 2000-07-25
US6344156B1 (en) 2002-02-05
KR101042869B1 (en) 2011-06-20
JP2000195339A (en) 2000-07-14
KR20080075827A (en) 2008-08-19
KR100878175B1 (en) 2009-01-12
JP3379456B2 (en) 2003-02-24

Similar Documents

Publication Publication Date Title
US6344156B1 (en) Anisotropic conductive adhesive film
KR100539060B1 (en) Anisotropic conductive adhesive and adhesive film
KR100713333B1 (en) Multi-layered anisotropic conductive film
US8273207B2 (en) Method for connecting electronic part and joined structure
KR100559937B1 (en) Method of microelectrode connection and connected srtucture thereby
JP3296306B2 (en) Anisotropic conductive adhesive and adhesive film
US6409866B1 (en) Process for mounting semiconductor device
KR100861757B1 (en) Connecting material for anisotropically electroconductive connection
KR19990008410A (en) Semiconductor device having semiconductor chip electrically connected to wiring board
JP2000207943A (en) Anisotropically conductive film and electrical connection device using the same
KR100832283B1 (en) Anisotropically electroconductive connecting material
JPH07157720A (en) Film having anisotropic electrical conductivity
JPH08148213A (en) Connection member and structure and method for connecting electrode using the same
JP2948038B2 (en) Anisotropic conductive film
US6475641B2 (en) Connecting material and connection structure
KR20020042465A (en) Connection material
US7846547B2 (en) Insulation-coated conductive particle
JPH0750104A (en) Conductive particle and connection member using conductive particle
JP2001155539A (en) Conductive fine particle, anisotropic conductive adhesive and conductive connector
JPH03101007A (en) Anisotropic conductive film
KR101086659B1 (en) Anisotropic conductive adhesive film
JPH08148210A (en) Connection member
KR20060041090A (en) Particle for anisotropic conductive connection and anisotropic conductive film
KR100241589B1 (en) Anisotropic conductive film
JPH09148702A (en) Connecting member and structure and method for connecting electrode using it

Legal Events

Date Code Title Description
AS Assignment

Owner name: SONY CHEMICALS CORP., JAPAN

Free format text: ASSIGNMENT OF ASSIGNORS INTEREST;ASSIGNORS:YAMADA, YUKIO;SAKAIRI, MIKIO;AKUTSU, YASUSHI;AND OTHERS;REEL/FRAME:010666/0443

Effective date: 19991208

STCF Information on status: patent grant

Free format text: PATENTED CASE

FPAY Fee payment

Year of fee payment: 4

FPAY Fee payment

Year of fee payment: 8

FPAY Fee payment

Year of fee payment: 12