US10761669B2 - Touch panel, method for fabricating the same, display panel, and display device - Google Patents
Touch panel, method for fabricating the same, display panel, and display device Download PDFInfo
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- US10761669B2 US10761669B2 US16/408,961 US201916408961A US10761669B2 US 10761669 B2 US10761669 B2 US 10761669B2 US 201916408961 A US201916408961 A US 201916408961A US 10761669 B2 US10761669 B2 US 10761669B2
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- G—PHYSICS
- G06—COMPUTING OR CALCULATING; COUNTING
- G06F—ELECTRIC DIGITAL DATA PROCESSING
- G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
- G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
- G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
- G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
- G06F3/0412—Digitisers structurally integrated in a display
-
- G—PHYSICS
- G06—COMPUTING OR CALCULATING; COUNTING
- G06F—ELECTRIC DIGITAL DATA PROCESSING
- G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
- G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
- G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
- G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
- G06F3/044—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means
- G06F3/0446—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means using a grid-like structure of electrodes in at least two directions, e.g. using row and column electrodes
-
- G—PHYSICS
- G06—COMPUTING OR CALCULATING; COUNTING
- G06F—ELECTRIC DIGITAL DATA PROCESSING
- G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
- G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
- G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
- G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
- G06F3/0416—Control or interface arrangements specially adapted for digitisers
-
- G—PHYSICS
- G06—COMPUTING OR CALCULATING; COUNTING
- G06F—ELECTRIC DIGITAL DATA PROCESSING
- G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
- G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
- G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
- G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
- G06F3/044—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means
- G06F3/0443—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means using a single layer of sensing electrodes
-
- G—PHYSICS
- G06—COMPUTING OR CALCULATING; COUNTING
- G06F—ELECTRIC DIGITAL DATA PROCESSING
- G06F2203/00—Indexing scheme relating to G06F3/00 - G06F3/048
- G06F2203/041—Indexing scheme relating to G06F3/041 - G06F3/045
- G06F2203/04103—Manufacturing, i.e. details related to manufacturing processes specially suited for touch sensitive devices
-
- G—PHYSICS
- G06—COMPUTING OR CALCULATING; COUNTING
- G06F—ELECTRIC DIGITAL DATA PROCESSING
- G06F2203/00—Indexing scheme relating to G06F3/00 - G06F3/048
- G06F2203/041—Indexing scheme relating to G06F3/041 - G06F3/045
- G06F2203/04111—Cross over in capacitive digitiser, i.e. details of structures for connecting electrodes of the sensing pattern where the connections cross each other, e.g. bridge structures comprising an insulating layer, or vias through substrate
-
- G—PHYSICS
- G06—COMPUTING OR CALCULATING; COUNTING
- G06F—ELECTRIC DIGITAL DATA PROCESSING
- G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
- G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
- G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
- G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
- G06F3/0416—Control or interface arrangements specially adapted for digitisers
- G06F3/04164—Connections between sensors and controllers, e.g. routing lines between electrodes and connection pads
Definitions
- This disclosure relates to the field of display technologies, and particularly to a touch panel, a method for fabricating the same, a display panel, and a display device.
- a touch panel includes metal wires, electrode connection bridges, a connection bridge protection layer, touch electrodes, a touch electrode protection layer, etc.
- Embodiments of the disclosure disclose a touch panel, a method for fabricating the same, a display panel, and a display device.
- touch electrodes on the substrate wherein the touch electrodes include a first electrode in a first direction, and a second electrode perpendicular to the first direction, and the first electrode includes a plurality of first electrode blocks;
- each of the plurality of bridge structures includes: at least two metal bridge points, and an electrode connection bridge and a first protection layer overlying the at least two metal bridge points successively, wherein the electrode connection bridge includes via holes corresponding to the metal bridge points in a one-to-one manner, and the pattern of an orthographic projection of the first protection layer on the substrate has the same shape as a pattern of an orthographic projection of the electrode connection bridge on the substrate; and two of the plurality of first electrode blocks respectively at two ends of each electrode connection bridge run respectively through the via holes of the first protection layer and the via holes of the electrode connection bridge, and are electrically connected respectively with the metal bridge points.
- At least two metal bridge points are at the underlying layer of each of the plurality of bridge structures, the electrode connection bridge and the first protection layer overlie the metal bridge points successively, both the electrode connection bridge and the first protection layer are arranged with the via holes corresponding to the metal bridge points, and the two electrode blocks at the two ends of each electrode connection bridge run respectively through the via holes of the first protection layer and the via holes of the electrode connection bridge, and are electrically connected respectively with the metal bridge points; and furthermore the two electrode blocks at the two ends of each electrode connection bridge can be electrically connected with each other through the metal bridge points and the electrode connection bridge.
- the electrode connection bridge and the first protection layer can be patterned using a same mask to thereby dispense with one mask so as to lower the cost of fabricating the touch panel.
- the touch panel further includes a second protection layer on the touch electrodes, and a pattern of an orthographic projection of the second protection layer on the substrate coincides with a pattern of an orthographic projection of the touch electrodes on the substrate.
- the touch panel further includes metal wires at a same layer as the metal bridge points.
- a wire electrode layer at a same layer as the touch electrodes and a wire protection layer at a same layer as the second protection layer overlie the metal wires successively.
- the touch panel further includes a third protection layer with a full layer structure on the second protection layer.
- the pattern of the orthographic projection of the first protection layer on the substrate covers the pattern of the orthographic projection of the electrode connection bridge on the substrate.
- a contour of an edge of the first protection layer completely covers a contour of an edge of the electrode connection bridge.
- the wire electrode layer and the wire protection layer each has an opening in a bonding area of the metal wires.
- the electrode connection bridge and the touch electrodes are Indium Tin Oxide electrodes, and the first protection layer and the second protection layer are insulating organic layers.
- a size of each of the via holes of the first protection layer is less than a size of each of the metal bridge points, and a size of each of the via holes of the electrode connection bridge is less than the size of each of the metal bridge points.
- the embodiments of the disclosure provide a display panel including the touch panel according to any one of the embodiments above.
- the embodiments of the disclosure provide a display device including the display panel according to the embodiments above.
- the embodiments of the disclosure provide a method for fabricating the touch panel according to any one of the embodiments above, the method including:
- the forming the touch electrodes on the first organic insulating layer includes:
- metal wires are further formed in the first patterning process.
- the method further includes:
- patterning the second organic insulating layer in a fourth patterning process to form a same pattern as the touch electrodes to be formed includes:
- etching the second electrode layer using the second organic insulating layer as a mask to form the touch electrodes includes:
- the method further includes: forming a third protection layer with a full layer structure on the second protection layer.
- FIG. 1 is a schematic structural diagram of metal bridge points and metal wires in a touch panel according to the embodiments of the disclosure.
- FIG. 2 is a schematic structural diagram of the metal bridge points, the metal wires, and electrode connection bridges in the touch panel according to the embodiments of the disclosure.
- FIG. 3 is a schematic structural diagram of a touch panel according to an embodiments of the disclosure.
- FIG. 4 is a schematic structural diagram of the touch panel in FIG. 3 in a sectional view along A-A.
- FIG. 5 is a schematic structural diagram of the touch panel in FIG. 3 in a sectional view along B-B.
- FIG. 6 is a schematic structural diagram of the touch panel in FIG. 3 in a sectional view along C-C.
- FIG. 7 is a schematic structural diagram of the touch panel in FIG. 3 in a sectional view along D-D;
- FIG. 8 is a schematic structural diagram of a part of the touch panel in a sectional view according to the embodiments of the disclosure after the metal bridge points are formed.
- FIG. 9 is a schematic structural diagram of a part of the touch panel in a sectional view according to the embodiments of the disclosure after a first electrode layer is formed.
- FIG. 10 is a schematic structural diagram of a part of the touch panel in a sectional view according to the embodiments of the disclosure after a photo-resist layer is formed on the first electrode layer.
- FIG. 11 is a schematic structural diagram of a part of the touch panel in a sectional view according to the embodiments of the disclosure after the metal connection bridges are formed.
- FIG. 12 is a schematic structural diagram of a part of the touch panel in a sectional view according to the embodiments of the disclosure after a first protection layer is formed.
- FIG. 13 is a schematic structural diagram of a part of the touch panel in a sectional view according to the embodiments of the disclosure after a second electrode layer is formed.
- FIG. 14 is a schematic structural diagram of a part of the touch panel in a sectional view according to the embodiments of the disclosure after a second protection layer is formed on the second electrode layer.
- FIG. 15 is a flow chart of a method for fabricating the touch panel according to the embodiments of the disclosure.
- the touch panel is usually fabricated by patterning a metal layer, a first electrode layer (e.g. a first Indium Tin Oxide layer, ITO1), a first protection layer (e.g. a first overcoat layer, OC1), a second electrode layer (e.g. a second Indium Tin Oxide layer, ITO2), and a second protection layer (e.g. a second overcoat layer, OC2) respectively using five masks at a high development cost.
- a first electrode layer e.g. a first Indium Tin Oxide layer, ITO1
- a first protection layer e.g. a first overcoat layer, OC1
- a second electrode layer e.g. a second Indium Tin Oxide layer, ITO2
- a second protection layer e.g. a second overcoat layer, OC2
- FIG. 1 to FIG. 15 Reference will be made to FIG. 1 to FIG. 15 .
- a touch panel according to the embodiments of the disclosure includes:
- touch electrodes on the substrate 1 where the touch electrodes include a first electrode 51 in a first direction (as indicated by the dotted arrow in FIG. 3 ) and a second electrode 52 perpendicular to the first direction, and the first electrode 51 includes a plurality of first electrode blocks 510 in the first direction; and
- a plurality of bridge structureson the substrate 1 configured to electrically connect adjacent first electrode blocks 510 of the plurality of first electrode blocks 510
- the plurality of bridge structures includes: at least two metal bridge points 2 , and an electrode connection bridge 3 and a first protection layer 4 overlying the at least two metal bridge points 2 successively, where the electrode connection bridge 3 includes via holes corresponding to the metal bridge points 2 in a one-to-one manner, and a pattern of an orthographic projection of the first protection layer 4 on the substrate 1 has a same shape as a pattern of an orthographic projection of the electrode connection bridge 3 on the substrate 1 ; and two of the plurality of first electrode blocks 510 respectively at two ends of each electrode connection bridge 3 run respectively through via holes of the first protection layer 4 and the via holes of the electrode connection bridge 3 , and are electrically connected respectively with the metal bridge points 2 .
- each of the plurality of bridge structures includes two metal bridge points 2 , which can correspond respectively to the two ends of the electrode connection bridge 3 , and the two first electrode blocks 510 at the two ends of the electrode connection bridge 3 can run respectively through two via holes of the first protection layer 4 , and the corresponding two via holes of the electrode connection bridge 3 , and be electrically connected respectively with the two metal bridge points 2 .
- At least two metal bridge points 2 are arranged at the underlying layer of each of the plurality of bridge structures, the electrode connection bridge 3 and the first protection layer 4 overlie the metal bridge points 2 successively, both the electrode connection bridge 3 and the first protection layer 4 are arranged with the via holes corresponding to the metal bridge points 2 , and the two electrode blocks 510 at the two ends of each electrode connection bridge 3 run respectively through the via holes of the first protection layer 4 and the via holes of the electrode connection bridge 3 , and are electrically connected respectively with the metal bridge points; and furthermore the two electrode blocks 510 at the two ends of each electrode connection bridge 3 can be electrically connected with each other through the metal bridge points 2 and the electrode connection bridge 3 .
- the electrode connection bridge 3 and the first protection layer 4 can be patterned using a same mask to thereby dispense with one mask so as to lower the cost of fabricating the touch panel.
- the pattern of the orthographic projection of the first protection layer 4 on the substrate 1 covers the pattern of the orthographic projection of the electrode connection bridge 3 on the substrate 1 , that is, a contour of an edge of the first protection layer 4 completely covers a contour of an edge of the electrode connection bridge 3 , so that the electrode connection bridge 3 is completely insulated from the second electrode 52 .
- a shape of the pattern of the first protection layer 4 is the same as a shape of the pattern of the electrode connection bridge 3 , and the contour of the edge of the first protection layer 4 completely covers the contour of the edge of the electrode connection bridge 3 ; and furthermore when the first protection layer 4 and the electrode connection bridge 3 are patterned respectively using a same mask, a size of the resulting contour of the edge of the first protection layer 4 and a size of the resulting contour of the edge of the electrode connection bridge 3 can be controlled by controlling the amount of exposure so that the contour of the edge of the electrode connection bridge 3 is completely covered by the contour of the edge of the first protection layer 4 .
- the touch panel according to the embodiments of the disclosure further includes a second protection layer 6 on the touch electrodes, and a pattern of an orthographic projection of the second protection layer 6 on the substrate 1 coincides with a pattern of the orthographic projection of the touch electrodes on the substrate 1 .
- the touch electrode layer can be etched using the second protection layer 6 as a mask to thereby form touch electrode structures, so that as compared with the fabricating process in the related art, the touch panel according to the embodiments of the disclosure can be fabricated while dispensing with one further mask, and also dispensing with the processes of coating, exposing, etching, and stripping photo-resist (PR) on the touch electrode layer, and thus avoiding the touch electrodes from being peeled in those processes.
- PR photo-resist
- the touch panel according to the embodiments of the disclosure further includes a third protection layer on the second protection layer 6 , and the third protection layer has a full layer structure, and can isolate the touch electrodes completely from the air to thereby avoid the touch electrodes from being oxidized.
- the metal bridge points 2 are preferably as small as possible; and in some embodiments, the metal bridge points 2 can be circles with a diameter ranging from 10 ⁇ m to 15 ⁇ m.
- a size of a via hole of the first protection layer 4 and a size of a via hole of the electrode connection bridge 3 are less than a size of the metal bridge point 2 , and in some embodiments, the via holes of the first protection layer 4 and the electrode connection bridge 3 can be circular holes with a diameter ranging from 5 ⁇ m to 10 ⁇ m.
- the touch panel according to the embodiments of the disclosure further includes metal wires 20 at the same layer as the metal bridge points 2 .
- the metal bridge points 2 and the metal wires 20 can be formed in one patterning process without any additional mask and additional process step.
- a wire electrode layer 50 at the same layer as the touch electrodes, and a wire protection layer 60 at the same layer as the second protection layer 6 overlie the metal wires 20 successively.
- the wire electrode layer 50 and the wire protection layer 60 can protect the metal wires 20 from being eroded, oxidized, etc., after being exposed to the air for a long period of time.
- the wire electrode layer 50 and the wire protection layer 60 each has an openings 8 in a bonding area of the metal wires 20 to thereby expose the metal wires 20 in the bonding area, thus facilitating circuit connection in the bonding area.
- the wire electrode layer 50 and the touch electrodes 5 are formed in one etching process, and the wire protection layer 60 and the second protection layer 6 are formed in one patterning process, without any additional mask and additional process step.
- both the electrode connection bridge 3 and the touch electrodes 5 are transparent electrodes, and can particularly be ITO electrodes; and both the first protection layer 4 and the second protection layer 6 can be insulating organic layers, can insulate and protect the ITO electrodes, can be formed in a specific pattern in a patterning process, and will not be stripped.
- the touch panel according to the embodiments of the disclosure can be fabricated in such a way that the electrode connection bridges 3 and the first protection layer can be patterned using a same mask, and the touch electrode layer is etched directly using the pattern of the second protection layer 6 as a mask to form the touch electrodes, so the touch panel can be fabricated while dispensing with at least two masks to thereby greatly lower the development cost, and also dispensing with the processes of coating, exposing, etching, and stripping the photo-resist (PR) on the touch electrode layer to thereby simplify the fabrication process, and thus avoiding the touch electrodes from being peeled, to thereby improve the good-yield ratio of the display panel.
- PR photo-resist
- the embodiments of the disclosure further provide a display panel including the touch panel according to any one of the embodiments above.
- the embodiments of the disclosure further provide a display device including the display panel according to the embodiments above.
- the embodiments of the disclosure further provide a method for fabricating the touch panel, and as illustrated in FIG. 15 , the method includes the following steps.
- Step S 101 forming a metal layer on the substrate 1 , and forming the metal bridge points 2 of each of the plurality of bridge structures in a first patterning process, as illustrated in FIG. 8 .
- the “patterning process” refers to process steps of forming a structure in a specific pattern, and can include one or more of process steps of coating, exposing, developing, etching, and striping photo-resist, or can be an imprinting process, an ink-jet printing process, or another patterning process of forming a structure in a desirable pattern using a mask in the art.
- Step S 102 forming a first electrode layer 300 on the metal layer, and forming the electrode connection bridge 3 of each of the plurality of bridge structures in a second patterning process, as illustrated in FIG. 9 to FIG. 11 .
- Step S 103 forming a first organic insulating layer on the first electrode layer, and forming the first protection layer 4 of each of the plurality of bridge structures in a third patterning process, as illustrated in FIG. 12 .
- a mask of the third patterning process is the same as a mask of the second patterning process.
- Step S 104 forming the touch electrodes on the first organic insulating layer.
- the electrode connection bridge 3 and the first protection layer 4 are patterned using a same ask so that one mask can be dispensed with to thereby lower the fabrication cost of the touch panel.
- the metal wires 20 can be further formed in the first patterning process in the step S 101 , that is, the metal layer is patterned in one patterning process in the step S 101 to form the metal bridge points 2 in a touch area and the metal lines 20 around the touch area, as illustrated in FIG. 1 .
- the flow of the step S 102 can include: forming an integral first electrode layer (ITO layer) 300 on the substrate 1 formed with the metal bridge points 2 as illustrated in FIG. 9 , and then coating, exposing, and developing photo-resist (PR) on the ITO layer 300 to form a photo-resist layer 7 with a same pattern of the electrode connection bridges 3 , as illustrated in FIG. 10 ; and then etching the ITO layer 300 to reserve the ITO layer in a protected area of the photo-resist layer 7 , and to remove the ITO layer in the other area to thereby form the electrode connection bridges 3 , as illustrated in FIG. 11 .
- ITO layer integral first electrode layer
- PR photo-resist
- the ITO layer can be etched using weak acid, which cannot etch the underlying metal bridge points 2 , so that the metal bridge points 2 at the openings of the pattern of the photo-resist layer 7 can be reserved for circuit connection between the two ends of the electrode connection bridges 3 . Finally the photo-resist layer 7 on the electrode connection bridges 3 is stripped so that the electrode connection bridge 3 is formed.
- the flow of the step S 103 can include: forming an integral organic insulating layer on the substrate 1 formed with the electrode connection bridges 3 as illustrated in FIG. 12 , and then exposing and developing the organic insulating layer to form the first protection layers 4 with a same pattern as the electrode connection bridges 3 , where the first protection layers 4 are also arranged with via holes matching with the metal bridge points 2 , and the shape of the contours of the edges of the first protection layers 4 is the same as the shape of the contours of the edges of the electrode connection bridges 3 .
- the exposure process of the organic insulating layer and the patterning process of the electrode connection bridges 3 use a same mask; and furthermore a size of the resulting contour of the edge of the first protection layers 4 and a size of the resulting contour of the edge of the electrode connection bridges 3 can be controlled by controlling the amount of exposure so that the size of the contours of the first protection layers 4 is larger than the size of the contours of the electrode connection bridges 3 , and thus the edge of the electrode connection bridges 3 are completely covered by the edge of the first protection layers 4 .
- the touch electrodes can be formed on the first organic insulating layer in the step S 104 particularly in the following steps:
- a second electrode layer 500 is formed on the first organic insulating layer, a second organic insulating layer is formed on the second electrode layer 500 , and the second insulating layer is patterned in a same pattern as the touch electrodes to be formed in a fourth patterning process to thereby form the second protection layer 6 ;
- the second electrode layer 500 is etched using the second protection layer 6 as a mask to form the touch electrodes (the first electrode 51 and the second electrode 52 ).
- the flow of the step S 104 can include: forming the integral second electrode layer (ITO layer) 500 on the substrate 1 formed with the bridge structures as illustrated in FIG. 13 , and then coating, exposing, and developing the organic insulating layer above the ITO layer 500 to form the pattern of the second protection layer 6 , as illustrated in FIG. 14 , where the second protection layer 6 is firstly formed; and etching the ITO layer 500 using the second protection layer 6 as a mask so that the ITO layer is removed in an area thereof which is not protected by the second protection layer 6 , and reserved in the other area thereof protected by the second protection layer 6 , as illustrated in FIG. 4 and FIG.
- the touch electrode layer is etched using the second protection layer 6 instead of photo-resist (PR) as a photo-resist protection layer, the touch electrodes can be formed while dispensing with one mask, and also dispensing with the processes of coating, exposing, developing, and stripping the photo-resist (PR) layer on the ITO layer 500 to thereby simplify the process, and thus avoiding the first protection layer 4 from being partially dissolved while stripping the photo-resist (PR) layer, and consequently the touch electrodes from being peeled.
- PR photo-resist
- the method further includes the step of forming a third protection layer with a full layer structure on the second protection layer 6 to thereby isolate the touch electrodes from the air so as to avoid the touch electrodes from being oxidized.
- the wire protection layer 60 overlying the metal wires 20 can be further formed in the fourth patterning process in the step S 104 , that is, the pattern of the second organic insulating layer includes the wire protection layer 60 in addition to the second protection layer 6 ; and furthermore, the second electrode layer 500 is etched using the second organic insulating layer as a mask to form the wire electrode layer 50 overlying the metal wires 20 , that is, the pattern of the second electrode 500 includes the wire electrode layer 50 in addition to the touch electrodes.
- both the wire electrode layer 50 and the wire protection layer 60 are designed with the openings 8 in the bonding area of the metal wires 20 , that is, the wire electrode layer 50 and the wire protection layer 60 in the bonding area are etched to expose the metal wires to thereby facilitate circuit connection in the bonding area.
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- Position Input By Displaying (AREA)
Abstract
Description
Claims (18)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201810779123 | 2018-07-16 | ||
| CN201810779123.8 | 2018-07-16 | ||
| CN201810779123.8A CN109002211B (en) | 2018-07-16 | 2018-07-16 | A touch screen and preparation method thereof, display panel and display device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| US20200019280A1 US20200019280A1 (en) | 2020-01-16 |
| US10761669B2 true US10761669B2 (en) | 2020-09-01 |
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| Application Number | Title | Priority Date | Filing Date |
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| US16/408,961 Expired - Fee Related US10761669B2 (en) | 2018-07-16 | 2019-05-10 | Touch panel, method for fabricating the same, display panel, and display device |
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| US (1) | US10761669B2 (en) |
| CN (1) | CN109002211B (en) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110221723B (en) * | 2019-05-28 | 2022-07-01 | 业成科技(成都)有限公司 | Touch panel manufacturing method, touch panel and electronic device |
| KR102877548B1 (en) * | 2019-12-03 | 2025-10-29 | 삼성디스플레이 주식회사 | Touch sensor, fabricating method thereof, and display device having the same |
| CN113835542A (en) | 2020-06-23 | 2021-12-24 | 宸美(厦门)光电有限公司 | touch screen panel |
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| CN107577375A (en) * | 2017-10-24 | 2018-01-12 | 业成科技(成都)有限公司 | Touch-screen and its manufacture method |
| CN108227989B (en) * | 2018-01-02 | 2021-03-05 | 京东方科技集团股份有限公司 | Touch substrate and preparation method thereof, metal mask plate and display device |
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- 2018-07-16 CN CN201810779123.8A patent/CN109002211B/en not_active Expired - Fee Related
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| US20110227858A1 (en) * | 2010-03-16 | 2011-09-22 | Su-Chang An | Touch panel and method for manufacturing the same |
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| US20160291790A1 (en) * | 2015-04-01 | 2016-10-06 | Shanghai Tianma Micro-electronics Co., Ltd. | Touch display panel and touch display device |
| US20190056816A1 (en) * | 2017-08-18 | 2019-02-21 | Int Tech Co., Ltd. | Conductive mesh and touch sensor |
Also Published As
| Publication number | Publication date |
|---|---|
| CN109002211A (en) | 2018-12-14 |
| US20200019280A1 (en) | 2020-01-16 |
| CN109002211B (en) | 2021-08-17 |
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