Classifications

• • C—CHEMISTRY; METALLURGY
  • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
  • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
  • C08L91/00—Compositions of oils, fats or waxes; Compositions of derivatives thereof
  • C08L91/06—Waxes
• • C—CHEMISTRY; METALLURGY
  • C07—ORGANIC CHEMISTRY
  • C07D—HETEROCYCLIC COMPOUNDS
  • C07D487/00—Heterocyclic compounds containing nitrogen atoms as the only ring hetero atoms in the condensed system, not provided for by groups C07D451/00 - C07D477/00
  • C07D487/02—Heterocyclic compounds containing nitrogen atoms as the only ring hetero atoms in the condensed system, not provided for by groups C07D451/00 - C07D477/00 in which the condensed system contains two hetero rings
  • C07D487/04—Ortho-condensed systems
• • C—CHEMISTRY; METALLURGY
  • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
  • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
  • C08K5/00—Use of organic ingredients
  • C08K5/16—Nitrogen-containing compounds
  • C08K5/17—Amines; Quaternary ammonium compounds
• • C—CHEMISTRY; METALLURGY
  • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
  • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
  • C08K5/00—Use of organic ingredients
  • C08K5/16—Nitrogen-containing compounds
  • C08K5/34—Heterocyclic compounds having nitrogen in the ring
  • C08K5/3442—Heterocyclic compounds having nitrogen in the ring having two nitrogen atoms in the ring
  • C08K5/3462—Six-membered rings

Definitions

• the invention relates to ⁇ -amino ketones which can be converted photochemically into amidine derivatives, to a process for their preparation and to a process for the photochemical preparation of the amidine derivatives.
• Further subjects of the invention are base-polymerizable or crosslinkable compositions comprising these ⁇ -amino ketones, a method of implementing photochemically induced, base-catalysed reactions, and the use of the ⁇ -amino ketones as photoinitiators for base-catalysed reactions.
• amidine group on exposure to visible or UV light.
• This amidine group is sufficiently basic to initiate a large number of base-catalysable reactions, especially polymerization reactions.
• the compounds are of high sensitivity and through the choice of the substituent R 1 the absorption spectrum can be varied within a wide range.
• the compounds make it possible to prepare so-called one-pot systems with base-catalysable oligomers or monomers having an extremely long storage life.
• a polymerization reaction for example, is initiated only after exposure to light.
• the systems can be formulated with little or no solvent, since the compounds can be dissolved in the monomers or oligomers without being affected.
• the active catalyst is formed only after exposure to light.
• These systems can be employed for numerous purposes, such as for finishes, coatings, moulding compounds or photolithographic reproductions.
• the invention provides organic compounds having a molecular weight of less than 1000, comprising at least one structural unit of the formula (I)
• R 1 is an aromatic or heteroaromatic radical capable of absorbing light in the wavelength range from 200 to 650 nm and in doing so brings about cleavage of the adjacent carbon-nitrogen bond.
• the structural unit of the formula (I) features a divalent and monovalent nitrogen atom and a divalent and monovalent carbon atom, the nitrogen atoms being in ⁇ position relative to one another.
• aromatic or heteroaromatic radicals R 1 are meant those which conform to the Hückel 4n+2 rule.
• the absorption maximum can be varied within a wide range through the choice of the aromatic or heteroaromatic radical R 1 , and so the photosensitivity of the compounds can be shifted from the UV into the daylight region.
• R 1 is an aromatic or heteroaromatic radical which is capable of absorbing light in the wavelength range from 200 to 650 nm and in doing so brings about cleavage of the adjacent carbon-nitrogen bond;
• R 2 and R 3 independently of one another are hydrogen, C 1 -C 18 alkyl, C 3 -C 18 alkenyl, C 3 -C 18 alkynyl or phenyl and, if R 2 is hydrogen or C 1 -C 18 alkyl, R 3 is additionally a group —CO—R 14 in which R 14 is C 1 -C 18 alkyl or phenyl; or R 1 and R 3 , together with the carbonyl group and the C atom to which R 3 is attached, form a benzocyclopentanone radical;
• R 5 is C 1 -C 18 alkyl or NR 15 R 16 ;
• R 4 , R 6 , R 7 , R 15 and R 16 independently of one another are hydrogen or C 1 -C 18 alkyl; or
• R 4 and R 6 together form a C 2 -C 12 alkylene bridge or
• R 5 and R 7 together, independently of R 4 and R 6 , form a C 2 -C 12 alkylene bridge or, if R 5 is NR 15 R 16 , R 16 and R 7 together form a C 2 -C 12 alkylene bridge.
• Alkyl in the various radicals having up to 18 carbon atoms is a branched or unbranched radical such as methyl, ethyl, propyl, isopropyl, n-butyl, sec-butyl, isobutyl, tert-butyl, 2-ethylbutyl, n-pentyl, isopentyl, 1-methylpentyl, 1,3-dimethylbutyl, n-hexyl, 1-methylhexyl, n-heptyl, isoheptyl, 1,1,3,3-tetramethylbutyl, 1-methylheptyl, 3-methylheptyl, n-octyl, 2-ethylhexyl, 1,1,3-trimethylhexyl, 1,1,3,3-tetramethylpentyl, nonyl, decyl, undecyl, 1-methylundecyl, dodecyl, 1,1,3,3,5,5-
• Alkenyl having 3 to 18 carbon atoms is a branched or unbranched radical such as propenyl, 2-butenyl, 3-butenyl, isobutenyl, n-2,4-pentadienyl, 3-methyl-2-butenyl, n-2-octenyl, n-2-dodecenyl, iso-dodecenyl, oleyl, n-2-octadecenyl or n-4-octadecenyl.
• Preference is given to alkenyl having 3 to 12, especially 3 to 6 carbon atoms.
• Alkynyl having 3 to 18 carbon atoms is a branched or unbranched radical such as propynyl —CH 2 —C ⁇ CH), 2-butynyl, 3-butynyl, n-2-octynyl, or n-2-octadecynyl. Preference is given to alkynyl having 3 to 12, especially 3 to 6 carbon atoms.
• the C 2 -C 12 alkylene bridge is ethylene, propylene, butylene, pentylene, hexylene, heptylene, octylene, nonylene, decylene, undecylene or dodecylene.
• R 1 is preferably an aromatic radical which is unsubstituted or substituted one or more times by C 1 -C 18 alkyl, C 3 -C 18 alkenyl, C 3 -C 18 alkynyl, C 1 -C 18 haloalkyl, NO 2 , NR 8 R 9 , N 3 , OH, CN, OR 10 , SR 10 , C(O)R 11 , C(O)OR 12 or halogen and is selected from the group consisting of phenyl, naphthyl, phenanthryl, anthracyl, pyrenyl, 5,6,7,8-tetrahydro-2-naphthyl, 5,6,7,8-tetrahydro-1-naphthyl, thienyl, benzo[b]thienyl, naphtho[2,3-b]thienyl, thiathrenyl, dibenzofuryl, chromenyl, xanthen
• R 8 , R 9 , R 10 , R 11 and R 12 are hydrogen or C 1 -C 18 alkyl
• R 13 is C 1 -C 18 alkyl, C 2 -C 18 alkenyl, C 2 -C 18 alkynyl, C 1 -C 18 haloalkyl, N0 2 , NR 8 R 9 , OH, CN, OR 10 , SR 10 , C(O)R 11 , C(O)OR 12 or halogen; and n is 0 or a number 1, 2 or 3.
• Halogen is fluorine, chlorine, bromine or iodine.
• C 1 -C 18 haloalkyl are fully or partly halogenated C 1 -C 18 alkyl.
• the halogen (halo) here is F, Cl, Br, or I.
• Examples are the positional isomers of mono- to decafluoropentyl, mono- to octafluorobutyl, mono- to hexafluoropropyl, mono- to tetrafluoroethyl and mono- and difluoromethyl and also the corresponding chloro, bromo and iodo compounds.
• Examples of the NR 8 R 9 amino group are the respective monoalkyl or dialkylamino groups such as methylamino, ethylamino, propylamino, butylamino, pentylamino, hexylamino, octadecylamino, dimethylamino, diethylamino, dipropylamino, diisopropylamino, di-n-butylamino, di-isobutylamino, dipentylamino, dihexylamino or dioctadecylamino.
• monoalkyl or dialkylamino groups such as methylamino, ethylamino, propylamino, butylamino, pentylamino, hexylamino, octadecylamino, dimethylamino, diethylamino, dipropylamino, diisopropylamino, di-
• dialkylamino groups are those in which the two radicals independently of one another are branched or unbranched, for example methylethylamino, methyl-n-propylamino, methylisopropylamino, methyl-n-butylamino, methylisobutylamino, ethylisopropylamino, ethyl-n-butylamino, ethylisobutylamino, ethyl-tert-butylamino, isopropyl-n-butylamino or isopropylisobutylamino.
• the alkoxy group OR 10 having up to 18 carbon atoms is a branched or unbranched radical such as methoxy, ethoxy, propoxy, isopropoxy, n-butoxy, isobutoxy, pentoxy, isopentoxy, hexoxy, heptoxy, octoxy, decyloxy, tetradecyloxy, hexadecyloxy or octadecyloxy.
• Examples of the thioalkyl group SR 10 are thiomethyl, thioethyl, thiopropyl, thiobutyl, thiopentyl, thiohexyl, thioheptyl, thiooctyl or thiooctadecyl, it being possible for the alkyl radicals to be linear or branched.
• radical R 1 examples are phenyl, naphthyl, phenanthryl, anthracyl, pyrenyl, 5,6,7,8-tetrahydro-2-naphthyl, 5,6,7,8-tetrahydro-1-naphthyl, thienyl, benzo[b]thienyl, naphtho[2,3-b]thienyl, thiathrenyl, dibenzofuryl, chromenyl, xanthenyl, phenoxathiinyl, pyrrolyl, imidazolyl, pyrazolyl, pyrazinyl, pyrimidinyl, pyridazinyl, indolizinyl, isoindolyl, indolyl, indazolyl, purinyl, quinolizinyl, isoquinolyl, quinolyl, phthalazinyl, naphthyridinyl,
• Radicals substituted one or more times are, for example, substituted 1 to 5 times, 1 to 4 times or 3 times, 2 times or once.
• R 1 and R 3 together with the carbonyl group and the C atom to which R 3 is attached, form a benzocyclopentanone radical, this means structures as follows
• R 1 is phenyl, naphthyl, pyrenyl, thioxanthyl or phenothiazinyl each of which is unsubstituted or substituted one or more times by C 1 -C 18 alkyl, C 1 -C 18 haloalkyl, NR 8 R 9 , CN, NO 2 , N 3 , SR 10 or OR 10 , or R 1 is a radical of the formulae A, B or C
• n 0 and the radicals R 8 , R 9 , R 10 and R 13 are as defined above.
• R 1 is phenyl, naphthyl, anthracyl, thioxanthyl, dibenzofuranyl or pyrenyl, the radicals phenyl, naphthyl, anthracyl, thioxanthyl and pyrenyl being unsubstituted or being substituted one or more times by CN, NR 8 R 9 , NO 2 , halogen, N 3 , CF 3 , SR 10 or OR 10 , or R 1 is a radical of the formulae A, B or C.
• n 0 and the radicals R 8 , R 9 , R 10 and R13 are as defined above.
• R 1 is phenyl, 4-aminophenyl, 4-methylthiophenyl, 4-trifluoromethylphenyl, 4-nitrophenyl, 2,4,6-trimethoxyphenyl, 2,4-dimethoxyphenyl, naphthyl, anthracyl or pyrenyl or a radical of the formula A or B
• R 2 and R 3 independently of one another are preferably hydrogen or C 1 -C 6 alkyl. It is likewise preferred for R 4 and R 6 together to be a C 2 -C 6 alkylene bridge.
• R 5 and R 7 are a C 2 -C 6 alkylene bridge or, if R 5 is NR 15 R 16 , R 16 and R 7 together are a C 2 -C 6 alkylene bridge.
• R 7 is preferably a C 2 -C 6 alkylene bridge together with R 5 or R 7 is C 1 -C 18 alkyl which is branched in the ⁇ -position of the N-atom.
• a particularly preferred group of compounds of the formula (II) are those in which R 1 is phenyl, naphthyl, anthracyl, thioxanthyl, dibenzofuranyl or pyrenyl, the phenyl radical being unsubstituted or being substituted one or more times by CN, NR 8 R 9 , NO 2 , N 3 , halogen, CF 3 , SR 10 or OR 10 , or R 1 is a radical of the formulae A, B or C
• n is 0 and the radicals R 8 , R 9 , R 10 and R 13 are hydrogen or C 1 -C 14 alkyl;
• R 2 and R 3 are hydrogen or C 1 -C 6 alkyl; or R 1 and R 3 , together with the carbonyl group and the C atom to which R 3 is attached, form a benzocyclopentanone radical;
• R 4 , R 6 and R 7 independently of one another are hydrogen or C 1 -C 6 alkyl
• R 5 is C 1 -C 6 alkyl or NR 15 R 16 , where R 15 and R 16 are hydrogen or C 1 -C 6 alkyl; or
• R 4 and R 6 together form a C 2 -C 6 alkylene bridge; or, independently of R 4 and R 6 ,
• R 5 and R 7 together form a C 2 -C 6 alkylene bridge or, if R 5 is NR 15 R 16 , R 16 and R 7 together form a C 2 -C 6 alkylene bridge.
• the invention additionally provides a process for preparing compounds having the structural unit of the formula (I), which comprises reacting a compound comprising a structural unit of the formula (III)
• R 1 is as defined above, including the preferred meanings
• Halogen is F, Cl, Br or I, preferably Br.
• R 1 , R 2 , R 3 , R 4 , R 5 , R 6 and R 7 are as defined above, including the preferred meanings, and Halogen is F, Cl, Br or I.
• the reaction can be carried out in a conventional manner. It is advantageous to use a solvent or solvent mixture, for example hydrocarbons (benzene, toluene, xylene), halogenated hydrocarbons (methylene chloride, chloroform, carbon tetrachloride, chlorobenzene), alkanols (methanol, ethanol, ethylene glycol monomethyl ether) and ethers (diethyl ether, dibutyl ether, ethylene glycol dimethyl ether) or mixtures thereof.
• hydrocarbons benzene, toluene, xylene
• halogenated hydrocarbons methylene chloride, chloroform, carbon tetrachloride, chlorobenzene
• alkanols methanol, ethanol, ethylene glycol monomethyl ether
• ethers diethyl ether, dibutyl ether, ethylene glycol dimethyl ether
• the reaction can be carried out within a temperature range from ⁇ 10° C. to +100° C. It is preferably carried out at from 10° C. to 50° C.
• the invention likewise provides a process for preparing a compound of the formula (VII)
• reaction solution is preferably stirred and, if desired, cooled in the course of the exposure.
• the invention additionally provides a composition comprising
• compositions comprising as component A) organic components in which the structural unit of the formula (I) comprises compounds of the formula (II)
• the base-catalysed addition or substitution reaction can be carried out with low molecular mass compounds (monomers), with oligomers, with polymeric compounds or with a mixture of these compounds.
• Examples of reactions which can be carried out both with monomers and with oligomers/polymers using the novel photoinitiators are the Knoevenagel reaction or the Michael addition reaction.
• compositions in which component B) is an anionically polymerizable or crosslinkable organic material are compositions in which component B) is an anionically polymerizable or crosslinkable organic material.
• the organic material can be in the form of mono- or polyfunctional monomers, oligomers or polymers.
• oligomeric/polymeric systems are binders or coating systems as are customary in the coatings industry.
• n) Two-component systems comprising an ⁇ , ⁇ -ethylenically unsaturated carbonyl compound and a polymer which contains activated CH 2 groups, it being possible for the activated CH 2 groups to be present either in the main chain or in the side chain or in both, as is described, for example, in EP-B-0 161 697 for (poly)malonate groups.
• Other compounds having activated CH 2 groups are (poly)acetoacetates and (poly)cyanoacetates.
• n) two-component systems comprising an ⁇ , ⁇ -ethylenically unsaturated carbonyl compound and a polymer which contains activated CH 2 groups, it being possible for the activated CH 2 groups to be present either in the main chain or in the side chain or in both, as is described, for example, in EP-B-0 161 697 for (poly)malonate groups.
• Other compounds having activated CH 2 groups are (poly)acetoacetates and (poly)cyanoacetates.
• Two-component systems comprising an ⁇ , ⁇ -ethylenically unsaturated carbonyl compound and a (poly)malonate, and their preparation, are described in EP-B-0 161 687.
• the malonate group here can be attached in a polyurethane, polyester, polyacrylate, epoxy resin, polyamide or polyvinyl polymer either in the main chain or in a side chain.
• the ⁇ , ⁇ -ethylenically unsaturated carbonyl compound employed can be any double bond activated by a carbonyl group. Examples are esters or amides of acrylic acid or methacrylic acid. In the ester groups it is also possible for additional hydroxyl groups to be present. Diesters and triesters are also possible.
• Typical examples are hexanediol diacrylate or trimethylolpropane triacrylate.
• acrylic acid it is also possible to use other acids and their esters or amides, such as crotonic or cinnamic acid.
• the components of the system react with one another at room temperature to form a crosslinked coating system which is suitable for numerous applications. Owing to its good inherent weathering resistance it is suitable, for example, for exterior applications as well and can, if required, be additionally stabilized by UV absorbers and other light stabilizers.
• Epoxy resins are suitable for preparing novel, curable mixtures comprising epoxy resins as component B) are those which are customary in epoxy resin technology, examples of such epoxy resins being:
• Aromatic polycarboxylic acids such as tetrahydrophthalic, 4-methyltetrahydrophthalic, hexahydrophthalic or 4-methylhexahydrophthalic acid, for example.
• Aromatic polycarboxylic acids furthermore, can be used, such as phthalic, isophthalic or terephthalic acid, for example.
• Polyglycidyl or poly( ⁇ -methylglycidyl) ethers obtainable by reacting a compound having at least two free alcoholic hydroxyl groups and/or phenolic hydroxyl groups with epichlorohydrin or ⁇ -methylepichlorohydrin under alkaline conditions or in the presence of an acidic catalyst with subsequent alkali treatment.
• the glycidyl ethers of this type are derived, for example, from acyclic alcohols, such as ethylene glycol, diethylene glycol and higher poly(oxyethylene) glycols, propane-1,2-diol or poly(oxypropylene) glycols, propane-1,3-diol, butane-1,4-diol, poly(oxytetramethylene) glycols, pentane-1,5-diol, hexane-1,6-diol, hexane-2,4,6-triol, glycerol, 1,1,1-trimethylolpropane, pentaerythritol, sorbitol, and from polyepichlorohydrins.
• acyclic alcohols such as ethylene glycol, diethylene glycol and higher poly(oxyethylene) glycols, propane-1,2-diol or poly(oxypropylene) glycols, propane-1,3-diol, butane
• cycloaliphatic alcohols such as 1,4-cyclohexanedimethanol, bis(4-hydroxycyclohexyl)methane or 2,2-bis(4-hydroxycyclohexyl)propane, or possess aromatic nuclei, such as N,N-bis(2-hydroxyethyl)aniline or p,p′-bis(2-hydroxyethylamino)diphenylmethane.
• the glycidyl ethers can also be derived from mononuclear phenols, such as resorcinol or hydroquinone, for example, or are based on polynuclear phenols, such as bis(4-hydroxyphenyl)methane, 4,4′-dihydroxybiphenyl, bis(4-hydroxyphenyl) sulfone, 1,1,2,2-tetrakis(4-hydroxyphenyl)ethane, 2,2-bis(4-hydroxyphenyl)propane, 2,2-bis(3,5-dibromo-4-hydroxyphenyl)propane and from novolaks, obtainable by condensing aldehydes, such as formaldehyde, acetaldehyde, chloral or furfuraldehyde, with phenols, such as phenol, or with phenols whose nucleus is substituted by chlorine atoms or C 1 -C 9 alkyl groups, examples being 4-chlorophenol, 2-methyl
• poly(N-glycidyl) compounds also, however, include triglycidyl isocyanurate, N,N′-diglycidyl derivatives of cycloalkyleneureas, such as ethyleneurea or 1,3-propyleneurea, and diglycidyl derivatives of hydantoins, such as of 5,5-dimethylhydantoin.
• Cycloaliphatic epoxy resins for example bis(2,3-epoxycyclopentyl) ether, 2,3-epoxycyclopentyl glycidyl ether, 1,2-bis(2,3-epoxycyclopentyloxy)ethane or 3,4-epoxycyclohexylmethyl 3′,4′-epoxycyclohexanecarboxylate.
• epoxy resins in which the 1,2-epoxide groups are attached to different heteroatoms and/or functional groups; these compounds include, for example, the N,N,O-triglycidyl derivative of 4-aminophenol, the glycidyl ether glycidyl ester of salicylic acid, N-glycidyl-N′-(2-glycidyloxypropyl)-5,5-dimethylhydantoin or 2-glycidyloxy-1,3-bis(5,5-dimethyl-1-glycidylhydantoin-3-yl)propane.
• these compounds include, for example, the N,N,O-triglycidyl derivative of 4-aminophenol, the glycidyl ether glycidyl ester of salicylic acid, N-glycidyl-N′-(2-glycidyloxypropyl)-5,5-dimethylhydantoin or 2-glycidyloxy-1,3-bis
• compositions comprise the photoinitiator, component A), preferably in an amount of from 0.01 to 10% by weight, based on the component B).
• the photopolymerizable mixtures may include various additives.
• thermal inhibitors which are intended to prevent premature polymerization, such as hydroquinone, hydroquinone derivatives, p-methoxyphenol, ⁇ -naphthol or sterically hindered phenols such as 2,6-di(tert-butyl)-p-cresol, for example.
• copper compounds such as copper naphthenate, stearate or octoate
• phosphorus compounds such as triphenylphosphine, tributylphosphine, triethyl phosphite, triphenyl phosphite or tribenzyl phosphite
• quaternary ammonium compounds such as tetramethylammonium chloride or trimethylbenzylammonium chloride
• hydroxylamine derivatives such as N-diethyl-hydroxylamine.
• UV absorbers such as those, for example, of the hydroxyphenylbenzotriazole, hydroxyphenyl-benzophenone, oxalamide or hydroxyphenyl-s-triazine type. Individual compounds or mixtures of these compounds can be used, with or without the deployment of sterically hindered amines (HALS).
• HALS sterically hindered amines
• UV absorbers and light stabilizers are given below.
• 1,2-(2′-Hydroxyphenyl)benzotriazoles for example 2-(2′-hydroxy-5′-methylphenyl)benzotriazole, 2-(3′,5′-di-tert-butyl-2′-hydroxyphenyl)benzotriazole, 2-(5′-tert-butyl-2′-hydroxyphenyl)benzotriazole, 2-(2′-hydroxy-5′-(1,1,3,3-tetramethylbutyl)phenyl)benzotriazole, 2-(3′,5′-di-tert-butyl-2′-hydroxyphenyl)-5-chlorobenzotriazole, 2-(3′-tert-butyl-2′-hydroxy-5′-methylphenyl)-5-chlorobenzotriazole, 2-(3′-sec-butyl-5′-tert-butyl-2′-hydroxyphenyl)benzotriazole, 2-(2′-hydroxy-4′-octoxyphenyl)
• 2.2-Hydroxybenzophenones for example the 4-hydroxy, 4-methoxy-, 4-octoxy-, 4-decyloxy, 4-dodecyloxy, 4-benzyloxy, 4,2′,4′-trihydroxy and 2′-hydroxy-4,4′-dimethoxy derivative.
• esters of substituted and unsubstituted benzoic acids for example 4-tert-butylphenyl salicylate, phenyl salicylate, octylphenyl salicylate, dibenzoylresorcinol, bis(4-tert-butylbenzoyl)resorcinol, benzoylresorcinol, 2,4-di-tert-butylphenyl 3,5-di-tert-butyl-4-hydroxybenzoate, hexadecyl 3,5-di-tert-butyl-4-hydroxybenzoate, octadecyl 3,5-di-tert-butyl-4-hydroxybenzoate and 2-methyl-4,6-di-tert-butylphenyl 3,5-di-tert-butyl-4-hydroxybenzoate.
• Sterically hindered amines such as bis(2,2,6,6-tetramethylpiperidyl) sebacate, bis(2,2,6,6-tetramethylpiperidyl) succinate, bis(1,2,2,6,6-pentamethylpiperidyl) sebacate, bis(1,2,2,6,6-pentamethylpiperidyl) n-butyl-3,5-di-tert-butyl-4-hydroxybenzylmalonate, condensation product of 1-hydroxyethyl-2,2,6,6-tetramethyl-4-hydroxypiperidine and succinic acid, condensation product of N,N′-bis(2,2,6,6-tetramethyl-4-piperidyl)hexamethylenediamine and 4-tert-octylamino-2,6-dichloro-1,3,5-s-triazine, tris(2,2,6,6-tetramethyl-4-piperidyl) nitrilotriacetate, tetrakis
• Oxalamides for example 4,4′-dioctyloxyoxanilide, 2,2′-diethoxyoxanilide, 2,2′-dioctyloxy-5,5′-di-tert-butyloxanilide, 2,2′-di-dodecyloxy-5,5′di-tert-butyloxanilide, 2-ethoxy-2′-ethyloxanilide, N,N′-bis(3-dimethylaminopropyl)oxalamide, 2-ethoxy-5-tert-butyl-2′-ethyloxanilide and its mixture with 2-ethoxy-2′-ethyl-5,4′-di-tert-butyloxanilide, mixtures of o- and p-methoxy- and of o- and p-ethoxy-disubstituted oxanilides.
• Phosphites and phosphonites for example, triphenyl phosphite, diphenyl alkyl phosphites, phenyl dialkyl phosphites, tris(nonylphenyl) phosphite, trilauryl phosphite, trioctadecyl phosphite, distearyl pentaerythritol diphosphite, tris(2,4-di-tert-butylphenyl) phosphite, diisodecyl pentaerythritol diphosphite, bis(2,4-di-tert-butylphenyl) pentaerythritol diphosphite, bis(2,6-di-tert-butyl-4-methylphenyl) pentaerythritol diphosphite, bis-isodecyloxy pentaerythritol diphosphite, bis
• Fillers and reinforcing agents for example calcium carbonate, silicates, glass fibres, glass beads, asbestos, talc, kaolin, mica, barium sulfate, metal oxides and hydroxides, carbon black, graphite, wood flour and flours or fibres of other natural products, synthetic fibres.
• additives for example plasticizers, lubricants, emulsifiers, pigments, Theological additives, catalysts, levelling assistants, optical brighteners, flameproofing agents, antistatics, blowing agents.
• coinitiators are dyes which improve the overall quantum yield by means, for example, of energy transfer or electron transfer.
• suitable dyes which can be added as coinitiators are triarylmethanes, for example malachite green, indolines, thiazines, for example methylene blue, xanthones, thioxanthones, oxazines, acridines or phenazines, for example safranine, and rhodamines of the formula
• R is alkyl or aryl and R′ is hydrogen, an alkyl or aryl radical, for example Rhodamine B, Rhodamine 6G or Violamine R, and also Sulforhodamine B or Sulforhodamine G.
• the composition may also include other binders as well.
• Further olefinically unsaturated compounds are possible.
• the unsaturated compounds may include one or more olefinically double bonds. They may be of low molecular mass (monomeric) or higher molecular mass (oligomeric). Examples of monomers having a double bond are alkyl or hydroxyalkyl acrylates or methacrylates, such as methyl, ethyl, butyl, 2-ethylhexyl or 2-hydroxyethyl acrylate, isbornyl acrylate, methyl methacrylate or ethyl methacrylate.
• Silicone acrylates are also of interest. Further examples are acrylonitrile, acrylamide, methacrylamide, N-substituted (meth)acrylamides, vinyl esters such as vinyl acetate, vinyl ethers such as isobutyl vinyl ether, styrene, alkyl- and halostyrenes, N-vinylpyrrolidone, vinyl chloride or vinylidene chloride.
• Examples of monomers having two or more double bonds are the diacrylates of ethylene glycol, propylene glycol, neopentyl glycol, hexamethylene glycol or bisphenol A, 4,4′-bis(2-acryloyloxyethoxy)diphenylpropane, trimethylolpropane triacrylate, pentaerythritol triacrylate or tetraacrylate, vinyl acrylate, divinyl benzene, divinyl succinate, diallyl- phthalate, triallyl phosphate, triallyl isocyanurate or tris(2-acryloylethyl)isocyanurate.
• polyunsaturated compounds of relatively high molecular mass examples include acrylicized epoxy resins, acrylicized polyesters or polyesters containing vinyl ether groups or epoxy groups, polyurethanes and polyethers.
• unsaturated oligomers are unsaturated polyester resins which are mostly prepared from maleic acid, phthalic acid and one or more diols and have molecular weights of from about 500 to 3000.
• vinyl ether monomers and oligomers and also maleate-terminated oligomers with polyester, polyurethane, polyether, polyvinyl ether and epoxy main chains.
• esters of ethylenically unsaturated carboxylic acids and polyols or polyepoxides and polymers having ethylenically unsaturated groups in the chain or in side groups, such as unsaturated polyesters, polyamides and polyurethanes and copolymers thereof, alkyd resins, polybutadiene and butadiene copolymers, polyisoprene and isoprene copolymers, polymers and copolymers having (meth)acrylic groups in side chains, and mixtures of one or more such polymers.
• Examples are benzophenone, benzophenone derivatives, acetophenone, acetophenone derivatives, for example ⁇ -hydroxycycloalkyl phenyl ketones, dialkoxyacetophenones, ⁇ -hydroxy- or ⁇ -aminoacetophenones, 4-aroyl-1,3-dioxolanes, benzoin alkyl ethers and benzil ketals, monoacyl phosphine oxides, bisacylphosphine oxides, ferrocenium compounds or titanocenes.
• the novel compositions can also have added to them non-reactive binders, which is particularly judicious if the photopolymerizable compounds are liquid or viscous substances.
• the amount of the non-reactive binder can be, for example, 5-95%, preferably 10-90% and, in particular, 40-90% by weight, based on the overall solids content.
• the choice of non-reactive binder is made in accordance with the field of use and with the properties required for this use, such as the possibility for development in aqueous and organic solvent systems, adhesion to substrates, and sensitivity to oxygen.
• Suitable binders are polymers having a molecular weight of around 5000-2,000,000, preferably 10,000-1,000,000.
• Examples are: homo- and copolymeric acrylates and methacrylates, for example copolymers of methyl methacrylate/ethyl acrylate/methacrylic acid, poly(alkyl methacrylates), poly(alkyl acrylates); cellulose esters and ethers, such as cellulose acetate, cellulose acetate butyrate, methylcellulose, ethylcellulose; polyvinylbutyral, polyvinylformal, cyclized rubber, polyethers such as polyethylene oxide, polypropylene oxide, polytetrahydrofuran; polystyrene, polycarbonate, polyurethane, chlorinated polyolefins, polyvinyl chloride, copolymers of vinyl chloride/vinylidene chloride, copolymers of vinylidene chloride with acrylonitrile, methyl methacrylate and
• the invention additionally provides a method of implementing base-catalysed reactions which comprises subjecting
• R 1 is an aromatic or heteroaromatic radical which is capable of absorbing light in the wavelength range from 200 to 650 nm and in doing so brings about cleavage of the adjacent carbon-nitrogen bond;
• Component A) is preferably an organic compound in which the structural unit of the formula (I) comprises compounds of the formula (II)
• R 1 , R 2 , R 3 , R 4 , R 5 , R 6 and R 7 are as defined above, including their preferred meanings.
• component B) is an anionically polymerizable or crosslinkable organic material.
• the sensitivity of the novel compositions to light generally extends from about 200 nm through the UV region and into the infrared region (about 20,000 nm, in particular 1200 nm) and therefore spans a very broad range.
• Suitable radiation comprises, for example, sunlight or light from artificial light sources. Therefore, a large number of very different types of light source can be used. Both point sources and flat radiators (lamp carpets) are suitable.
• Examples are carbon arc lamps, xenon arc lamps, medium-pressure, high-pressure and low-pressure mercury lamps, doped if desired with metal halides (metal halogen lamps), microwave-stimulated metal vapour lamps, excimer lamps, superactinic fluorescent tubes, fluorescent lamps, incandescent argon lamps, electronic flashlights, photographic flood lamps, electron beams and X-rays, produced by means of synchrotrons or laser plasma.
• the distance between the lamp and the substrate according to the invention which is to be exposed can vary depending on the application and on the type and/or power of the lamp, for example between 2 cm and 150 cm.
• laser light sources for example excimer lasers. Lasers in the visible region or in the IR region can also be employed.
• novel compositions can be employed for various purposes, for example as printing inks, as clearcoats, as white paints, for example for wood or metal, as coating materials, inter alia for paper, wood, metal or plastic, as powder coatings, as daylight-curable coatings for marking buildings and roads, for photographic reproduction processes, for holographic recording materials, for image recording processes or for the production of printing plates which can be developed using organic solvents or aqueous-alkaline media, for the production of masks for screen printing, as dental filling materials, as adhesives, including pressure-sensitive adhesives, as laminating resins, as etch resists or permanent resists and as solder masks for electronic circuits, for the production of three-dimensional articles by mass curing (UV curing in transparent moulds) or by the stereolithography process, as is described, for example, in U.S.
• Unsaturated polyester resins are mostly used in two-component systems in conjunction with a monounsaturated monomer, preferably styrene.
• a monounsaturated monomer preferably styrene.
• specific one-component systems are frequently employed, for example polymaleinimides, polychalcones or polyimides, as described in DE-A-2 308 830.
• novel photocurable compositions are suitable, for example, as coating materials for substrates of all kinds, examples being wood, textiles, paper, ceramic, glass, plastics such as polyesters, polyethylene terephthalate, polyolefins or cellulose acetate, especially in the form of films, and also metals such as Al, Cu, Ni, Fe, Zn, Mg or Co and GaAs, Si or SiO 2 , on which it is the intention to apply a protective coating or, by imagewise exposure, an image.
• substrates of all kinds examples being wood, textiles, paper, ceramic, glass, plastics such as polyesters, polyethylene terephthalate, polyolefins or cellulose acetate, especially in the form of films, and also metals such as Al, Cu, Ni, Fe, Zn, Mg or Co and GaAs, Si or SiO 2 , on which it is the intention to apply a protective coating or, by imagewise exposure, an image.
• the substrates can be coated by applying a liquid composition, a solution or suspension to the substrate.
• a liquid composition a solution or suspension
• the choice of solvent and the concentration depend predominantly on the type of composition and the coating process.
• the solvent should be inert: in other words, it should not undergo any chemical reaction with the components and should be capable of being removed again after the coating operation, in the drying process.
• suitable solvents are ketones, ethers and esters, such as methyl ethyl ketone, isobutyl methyl ketone, cyclopentanone, cyclohexanone, N-methylpyrrolidone, dioxane, tetrahydrofuran, 2-methoxyethanol, 2-ethoxyethanol, 1-methoxy-2-propanol, 1,2-dimethoxyethane, ethyl acetate, n-butyl acetate and ethyl 3-ethoxypropionate.
• ketones such as methyl ethyl ketone, isobutyl methyl ketone, cyclopentanone, cyclohexanone, N-methylpyrrolidone, dioxane, tetrahydrofuran, 2-methoxyethanol, 2-ethoxyethanol, 1-methoxy-2-propanol, 1,2-dimethoxyethane, ethyl acetate, n-
• the solution is applied uniformly to a substrate, for example by spin coating, dip coating, knife coating, curtain coating, brushing, spraying—especially electrostatic spraying—and reverse roll coating and by electrophoretic deposition. It is also possible to apply the photosensitive layer to a temporary, flexible support and then to coat the final substrate, for example a copper-clad circuit board, by means of layer transfer via lamination.
• the amount applied (layer thickness) and the nature of the substrate (layer support) are functions of the desired field of application.
• the range of layer thicknesses generally comprises values from about 0.1 ⁇ m to more than 100 ⁇ m.
• novel radiation-sensitive compositions can also be subjected to imagewise exposure. In this case they are used as negative resists. They are suitable for electronics (galvanoresists, etch resists and solder resists), for the production of printing plates, such as offset printing plates, flexographic and relief printing plates or screen printing plates, for the production of marking stamps, and can be used for chemical milling or as micro resists in the production of integrated circuits. There is a correspondingly wide range of variation in the possible layer supports and in the processing conditions of the coated substrates.
• imagewise exposure relates both to exposure through a photomask containing a predetermined pattern, for example a slide, exposure by a laser beam which is moved under computer control, for example, over the surface of the coated substrate and so generates an image, and irradiation with computer-controlled electron beams.
• thermal treatment Following the imagewise exposure of the material and prior to developing, it may be advantageous to carry out a brief thermal treatment, in which only the exposed parts are thermally cured.
• the temperatures employed are generally 50-150° C. and preferably 80-130° C.; the duration of the thermal treatment is generally between 0.25 and 10 minutes.
• a further field of use for photocuring is that of metal coating, for example the surface-coating of metal panels and tubes, cans or bottle tops, and photocuring on polymer coatings, for example of floor or wall coverings based on PVC.
• Examples of the photocuring of paper coatings are the colourless varnishing of labels, record sleeves or book covers.
• the use of the novel compounds for curing shaped articles made from composite compositions is likewise of interest.
• the composite composition is made up of a self-supporting matrix material, for example a glass-fibre fabric, or else, for example, of plant fibres [cf. K.-P. Mieck, T. Reussmann in Kunststoffe 85 (1995), 366-370], which is impregnated with the photocuring formulation.
• Shaped articles which are produced from composite compositions using the compounds according to the invention are of high mechanical stability and resistance.
• the compounds of the invention can also be used as photocuring agents in moulding, impregnating and coating compositions, as are described, for example, in EP-A-7086. Examples of such compositions are fine coating resins on which stringent requirements are placed with respect to their curing activity and resistance to yellowing, or fibre-reinforced mouldings such as planar or longitudinally or transversely corrugated light diffusing panels.
• R 1 is an aromatic or heteroaromatic radical which is capable of absorbing light in the wavelength range from 200 to 650 nm and on doing so brings about cleavage of the adjacent carbon-nitrogen bond, as a photoinitiator for photochemically induced, base-catalysed addition or substitution reactions.
• the invention provides, furthermore, a coated substrate which has been coated on at least one surface with a composition as described above, and a process for the photographic production of relief images, in which a coated substrate is subjected to imagewise exposure and then the unexposed areas are removed with a solvent.
• a coated substrate is subjected to imagewise exposure and then the unexposed areas are removed with a solvent.
• a solvent is the abovementioned exposure by means of a laser beam.
• Example 76 The compound of Example 76 is obtained as follows: a base-catalysed coupling reaction of thiosalicylic acid and p-bromoacetophenone in the presence of copper is used to obtain the keto acid which, following dehydrogenation with polyphosphoric acid, gives the 2-acetylthioxanthone, which is brominated in the ⁇ position. Finally, the reaction of the ketone with 1,5-diazabicyclo[4.3.0]nonane gives the compound A76.
• reaction is carried out under a nitrogen atmosphere and all commercial chemicals used are employed without further purification.
• reaction is carried out under a nitrogen atmosphere and all commercial chemicals used are employed without further purification.
• the resulting polymer has a solids content of 98.6%, a viscosity of 2710 mPa s and an acid number of 0.3 mg of KOH/g based on the solids content.
• M n is 1838
• M w is 3186
• the colour is 175 on the APHA (American Public Health Association) scale (Hazen colour number; ISO 6271).

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